CN106348244B - A kind of graphene-based nanowire composite structures and preparation method thereof - Google Patents
A kind of graphene-based nanowire composite structures and preparation method thereof Download PDFInfo
- Publication number
- CN106348244B CN106348244B CN201610879358.5A CN201610879358A CN106348244B CN 106348244 B CN106348244 B CN 106348244B CN 201610879358 A CN201610879358 A CN 201610879358A CN 106348244 B CN106348244 B CN 106348244B
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- Prior art keywords
- metal compound
- graphene
- nanowires
- nanowire
- composite structure
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- 239000002070 nanowire Substances 0.000 title claims abstract description 160
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 106
- 229910021389 graphene Inorganic materials 0.000 title claims abstract description 106
- 239000002131 composite material Substances 0.000 title claims abstract description 35
- 238000002360 preparation method Methods 0.000 title abstract description 8
- 150000002736 metal compounds Chemical class 0.000 claims description 97
- 239000000758 substrate Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 16
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 14
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 14
- 239000002356 single layer Substances 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 238000000206 photolithography Methods 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 230000003247 decreasing effect Effects 0.000 claims description 3
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims description 3
- 230000035484 reaction time Effects 0.000 claims description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 239000000463 material Substances 0.000 abstract description 8
- 239000004065 semiconductor Substances 0.000 abstract description 8
- 229910000765 intermetallic Inorganic materials 0.000 abstract 6
- 239000010408 film Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 4
- 238000003491 array Methods 0.000 description 3
- 239000002086 nanomaterial Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/04—Networks or arrays of similar microstructural devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00349—Creating layers of material on a substrate
- B81C1/00373—Selective deposition, e.g. printing or microcontact printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2207/00—Microstructural systems or auxiliary parts thereof
- B81B2207/05—Arrays
- B81B2207/056—Arrays of static structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0198—Manufacture or treatment of microstructural devices or systems in or on a substrate for making a masking layer
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
Claims (11)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610879358.5A CN106348244B (en) | 2016-10-09 | 2016-10-09 | A kind of graphene-based nanowire composite structures and preparation method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610879358.5A CN106348244B (en) | 2016-10-09 | 2016-10-09 | A kind of graphene-based nanowire composite structures and preparation method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106348244A CN106348244A (en) | 2017-01-25 |
CN106348244B true CN106348244B (en) | 2019-03-05 |
Family
ID=57867143
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610879358.5A Expired - Fee Related CN106348244B (en) | 2016-10-09 | 2016-10-09 | A kind of graphene-based nanowire composite structures and preparation method thereof |
Country Status (1)
Country | Link |
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CN (1) | CN106348244B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN206921493U (en) * | 2017-02-17 | 2018-01-23 | 全普光电科技(上海)有限公司 | Graphene-based laminated film with cavity |
CN107680705A (en) * | 2017-09-19 | 2018-02-09 | 壹号元素(广州)科技有限公司 | A kind of isotope battery of the wide forbidden region semi-conductor nano tube/linear of ordered arrangement |
CN108461303A (en) * | 2018-03-27 | 2018-08-28 | 哈尔滨理工大学 | The preparation method of titanium dioxide nano thread-graphene composite material |
CN109211991B (en) * | 2018-09-25 | 2021-06-22 | 红河学院 | Construction and application of nitrogen and sulfur co-doped graphene loaded alloy nanowire composite material-based electrochemical sensor |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8257867B2 (en) * | 2008-07-28 | 2012-09-04 | Battelle Memorial Institute | Nanocomposite of graphene and metal oxide materials |
FR2962995B1 (en) * | 2010-07-21 | 2013-07-05 | Commissariat Energie Atomique | METHOD FOR MANUFACTURING A STRUCTURE COMPRISING A GRAPHENE SHEET PROVIDED WITH METAL PLOTS, STRUCTURE THUS OBTAINED AND USES THEREOF |
CN102757041A (en) * | 2012-07-30 | 2012-10-31 | 哈尔滨工业大学 | Preparation method of graphene/metal oxide nanocomposite powder |
US9349543B2 (en) * | 2012-07-30 | 2016-05-24 | California Institute Of Technology | Nano tri-carbon composite systems and manufacture |
CN104549363B (en) * | 2014-12-31 | 2018-04-17 | 江苏大学 | A kind of nano metal or metal alloy catalyst and preparation method thereof |
CN106449133B (en) * | 2016-10-08 | 2020-03-31 | 全普半导体科技(深圳)有限公司 | Single-layer graphene film-based composite structure, preparation method and semiconductor device |
CN206244402U (en) * | 2016-10-09 | 2017-06-13 | 全普光电科技(上海)有限公司 | A kind of graphene-based nanowire composite structures |
-
2016
- 2016-10-09 CN CN201610879358.5A patent/CN106348244B/en not_active Expired - Fee Related
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CN106348244A (en) | 2017-01-25 |
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Effective date of registration: 20190909 Address after: 518000 44 storey Longgang Venture Capital Building, Tengfei Road, Longgang District, Shenzhen City, Guangdong Province Patentee after: Quanpu Semiconductor Technology (Shenzhen) Co.,Ltd. Address before: 201203 Pudong New Area Zhang Heng Road, Lane 2, building No. 1000, No. 206, Shanghai Patentee before: The photoelectric technology (Shanghai) Co.,Ltd. |
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