CN106291814A - A kind of fiber waveguide manufacture method and fiber waveguide - Google Patents
A kind of fiber waveguide manufacture method and fiber waveguide Download PDFInfo
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- CN106291814A CN106291814A CN201510239021.3A CN201510239021A CN106291814A CN 106291814 A CN106291814 A CN 106291814A CN 201510239021 A CN201510239021 A CN 201510239021A CN 106291814 A CN106291814 A CN 106291814A
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- 238000000034 method Methods 0.000 title claims abstract description 60
- 239000000835 fiber Substances 0.000 title claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 30
- 239000011521 glass Substances 0.000 claims abstract description 125
- 150000002500 ions Chemical class 0.000 claims abstract description 125
- 239000000758 substrate Substances 0.000 claims abstract description 110
- 150000003839 salts Chemical class 0.000 claims abstract description 93
- 238000009792 diffusion process Methods 0.000 claims abstract description 47
- 150000001768 cations Chemical class 0.000 claims abstract description 42
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 7
- 239000002019 doping agent Substances 0.000 claims description 39
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 36
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims description 34
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 claims description 21
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 claims description 19
- 229910001414 potassium ion Inorganic materials 0.000 claims description 19
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 18
- 235000010344 sodium nitrate Nutrition 0.000 claims description 17
- 239000004317 sodium nitrate Substances 0.000 claims description 17
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 16
- 230000007797 corrosion Effects 0.000 claims description 10
- 238000005260 corrosion Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 235000010333 potassium nitrate Nutrition 0.000 claims description 10
- 239000004323 potassium nitrate Substances 0.000 claims description 10
- 239000010409 thin film Substances 0.000 claims description 10
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 238000001259 photo etching Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- 238000002207 thermal evaporation Methods 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- 239000005368 silicate glass Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 239000005751 Copper oxide Substances 0.000 claims description 3
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims description 3
- LCKIEQZJEYYRIY-UHFFFAOYSA-N Titanium ion Chemical compound [Ti+4] LCKIEQZJEYYRIY-UHFFFAOYSA-N 0.000 claims description 3
- 239000005385 borate glass Substances 0.000 claims description 3
- NCMHKCKGHRPLCM-UHFFFAOYSA-N caesium(1+) Chemical compound [Cs+] NCMHKCKGHRPLCM-UHFFFAOYSA-N 0.000 claims description 3
- 229910000431 copper oxide Inorganic materials 0.000 claims description 3
- 229960004643 cupric oxide Drugs 0.000 claims description 3
- 239000005365 phosphate glass Substances 0.000 claims description 3
- 235000012239 silicon dioxide Nutrition 0.000 claims description 3
- 239000000377 silicon dioxide Substances 0.000 claims description 3
- 239000005388 borosilicate glass Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 13
- 230000008878 coupling Effects 0.000 abstract description 8
- 238000010168 coupling process Methods 0.000 abstract description 8
- 238000005859 coupling reaction Methods 0.000 abstract description 8
- 238000005516 engineering process Methods 0.000 abstract description 7
- 238000009826 distribution Methods 0.000 abstract description 6
- 238000005342 ion exchange Methods 0.000 description 7
- 239000013307 optical fiber Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 230000000717 retained effect Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000035755 proliferation Effects 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Abstract
The invention provides manufacture method and the fiber waveguide of a kind of fiber waveguide, the method comprises the following steps: provide a glass substrate；On described glass substrate, the region of waveguide core both sides forms the fused salt diffusion region containing a kind of cation；On the described glass substrate of the fused salt diffusion region formed containing a kind of cation, the formation ion doped region, region of waveguide core；On the described glass substrate forming ion doped region, the surface of described ion doped region is formed and removes doped region.The manufacture method of the fiber waveguide that the present invention provides, makes the symmetry of Optical Waveguide Modes field distribution be improved, reduces coupling loss and loss；Formed by ion anticommuting technology and remove doped region, it is ensured that the fiber waveguide formed is buried light waveguide, the coupling loss reducing fiber waveguide and the loss introduced due to the scattering of glass substrate surface fault location.
Description
Technical field
The present invention relates to optical device, integrated optics and light network field, particularly to a kind of fiber waveguide manufacturer
Method and fiber waveguide.
Background technology
Along with the various data communication services such as cloud computing, Streaming Media and mobile Internet and telecommunication service demand
Explosive increase, router, terminal unit, the handling capacity of switch increase rapidly, the function of these equipment
In module, plate encounters new problem to plate, the interconnection between plate to backboard, as bottlenecks, clock skew,
Cross-talk, power consumption etc..Along with improving constantly of chip integration, interconnection density and transfer rate, these problems
The impact caused becomes to become increasingly conspicuous.It is additionally, since the restriction that inherent physical mechanism is electrically interconnected, is being electrically interconnected
Category, these problems hardly result in and obtain basic solution.
The solution the problems referred to above that are introduced as of light network open new way.Optical fiber transmission network is in the world
Sprawl on a large scale, and constantly permeate to short distance and very-short-reach from distance.Continue optical fiber World Wide Web,
After wide area network, Metropolitan Area Network (MAN) and LAN successfully replace traditional copper connecting lines, using light as the data of carrier wave
Transmission also obtains increasingly extensive application in storage area network and more short-range transmission system.Typically,
The medium that optical fiber transmits as data at the data cube computation of the internal different levels of data center, as between rack and
Interior of equipment cabinet, at present, the light network between circuit board and on circuit board becomes the target of next step key breakthrough.
Fiber waveguide is to realize between circuit board and the basis of light network on circuit board.It is currently used for plate level light network
Optical waveguide technique mainly includes that two classes, a class are optical waveguide techniques based on ion exchange technique, another kind of is
Polymer based optical waveguide technology.Compared with the latter, optical waveguide technique has that transmission belt is roomy, loss is low,
The significant properties that environmental stability is good, therefore suffers from the attention of researchers.
Normally used ion exchange technique be glass substrate surface make thin film, and make on thin film from
Sub-exchanging window, formed fiber waveguide make mask used, then the glass substrate with mask is put into containing
Carrying out ion exchange in the fused salt of dopant ion, the dopant ion in the fused salt containing dopant ion passes through light wave
Lead and make the ion exchanging window of mask used formation and swap with the sodium ion in glass substrate, adulterate from
Son enters glass substrate and forms the ion doped region of glass surface, as the sandwich layer of surface light waveguide.But,
In the ion doped region forming process of glass surface, due to the horizontal proliferation of dopant ion, glass surface
Ion doped region is flat, and therefore its Optical Waveguide Modes field distribution is asymmetric, and fiber waveguide couples damage with optical fiber
Consume the biggest；On the other hand, the ion doped region of glass surface is positioned at the surface of glass substrate, and optical guided wave is at glass
Scattering at glass surface defect is introduced into the highest loss.
The fiber waveguide making buried type can improve the symmetry of optical waveguide core layer index distribution, the most permissible
The symmetry making Optical Waveguide Modes field distribution is improved, and reduces the coupling loss of fiber waveguide device and optical fiber.With
Time, make below the core embedded in glass surface of fiber waveguide, the optical guided wave that glass surface defects causes can be eliminated
Scattering, reduces the loss of device.The making of buried light waveguide generally uses electric-field-assisted ion to migrate
Mode, the glass substrate after exchanging primary ions carries out electric-field-assisted ion migration, in the process,
In the fused salt without dopant ion of glass substrate both sides, insert two respectively connect DC source respectively
Anelectrode and the contact conductor of negative electrode, apply Dc bias in the both sides of glass substrate.In this Dc bias
Effect under, the buried entrance in the ion doped region glass substrate of glass surface that ion exchange is formed, formed
The ion doped region of buried type, and glass substrate surface is formed and removes doped region.This electric-field-assisted ion migrates
Although technology with the fiber waveguide of excellent, but can need at high temperature owing to electric-field-assisted ion migrates
Carry out, and insulated from each other between the fused salt without dopant ion of glass substrate both sides to be ensured, because of
This needs higher cost by this fabrication techniques buried light waveguide, also makes large-sized fiber waveguide device
Making extremely difficult, therefore make and be difficult to practical for the fiber waveguide of light network.
Summary of the invention
The invention provides a kind of fiber waveguide manufacture method and fiber waveguide, its purpose is to solve existing light
Waveguide fabrication method causes that higher coupling loss, loss and cost are high, be difficult to practical problem.
In order to achieve the above object, The embodiment provides the manufacture method of a kind of fiber waveguide, the party
Method comprises the following steps:
One glass substrate is provided；
On described glass substrate, the region of waveguide core both sides forms the fused salt diffusion region containing a kind of cation；
On the described glass substrate of the fused salt diffusion region formed containing a kind of cation, the region shape of waveguide core
Become ion doped region；
On the described glass substrate forming ion doped region, the surface of described ion doped region is formed goes doping
District.
Further, on described glass substrate, the region of waveguide core both sides is formed containing a kind of cation
The step of fused salt diffusion region includes:
On described glass substrate, form the mask used by fused salt diffusion region containing a kind of cation；And it is described
Mask covers the region at waveguide core place；
Will be formed with the glass substrate of mask be placed in containing a kind of cation fused salt in, and keep first to preset
Time period, form the fused salt diffusion region containing a kind of cation in the region of the mask both sides of described glass substrate.
Further, on described glass substrate, form covering used by the fused salt diffusion region containing a kind of cation
The step of film includes:
Thin film is made in the upper surface thermal evaporation of described glass substrate or the method for sputtering；
Retaining waveguide core region upper width on described glass substrate by photoetching and wet corrosion technique is
The thin film of the first predetermined width, as the mask used by the fused salt diffusion region containing a kind of cation.
Further, the material of described mask is aluminum or chrome copper or silicon dioxide.
Further, the cation in the described fused salt containing a kind of cation is potassium ion.
Further, will be formed with the glass substrate of mask be placed in containing a kind of cation fused salt in, and protect
Hold the first preset time period, form melting containing a kind of cation in the region of the mask both sides of described glass substrate
The step of salt diffusion region includes:
The glass substrate that will be formed with mask is placed in the potassium nitrate fused salt of 330-420 DEG C, keeps first to preset
Time period；
Potassium ion in described potassium nitrate fused salt acts on the mask both sides of described glass substrate through thermal diffusion
Region forms potassium ion diffusion region.
Further, described waveguide is bar shaped, and described mask covers bar shaped waveguide core region, described mask
Center overlap with the center of described slab waveguide, the length of described mask is more than or equal to described
The length of the core of slab waveguide.
Further, on the described glass substrate of the fused salt diffusion region formed containing a kind of cation, waveguide core
The step of the formation ion doped region, region in portion includes:
Described mask is removed from described glass substrate；
Described glass substrate is placed in the fused salt containing dopant ion, keeps the second preset time period, described
Dopant ion diffuses into the region of waveguide core, forms ion doped region, the both sides of described ion doped region
It is connected with described potassium ion diffusion region respectively.
Further, at least one during described dopant ion is titanium ion, silver ion or cesium ion.
Further, the step removing described mask from described glass substrate includes:
After being cooled down by described glass substrate, the method for corrosion is used to remove the mask of described glass substrate surface.
Further, the described fused salt containing dopant ion be sodium nitrate, calcium carbonate and silver nitrate mixing melt
Salt；Wherein, the mole percent of sodium nitrate, calcium carbonate and three kinds of compositions of silver nitrate be respectively 10-90%,
10-90%, 0.1-5%.
Further, on described glass substrate, the surface of described ion doped region forms the step removing doped region
Suddenly include:
Described glass substrate is placed in without in the fused salt of dopant ion, keeps the 3rd preset time period, described
The ion on the surface of ion doped region enters in the fused salt without dopant ion, at the table of described ion doped region
Face is formed and removes doped region.
Further, described glass substrate is placed in without in the fused salt of dopant ion, when keeping the 3rd to preset
Between section, the ion on the surface of described ion doped region enters in the fused salt without dopant ion, at described ion
The surface of doped region is formed goes the step of doped region to include:
At described glass substrate is inserted 220-300 DEG C in the fused salt mixt of sodium nitrate and calcium carbonate, keep the
Three preset time period, the ion on the surface of described ion doped region enters in the fused salt without dopant ion,
The surface of described ion doped region is formed and removes doped region；Wherein, sodium nitrate and two kinds of compositions of calcium carbonate mole
Percent is respectively 10-90%, 10-90%.
Further, in described ion doped region, described in go doped region area below be waveguide core.
Further, the refractive index refractive index less than described waveguide core of doped region is gone described in；Described ion
The refractive index of the glass substrate of doped region bottom is less than the refractive index of described waveguide core.
Further, the refractive index of described potassium ion diffusion region is less than the refractive index of described waveguide core.
Further, the material of described glass substrate is silicate glass or borosilicate glass or phosphate glass
Glass or borate glass.
To achieve these goals, present invention also offers a kind of fiber waveguide, this fiber waveguide is such as said method
The fiber waveguide manufactured.
The such scheme of the present invention at least includes following beneficial effect:
The fiber waveguide manufacture method that the present invention provides forms melting containing a kind of cation by ion exchange technique
Salt diffusion region, the left and right sides of the ion doped region of buried type respectively with the fused salt diffusion region containing a kind of cation
Be connected, by the fused salt diffusion region containing a kind of cation the suppression of dopant ion limited buried type from
The lateral dimension of sub-doped region, makes the symmetry of Optical Waveguide Modes field distribution be improved, reduces coupling loss
With loss.Formed by ion anticommuting technology and remove doped region, it is ensured that the fiber waveguide formed is for burying
Formula fiber waveguide, reduces the coupling loss of fiber waveguide and owing to the scattering of glass substrate surface fault location introduces
Loss.
Accompanying drawing explanation
Fig. 1 is the flow chart of steps of the manufacture method of fiber waveguide of the present invention；
Fig. 2 is the particular flow sheet of step 12 in Fig. 1；
Fig. 3 be step 22 after glass substrate and containing a kind of cation the schematic diagram of fused salt；
Fig. 4 is the particular flow sheet of step 13 in Fig. 1；
Fig. 5 be the glass substrate after step 32 and containing dopant ion the schematic diagram of fused salt；
Fig. 6 be the glass substrate after step 14 and without dopant ion the schematic diagram of fused salt；
Fig. 7 is the schematic diagram of the fiber waveguide described in the embodiment of the present invention；
Fig. 8 is the flow chart of steps of embodiment one；
Fig. 9 is the flow chart of steps of embodiment two.
Description of reference numerals:
1, glass substrate；2, waveguide core；3, the fused salt diffusion region containing a kind of cation；4, ion is mixed
Miscellaneous district；5, doped region is removed；6, mask；7, containing the fused salt of a kind of cation；8, containing dopant ion
Fused salt；9, the fused salt without dopant ion.
Detailed description of the invention
For making the technical problem to be solved in the present invention, technical scheme and advantage clearer, below in conjunction with attached
Figure and specific embodiment are described in detail.
See Fig. 1, the present invention is directed to existing problem, it is provided that the manufacture method of a kind of waveguide, the method
Comprise the following steps:
Step 11 a, it is provided that glass substrate 1；The material of described glass substrate 1 is silicate glass or borosilicate
Silicate glass or phosphate glass or borate glass.
Step 12, on described glass substrate 1, the region of waveguide core 2 both sides formed containing a kind of sun from
The fused salt diffusion region 3 of son；
Step 13, on the described glass substrate 1 of the fused salt diffusion region 3 formed containing a kind of cation, ripple
Lead the formation ion doped region, region 4 of core 2；
Step 14, on the described glass substrate 1 forming ion doped region 4, described ion doped region 4
Surface formed remove doped region 5.
Seeing Fig. 2 and Fig. 3, step 12 includes:
Step 21, on described glass substrate 1, is formed used by the fused salt diffusion region 3 containing a kind of cation
Mask 6；And described mask 6 covers the region at waveguide core 2 place；
Step 22, will be formed with the glass substrate 1 of mask 6 be placed in containing a kind of cation fused salt 7 in,
And keep the first preset time period, formed containing a kind of sun in the region of mask 6 both sides of described glass substrate 1
The fused salt diffusion region 3 of ion；Further, the cation in the described fused salt 7 containing a kind of cation is potassium
Ion.
Further, step 21 includes:
Thin film is made in the upper surface thermal evaporation of described glass substrate 1 or the method for sputtering；
Further, the material of described mask 6 is aluminum or chrome copper or silicon dioxide；Described waveguide is bar
Shape, described mask 6 covers bar shaped waveguide core 2 region, the center of described mask 6 and described bar shaped
The center of waveguide overlaps, and the length of described mask 6 is more than or equal to the length of the core of described slab waveguide
Degree.
Waveguide core 2 overlying regions width on described glass substrate 1 is retained by photoetching and wet corrosion technique
It is the thin film of the first predetermined width, as the mask 6 used by the fused salt diffusion region 3 containing a kind of cation.
Further, step 22 specifically includes:
The glass substrate 1 that will be formed with mask 6 is placed in the potassium nitrate fused salt of 330-420 DEG C, keeps first
Preset time period；
Potassium ion in described potassium nitrate fused salt acts on mask 6 both sides of described glass substrate 1 through thermal diffusion
Region formed potassium ion diffusion region.
Seeing Fig. 4 and Fig. 5, step 13 includes:
Step 31, removes described mask 6 from described glass substrate 1；
Step 32, is placed in described glass substrate 1 in the fused salt 8 containing dopant ion, and holding second is pre-
If the time period, described dopant ion diffuses into the region of waveguide core 2, forms ion doped region 4, institute
The both sides stating ion doped region 4 are connected with described potassium ion diffusion region respectively；Further, described doping from
Son is at least one in titanium ion, silver ion or cesium ion；The described fused salt 8 containing dopant ion is nitre
Acid sodium, calcium carbonate and the fused salt mixt of silver nitrate；Wherein, sodium nitrate, calcium carbonate and three kinds of compositions of silver nitrate
Mole percent be respectively 10-90%, 10-90%, 0.1-5%.
Further, step 31 includes:
After being cooled down by described glass substrate 1, the method for corrosion is used to remove covering of described glass substrate 1 surface
Film 6.
Seeing Fig. 6, step 14 specifically includes:
Described glass substrate 1 is placed in the fused salt 9 not having dopant ion, keeps the 3rd preset time period,
The ion on the surface of described ion doped region 4 enters in the fused salt 9 not having dopant ion, mixes at described ion
The surface in miscellaneous district 4 is formed and removes doped region 5.
Further, being placed in the fused salt 9 not having dopant ion by described glass substrate 1, holding the 3rd is pre-
If the time period, the ion on the surface of described ion doped region 4 enters in the fused salt 9 not having dopant ion,
The surface of described ion doped region 4 is formed goes the step of doped region 5 to include:
At described glass substrate 1 is inserted 220-300 DEG C in the fused salt mixt of sodium nitrate and calcium carbonate, keep
3rd preset time period, the ion on the surface of described ion doped region 4 enters the fused salt 9 not having dopant ion
In, formed on the surface of described ion doped region 4 and remove doped region 5；Wherein, sodium nitrate and calcium carbonate two kinds
The mole percent of composition is respectively 10-90%, 10-90%.
Seeing Fig. 7, present invention also offers a kind of fiber waveguide, this fiber waveguide is the light manufactured such as said method
Waveguide, in described ion doped region 4, described in go doped region 5 area below be waveguide core 2；Described
Go the refractive index refractive index less than described waveguide core 2 of doped region 5；Bottom, described ion doped region 4
The refractive index of glass substrate 1 is less than the refractive index of described waveguide core 2；The refraction of described potassium ion diffusion region
Rate is less than the refractive index of described waveguide core 2.
In order to more clearly describe the technology contents of the present invention, describe in detail with two specific embodiments below.
Embodiment one: see Fig. 8, makes the fiber waveguide that core dimensions is about 10 microns；
Step 41 a, it is provided that thickness is the glass substrate 1 of 1.5 millimeters.
Step 42, the method in described glass substrate 1 upper surface thermal evaporation or sputtering makes a layer thickness
It is the aluminum film of 80～200 nanometers, is retained by photoetching and wet corrosion technique and on glass substrate 1, make light wave
On the region led, width is the thin film of 15-40 micron, as mask 6.
Step 43, the glass substrate 1 that will be formed with mask 6 is placed in the potassium nitrate fused salt of 330-420 DEG C guarantor
Hold 20-200 minute；During this, the potassium ion in described potassium nitrate fused salt acts on described through thermal diffusion
The region of mask 6 both sides of glass substrate 1 forms potassium ion diffusion region；
Step 44, after being cooled down by described glass substrate 1, uses the method for corrosion to remove described glass substrate 1
The mask 6 on surface；
Step 45, is placed in described glass substrate 1 in the fused salt mixt of sodium nitrate, calcium carbonate and silver nitrate
Keep 5-60 minute, the formation ion doped region, region 4 of waveguide core 2；Wherein, three kinds of compositions mole
Percent is respectively 10-90%, 10-90%, 0.1-5%；Temperature during this is between 220-300 DEG C；
Step 46, sodium nitrate and the fused salt mixt of calcium carbonate at described glass substrate 1 is inserted 220-300 DEG C
In, keeping 3-60 minute, the ion on the surface of described ion doped region 4 enters the molten of dopant ion
In salt 9, formed on the surface of described ion doped region 4 and remove doped region 5；In described ion doped region 4,
It is described that to go doped region 5 area below be waveguide core 2；Wherein, sodium nitrate and two kinds of compositions of calcium carbonate
Mole percent is respectively 10-90%, 10-90%.
Embodiment two: see Fig. 9, makes the fiber waveguide that core dimensions is about 50 microns；
Step 51 a, it is provided that thickness is the glass substrate 1 of 1.5 millimeters；
Step 52, the method in described glass substrate 1 upper surface thermal evaporation or sputtering makes a layer thickness
It is the aluminum film of 80～200 nanometers, is retained by photoetching and wet corrosion technique and on glass substrate 1, make light wave
On the region led, width is the thin film of 100-150 micron, as mask 6.
Step 53, the glass substrate 1 that will be formed with mask 6 is placed in the potassium nitrate fused salt of 330-420 DEG C guarantor
Hold 60-900 minute；During this, the potassium ion in described potassium nitrate fused salt acts on described through thermal diffusion
The region of mask 6 both sides of glass substrate 1 forms potassium ion diffusion region；
Step 54, after being cooled down by described glass substrate 1, uses the method for corrosion to remove described glass substrate 1
The mask 6 on surface；
Step 55, is placed in described glass substrate 1 in the fused salt mixt of sodium nitrate, calcium carbonate and silver nitrate
Keep 20-240 minute, the formation ion doped region, region 4 of waveguide core 2；Wherein, the rubbing of three kinds of compositions
You are respectively 10-90%, 10-90%, 0.1-5% by percent；Temperature during this is between 220-300 DEG C；
Step 56, sodium nitrate and the fused salt mixt of calcium carbonate at described glass substrate 1 is inserted 220-300 DEG C
In, keeping 20-180 minute, the ion on the surface of described ion doped region 4 enters dopant ion
In fused salt 9, formed on the surface of described ion doped region 4 and remove doped region 5；In described ion doped region 4,
It is described that to go doped region 5 area below be waveguide core 2；Wherein, sodium nitrate and two kinds of compositions of calcium carbonate
Mole percent is respectively 10-90%, 10-90%.
The fiber waveguide manufacture method that the present invention provides forms melting containing a kind of cation by ion exchange technique
Salt diffusion region 3, the left and right sides of the ion doped region 4 of buried type is expanded with the fused salt containing a kind of cation respectively
Dissipate district 3 to be connected, by the fused salt diffusion region 3 containing a kind of cation, the suppression restriction of dopant ion is covered
The lateral dimension of buried ion doped region 4, makes the symmetry of Optical Waveguide Modes field distribution be improved, and reduces
Coupling loss and loss.Formed by ion anticommuting technology and remove doped region 5, it is ensured that formed
Fiber waveguide is buried light waveguide, reduces the coupling loss of fiber waveguide and owing to glass substrate 1 surface lacks
Fall into the loss that the scattering at place introduces.
The above is the preferred embodiment of the present invention, it is noted that for the common skill of the art
For art personnel, on the premise of without departing from principle of the present invention, it is also possible to make some improvements and modifications,
These improvements and modifications also should be regarded as protection scope of the present invention.
Claims (18)
1. the manufacture method of a fiber waveguide, it is characterised in that comprise the following steps:
One glass substrate is provided；
On described glass substrate, the region of waveguide core both sides forms the fused salt diffusion region containing a kind of cation；
On the described glass substrate of the fused salt diffusion region formed containing a kind of cation, the region shape of waveguide core
Become ion doped region；
On the described glass substrate forming ion doped region, the surface of described ion doped region is formed goes doping
District.
2. the manufacture method of fiber waveguide as claimed in claim 1, it is characterised in that at described glass base
On sheet, the region of waveguide core both sides forms the step of the fused salt diffusion region containing a kind of cation and includes:
On described glass substrate, form the mask used by fused salt diffusion region containing a kind of cation；And it is described
Mask covers the region at waveguide core place；
Will be formed with the glass substrate of mask be placed in containing a kind of cation fused salt in, and keep first to preset
Time period, form the fused salt diffusion region containing a kind of cation in the region of the mask both sides of described glass substrate.
3. the manufacture method of fiber waveguide as claimed in claim 2, it is characterised in that at described glass base
On sheet, the step forming the mask used by fused salt diffusion region containing a kind of cation includes:
Thin film is made in the upper surface thermal evaporation of described glass substrate or the method for sputtering；
Retaining waveguide core region upper width on described glass substrate by photoetching and wet corrosion technique is
The thin film of the first predetermined width, as the mask used by the fused salt diffusion region containing a kind of cation.
4. the manufacture method of fiber waveguide as claimed in claim 3, it is characterised in that the material of described mask
Matter is aluminum or chrome copper or silicon dioxide.
5. the manufacture method of fiber waveguide as claimed in claim 2, it is characterised in that described containing a kind of sun
Cation in the fused salt of ion is potassium ion.
6. the manufacture method of fiber waveguide as claimed in claim 5, it is characterised in that will be formed with mask
Glass substrate be placed in containing a kind of cation fused salt in, and keep the first preset time period, at described glass
The region of the mask both sides of glass substrate forms the step of the fused salt diffusion region containing a kind of cation and includes:
The glass substrate that will be formed with mask is placed in the potassium nitrate fused salt of 330-420 DEG C, keeps first to preset
Time period；
Potassium ion in described potassium nitrate fused salt acts on the mask both sides of described glass substrate through thermal diffusion
Region forms potassium ion diffusion region.
7. the manufacture method of fiber waveguide as claimed in claim 1, it is characterised in that described waveguide is bar
Shape, described mask covers bar shaped waveguide core region, the center of described mask and described slab waveguide
Center overlaps, and the length of described mask is more than or equal to the length of the core of described slab waveguide.
8. the manufacture method of fiber waveguide as claimed in claim 6, it is characterised in that formed containing one
On the described glass substrate of the fused salt diffusion region of cation, the step of the formation ion doped region, region of waveguide core
Suddenly include:
Described mask is removed from described glass substrate；
Described glass substrate is placed in the fused salt containing dopant ion, keeps the second preset time period, described
Dopant ion diffuses into the region of waveguide core, forms ion doped region, the both sides of described ion doped region
It is connected with described potassium ion diffusion region respectively.
9. the manufacture method of fiber waveguide as claimed in claim 8, it is characterised in that described dopant ion
For at least one in titanium ion, silver ion or cesium ion.
10. the manufacture method of fiber waveguide as claimed in claim 8, it is characterised in that from described glass base
The step removing described mask on sheet includes:
After being cooled down by described glass substrate, the method for corrosion is used to remove the mask of described glass substrate surface.
The manufacture method of 11. fiber waveguides as claimed in claim 9, it is characterised in that described containing doping
The fused salt of ion is the fused salt mixt of sodium nitrate, calcium carbonate and silver nitrate；Wherein, sodium nitrate, calcium carbonate and
The mole percent of three kinds of compositions of silver nitrate is respectively 10-90%, 10-90%, 0.1-5%.
The manufacture method of 12. fiber waveguides as claimed in claim 8, it is characterised in that at described glass base
On sheet, the surface of described ion doped region is formed goes the step of doped region to include:
Described glass substrate is placed in without in the fused salt of dopant ion, keeps the 3rd preset time period, described
The ion on the surface of ion doped region enters in the fused salt without dopant ion, at the table of described ion doped region
Face is formed and removes doped region.
The manufacture method of 13. fiber waveguides as claimed in claim 12, it is characterised in that by described glass
Substrate is placed in without in the fused salt of dopant ion, keeps the 3rd preset time period, the table of described ion doped region
The ion in face enters in the fused salt without dopant ion, is formed on the surface of described ion doped region and removes doped region
Step include:
At described glass substrate is inserted 220-300 DEG C in the fused salt mixt of sodium nitrate and calcium carbonate, keep the
Three preset time period, the ion on the surface of described ion doped region enters in the fused salt without dopant ion,
The surface of described ion doped region is formed and removes doped region；Wherein, sodium nitrate and two kinds of compositions of calcium carbonate mole
Percent is respectively 10-90%, 10-90%.
The manufacture method of 14. fiber waveguides as claimed in claim 12, it is characterised in that described ion is mixed
In miscellaneous district, described in go doped region area below be waveguide core.
The manufacture method of 15. fiber waveguides as claimed in claim 14, it is characterised in that described in go doping
The refractive index in district is less than the refractive index of described waveguide core；The folding of the glass substrate of bottom, described ion doped region
Penetrate the rate refractive index less than described waveguide core.
The manufacture method of 16. fiber waveguides as claimed in claim 14, it is characterised in that described potassium ion
The refractive index of diffusion region is less than the refractive index of described waveguide core.
The manufacture method of 17. fiber waveguides as claimed in claim 1, it is characterised in that described glass substrate
Material be silicate glass or borosilicate glass or phosphate glass or borate glass.
18. 1 kinds of fiber waveguides, it is characterised in that this fiber waveguide is as described in any one of claim 1-17
Method manufacture fiber waveguide.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510239021.3A CN106291814A (en) | 2015-05-12 | 2015-05-12 | A kind of fiber waveguide manufacture method and fiber waveguide |
| PCT/CN2016/073791 WO2016180061A1 (en) | 2015-05-12 | 2016-02-15 | Optical waveguide manufacturing method, optical waveguide and computer storage medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510239021.3A CN106291814A (en) | 2015-05-12 | 2015-05-12 | A kind of fiber waveguide manufacture method and fiber waveguide |
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| CN106291814A true CN106291814A (en) | 2017-01-04 |
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| CN201510239021.3A Pending CN106291814A (en) | 2015-05-12 | 2015-05-12 | A kind of fiber waveguide manufacture method and fiber waveguide |
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| CN (1) | CN106291814A (en) |
| WO (1) | WO2016180061A1 (en) |
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| CN108828718A (en) * | 2018-06-15 | 2018-11-16 | 深圳市慧康精密仪器有限公司 | A method of improving glass based optical waveguide chip uniformity |
| CN111158084A (en) * | 2020-02-08 | 2020-05-15 | 浙江大学深圳研究院 | Manufacturing method of ion-exchange glass-based surface waveguide spot size converter |
| CN111208607A (en) * | 2020-02-09 | 2020-05-29 | 浙江大学深圳研究院 | Method for manufacturing glass-based spot-size converter by grooved hot plate temperature gradient ion diffusion |
| CN111208608A (en) * | 2020-02-08 | 2020-05-29 | 浙江大学深圳研究院 | Manufacturing method of ion exchange glass-based buried waveguide mode spot converter |
| CN111239898A (en) * | 2020-02-09 | 2020-06-05 | 浙江大学深圳研究院 | Method for manufacturing glass-based buried type spot-size converter by grooved hot plate temperature gradient ion diffusion |
| CN111699424A (en) * | 2018-01-18 | 2020-09-22 | 康宁公司 | Low loss waveguide formed in high transmission glass using Ag-Na ion exchange |
| CN113391396A (en) * | 2021-06-08 | 2021-09-14 | 浙江大学绍兴微电子研究中心 | Method for improving symmetry of glass-based optical waveguide core by adopting inner barrier layer |
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| CN106746740B (en) * | 2016-12-06 | 2019-06-28 | 中国航空工业集团公司北京航空材料研究院 | A method of induction glass surface crystallization is exchanged by High temperature ion |
| CN106746743B (en) * | 2016-12-06 | 2019-06-28 | 中国航空工业集团公司北京航空材料研究院 | A method of glass surface selectivity crystallization is induced by femtosecond laser |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| FI86225C (en) * | 1990-08-23 | 1992-07-27 | Nokia Oy Ab | Adaptation elements for interconnecting different light waveguides and manufacturing process for the same |
| CN1719291A (en) * | 2005-05-25 | 2006-01-11 | 中国科学院上海微系统与信息技术研究所 | A kind of method for making of glass optical waveguide |
| CN100343709C (en) * | 2005-10-12 | 2007-10-17 | 浙江南方通信集团股份有限公司 | Productoion of glass buried light waveguide device by ionic mask method |
| CN100412583C (en) * | 2006-05-08 | 2008-08-20 | 浙江南方通信集团股份有限公司 | Method for preparing glass waveguide by single-side molten salt electric field assistant ion exchange |
| CN100392446C (en) * | 2006-05-08 | 2008-06-04 | 浙江南方通信集团股份有限公司 | Method for preparing glass waveguide by ion mask |
| CN102645701B (en) * | 2012-05-04 | 2013-07-31 | 上海光芯集成光学股份有限公司 | Method for producing optical waveguide on surface of glass substrate by utilizing ion exchange method |
-
2015
- 2015-05-12 CN CN201510239021.3A patent/CN106291814A/en active Pending
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2016
- 2016-02-15 WO PCT/CN2016/073791 patent/WO2016180061A1/en active Application Filing
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| CN111699424A (en) * | 2018-01-18 | 2020-09-22 | 康宁公司 | Low loss waveguide formed in high transmission glass using Ag-Na ion exchange |
| US12030809B2 (en) | 2018-01-18 | 2024-07-09 | Corning Incorporated | Low-loss waveguides formed in high-transmission glass using ag-na ion exchange |
| CN108828718A (en) * | 2018-06-15 | 2018-11-16 | 深圳市慧康精密仪器有限公司 | A method of improving glass based optical waveguide chip uniformity |
| CN111158084A (en) * | 2020-02-08 | 2020-05-15 | 浙江大学深圳研究院 | Manufacturing method of ion-exchange glass-based surface waveguide spot size converter |
| CN111208608A (en) * | 2020-02-08 | 2020-05-29 | 浙江大学深圳研究院 | Manufacturing method of ion exchange glass-based buried waveguide mode spot converter |
| CN111208607A (en) * | 2020-02-09 | 2020-05-29 | 浙江大学深圳研究院 | Method for manufacturing glass-based spot-size converter by grooved hot plate temperature gradient ion diffusion |
| CN111239898A (en) * | 2020-02-09 | 2020-06-05 | 浙江大学深圳研究院 | Method for manufacturing glass-based buried type spot-size converter by grooved hot plate temperature gradient ion diffusion |
| CN113391396A (en) * | 2021-06-08 | 2021-09-14 | 浙江大学绍兴微电子研究中心 | Method for improving symmetry of glass-based optical waveguide core by adopting inner barrier layer |
| CN113391396B (en) * | 2021-06-08 | 2023-09-19 | 浙江大学绍兴微电子研究中心 | Method for improving core symmetry of glass-based optical waveguide by adopting inner barrier layer |
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