CN106159434A - A kind of high quality factor Terahertz ring dipole Meta Materials - Google Patents
A kind of high quality factor Terahertz ring dipole Meta Materials Download PDFInfo
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- CN106159434A CN106159434A CN201510172784.0A CN201510172784A CN106159434A CN 106159434 A CN106159434 A CN 106159434A CN 201510172784 A CN201510172784 A CN 201510172784A CN 106159434 A CN106159434 A CN 106159434A
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Abstract
The invention discloses a kind of high quality factor Terahertz ring dipole Meta Materials, prepare respectively on dielectric layer two sides including first metal pattern layer and second metal pattern layer, the first described metal pattern layer and the second described metal pattern layer.First metal pattern layer is born three wide 15 ~ 17 μm of rectangle 1(length 78 ~ 82 μm * in semiaxis region by being distributed in x-axis) and it is distributed in three wide 15 ~ 17 μm of rectangle 2(length 62 ~ 66 μm * in x-axis positive axis region) form, six rectangle patterns are at the μm of the distance center of circle 23 ~ 25, and each rectangle pattern is along the tangential direction 60 ° of arrangements in interval of circle；Second metal pattern layer pattern is that the first metal pattern layer rotates 180 ° along z-axis, and the double layer of metal patterned layer center of circle in a z-direction overlaps.Use the ring dipole Meta Materials of " metal-dielectric-metal " structure, can effectively strengthen front incident intensity, ring dipole resonance has high quality factor Q-value > 12, dielectric thickness changes between 5 μm-30 μm, ring dipole resonance frequency can regulate between 1.0 ~ 1.3THz, can be used for preparing the THz devices such as Terahertz sensor, frequency modulator, wave filter.
Description
Technical field
The present invention relates to a kind of high quality factor Terahertz ring dipole Meta Materials, use " metal-dielectric-metal " structure, there is normal incidence intensity high, ring dipole resonance quality factor q value is big, resonant frequency, with features such as dielectric thickness scalable, can be used for preparing the THz devices such as Terahertz sensor, frequency modulator, wave filter.
Background technology
The electromagnetic wave that Terahertz (THz) ripple is between microwave and far infrared.The nineties in last century, terahertz sources source and detector achieve a series of breakthrough, have caused the fast development of Terahertz science and technology.Free electron laser and the development of ultrafast laser technique, the generation for terahertz pulse provides stable, reliable excitation source, makes the research of the mechanism of production of terahertz emission, detection and application technology be rapidly developed.Terahertz has a wide range of applications with the field such as imaging technique and information science at biomedicine, safety monitoring, nondestructive detecting, astronomy, spectrum.Ring dipole, as the 3rd class radiation source, has distinguished characteristic, is produced by the relevant effect of electric multipole or magnetic multi-polar, has the characteristics such as high quality factor.Owing to nature medium ring dipole resonance intensity is weak, how to be covered by other resonance, available Meta Materials realizes ring dipole phenomenon under Terahertz frequency range.So-called Meta Materials, it is simply that macroscopical elementary cell with geometry in particular is periodically or aperiodically arranged, a kind of artificial material constituted.Meta Materials is that we arbitrarily control electromagnetic wave propagation mode and provide effective means.Ring dipole Meta Materials has been carried out corresponding theory research in microwave band and light-wave band and has carried out it is experimentally confirmed that but there is not been reported at terahertz wave band.
Summary of the invention
For existing research situation, the present invention provides a kind of Terahertz ring dipole Meta Materials using " metal-dielectric-metal " structure, this kind of Meta Materials can be prepared on tradition Terahertz medium Mylar, Polyimide, there is incident intensity big, the excellent performance indications such as Q-value is high, resonant-frequency adjustable joint.
A kind of high quality factor Terahertz ring dipole Meta Materials, prepares on dielectric layer two sides respectively including first metal pattern layer and second metal pattern layer, the first described metal pattern layer and the second described metal pattern layer.First metal pattern layer is born three wide 15 ~ 17 μm of rectangle 1(length 78 ~ 82 μm * in semiaxis region by being distributed in x-axis) and it is distributed in three wide 15 ~ 17 μm of rectangle 2(length 62 ~ 66 μm * in x-axis positive axis region) form, six rectangle patterns are at the μm of the distance center of circle 23 ~ 25, and each rectangle pattern is along the tangential direction 60 ° of arrangements in interval of circle；Second metal pattern layer pattern is that the first metal pattern layer rotates 180 ° along z-axis, and the double layer of metal patterned layer center of circle in a z-direction overlaps.
Further, the material of the first metal pattern layer and the second metal pattern layer is any one in aluminum, lead, silver, and metal pattern layer thickness is 200nm-400nm.
Further, the material of dielectric layer is any one in Mylar, Polyimide, and dielectric thickness is 5-30 μm.
Further, preparation method is photoetching process and vacuum thermal evaporation, it is characterised in that comprise the steps:
(1) whirl coating: photoresist spinner turns 20 ~ 40 seconds with the speed of 3000 rpm, is thrown on medium by photoresist.Being put into by sample in baking box and toast 5 minutes at 115 DEG C, after prebake conditions, the photoresist thickness on medium is about 2 ~ 4 μm；(2) exposure: sample is placed in exposure machine, and photoresist is pressed under structure mask plate exposure, time of exposure 20 ~ 40 seconds.Sample is put in baking box and toast 5 minutes at 115 DEG C, make photoresist carry out sufficient chemical reaction, so that the figure homogenization of exposure；(3) development: being placed in developer solution by the sample after baking and develop about 20 ~ 40 seconds, sample flushing dried up is put in baking box and toasted 5 minutes at 115 DEG C, makes the developer solution evaporation remaining on sample, the figure of solidification photoresist；(4) evaporation metal: be more than the aluminum film of twice skin depth by the method for vacuum thermal evaporation at photoresist layer plated surface last layer.The vacuum environment of evaporation is higher than 5 × 10-5MB, evaporation rate about 10nm/s.The local aluminum direct plating of unglazed photoresist is on dielectric layer；(5) peeling off: be immersed in acetone soln by the sample being deposited with, photoresist dissolves and is taken away by metal thereon, and direct plating metal on dielectric layer then stays, and forms aluminum graphic array.Complete one-sided metallic structure sheaf to prepare；(6) repeat after dielectric layer another side is accurately directed at, repeat step and play (1) ~ (5), it is thus achieved that the preparation of ring dipole Meta Materials.
Further, the Terahertz electromagnetic property of ring dipole Meta Materials uses 8-F THz-TDS to measure.
The present invention compared with prior art, has substantive distinguishing features highlighted below and a remarkable advantage:
1. use the ring dipole Meta Materials of " metal-dielectric-metal " structure, it is possible to effectively strengthen front incident intensity.
Under Terahertz frequency range, 2. observe ring dipole resonance, there is high q-factor 12.
3. being changed between 5 μm-30 μm by dielectric thickness, ring dipole resonance frequency can regulate between 1.0 ~ 1.3THz.
Accompanying drawing explanation
Fig. 1 ring dipole metamaterial modular construction；The thickness of g: dielectric layer；R: rectangle distance center distance；The length of a: rectangle 1；The length of a-s: rectangle 2；B: rectangular width；C: metal layer thickness.
Fig. 2 ring dipole resonance Q-value is with dielectric thickness change curve.
Detailed description of the invention
Below in conjunction with drawings and Examples, the present invention is described in detail, the invention is not limited in example.
Metal pattern layer is prepared as shown in Figure 1 on dielectric layer two sides, first metal pattern layer is born three wide 16 μm of rectangle 1(length 80 μm * in semiaxis region by being distributed in x-axis) and it is distributed in three wide 16 μm of rectangle 2(length 64 μm * in x-axis positive axis region) pattern forms, six rectangle patterns are at the μm of the distance center of circle 24, and each rectangle pattern is along the tangential direction 60 ° of arrangements in interval of circle；Second metal pattern layer pattern is that the first metal pattern layer rotates 180 ° along z-axis, and the double layer of metal patterned layer center of circle in a z-direction overlaps.
The material of the first metal pattern layer and the second metal pattern layer is aluminum, and metal pattern layer thickness is 300nm.
The material of dielectric layer is Mylar, and dielectric thickness is 22 μm.
The preparation method of this Terahertz ring dipole Meta Materials is photoetching process and vacuum thermal evaporation, it is characterised in that comprise the steps:
(1) whirl coating: photoresist spinner turns 30 seconds with the speed of 3000 rpm, is thrown on medium by photoresist.Being put into by sample in baking box and toast 5 minutes at 115 DEG C, after prebake conditions, the photoresist thickness on medium is about 3 μm；(2) exposure: sample is placed in exposure machine, and photoresist is pressed under structure mask plate exposure, time of exposure 30 seconds.Sample is put in baking box and toast 5 minutes at 115 DEG C, make photoresist carry out sufficient chemical reaction, so that the figure homogenization of exposure；(3) development: being placed in developer solution by the sample after baking and develop about 30 seconds, sample flushing dried up is put in baking box and toasted 5 minutes at 115 DEG C, makes the developer solution evaporation remaining on sample, the figure of solidification photoresist；(4) evaporation metal: be more than the aluminum film of twice skin depth by the method for vacuum thermal evaporation at photoresist layer plated surface last layer.The vacuum environment of evaporation is higher than 5 × 10-5MB, evaporation rate about 10nm/s.The local aluminum direct plating of unglazed photoresist is on dielectric layer；(5) peeling off: be immersed in acetone soln by the sample being deposited with, photoresist dissolves and is taken away by metal thereon, and direct plating metal on dielectric layer then stays, and forms aluminum graphic array.Complete one-sided metallic structure sheaf to prepare；(6) repeat after dielectric layer another side is accurately directed at, repeat step and play (1) ~ (5), it is thus achieved that the preparation of ring dipole Meta Materials.
Terahertz ring dipole Meta Materials, its Terahertz electromagnetic property uses 8-F THz-TDS to measure.
Although the present invention discloses as above with preferred embodiment, but it is not limited to the present invention；Any those skilled in the art, without departing from the spirit and scope of the present invention, can carry out various change and retouching to described invention, and therefore, protection scope of the present invention should be depending on being as the criterion that the scope of the claims of the application is limited.
Claims (6)
1. a high quality factor Terahertz ring dipole Meta Materials, it is characterised in that: include that first metal pattern layer and second metal pattern layer, the first described metal pattern layer and the second described metal pattern layer are prepared respectively on dielectric layer two sides.
2. a kind of high quality factor Terahertz ring dipole Meta Materials as claimed in claim 1, it is characterized in that: the first metal pattern layer is born three wide 15 ~ 17 μm of rectangle 1(length 78 ~ 82 μm * in semiaxis region by being distributed in x-axis) and it is distributed in three wide 15 ~ 17 μm of rectangle 2(length 62 ~ 66 μm * in x-axis positive axis region) form, six rectangle patterns are at the μm of the distance center of circle 23 ~ 25, and each rectangle pattern is along the tangential direction 60 ° of arrangements in interval of circle；Second metal pattern layer pattern is that the first metal pattern layer rotates 180 ° along z-axis, and the double layer of metal patterned layer center of circle in a z-direction overlaps.
3. a kind of high quality factor Terahertz ring dipole Meta Materials as claimed in claim 1, it is characterized in that: the first described metal pattern layer and the material of the second metal pattern layer are any one in aluminum, lead, silver, and metal pattern layer thickness is 200nm-400nm.
4. a kind of high quality factor Terahertz ring dipole Meta Materials as claimed in claim 1, it is characterised in that: described dielectric layer material is any one in Mylar, Polyimide, and dielectric thickness is 5-30 μm.
The preparation method of a kind of high quality factor Terahertz ring dipole Meta Materials the most as claimed in claim 1 is photoetching process and vacuum thermal evaporation, it is characterised in that comprise the steps:
(1) whirl coating: photoresist spinner turns 20 ~ 40 seconds with the speed of 3000 rpm, is thrown on medium by photoresist, puts into sample in baking box and toasts 5 minutes at 115 DEG C, and after prebake conditions, the photoresist thickness on medium is about 2 ~ 4 μm；(2) exposure: sample is placed in exposure machine, and photoresist is pressed under structure mask plate exposure, time of exposure 20 ~ 40 seconds；Sample is put in baking box and toast 5 minutes at 115 DEG C, make photoresist carry out sufficient chemical reaction, so that the figure homogenization of exposure；(3) development: being placed in developer solution by the sample after baking and develop about 20 ~ 40 seconds, sample flushing dried up is put in baking box and toasted 5 minutes at 115 DEG C, makes the developer solution evaporation remaining on sample, the figure of solidification photoresist；(4) evaporation metal: be more than the metal film of twice skin depth at photoresist layer plated surface last layer by the method for vacuum thermal evaporation, the vacuum environment of evaporation is higher than 5 × 10-5MB, evaporation rate about 10nm/s, the local metal of unglazed photoresist is directly plated on dielectric layer；(5) peeling off: be immersed in acetone soln by the sample being deposited with, photoresist dissolves and is taken away by metal thereon, and direct plating metal on dielectric layer then stays, and forms aluminum graphic array, completes one-sided metallic structure sheaf and prepare；(6) repeat after dielectric layer another side is accurately directed at, repeat step and play (1) ~ (5), it is thus achieved that the preparation of ring dipole Meta Materials.
6. a kind of high quality factor Terahertz ring dipole Meta Materials as claimed in claim 1, its Terahertz electromagnetic property uses 8-F THz-TDS to measure.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108565558A (en) * | 2018-05-24 | 2018-09-21 | 天津职业技术师范大学 | A kind of bilayer concave structure Terahertz ring dipole Meta Materials |
| CN110364822A (en) * | 2019-08-08 | 2019-10-22 | 天津职业技术师范大学(中国职业培训指导教师进修中心) | The super surface of double frequency c type split ring resonator Terahertz ring dipole and preparation method |
| CN113917588A (en) * | 2021-09-06 | 2022-01-11 | 武汉理工大学 | Super-surface structure transmission type polarization regulator and preparation method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102800986A (en) * | 2012-08-02 | 2012-11-28 | 中国科学院上海微系统与信息技术研究所 | Terahertz dual-band metamaterial based on electric resonance |
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2015
- 2015-04-14 CN CN201510172784.0A patent/CN106159434A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102800986A (en) * | 2012-08-02 | 2012-11-28 | 中国科学院上海微系统与信息技术研究所 | Terahertz dual-band metamaterial based on electric resonance |
Non-Patent Citations (2)
| Title |
|---|
| ZG DONG 、 J ZHU 、 J RHO: "Optical toroidal dipolar response by an asymmetric double-bar metamaterial", 《APPLIED PHYSICS LETTERS》 * |
| 谷建强: "太赫兹奇异介质研究", 《中国优秀硕士学位论文全文数据库（电子期刊）》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108565558A (en) * | 2018-05-24 | 2018-09-21 | 天津职业技术师范大学 | A kind of bilayer concave structure Terahertz ring dipole Meta Materials |
| CN110364822A (en) * | 2019-08-08 | 2019-10-22 | 天津职业技术师范大学(中国职业培训指导教师进修中心) | The super surface of double frequency c type split ring resonator Terahertz ring dipole and preparation method |
| CN113917588A (en) * | 2021-09-06 | 2022-01-11 | 武汉理工大学 | Super-surface structure transmission type polarization regulator and preparation method thereof |
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