CN102443763B - Covering element with anti-fingerprint coating and preparation method thereof - Google Patents
Covering element with anti-fingerprint coating and preparation method thereof Download PDFInfo
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- CN102443763B CN102443763B CN201010510347.2A CN201010510347A CN102443763B CN 102443763 B CN102443763 B CN 102443763B CN 201010510347 A CN201010510347 A CN 201010510347A CN 102443763 B CN102443763 B CN 102443763B
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- layer
- fingerprint coating
- covering member
- base material
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Abstract
The invention provides a covering element with an anti-fingerprint coating, which comprises a substrate and the anti-fingerprint coating formed on the substrate, wherein the anti-fingerprint coating comprises a transparent SiO2 layer and a transparent CaF2 layer, and the SiO2 layer is positioned between the substrate and the CaF2 layer. A preparation method of the covering element with the anti-fingerprint coating mainly comprises the following step that the transparent SiO2 layer and the transparent CaF2 layer are deposited on the substrate by a vacuum film coating method, such as a radio frequency magnetic control sputtering method. The covering element has good hydrophobic and anti-fingerprint effects. The invention also provides a preparation method of the covering element.
Description
Technical field
The present invention relates to and a kind of there is covering member of anti-fingerprint coating and preparation method thereof.
Background technology
Along with the use of 3C electronic product is more and more frequent, the outward appearance of human consumer to product there has also been more and more higher requirement.Except requiring that product casing color is attractive in appearance, hand feel and drape, also require that its surface has good wear resistance, scratch resistance and anti-fingerprint (anti-fingerprint) performance.
Current industry uses more anti-fingerprint method to be spray one deck organic chemicals at base material, as anti-fingerprint coating or anti-fingerprint wet goods, makes it be attached to base material is formed bright in luster, have the organic coating of certain anti-fingerprint effect by heating or drying.But this preparation technology of coating is very loaded down with trivial details, but also there is the chemical substance that free formaldehyde etc. is unfavorable for environmental protection and HUMAN HEALTH.In addition, above-mentioned organic coating wear resisting property is poor, easily weares and teares after using for some time.
Summary of the invention
In view of this, be necessary to provide a kind of environmental protection, the wear-resisting covering member with anti-fingerprint coating.
Have a covering member for anti-fingerprint coating, comprise base material and be formed at the anti-fingerprint coating on this base material, this anti-fingerprint coating comprises a transparent SiO
2layer and a transparent CaF
2layer, this SiO
2layer is positioned at this base material and this CaF
2between layer.
There is a preparation method for the covering member of anti-fingerprint coating, comprise the steps:
Base material is provided;
Deposit primary antibodie fingerprint coating on the substrate by vacuum coating method, this anti-fingerprint coating comprises a transparent SiO
2layer and a transparent CaF
2layer, this SiO
2layer is positioned at this base material and this CaF
2between layer.
Compared to prior art, the anti-fingerprint coating of above-mentioned employing vacuum coating method deposited on substrates, this anti-fingerprint coating comprises SiO
2layer and CaF
2layer, due to this CaF
2existence containing fluorine in layer, so its surface tension less (being less than the surface tension of water), thus makes water at this CaF
2layer surface is difficult to sprawl, and has hydrophobic, anti-fingerprint effect preferably.And, CaF
2layer and SiO
2layer is transparent, can not affect the appearance effect of other decoration coatings between base material and anti-fingerprint coating.On the other hand, because anti-fingerprint coating has higher hardness, stable performance, not containing toxic substance, makes covering member wear resisting property better, environmentally friendly.
Accompanying drawing explanation
Fig. 1 is the cross-sectional schematic of the anti-fingerprint coating covering member of present pre-ferred embodiments.Main element nomenclature
Covering member 10
Base material 12
Color layers 13
Anti-fingerprint coating 14
SiO
2layer 141
CaF
2layer 143
Embodiment
Refer to Fig. 1, the covering member 10 that present pre-ferred embodiments has anti-fingerprint coating comprises base material 12 and is formed at the anti-fingerprint coating 14 on this base material 12.
Described base material 12 can be made up of metallic substance or non-metallic material.This metallic substance can comprise stainless steel, titanium, titanium alloy, copper, copper alloy, aluminium, aluminium alloy and magnesium alloy etc.These non-metallic material can comprise plastics, pottery, glass etc.
This anti-fingerprint coating 14 comprises a transparent SiO
2layer 141 and a transparent CaF
2layer 143.This SiO
2layer 141 is positioned at base material 12 and CaF
2between layer 143.SiO
2141, layer connects transitional function, for increasing CaF
2the bonding force of layer 143 and base material 12.SiO
2the thickness of layer 141 is approximately 0.02 ~ 0.05 micron.CaF
2layer 143 is formed at this SiO
2on layer 141, CaF
2the thickness of layer 143 is approximately 0.1 ~ 0.5 micron, and preferred thickness is 0.1 ~ 0.3 micron.
A surface-coated CaF of above-mentioned covering member 10
2layer 143, this CaF
2due to the existence of fluorine in layer 143, so its surface tension less (being less than the surface tension of water), thus make water at CaF
2layer 143 surface are difficult to sprawl, and have hydrophobic, anti-fingerprint effect preferably.
This covering member 10 can be the housing of 3C electronic product, furniture, kitchen utensils or other decoration part.
The preparation method of above-mentioned covering member 10 mainly comprises the steps:
First, provide base material 12, and plated film pre-treatment is carried out to this base material 12.This pre-treatment mainly comprises: base material 12 is put into the ultrasonic cleaner being loaded with ethanol and/or acetone soln and carry out vibrations cleaning, to remove the impurity on base material 12 surface and greasy dirt etc.
Plasma clean is carried out to the surface of the base material 12 after above-mentioned cleaning, further cleaned base material 12 surface, to improve the bonding force on base material 12 surface and follow-up coating.The concrete operations of this plasma cleaning and processing parameter are: vacuum chamber base material 12 being put into a vacuum coating film equipment, and being evacuated to vacuum tightness is 2 × 10
-3~ 8.0 × 10
-3pa, passing into high-purity argon gas is ion source gas, and open ion source power supply, carry out plasma bombardment to base material 12 surface, bombardment time is 3 ~ 10min.
Vacuum plating process is carried out to the base material 12 through above-mentioned pre-treatment, to form this anti-fingerprint coating 14 on base material 12 surface.The concrete film coating method forming this anti-fingerprint coating 14 can adopt the one in rf magnetron sputtering and evaporation.
The present embodiment adopts this anti-fingerprint coating 14 of rf magnetron sputtering plating, concrete operations and processing parameter as follows: after plasma clean is carried out to base material 12, open SiO
2target power supply, power is 100 ~ 400W, control base material 12 temperature at 20 ~ 200 DEG C, to vacuum chamber, to pass into flow be the argon gas of 100 ~ 200sccm is sputter gas, and to pass into flow be that the oxygen of 10 ~ 30sccm is as reactant gases, with the Sauerstoffatom lacked in supplementary sputter deposition process, start plating SiO
2layer 141, plated film time controling was at 6 ~ 15 minutes.Then, SiO is closed
2target and oxygen, open CaF
2target power supply, power is 100 ~ 400W, and argon flow amount remains unchanged, and opens deposition CaF
2layer 143, depositing time is approximately 10 ~ 20 minutes.Close CaF
2target power supply, stops passing into argon gas, after described anti-fingerprint coating 14 cools, passes into air, open door for vacuum chamber in vacuum chamber, takes out the base material 12 that plating has anti-fingerprint coating 14.
Understandable, deposition this anti-fingerprint coating 14 before also can on base material 12 plating one color layers 13.Correspondingly, this covering member 10 can also comprise a color layers 13 between base material 12 and anti-fingerprint coating 14, to strengthen the aesthetic property of this covering member 10.
The described preparation method with the covering member 10 of anti-fingerprint coating, adopts vacuum coating method prior to base material 12 depositing a transparent SiO
2layer 141 conduct connects transition layer, then in this SiO
2layer 141 deposition one CaF
2layer 143.Due to this CaF
2existence containing fluorine in layer 143, so its surface tension less (being less than the surface tension of water), thus makes water at CaF
2layer 143 surface are difficult to sprawl, and have hydrophobic, anti-fingerprint effect preferably.And, CaF
2layer 143 and SiO
2layer 141 is transparent, can not affect the appearance effect of other decoration coatings between base material 12 and anti-fingerprint coating 14.On the other hand, because anti-fingerprint coating 14 has higher hardness, stable performance, not containing toxic substance, makes covering member 10 wear resisting property better, environmentally friendly.
Claims (11)
1. there is a covering member for anti-fingerprint coating, comprise base material and be formed at the anti-fingerprint coating on this base material, it is characterized in that: this anti-fingerprint coating comprises a transparent SiO
2layer and one is directly formed at SiO
2transparent CaF on layer
2layer, this SiO
2layer is positioned at this base material and this CaF
2between layer.
2. there is the covering member of anti-fingerprint coating as claimed in claim 1, it is characterized in that: this SiO
2the thickness of layer is 0.02 ~ 0.05 micron.
3. there is the covering member of anti-fingerprint coating as claimed in claim 1, it is characterized in that: this CaF
2the thickness of layer is 0.1 ~ 0.5 micron.
4. there is the covering member of anti-fingerprint coating as claimed in claim 1, it is characterized in that: this covering member with anti-fingerprint coating also comprises a color layers between this base material and anti-fingerprint coating.
5. there is a preparation method for the covering member of anti-fingerprint coating, comprise the steps:
Base material is provided;
Deposit primary antibodie fingerprint coating on the substrate by vacuum coating method, this anti-fingerprint coating comprises a transparent SiO
2layer and one is directly formed at SiO
2transparent CaF on layer
2layer, this SiO
2layer is positioned at this base material and this CaF
2between layer.
6. the preparation method of the covering member of anti-fingerprint coating as claimed in claim 5, is characterized in that: described vacuum tightness membrane method is radio-frequency magnetron sputter method.
7. the preparation method of the covering member of anti-fingerprint coating as claimed in claim 6, is characterized in that: described radio-frequency magnetron sputter method deposits this SiO
2layer is with SiO
2for target, power is 100 ~ 400W, and this temperature controls at 20 ~ 200 DEG C, take flow as the argon gas of 100 ~ 200sccm is sputter gas, using flow be the oxygen of 10 ~ 30sccm as reactant gases, the plated film time is 6 ~ 15 minutes.
8. the preparation method of the covering member of anti-fingerprint coating as claimed in claim 6, is characterized in that: described radio-frequency magnetron sputter method deposits this CaF
2layer is with CaF
2for target, power is 100 ~ 400W, take flow as the argon gas of 100 ~ 200sccm is sputter gas, and depositing time is 10 ~ 20 minutes.
9. the preparation method of the covering member of anti-fingerprint coating as claimed in claim 5, is characterized in that: described vacuum tightness membrane method is evaporation.
10. the preparation method of the covering member of anti-fingerprint coating as claimed in claim 5, is characterized in that: the preparation method of the covering member of this anti-fingerprint coating is also included in the front step of this base material being carried out to ultrasonic cleaning and plasma clean of this anti-fingerprint coating of deposition.
The preparation method of the covering member of 11. anti-fingerprint coatings as claimed in claim 5, is characterized in that: the preparation method of the covering member of this anti-fingerprint coating be also included in this anti-fingerprint coating of deposition before on this base material the step of plating one color layers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010510347.2A CN102443763B (en) | 2010-10-15 | 2010-10-15 | Covering element with anti-fingerprint coating and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010510347.2A CN102443763B (en) | 2010-10-15 | 2010-10-15 | Covering element with anti-fingerprint coating and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102443763A CN102443763A (en) | 2012-05-09 |
| CN102443763B true CN102443763B (en) | 2015-03-11 |
Family
ID=46006696
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010510347.2A Expired - Fee Related CN102443763B (en) | 2010-10-15 | 2010-10-15 | Covering element with anti-fingerprint coating and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102443763B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103019443A (en) * | 2012-12-04 | 2013-04-03 | 江西沃格光电科技有限公司 | Antifouling touch screen, preparation method thereof and handheld mobile equipment |
| CN103409721A (en) * | 2013-07-10 | 2013-11-27 | 苏州爱迪尔镀膜科技有限公司 | High-density nano film coating hardening technique |
| CN103434203B (en) * | 2013-07-17 | 2015-11-18 | 东明兴业科技股份有限公司 | Anti-fingerprint film and preparation method thereof |
| CN104419893A (en) * | 2013-08-29 | 2015-03-18 | 江苏远大光学科技有限公司 | Coating method for waterproof film of spectacle lens |
| CN104694929B (en) * | 2015-03-17 | 2017-10-27 | 厦门建霖健康家居股份有限公司 | A kind of method for preparing anti-fingerprint film on sanitaryware surface |
| CN104951133A (en) * | 2015-06-18 | 2015-09-30 | 无锡启晖光电科技有限公司 | Touch screen anti-reflection anti-fouling membrane |
| CN106282934A (en) * | 2016-08-31 | 2017-01-04 | 广东欧珀移动通信有限公司 | Surface treatment method |
| CN107460448B (en) * | 2017-08-04 | 2020-02-04 | 中国科学院宁波材料技术与工程研究所 | Decorative coating on surface of substrate and preparation method thereof |
| CN111364014A (en) * | 2020-04-26 | 2020-07-03 | 蓝思科技（长沙）有限公司 | Processing technology of invisible fingerprint film |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4748050A (en) * | 1985-08-09 | 1988-05-31 | Daicel Chemical Industries, Ltd. | Process for preparing thin film having high light transmittance |
| CN1872924A (en) * | 2005-03-14 | 2006-12-06 | Jds尤尼弗思公司 | Anti-moisture and soil-repellent coatings |
| JP2010218895A (en) * | 2009-03-17 | 2010-09-30 | Semiconductor Energy Lab Co Ltd | Film formation substrate, film forming method, and method of manufacturing light emitting device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2961163B2 (en) * | 1996-05-30 | 1999-10-12 | 株式会社ニッカテクノ | Iris transfer material |
-
2010
- 2010-10-15 CN CN201010510347.2A patent/CN102443763B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4748050A (en) * | 1985-08-09 | 1988-05-31 | Daicel Chemical Industries, Ltd. | Process for preparing thin film having high light transmittance |
| CN1872924A (en) * | 2005-03-14 | 2006-12-06 | Jds尤尼弗思公司 | Anti-moisture and soil-repellent coatings |
| JP2010218895A (en) * | 2009-03-17 | 2010-09-30 | Semiconductor Energy Lab Co Ltd | Film formation substrate, film forming method, and method of manufacturing light emitting device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102443763A (en) | 2012-05-09 |
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Granted publication date: 20150311 Termination date: 20181015 |