CN106206675A - OLED display screen and manufacture method thereof - Google Patents
OLED display screen and manufacture method thereof Download PDFInfo
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- CN106206675A CN106206675A CN201610871920.XA CN201610871920A CN106206675A CN 106206675 A CN106206675 A CN 106206675A CN 201610871920 A CN201610871920 A CN 201610871920A CN 106206675 A CN106206675 A CN 106206675A
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- 238000000034 method Methods 0.000 title claims abstract description 38
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 239000000463 material Substances 0.000 claims abstract description 99
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 238000010276 construction Methods 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000000465 moulding Methods 0.000 claims description 6
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 5
- 239000007924 injection Substances 0.000 claims description 5
- 230000008859 change Effects 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000006835 compression Effects 0.000 claims description 2
- 238000007906 compression Methods 0.000 claims description 2
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/88—Dummy elements, i.e. elements having non-functional features
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Geometry (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The invention provides a kind of OLED display screen and manufacture method thereof, substrate is formed magneto strictive material, it is interval that described magneto strictive material is positioned at neighbor, form shared layer and cover described magneto strictive material and multiple pixel region, by changing the periphery magnetic field intensity of described magneto strictive material, described magneto strictive material is occurred flexible, so that described shared layer ruptures in neighbor interval, the most just neighbor can be avoided also to work due to the impact of other pixel, i.e. reduce the pixel cross-talk problem of OLED display screen.
Description
Technical field
The present invention relates to display fabrication techniques field, particularly to a kind of OLED display screen and manufacture method thereof.
Background technology
In recent years, center, monitor market is gradually shared by flat faced display (Flat Panel Display, FPD)
According to.Utilize FPD can manufacture large scale and thin and light display device.This kind of FPD includes liquid crystal display (Liquid
Crystal Display, LCD), plasma display (Plasma Display Panel, PDP), organic light-emitting diodes
Pipe (Organic Light Emitting Diode, OLED) display screen etc..
OLED display screen is a kind of emerging flat faced display, and it possesses self-luminous, is not required to backlight, contrast high, thick
Spend thin, visual angle is wide, response speed is fast, can be used for flexibility panel, use that temperature range is wide, structure and the excellence such as processing procedure is simpler
Characteristic, therefore there is extraordinary development prospect.
High PPI (number of pixels that per inch is had) is the trend of display industry development.Along with the lifting of PPI, phase
Distance between adjacent pixel is increasingly nearer, for OLED display screen, owing to the organic material of shared layer has conductive characteristic,
Often making when need not neighbor work, neighbor also can work due to the impact of other pixel.High PPI is easier to produce
Raw crosstalk, so can have a strong impact on OLED display screen colourity and contrast.Implanted layer and transport layer material along with high mobility
The application of material, often leads to OLED display screen crosstalk phenomenon more serious.
Therefore, how to reduce the pixel cross-talk problem of OLED display screen, become that those skilled in the art are urgently to be resolved hurrily one
Individual technical barrier.
Summary of the invention
It is an object of the invention to provide a kind of OLED display screen and manufacture method thereof, to solve OLED of the prior art
The problem that display screen exists pixel cross-talk.
For solving above-mentioned technical problem, the present invention provides a kind of OLED display screen, and described OLED display screen includes: substrate,
There is on described substrate multiple pixel region；It is formed at the magneto strictive material on described substrate, described magneto strictive material
It is positioned at neighbor interval；And cover the plurality of pixel region and the shared layer of described magneto strictive material；Wherein, described common
Rupture in neighbor interval due to the flexible of described magneto strictive material with layer.
Optionally, in described OLED display screen, described OLED display screen also includes the picture being formed on described substrate
Element confining layers, described pixel confining layers limits the position of the plurality of pixel region, and wherein, described magneto strictive material is formed at
In described pixel confining layers.
Optionally, in described OLED display screen, described pixel region confining layers pixel confining layers includes that multiple restriction is tied
Structure, each limiting structure has multiple spaced apart supporting construction, and the embedding of described magneto strictive material is formed at described many
In in space between individual supporting construction.
Optionally, in described OLED display screen, the material of described magneto strictive material includes TbFe2、DyFe2Or
Person SmFe2In one or more.
Optionally, in described OLED display screen, described shared layer includes that the hole injection layer sequentially formed, hole pass
Defeated layer, electron transfer layer and electron injecting layer.
The present invention also provides for the manufacture method of a kind of OLED display screen, and the manufacture method of described OLED display screen includes:
Substrate is provided, described substrate has multiple pixel region；
Forming magneto strictive material on the substrate, it is interval that described magneto strictive material is positioned at neighbor；
The plurality of pixel region and described magneto strictive material cover shared layer；
Change the periphery magnetic field intensity of described magneto strictive material so that described magneto strictive material occurs flexible,
So that described shared layer ruptures in neighbor interval.
Optionally, in the manufacture method of described OLED display screen, form magneto strictive material on the substrate
Before, the manufacture method of described OLED display screen also includes:
Forming pixel confining layers on the substrate, described pixel confining layers limits the position of the plurality of pixel region；
Wherein, described magneto strictive material is formed in described pixel confining layers.
Optionally, in the manufacture method of described OLED display screen, described pixel confining layers includes multiple limiting structure,
Having supporting construction on each limiting structure, described magneto strictive material embeds in described supporting construction.
Optionally, in the manufacture method of described OLED display screen, form magneto strictive material on the substrate
Comprise the technical steps that:
Magneto strictive material is formed under vacuum conditions by press mold moulding process；
Under argon shield, described magneto strictive material is solidified.
Optionally, in the manufacture method of described OLED display screen, in the plurality of pixel region and described magnetostriction
Cover shared layer on material layer to comprise the technical steps that:
Described substrate is adsorbed by magnet plate；
The magnet plate being adsorbed with substrate is fixed on coldplate；
Using evaporation process to form shared layer, described shared layer covers the plurality of pixel region and described magnetostriction materials
Layer.
In the OLED display screen and manufacture method thereof of present invention offer, substrate forms magneto strictive material, institute
State magneto strictive material and be positioned at neighbor interval, form shared layer and cover described magneto strictive material and multiple pixel
District, by changing the periphery magnetic field intensity of described magneto strictive material so that described magneto strictive material occurs flexible, from
And described shared layer is ruptured in neighbor interval, neighbor the most just can be avoided to affect also due to other pixel
Meeting work, i.e. reduces the pixel cross-talk problem of OLED display screen.
Accompanying drawing explanation
Fig. 1～Fig. 4 is the generalized section of the structure that the manufacture method of the OLED display screen of the embodiment of the present invention is formed.
Detailed description of the invention
The OLED display screen proposed the present invention below in conjunction with the drawings and specific embodiments and manufacture method thereof are made further
Describe in detail.According to following explanation and claims, advantages and features of the invention will be apparent from.It should be noted that, accompanying drawing
All use the form simplified very much and all use non-ratio accurately, only in order to convenient, aid illustration present invention enforcement lucidly
The purpose of example.
Refer to Fig. 1～Fig. 4, cuing open of the structure that the manufacture method of its OLED display screen being the embodiment of the present invention is formed
Face schematic diagram.
As it is shown in figure 1, the manufacture method of described OLED display screen includes: provide substrate 10, described substrate 10 has many
Individual pixel region.Common, described substrate 10 is glass substrate.
In the embodiment of the present application, on described substrate 10, anode 12 is then formed.Wherein, the material of described anode 12 can
Thinking transparent conductive material or metal material, such as, the material of described anode 12 can be the conjunction of the alloy of Ag, Ag, Al, Al
Gold, the alloy of Cu, Cu, the alloy etc. of Pt or Pt；Can also be ITO, IZO, AZO or ZTO etc..
Please continue to refer to Fig. 1, in the embodiment of the present application, then, described substrate 10 forms pixel confining layers 11, institute
State pixel confining layers 11 and limit the position of the plurality of pixel region.Concrete, described pixel confining layers 11 includes that multiple restriction is tied
Structure, each limiting structure has supporting construction.Can be to a certain extent to neighbor district by described pixel confining layers 11
Play buffer action, avoid the pixel being subsequently formed also can work due to the impact of other pixel the most to a certain extent.It is also preferred that the left institute
The material stating pixel confining layers 11 is organic gel.I.e., specifically can form the restriction of described pixel by depositing, etch organic glue-line
Layer 11.
Next referring to Fig. 2, described substrate 10 forms magneto strictive material 13.In the embodiment of the present application, tool
Body is formation magneto strictive material 13 in described pixel confining layers 11.Further, described magneto strictive material 13
Embed in multiple supporting constructions of described pixel confining layers 11.Wherein, described magneto strictive material 13 can pass through press mold molding
Technique is formed.Preferably, described magneto strictive material 13 is formed by press mold moulding process under vacuum conditions.Further
, after described magneto strictive material 13 is formed by press mold moulding process, also solidify under argon shield, thus may be used
To improve the quality and reliability of the magneto strictive material 13 formed.Wherein, the material of described magneto strictive material 13
Including TbFe2、DyFe2Or SmFe2In one or more.In addition, described magneto strictive material 13 can also use
Other materials is formed, as long as selected materials disclosure satisfy that the periphery magnetic field intensity changing described magneto strictive material 13, permissible
Described magneto strictive material 13 is occurred flexible.
As it is shown on figure 3, then, forming shared layer 14, described shared layer 14 covers the plurality of pixel region and described mangneto
Strictive material 13.In the embodiment of the present application, described shared layer 14 is formed by evaporation process.Concrete, pass through magnet plate
The 20 described substrates of absorption 10 (another side of i.e. relative with basic 10 one sides at magneto strictive material 13 place substrate 10)；Connect
Employing evaporation process (making the pattern on mask plate 21 be transferred on substrate 10) to be formed on described magneto strictive material 13
Shared layer 14, wherein, described shared layer 14 also covers described pixel confining layers 11 and anode 12.
Further, the magnet plate 20 being adsorbed with substrate 10 described in is fixed on coldplate 22.Thus formed altogether at evaporation
During layer 14, the shared layer 14 formed can be lowered the temperature, and then improve the quality of the shared layer 14 formed
With reliability.
In the embodiment of the present application, described shared layer 14 specifically comprises the steps that hole injection layer；It is formed at described hole to inject
Hole transmission layer on layer；It is formed at the electron transfer layer on described hole transmission layer and is formed on described electron transfer layer
Electron injecting layer.Further, after forming hole injection layer and hole transmission layer, formed on the hole transport layer and send out
Photosphere, then, then forms electron transfer layer and electron injecting layer.
Then, as shown in Figure 4, the magnetic field intensity of described magnet plate 20, thus, described magneto strictive material 13 are changed
Raw flexible, thus described shared layer 14 ruptures in neighbor interval.In the embodiment of the present application, shared layer 14 is being formed
During use magnet plate 20, therefore can change the magnetic field intensity of described magnet plate 20 very easily, and then make described mangneto
Strictive material 13 occurs flexible.In other embodiments of the application, it is also possible at described magneto strictive material 13
Periphery externally-applied magnetic field, makes described magneto strictive material 13 occur by the intensity changing described externally-applied magnetic field flexible, to this
Application is not construed as limiting.
In the embodiment of the present application, the fracture of described shared layer 14 occurs mainly in described pixel confining layers 11 sidewall, or
Person says and the sidewall at described magneto strictive material 13 occurs.It is therefore advantageous to, described pixel confining layers 11 and described mangneto are stretched
Compression material floor 13 is all only arranged between neighbor district.
Additionally, in other embodiments of the application, it is also possible to allow for described magnetostriction after forming hole injection layer
Material layer 13 occurs flexible；Form hole transmission layer again so that described magneto strictive material 13 occurs flexible；Form hole again
Transport layer so that described magneto strictive material 13 occurs flexible ... the rest may be inferred.
Further, negative electrode and polaroid etc. can then be formed on described shared layer 14.Follow-up can be according to prior art
Continuing to manufacture, this is repeated no more by the embodiment of the present application.
After above-mentioned technique, the OLED display screen formed can reduce pixel cross-talk problem greatly.It specifically includes:
Substrate 10, described substrate 10 has multiple pixel region；It is formed at the magneto strictive material 13 on described substrate 10, described magnetic
Cause strictive material 13 and be positioned at neighbor interval；And cover being total to of the plurality of pixel region and described magneto strictive material 13
With layer 14；Wherein, described shared layer 14 occurs disconnected due to the flexible of described magneto strictive material 13 in neighbor interval
Split.
Further, described OLED display screen also includes the pixel confining layers 11 being formed on described substrate 10, described picture
Element confining layers 11 limits the position of the plurality of pixel region, and wherein, described magneto strictive material 13 is formed at described pixel limit
In given layer 11.Described pixel confining layers 11 includes multiple limiting structure, and each limiting structure has multiple spaced apart support
Structure, described magneto strictive material 13 is formed in the space between the plurality of supporting construction.
Preferably, the material of described magneto strictive material 13 includes TbFe2、DyFe2Or SmFe2In one or many
Kind.Described magneto strictive material 13 is formed by press mold moulding process.Described shared layer 14 includes the hole note sequentially formed
Enter layer, hole transmission layer, electron transfer layer and electron injecting layer.Described OLED display screen also includes: be formed at described substrate 10
On anode 12；And it is formed at the negative electrode on described shared layer 14 and polariscope etc..
As fully visible, in the OLED display screen and manufacture method thereof of embodiment of the present invention offer, substrate forms magnetic
Causing strictive material, it is interval that described magneto strictive material is positioned at neighbor, forms shared layer and covers described magnetostriction material
The bed of material and multiple pixel region, by changing the periphery magnetic field intensity of described magneto strictive material so that described magnetostriction material
The bed of material occurs flexible so that described shared layer ruptures in neighbor interval, the most just can avoid neighbor by
Also can work in the impact of other pixel, i.e. reduce the pixel cross-talk problem of OLED display screen.
Foregoing description is only the description to present pre-ferred embodiments, not any restriction to the scope of the invention, this
Any change that the those of ordinary skill in bright field does according to the disclosure above content, modification, belong to the protection of claims
Scope.
Claims (10)
1. an OLED display screen, it is characterised in that described OLED display screen includes: substrate, described substrate has multiple picture
Element district；Being formed at the magneto strictive material on described substrate, it is interval that described magneto strictive material is positioned at neighbor；And cover
Cover the plurality of pixel region and the shared layer of described magneto strictive material；Wherein, described shared layer is due to described magnetostriction
Material layer flexible and rupture in neighbor interval.
2. OLED display screen as claimed in claim 1, it is characterised in that described OLED display screen also includes being formed at described base
Pixel confining layers on plate, described pixel confining layers limits the position of the plurality of pixel region, wherein, described magnetostriction materials
Layer is formed in described pixel confining layers.
3. OLED display screen as claimed in claim 2, it is characterised in that described pixel confining layers includes multiple limiting structure,
Having supporting construction on each limiting structure, described magneto strictive material embeds in described supporting construction.
4. the OLED display screen as according to any one of claims 1 to 3, it is characterised in that described magneto strictive material
Material includes TbFe2、DyFe2Or SmFe2In one or more.
5. the OLED display screen as according to any one of claims 1 to 3, it is characterised in that described shared layer includes shape successively
Hole injection layer, hole transmission layer, electron transfer layer and the electron injecting layer become.
6. the manufacture method of an OLED display screen, it is characterised in that the manufacture method of described OLED display screen includes:
Substrate is provided, described substrate has multiple pixel region；
Forming magneto strictive material on the substrate, it is interval that described magneto strictive material is positioned at neighbor；
The plurality of pixel region and described magneto strictive material cover shared layer；
Change the periphery magnetic field intensity of described magneto strictive material so that described magneto strictive material occurs flexible, thus
Described shared layer is ruptured in neighbor interval.
7. the manufacture method of OLED display screen as claimed in claim 6, it is characterised in that form mangneto on the substrate and stretch
Before compression material layer, the manufacture method of described OLED display screen also includes:
Forming pixel confining layers on the substrate, described pixel confining layers limits the position of the plurality of pixel region；
Wherein, described magneto strictive material is formed in described pixel confining layers.
8. the manufacture method of OLED display screen as claimed in claim 7, it is characterised in that described pixel confining layers includes multiple
Limiting structure, each limiting structure has supporting construction, and described magneto strictive material embeds in described supporting construction.
9. the manufacture method of the OLED display screen as according to any one of claim 6～8, it is characterised in that at described substrate
Upper formation magneto strictive material comprises the technical steps that:
Magneto strictive material is formed under vacuum conditions by press mold moulding process；
Under argon shield, described magneto strictive material is solidified.
10. the manufacture method of OLED display screen as claimed in claim 6, it is characterised in that in the plurality of pixel region and institute
State covering shared layer on magneto strictive material to comprise the technical steps that:
Described substrate is adsorbed by magnet plate；
The magnet plate being adsorbed with substrate is fixed on coldplate；
Using evaporation process to form shared layer, described shared layer covers the plurality of pixel region and described magneto strictive material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610871920.XA CN106206675B (en) | 2016-09-30 | 2016-09-30 | OLED display screen and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610871920.XA CN106206675B (en) | 2016-09-30 | 2016-09-30 | OLED display screen and its manufacturing method |
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| CN106206675A true CN106206675A (en) | 2016-12-07 |
| CN106206675B CN106206675B (en) | 2019-03-08 |
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| CN201610871920.XA Active CN106206675B (en) | 2016-09-30 | 2016-09-30 | OLED display screen and its manufacturing method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108091580A (en) * | 2017-12-11 | 2018-05-29 | 京东方科技集团股份有限公司 | Display panel, pixel isolation wall and preparation method thereof |
| CN109713009A (en) * | 2018-03-06 | 2019-05-03 | 广东聚华印刷显示技术有限公司 | Electroluminescent device and preparation method thereof |
| CN111200000A (en) * | 2020-01-09 | 2020-05-26 | 云谷（固安）科技有限公司 | Display panel and display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050046341A1 (en) * | 2003-08-28 | 2005-03-03 | Nami Ikeda | OLED display and method for manufacturing thereof |
| CN105489631A (en) * | 2015-12-22 | 2016-04-13 | 昆山国显光电有限公司 | Organic light-emitting display device and preparation method thereof |
| CN105590954A (en) * | 2015-12-22 | 2016-05-18 | 昆山国显光电有限公司 | Oled display panel and manufacturing method thereof |
| CN105895664A (en) * | 2016-05-31 | 2016-08-24 | 上海天马有机发光显示技术有限公司 | Display panel, manufacturing method and electronic equipment |
-
2016
- 2016-09-30 CN CN201610871920.XA patent/CN106206675B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050046341A1 (en) * | 2003-08-28 | 2005-03-03 | Nami Ikeda | OLED display and method for manufacturing thereof |
| CN105489631A (en) * | 2015-12-22 | 2016-04-13 | 昆山国显光电有限公司 | Organic light-emitting display device and preparation method thereof |
| CN105590954A (en) * | 2015-12-22 | 2016-05-18 | 昆山国显光电有限公司 | Oled display panel and manufacturing method thereof |
| CN105895664A (en) * | 2016-05-31 | 2016-08-24 | 上海天马有机发光显示技术有限公司 | Display panel, manufacturing method and electronic equipment |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108091580A (en) * | 2017-12-11 | 2018-05-29 | 京东方科技集团股份有限公司 | Display panel, pixel isolation wall and preparation method thereof |
| US10541285B2 (en) | 2017-12-11 | 2020-01-21 | Boe Technology Group Co., Ltd. | Pixel isolation bank and method of manufacturing the same |
| CN109713009A (en) * | 2018-03-06 | 2019-05-03 | 广东聚华印刷显示技术有限公司 | Electroluminescent device and preparation method thereof |
| CN109713009B (en) * | 2018-03-06 | 2020-12-29 | 广东聚华印刷显示技术有限公司 | Electroluminescent device and manufacturing method thereof |
| CN111200000A (en) * | 2020-01-09 | 2020-05-26 | 云谷（固安）科技有限公司 | Display panel and display device |
| CN111200000B (en) * | 2020-01-09 | 2022-05-03 | 云谷（固安）科技有限公司 | Display panel and display device |
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| Publication number | Publication date |
|---|---|
| CN106206675B (en) | 2019-03-08 |
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