CN106381524A - 一种基于原位合成法的InP单晶炉用观察窗装置 - Google Patents
一种基于原位合成法的InP单晶炉用观察窗装置 Download PDFInfo
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- CN106381524A CN106381524A CN201610921172.1A CN201610921172A CN106381524A CN 106381524 A CN106381524 A CN 106381524A CN 201610921172 A CN201610921172 A CN 201610921172A CN 106381524 A CN106381524 A CN 106381524A
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
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- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
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CN201610921172.1A CN106381524A (zh) | 2016-10-21 | 2016-10-21 | 一种基于原位合成法的InP单晶炉用观察窗装置 |
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CN201610921172.1A CN106381524A (zh) | 2016-10-21 | 2016-10-21 | 一种基于原位合成法的InP单晶炉用观察窗装置 |
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CN201610921172.1A Pending CN106381524A (zh) | 2016-10-21 | 2016-10-21 | 一种基于原位合成法的InP单晶炉用观察窗装置 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108179479A (zh) * | 2018-01-22 | 2018-06-19 | 苏州晶特晶体科技有限公司 | 一种可拆式风冷观察组件 |
WO2019109366A1 (zh) * | 2017-12-08 | 2019-06-13 | 中国电子科技集团公司第十三研究所 | 利用承载气体进行磷化物原位注入合成的方法 |
US20210230767A1 (en) * | 2019-08-21 | 2021-07-29 | Meishan Boya Advanced Materials Co., Ltd. | Methods and devices for growing scintillation crystals with multi-component garnet structure |
CN113564721A (zh) * | 2021-08-17 | 2021-10-29 | 眉山博雅新材料有限公司 | 一种晶体生长炉的观察窗装置 |
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CN103913072A (zh) * | 2014-04-09 | 2014-07-09 | 宝钢工程技术集团有限公司 | 一种自清洁观察窗装置 |
CN104404621A (zh) * | 2014-11-26 | 2015-03-11 | 中国电子科技集团公司第十三研究所 | 一种磷化铟单晶炉观察窗防污染装置 |
CN104451858A (zh) * | 2014-11-26 | 2015-03-25 | 中国电子科技集团公司第十三研究所 | 高压原位合成多功能晶体生长系统 |
CN204237887U (zh) * | 2014-11-26 | 2015-04-01 | 中国电子科技集团公司第十三研究所 | 高压原位合成多功能晶体生长系统 |
CN206204481U (zh) * | 2016-10-21 | 2017-05-31 | 珠海鼎泰芯源晶体有限公司 | 一种基于原位合成法的InP单晶炉用观察窗装置 |
-
2016
- 2016-10-21 CN CN201610921172.1A patent/CN106381524A/zh active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000226293A (ja) * | 1999-02-08 | 2000-08-15 | Komatsu Electronic Metals Co Ltd | 半導体単結晶製造装置 |
CN201545908U (zh) * | 2009-08-25 | 2010-08-11 | 东莞宏威数码机械有限公司 | 腔体观察窗 |
CN102337592A (zh) * | 2011-07-01 | 2012-02-01 | 中国电子科技集团公司第二研究所 | SiC晶体生长炉测温窗 |
CN202660933U (zh) * | 2011-12-05 | 2013-01-09 | 贵阳铝镁设计研究院有限公司 | 一种可自动吹扫的炉窑观察窗 |
CN202730305U (zh) * | 2012-08-10 | 2013-02-13 | 上虞晶信机电科技有限公司 | 蓝宝石晶体生长带氩气冲洗的观察口装置 |
CN103913072A (zh) * | 2014-04-09 | 2014-07-09 | 宝钢工程技术集团有限公司 | 一种自清洁观察窗装置 |
CN104404621A (zh) * | 2014-11-26 | 2015-03-11 | 中国电子科技集团公司第十三研究所 | 一种磷化铟单晶炉观察窗防污染装置 |
CN104451858A (zh) * | 2014-11-26 | 2015-03-25 | 中国电子科技集团公司第十三研究所 | 高压原位合成多功能晶体生长系统 |
CN204237887U (zh) * | 2014-11-26 | 2015-04-01 | 中国电子科技集团公司第十三研究所 | 高压原位合成多功能晶体生长系统 |
CN206204481U (zh) * | 2016-10-21 | 2017-05-31 | 珠海鼎泰芯源晶体有限公司 | 一种基于原位合成法的InP单晶炉用观察窗装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019109366A1 (zh) * | 2017-12-08 | 2019-06-13 | 中国电子科技集团公司第十三研究所 | 利用承载气体进行磷化物原位注入合成的方法 |
US10648100B1 (en) | 2017-12-08 | 2020-05-12 | The 13Th Research Institute Of China Electronics Technology Group Corporation | Method for carrying out phosphide in-situ injection synthesis by carrier gas |
CN108179479A (zh) * | 2018-01-22 | 2018-06-19 | 苏州晶特晶体科技有限公司 | 一种可拆式风冷观察组件 |
US20210230767A1 (en) * | 2019-08-21 | 2021-07-29 | Meishan Boya Advanced Materials Co., Ltd. | Methods and devices for growing scintillation crystals with multi-component garnet structure |
CN113564721A (zh) * | 2021-08-17 | 2021-10-29 | 眉山博雅新材料有限公司 | 一种晶体生长炉的观察窗装置 |
CN113564721B (zh) * | 2021-08-17 | 2022-06-07 | 眉山博雅新材料股份有限公司 | 一种晶体生长炉的观察窗装置 |
WO2023020526A1 (zh) * | 2021-08-17 | 2023-02-23 | 眉山博雅新材料股份有限公司 | 一种炉体的窗体装置 |
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Effective date of registration: 20170405 Address after: 519085 Guangdong province Zhuhai city road two Jinding Industrial Area high-tech zone on the south side of A1 building, Rui Applicant after: Zhuhai Ding Tai Xinyuan crystal Ltd Address before: 100080 Haidian District street, Haidian, building B, block 10, level 340, level 3, Applicant before: Beijing Ding Tai Xinyuan Technology Development Co. Ltd. |
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Effective date of registration: 20170804 Address after: 100080 Haidian District street, Haidian, building B, block 10, level 340, level 3, Applicant after: Beijing Ding Tai Xinyuan Technology Development Co. Ltd. Address before: 519085 Guangdong province Zhuhai city road two Jinding Industrial Area high-tech zone on the south side of A1 building, Rui Applicant before: Zhuhai Ding Tai Xinyuan crystal Ltd |
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Effective date of registration: 20170823 Address after: 519085 Guangdong province Zhuhai city road two Jinding Industrial Area high-tech zone on the south side of A1 building, Rui Applicant after: Zhuhai Ding Tai Xinyuan crystal Ltd Address before: 100080 Haidian District street, Haidian, building B, block 10, level 340, level 3, Applicant before: Beijing Ding Tai Xinyuan Technology Development Co. Ltd. |
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