CN106461563A - Detection device, detection method, processing device, and processing method - Google Patents

Detection device, detection method, processing device, and processing method Download PDF

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Publication number
CN106461563A
CN106461563A CN201580034204.XA CN201580034204A CN106461563A CN 106461563 A CN106461563 A CN 106461563A CN 201580034204 A CN201580034204 A CN 201580034204A CN 106461563 A CN106461563 A CN 106461563A
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CN
China
Prior art keywords
pattern
blooming
polarization
row
surface side
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Pending
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CN201580034204.XA
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Chinese (zh)
Inventor
陈廷槐
西原伸彦
田中大充
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Sumitomo Chemical Co Ltd
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Sumitomo Chemical Co Ltd
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Publication of CN106461563A publication Critical patent/CN106461563A/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation

Abstract

This detection device (DA1) includes: a support body (B1) having a support surface (B1a) that supports the first surface (OP1a) of an optical film (OP1), and having a reflective surface (RS1) at least at a portion within the support surface (B1a); a light source unit (IL1) that radiates light from the second surface (OP1b) side of the optical film (OP1) towards the optical film (OP1) positioned on the reflective surface (RS1); an imaging unit (CM1) that images the reflected light image from the optical film (OP1) positioned on the reflective surface (RS1) from the second surface (OP1b) side of the optical film (OP1); and a pattern detection unit (IP1) that detects a polarization pattern sequence (OP12a, OP12b) positioned on the reflective surface (RS1) on the basis of the reflected light image of the optical film (OP1).

Description

Detection means, detection method, processing meanss and processing method
Technical field
The present invention relates to detection means, detection method, processing meanss and processing method.
The application based on June 30th, 2014 in the Japanese Patent Application 2014-134351 of Japanese publication and CLAIM OF PRIORITY, By its content quotation in this.
Background technology
As display stereo-picture mode it is known that being referred to as the side of FPR (Film Patterned Retarder) mode Formula.In the 3D liquid crystal display of FPR mode, in order to separate right eye image with left eye image, in the table of liquid crystal panel Face is configured with the patterning phase retardation film (with reference to patent documentation 1) being referred to as FPR film.
FPR film includes right eye pattern of polarization row and left eye pattern of polarization arranges.Right eye pattern of polarization row and left eye Corresponding with the right eye pixel column of liquid crystal panel and left eye pixel column and be alternately arranged with pattern of polarization row.Right eye polarizes The direction of the slow axis that pattern row are arranged with pattern of polarization with left eye is orthogonal.Sometimes it is being configured with right eye pattern of polarization row and a left side The outside configuration of the effective coverage of ophthalmically acceptable pattern of polarization row is to mutatis mutandis pattern of polarization row.
Citation
Patent documentation
Patent documentation 1:Japanese Unexamined Patent Publication 2012-32445 publication
Content of the invention
Invent problem to be solved
FPR film is formed with multiple pattern of polarization row with fine width.Therefore, FPR film is being cut to regulation Width or shape, FPR film is fitted in during liquid crystal panel the position it is necessary to detection pattern of polarization row exactly, and be based on this position Put and FPR film is aligned.
For example, patent documentation 1 describes the lower face side irradiation light from FPR film and utilizes the upper surface from FPR film for the camera The device that side is shot is used as the detection means of pattern of polarization row.
It is configured with polarization plates between FPR film and light source, be configured with successively from FPR film side between FPR film and camera Polarizer (1/4 wavelength plate) and polarization plates.Right eye arranges the length side along film with pattern of polarization row and left eye pattern of polarization To extension.Along with FPR film roll out and convey and continuously detect these pattern of polarization arrange.
However, in the structure of patent documentation 1, because the lower face side in FPR film arranges light source, therefore cannot be in FPR The lower face side configuration supporting mass of film.It is, therefore, necessary to the unstable position not being supported by body supporting in FPR film carries out polarization figure The detection of case row.It is also contemplated for arranging through hole in supporting mass, but only then cannot be fully to FPR film by the light through through hole It is illuminated.
In addition, the most surface in FPR film is provided with the protecting film such as protecting film, separation membrane.Protecting film has birefringence, meeting Produce unexpected phase contrast.If there is not protecting film, right eye pattern of polarization row and left eye pattern of polarization row are shown as bright Pattern and dark pattern, if but there is protecting film, bright pattern is reduced it is impossible to clearly distinguish both with the contrast of dark pattern. Therefore, before carrying out optical detecting, need to spend time protecting film being carried out peel off etc..
In addition, FPR film fits in the surface of the polarization plates of the display surface side of liquid crystal panel, but also will pass through in research recently The one-piece type FPR film of the polarization plates of polarization plates and FPR film integration fits in the structure on the surface of liquid crystal panel.In this knot In structure, due to the deviation of the optic axises in the face of polarization plates, above-mentioned bright pattern is reduced further with the contrast of dark pattern, more Plus be difficult to distinguish both.
It is an object of the invention to provide the detection means of pattern of polarization row, detection method, place can accurately be detected Reason device and processing method.
For solving the scheme of problem
The detection means of first technical scheme of the present invention is disposed with phase place to from the first surface side towards the second surface side Difference layer, include the direction patterning phase separation layer of multiple pattern of polarization row different from each other of slow axis and polarizer layer forms The plurality of pattern of polarization row of blooming detected, described detection means is characterised by, including:Supporting mass, its tool There is the bearing-surface that described first face to described blooming is supported, at least a portion in described bearing-surface has reflection Face, this reflecting surface makes to pass through the light reflection after described blooming to described first surface side from described second surface side;Light source portion, its from Described second surface side of described blooming is towards the described blooming irradiation light on described reflecting surface;Image pickup part, it is from institute Described second surface side stating blooming shoots the reflected light picture of the described blooming being located on described reflecting surface;And pattern detection Portion, it detects the plurality of pattern of polarization row on described reflecting surface based on the described reflected light picture of described blooming.
In the detection means of first technical scheme of the present invention, Ke Yishi, described pattern detection portion is based on the plurality of The brightness of reflected light picture of pattern of polarization row or the difference of color, to detect the plurality of pattern of polarization row.
The detection means of second technical scheme of the present invention is disposed with phase place to from the first surface side towards the second surface side The patterning phase separation layer of difference layer, polarizer layer and the direction multiple pattern of polarization row different from each other including slow axis forms The plurality of pattern of polarization row of blooming detected, described detection means is characterised by, including:Supporting mass, its tool There is the bearing-surface that described first face to described blooming is supported, at least a portion in described bearing-surface has reflection Face, this reflecting surface makes to pass through the light reflection after described blooming to described first surface side from described second surface side;Light source portion, its from Described second surface side of described blooming is towards the described blooming irradiation light on described reflecting surface;Polarization plates, its setting On from described light source portion towards the light path of the described light of described blooming;Image pickup part, it is from described the second of described blooming Surface side shoots the reflected light picture of the described blooming being located on described reflecting surface;And pattern detection portion, it is based on described optics The described reflected light picture of film is detecting the row of the plurality of pattern of polarization on described reflecting surface.
In the detection means of second technical scheme of the present invention, described pattern detection portion is based on the plurality of pattern of polarization The brightness of reflected light picture of row or the difference of color are detecting the plurality of pattern of polarization row.
In the detection means of second technical scheme of the present invention, Ke Yishi, including to the polarization axle of described polarization plates with The adjustment portion that the relative angle of the slow axis of described pattern of polarization row is adjusted.
The detection method of first technical scheme of the present invention is disposed with phase place to from the first surface side towards the second surface side Difference layer, include the direction patterning phase separation layer of multiple pattern of polarization row different from each other of slow axis and polarizer layer forms The plurality of pattern of polarization row of blooming detected, described detection method is characterised by, including:Holding step, In this holding step, supported described first face of described blooming by supporting mass, this supporting mass has the institute to described blooming State the bearing-surface that the first face is supported, at least a portion in described bearing-surface has reflecting surface, this reflecting surface makes from institute State the second surface side and pass through the light reflection after described blooming to described first surface side;Irradiating step, in this irradiating step, from institute Described second surface side stating blooming is towards the described blooming irradiation light on described reflecting surface;Shoot step, in this bat Take the photograph in step, shoot the reflected light of the described blooming being located at described reflecting surface from described second surface side of described blooming Picture;And pattern detection step, in this pattern detection step, detected based on the described reflected light picture of described blooming and be located at The plurality of pattern of polarization row on described reflecting surface.
In the detection method of first technical scheme of the present invention, Ke Yishi, described pattern detection step is based on described many The brightness of reflected light picture of individual pattern of polarization row or the difference of color are detecting the plurality of pattern of polarization row.
The detection method of second technical scheme of the present invention is disposed with phase place to from the first surface side towards the second surface side The patterning phase separation layer of difference layer, polarizer layer and the direction multiple pattern of polarization row different from each other including slow axis forms The plurality of pattern of polarization row of blooming detected, described detection method is characterised by, including:Holding step, In this holding step, supported described first face of described blooming by supporting mass, this supporting mass has the institute to described blooming State the bearing-surface that the first face is supported, at least a portion in described bearing-surface has reflecting surface, this reflecting surface makes from institute State the second surface side and pass through the light reflection after described blooming to described first surface side;Irradiating step, in this irradiating step, from institute State described second surface side of blooming via polarization plates towards the described blooming irradiation light on described reflecting surface;Shoot step Suddenly, in this shooting step, shoot, from described second surface side of described blooming, the described blooming being located at described reflecting surface Reflected light picture;And pattern detection step, in this pattern detection step, described reflected light picture based on described blooming Lai The plurality of pattern of polarization row that detection is located on described reflecting surface.
In the detection method of second technical scheme of the present invention, Ke Yishi, described pattern detection step is based on described many The brightness of reflected light picture of individual pattern of polarization row or the difference of color are detecting the plurality of pattern of polarization row.
In the detection method of second technical scheme of the present invention, can include the polarization axle to described polarization plates with described The set-up procedure that the relative angle of the slow axis of pattern of polarization row is adjusted.
It is right that the processing meanss of first technical scheme of the present invention are come using the detection means of first technical scheme of the present invention It is disposed with phase separation layer, includes the direction of slow axis multiple pattern of polarization different from each other towards the second surface side from the first surface side The plurality of pattern of polarization row of the blooming of the patterning phase separation layer of row and polarizer layer are detected, and base To carry out predetermined processing to described blooming in the position of described pattern of polarization row.
It is right that the processing meanss of second technical scheme of the present invention are come using the detection means of second technical scheme of the present invention The direction being disposed with phase separation layer, polarizer layer and inclusion slow axis towards the second surface side from the first surface side is different from each other The plurality of pattern of polarization row of the blooming of patterning phase separation layer of multiple pattern of polarization row detected, and base To carry out predetermined processing to described blooming in the position of described pattern of polarization row.
It is right that the processing method of first technical scheme of the present invention is come using the detection method of first technical scheme of the present invention It is disposed with phase separation layer, includes the direction of slow axis multiple pattern of polarization different from each other towards the second surface side from the first surface side The plurality of pattern of polarization row of the blooming of the patterning phase separation layer of row and polarizer layer are detected, and base To carry out predetermined processing to described blooming in the position of described pattern of polarization row.
It is right that the processing method of first technical scheme of the present invention is come using the detection method of second technical scheme of the present invention The direction being disposed with phase separation layer, polarizer layer and inclusion slow axis towards the second surface side from the first surface side is different from each other The plurality of pattern of polarization row of the blooming of patterning phase separation layer of multiple pattern of polarization row detected, and base To carry out predetermined processing to described blooming in the position of described pattern of polarization row.
Position it should be noted that " carrying out predetermined processing to blooming " in the present invention refers to, based on pattern of polarization row Put the position to control blooming with respect to thing of being fitted, or blooming is being carried out cut the width of processing time control optical film Crawling on degree direction.
Invention effect
In accordance with the invention it is possible to providing the detection means that can accurately detect pattern of polarization and arrange, detection method, processing dress Put and processing method.
Brief description
Fig. 1 is the brief figure of the detection means of the first embodiment of the present invention.
Fig. 2 is the brief figure of the detection means of second embodiment of the present invention.
Fig. 3 is the sectional view of that represents blooming.
Fig. 4 is to represent the light quantity distribution of reflected light picture of blooming and the figure of color distribution.
Fig. 5 is the brief figure of the detection means of third embodiment of the present invention.
Fig. 6 is the figure that liquid crystal panel and the method for adjustment of the relative bonding position of blooming are described.
Fig. 7 A is the figure of the bonding process to liquid crystal panel laminating blooming illustrating to carry out by cylinder of fitting.
Fig. 7 B is the figure of the bonding process to liquid crystal panel laminating blooming illustrating to carry out by cylinder of fitting.
Fig. 8 is the brief figure of the detection means of the 4th embodiment of the present invention.
Fig. 9 is the top view of that represents blooming.
Figure 10 is the brief figure of cutting processing unit (plant).
Specific embodiment
[first embodiment]
Fig. 1 is the brief figure of detection means DA1 of the first embodiment of the present invention.
Detection means DA1 of present embodiment includes supporting mass B1, image unit U1 and pattern detection portion IP1.Detection Pattern of polarization row OP12a, OP12b that device DA1 is comprised to blooming OP1 detect.
Blooming OP1 at least includes phase separation layer OP11, patterning phase separation layer OP12 and polarizer layer OP13.From light Learn the first face (face of the side being supported by supporting mass B1) the OP1a side of film OP1 towards the second face (with supported by supporting mass B1 The face of side opposition side) OP1b side set gradually phase separation layer OP11, patterning phase separation layer OP12 and polarizer layer OP13. The part in addition to phase separation layer OP11 in blooming OP1 is blooming main part OPC1.
Patterning phase separation layer OP12 include slow axis RTAX direction multiple pattern of polarization row OP12a different from each other, OP12b.Patterning phase separation layer OP12 for example include slow axis RTAX orthogonal the first pattern of polarization row OP12a in direction and Second pattern of polarization row OP12b.Observe from the normal direction of blooming OP1, the slow axis RTAX example of the first pattern of polarization row OP12a As polarization axle (axis of homology) the PLAX deasil shape angle at 45 ° with respect to polarizer layer OP13.Method from blooming OP1 Line direction is observed, and the slow axis RTAX of the second pattern of polarization row OP12b polarization axle PLAX for example with respect to polarizer layer OP13 is inverse Hour hands landform angle at 45 °.First pattern of polarization row OP12a and the second pattern of polarization row OP12b is with its length direction just It is alternately arranged on the direction handed over.
Phase separation layer OP11 as blooming main part OPC1 protecting film (protection film) with can peel off Mode is arranged at blooming main part OPCI.Protecting film generally extends to manufacture by twin shaft, has birefringence.Protecting film with Patterning phase separation layer OP12, polarizer layer OP13 etc. compare, and phase contrast is not fully controlled.Therefore, protecting film can be to transmission The phase contrast that light imparting after patterning phase separation layer OP12 is not intended to.Such phase contrast can reduce the precision of optical detecting, Therefore such phase contrast should be excluded, but in the present embodiment, such phase contrast be positively utilized to carry out polarization figure The detection of case row OP12a, OP12b.Described later with regard to this point.
Blooming OP1 can be included beyond phase separation layer OP11, patterning phase separation layer OP12 and polarizer layer OP13 Layer.For example, it is possible to part or all by the blooming OP3 shown in Fig. 3 is used as blooming OP1.
The blooming OP3 of Fig. 3 includes first phase difference layer (protecting film) OP31, substrate layer in a thickness direction successively OP33, light redirecting layer OP34, patterning phase separation layer OP35, the first adhesive linkage OP36, polarizer layer OP37, the second adhesive linkage OP38, polaroid protective layer OP39, adhesive layer OP40 and second phase difference layer (separation membrane) OP41.Removing in blooming OP3 Part beyond first phase difference layer OP31 and second phase difference layer OP41 is blooming main part OP42.
Difference layer OP31 is corresponding with the phase separation layer OP11 of Fig. 1 for first phase, the pattern of patterning phase separation layer OP35 and Fig. 1 Change phase separation layer OP12 to correspond to, polarizer layer OP37 is corresponding with the polarizer layer OP13 of Fig. 1, blooming main part OP42 and Fig. 1 Blooming main part OPC1 correspond to.In the present embodiment, for example second phase difference layer will can be peeled off from blooming OP3 Blooming OP45 obtained by OP41 is used as blooming OP1.
Hereinafter, the concrete structure of blooming OP3 is described.
< polarizer layer>
Polarizer layer OP37 makes the light transmission of the vibration plane with a direction in the light of incidence, and absorbs the light of incidence In the light with the vibration plane orthogonal with this direction.The just rectilinearly polarized light projecting via polarizer layer OP37.
As polarizer layer OP37, for example, can use the polarizing coating manufacturing via following operation, described operation refers to By the operation of polyvinyl alcohol resin film uniaxial extension, by being dyeed to polyvinyl alcohol resin film with dichroism pigment and Adsorb the operation of dichroism pigment, with boric acid aqueous solution, the polyvinyl alcohol resin film being adsorbed with dichroism pigment processed Operation and the operation washed after the process of boric acid aqueous solution.
Polyvinyl alcohol resin can be obtained by making polyvinyl acetate system resin saponification.Polyvinyl acetate system tree Fat except can be in addition to the homopolymer of vinyl acetate is polyvinyl acetate, can also be vinyl acetate and can be therewith The copolymer of the other monomers of copolymerization.As unsaturation for example can be enumerated with the other monomers of vinyl acetate copolymerization Carboxylic acidss, olefines, vinyl ethers, unsaturated sulfonic acid class, there is acrylic amide of ammonium etc..
As dichroism pigment, for example, can use iodine, dichromatic organic dyestuff.Using iodine as dichroism pigment In the case of, can using by polyvinyl alcohol resin film immersion in the aqueous solution containing iodine and potassium iodide and the side that dyes Method.
The uniaxial extension of polyvinyl alcohol resin film can carry out before the dyeing of dichroism pigment it is also possible to two colors Property pigment dyeing simultaneously carry out it is also possible to after the dyeing of dichroism pigment, for example boric acid process during carry out.
The thickness of polarizer layer OP37 for example can be set to average thickness and be more than 5 μm and less than 40 μm.
< patterns phase separation layer >
Patterning phase separation layer OP35 makes the rectilinearly polarized light of incidence become the light of two kinds of polarization states and project.Patterning Phase separation layer OP35 is formed in light redirecting layer OP34.
Light redirecting layer OP34 has orientation restraint to the material (hereinafter referred to as liquid crystal material) with liquid crystal liquid crystal property.Light orientation Layer OP34 is formed using the light orientation material of polymerism.As light orientation material, it is possible to use because being shown by polarized light exposure The material of existing orientation restraint.By being allowed to poly- on the basis of orientation restraint is manifested to light orientation material exposure polarized light Close, thus forming light redirecting layer OP34 maintaining orientation restraint.As such light orientation material, it is possible to use generally The material known.
Light redirecting layer OP34 for example includes the orthogonal first orientation region in direction and the second orientation of orientation restraint Region.First orientation region extends in banding respectively along the direction parallel with one side of blooming OP3 with second orientation region. First orientation region and second orientation region are arranged alternately on the direction orthogonal with the bearing of trend of itself.
Patterning phase separation layer OP35 includes first pattern of polarization corresponding with the first orientation region of light redirecting layer OP34 Row OP35a and second pattern of polarization row OP35b corresponding with second orientation region.First pattern of polarization row OP35a and second The slow axis of pattern of polarization row OP35b is orthogonal.First pattern of polarization row OP35a makes rectilinearly polarized light become and turns to the first circular polarization Light.It is different from the direction of rotation of the first circularly polarized light that second pattern of polarization row OP35b makes rectilinearly polarized light change turn to direction of rotation The second circularly polarized light.
Patterning phase separation layer OP35 uses to be had the liquid crystal material of functional group of polymerism and is formed.Patterning phase contrast Layer OP35 obtains in the following way, the first orientation region being had according to light redirecting layer OP34 and second orientation region Orientation restraint and in two directions arrange liquid crystal material, and, make the functional group of the polymerism that liquid crystal material has Reaction, maintains the used liquid crystalline phase of liquid crystal material and is allowed to solidify.As the liquid crystal material of such polymerism, can make With commonly known material.
< substrate layer >
Substrate layer OP33 is used as the base material that light redirecting layer OP34 and patterning phase separation layer OP35 are supported.Light takes Pass through to apply light orientation material and liquid crystal material on the surface of substrate layer OP33 to layer OP34 and patterning phase separation layer OP35 Expect and formed.
As the formation material of substrate layer OP33, for example can enumerate Triafol T (TAC) is resin, Merlon It is resin, polyvinyl alcohol resin, polystyrene resin, (methyl) acrylic ester resin, comprise cyclic polyolefin hydrocarbon system tree Fat, the polyolefin-based resins of polypropylene-based resin, polyarylate system resin, polyimides system resins, polyamide series resin etc..
The thickness of substrate layer OP33 for example can be more than 40 μm and less than 100 μm for average thickness.
< polaroid protective layer >
Formation material as polaroid protective layer OP39, it is possible to use the material same with above-mentioned substrate layer OP33. As such material, for example can enumerate Triafol T (TAC) is resin, polycarbonate-based resin, polyethenol series Resin, polystyrene resin, (methyl) acrylic ester resin, comprise cyclic polyolefin hydrocarbon system resin, polypropylene-based resin Polyolefin-based resins, polyarylate system resin, polyimides system resins, polyamide series resin etc..
The thickness of polaroid protective layer OP39 for example can be set to average thickness and be more than 5 μm and less than 80 μm.
< adhesive linkage >
The formation material of the first adhesive linkage OP36 and the second adhesive linkage OP38 for example can be enumerated to employ polyethylene The constituent of alcohol system resin or polyurethane resin is dissolved in the water as main component the material obtaining or be dispersed in water The water system bonding agent that obtains, the solvent-free photo-curable bonding containing light-cured resin and light cationic polymerization initiator etc. Agent.As the formation material of the first adhesive linkage OP36 and the second adhesive linkage OP38, volume contraction when manufacturing is few, thickness Control easily this viewpoint to set out, preferably use Photocurable adhesive agent, more preferably using ultraviolet hardening bonding agent.
As ultraviolet hardening bonding agent, as long as being supplied with the state of the shape coating that can be in a liquid state, then can make Various bonding agents used in the manufacture of conventional polarization plates.For ultraviolet hardening bonding agent, from against weather, gather From the viewpoint of conjunction property etc., preferably comprise the compound of cationically polymerizable, such as epoxide, more specifically as Japan Described in JP 2004-245925 publication, such epoxide not having aromatic rings in intramolecular is used as ultraviolet The bonding agent of one of curability composition.
As such epoxide, for example, can enumerate with the diglycidyl ether of bisphenol-A as representative examples right The raw material of aromatic epoxy compound is that aromatic polyhydroxy compounds carry out core hydrogenation and make it glycidyl etherified and obtain To hydrogenated epoxy compound, intramolecular at least have the epoxy radicals being combined with ester ring type ring alicyclic epoxy close Thing, aliphatic epoxy compound with the glycidyl ether of aliphatic polyhydroxy compound as typical example etc..
Ultraviolet hardening bonding agent is except allocating the cationically polymerizable compound with epoxide as typical example into In addition, also allocated into polymerization initiator, in particular for produce because of ultraviolet irradiation cation kind or lewis acid and then Cause the light cationic polymerization initiator of the polymerization of cationically polymerizable compound.And, ultraviolet hardening bonding agent also may be used To allocate into, the various additives such as hot cationic polymerization and the photosensitizer of polymerization are caused by heating.
The formation material of the first adhesive linkage OP36 and the second adhesive linkage OP38 can be identical, or can also be different, but From the viewpoint of productivity ratio, the bonding force of appropriateness can obtained under the premise of this, preferably use identical bonding agent and carry out shape Become the first adhesive linkage OP36 and the second adhesive linkage OP38.
The thickness of the first adhesive linkage OP36 and the second adhesive linkage OP38 for example can be set to average thickness and be more than 0.5 μm And less than 5 μm.
< adhesive layer >
Adhesive layer OP40 is for example used for blooming OP45 fits in the display surface of liquid crystal panel.As formation adhesive layer The binding agent of OP40, for example, can enumerate using acrylic resin, silicone-based resin, polyester, polyurethane, polyethers etc. as substrate The binding agent of resin.Wherein, excellent on optical transparence as the acrylic adhesive of base resin using acrylic resin Different, wettability and the cohesiveness of appropriateness can be kept, and against weather, thermostability etc. are excellent, and under conditions of heating, humidification Do not allow to be also easy to produce and the stripping problem such as float, peel off, therefore preferably use.
The acrylic resin of composition acrylic adhesive preferably uses ester moiety and has methyl, ethyl, butyl or 2- Carbon number as ethylhexyl is alkyl acrylate and (methyl) acrylic acid, (methyl) propylene of less than 20 alkyl The acrylic acid series copolymer of such (methyl) acrylic monomer containing functional group of acid -2- hydroxyl ethyl ester.
Adhesive layer OP40 containing such acrylic acid series copolymer is after fitting in liquid crystal panel because there is certain not Good situation and need peel off when, generation of adhesive deposit etc. can not be produced on the glass substrate and peel off with comparalive ease.Acrylic acid seriess The vitrification point of copolymer is preferably less than 25 DEG C, more preferably less than 0 DEG C.In addition, this acrylic acid series copolymer has generally More than 100000 weight average molecular weight.
The thickness of adhesive layer OP40 for example can be set to average thickness and be more than 1 μm and less than 40 μm.
< first phase difference layer >
First phase difference layer (protecting film) OP31 protects patterning phase separation layer OP35 together with substrate layer OP33.First phase Potential difference layer OP31 is arranged to peel off freely with respect to substrate layer OP33.
First phase difference layer OP31 can use resin bed or the tack forming bonding-fissility on transparent resin film Resin bed and give the phase separation layer of weak cohesive.As transparent resin film, for example, can enumerate poly terephthalic acid second two Alcohol ester, PEN, polyethylene and the extruded film of thermoplastic resin as polypropylene, they are combined Co-extrusion film, they uniaxially or biaxially are extended obtained from film etc..As transparent resin film, preferably use the transparency And the uniaxially or biaxially stretched PTFE film of the excellent and cheap polyethylene terephthalate of homogeneity or polyethylene.
As the resin bed of bonding-fissility, for example can enumerate acrylic adhesive, natural rubber system binding agent, Styrene butadiene copolymers cement, polyisobutylene system binding agent, vinyl Ether system resin binder, silicone-based resin Binding agent etc..In addition, as the resin bed of tack, such as ethylene-vinyl acetate c resin etc. can be enumerated.As viscous The resin bed of conjunction-fissility, preferably uses the excellent acrylic adhesive of the transparency.
The thickness of first phase difference layer OP31 for example can be set to average thickness and be more than 15 μm and less than 75 μm.
< second phase difference layer >
Second phase difference layer (separation membrane) OP41 covers adhesive layer OP40 and protects adhesive layer OP40.Second phase difference layer OP41 is arranged to peel off freely with respect to adhesive layer OP40.As second phase difference layer OP41, it is possible to use with first phase The same transparent resin film of difference layer OP31.
The thickness of second phase difference layer OP41 for example can be set to average thickness and be more than 15 μm and less than 75 μm.
Return Fig. 1, supporting mass B1 has the bearing-surface B1a that the first face OP1a to blooming OP1 is supported.Supporting mass B1 at least a portion in bearing-surface B1a has reflecting surface RS1, and this reflecting surface RS1 makes first face lateral from the second face OP1b Light after OP1a side passes through blooming OP1 reflects.The material of reflecting surface RS1, structure are not particularly limited.Reflecting surface RS1 can lead to Cross the surface to supporting mass B1 to carry out mirror finish and formed it is also possible to pass through the surface configuration metallic reflection in supporting mass B1 The reflecting members such as film, reflection type polarization plate and formed.Furthermore it is possible to be bearing-surface B1a integrally become reflecting surface RS1 it is also possible to It is that a part of region of only bearing-surface B1a becomes reflecting surface RS1.Supporting mass B1 can stably keep blooming OP1.? The shape holding body B1 is not particularly limited, can be using the arbitrary shape such as tabular, column, tubular.The shape of bearing-surface B1a also may be used With using the arbitrary shape such as plane, flexure plane.
Image unit U1 includes light source portion IL1 and image pickup part CM1.Image unit U1 is for example so that pass through a pattern of polarization Arrange and incide the mode of image pickup part CM1 by the light transmission same pattern of polarization row after reflecting surface RS1 reflection, make light source portion IL1 and image pickup part CM1 is close and integratedly keeps them.
Light source portion IL1 irradiates towards the blooming OP1 positioned at reflecting surface RS1 from the second face OP1b side of blooming OP1 Light.As light source portion IL1, it is possible to use the known light source such as LED.Light source portion IL1 for example irradiates white towards blooming OP1 Light, but the light that light source portion IL1 is irradiated is not limited to this.In the present embodiment, can be according to phase separation layer OP11, patterning The phase contrast of phase separation layer OP12 and polarizer layer OP13, wavelength dispersion characteristics etc. and from light source portion IL1 irradiate suitable wavelength Light.
Image pickup part CM1 shoots the anti-of the blooming OP1 being located at reflecting surface RS1 from the second face OP1b side of blooming OP1 Penetrate light image.As image pickup part CM1, it is possible to use the known image unit such as CCD camera.
Pattern detection portion IP1 detects the pattern of polarization row on reflecting surface RS1 based on the reflected light picture of blooming OP1 OP12a, OP12b, extract the marginal positional information of pattern of polarization row OP12a, OP12b.As pattern detection portion IP1, can With using known graphics processing unit.The picture signal of the reflected light picture taken by image pickup part CM1 is by pattern detection portion IP1 Be converted to the view data after numerical data, and be carried out the known image procossing such as color extraction process, binary conversion treatment.
The slow axis RTAX of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b is with respect to polarizer layer OP13 Direction formed by polarization axle PLAX different from each other.Therefore, just through polarizer layer OP13, patterning phase separation layer OP12 and Phase separation layer OP11 and by reflecting surface RS1 reflection so that be again passed through phase separation layer OP11, patterning phase separation layer OP12 and For the brightness of the light after polarizer layer OP13, color, through the brightness of the light after the first pattern of polarization row OP12a, color with Different through the brightness of the light after the second pattern of polarization row OP12b, color.Thus, pattern detection portion IP1 is based on the first polarization figure The brightness of reflected light picture of case row OP12a and the second pattern of polarization row OP12b or the difference of color, to detect the first pattern of polarization Row OP12a and the second pattern of polarization row OP12b.
For example as shown in (a) and (b) in Fig. 4, following phenomenon can be produced:When from light source portion IL1 irradiation white light When, big to the light quantity of the red R of the incident light of image pickup part CM1 through the first pattern of polarization row OP12a, on the other hand, pass through Second pattern of polarization row OP12b and little to the light quantity of the green G of the incident light of image pickup part CM1.Pattern detection portion IP1 is by anti- The view data penetrating light image is implemented the known image procossing such as color extraction process, binary conversion treatment to detect the first pattern of polarization Row OP12a and the second pattern of polarization row OP12b.Can select and use color extraction to process, arbitrary in binary conversion treatment Side is it is also possible in the lump using both.For example, pattern detection portion IP1 is had more by extracting in the view data of reflected light picture The part of the color (in the diagram, such as red R) showing brightly, and two-value is carried out further to the view data extracted Change is processed, thus the first pattern of polarization row OP12a and the second pattern of polarization row OP12b is detected as bright pattern and dark pattern Go out.Have multiple known to color extraction process, the algorithm of binary conversion treatment, be not limited to specific detection method.
Light source portion IL1 can also be (anti-in order to adjust the contrast of the reflected light picture of multiple pattern of polarization row OP12a, OP12b Penetrate the ratio of the brightness of light image) and irradiate the light of the colors such as redness, green.For example, if irradiate the light of red R from light source portion IL1, The reflected light picture being practically free of the second pattern of polarization row OP12b of red R becomes black.Thus, the first pattern of polarization row The ratio (hereinafter referred to as " first of the brightness of reflected light picture of OP12a and the brightness of the reflected light picture of the second pattern of polarization row OP12b The contrast of the reflected light picture that pattern of polarization row are arranged with the second pattern of polarization ") become big, easily detect the first pattern of polarization row OP12a and the second pattern of polarization row OP12b.
Light source portion IL1 can also irradiate the light of green G.But, the color being shown more brightly using irradiation is (in the diagram For example, red R) light source portion IL1 for the reflection improving the first pattern of polarization row OP12a and the second pattern of polarization row OP12b The contrast of light image is advantageously.
As described above, the contrast root of the reflected light picture of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b Different according to the wavelength of the light incident to blooming OP1.The wavelength of the light irradiating from light source portion IL1 can be set as following ripple Long:This wavelength makes the contrast of the reflected light picture of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b white with irradiating The situation of coloured light is compared and is relatively become big.
As previously discussed, in detection means DA1 of present embodiment, through polarizer layer OP13 and patterning phase place Difference layer OP12 after light incide reflecting surface RS1 via phase separation layer OP11, make by reflecting surface RS1 reflect after light again via Phase separation layer OP11 and incide patterning phase separation layer OP12 and polarizer layer OP13.Therefore, shot by image pickup part CM1 Reflected light picture in, the different multiple patterns row of color, brightness and the first pattern of polarization row OP12a and the second pattern of polarization row OP12b accordingly shows.Thus, if the figure such as color extraction process, binary conversion treatment is implemented to the view data of this reflected light picture As processing, then can accurately detect the first pattern of polarization row OP12a and the second pattern of polarization row OP12b.
For example, it is not provided with the case of patterning between phase separation layer OP12 and reflecting surface RS1 in phase separation layer OP11, The reflected light picture being shot by image pickup part CM1 becomes the image of whole dark complexion.Thus it is impossible to detection the first pattern of polarization row OP12a and Second pattern of polarization row OP12b.By by phase separation layer OP11 be arranged at patterning phase separation layer OP12 and reflecting surface RS1 it Between, thus produce the light spilling from polarizer layer OP13, should the color of light, for brightness, be also through the first pattern of polarization The color of light after row OP12a, brightness are different with the color through the light after the second pattern of polarization row OP12b, brightness.
, compared with patterning phase separation layer OP12, polarizer layer OP13 etc., its phase contrast is not abundant for phase separation layer OP11 Ground controls, and how can produce unfavorable condition therefore in optical detecting.Accordingly, it would be desirable to spend time in advance will before optical detecting Phase separation layer stripping etc., but the phase contrast of phase separation layer OP11 in the present embodiment, is positively utilized, thus not peeling off phase place Difference layer OP11 ground detection pattern of polarization row OP12a, OP12b.Pattern of polarization can be detected thereby, it is possible to provide in high precision and efficiently The detection means of row OP12a, OP12b and detection method.
[second embodiment]
Fig. 2 is the brief figure of detection means DA2 of second embodiment of the present invention.
Detection means DA2 of present embodiment includes supporting mass B2, image unit U2, pattern detection portion IP2 and adjustment Portion PLR.Detection means DA2 detects to pattern of polarization row OP23a, the OP23b contained by blooming OP2.
Blooming OP2 at least includes phase separation layer OP21, polarizer layer OP22 and patterning phase separation layer OP23.From light Learn the first face (face of the side being supported by supporting mass B2) the OP2a side of film OP2 towards the second face (with supported by supporting mass B2 The face of side opposition side) OP2b side set gradually phase separation layer OP21, polarizer layer OP22 and patterning phase separation layer OP23. The part in addition to phase separation layer OP21 in blooming OP2 is blooming main part OPC2.
Patterning phase separation layer OP23 include slow axis RTAX direction multiple pattern of polarization row OP23a different from each other, OP23b.Patterning phase separation layer OP23 for example include slow axis RTAX orthogonal the first pattern of polarization row OP23a in direction and Second pattern of polarization row OP23b.Observe from the normal direction of blooming OP2, the slow axis RTAX example of the first pattern of polarization row OP23a As polarization axle (axis of homology) the PLAX1 deasil shape angle at 45 ° with respect to polarizer layer OP22.From blooming OP2's Normal direction is observed, the slow axis RTAX of the second pattern of polarization row OP23b polarization axle PLAX1 for example with respect to polarizer layer OP22 Widdershins shape angle at 45 °.First pattern of polarization row OP23a and the second pattern of polarization row OP23b with its length direction It is alternately arranged on orthogonal direction.
Phase separation layer OP21 is arranged in the way of can peeling off as the protecting film (separation membrane) of blooming main part OPC2 In blooming main part OPC2.Protecting film generally extends to manufacture by twin shaft, has birefringence.Protecting film and patterning phase Potential difference layer OP23, polarizer layer OP22 etc. compare phase contrast and are not adequately controlled.Therefore, protecting film is to through patterning phase place The phase contrast that light imparting after difference layer OP23 is not intended to.Such phase contrast can reduce the precision of optical detecting, therefore should arrange Except such phase contrast, but in the present embodiment, be positively utilized such phase contrast come to carry out pattern of polarization row OP23a, The detection of OP23b.Described later with regard to this point.
Blooming OP2 can be included beyond phase separation layer OP21, polarizer layer OP22 and patterning phase separation layer OP23 Layer.In the present embodiment, for example the blooming OP3 shown in Fig. 3 can be used as blooming OP2.In this case, second Phase separation layer OP41 is corresponding with the phase separation layer OP21 of Fig. 2, and polarizer layer OP37 is corresponding with the polarizer layer OP22 of Fig. 2, pattern Phase separation layer OP35 is corresponding with the patterning phase separation layer OP23 of Fig. 2 for change, the blooming main body of blooming main part OP42 and Fig. 2 Portion OPC2 corresponds to.
Supporting mass B2 has the bearing-surface B2a that the first face OP2a to blooming OP2 is supported.Supporting mass B1 is in supporting At least a portion in the B2a of face has reflecting surface RS2, and this reflecting surface RS2 makes saturating from the lateral first face OP2a side of the second face OP2b Cross the reflection of the light after blooming OP2.The material of reflecting surface RS2, structure are not particularly limited.Reflecting surface RS2 can be by supporting The surface of body B2 carries out mirror finish and is formed, and electricity can be by the surface configuration metallic reflective coating, reflective in supporting mass B2 The reflecting members such as polarization plates and formed.Furthermore it is possible to be that bearing-surface B2a integrally becomes reflecting surface RS2 or only bearing-surface A part of region of B2a becomes reflecting surface RS2.
Supporting mass B2 can stably keep blooming OP2.The shape of supporting mass B2 is not particularly limited, and can adopt The arbitrary shapes such as tabular, column, tubular.The shape of bearing-surface B2a can also adopt the arbitrary shape such as plane, flexure plane.
Image unit U2 includes light source portion IL2, image pickup part CM2 and polarization plates PLF.Image unit U2 is for example so that pass through One pattern of polarization arranges and incides image pickup part CM2's by the light transmission same pattern of polarization row after reflecting surface RS2 reflection Mode, makes light source portion IL2 and image pickup part CM2 close and integratedly keeps them.
Light source portion IL2 irradiates towards the blooming OP2 positioned at reflecting surface RS2 from the second face OP2b side of blooming OP2 Light.Polarization plates PLF are arranged at the light path of the light from light source portion IL2 towards blooming OP2.The light irradiating from light source portion IL2 is saturating Cross polarization plates PLF and be converted into rectilinearly polarized light.As light source portion IL2, it is possible to use the known light source such as LED.Light source portion IL2 for example irradiates white light towards blooming OP2, but the light that light source portion IL2 is irradiated is not limited to this.In present embodiment In, can according to phase separation layer OP21, polarizer layer OP22, patterning phase separation layer OP23 and polarization plates PLF phase contrast, Wavelength dispersion characteristics etc. to irradiate the light of suitable wavelength from light source portion IL2.
Image pickup part CM2 shoots the anti-of the blooming OP2 being located at reflecting surface RS2 from the second face OP2b side of blooming OP2 Penetrate light image.As image pickup part CM2, it is possible to use the known image unit such as CCD camera.
Pattern detection portion IP2 detects the pattern of polarization row on reflecting surface RS2 based on the reflected light picture of blooming OP2 OP23a, OP23b, extract the marginal positional information of pattern of polarization row OP23a, OP23b.As pattern detection portion IP2, can With using known graphics processing unit.The picture signal of the reflected light picture captured by image pickup part CM2 is turned by pattern detection portion IP2 It is changed to the view data after numerical data, and be carried out the known image procossing such as color extraction process, binary conversion treatment.
The slow axis RTAX of the first pattern of polarization row OP23a and the second pattern of polarization row OP23b is inclined with respect to polarization plates PLF The direction formed by axle (axis of homology) PLAX2 that shakes is different from each other.Therefore, just through polarization plates PLF, patterning phase separation layer OP23, Polarizer layer OP22 and phase separation layer OP21 simultaneously by reflecting surface RS2 reflection and then is again passed through phase separation layer OP21, polaroid For the brightness of light after layer OP22 and patterning phase separation layer OP23, color, after the first pattern of polarization row OP23a The brightness of light, color are different from the brightness through the light after the second pattern of polarization row OP23b, color.Thus, pattern detection portion The brightness of reflected light picture based on the first pattern of polarization row OP23a and the second pattern of polarization row OP23b for the IP2 or the difference of color, To detect the first pattern of polarization row OP23a and the second pattern of polarization row OP23b.
Pattern detection portion IP2 is by implementing the public affairs such as color extraction process, binary conversion treatment to the view data of reflected light picture The image procossing known is detecting the first pattern of polarization row OP23a and the second pattern of polarization row OP23b.Can select and use face Either one in color extraction process, binary conversion treatment is it is also possible in the lump using both.For example, pattern detection portion IP2 passes through anti- Penetrate in the view data of light image and extract the part with the color showing more brightly, and further to the view data extracted Carry out binary conversion treatment, thus using the first pattern of polarization row OP23a and the second pattern of polarization row OP23b as bright pattern and dark figure Case and detect.Have multiple known to color extraction process as described above, the algorithm of binary conversion treatment, be not limited to specifically examine Survey method.
Light source portion IL2 can also be (anti-in order to adjust the contrast of the reflected light picture of multiple pattern of polarization row OP23a, OP23b Penetrate the ratio of the brightness of light image) and irradiate the light of the colors such as redness, green.First pattern of polarization row OP23a and the second pattern of polarization The contrast of the reflected light picture of row OP23b is different according to the wavelength of the light incident to blooming OP2.Irradiate from light source portion IL2 The wavelength of light can be set as following wavelength:This wavelength makes the first pattern of polarization row OP23a and the second pattern of polarization row OP23b The contrast of reflected light picture relatively become big compared with the situation irradiating white light.
Adjustment portion PLR adjusts the polarization axle PLAX2 of the polarization plates PLF and slow axis RTAX of pattern of polarization row OP23a, OP23b Relative angle.By the slow of the first pattern of polarization row OP23a and the second pattern of polarization row OP23b is adjusted by adjustment portion PLR Axle RTAX with respect to the polarization axle PLAX2 angulation of polarization plates PLF, thus, it is possible to increase the first pattern of polarization row OP23a Asymmetry (difference such as color, brightness) with the reflected light picture of the second pattern of polarization row OP23b.Thus, pattern detection portion IP2 Pattern of polarization row OP23a, OP23b on reflecting surface RS2 can accurately be detected.
It should be noted that the polarization axle PLAX2 of above-mentioned polarization plates PLF and pattern of polarization row OP23a, OP23b's is slow The adjustment of the relative angle of axle RTAX for example can be carried out by adjustment portion PLR as follows:Polarization plates PLF are being attached at energy After the fixture of enough rotations, operator confirms the reflected light picture of blooming OP2, while making to be attached at the fixture that can rotate Polarization plates PLF rotate together with fixture.In such a case it is possible to adopt following steps:Operator is while confirm blooming The reflected light picture of OP2, while making fixture rotate, is being judged as the first pattern of polarization row OP23a and the second pattern of polarization row OP23b Asymmetry become maximum position and so that the rotation of fixture is stopped.On the other hand, the adjustment of above-mentioned relative angle can also By adjustment portion PLR to make fixture automatically carry out by way of rotating using motor omitting diagram etc..In addition, above-mentioned is relative The adjustment of angle can be implemented by each operation but it is also possible to be in blank volume (reference R1 in reference to Figure 10) more Confirm the reflected light picture of blooming OP2 when changing, do not carry out relative angle in the case that the asymmetry of this reflected light picture is big Adjustment, and only little and be adjusted when pattern identification is bad in asymmetry.
As described above, the phase place of phase separation layer OP21 in detection means DA2 of present embodiment, is also positively utilized Difference, thus do not detect pattern of polarization row OP23a, OP23b with not peeling off phase separation layer OP21.Therefore, it is possible to provide can high accuracy and The efficiently detection means of detection pattern of polarization row OP23a, OP23b and detection method.In addition, in the present embodiment, energy Enough increase the non-right of the first pattern of polarization row OP23a and the reflected light picture of the second pattern of polarization row OP23b by adjustment portion PLR Title property.Thus, the accuracy of detection of pattern of polarization row OP23a, OP23b improves.
[the 3rd embodiment]
Fig. 5 is the brief figure of detection means DA3 of third embodiment of the present invention.
Fig. 6 is the figure illustrating to the method that liquid crystal panel P is adjusted with the relative bonding position of blooming F1.
Fig. 7 A and Fig. 7 B is the figure that the bonding process to liquid crystal panel P laminating blooming F1 is described.
As shown in figure 5, detection means DA3 of present embodiment include supporting mass (laminating cylinder) 32, image unit 35 with And pattern detection portion IP3.Detection means DA3 is to pattern of polarization row APAa, APAb, the DPAa, DPAb (reference contained by blooming F1 Fig. 6) detected.
As shown in Fig. 5 to Fig. 7 A, Fig. 7 B, detection means DA3 of present embodiment constitute based on pattern of polarization row APAa, Position (the marginal position of such as pattern of polarization row APAa, APAb, DPAa, DPAb of APAb, DPAa, DPAb (with reference to Fig. 6) Put) blooming F1 is alignedly fitted in liquid crystal panel P laminating apparatus 13 a part.Laminating apparatus 13 are except including inspection Survey beyond device DA3, also include control device 25, driving means 42, laminating workbench 41 and image unit 36 etc..Supporting mass 32 is the laminating component of the cylinder shape that the blooming F1 of the holding face of being held in 32a fits to liquid crystal panel P.Thus, below will " supporting mass " is denoted as " laminating cylinder " and illustrates.
Blooming F1 is same with the blooming OP1 shown in Fig. 1, from the first face (face of the side being supported by laminating cylinder 32) Side at least includes phase separation layer, patterning successively towards the second face (face with the side opposition side being supported by cylinder 32 of fitting) side Phase separation layer and polarizer layer.In the present embodiment, for example the blooming OP45 shown in Fig. 3 can be used as blooming F1.Pattern of polarization row APAa and pattern of polarization row DPAa is corresponding with the first pattern of polarization row OP35a of Fig. 3, and pattern of polarization arranges APAb and pattern of polarization row DPAb is corresponding with the second pattern of polarization row OP35b of Fig. 3.
As shown in figure 5, blooming F1 is including effective coverage AC, the Yi Jiyu opposed with the viewing area of liquid crystal panel P Film positioned at the single sheet of the opposed neighboring area SR in the neighboring area of the periphery of the viewing area of liquid crystal panel P.
As shown in figs.5 and 6, in effective coverage AC, it is correspondingly provided with slow axis with multiple pixel columns of liquid crystal panel P Direction multiple pattern of polarization row DPAa, DPAb different from each other.Alternately configure display in the viewing area of liquid crystal panel P right The right eye pixel column of ophthalmically acceptable image and the left eye pixel column of display left eye image.Therefore, in the AC of effective coverage alternately Ground configuration is used with pixel column corresponding right eye pattern of polarization row DPAa and left eye corresponding with left eye pixel column with right eye Pattern of polarization row DPAb.
Neighboring area SR alternately configure slow axis direction parallel with right eye pattern of polarization row DPAa first polarization The direction of pattern row APAa and slow axis and left eye the second parallel pattern of polarization row APAb of pattern of polarization row DPAb.Setting Can individually or with the pattern of polarization being arranged at effective coverage AC arrange in pattern of polarization row APAa, APAb of neighboring area SR DPAa, DPAb are together with acting on the alignment fiducials making blooming F1 be aligned with liquid crystal panel P.In order that pattern of polarization row The detection of APAa, APAb easily, for example, can make at least in pattern of polarization row APAa, the APAb be arranged at neighboring area SR The width ratio of individual pattern of polarization row is arranged at the width width of pattern of polarization row DPAa, DPAb of effective coverage AC.
As shown in figure 5, laminating cylinder 32 has the holding face 32a of the cylindrical shape parallel with the width of blooming F1. Holding face 32a is the bearing-surface that the first face to blooming F1 (lower surface of the first phase difference layer OP31 of Fig. 3) is supported. Holding face 32a for example has the weak adherence force of binding face (surface of the adhesive layer OP40 of Fig. 3) than blooming F1, can be to light The surface protection film (the first phase difference layer OP31 of Fig. 3) learning film F1 is repeated stickup, peels off.Laminating cylinder 32 for example passes through To make in the outer peripheral face winding bonding sheet of metal cylinder.The surface of this bonding sheet becomes holding face 32a.Holding face 32a Width central part be keep blooming F1 holding area FA.
Multiple positions in holding face 32a for the laminating cylinder 32 have to be made to pass through blooming from the second surface side to the first surface side The reflecting surface 39 of the light reflection after F1.Reflecting surface 39 for example passes through in the surface configuration metallic reflective coating, reflective keeping face 32a The reflecting members such as polarization plates and formed.
Reflecting surface 39 is arranged at the part in the pattern of polarization row keeping being configured as alignment fiducials in the 32a of face.It is configured with The position of reflecting surface 39 becomes the detection zone that can detect pattern of polarization row.Can will be multiple in the holding face of being arranged at 32a The pattern of polarization that one or more detection zones in detection zone detect arranges as alignment fiducials.In the present embodiment, example As multiple reflectings surface 39 of same shape are respectively arranged at along the direction of rotation of laminating cylinder 32 with the interval being equal to each other The central part of holding area FA and both ends.The central part setting of holding area FA reflecting surface 39 and blooming F1 effective The central part of region AC is opposed.In the reflecting surface 39 of the end of holding area FA setting and the effective coverage AC of blooming F1 and week The demarcation line of border area domain SR is opposed.
Driving means 42 while so that laminating cylinder 32 is rotated around rotary shaft RA, make laminating cylinder 32 along with rotary shaft The orthogonal horizontal direction of RA and vertical move.Driving means 42 are electrically connected with control device 25, by control device 25 Control the driving of driving means 42.
Image unit 35 includes light source portion 35a and image pickup part 35b.Image unit 35 is for example so that pass through a pattern of polarization Row and the light transmission same pattern of polarization row after being reflected by reflecting surface 39 and incide the mode of image pickup part 35b, make light source portion 35a and image pickup part 35b is close and integratedly keeps them.In Figure 5, for the sake of aspect, illustrate only a shooting single Unit 35, but image unit 35 for example can with the set location of reflecting surface 39 accordingly cylinder 32 of fitting width (with The parallel direction of rotary shaft RA) upper setting is multiple.Alternatively, it is also possible to arrange the width side making image unit 35 in laminating cylinder 32 The travel mechanism moving up, is detected the pattern of polarization row of multiple detection zones by an image unit 35.
Light source portion 35a is from second surface side of blooming F1 towards the blooming F1 irradiation light positioned at reflecting surface 39.As Light source portion 35a, it is possible to use the known light source such as LED.Light source portion 35a for example irradiates white light towards blooming F1, but light source The light that portion 35a is irradiated is not limited to this.For example, it is possible to phase separation layer according to contained by blooming F1, patterning phase separation layer And the phase contrast of polarizer layer, wavelength dispersion characteristics etc. and irradiate the light of suitable wavelength from light source portion 35a.
Image pickup part 35b shoots the reflected light picture of the blooming F1 being located at reflecting surface 39 from second surface side of blooming F1. As image pickup part 35b, it is possible to use the known image unit such as CCD camera.
Pattern detection portion IP3 detects the pattern of polarization row on reflecting surface 39 based on the reflected light picture of blooming F1 APAa, APAb, DPAa, DPAb (with reference to Fig. 6), extract the marginal position of pattern of polarization row APAa, APAb, DPAa, DPAb Information.As pattern detection portion IP3, it is possible to use known graphics processing unit.Reflected light picture taken by image pickup part 35b Picture signal the view data after numerical data is converted to by pattern detection portion IP3, and be carried out color extraction process, two The known image procossing such as value process.As it was previously stated, the reflected light of the different two pattern of polarization row in the direction of slow axis as Color, brightness are different from each other.Therefore, by the image procossing such as color extraction process, binary conversion treatment, energy are implemented to view data Enough accurately detection pattern of polarization row.
Light source portion 35a can also in order to adjust the reflected light of multiple pattern of polarization row APAa, APAb, DPAa, DPAb as Contrast (ratio of the brightness of reflected light picture) and irradiate the light of the colors such as redness, green.Multiple pattern of polarization row APAa, APAb, The contrast of the reflected light picture of DPAa, DPAb is different according to the wavelength of the light incident to blooming F1.Irradiate from light source portion 35a The wavelength of light can be set as following wavelength:This wavelength makes that multiple pattern of polarization row APAa, APAb, DPAa, DPAb's is anti- The contrast penetrating light image relatively becomes big compared with the situation irradiating white light.
Control device 25 obtains pattern of polarization row APAa, APAb, DPAa, DPAb (reference that pattern detection portion IP3 is extracted Marginal positional information Fig. 6).Control device 25 is marginal based on pattern of polarization row APAa, APAb, DPAa, DPAb's Positional information come to confirm blooming F1 with respect to laminating cylinder 32 allocation position.Control device 25 is based on pattern of polarization and arranges The marginal positional information of APAa, APAb, DPAa, DPAb, makes laminating workbench 41 (reference by driving means (not shown) Fig. 6) respectively along with the orthogonal direction of rotary shaft RA of laminating cylinder 32 and parallel with rotary shaft RA of cylinder 32 of fitting Direction is moved, and so that laminating workbench 41 is rotated in the horizontal plane by rotary apparatuss (not shown).Thus, in order to being held in patch The liquid crystal panel P closing workbench 41 is adjusted with the relative bonding position of the blooming F1 being held in laminating cylinder 32 and carries out Be aligned.
Control device 25 is configured to including computer system.Computer system includes the arithmetic processing section such as CPU and storage The storage parts such as device, hard disk.The function of pattern detection portion IP3 is realized by arithmetic processing section.Control device 25 includes holding The interface of the communication of external device (ED) of row and computer system, Comprehensive Control detection means DA3, driving means 42 and laminating work The action of the external device (ED)s such as station 41 (with reference to Fig. 6).
Hereinafter, the method for adjustment of liquid crystal panel P and the relative bonding position of blooming F1 is described using Fig. 6.In Fig. 6 In, right section of figure is the explanatory diagram of the allocation position of blooming F1 being pasted on laminating cylinder 32, and left section of figure is to maintain in patch Close the explanatory diagram of the allocation position of liquid crystal panel P of workbench 41, the figure of hypomere is the explanation of the adjustment amount of laminating workbench 41 Figure.In figure 6, for convenience's sake, eliminate the diagram of reflecting surface 39.
As shown in right section of Fig. 6, shot the corner pasting the blooming F1 being held in holding face 32a by image unit 35. On blooming F1, it is being disposed with multiple polarization figures with the rotary shaft along laminating cylinder 32 parallel direction Case row APAa, APAb, DPAa, DPAb.Image unit 35 with laminating cylinder 32 rotation and to along its its direction of rotation Two corners on one side of blooming F1 are shot.
The reflected light in the corner based on the blooming F1 being photographed by image unit 35 for the pattern detection portion IP3 shown in Fig. 5 As detecting pattern of polarization row APAa, APAb, DPAa, the DPAb positioned at the corner of blooming F1, extract pattern of polarization row APAa, The marginal positional information of APAb, DPAa, DPAb.In addition, pattern detection portion IP3 is by the polarization in the corner positioned at blooming F1 Specific two pattern of polarization in pattern row APAa, APAb, DPAa, DPA arrange (for example nearest away from effective coverage neighboring area Two pattern of polarization row APAa, APAb) the position EGP in corner as blooming F1 for the position of marginal end and examine Measure.The position EGP in the corner of the blooming F1 being detected by pattern detection portion IP3 becomes and for blooming F1 to fit in liquid crystal surface The alignment fiducials of blooming F1 during plate P.
In the following description, will roll along laminating between two corners of the blooming F1 being shot by image unit 35 The distance of the circumference of cylinder 32 is referred to as between camera apart from Lc.Apart from Lc and above-mentioned blooming F1 along direction of rotation between camera The length on one side is roughly equal.
For example, blooming F1 along with laminating cylinder 32 rotation and between mobile camera apart from Lc when, blooming F1's The position of corner EGP moves to terminal Ep2 from starting point Ep1.The starting point being detected by image unit 35 and pattern detection portion IP3 The positional information of Ep1 and terminal Ep2 is transported to control device 25.Control device 25, as shown in the hypomere of Fig. 6, is based on The distance between starting point Ep1 on Lc and the direction parallel with the rotary shaft of laminating cylinder 32 and terminal Ep2 between camera Le (hereinafter referred to as start point/end point deviation Le.) calculating angle correction α (tan α=Le/Lc).
As shown in left section of Fig. 6, by image unit 36 (reference picture 7A and Fig. 7 B) described later to being held in laminating work The corner of the liquid crystal panel P of platform 41 is shot.For example, has labelling Pm (for example in this enforcement in each corner of liquid crystal panel P It is three labellings Pm1, Pm2, Pm3 in mode).The the first labelling Pm1, the second labelling Pm2 that are detected by image unit 36 and The positional information of the 3rd labelling Pm3 is transported to control device 25.The detection information based on image unit 36 for the control device 25 Lai Control the driving of laminating workbench 41, carry out being held in the be aligned of the liquid crystal panel P of laminating workbench 41.Control device 25 is based on Angle correction α carrys out the rotary apparatuss that drive control omits diagram, makes laminating workbench 41 anglec of rotation α in the horizontal plane.Thus, Carry out the be aligned that liquid crystal panel P is with respect to laminating cylinder 32.
Hereinafter, illustrate that the blooming F1 being carried out by cylinder 32 of fitting is pasted to liquid crystal panel P using Fig. 7 A and Fig. 7 B The bonding process closing.
As shown in Figure 7 A, control device 25 makes laminating cylinder 32 move to the assigned position of the top of laminating workbench 41. The positional information based on the corner EGP of blooming F1 for the control device 25 and the first labelling Pm1, the second labelling Pm2 of liquid crystal panel P And the 3rd labelling Pm3 positional information, to carry out fit cylinder 32 and being aligned of workbench 41 of fitting, so that blooming F1 Right eye pattern of polarization row DPAa and left eye pattern of polarization row DPAb be arranged at the right eye pixel of liquid crystal panel P with And left eye pixel is overlapping under vertical view.
Control device 25 makes laminating cylinder 32 decline in laminating and becomes the optics of the holding face of being pasted on 32a from top The leading section of film F1 is pressed into the state of the end of liquid crystal panel P.
Laminating cylinder 32 declines to become the state that blooming F1 is pressed into liquid crystal panel P.Now, laminating cylinder 32 leads to Cross and the blooming F1 of the holding face of being held in 32a is pressed on liquid crystal panel P and rotates, thus blooming F1 is fitted in liquid crystal Panel P.
As shown in Figure 7 B, control device 25 make in laminating laminating workbench 41 with the rotation of laminating cylinder 32 with Relative movement on the direction of rotating shaft direct cross of laminating cylinder 32.In the present embodiment, laminating cylinder 32 rotate counterclockwise, patch Close workbench 41 to move to paper right.It should be noted that following structure can also be set to:Move not making laminating workbench 41 While moving and so that laminating cylinder 32 is rotated, laminating cylinder 32 is made to move to paper left.
For example, the shift action of the rotation driving of laminating cylinder 32 and the liquid crystal panel P being carried out by laminating workbench 41 is same Step is carried out.Thereby, it is possible to suppress to produce friction between blooming F1 and liquid crystal panel P.Thereby, it is possible to while suppressing blooming F1 offsets while blooming F1 is fitted in liquid crystal panel P with respect to liquid crystal panel P.
Laminating cylinder 32 for example has the weak stickup of binding face (surface of the adhesive layer OP40 of Fig. 3) than blooming F1 Power, can be repeated stickup, peel off to the surface protection film (the first phase difference layer OP31 of Fig. 3) of blooming F1, therefore paste The blooming F1 that conjunction surface side is pressed against on liquid crystal panel P peels off from holding face 32a and fits to liquid crystal panel P side.
Although omit diagram, liquid crystal panel P be fitted with the face of the face opposition side of the blooming F1 that fits polarization plates, Brightness improves the bloomings such as film.Thereby, it is possible to provide the optical display device that can carry out stereo display.
As previously discussed, in detection means DA3 of present embodiment, also in the same manner as first embodiment, Neng Gougao Precision and efficiently detection pattern of polarization row APAa, APAb, DPAa, DPAb.The laminating apparatus 13 of present embodiment are based on by examining Survey the marginal positional information of pattern of polarization row APAa, APAb, DPAa, DPAb that device DA3 extracts, to carry out blooming F1 With being aligned of liquid crystal panel P, therefore, it is possible to improve the Anawgy accuracy of blooming F1 and liquid crystal panel P.Thus, it is possible to provide display The optical display device of excellent quality.
[the 4th embodiment]
Fig. 8 is the brief figure of detection means DA4 of the 4th embodiment.
Fig. 9 is the top view of the brief configuration representing blooming F2.
Figure 10 is the brief figure of cutting processing unit (plant) 50.
Detection means DA4 of present embodiment includes supporting mass 61, image unit 62, pattern detection portion IP4 and adjustment Portion 63.Detection means DA4 detects pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Fig. 9) contained by blooming F2.
As shown in Fig. 8 to Figure 10, detection means DA3 of present embodiment is along cutting line SL1, SL2, SL3 to blooming F2 carries out cutting processing, constitutes a part for cutting processing unit (plant) 50.Cutting processing unit (plant) 50 is except including detection means (first Detection means) beyond DA4, also include film supply unit 51, film reeling end 52,53, slitter edge reeling end 54, first crawl control unit 55th, second crawl control unit 56, second detection device 57, cutting portion 58 and control device 70 etc..
Blooming F2 is same with the blooming OP2 shown in Fig. 2, from the first face (face of the side being supported by supporting mass 61) side Towards the second face (face with the side opposition side being supported by supporting mass 61) side at least include successively phase separation layer, polarizer layer with And patterning phase separation layer.In the present embodiment, for example the blooming OP3 shown in Fig. 3 can be used as blooming F2.
As shown in figure 9, blooming F2 is alternately to include effect region AC on width orthogonal to the longitudinal direction Film with the strip of neighboring area SR.Effective coverage AC is, for example, opposed with the viewing area of the liquid crystal panel P shown in Fig. 6 Part, neighboring area SR is the part opposed with the neighboring area of the periphery of the viewing area positioned at liquid crystal panel P.
Blooming F2 has and multiple (such as two in fig .9) corresponding width of liquid crystal panel.Using cutting described later Blooming F2 is cut off by processing unit (plant) 50 (with reference to Figure 10) along cutting line SL1, SL2, SL3.Cutting line SL1, SL2, SL3 are set It is scheduled in the SR of neighboring area.Thus, blooming F2 is divided into multiple strips with width corresponding with liquid crystal panel Shape film.Strip film obtained from segmentation is cut into the size of liquid crystal panel P, using the laminating shown in Fig. 7 A and Fig. 7 B This strip film is fitted in liquid crystal panel P by device 13.
The structure of the effective coverage AC of blooming F2 and neighboring area SR and knot illustrated in the third embodiment Structure is identical.Thus, here omits detail explanation.Cutting line SL1, SL2, SL3 are for example set in and set in neighboring area SR The marginal position of pattern of polarization row APAa, APAb of putting.
As shown in figure 8, supporting mass 61 has the columned bearing-surface 61a parallel with the width of blooming F2.? Holding body 61 is, for example, to constitute one of multiple conveying rollers of transport path FCL (with reference to Figure 10) of blooming F2.Supporting mass 61 While the first face (upper surface of the second phase difference layer 41 of Fig. 3) of supporting optical film F2, defeated along with blooming F2 Send and rotate.Supporting mass 61 e.g. implements the metal roller of mirror finish, and bearing-surface 61a integrally becomes reflecting surface.
Image unit 62 includes light source portion 62a, image pickup part 62b and polarization plates 62c.Image unit 62 is for example so that pass through One pattern of polarization arranges and incides shooting by the light transmission same pattern of polarization row after reflecting surface (bearing-surface 61a) reflection The mode of portion 62b, makes light source portion 62a and image pickup part 62b close and integratedly keeps them.
Light source portion 62a is located at from the second face (lower surface of the first phase difference layer OP31 of Fig. 3) the side direction of blooming F2 Blooming F2 irradiation light on reflecting surface.Polarization plates 62c are arranged at the light path of the light from light source portion 62a towards blooming F2. Be converted to rectilinearly polarized light from light transmission polarization plates 62c of light source portion 62a irradiation.As light source portion 62a, it is possible to use LED Deng known to light source.Light source portion 62a for example irradiates white light towards blooming F2, but the light that light source portion 62a is irradiated does not limit In this.For example, it is possible to phase separation layer according to contained by blooming F2, patterning phase separation layer and polarizer layer, polarization plates 62c Phase contrast, wavelength dispersion characteristics etc. and irradiate the light of suitable wavelength from light source portion 62a.
Image pickup part 62b shoots the reflected light picture of the blooming F2 being located at reflecting surface from second surface side of blooming F2.Make For image pickup part 62b, it is possible to use the known image unit such as CCD camera.
Pattern detection portion IP4 detects the pattern of polarization row on reflecting surface based on the reflected light picture of blooming F2 APAa, APAb, DPAa, DPAb, extract the marginal position of pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Fig. 9) Information.As pattern detection portion IP4, it is possible to use known graphics processing unit.Reflected light captured by image pickup part 62b as Picture signal is converted to the view data after numerical data by pattern detection portion IP4, and is carried out color extraction process, two-value The known image procossing such as change process.As it was previously stated, the face of the different reflected light picture of two pattern of polarization row in the direction of slow axis Color, brightness are different from each other.Therefore, by the image procossing such as color extraction process, binary conversion treatment are implemented to view data, thus Can accurately detect that pattern of polarization arranges.
Light source portion 62a can also in order to adjust the reflected light of multiple pattern of polarization row APAa, APAb, DPAa, DPAb as Contrast (ratio of the brightness of reflected light picture) and irradiate the light of the colors such as redness, green.Multiple pattern of polarization row APAa, APAb, The contrast of the reflected light picture of DPAa, DPAb is different according to the wavelength of the light incident to blooming F2.Irradiate from light source portion 62a The wavelength of light can be set as following wavelength:This wavelength makes that multiple pattern of polarization row APAa, APAb, DPAa, DPAb's is anti- The contrast penetrating light image relatively becomes big compared with the situation irradiating white light.
Adjustment portion 63 adjusts polarization axle and pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Fig. 9) of polarization plates 62c Slow axis relative angle.By adjusted by adjustment portion 63 slow axis of pattern of polarization row APAa, APAb, DPAa, DPAb with respect to The polarization axle angulation of polarization plates 62c, can increase pattern of polarization row APAa, DPAa and pattern of polarization row APAb, DPAb Reflected light picture asymmetry (difference such as color, brightness).Thus, pattern detection portion IP4 can accurately detect and be located at Pattern of polarization row APAa, APAb, DPAa, DPAb on reflecting surface.
Control device 70 obtains dividing of pattern of polarization row APAa, APAb, DPAa, DPAb that pattern detection portion IP4 is extracted The positional information in boundary line.The marginal positional information based on pattern of polarization row APAa, APAb, DPAa, DPAb for the control device 70 To confirm the allocation position that blooming F2 is with respect to supporting mass 61.Control device 70 be based on pattern of polarization row APAa, APAb, The marginal positional information of DPAa, DPAb come to detect reality blooming F2 advanced positions with respect to traveling set in advance Which kind of degree position offset by.
Control device 70 passes through first control unit 55 that crawls shown in Figure 10 makes film supply unit 51 along with blooming F2's The orthogonal width of conveying direction moves, to reduce the skew of the advanced positions of blooming F2.
Control device 70 composition includes computer system.Computer system includes the arithmetic processing section such as CPU and storage The storage parts such as device, hard disk.The function of pattern detection portion IP4 is realized by arithmetic processing section.Control device 70 includes holding The interface of the communication of external device (ED) of row and computer system, Comprehensive Control first detection means DA4, film supply unit 51, film roll Take portion 52,53, slitter edge reeling end 54, first crawl control unit 55, second crawl control unit 56, second detection device 57 and cut The action of disconnected portion 58 grade external device (ED).
Hereinafter, illustrate using Figure 10 to cut the structure of processing unit (plant) 50.
Film supply unit 51 keeps the blank volume R1 batching blooming F2, and by blooming F2 along its length direction Release.On the transport path FCL from the blooming F2 that film supply unit 51 is released, it is configured with successively from conveying direction upstream side First crawl control unit 55, the first detection means DA4, second crawl control unit 56, second detection device 57 and cutting portion 58.
Advanced positions after the firm releasing of the blooming F2 that film supply unit 51 is released are examined using the first detection means DA4 Survey.First detection means DA4 detection is arranged at multiple pattern of polarization row APAa, APAb, DPAa, DPAb (references of blooming F2 Fig. 9).Control device 70 is based on multiple pattern of polarization row APAa, APAb, DPAa, the DPAb being detected by the first detection means DA4 Position (the marginal position of such as pattern of polarization row APAa, APAb, DPAa, DPAb), to detect the traveling of blooming F2 The skew of position, controls first to crawl control unit 55 and control crawling of blooming F2.
By first crawl control unit 55 control the blooming F2 after crawling advanced positions use second detection device 57 To be detected.Second detection device 57 detection be arranged at multiple pattern of polarization row APAa of blooming F2, APAb, DPAa, DPAb (with reference to Fig. 9).Control device 70 based on the multiple pattern of polarization row APAa being detected by second detection device 57, APAb, The position (the marginal position of such as pattern of polarization row APAa, APAb, DPAa, DPAb) of DPAa, DPAb, to detect blooming The skew of the advanced positions of F2, controls second to crawl control unit 56 and control crawling of blooming F2.
First crawls control unit 55 for example based on the blooming being detected by the first detection means DA4 and control device 70 The skew of the advanced positions of F2, to make to release the position (position of R1 rolled up by blank) of blooming F2 along optics by film supply unit 51 The width of film F2 moves.Crawl control unit 55 by first, can roughly control blooming F2 advanced positions inclined Move.
Second detection device 57 has the structure same with the first detection means DA4.Second detection device 57 passes through shooting Unit 67 shoot by the reflective surface of supporting mass 66 after blooming F2 reflected light picture, based on this shooting result come detecting position Pattern of polarization row APAa, APAb, DPAa, DPAb on reflecting surface (with reference to Fig. 9), extract pattern of polarization row APAa, APAb, The marginal positional information of DPAa, DPAb.
Control device 70 obtains pattern of polarization row APAa, APAb, DPAa, DPAb (ginseng that second detection device 57 is extracted According to Fig. 9) marginal positional information.The demarcation line based on pattern of polarization row APAa, APAb, DPAa, DPAb for the control device 70 Positional information, to confirm the allocation position that blooming F2 is with respect to supporting mass 66.Control device 70 is based on pattern of polarization and arranges The marginal positional information of APAa, APAb, DPAa, DPAb, the advanced positions of blooming F2 to detect reality are with respect to pre- Which kind of degree is the advanced positions first setting offset by.Control device 70 controls second to crawl control unit 56 and adjust blooming F2's Advanced positions, so that the advanced positions of blooming F2 are consistent with advanced positions set in advance.
Second crawls control unit 56 for example based on the blooming being detected by second detection device 57 and control device 70 The skew of the advanced positions of F2, makes first guide reel 64 of supporting optical film F2 and the second guide reel 65 with respect to blooming F2 Conveying direction tilt.First guide reel 64 configures in the way of rotary shaft each other is parallel with the second guide reel 65.Second Serpentiss Row control unit 56 makes the direct of travel that the direction of the rotary shaft of the first guide reel 64 and the second guide reel 65 is with respect to blooming F2 Integratedly tilt.Thus, the advanced positions of blooming F2 are trimmed off in the direction of the width so that blooming F2 is set in advance Advance in advanced positions.
It should be noted that second crawl control unit 56 can also be make the guide reel of supporting optical film F2 with respect to The structure that the conveying direction of blooming F2 tilts.
Advanced positions to the blooming F2 of cutting portion 58 conveying are crawled control by first control unit 55 and second that crawls Portion 56 critically controls.First crawls control unit 55 and the second structure crawling control unit 56 is not limited to above-mentioned structure. Crawl control unit 55 as first, compared with the control unit 56 that preferably crawls with second, can largely adjust the row of blooming F2 Enter position.Crawl control unit 56 as second, compared with the control unit 55 that preferably crawls with first, can critically adjust blooming F2 Advanced positions.
In addition, first crawl control unit 55, the first detection means DA4, second crawl control unit 56 and the second detection dress The configuration putting 57 is not limited to above-mentioned configuration.First detection means DA4 can be only fitted to the first upstream crawling control unit 55 Side is it is also possible to configuration is in downstream.Second detection device 57 can be only fitted to second crawl control unit 56 upstream side it is also possible to Configuration is in downstream.Second detection device 57 is crawling the position crawled that control unit 55 controls blooming F2 on the lower than by first Multiple polarization figures of blooming F2 are detected in the position swum side and lean on upstream side than the position being cut off blooming F2 by cutting portion 58 Case row APAa, APAb, DPAa, DPAb.Second control unit 56 that crawls is controlling blooming than by first control unit 55 that crawls The position downstream crawled of F2 and than by cutting portion 58 cut off blooming F2 position lean on upstream side position control light Learn crawling of film F2.
Cutting portion 58 cuts off blooming F2 along cutting line SL1, SL2, the SL3 shown in Fig. 9.Cutting portion 58 is for example permissible It is made up of cutting edge, laser cutter etc..Cutting portion 58 is spaced in the configuration space identical with cutting line SL1, SL2, SL3 Configure multiple on the width of blooming F2.Control device 70 is crawled control unit by first control unit 55 and second that crawls 56, to control the advanced positions of blooming F2, cut line SL1, SL2, SL3 with the configuration in the underface of cutting portion 58.Cutting portion 58 Controlling the position downstream crawled of blooming F2 than by first control unit 55 and second control unit 56 that crawls that crawls By blooming F2 along cutting line SL1, SL2, SL3 cut-out parallel with its conveying direction at position.
Cut-off portion 58 along width segmentation after blooming F2 in comprise the part of effective coverage AC by film roll Take portion 52,53 to batch, provide as blank volume R2, R3 of the strip film with width corresponding with liquid crystal panel. The part without effective coverage AC in blooming F2 after the segmentation of cut-off portion 58 is batched by slitter edge reeling end 54, is given up Abandon.
As described above, in the first detection means DA4 of present embodiment and second detection device 57, also with second Embodiment is same, can detect pattern of polarization row APAa, APAb, DPAa, DPAb in high precision and efficiently.Present embodiment Cutting processing unit (plant) 50 based on the pattern of polarization row APAa being detected by the first detection means DA4 and second detection device 57, The marginal positional information of APAb, DPAa, DPAb, to control the advanced positions of blooming F2.Therefore, it is possible to accurately enter The control of row advanced positions.In addition, entering every trade in two stages using first control unit 55 and second control unit 56 that crawls that crawls Enter the control of position, therefore, it is possible to substantially eliminate the skew of the advanced positions of blooming F2.Thus, reduce because of traveling position The skew put and by mistake by the probability of effective coverage AC cut-out, yield rate improves.In addition, advanced positions can be considered constriction The width of the remainder (neighboring area) of skew, the waste of therefore blooming F2 tails off, and manufacturing cost reduces.
More than, referring to the drawings the preferred embodiment example of the present invention is illustrated, but the present invention is not limited to Above-mentioned example.Each structural elements shown in above-mentioned example variously-shaped, combination etc. be only one, can without departing from It is based on design requirement etc. in the range of the purport of the present invention and carry out various changes.
For example in the above-described embodiment, as one of processing meanss of the detection means possessing the present invention, enumerate Laminating apparatus, cutting processing unit (plant), but processing meanss are not limited to this.The detection means of the present invention and detection method can It is applicable to various processing meanss and the processing method being processed based on the position of pattern of polarization row.
In addition, in the above-described embodiment, as the pattern of polarization row contained by patterning phase separation layer, two kinds are illustrated Pattern of polarization arranges.But, patterning phase separation layer contained by pattern of polarization row be not limited to two kinds it is also possible to be set to three kinds with On.In this case, the brightness each other of the reflected light picture of multiple pattern of polarization row, color etc. are also different.Thus, pattern detection portion Multiple pattern of polarization row can be detected based on the brightness of reflected light picture that multiple pattern of polarization arrange or the difference of color.
Industrial applicability
According to the detection means of the present invention, detection method, processing meanss and processing method, using the teaching of the invention it is possible to provide can be accurately The detection means of detection pattern of polarization row, detection method, processing meanss and processing method.
Description of reference numerals:
13 ... laminating apparatus (processing meanss), 32 ... laminatings cylinder (supporting mass), 32a ... keep face (bearing-surface), 35a ... Light source portion, 35b ... image pickup part, 39 ... reflectings surface, 50 ... cutting processing unit (plant) (processing meanss), 57 ... second detection devices, 61 ... supporting masses, 61a ... bearing-surface, 62a ... light source portion, 62b ... image pickup part, 62c ... polarization plates, 63 ... adjustment portions, APAa, APAb, DPAa, DPAb ... pattern of polarization row, B1, B2 ... supporting mass, B1a, B2a ... bearing-surface, CM1, CM2 ... image pickup part, DA1, DA2, DA3, DA4 ... detection means, F1, F2 ... blooming, IL1, IL2 ... light source portion, IP1, IP2, IP3, IP4 ... pattern detection Portion, OP1, OP2, OP3, OP45 ... blooming, OP1a, OP2a ... first face, OP1b, OP2b ... second face, OP11, OP21, OP31, OP41 ... phase separation layer, OP12, OP23, OP35 ... patterning phase separation layer, OP12a, OP12b, OP23a, OP23b ... Pattern of polarization row, OP13, OP22, OP37 ... polarizer layer, the polarization axle of PLAX2 ... polarization plates, PLF ... polarization plates, PLR ... adjust The whole, slow axis of RS1, RS2 ... reflecting surface, RTAX ... pattern of polarization row.

Claims (14)

1. a kind of detection means, it is disposed with phase separation layer, includes the side of slow axis towards the second surface side to from the first surface side The blooming of the different patterning phase separation layers of multiple pattern of polarization row and polarizer layer is the plurality of to each other Pattern of polarization row are detected,
Described detection means is characterised by, including:
Supporting mass, it has the bearing-surface that described first face to described blooming is supported, in described bearing-surface extremely A few part has reflecting surface, and this reflecting surface makes to pass through the light after described blooming from described second surface side to described first surface side Reflection;
Light source portion, it irradiates towards the described blooming positioned at described reflecting surface from described second surface side of described blooming Light;
Image pickup part, it shoots the reflection of the described blooming being located at described reflecting surface from described second surface side of described blooming Light image;And
Pattern detection portion, it is detected the plurality of on described reflecting surface based on the described reflected light picture of described blooming Pattern of polarization arranges.
2. detection means according to claim 1, wherein,
The brightness of reflected light picture or the difference of color that described pattern detection portion is arranged based on the plurality of pattern of polarization, to detect institute State multiple pattern of polarization row.
3. a kind of detection means, its to from first surface side towards the second surface side be disposed with phase separation layer, polarizer layer and Including the patterning phase separation layer of the direction of slow axis multiple pattern of polarization row different from each other blooming the plurality of Pattern of polarization row are detected,
Described detection means is characterised by, including:
Supporting mass, it has the bearing-surface that described first face to described blooming is supported, in described bearing-surface extremely A few part has reflecting surface, and this reflecting surface makes to pass through the light after described blooming from described second surface side to described first surface side Reflection;
Light source portion, it irradiates towards the described blooming positioned at described reflecting surface from described second surface side of described blooming Light;
Polarization plates, it is arranged at from described light source portion towards the light path of the described light of described blooming;
Image pickup part, it shoots the reflection of the described blooming being located at described reflecting surface from described second surface side of described blooming Light image;And
Pattern detection portion, it is detected the plurality of on described reflecting surface based on the described reflected light picture of described blooming Pattern of polarization arranges.
4. detection means according to claim 3, wherein,
The difference of the brightness of the reflected light picture that described pattern detection portion is arranged based on the plurality of pattern of polarization or color is to detect State multiple pattern of polarization row.
5. the detection means according to claim 3 or 4, wherein,
The relative angle of slow axis that described detection means includes the polarization axle of described polarization plates is arranged with described pattern of polarization is carried out The adjustment portion of adjustment.
6. a kind of detection method, is disposed with phase separation layer, includes the direction of slow axis towards the second surface side to from the first surface side The blooming of the patterning phase separation layer of multiple pattern of polarization row different from each other and polarizer layer the plurality of partially The pattern that shakes row are detected,
Described detection method is characterised by, including:
Holding step, in this holding step, is supported described first face of described blooming, it is right that this supporting mass has by supporting mass The bearing-surface that described first face of described blooming is supported, at least a portion in described bearing-surface has reflecting surface, This reflecting surface makes to pass through the light reflection after described blooming to described first surface side from described second surface side;
Irradiating step, in this irradiating step, from described second surface side of described blooming towards positioned at described reflecting surface Described blooming irradiation light;
Shoot step, in this shooting step, shoot from described second surface side of described blooming and be located at described reflecting surface The reflected light picture of described blooming;And
Pattern detection step, in this pattern detection step, is detected positioned at institute based on the described reflected light picture of described blooming State the plurality of pattern of polarization row on reflecting surface.
7. detection method according to claim 6, wherein,
The brightness of reflected light picture that described pattern detection step is arranged based on the plurality of pattern of polarization or the difference of color detect The plurality of pattern of polarization row.
8. a kind of detection method, is disposed with phase separation layer, polarizer layer and bag to from the first surface side towards the second surface side Include slow axis the direction blooming of patterning phase separation layer of multiple pattern of polarization row different from each other the plurality of partially The pattern that shakes row are detected,
Described detection method is characterised by, including:
Holding step, in this holding step, is supported described first face of described blooming, it is right that this supporting mass has by supporting mass The bearing-surface that described first face of described blooming is supported, at least a portion in described bearing-surface has reflecting surface, This reflecting surface makes to pass through the light reflection after described blooming to described first surface side from described second surface side;
Irradiating step, in this irradiating step, from described second surface side of described blooming via polarization plates towards positioned at described Described blooming irradiation light on reflecting surface;
Shoot step, in this shooting step, shoot from described second surface side of described blooming and be located at described reflecting surface The reflected light picture of described blooming;And
Pattern detection step, in this pattern detection step, is detected positioned at institute based on the described reflected light picture of described blooming State the plurality of pattern of polarization row on reflecting surface.
9. detection method according to claim 8, wherein,
The brightness of reflected light picture that described pattern detection step is arranged based on the plurality of pattern of polarization or the difference of color detect The plurality of pattern of polarization row.
10. detection method according to claim 8 or claim 9, wherein,
The relative angle of slow axis that described detection method includes the polarization axle of described polarization plates is arranged with described pattern of polarization is carried out The set-up procedure of adjustment.
A kind of 11. processing meanss it is characterised in that
Usage right requires the detection means described in 1 or 2 to be disposed with phase contrast to from the first surface side towards the second surface side Layer, the direction patterning phase separation layer of multiple pattern of polarization row different from each other including slow axis and polarizer layer The plurality of pattern of polarization row of blooming are detected, and based on the position of described pattern of polarization row, described blooming are entered Row predetermined processing.
A kind of 12. processing meanss it is characterised in that
Usage right requires the detection means any one of 3 to 5 to set gradually towards the second surface side to from the first surface side The patterning phase contrast having phase separation layer, polarizer layer and including the direction multiple pattern of polarization row different from each other of slow axis The plurality of pattern of polarization row of the blooming of layer are detected, and the position based on described pattern of polarization row is come to described Blooming carries out predetermined processing.
A kind of 13. processing methods it is characterised in that
Usage right requires the detection method described in 6 or 7 to be disposed with phase contrast to from the first surface side towards the second surface side Layer, the direction patterning phase separation layer of multiple pattern of polarization row different from each other including slow axis and polarizer layer The plurality of pattern of polarization row of blooming are detected, and based on the position of described pattern of polarization row, described blooming are entered Row predetermined processing.
A kind of 14. processing methods it is characterised in that
Usage right requires the detection method any one of 8 to 10 to set gradually towards the second surface side to from the first surface side The patterning phase contrast having phase separation layer, polarizer layer and including the direction multiple pattern of polarization row different from each other of slow axis The plurality of pattern of polarization row of the blooming of layer are detected, and the position based on described pattern of polarization row is come to described Blooming carries out predetermined processing.
CN201580034204.XA 2014-06-30 2015-06-25 Detection device, detection method, processing device, and processing method Pending CN106461563A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
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