CN106252477A - 一种复合全反射镜的倒装led芯片结构及制作方法 - Google Patents
一种复合全反射镜的倒装led芯片结构及制作方法 Download PDFInfo
- Publication number
- CN106252477A CN106252477A CN201610928495.3A CN201610928495A CN106252477A CN 106252477 A CN106252477 A CN 106252477A CN 201610928495 A CN201610928495 A CN 201610928495A CN 106252477 A CN106252477 A CN 106252477A
- Authority
- CN
- China
- Prior art keywords
- layer
- dbr
- type gan
- type
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 29
- 150000001875 compounds Chemical class 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 22
- 238000005520 cutting process Methods 0.000 claims abstract description 4
- 238000000227 grinding Methods 0.000 claims abstract description 4
- 238000001259 photo etching Methods 0.000 claims abstract description 4
- 229910052594 sapphire Inorganic materials 0.000 claims description 14
- 239000010980 sapphire Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- 230000000903 blocking effect Effects 0.000 claims description 9
- 238000005566 electron beam evaporation Methods 0.000 claims description 9
- 238000001459 lithography Methods 0.000 claims description 9
- 229910052681 coesite Inorganic materials 0.000 claims description 7
- 229910052906 cristobalite Inorganic materials 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052682 stishovite Inorganic materials 0.000 claims description 7
- 229910052905 tridymite Inorganic materials 0.000 claims description 7
- 239000000945 filler Substances 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 238000010276 construction Methods 0.000 abstract description 7
- 239000002131 composite material Substances 0.000 abstract description 6
- 238000000605 extraction Methods 0.000 abstract description 6
- 238000000985 reflectance spectrum Methods 0.000 abstract description 6
- 238000005530 etching Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0075—Processes for devices with an active region comprising only III-V compounds comprising nitride compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610928495.3A CN106252477B (zh) | 2016-10-31 | 2016-10-31 | 一种复合全反射镜的倒装led芯片结构及制作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610928495.3A CN106252477B (zh) | 2016-10-31 | 2016-10-31 | 一种复合全反射镜的倒装led芯片结构及制作方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106252477A true CN106252477A (zh) | 2016-12-21 |
CN106252477B CN106252477B (zh) | 2018-11-02 |
Family
ID=57600711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610928495.3A Active CN106252477B (zh) | 2016-10-31 | 2016-10-31 | 一种复合全反射镜的倒装led芯片结构及制作方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN106252477B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106997917A (zh) * | 2017-05-08 | 2017-08-01 | 珠海市芯半导体科技有限公司 | 一种led倒装芯片及其制备方法 |
CN109326686A (zh) * | 2018-09-12 | 2019-02-12 | 聚灿光电科技(宿迁)有限公司 | 一种倒装发光二极管芯片的制作方法 |
CN112909139A (zh) * | 2021-02-01 | 2021-06-04 | 扬州乾照光电有限公司 | 一种基于dbr结构的led芯片及其制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020038869A1 (en) * | 2000-09-29 | 2002-04-04 | Keiji Takaoka | Vertical cavity-type semiconductor light-emitting device and optical module using vertical cavity -type semiconductor light-emitting device |
CN102082216A (zh) * | 2009-11-26 | 2011-06-01 | 上海蓝光科技有限公司 | 一种发光二极管芯片及其制造方法 |
CN102969414A (zh) * | 2011-08-31 | 2013-03-13 | 日亚化学工业株式会社 | 半导体发光元件 |
CN103078024A (zh) * | 2013-01-31 | 2013-05-01 | 武汉迪源光电科技有限公司 | 一种具有反射镜结构的发光二极管 |
CN104037277A (zh) * | 2014-06-26 | 2014-09-10 | 圆融光电科技有限公司 | 倒装led芯片的制备方法及倒装led芯片 |
-
2016
- 2016-10-31 CN CN201610928495.3A patent/CN106252477B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020038869A1 (en) * | 2000-09-29 | 2002-04-04 | Keiji Takaoka | Vertical cavity-type semiconductor light-emitting device and optical module using vertical cavity -type semiconductor light-emitting device |
CN102082216A (zh) * | 2009-11-26 | 2011-06-01 | 上海蓝光科技有限公司 | 一种发光二极管芯片及其制造方法 |
CN102969414A (zh) * | 2011-08-31 | 2013-03-13 | 日亚化学工业株式会社 | 半导体发光元件 |
CN103078024A (zh) * | 2013-01-31 | 2013-05-01 | 武汉迪源光电科技有限公司 | 一种具有反射镜结构的发光二极管 |
CN104037277A (zh) * | 2014-06-26 | 2014-09-10 | 圆融光电科技有限公司 | 倒装led芯片的制备方法及倒装led芯片 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106997917A (zh) * | 2017-05-08 | 2017-08-01 | 珠海市芯半导体科技有限公司 | 一种led倒装芯片及其制备方法 |
CN109326686A (zh) * | 2018-09-12 | 2019-02-12 | 聚灿光电科技(宿迁)有限公司 | 一种倒装发光二极管芯片的制作方法 |
CN112909139A (zh) * | 2021-02-01 | 2021-06-04 | 扬州乾照光电有限公司 | 一种基于dbr结构的led芯片及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN106252477B (zh) | 2018-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103975451B (zh) | 制造半导体发光器件的方法 | |
CN103988322B (zh) | 半导体发光器件 | |
CN105378951B (zh) | 高度反射倒装芯片led管芯 | |
US7135709B1 (en) | Surface structured light-emitting diode with improved current coupling | |
CN101604723B (zh) | 发射辐射半导体器件 | |
CN102779917B (zh) | 半导体芯片和用于制造半导体芯片的方法 | |
JP5231701B2 (ja) | 放射線を発する半導体デバイス及びその製造方法 | |
US8546819B2 (en) | Light emitting device and fabrication method thereof | |
CN103682004B (zh) | 一种改善出光率的发光二极管倒装芯片及其制备方法 | |
TWI472062B (zh) | 半導體發光裝置及其製造方法 | |
CN105009308B (zh) | 用于创建多孔反射接触件的方法和装置 | |
CN103946994B (zh) | 半导体发光器件 | |
CN104011887A (zh) | 半导体发光器件 | |
JP2004179347A (ja) | 半導体発光素子 | |
CN106252477A (zh) | 一种复合全反射镜的倒装led芯片结构及制作方法 | |
CN108336200A (zh) | Led芯片结构及其制备方法 | |
CN102447016A (zh) | 发光二极管结构及其制作方法 | |
KR100999713B1 (ko) | 발광소자 및 그 제조방법 | |
CN113555484B (zh) | 高光效倒装led芯片及其制备方法 | |
JP2012529170A (ja) | 発光半導体装置及び製造方法 | |
CN101656283B (zh) | 发光二极管组件及其制造方法 | |
DE102021111355A1 (de) | Leuchtvorrichtung | |
JP2004128321A (ja) | 半導体発光素子 | |
CN116646441A (zh) | 一种微显示芯片及其制备方法 | |
CN106159075A (zh) | 一种具有低热阻绝缘层结构的倒装led芯片及制作方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20180920 Address after: 214192 18 Xishan North Road, Xishan Economic Development Zone, Wuxi, Jiangsu Applicant after: Jiangsu Xinguanglian Technology Co., Ltd. Address before: 214192 18 Xishan North Road, Xishan Economic Development Zone, Wuxi, Jiangsu Applicant before: Jiangsu Xinguanglian Semiconductors Co., Ltd. |
|
TA01 | Transfer of patent application right | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20181018 Address after: 214192 18 Xishan North Road, Xishan Economic Development Zone, Wuxi, Jiangsu Applicant after: Jiangsu Xinguanglian Technology Co., Ltd. Applicant after: Jiangsu Xinguanglian Semiconductors Co., Ltd. Address before: 214192 18 Xishan North Road, Xishan Economic Development Zone, Wuxi, Jiangsu Applicant before: Jiangsu Xinguanglian Technology Co., Ltd. |
|
TA01 | Transfer of patent application right |