CN106406035B - 一种周边曝光传送机构下垂监控装置及其监控方法 - Google Patents

一种周边曝光传送机构下垂监控装置及其监控方法 Download PDF

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CN106406035B
CN106406035B CN201610925239.9A CN201610925239A CN106406035B CN 106406035 B CN106406035 B CN 106406035B CN 201610925239 A CN201610925239 A CN 201610925239A CN 106406035 B CN106406035 B CN 106406035B
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transport mechanism
sagging
optical sensor
fibre optical
processing units
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CN106406035A (zh
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王祝青
赵辉
沙双庆
王雷
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Nanjing CEC Panda LCD Technology Co Ltd
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Nanjing Huadong Electronics Information and Technology Co Ltd
Nanjing CEC Panda FPD Technology Co Ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask

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Abstract

本发明公开了一种周边曝光传送机构下垂监控装置及其监控方法,在传送机构的两侧安装光纤传感器,所述光纤传感器设置在低于传送机构底面7~12mm且在传送机构完全伸出后距离其最前端2~4.5cm的位置,所述光纤传感器将检测到的光感信号发送给PLC处理单元,PLC处理单元判断传送机构发生下垂并控制触摸屏进行报警。本发明通过在曝光机的传送机构两侧设置光纤传感器,当发生下垂情况时光纤传感器可将光线被遮挡的光感信号传递给PLC处理单元,PLC控制触摸屏发出报警,故可精确了解传送机构的运行状态,及时发现发生下垂现象,防止了基板破片,避免了传送机构下垂与基板搬入机构相撞的可能性,无需人力观察,节省人力物力的消耗,节约经济成本。

Description

一种周边曝光传送机构下垂监控装置及其监控方法
技术领域
本发明涉及一种周边曝光机,具体涉及一种周边曝光机的传送机构。
背景技术
周边曝光机在完成周边曝光动作后,传送机构上升将基板传至显影单元,基板传片完成后,传送机构下降回归至下限位置。若传送机构高度异常易导致基板破片,严重的会造成升降气缸损坏异常。目前监控传送机构的主要方式是三种:通过维护保养时点检,测量传送机构水平距离平台支撑高度;日常点检,主要用过目测观察是否有异常;正常生产过程中,通过升降气缸高度是否有异常判断。
上述三种监控方式对应存在以下问题:
1、通过维护保养时测量传送机构距离平台支撑的高度来判断,需要多人操作,测量较多点位,维护保养工时长,维护保养时间增加;
2、日常点检时肉眼观察误差较大,反馈笼统,异常不能及时发现;
3、如果通过升降气缸状态监控,当气缸状态异常报警时,此时气缸已经磨损严重,需及时更换,无法及时发现传送机构的异常。
发明内容
发明目的:本发明的目的在于针对现有技术的不足,提供一种周边曝光传送机构下垂监控装置及其监控方法,能够及时、准确且便捷的发现传送机构是否发生下垂情况并做出报警。
技术方案:一种周边曝光传送机构下垂监控装置,在传送机构的两侧安装光纤传感器,所述光纤传感器设置在低于传送机构底面7~12mm且距离传送机构完全伸出后前端2~4.5cm的位置,所述光纤传感器将检测到的光感信号发送给PLC处理单元,PLC处理单元判断传送机构发生下垂并控制触摸屏进行报警。
进一步,所述光纤传感器的感光度下限为50~100MJ,感度灵敏且可避免误报警。
一种周边曝光传送机构下垂监控装置的监控方法,曝光完成的基板承载于传送机构上,传送机构完全伸出后,若传送机构发生下垂时两侧光纤传感器的光被遮住,光纤传感器将检测到的光感信号发送给PLC处理单元,PLC处理单元将有无遮挡的光感信号转换成数字信号,当出现下垂的数字信号时控制触摸屏发出相应警报,传送机构停止动作。
进一步,所述PLC处理单元还包括一个常闭开关,当不需要实时监控下垂或光纤传感器异常损坏时,打开常闭开关,忽略下垂报警信号。
进一步,所述PLC处理单元和触摸屏之间设有时间延时继电器,时间设定为5~6s,当发出下垂报警时,在5~6s内传送机构正常工作保证下垂的基板正常传送出去,5~6s后传送机构停止工作。
进一步,沿传送机构的长度方向上设有多组用于检测传送机构上下偏移量的传感器,通过统计各个偏移量并计算出每张基板的平坦度,可发现基板的异常性变现象。
有益效果:本发明通过在曝光机的传送机构两侧设置光纤传感器,当发生下垂情况时光纤传感器可将光线被遮挡的光感信号传递给PLC处理单元,PLC控制触摸屏发出报警,故可精确了解传送机构的运行状态,及时发现发生下垂现象,防止了基板破片,避免了传送机构下垂与基板搬入机构相撞的可能性,无需人力观察,节省人力物力的消耗,节约经济成本。
附图说明
图1为周边曝光机传送机构的结构示意图;
图2为本发明监控方法流程图。
具体实施方式
下面对本发明技术方案进行详细说明,但是本发明的保护范围不局限于所述实施例。
实施例:本实施例周边曝光机的传送机构1为九根沿水平方向伸出的棒状支撑杆,如图1所示,每根支撑杆上设有若干滚轮,支撑杆上升后将基板通过滚轮输送至显影单元。本发明防止周边曝光机传送机构1下垂的装置包括安装在传送机构1两侧的光纤传感器2,光纤传感器2设置在低于传送机构1底面7mm且距离传送机构1完全伸出后前端2cm的位置,光纤传感器2的感光度下限为60MJ。光纤传感器2通过时间继电器与PLC处理单元相连,PLC处理单元另外连接触摸屏。
上述装置的监控方法如图2所示,曝光完成的基板正常搬入承载于传送机构1上,传送机构1完全伸出后,光纤传感器2将检测到的光感信号发送给PLC处理单元,PLC处理单元将光感信号转换成数字信号。具体的,传送机构1正常伸出无发生下垂现象时,光纤传感器2之间的光线不会被遮挡,此时,PLC输出的信号为0;若传送机构1发生下垂,两侧光纤传感器2之间的光被遮住,PLC处理单元输出的数字信号为1。出现数字信号1时控制触摸屏发出相应警报。由于一片基板正常传送时间为3~4s左右,时间延时继电器的时间设定为6s,当发出下垂报警时,在5~6s内传送机构1正常工作确保下垂的基板正常传送出去,5~6s后传送机构1停止工作,不会接收上游发过来的下一枚基板,保证传送机构1内无基板,方便观察人员查看检查异常。此外,PLC处理单元中还设有一个串联的常闭信号,当不需要实时监控下垂或光纤传感器2异常损坏时,打开常闭信号,PLC输出的信号为始终为0,不会发出下垂报警。
沿传送机构1的长度方向上均布有多组用于检测传送机构1上下偏移量的传感器,通过统计各个偏移量并计算出每张基板的平坦度,可发现基板的异常性变现象。

Claims (5)

1.一种周边曝光传送机构下垂监控装置,其特征在于:在传送机构的两侧安装光纤传感器,所述光纤传感器设置在低于传送机构底面7~12mm且在传送机构完全伸出后距离其最前端2~4.5cm的位置,所述光纤传感器将检测到的光感信号发送给PLC处理单元,PLC处理单元判断传送机构发生下垂并控制触摸屏进行报警,所述PLC处理单元和触摸屏之间还设有时间延时继电器。
2.根据权利要求1所述的周边曝光传送机构下垂监控装置,其特征在于:所述光纤传感器的感光度下限为50~100MJ。
3.根据权利要求1所述的周边曝光传送机构下垂监控装置的监控方法,其特征在于:曝光完成的基板承载于传送机构上,传送机构完全伸出后,若传送机构发生下垂时两侧光纤传感器的光被遮住,光纤传感器将检测到的光感信号发送给PLC处理单元,PLC处理单元将有无遮挡的光感信号转换成数字信号,当出现下垂的数字信号时控制触摸屏发出相应警报,PLC处理单元和触摸屏之间设有时间延时继电器,时间设定为5~6s,当发出下垂报警时,在5~6s内传送机构正常工作保证下垂的基板正常传送出去,5~6s后传送机构停止工作。
4.根据权利要求3所述的周边曝光传送机构下垂监控装置的监控方法,其特征在于:所述PLC处理单元中还设有一个常闭信号,当不需要实时监控下垂或光纤传感器异常损坏时,打开常闭信号,忽略下垂报警信号。
5.根据权利要求3所述的周边曝光传送机构下垂监控装置的监控方法,其特征在于:沿传送机构的长度方向上设有多组用于检测传送机构上下偏移量的传感器,通过统计各个偏移量并计算出每张基板的平坦度,可发现基板的异常性变现象。
CN201610925239.9A 2016-10-24 2016-10-24 一种周边曝光传送机构下垂监控装置及其监控方法 Expired - Fee Related CN106406035B (zh)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2447310A1 (en) * 2003-11-04 2005-05-04 David Tichbourne Shell egg ultraviolet light germicidal system
CN105425432A (zh) * 2015-11-05 2016-03-23 范师华 一种用于触摸屏生产工艺的液晶面板的检测装置
CN205140936U (zh) * 2015-12-01 2016-04-06 海太半导体(无锡)有限公司 一种晶圆传送异常监测装置
CN205240075U (zh) * 2015-12-29 2016-05-18 郑州旭飞光电科技有限公司 玻璃基板传送装置和玻璃基板卸料系统

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