CN106191860A - Film-coated part and preparation method thereof - Google Patents
Film-coated part and preparation method thereof Download PDFInfo
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- CN106191860A CN106191860A CN201510280912.3A CN201510280912A CN106191860A CN 106191860 A CN106191860 A CN 106191860A CN 201510280912 A CN201510280912 A CN 201510280912A CN 106191860 A CN106191860 A CN 106191860A
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Abstract
A kind of film-coated part, described film-coated part includes matrix, the metal level being formed at matrix surface, is formed at the boundary layer of layer on surface of metal and is formed at the hydrophobic layer of boundary layer, described boundary layer is that earth silicon material is made, described hydrophobic layer is Parylene or fluorine material is made, described fluorine material be mainly composed of silicon fluoride.Film-coated part provided by the present invention forms prime coat and boundary layer by plasma enhanced chemical vapor deposition method, and layer of metal layer is formed in the surface of this prime coat, a hydrophobic layer is formed then at this boundary layer, so that this film-coated part there is metal-like outward appearance while also there is preferably hydrophobic performance, production technology is simple, has the preferably market competitiveness.
Description
Technical field
The present invention relates to a kind of film-coated part, particularly relate to the manufacture method of a kind of film-coated part.
Background technology
In prior art, electronic product is developed rapidly and is improved, and consumers are the highest to the requirement of the appearance member of electronic product.In conventional art, generally made by baking finish process the appearance member such as housing of electronic installation have the effects such as hydrophobic, thus improve the water resistance of electronic installation.So, the many factors of baking vanish quality is affected, such as, environment between the cleannes of base material, spray pressure, levelling and the thickness etc. of paint, so there will be multiple unfavorable condition, such as, containing more impurity, bubbles, amass paint and occur that the situations such as oil drop affect electronic product outward appearance.Therefore, how to improve hydrophobic performance and the appearance requirement of the appearance member of electronic installation, be the significant problems that face of researchers.
Summary of the invention
In view of the above circumstances, it is necessary to provide a kind of and there is hydrophobic performance and outward appearance has the film-coated part of metal-like.
Separately, there is a need to provide the manufacture method of a kind of film-coated part.
A kind of film-coated part, described film-coated part includes matrix, the metal level being formed at matrix surface, is formed at the boundary layer of layer on surface of metal and is formed at the hydrophobic layer of boundary layer, described boundary layer is that earth silicon material is made, described hydrophobic layer is Parylene or fluorine material is made, described fluorine material be mainly composed of silicon fluoride.
The manufacture method of a kind of film-coated part, comprises the steps:
One matrix is provided；
On this matrix, a metal level is formed by resistance-type vacuum coating mode；
Forming a boundary layer by plasma enhanced chemical vapor deposition method in the surface of this metal level, described boundary layer is that earth silicon material is made；
Forming a hydrophobic layer in the surface of this boundary layer, prepare described film-coated part, wherein said hydrophobic layer is Parylene or fluorine material is made, described fluorine material be mainly composed of silicon fluoride.
Film-coated part provided by the present invention forms prime coat and boundary layer by plasma enhanced chemical vapor deposition method, and layer of metal layer is formed in the surface of this prime coat, a hydrophobic layer is formed then at this boundary layer, so that this film-coated part there is metal-like outward appearance while also there is preferably hydrophobic performance, production technology is simple, has the preferably market competitiveness.
Accompanying drawing explanation
Fig. 1 is the generalized section of the film-coated part of better embodiment of the present invention.
Main element symbol description
| Film-coated part | 10 |
| Matrix | 11 |
| Prime coat | 13 |
| Metal level | 15 |
| Boundary layer | 17 |
| Hydrophobic layer | 19 |
Following detailed description of the invention will further illustrate the present invention in conjunction with above-mentioned accompanying drawing.
Detailed description of the invention
In order to make the purpose of the present invention, technical scheme and advantage clearer, the present invention is further elaborated with embodiment below in conjunction with accompanying drawing.
Refer to Fig. 1, the film-coated part 10 of the better embodiment that the present invention provides, including matrix 11, it is sequentially formed in the prime coat 13 on matrix 11 surface, metal level 15, boundary layer 17 and hydrophobic layer 19.
Described matrix 11 is that plastics, silica gel, metal, glass or pottery are made.
Described prime coat 13 is made for earth silicon material, for the adhesion improved between matrix 11 and subsequent film.The thickness range of described prime coat 13 is 8-12nm.
Described metal level 15 is formed at the surface of this prime coat 13, described metal level 15 is made up of metal material, and described metal material is aluminum (Al), chromium (Cr), titanium (Ti), indium (In), stannum (Sn), nickel (Ni), zirconium (Zr), silver (Ag), copper (Cu) or rustless steel (SUS) etc..The thickness range of described metal level 15 is 0.3-0.5um.It is appreciated that, when this matrix 11 is made for nonmetallic materials, described metal level 15 can improve the metal-like of this film-coated part 10.
Described boundary layer 17 is formed at the surface of this metal level 15, and described boundary layer 17 is made for earth silicon material, for the adhesion improved between metal level 15 and subsequent film, the most also can improve the wearability of this film-coated part 10.The thickness range of described boundary layer 17 is 8-12nm.
Described hydrophobic layer 19 is formed at the surface of described boundary layer 17, and described hydrophobic layer 19 is made for Parylene or fluorine material, wherein fluorine material be mainly composed of silicon fluoride, the chemical formula of this silicon fluoride is RfXSi(OMe)3, wherein RfFor fluoro-containing group, X is halogen.The thickness range of described hydrophobic layer 19 is 1-10um.
Being appreciated that in other embodiments, described prime coat 13 and metal level 15 can omit, and boundary layer 17 is formed directly into matrix 11 surface.
The manufacture method of the film-coated part 10 of better embodiment of the present invention, comprises the steps:
One matrix 11 is provided, this matrix 11 is carried out pretreatment.Specifically, with deionized water and dehydrated alcohol, matrix 11 surface is carried out wiping successively.Then, put into be loaded with in the ultrasonic cleaner of acetone soln by matrix 11 and carry out ultrasonic waves for cleaning, to remove impurity and the greasy dirt etc. on matrix 11 surface.Described matrix 11 is that plastics, silica gel, metal, glass or pottery are made.
Surface through above-mentioned pretreated matrix 11 is carried out plasma clean, to remove the dirty, to increase the adhesion on matrix 11 surface and subsequent film of matrix 11 surface further.Specifically, the matrix 11 after cleaning is put in vacuum chamber, is 3.5x10 to being evacuated to pressure in vacuum chamber-5torr-6.0x10-5Torr, then injecting flow to vacuum chamber is the O of 450sccm-600sccm2With the Ar of 300-400sccm, pass through O2Performing etching matrix 11 with Ar glow discharge and activate, continuing EF power is 1-9kw, and scavenging period is 40s-90s.
A prime coat 13 is formed in the surface of this matrix 11 by plasma enhanced chemical vapor deposition method (Plasma Enhanced Chemical Vapor Deposition, PECVD).Specifically, described matrix 11, after plasma clean completes, is 5x10 to vacuum chamber to pressure-2torr-8x10-1Torr, is then charged with the O that flow is 200sccm-300sccm2Indoor to vacuum with the silicone oil of 100sccm-150sccm, continuing EF power is 1-9kw, and deposition silicon dioxide is to matrix 11 surface to form layer of silicon dioxide layer, i.e. prime coat 13, and sedimentation time is 25-60s.
This prime coat 13 is carried out densification.Specifically, the Ar to pressure 5x10 that insufflation gas flow is 450sccm-600sccm is continued in vacuum chamber-2torr-8x10-1Torr, continuing EF power is 5kw-9kw, electric discharge build-up of luminance 40s-90s, with the surface of etching silicon dioxide layer, peeling off the poor silicon dioxide of silicon dioxide layer surface adhesion force and for the finest and close prime coat 13 of silicon dioxide layer delivery of supplemental oxygen atom formation, described prime coat 13 thickness range is 8-12nm.
A metal level 15 is formed in the surface of this prime coat 13 by resistance-type vacuum coating mode.Specifically, it is provided that a metal targets is placed in vacuum chamber, the pressure in vacuum chamber is evacuated to 1x10-4torr-5x10-3Torr, adjusts and heats 200s by the electric current of metal targets to 300A-450A so that metal targets gasifies in the case of high electric current heats, thus is deposited on this prime coat 13, forms metal level 15.Metal targets can be that the materials such as aluminum (Al), chromium (Cr), titanium (Ti), indium (In), stannum (Sn), nickel (Ni), zirconium (Zr), silver (Ag), copper (Cu) or rustless steel (SUS) are made.The thickness range of described metal level 15 is 0.3-0.5um.
An interfacial layer 17 is formed in the surface of this metal level 15 by plasma enhanced chemical vapor deposition method (Plasma Enhanced Chemical Vapor Deposition, PECVD).Specifically, being evacuated to pressure in vacuum chamber is 5x10-2torr
-8x10-1Torr, is then charged with the O that flow is 200sccm-300sccm2Indoor to vacuum with the silicone oil of 100sccm-150sccm, continuing EF power is 1-9kw, and deposition layer of silicon dioxide layer is to metal level 15 surface to form boundary layer 17, and sedimentation time is 25-60s.
This boundary layer 17 is carried out densification.Specifically, in vacuum chamber continue insufflation gas flow be the Ar of 450sccm-600sccm be 5x10 to vacuum indoor pressure-2torr-8x10-1Torr, continuing EF power is 5kw-9kw electric discharge build-up of luminance 40s-90s, playing the surface of etching silicon dioxide layer, peel off the poor silicon dioxide of silicon dioxide layer surface adhesion force and form the finest and close boundary layer 17 for silicon dioxide layer delivery of supplemental oxygen atom, described boundary layer 17 thickness range is 8-12nm.
A hydrophobic layer 19 is deposited in the surface of this boundary layer 17.When hydrophobic layer 19 is made up of Parylene, form hydrophobic layer 19 by chemical vapour deposition technique (Chemical Vapor Depositio, CVD).Specifically, in vacuum chamber, inject the Parylene of liquid, the pressure in vacuum chamber is evacuated to 1x10-4torr-5x10-3Torr, to continuous heating 150-200 DEG C in vacuum chamber, make this Parylene 150-200 DEG C of gasification, be finally again heated to 650 DEG C-750 DEG C chemical bonds making Parylene and crack, obtain, after depositing 60-100min under room temperature, the hydrophobic layer 19 that thickness range is 1-10um.
It is appreciated that, when described hydrophobic layer 19 is made for fluorine material, its generation type is: form one layer of hydrophobic coating by the way of will be formed with the matrix 11 of boundary layer 17 and being soaked in fluorine material liquid or spray fluorine material liquid towards boundary layer 17 on this boundary layer 17, described hydrophobic coating is that fluorine material is made, described fluorine material be mainly composed of silicon fluoride, the chemical formula of this silicon fluoride is RfXSi(OMe)3, wherein RfFor fluoro-containing group, X is halogen.Silicon fluoride in hydrophobic coating was formed after hydrogen bond through hydrolysis, polycondensation reaction in the regular hour, the matrix 11 that will be formed with hydrophobic coating is placed in dry solidification 30min-60min at 120 DEG C-200 DEG C, thus forming covalent bond with the silicon dioxide generation condensation reaction forming boundary layer 17, the most described hydrophobic coating solidify to form hydrophobic layer 19.The hydrophobic layer 19 made due to this silicon fluoride material with by there is covalent bond between this boundary layer 17 of silica deposit so that can consolidate between hydrophobic layer 19 with boundary layer 17 and be connected.
Being appreciated that in other embodiments, the step forming prime coat 13 can be omitted, and metal level 15 is formed directly into matrix 11 surface.
Film-coated part 10 provided by the present invention forms prime coat 13 and boundary layer 17 by plasma enhanced chemical vapor deposition method, and layer of metal layer 15 is formed in the surface of this prime coat 13, a hydrophobic layer 19 is formed then at this boundary layer 17, so that this film-coated part 10 there is metal-like outward appearance while also there is preferably hydrophobic performance, production technology is simple, has the preferably market competitiveness；Meanwhile, hydrophobic layer 19 uses volatile organic content less organic material Parylene or fluorine material to make, and has preferable environmental-protecting performance.
The foregoing is only presently preferred embodiments of the present invention, not in order to limit the present invention, all any amendment, equivalent and improvement etc. made within the spirit and principles in the present invention, should be included within the scope of the present invention.
Claims (10)
1. a film-coated part, it is characterized in that: described film-coated part includes matrix, the metal level being formed at matrix surface, is formed at the boundary layer of layer on surface of metal and is formed at the hydrophobic layer of interface layer surfaces, described boundary layer is that earth silicon material is made, described hydrophobic layer is Parylene or fluorine material is made, described fluorine material be mainly composed of silicon fluoride.
2. film-coated part as claimed in claim 1, it is characterised in that: described metal level is that aluminum, chromium, titanium, indium, stannum, nickel, zirconium, silver, copper or rustless steel are made, and the thickness range of described metal level is 0.3-0.5um.
3. film-coated part as claimed in claim 1, it is characterised in that: the thickness range of described boundary layer is 8-12nm, and the thickness range of described hydrophobic layer is 1-10um.
4. film-coated part as claimed in claim 1, it is characterised in that: described film-coated part also includes the prime coat being formed between matrix and metal level, and described prime coat is that earth silicon material is made.
5. film-coated part as claimed in claim 1, it is characterised in that: described matrix is that plastics, silica gel, metal, glass or pottery are made.
6. a manufacture method for film-coated part, comprises the steps:
One matrix is provided；
On this matrix, a metal level is formed by resistance-type vacuum coating mode；
Forming a boundary layer by plasma enhanced chemical vapor deposition method in the surface of this metal level, described boundary layer is that earth silicon material is made；
Forming a hydrophobic layer in the surface of this boundary layer, prepare described film-coated part, wherein said hydrophobic layer is Parylene or fluorine material is made, described fluorine material be mainly composed of silicon fluoride.
7. the manufacture method of film-coated part as claimed in claim 6, it is characterised in that the formation of described metal level specifically includes following steps:
A metal targets is provided to be placed in vacuum chamber；
Pressure in vacuum chamber is evacuated to 1x10-4torr-5x10-3torr；
Adjust by the electric current of metal targets to 300A-450A so that metal targets is heated 200s thus gasified metal target.
8. the manufacture method of film-coated part as claimed in claim 6, it is characterised in that the formation of described boundary layer specifically includes following steps:
Pressure in vacuum chamber is evacuated to 5x10-2torr-8x10-1torr；
It is filled with the O that flow is 200sccm-300sccm2Indoor to vacuum with the silicone oil of 100sccm-150sccm；
Continuing EF power is 1-9kw, deposits silicon dioxide 25-60s；
To in vacuum chamber continue insufflation gas flow be the Ar of 450sccm-600sccm be 5x10 to vacuum indoor pressure-2torr-8x10-1torr；
Continuing EF power is 5kw-9kw, and discharge build-up of luminance 40-90s.
9. the manufacture method of film-coated part as claimed in claim 8, it is characterized in that: before this matrix surface forms metal level, also forming one layer of prime coat, described prime coat is that earth silicon material is made, and the manufacture method of described prime coat is identical with the manufacture method of this boundary layer.
10. the manufacture method of film-coated part as claimed in claim 6, it is characterised in that described hydrophobic layer is fluorine material when making, and the most described hydrophobic layer is by soaking or being formed by the way of spraying；Described hydrophobic material is Parylene when making, then this hydrophobic layer is formed by chemical gaseous phase depositing process.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510280912.3A CN106191860A (en) | 2015-05-28 | 2015-05-28 | Film-coated part and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510280912.3A CN106191860A (en) | 2015-05-28 | 2015-05-28 | Film-coated part and preparation method thereof |
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| CN106191860A true CN106191860A (en) | 2016-12-07 |
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| CN201510280912.3A Pending CN106191860A (en) | 2015-05-28 | 2015-05-28 | Film-coated part and preparation method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109280889A (en) * | 2017-07-21 | 2019-01-29 | 东莞拉奇纳米科技有限公司 | Parylene organic polymer film dry type film-plating process |
| CN109628883A (en) * | 2017-10-09 | 2019-04-16 | 拉奇企业股份有限公司 | The Parylene organic polymer coating thin film method of catheter in blood vessel |
| CN114855142A (en) * | 2022-04-18 | 2022-08-05 | 电子科技大学 | Parylene material with low surface energy and preparation method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109280889A (en) * | 2017-07-21 | 2019-01-29 | 东莞拉奇纳米科技有限公司 | Parylene organic polymer film dry type film-plating process |
| CN109628883A (en) * | 2017-10-09 | 2019-04-16 | 拉奇企业股份有限公司 | The Parylene organic polymer coating thin film method of catheter in blood vessel |
| CN114855142A (en) * | 2022-04-18 | 2022-08-05 | 电子科技大学 | Parylene material with low surface energy and preparation method thereof |
| CN114855142B (en) * | 2022-04-18 | 2023-07-25 | 电子科技大学 | Low surface energy parylene material and its preparation method |
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Application publication date: 20161207 |