CN106221587B - A kind of alumina base chemical mechanical polishing liquid - Google Patents
A kind of alumina base chemical mechanical polishing liquid Download PDFInfo
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- CN106221587B CN106221587B CN201610705555.5A CN201610705555A CN106221587B CN 106221587 B CN106221587 B CN 106221587B CN 201610705555 A CN201610705555 A CN 201610705555A CN 106221587 B CN106221587 B CN 106221587B
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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Abstract
The present invention relates to a kind of alumina base chemical mechanical polishing liquids, are grouped as by the group of following mass fraction：16~20 parts of alumina powder,18~22 parts of Glycerin, mixed triester with caprylic acid capric acid,14~18 parts of tertiary butyl cellosolve,12~16 parts of diethanolamine of fat acyl,18~22 parts of alcohol ether mono sulfosuccinates,14~18 parts of butyl carbitol,12~16 parts of sodium polyphosphate,18~22 parts of calcium sorbate,14~18 parts of glycerol decanoate,12~16 parts of oxalic acid,18~22 parts of mercapto benzothiazole sodium,14~18 parts of diethylene triamine pentamethylene phosphonic,14~18 parts of paranitrobenzoic acid,12~16 parts of sodium tetraborate decahydrate,18~22 parts of silicon oxide powder,14~18 parts of alpha-silicon nitride powders,12~16 parts of Bravo,18~22 parts of triethanolamine,14~18 parts of xanthans,12~16 parts of imidazolidinyl urea,18~22 parts of cetanol,14~18 parts of diethylene glycol dibenzoate,12~16 parts of decabromodiphenylethane,10000~20000 parts of water.Product in the present invention has preferable polishing effect.
Description
Technical field
The present invention relates to a kind of alumina base chemical mechanical polishing liquids, belong to polishing agent technical field.
Background technology
Polishing fluid is a kind of water-soluble polishing agent without any sulphur, phosphorus, chlorine additive, and polishing fluid has good deoil
Dirt, antirust are cleaned and performance of adding lustre to, and metal product can be made to be more than original gloss.Performance is stable, nontoxic, to environment without dirt
The effects that dye.This product performance is stable, nontoxic, it is environmentally safe the effects that, light liquid application method：Including ratchet spanner, open
Mouth spanner, batch nozzle, box spanner, die nut, screwdriver etc., the metal products such as terne metal, kirsite after grinding,
Polishing agent cooperation vibro-grinding light polishing machine is reused, drum-type grinding light formula machine is polished；1 polishing agent injected volume be (according to
The product brightness of the size of different product, the size of light polishing machine and each company requires to carry out appropriately configured), 2：Polishing time：
Determined according to the state of product.3, it cleans primary with clear water after the completion of polishing and dries.
Invention content
The purpose of the present invention is to provide a kind of alumina base chemical mechanical polishing liquids, so that alumina base is better achieved
The function of chemical mechanical polishing liquid.
To achieve the goals above, technical scheme is as follows.
A kind of alumina base chemical mechanical polishing liquid, is grouped as by the group of following mass fraction：Alumina powder 16~20
Part, 18~22 parts of Glycerin, mixed triester with caprylic acid capric acid, 14~18 parts of tertiary butyl cellosolve, 12~16 parts of diethanolamine of fat acyl, alcohol ether sulfo group
18~22 parts of monomester succinate disodium salt, 14~18 parts of butyl carbitol, 12~16 parts of sodium polyphosphate, calcium sorbate 18~22
Part, 14~18 parts of glycerol decanoate, 12~16 parts of oxalic acid, 18~22 parts of mercapto benzothiazole sodium, five methene phosphine of diethylenetriamine
14~18 parts of acid, 14~18 parts of paranitrobenzoic acid, 12~16 parts of sodium tetraborate decahydrate, 18~22 parts of silicon oxide powder, nitridation
14~18 parts of Si powder, 12~16 parts of Bravo, 18~22 parts of triethanolamine, 14~18 parts of xanthans, imidazolidinyl urea 12~
16 parts, 18~22 parts of cetanol, 14~18 parts of diethylene glycol dibenzoate, 12~16 parts of decabromodiphenylethane, water 10000~
20000 parts.
Further, above-mentioned alumina base chemical mechanical polishing liquid, is grouped as by the group of following mass fraction：Alumina powder
16 parts of end, 18 parts of Glycerin, mixed triester with caprylic acid capric acid, 14 parts of tertiary butyl cellosolve, 12 parts of diethanolamine of fat acyl, alcohol ether sulfosuccinic acid list
18 parts of ester disodium salt, 14 parts of butyl carbitol, 12 parts of sodium polyphosphate, 18 parts of calcium sorbate, 14 parts of glycerol decanoate, oxalic acid 12
Part, 18 parts of mercapto benzothiazole sodium, 14 parts of diethylene triamine pentamethylene phosphonic, 14 parts of paranitrobenzoic acid, sodium tetraborate decahydrate
12 parts, 18 parts of silicon oxide powder, 14 parts of alpha-silicon nitride powders, 12 parts of Bravo, 18 parts of triethanolamine, 14 parts of xanthans, imidazolidine
12 parts of base urea, 18 parts of cetanol, 14 parts of diethylene glycol dibenzoate, 12 parts of decabromodiphenylethane, 10000 parts of water.
Further, above-mentioned alumina base chemical mechanical polishing liquid, is grouped as by the group of following mass fraction：Alumina powder
18 parts of end, 20 parts of Glycerin, mixed triester with caprylic acid capric acid, 16 parts of tertiary butyl cellosolve, 14 parts of diethanolamine of fat acyl, alcohol ether sulfosuccinic acid list
20 parts of ester disodium salt, 16 parts of butyl carbitol, 14 parts of sodium polyphosphate, 20 parts of calcium sorbate, 16 parts of glycerol decanoate, oxalic acid 14
Part, 20 parts of mercapto benzothiazole sodium, 16 parts of diethylene triamine pentamethylene phosphonic, 16 parts of paranitrobenzoic acid, sodium tetraborate decahydrate
14 parts, 20 parts of silicon oxide powder, 16 parts of alpha-silicon nitride powders, 14 parts of Bravo, 20 parts of triethanolamine, 16 parts of xanthans, imidazolidine
14 parts of base urea, 20 parts of cetanol, 16 parts of diethylene glycol dibenzoate, 14 parts of decabromodiphenylethane, 15000 parts of water.
Further, above-mentioned alumina base chemical mechanical polishing liquid, is grouped as by the group of following mass fraction：Alumina powder
20 parts of end, 22 parts of Glycerin, mixed triester with caprylic acid capric acid, 18 parts of tertiary butyl cellosolve, 16 parts of diethanolamine of fat acyl, alcohol ether sulfosuccinic acid list
22 parts of ester disodium salt, 18 parts of butyl carbitol, 16 parts of sodium polyphosphate, 22 parts of calcium sorbate, 18 parts of glycerol decanoate, oxalic acid 16
Part, 22 parts of mercapto benzothiazole sodium, 18 parts of diethylene triamine pentamethylene phosphonic, 18 parts of paranitrobenzoic acid, sodium tetraborate decahydrate
16 parts, 22 parts of silicon oxide powder, 18 parts of alpha-silicon nitride powders, 16 parts of Bravo, 22 parts of triethanolamine, 18 parts of xanthans, imidazolidine
16 parts of base urea, 22 parts of cetanol, 18 parts of diethylene glycol dibenzoate, 16 parts of decabromodiphenylethane, 20000 parts of water.
Further, steps are as follows for above-mentioned alumina base chemical mechanical polishing liquid preparation method：
(1) by the alumina powder of the mass fraction, Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve, fatty acyl diethanol
Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, paranitrobenzoic acid, sodium tetraborate decahydrate, oxygen
SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, decabromodiphenylethane are added in the water of above-mentioned mass fraction, ultrasound
High speed dispersion, ultrasonic frequency are 20~40KHz, and 5000~5400r/min of rate of dispersion, jitter time is 30~60min；
(2) be added the butyl carbitol of the mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid,
Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency be 20~35KHz, rate of dispersion 4800~
5200r/min, jitter time are 30~50min；
(3) Bravo, triethanolamine, xanthans, imidazolidinyl urea, the cetanol of the mass fraction is added, ultrasound is high
Speed dispersion, ultrasonic frequency are 20~30KHz, and 4600~4800r/min of rate of dispersion, jitter time is 20~40min；Mixing
Obtained this product after uniformly.
Invention has the beneficial effects that：This alumina base chemical mechanical polishing liquid process of preparing is simple, the present invention
In product have preferable polishing effect, and have preferable sterilizing function, performance also more excellent to human injury
It is small.
Specific implementation mode
The specific implementation mode of the present invention is described with reference to embodiment, to be better understood from the present invention.
Embodiment 1
Alumina base chemical mechanical polishing liquid in the present embodiment, is grouped as by the group of following mass fraction：Alumina powder
16 parts of end, 18 parts of Glycerin, mixed triester with caprylic acid capric acid, 14 parts of tertiary butyl cellosolve, 12 parts of diethanolamine of fat acyl, alcohol ether sulfosuccinic acid list
18 parts of ester disodium salt, 14 parts of butyl carbitol, 12 parts of sodium polyphosphate, 18 parts of calcium sorbate, 14 parts of glycerol decanoate, oxalic acid 12
Part, 18 parts of mercapto benzothiazole sodium, 14 parts of diethylene triamine pentamethylene phosphonic, 14 parts of paranitrobenzoic acid, sodium tetraborate decahydrate
12 parts, 18 parts of silicon oxide powder, 14 parts of alpha-silicon nitride powders, 12 parts of Bravo, 18 parts of triethanolamine, 14 parts of xanthans, imidazolidine
12 parts of base urea, 18 parts of cetanol, 14 parts of diethylene glycol dibenzoate, 12 parts of decabromodiphenylethane, 10000 parts of water.
Steps are as follows for above-mentioned alumina base chemical mechanical polishing liquid preparation method：
(1) by the alumina powder of the mass fraction, Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve, fatty acyl diethanol
Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, paranitrobenzoic acid, sodium tetraborate decahydrate, oxygen
SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, decabromodiphenylethane are added in the water of above-mentioned mass fraction, ultrasound
High speed dispersion, ultrasonic frequency 20kHz, rate of dispersion 5400r/min, jitter time 60min；
(2) be added the butyl carbitol of the mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid,
Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency 20kHz, rate of dispersion 5200r/min, jitter time are
50min；
(3) Bravo, triethanolamine, xanthans, imidazolidinyl urea, the cetanol of the mass fraction is added, ultrasound is high
Speed dispersion, ultrasonic frequency 20kHz, rate of dispersion 4800r/min, jitter time 40min；This is made after mixing
Product.
Embodiment 2
Alumina base chemical mechanical polishing liquid in the present embodiment, is grouped as by the group of following mass fraction：Alumina powder
18 parts of end, 20 parts of Glycerin, mixed triester with caprylic acid capric acid, 16 parts of tertiary butyl cellosolve, 14 parts of diethanolamine of fat acyl, alcohol ether sulfosuccinic acid list
20 parts of ester disodium salt, 16 parts of butyl carbitol, 14 parts of sodium polyphosphate, 20 parts of calcium sorbate, 16 parts of glycerol decanoate, oxalic acid 14
Part, 20 parts of mercapto benzothiazole sodium, 16 parts of diethylene triamine pentamethylene phosphonic, 16 parts of paranitrobenzoic acid, sodium tetraborate decahydrate
14 parts, 20 parts of silicon oxide powder, 16 parts of alpha-silicon nitride powders, 14 parts of Bravo, 20 parts of triethanolamine, 16 parts of xanthans, imidazolidine
14 parts of base urea, 20 parts of cetanol, 16 parts of diethylene glycol dibenzoate, 14 parts of decabromodiphenylethane, 15000 parts of water.
Steps are as follows for above-mentioned alumina base chemical mechanical polishing liquid preparation method：
(1) by the alumina powder of the mass fraction, Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve, fatty acyl diethanol
Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, paranitrobenzoic acid, sodium tetraborate decahydrate, oxygen
SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, decabromodiphenylethane are added in the water of above-mentioned mass fraction, ultrasound
High speed dispersion, ultrasonic frequency 30kHz, rate of dispersion 5200r/min, jitter time 45min；
(2) be added the butyl carbitol of the mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid,
Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency 27kHz, rate of dispersion 5000r/min, jitter time are
40min；
(3) Bravo, triethanolamine, xanthans, imidazolidinyl urea, the cetanol of the mass fraction is added, ultrasound is high
Speed dispersion, ultrasonic frequency 25kHz, rate of dispersion 4700r/min, jitter time 30min；This is made after mixing
Product.
Embodiment 3
Alumina base chemical mechanical polishing liquid in the present embodiment, is grouped as by the group of following mass fraction：Alumina powder
20 parts of end, 22 parts of Glycerin, mixed triester with caprylic acid capric acid, 18 parts of tertiary butyl cellosolve, 16 parts of diethanolamine of fat acyl, alcohol ether sulfosuccinic acid list
22 parts of ester disodium salt, 18 parts of butyl carbitol, 16 parts of sodium polyphosphate, 22 parts of calcium sorbate, 18 parts of glycerol decanoate, oxalic acid 16
Part, 22 parts of mercapto benzothiazole sodium, 18 parts of diethylene triamine pentamethylene phosphonic, 18 parts of paranitrobenzoic acid, sodium tetraborate decahydrate
16 parts, 22 parts of silicon oxide powder, 18 parts of alpha-silicon nitride powders, 16 parts of Bravo, 22 parts of triethanolamine, 18 parts of xanthans, imidazolidine
16 parts of base urea, 22 parts of cetanol, 18 parts of diethylene glycol dibenzoate, 16 parts of decabromodiphenylethane, 20000 parts of water.
Steps are as follows for above-mentioned alumina base chemical mechanical polishing liquid preparation method：
(1) by the alumina powder of the mass fraction, Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve, fatty acyl diethanol
Amine, alcohol ether mono sulfosuccinates, diethylene triamine pentamethylene phosphonic, paranitrobenzoic acid, sodium tetraborate decahydrate, oxygen
SiClx powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, decabromodiphenylethane are added in the water of above-mentioned mass fraction, ultrasound
High speed dispersion, ultrasonic frequency 40kHz, rate of dispersion 5000r/min, jitter time 30min；
(2) be added the butyl carbitol of the mass fraction, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid,
Mercapto benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency 35kHz, rate of dispersion 4800r/min, jitter time are
30min；
(3) Bravo, triethanolamine, xanthans, imidazolidinyl urea, the cetanol of the mass fraction is added, ultrasound is high
Speed dispersion, ultrasonic frequency 30kHz, rate of dispersion 4600r/min, jitter time 20min；This is made after mixing
Product.
Contrast on effect is carried out to above-described embodiment sample, contrast sample is certain commercially available polishing fluid, comparing result such as 1 institute of table
Show.
1 product Contrast on effect of the embodiment of the present invention of table
Wherein, polishing effect is given a mark：4 indicate, 3 indicate preferable, and 2 indicate qualified, and 1 indicates poor.
As it can be seen that the product in the present invention, has preferable polishing effect, and have preferable sterilizing function, performance
More excellent is small to human injury.
The above is the preferred embodiment of the present invention, it is noted that for those skilled in the art
For, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also considered as
Protection scope of the present invention.
Claims (5)
1. a kind of alumina base chemical mechanical polishing liquid, it is characterised in that：It is grouped as by the group of following mass fraction：Alumina powder
End 16~20 parts, 18~22 parts of Glycerin, mixed triester with caprylic acid capric acid, 14~18 parts of tertiary butyl cellosolve, 12~16 parts of diethanolamine of fat acyl,
18~22 parts of alcohol ether mono sulfosuccinates, 14~18 parts of butyl carbitol, 12~16 parts of sodium polyphosphate, sorbic acid
18~22 parts of calcium, 14~18 parts of glycerol decanoate, 12~16 parts of oxalic acid, 18~22 parts of mercapto benzothiazole sodium, diethylenetriamine
Five 14~18 parts of methylenephosphonic acids, 14~18 parts of paranitrobenzoic acid, 12~16 parts of sodium tetraborate decahydrate, silicon oxide powder 18~22
Part, 14~18 parts of alpha-silicon nitride powders, 12~16 parts of Bravo, 18~22 parts of triethanolamine, 14~18 parts of xanthans, imidazolidinyl
12~16 parts of urea, 18~22 parts of cetanol, 14~18 parts of diethylene glycol dibenzoate, 12~16 parts of decabromodiphenylethane, water
10000~20000 parts.
2. alumina base chemical mechanical polishing liquid according to claim 1, it is characterised in that：The alumina base chemistry machine
Tool polishing fluid is grouped as by the group of following mass fraction：16 parts of alumina powder, 18 parts of Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve
14 parts, 12 parts of diethanolamine of fat acyl, 18 parts of alcohol ether mono sulfosuccinates, 14 parts of butyl carbitol, polyphosphoric acids
12 parts of sodium, 18 parts of calcium sorbate, 14 parts of glycerol decanoate, 12 parts of oxalic acid, 18 parts of mercapto benzothiazole sodium, five first of diethylenetriamine
Pitch 14 parts of phosphonic acids, 14 parts of paranitrobenzoic acid, 12 parts of sodium tetraborate decahydrate, 18 parts of silicon oxide powder, 14 parts of alpha-silicon nitride powders, hundred
Bacterium is 12 parts clear, 18 parts of triethanolamine, 14 parts of xanthans, 12 parts of imidazolidinyl urea, 18 parts of cetanol, diethylene glycol dibenzoate 14
Part, 12 parts of decabromodiphenylethane, 10000 parts of water.
3. alumina base chemical mechanical polishing liquid according to claim 1, it is characterised in that：The alumina base chemistry machine
Tool polishing fluid is grouped as by the group of following mass fraction：18 parts of alumina powder, 20 parts of Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve
16 parts, 14 parts of diethanolamine of fat acyl, 20 parts of alcohol ether mono sulfosuccinates, 16 parts of butyl carbitol, polyphosphoric acids
14 parts of sodium, 20 parts of calcium sorbate, 16 parts of glycerol decanoate, 14 parts of oxalic acid, 20 parts of mercapto benzothiazole sodium, five first of diethylenetriamine
Pitch 16 parts of phosphonic acids, 16 parts of paranitrobenzoic acid, 14 parts of sodium tetraborate decahydrate, 20 parts of silicon oxide powder, 16 parts of alpha-silicon nitride powders, hundred
Bacterium is 14 parts clear, 20 parts of triethanolamine, 16 parts of xanthans, 14 parts of imidazolidinyl urea, 20 parts of cetanol, diethylene glycol dibenzoate 16
Part, 14 parts of decabromodiphenylethane, 15000 parts of water.
4. alumina base chemical mechanical polishing liquid according to claim 1, it is characterised in that：The alumina base chemistry machine
Tool polishing fluid is grouped as by the group of following mass fraction：20 parts of alumina powder, 22 parts of Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve
18 parts, 16 parts of diethanolamine of fat acyl, 22 parts of alcohol ether mono sulfosuccinates, 18 parts of butyl carbitol, polyphosphoric acids
16 parts of sodium, 22 parts of calcium sorbate, 18 parts of glycerol decanoate, 16 parts of oxalic acid, 22 parts of mercapto benzothiazole sodium, five first of diethylenetriamine
Pitch 18 parts of phosphonic acids, 18 parts of paranitrobenzoic acid, 16 parts of sodium tetraborate decahydrate, 22 parts of silicon oxide powder, 18 parts of alpha-silicon nitride powders, hundred
Bacterium is 16 parts clear, 22 parts of triethanolamine, 18 parts of xanthans, 16 parts of imidazolidinyl urea, 22 parts of cetanol, diethylene glycol dibenzoate 18
Part, 16 parts of decabromodiphenylethane, 20000 parts of water.
5. alumina base chemical mechanical polishing liquid according to claim 1, it is characterised in that：The alumina base chemistry machine
Tool polishes liquid and preparation method thereof, and steps are as follows：
(1) by the alumina powder of the mass fraction, Glycerin, mixed triester with caprylic acid capric acid, tertiary butyl cellosolve, diethanolamine of fat acyl, alcohol
Ether sulfosuccinic acid monoester disodium salt, diethylene triamine pentamethylene phosphonic, paranitrobenzoic acid, sodium tetraborate decahydrate, silica
Powder, alpha-silicon nitride powders, diethylene glycol dibenzoate, decabromodiphenylethane are added in the water of above-mentioned mass fraction, ultrasound high speed
Dispersion, ultrasonic frequency are 20~40KHz, and 5000~5400r/min of rate of dispersion, jitter time is 30~60min；
(2) butyl carbitol, sodium polyphosphate, calcium sorbate, glycerol decanoate, oxalic acid, the sulfydryl of the mass fraction is added
Benzothiazole sodium, ultrasonic high speed dispersion, ultrasonic frequency be 20~35KHz, rate of dispersion 4800~
5200r/min, jitter time are 30~50min；
(3) Bravo, triethanolamine, xanthans, imidazolidinyl urea, the cetanol of the mass fraction, ultrasound high speed point is added
It dissipates, ultrasonic frequency is 20~30KHz, and 4600~4800r/min of rate of dispersion, jitter time is 20~40min；It is uniformly mixed
This product is made afterwards.
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| CN201610705555.5A CN106221587B (en) | 2016-08-23 | 2016-08-23 | A kind of alumina base chemical mechanical polishing liquid |
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| US6150274A (en) * | 1999-05-03 | 2000-11-21 | Winbond Electronics Corp. | Method of enhancing CMP removal rate of polymer-like material and improving planarization in integrated circuit structure |
| CN1560161A (en) * | 2004-03-01 | 2005-01-05 | 长沙矿冶研究院 | Water-based nano diamond polishing solution and preparation method thereof |
| CN101452873A (en) * | 2007-12-06 | 2009-06-10 | 上海华虹Nec电子有限公司 | Shallow trench isolation process |
| CN102337084A (en) * | 2011-07-25 | 2012-02-01 | 郑州磨料磨具磨削研究所 | Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof |
-
2016
- 2016-08-23 CN CN201610705555.5A patent/CN106221587B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6150274A (en) * | 1999-05-03 | 2000-11-21 | Winbond Electronics Corp. | Method of enhancing CMP removal rate of polymer-like material and improving planarization in integrated circuit structure |
| CN1560161A (en) * | 2004-03-01 | 2005-01-05 | 长沙矿冶研究院 | Water-based nano diamond polishing solution and preparation method thereof |
| CN101452873A (en) * | 2007-12-06 | 2009-06-10 | 上海华虹Nec电子有限公司 | Shallow trench isolation process |
| CN102337084A (en) * | 2011-07-25 | 2012-02-01 | 郑州磨料磨具磨削研究所 | Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof |
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