CN106191766A - 蒸镀装置、薄膜形成方法及有机发光显示装置制造方法 - Google Patents
蒸镀装置、薄膜形成方法及有机发光显示装置制造方法 Download PDFInfo
- Publication number
- CN106191766A CN106191766A CN201510236310.8A CN201510236310A CN106191766A CN 106191766 A CN106191766 A CN 106191766A CN 201510236310 A CN201510236310 A CN 201510236310A CN 106191766 A CN106191766 A CN 106191766A
- Authority
- CN
- China
- Prior art keywords
- area
- substrate
- evaporation coating
- supporting part
- coating device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020140109969A KR102227482B1 (ko) | 2014-08-22 | 2014-08-22 | 증착 장치, 이를 이용한 박막 형성 방법 및 유기 발광 표시 장치 제조 방법 |
KR10-2014-0109969 | 2014-08-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN106191766A true CN106191766A (zh) | 2016-12-07 |
Family
ID=55535809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510236310.8A Pending CN106191766A (zh) | 2014-08-22 | 2015-05-11 | 蒸镀装置、薄膜形成方法及有机发光显示装置制造方法 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102227482B1 (ko) |
CN (1) | CN106191766A (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107313014A (zh) * | 2017-07-24 | 2017-11-03 | 江苏实为半导体科技有限公司 | 一种蒸镀装置 |
CN111886356A (zh) * | 2018-03-20 | 2020-11-03 | 夏普株式会社 | 成膜用掩模及使用该成膜用掩模的显示装置的制造方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107904566A (zh) * | 2017-12-15 | 2018-04-13 | 京东方科技集团股份有限公司 | 一种蒸镀载板及蒸镀装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005256101A (ja) * | 2004-03-12 | 2005-09-22 | Mitsui Eng & Shipbuild Co Ltd | 基板・マスク固定装置 |
CN101523571A (zh) * | 2006-09-29 | 2009-09-02 | 无穷动力解决方案股份有限公司 | 柔性基板上沉积的电池层的掩模和材料限制 |
JP2013209697A (ja) * | 2012-03-30 | 2013-10-10 | Hitachi High-Technologies Corp | 成膜装置および成膜方法 |
WO2013183374A1 (ja) * | 2012-06-08 | 2013-12-12 | シャープ株式会社 | 蒸着装置 |
CN203582967U (zh) * | 2012-12-12 | 2014-05-07 | 三星显示有限公司 | 沉积装置 |
-
2014
- 2014-08-22 KR KR1020140109969A patent/KR102227482B1/ko active IP Right Grant
-
2015
- 2015-05-11 CN CN201510236310.8A patent/CN106191766A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005256101A (ja) * | 2004-03-12 | 2005-09-22 | Mitsui Eng & Shipbuild Co Ltd | 基板・マスク固定装置 |
CN101523571A (zh) * | 2006-09-29 | 2009-09-02 | 无穷动力解决方案股份有限公司 | 柔性基板上沉积的电池层的掩模和材料限制 |
JP2013209697A (ja) * | 2012-03-30 | 2013-10-10 | Hitachi High-Technologies Corp | 成膜装置および成膜方法 |
WO2013183374A1 (ja) * | 2012-06-08 | 2013-12-12 | シャープ株式会社 | 蒸着装置 |
CN203582967U (zh) * | 2012-12-12 | 2014-05-07 | 三星显示有限公司 | 沉积装置 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107313014A (zh) * | 2017-07-24 | 2017-11-03 | 江苏实为半导体科技有限公司 | 一种蒸镀装置 |
CN111886356A (zh) * | 2018-03-20 | 2020-11-03 | 夏普株式会社 | 成膜用掩模及使用该成膜用掩模的显示装置的制造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR102227482B1 (ko) | 2021-03-15 |
KR20160024090A (ko) | 2016-03-04 |
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WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20161207 |
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WD01 | Invention patent application deemed withdrawn after publication |