CN106449509B - 一种升降旋转装置 - Google Patents

一种升降旋转装置 Download PDF

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CN106449509B
CN106449509B CN201611047884.1A CN201611047884A CN106449509B CN 106449509 B CN106449509 B CN 106449509B CN 201611047884 A CN201611047884 A CN 201611047884A CN 106449509 B CN106449509 B CN 106449509B
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CN106449509A (zh
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李文
韦孟锑
丁治祥
刘伟
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Wuxi Autowell Technology Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68792Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

本发明涉及一种升降旋转装置,包括驱动装置,所述驱动装置上连接有横移装置,所述横移装置上装有升降装置,所述升降装置上连接有旋转装置;所述旋转装置包括带动中轴转动的摆臂,所述中轴上同步安装有硅片吸附装置;所述摆臂的端部与旋转控制装置滑动和/或滚动连接,用于使所述摆臂转动。该升降旋转装置,通过带动摆臂的动作,实现了中轴的转动,进而带动了中轴上端硅片吸附装置上硅片的转动,通过中轴上同步安装的硅片吸附装置,实现了硅片的运载与转动,同时为了更好的实现硅片旋转功能,避免干涉,将旋转装置安装在升降装置上,为了带动硅片的输送,而将升降装置安装在横移装置上,从而完成了在输送过程中实现使硅片旋转的功能。

Description

一种升降旋转装置
技术领域
本发明涉及一种升降旋转装置,属于光伏设备领域。
背景技术
在太阳能电池片的生产过程中,需要先将硅棒切割成硅片,然后对硅片清洗,清洗完成后需要对硅片进行检测,一般是将硅片放在输送装置上,检测装置设置在输送装置两侧,逐步对硅片表面的脏污、隐裂、边缘缺陷、翘曲度等情况进行检测。
但是这种传统的检测方式在对硅片边缘进行检测的时候,只能检测到输送带两侧的硅片边缘,对于其他边缘并不方便检测,检测硅片隐裂的时候只是检测的单一方向上的隐裂,对于另一方向上隐裂的检测不能进行,因此,需要提供一种装置,能够实现硅片的旋转,使其能在输送带边缘的硅片检测完后旋转一定的角度,从而便于对其余的边缘进行检测。
发明内容
本发明的目的在于提供一种升降旋转装置,能够在动态输送过程中实现使硅片旋转的功能。
本发明的目的是通过以下技术方案来实现:一种升降旋转装置,包括驱动装置,所述驱动装置上连接有横移装置,所述横移装置上装有升降装置,所述升降装置上连接有旋转装置;
所述旋转装置包括带动中轴转动的摆臂,所述中轴上同步安装有硅片吸附装置;所述摆臂的端部与旋转控制装置滑动和/或滚动连接,用于使所述摆臂转动。
进一步地,所述升降装置采用伺服控制或采用机械从动件控制。
进一步地,所述升降装置采用机械从动件控制,所述升降装置包括安装在所述横移装置上的导柱,所述导柱上滑动安装有升降安装板,所述升降安装板一侧固定安装有升降滚轮,所述升降滚轮与升降导轨配合,所述升降导轨的前后具有高度差。升降导轨通过前后的高度差实现带动升降滚轮的升降,从而带动升降安装板的升降。
进一步地,所述升降导轨可单独升降或采用随动升降的方式。
进一步地,所述旋转装置包括转轴座,所述转轴座上安装有所述中轴,所述中轴上安装有所述摆臂,所述摆臂端部安装有旋转导轮,所述旋转导轮与所述旋转控制装置滚动连接,所述中轴上套装有弹簧,所述弹簧一端连接在摆臂上,所述弹簧的另一端连接在所述转轴座上。弹簧用于带动摆臂旋转后的复位。
进一步地,所述旋转控制装置采用旋转导向板,所述旋转导向板上设有旋转导向面,所述旋转导向面包括第一导向面与第二导向面,所述第一导向面与所述第二导向面之间通过平滑的曲面连接。第一导向面与第二导向面平行但不重合,通过第一导向面与第二导向面之间的距离差来实现控制中轴旋转的角度。
进一步地,所述升降导轨采用随动升降的方式,所述升降导轨安装在随动升降滑动装置上,所述随动升降滑动装置上安装有限位滑动装置,所述限位滑动装置上可滑动的安装有支撑轮,所述支撑轮用于支撑所述升降导轨,所述升降导轨与所述支撑轮接触的面有高度差,所述升降安装板上安装有与所述支撑轮相配合的推杆,所述推杆用于推动支撑轮沿所述限位滑动装置滑动,由于支撑轮安装在限位滑动装置上,只能沿限位滑动装置滑动方向运动,因此支撑轮运动会带动升降导轨沿着随动升降滑动装置滑动。
进一步地,所述支撑轮包括第一支撑轮与第二支撑轮,所述第一支撑轮与所述第二支撑轮分别设置在所述升降导轨下侧的前部和后部,所述升降导轨下侧的前部与后部分别设有带高度差的导向面,所述第一支撑轮与所述第二支撑轮采用连接板固定连接。
进一步地,所述驱动装置包括电机带动的丝杠。
进一步地,所述横移装置采用横移滑块滑轨副,所述丝杠上连接有横移滑块,所述横移滑块上安装有横移滑板,所述导柱安装在所述横移滑板上。
本发明所述的一种升降旋转装置,通过带动摆臂的动作,实现了中轴的转动,进而带动了中轴上端硅片吸附装置上硅片的转动,通过中轴上同步安装的硅片吸附装置,实现了硅片的运载与转动,同时为了更好的实现硅片旋转功能,避免干涉,将旋转装置安装在升降装置上,为了带动硅片的输送,而将升降装置安装在横移装置上,从而完成了在输送过程中实现使硅片旋转的功能。
附图说明
图1为本发明所述一种升降旋转装置装配示意图;
图2为图1主视图;
图3为本发明所示一种升降旋转装置升降装置爆炸视图。
具体实施方式
下面根据附图和实施例对本发明作进一步详细说明。
如图1所示,本发明实施例所述的一种升降旋转装置,包括驱动装置1,驱动装置1上连接有横移装置2,横移装置2上装有升降装置3,升降装置3上连接有旋转装置4;旋转装置4包括带动中轴401转动的摆臂402,中轴401上同步安装有硅片吸附装置5;摆臂402的端部与旋转控制装置6滑动和/或滚动连接,用于使摆臂402转动。通过硅片吸附装置5实现了硅片的吸附。可以采用摆臂402不动,旋转控制装置6运动的形式来实现摆臂402绕着中轴401的转动,也可以采用旋转控制装置6不动固定的形式,通过摆臂402抵接固定设置的旋转控制装置6来实现摆臂402的旋转。本实施例中的硅片吸附装置5采用吸盘,吸盘安装在硅片运输架上,硅片运输架安装在中轴401上。
如图1、图2、图3所示,本实施例中升降装置3采用伺服控制或采用机械从动件控制。本实施例中,升降装置3采用机械从动件控制,升降装置3包括安装在横移装置2上的导柱301,导柱301上滑动安装有升降安装板302,升降安装板302一侧固定安装有升降滚轮303,升降滚轮303与升降导轨304配合,升降导轨304的前后具有高度差。升降导轨304可单独升降或采用随动升降的方式。本实施例中,升降导轨304采用随动升降的方式,升降导轨304安装在随动升降滑动装置305上,随动升降滑动装置305上安装有限位滑动装置306,限位滑动装置306上可滑动的安装有支撑轮,支撑轮用于支撑升降导轨304,升降导轨304与支撑轮接触的面有高度差,升降安装板302上安装有与支撑轮相配合的推杆308。支撑轮包括第一支撑轮310与第二支撑轮307,第一支撑轮310与第二支撑轮307分别设置在升降导轨304下侧的前部和后部,升降导轨304下侧的前部与后部分别设有带高度差的导向面,第一支撑轮310与第二支撑轮307采用连接板309固定连接。驱动装置1包括电机带动的丝杠。横移装置2采用横移滑块滑轨副,丝杠上连接有横移滑块,横移滑块上安装有横移滑板201,导柱301安装在横移滑板201上。
如图1、图2所示,本实施例中旋转装置4包括转轴座403,转轴座403上安装有中轴401,中轴401上安装有摆臂402,摆臂402端部安装有旋转导轮,旋转导轮与旋转控制装置6滚动连接,中轴401上套装有弹簧,弹簧一端连接在摆臂402上,弹簧的另一端连接在转轴座403上,本实施中的弹簧采用扭簧。旋转控制装置6采用旋转导向板601,旋转导向板601所述旋转导向板上设有旋转导向面,旋转导向面包括第一导向面602与第二导向面603,第一导向面602与第二导向面603之间通过平滑的曲面连接。第一导向面602与第二导向面603平行但不重合,通过第一导向面602与第二导向面603之间的距离差来实现控制中轴旋转的角度。
硅片输送到位置之后,横移装置2带动横移滑板201向前运动,此时旋转装置4上的旋转导轮在旋转导向板601上的第一导向面602滑动,旋转装置4不旋转,与此同时,升降滚轮303在升降导轨304上由低位向高位滑动,带动升降装置3由低位向高位运动,当滑动到高位后,硅片吸附装置5将硅片吸附,横移装置2继续向前运动,在硅片吸附装置5吸附到硅片之后,旋转导轮运动到旋转导向板601上连接第一导向面602与第二导向面603的曲面,随之带动中轴401的旋转,安装在中轴401上的硅片吸附装置5也随之转动,从而带动了硅片的转动,当旋转导轮运动到第二导向面603之后,推杆308推动下侧的第一支撑轮310,第一支撑轮310沿限位滑动装置306滑动,第一支撑轮10与第二支撑轮307分别从升降导轨304下侧的低位滑动到高位,由于第一支撑轮310与第二支撑轮307只能沿限位滑动装置306滑动,因而会使升降导轨304沿随动升降滑动装置305下降,升降装置3也随着升降导轨304从高位运动到低位。硅片吸附装置5将硅片释放,横移装置2带动旋转装置4向后运动,硅片吸附装置5在弹簧的作用下完成角度的复位。当旋转导轮运动到第一导向面602后,在推杆308的推动下,第二支撑轮307从升降导轨304的下侧高位运动到低位,升降滚轮303也从升降导轨304上侧的高位滑到低位,使升降导轨304上升,此时升降装置3仍在低位。横移装置2带动横移滑板201向前运动,如此循环,实现了动态输送过程中,硅片旋转的功能。
以上仅为说明本发明的实施方式,并不用于限制本发明,对于本领域的技术人员来说,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。

Claims (9)

1.一种升降旋转装置,其特征在于,包括驱动装置,所述驱动装置上连接有横移装置,所述横移装置上装有升降装置,所述升降装置上连接有旋转装置;
所述旋转装置包括带动中轴转动的摆臂,所述中轴上同步安装有硅片吸附装置;所述摆臂的端部与旋转控制装置滑动或滚动连接,用于使所述摆臂转动;
所述旋转控制装置采用旋转导向板,所述旋转导向板上设有旋转导向面,所述旋转导向面包括第一导向面与第二导向面,所述第一导向面与所述第二导向面之间通过平滑的曲面连接,所述第一导向面与所述第二导向面平行但不重合。
2.如权利要求1所述的升降旋转装置,其特征在于,所述升降装置采用伺服控制或采用机械从动件控制。
3.如权利要求1所述的升降旋转装置,其特征在于,所述升降装置采用机械从动件控制,所述升降装置包括安装在所述横移装置上的导柱,所述导柱上滑动安装有升降安装板,所述升降安装板一侧固定安装有升降滚轮,所述升降滚轮与升降导轨配合,所述升降导轨的前后具有高度差。
4.如权利要求3所述的升降旋转装置,其特征在于,所述升降导轨可单独升降或采用随动升降的方式。
5.如权利要求4所述的升降旋转装置,其特征在于,所述旋转装置包括转轴座,所述转轴座上安装有所述中轴,所述中轴上安装有所述摆臂,所述摆臂端部安装有旋转导轮,所述旋转导轮与所述旋转控制装置滚动连接,所述中轴上套装有弹簧,所述弹簧一端连接在摆臂上,所述弹簧的另一端连接在所述转轴座上。
6.如权利要求5所述的升降旋转装置,其特征在于,所述升降导轨采用随动升降的方式,所述升降导轨安装在随动升降滑动装置上,所述随动升降滑动装置上安装有限位滑动装置,所述限位滑动装置上可滑动的安装有支撑轮,所述支撑轮用于支撑所述升降导轨,所述升降导轨与所述支撑轮接触的面有高度差,所述升降安装板上安装有推杆。
7.如权利要求6所述的升降旋转装置,其特征在于,所述支撑轮包括第一支撑轮与第二支撑轮,所述第一支撑轮与所述第二支撑轮分别设置在所述升降导轨下侧的前部和后部,所述升降导轨下侧的前部与后部分别设有带高度差的导向面,所述第一支撑轮与所述第二支撑轮采用连接板固定连接。
8.如权利要求3所述的升降旋转装置,其特征在于,所述驱动装置包括电机带动的丝杠。
9.如权利要求8所述的升降旋转装置,其特征在于,所述横移装置采用横移滑块滑轨副,所述丝杠上连接有横移滑块,所述横移滑块上安装有横移滑板,所述导柱安装在所述横移滑板上。
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