CN106078517A - A kind of trimming device for polishing cushion - Google Patents

A kind of trimming device for polishing cushion Download PDF

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Publication number
CN106078517A
CN106078517A CN201610629089.7A CN201610629089A CN106078517A CN 106078517 A CN106078517 A CN 106078517A CN 201610629089 A CN201610629089 A CN 201610629089A CN 106078517 A CN106078517 A CN 106078517A
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CN
China
Prior art keywords
cutting members
trimming device
polishing cushion
polishing
pedestal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610629089.7A
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Chinese (zh)
Inventor
陈盈同
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YTDIAMOND Co Ltd
Original Assignee
YTDIAMOND Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YTDIAMOND Co Ltd filed Critical YTDIAMOND Co Ltd
Priority to CN201610629089.7A priority Critical patent/CN106078517A/en
Publication of CN106078517A publication Critical patent/CN106078517A/en
Pending legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces

Abstract

A kind of trimming device for polishing cushion, belongs to color-buffing finish technical field.Including a pedestal, at least one cutting members and at least positioning piece.Cutting members is arranged on pedestal.Keeper is arranged on pedestal, and protrudes from the upper surface of pedestal.The present invention wherein one has the beneficial effects that, can be by " described location structure is formed in described cutting members or the technological means of " on described pedestal; can be by material cutting unnecessary on polishing pad without producing protuberance; the burnishing surface making polishing pad can be relatively flat, effectively to control the surface roughness of polishing pad.

Description

A kind of trimming device for polishing cushion
Technical field
The present invention relates to a kind of trimming device for polishing cushion, belong to color-buffing finish technical field.
Background technology
The polishing pad trimmer of technology today be all with " abrasive particle (such as: diamond) " as process tool to remove polishing pad (Pad) material.Referring to shown in Fig. 1, the top of polishing pad trimmer Q is covered with abrasive particle d.In the processing procedure of processing polished pad, abrasive particle d Processing is to remove the material on polishing pad in the way of grinding.
But, due to the abrasive particle d on polishing pad trimmer Q, its cutting edge in irregular shape, and generally abrasive particle d can be with Bigger negative bevel is clamp-oned in machined material, belongs to the processing mechanism of many point grinding, thus stays at material surface coarse Plough cut channel mark (ploughing).
If in order to allow surface roughness reduce, then must use higher density and thinner abrasive particle d processing, thick to reduce Rough cutter trade.But, in the manufacture process of dresser, the abrasive particle d of smaller particle is difficult to be combined with base material and fixes.Instead can Because abrasive particle d easily comes off and scratch wafer, therefore the size to abrasive particle d has certain restriction (currently used conventional granule Size about 0.1 millimeter (millimeter, mm) is between 0.3 millimeter), and it is difficult to reduce efficiently the rough surface of polishing pad Degree.
The technology of industry quasiconductor comes into 7 nm (nanometer, nm) processing procedure at present, the polishing mat material used Material is not the most conventional rigid polishing pad, and the surface roughness value also relative requirement required for pad interface is lower.Therefore, as What designs to improve polishing pad trimmer by structure, and effective processing polished pad also controls good surface roughness, next gram Take above-mentioned disappearance, it has also become one of important topic that this cause to be solved.
Summary of the invention
The technical problem to be solved is, provides a kind of polishing pad finishing dress for the deficiencies in the prior art Put.
In order to solve above-mentioned technical problem, a wherein technical scheme of the present invention is,
A kind of trimming device for polishing cushion, comprising:
One pedestal;
At least one cutting members, described cutting members is arranged on described pedestal;And
At least positioning piece, described keeper is arranged on described pedestal, and protrudes from the upper surface of described pedestal.
The present invention is used an other technical scheme to be to provide a kind of trimming device for polishing cushion, it include a pedestal and At least one cutting members.Described cutting members is arranged on described pedestal, and a top of described cutting members has a blade part and Butting section.
Yet another aspect of the present invention is to provide a kind of trimming device for polishing cushion, and it includes a pedestal, at least One cutting members and at least one location structure.Described cutting members is arranged on described pedestal, and wherein said cutting members has a cutter Blade.Described location structure is formed in described cutting members or on described pedestal.
In sum, the present invention wherein one has the beneficial effects that, the polishing pad finishing dress that the embodiment of the present invention is provided Putting, it can be by " described location structure is formed in described cutting members or the technological means of " on described pedestal, can will polish Material cutting unnecessary on pad is without producing protuberance so that the burnishing surface of polishing pad can be relatively flat, throws with effective control The surface roughness of light pad.
It is further understood that inventive feature and technology contents for enabling, refers to below in connection with the present invention specifically Bright and accompanying drawing, however the accompanying drawing provided only provide with reference to and explanation use, be not used for the present invention person of being any limitation as.
Accompanying drawing explanation
When considered in conjunction with the accompanying drawings, by referring to detailed description below, it is possible to be more completely more fully understood that the present invention with And easily learn the advantage that many of which is adjoint, but accompanying drawing described herein is used for providing a further understanding of the present invention, Constituting the part of the present invention, the schematic description and description of the present invention is used for explaining the present invention, is not intended that this Bright improper restriction, such as figure wherein:
Fig. 1 is the schematic perspective view of the trimming device for polishing cushion of prior art.
Fig. 2 A is the present invention schematic diagram that wherein a cutting members contacts with polishing pad.
Fig. 2 B is the schematic diagram that the other cutting members of the present invention contacts with polishing pad.
Fig. 2 C is the schematic diagram that the another cutting members of the present invention contacts with polishing pad.
Fig. 2 D is the schematic diagram that the blade part of the another cutting members of the present invention contacts with polishing pad.
Fig. 3 is the three-dimensional combination figure of the trimming device for polishing cushion of the embodiment of the present invention 1.
Fig. 4 is the three-dimensional exploded view of the trimming device for polishing cushion of the embodiment of the present invention 2.
Fig. 5 is the axonometric chart of the finishing module of the embodiment of the present invention 2.
Fig. 6 is the side view that the finishing module of the embodiment of the present invention 2 has a major first face.
Fig. 7 is the side view that the finishing module of the embodiment of the present invention 2 has two major first faces.
Fig. 8 is that the finishing module of the embodiment of the present invention 2 has major first face and the side view of the first butting section.
Fig. 9 is the axonometric chart of the finishing module of the embodiment of the present invention 3.
Figure 10 is the side view of the finishing module of the embodiment of the present invention 3.
Figure 11 is the axonometric chart of the finishing module of the embodiment of the present invention 4.
Figure 12 is that the other side of the finishing module of the embodiment of the present invention 4 regards schematic diagram.
Figure 13 is the axonometric chart of the finishing module of the embodiment of the present invention 5.
Figure 14 is the three-dimensional combination figure of the trimming device for polishing cushion of the embodiment of the present invention 5.
Figure 15 is the three-dimensional combination figure of the trimming device for polishing cushion of the embodiment of the present invention 6.
Figure 16 is the axonometric chart of the finishing module of the embodiment of the present invention 7.
Figure 17 is the schematic diagram of the microstructured layers being arranged on location structure of the embodiment of the present invention.
The present invention is further described with embodiment below in conjunction with the accompanying drawings.
Detailed description of the invention
Obviously, those skilled in the art belong to the guarantor of the present invention based on the many modifications and variations that spirit of the invention is done Protect scope.
Those skilled in the art of the present technique are appreciated that unless expressly stated, singulative used herein " ", " Individual ", " described " and " being somebody's turn to do " may also comprise plural form.It is to be further understood that the wording used in this specification " bag Include " refer to there is described feature, integer, step, operation, assembly and/or assembly, but it is not excluded that existence or add one or Multiple further features, integer, step, operation, assembly, assembly and/or their group.It should be understood that when claiming assembly, assembly quilt When ' attach ' to another assembly, assembly, it can be directly connected to other assembly or assembly, or can also there is middle groups Part or assembly.Wording "and/or" used herein includes that one or more any cell listing item being associated is with complete Portion combines.
Those skilled in the art of the present technique are appreciated that unless otherwise defined, and all terms used herein (include technology art Language and scientific terminology) have with the those of ordinary skill in art of the present invention be commonly understood by identical meaning.Also should Being understood by, those terms defined in such as general dictionary should be understood that the meaning having with the context of prior art The meaning that justice is consistent, and unless defined as here, will not explain by idealization or the most formal implication.
For ease of the understanding to the embodiment of the present invention, explanation will be further explained below, and each embodiment will be not Constitute the restriction to the embodiment of the present invention.
A kind of by the first cutting members effectively to control the trimming device for polishing cushion of the surface roughness of polishing pad.
The following is illustrated by particular specific embodiment presently disclosed about the " reality of trimming device for polishing cushion " Executing mode, those skilled in the art can be understood advantages of the present invention and effect by content disclosed in this specification.The present invention can Implemented by other different specific embodiment or applied, the every details in this specification may be based on different viewpoints with Application, carries out various modification and change under without departing from the spirit.Simply illustrate it addition, the accompanying drawing of the present invention is only Bright, not according to the description of actual size, stated.Following embodiment will be explained in further detail the relevant skill of the present invention Art content, but disclosure of that and be not used to limit the present invention technical scope.
Although should be understood that possible use term first, second, third, etc. are to describe various assembly or signal etc. herein, But these assemblies or signal should not be limited by these terms.These terms are to distinguish an assembly and another assembly, or one Signal and another signal.It addition, as used herein, term "or" potentially include depending on practical situation be associated list project In any one or multiple all combinations.
First, referring to shown in Fig. 2 A, Fig. 2 B, Fig. 2 C and Fig. 2 D, the present invention provides a kind of trimming device for polishing cushion, its There is provided a cutting members (such as first cutting members 22 or the second cutting members 23) in order to repair the material on polishing pad E.For example, Cutting members can be flap cutting members.Following elder generation illustrates with the first cutting members 22.One top of the first cutting members 22 has One blade part K and a butting section 223 (referring to shown in Fig. 2 D, the such as first butting section 223 or the second butting section 233).Cutter Blade K is positioned at an edge on the top of the first cutting members 22, and butting section 223 is adjacent with blade part K and extends side by side.It addition, Butting section 223 can be a plane or a cambered surface.Furthermore, blade part K has one and prolongs towards pedestal 1 (referring to shown in Fig. 3) direction After the rake face (such as major first face 222 or the second rake face 232) stretched and extends towards the direction on described top Knife face (knife face 231 after such as major first flank 221 or the second), and can be formed between knife face and rake face afterwards one between 30~ Angle between 75 degree.The length of blade part K can be between 1~20 millimeter (mm).Should be noted that, first cut with first below Major first flank 221 and the major first face 222 of cutting members 22 illustrate.
It is contacted with polishing with explanation when the blade part of the first cutting members 22 referring back to Fig. 2 A, Fig. 2 B, Fig. 2 C and Fig. 2 D The situation of the bevel to be cut of pad E.Fig. 2 A is the present invention schematic diagram that wherein a cutting members contacts with polishing pad.First cutting members 22 Blade part K when contacting with polishing pad E, form an orthogonal rake between major first face 222 and the vertical line being perpendicular to polishing pad E (rake angle) θ 1 and major first flank 221 completely attach to the bevel to be cut of polishing pad E.Thereby in working angles, throw The material (chip chip) being removed on light pad E can slide onto a channel of chip removal along major first face 222.Subsidiary one carries, just Bevel angle θ 1 can be between 0 degree to 60 degree, more preferably between 30~45 degree, optimal for 45 degree of (shear angle).Thereby, by the orthogonal rake θ 1 of 45 degree so that the first cutting members 22 has the angle of shear most preferably removing material, and cuts Shear force is minimum.It addition, the angle of orthogonal rake θ 1 is bigger, blade is the sharpest, the most easily removes the material on polishing pad, but cutter is strong Degree dies down the most relatively.
Referring to Fig. 2 B, Fig. 2 B is the schematic diagram that the other cutting members of the present invention contacts with polishing pad.First cutting members 22 Blade part K when contacting with polishing pad, form an orthogonal rake θ between major first face 222 and the vertical line being perpendicular to polishing pad E 1 then forms one between knife face 221 and the bevel to be cut of polishing pad escapes to allow angle (clearance or relief angle) θ 2. For example: escape to allow angle θ 2 can more than 0 degree, more even escape to allow the angle of angle θ 2 between 0 degree to 15 degree, and it is still further preferred that Escape to allow angle θ 2 between 3 degree to 7 degree.Thereby, in working angles, escape angle θ 2 can be reduced major first flank 221 and throw The contact of light pad E and affect part machined on polishing pad E, simultaneously by escaping to allow angle θ 2 also avoid cutting members 22 and polishing pad The contact area of E is excessive and reduces cutting force.
Referring to Fig. 2 C, Fig. 2 C is the schematic diagram that the another cutting members of the present invention contacts with polishing pad.In the present embodiment first Cutting members 22 has before major first flank 221, major first face 222 and is connected to major first flank 221 and first The first butting section 223 between knife face 222.When the blade part K of the first cutting members 22 contacts with polishing pad E, the first butting section 223 contact with the bevel to be cut of polishing pad E, and just form one between major first face 222 and the vertical line being perpendicular to polishing pad E Bevel angle θ 1 and form one between major first flank 221 and the bevel to be cut of polishing pad E and escape to allow angle θ 2.Therefore, when the first cutting members During material on 22 cutting polishing pad E, the first butting section 223 first can cause part protuberance with fixed to having resilient polishing pad E Justice goes out to need the material removed.Then, the material of protuberance is removed by major first face 222.Thereby, the setting of the first butting section 223 Meter can be avoided excessively removing the material on polishing pad E and increasing the abrasion life-span of the first cutting members 22.Additionally it is worth mentioning It is that the first butting section 223 is also designed to the tangent plane with a circular arc.In other words, the first butting section 223 can be as one Location structure, and this location structure formed or be arranged in the first cutting members 22.But, should be noted that, other embodiment party In formula, location structure can also be formed or be arranged on pedestal 1, and 1 upper surface protruding from pedestal (refers to embodiment 2, determines Bit architecture can be for the keeper 24 shown in Figure 11), the present invention is not limited.It should be noted that location structure can be used for limiting Position the first cutting members 22 is relative to the height between polishing pad E, therefore, and location structure (the such as first butting section 223 or keeper 24) height can be less than or equal to the height of the first cutting members 22.Or be, location structure (the such as first butting section 223 or Keeper 24) height can be less than or equal to the height of blade part K, the right present invention is not limited.
Refer to the schematic diagram that the blade part that Fig. 2 D, Fig. 2 D is the another cutting members of the present invention contacts with polishing pad.Blade part K Knife face 221, one rake face 222 after having one, and can also have chamfering R between knife face 221 and rake face 222 afterwards , and the radius of chamfering is between 0.01~300 micron (micrometer, μm) (edgeradius).The wherein design of chamfering R Material unnecessary on polishing pad E can be cut in order to assist major first flank 221 to push away.Should be specified, such as Fig. 2 A, 2B and This chamfering R can also be had on the blade part K of the first cutting members 22 shown in 2C.One skilled in the art should be according to certainly The demand of body adjusts the blade part K changing the first cutting members 22, by the angle of orthogonal rake θ 1, escapes to allow the angle of angle θ 2 and chamfering The radius of R is optionally designed in the first cutting members 22, and the present invention no longer adds with this to repeat.
But, trimming device for polishing cushion can have multiple different change aspect.For example, the first cutting members 22 can To have different blade part K.Or, the first cutting members 22 can have multiple blade part K.Or, polishing pad finishing Device can have different spread patterns.Change aspect will be introduced one by one below by different embodiments.
Embodiment 1:
First, referring to Fig. 3 and coordinate shown in earlier figures 2A to Fig. 2 D, Fig. 3 is the first cutting members of the embodiment of the present invention 1 Schematic perspective view.The embodiment of the present invention provides a kind of trimming device for polishing cushion Z, comprising: pedestal 1 and first cutting members 22.First cutting members 22 top has a blade part K and a butting section 223 (referring to Fig. 2 C and Fig. 2 D), and blade part K is positioned at The edge on the top of the first cutting members 22, blade part K have one towards pedestal 1 direction extend major first face 222 and One major first flank 221 extended towards the direction on described top.Wherein major first flank 221 can contact with polishing pad E, and logical Cross major first face 222 cutting and remove the material on polishing pad E.In this embodiment, blade part K has between 0 degree to 60 degree Orthogonal rake θ 1, and there is escaping between 0 degree to 15 degree θ 2 allow angle.In other embodiments, the first cutting members also may be used To have chamfering R structure as shown in Figure 2 D.The present invention does not do any restriction at this.
Holding above-mentioned, in the present embodiment, the first cutting members 22 can be set directly on pedestal 1 by the way of pasting.Yu Qi In its embodiment, the first cutting members 22 can also be by embedding or by being arranged on pedestal 1 by the way of fixing.This area has First cutting members 22 should simple change be arranged on pedestal 1 by usually intellectual voluntarily, and the present invention is not limited.
Embodiment 2:
Refer to the three-dimensional exploded view of the trimming device for polishing cushion that Fig. 4, Fig. 4 are the embodiment of the present invention 2.The embodiment of the present invention A kind of trimming device for polishing cushion Z is provided, comprising: a pedestal 1 and multiple finishing module 2.Each finishing module 2 includes one The bearing assembly 21 being arranged on pedestal 1 and first cutting members 22 being arranged on bearing assembly 21, the first cutting members 22 And form a channel of chip removal g between bearing assembly 21.
Accept above-mentioned, pedestal 1 has multiple containing groove 11, and multiple finishing module 2 is separately positioned on multiple accommodating In groove 11.For example, finishing module 2 can allow with different modes such as engaging, bind, fix, embed, paste, spiral shell sets and repair Whole assembly 2 is arranged among containing groove 11.Therefore, each finishing module 2 is removably disposed in corresponding accommodating recessed In groove 11.Subsidiary one carries, and what finishing module 2 can be paired is arranged on pedestal 1, to keep the balance of whole pedestal 1, it is to avoid high Produced vibrations when speed rotates.
Refer to the axonometric chart of the finishing module that Fig. 5, Fig. 5 are the embodiment of the present invention 2.Each finishing module 2 includes holding Carry assembly 21 and the first cutting members 22.Bearing assembly 21 has one first protuberance 211 and and divides each other with the first protuberance 211 From the second protuberance 212, and channel of chip removal g is arranged between the first protuberance 211 and the second protuberance 212.Further, the first cutting Part 22 is located on channel of chip removal g, and is arranged on the first protuberance 211 and the second protuberance 212.Furthermore, the first cutting members 22 It is also designed to be removably disposed on bearing assembly 21.In detail, the edge on the top of the first cutting members 22 has One blade part K, blade part K have a major first flank 221 and extended towards the direction on described top towards carrying group The major first face 222 that part 21 direction extends.Wherein major first flank 221 can contact with polishing pad E, and passes through major first face 222 cuttings remove the material on polishing pad E.Thereby, the whole face of major first face 222 removes the material on polishing pad E and makes polishing E is more smooth for pad, and the material after cutting can be discharged by channel of chip removal g.Subsidiary one carries, length D 1 of the first cutting members 22 Can be between 1 millimeter (mm)~20 millimeters (mm), and the length of blade part K can be with the complete phase of length of the first cutting members 22 With, or less than the first cutting members 22, the present invention is not limited thereto system.Further, the material of the blade part K of the first cutting members 22 Can select as monocrystalline diamond, glomerocryst diamond (Polycrystalline Diamond, PCD), CVD diamond (chemical Vapor deposition diamond (chemical gaseous phase depositing diamond method)), carbide cutting part combine plating CVD diamond film, (PCD) glomerocryst diamond cutting part combines plating CVD diamond film, ceramic material combines plating CVD diamond film or other material plating CVD bores Stone, the present invention is not limited thereto system.
Should be specified, the blade part K design of the first cutting members in the present embodiment structure as shown in Figure 2 B, There is angle escaping between 0 degree to 15 degree or between 1 degree to 15 degree and allow angle θ 2.But, in other embodiments, first cuts The design of the blade part K of cutting members 22 can be as shown in Fig. 2 A or Fig. 2 C, or the blade part K of the first cutting members 22 can also set Being calculated as the chamfering R structure having as shown in 2D, one skilled in the art should change according to practical situation, at this not voluntarily Add again to repeat.
Continuing above-mentioned, finishing module 2 can have multiple different change aspect to remove material on polishing pad E to promote cutting Efficiency, and increase trimming device for polishing cushion application range.For example, Fig. 5 is coordinated the most in the lump, and refering to Fig. 6, Fig. 7 And the finishing module that Fig. 8, Fig. 6 are the embodiment of the present invention 2 has the side view of a major first face.Fig. 7 is that the present invention is real The finishing module executing example 2 has the side view of two major first faces.Fig. 8 is that the finishing module of the embodiment of the present invention 2 has One rake face and the side view of the first butting section.
As shown in Figure 6, the first cutting members 22 has a blade part K, and has a major first face 222 on blade part K, And major first face 222 is extended on bearing assembly 21 by the top of blade part K.Similarly, in the embodiment shown in Fig. 6 One cutting members 22 has angle escaping between 0 degree to 15 degree allows angle θ 2.In other embodiments, the first cutting members 22 also may be used Escape to allow angle θ 2 to be designed to not have, or the blade part K of the first cutting members 22 can design and have radius between 0.01~300 The chamfering R structure of micron.The present invention can have arbitrarily change for the design of the first cutting members 22, no longer adds to repeat in this.
As it is shown in fig. 7, the first cutting members 22 have have first on two blade part K, and each blade part K before cutter Face 222.Two major first faces 222 are extended on bearing assembly 21 by major first flank 221 respectively.In the present embodiment, two The angle, θ 3 that individual major first face 222 is formed with bearing assembly 21 respectively is identical.In other embodiments, cutter before two first The angle, θ 3 that face 222 is formed with bearing assembly 21 respectively can also be different.
As shown in Figure 8, only one of which the first cutting members 22 on finishing module 2, and before the first cutting members 22 has one first Knife face 222.For the embodiment of Fig. 8, location structure may be formed on finishing module 2, furthermore, it is understood that location structure can shape Become in the first cutting members 22, be that the first butting section 223 illustrates with location structure below.Specifically, the first cutting members Before the top of 22 has at least one first butting section 223 (location structure), and at least one first butting section 223 and at least one first Knife face 222 is connected with each other, and the height that the height of the first butting section 223 is less than or equal to blade part K.Furthermore, the first butting section 223 are connected between major first flank 221 and major first face 222.Subsidiary one carries, in the first cutting members 22 shown in Fig. 8 also Can have two major first faces 222 as the first cutting members 22 as shown in Figure 7, and two major first faces 222 are the most each Not having the first butting section 223, it no longer can be added to repeat in this in conjunction with Fig. 4 and Fig. 5 to complete.Embodiment shown in Fig. 8 In the first cutting members 22 can also design and there is angle escaping between 0 degree to 15 degree allow angle θ 2.Or, the first cutting members The blade part K of 22 can design has the chamfering R structure that radius is between 0.01~300 micron.The present invention is for the first cutting members The design of 22 can have arbitrarily change, no longer adds to repeat in this.
Embodiment 3:
Refer to the axonometric chart of the finishing module that Fig. 9 and Figure 10, Fig. 9 are the embodiment of the present invention 3.Figure 10 is that the present invention is real Execute the side view of the finishing module of example 3.Each finishing module 2 also includes one second cutting members 23, and the second cutting members 23 with First cutting members 22 is disposed adjacent to each other.Similarly, the second cutting members 23 is located on channel of chip removal g, and it is convex to be arranged at first In portion 211 and the second protuberance 212.Furthermore, the second cutting members 23 can also be designed to be removably disposed in bearing assembly 21 On.Further, the first cutting members 22 of finishing module 2 can have at least one major first face 222, the second cutting members 23 have to Few one second rake face 232.It addition, should be noted that, channel of chip removal g can also be set in other embodiments, and It is directly the first cutting members 22 and the second cutting members 23 to be arranged on bearing assembly 21.
Accepting above-mentioned, in embodiment 3, the first cutting members 22 and the second cutting members 23 can have identical structure. The structure of the second cutting members 23 refers to the aforementioned multiple aspect (as shown in Figure 6 to 8) for the first cutting members 22.Citing comes Saying, referring to Fig. 7 again, the top of the first cutting members 22 has at least one first butting section 223, at least one first butting section 223 Being connected with each other with at least one major first face 222, the top of the second cutting members 23 has at least one second butting section 233, and extremely Few one second butting section 233 is connected with each other with at least one second rake face 232.Or, the first cutting in other embodiments Part 22 and the second cutting members 23 can have the structure differed.For example, the first cutting members 22 design as shown in Figure 6 and Two cutting members design as shown in Figure 7.One skilled in the art can be according to actually demand adjusted design the first cutting members 22 With the structure of the second cutting members 23, the present invention is not limited thereto system.
Embodiment 4:
Refer to the axonometric chart of the finishing module that Figure 11 and Figure 12, Figure 11 are the embodiment of the present invention 4.Figure 12 is the present invention A wherein schematic side view of the finishing module of embodiment 4.In embodiment 4, finishing module 2 have one first cutting members 22 with And a location structure, for the embodiment of Figure 11 and Figure 12, location structure may be formed on finishing module 2, furthermore, it is understood that Location structure may be formed on bearing assembly 21, illustrates with location structure for keeper 24 below.Specifically, keeper The height of 24 (location structures) can be less than or equal to the height of the first cutting members 22, and keeper 24 sets side by side with the first cutting members 22 Put on bearing assembly 21, in order to control first cutting members 22 difference in height relative to keeper 24, and limit the first cutting members 22 cutting depth protruding keeper 24.For Geng Xiangxi, keeper 24 is arranged on the front of the first cutting members 22, therefore when When finishing module 2 contacts with grinding pad, keeper 24 can first contact the bevel to be cut of grinding pad, to flatten the to be cut of concavo-convex inequality Bevel.Then, the first cutting members 22 can carry out cutting the difference in height that keeper 24 is limited, and uses control the first cutting members 22 convex Cutting depth for keeper 24.What deserves to be explained is, in other embodiments, location structure (keeper 24) can also Having a cutting structure C, this cutting structure C has the effect that remove material identical with the blade part K of the first cutting members 22.
Continue above-mentioned, by changing height between the first cutting members 22 and bearing assembly 21 and keeper 24 and can hold Carry the height between assembly 21 to control the degree of depth to be cut.For example, the top of the first cutting members 22 and bearing assembly 21 Between distance be the first distance h1, the distance between an end face 241 and the bearing assembly 21 of keeper 24 is second distance h2, The most as shown in figure 12, the first distance h1 can be more than second distance h2.But, the first distance h1 and second in other embodiments Distance h2 can be identical or the first distance h1 is slightly below second distance h2.Therefore, by the first distance h1 and second distance h2 Difference, the cutting depth of the first cutting members 22 can be set as this difference.The difference of the first distance h1 and second distance h2 can With between 0 micron to 100 micron (micrometer, μm), it is preferred that the difference of the first distance h1 and second distance h2 can With between 20 microns to 50 microns, in other words, the height of location structure (keeper 24 or the first butting section 223) can be low Between the end face 0 micron to 100 microns of the first cutting members 22, maybe can be micro-to 50 less than the end face 20 microns of the first cutting members 22 Between meter.Subsidiary one carries, and can also thrust polishing pad E mistake to avoid the first cutting members 22 of finishing module 2 by keeper 24 Deeply, the material on too much polishing pad E is removed.It addition, what deserves to be explained is, an end face 241 of keeper 24 can be a plane or Being a cambered surface, the present invention is not limited.
It addition, please referring initially to shown in Figure 17, keeper 24 (location structure) can also have a microstructured layers U, citing comes Saying, microstructured layers U can be a grinding micro structure, and to be cut by the grinding micro structure on keeper 24 and polishing pad E Face contacts, and is combed vertical so that material unnecessary on bevel to be cut is positioned part 24.Then, the first cutting members 22 is by polishing pad The upper material removal vertical by comb of E.What deserves to be explained is, aforementioned butting section 223 can also have a microstructured layers U, on reaching State effect.Thereby, plough can be produced by the mechanism of grinding and cut effect.Microstructured layers U is a pectinate texture.What deserves to be explained is, Microstructured layers U can also be a rough-shape micro structure, be in granular form micro structure, in the micro structure of array shape, in sawtooth The micro structure of type shape, the micro structure in pyramid shape or in irregular micro structure, the present invention is not limited.
It will be understood by those skilled in the art that the above is that trimming device for polishing cushion one typical case implements aspect, this The subsequent applications of invention can have various changes in different enforcement aspects.
Embodiment 5:
For example, the axonometric chart of the finishing module that Figure 13 and Figure 14, Figure 13 are the embodiment of the present invention 5 is referred to.Figure 14 is the three-dimensional combination figure of the trimming device for polishing cushion of the embodiment of the present invention 5.As shown in figure 13, finishing module 2 ' has a carrying The first cutting members 22 ' that assembly 21 ' and is arranged on bearing assembly 21 '.Bearing assembly 21 ' have a par 213 ' with And one adjacent to the first protuberance 211 ' of par 213 '.There is at least one lockhole 214 ', by lockhole on par 213 ' 214 ' in order to be fixed at finishing module 2 ' on pedestal.For embodiment 5, lockhole 214 ' can include one first lockhole 2141 ', One second lockhole 2142 ' and one the 3rd lockhole 2143 '.Thereby so that bearing assembly 21 ' has the first lockhole arranged side by side 2141 ', 1 second lockhole 2142 ' and one the 3rd lockhole 2143 ', with in order to be installed in the first cutting members 22 ' on pedestal 1 '. For example, after the second lockhole 2142 ', the first cutting members 22 ' can be installed in pedestal first with a fixture (spiral lock) On 1 '.Then, recycle two other fixture and pass the first lockhole 2141 ' and the 3rd lockhole 2143 ', to adjust the first cutting The level height of part 22 '.Must say name, each first cutting members 22 ' being arranged on pedestal 1 ' is preferably kept in same In one level height.It addition, the first cutting members 22 ' is arranged on the first protuberance 211 ', the first cutting members 22 ' has a blade part K ' is designed to Radius arc edge T between 10~100 millimeters (millimeter, mm).Blade part K ' has first Rear knife face 221 ' and major first face 222 ', and major first flank 221 ' is connected to form an arc with the second rake face 222 ' Blade part K.Being contacted with the bevel to be cut of polishing pad E by major first flank 221 ', it is unnecessary that the second rake face 222 ' can cut Material, and cutting can an oblique section 215 ' sliding on the first protuberance 211 '.It is noted that the second rake face 222 ' can have identical slope with oblique section 215 ' and be connected with each other.Or, the second rake face 222 ' and oblique section 215 ' can have different slopes.Wherein bearing assembly 21 ' also has a row and cuts face 216 ', and row cuts face 216 ' and is connected to Between oblique section 215 ' and the first protuberance 211 '.When the first cutting members 22 ' cuts polishing pad E more than material, cut by row Face 216 ' and oblique section 215 ' can cut face 216 ' and oblique section 215 ' slip eliminating with assisted machining via row.
Referring to shown in Figure 14, trimming device for polishing cushion Z ' has the finishing module 2 ' of symmetric arrays two-by-two, and each The front of finishing module 2 ' is all respectively provided with a location structure, illustrates with location structure for keeper 3 ' below.Come in detail Saying, for the embodiment of Figure 14, keeper 3 ' (location structure) may be formed on pedestal 1 ', and the height of keeper 3 ' can be low In or equal to the height of blade part K '.Finishing module 2 ' can pass through a screw (non-label in figure) and be fixed in lockhole 214 ', with Screw togather finishing module 2 ' and pedestal 1 '.Subsidiary one carries, and has a preset distance between keeper 3 ' and finishing module 2 ' so that the A space can be formed between one rake face 222 ', oblique section 215 ' and keeper 3 '.Therefore cut when major first face 222 ' After material can slide onto in the space that keeper 3 ' and finishing module 2 ' are formed so that this preset distance is similar to aforementioned Channel of chip removal g in embodiment.It addition, what deserves to be explained is, an end face (non-label in figure) of keeper 3 ' (location structure) Can be a plane or a cambered surface.Furthermore, it is understood that the position of keeper 3 ' also have to be arranged at finishing module as indicated in the drawings 2 ' front ends, in other embodiments keeper 3 " can also be arranged between two finishing modules 2 ', or by keeper 3 " ' It is arranged at the centre of pedestal 1 '.It is noted that keeper 3 ', keeper 3 ", keeper 3 " ' setting can be selected or according to needing Ask and optionally arrange.What deserves to be explained is, in other embodiments, location structure (keeper 3 ', 3 ", 3 " ') also may be used To have a cutting structure C (not shown in Figure 14, referring to shown in Figure 12), this cutting structure C has and the first cutting members 22 Cutting effect identical for blade part K.It is noted that keeper 3 ' can also be provided with as described in previous embodiment micro- Structure sheaf U.
Embodiment 6:
Furthermore, the finishing module on trimming device for polishing cushion Z can also have different arrangement modes to strengthen processing polished The efficiency of pad.Refer to the three-dimensional combination figure of the trimming device for polishing cushion that Figure 15, Figure 15 are the embodiment of the present invention 6.Finishing module 2 Radial being arranged on pedestal 1, such as: clockwise or counterclockwise can be arranged in.In the present embodiment, by finishing module 2 It is arranged on pedestal 1 in counterclockwise, during so that trimming device for polishing cushion M rotates on polishing pad, passes through tangential motion By chip discharge.In other embodiments, finishing module 2 can also be arranged on pedestal 1 by other arrangement mode, to increase Add efficiency when processing polished pad.One skilled in the art can depend on actual demand adjusted design finishing module 2 Arrangement mode, as long as finishing module 2 presents symmetric mode or is evenly distributed in impact faces to avoid shaking, the present invention It is not limited thereto system.
Embodiment 7:
Referring to shown in Figure 16, Figure 16 is the axonometric chart of the finishing module of the embodiment of the present invention 7.Finishing module 2 " have one First cutting members 22 ", the first cutting members 22 " there is a blade part K ", a major first flank 221 " and a major first face 222 ", Blade part K ", major first flank 221 " and major first face 222 " feature as described in previous embodiment, at this hold the most superfluous State.It should be noted that the first cutting members 22 " material be selected from metal (such as but not limited to: molybdenum (Molybdenum, Mo), Ferrum (Fe) or vanadium (Vanadium, V)), alloy (such as but not limited to tungsten carbide (Tungsten Carbide, WC)), glomerocryst bore Stone (Polycrystalline Diamond, PCD), pottery are (such as but not limited to carborundum (Silicon carbide, SiC) Or aluminium oxide (Al2O3)).Furthermore, the first cutting members 22 " on be also provided with a thin layer P, for example, this thin layer P can Thinking a diamond film, and diamond film can be CVD diamond, polycrystalline diamond or nm diamond etc., the present invention is not limited.It is worth It is noted that thin layer P can also be coated with trimming device for polishing cushion Z completely or cover the first cutting members 22 ", the present invention is not with thin Film layer P is coated with the first cutting members 22 the most completely " or only cover blade part K " be limited.In other words, trimming device for polishing cushion Z Overall outer surface can plate thin film layer P.
What deserves to be explained is, the first cutting members 22 " also include a par 224, and there is on par 224 at least one lock Hole 225, be may be used to finishing module 2 by the setting of lockhole 225 " it is fixed on pedestal.For embodiment 7, lockhole 225 can Including one first lockhole 2251,1 second lockhole 2252 and one the 3rd lockhole 2253.Thereby, with in order to by the first cutting members 22 " it is installed on pedestal, it is also possible to adjust height level.
The present invention wherein one has the beneficial effects that, the trimming device for polishing cushion that the embodiment of the present invention is provided, and it can lead to Cross that " described location structure (the first butting section 223, keeper 24 or keeper 3 ') is formed at described cutting members (the first cutting members 22 or second cutting members 23) on upper or described pedestal (1,1 '), the height of wherein said location structure be less than or equal to described in cut The technological means of the height " of the blade part of cutting members (k, K ', K "), can cut material unnecessary on polishing pad E without producing Raw protuberance so that the burnishing surface of polishing pad E can be relatively flat, effectively to control the surface roughness of polishing pad E.
[symbol description]
Polishing pad finishing Q, Z, Z '
Device
Pedestal 1,1 ' containing groove 11
Finishing module 2,2 ', 2 " bearing assembly 21,21 '
First protuberance 211 211,211 '
Second protuberance 212 212
Par 213 '
Lockhole 214 '
First lockhole 2141 '
Second lockhole 2142 '
3rd lockhole 2143 '
Oblique section 215 '
First cutting members 22,22 ', 22 "
Major first flank 221,221 ', 221 "
Major first face 222,222 ', 222 "
First butting section 223
Par 224
Lockhole 225
First lockhole 2251
Second lockhole 2252
3rd lockhole 2253
Second cutting members 23
Knife face 231 after second
Second rake face 232
Second butting section 233
Keeper 24
End face 241
Keeper 3 ', 3 ", 3 " '
Blade part K, K ', K "
Thin layer P
Length D1
Channel of chip removal g
Orthogonal rake θ 1
Escape to allow angle θ 2
Angle, θ 3
First distance h1
Second distance h2
Abrasive particle d
Polishing pad E
Chamfering R
Arc edge T
Cutting structure C
Microstructured layers U
The foregoing is only the preferable possible embodiments of the present invention, non-the scope of the claims therefore limiting to the present invention, therefore such as Use the equivalence techniques change that description of the invention and accompanying drawing content are done, be both contained in protection scope of the present invention.

Claims (31)

1. a trimming device for polishing cushion, it is characterised in that including:
One pedestal;
At least one cutting members, described cutting members is arranged on described pedestal;And
At least positioning piece, described keeper is arranged on described pedestal, and protrudes from the upper surface of described pedestal.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that the height of wherein said keeper is low In or equal to the height of described cutting members.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that wherein, a top of described cutting members Having a blade part and a butting section, described blade part is positioned at an edge on described top, described butting section and described cutter Blade is adjacent and extends side by side.
A kind of trimming device for polishing cushion the most according to claim 3, it is characterised in that wherein, described butting section is a plane Or a cambered surface.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that wherein, an end face of described keeper It is a plane or a cambered surface.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that wherein, described cutting members just has one Angle is escaped to allow in oblique angle and, described orthogonal rake between 0 degree to 60 degree, described in escape to allow angle between 0 degree to 15 degree.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that wherein, described cutting members is lamellar.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that wherein, described cutting members also has one Channel of chip removal.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that wherein, described pedestal has at least one Containing groove, is used for housing described cutting members.
A kind of trimming device for polishing cushion the most according to claim 1, it is characterised in that wherein, described cutting members is arranged at On one bearing assembly, described bearing assembly is in order to be installed on described pedestal, and described bearing assembly has one first lock arranged side by side Hole, one second lockhole and one the 3rd lockhole.
11. a kind of trimming device for polishing cushion according to claim 1, it is characterised in that wherein, the material of described blade part Monocrystalline diamond, glomerocryst diamond, CVD diamond, carbide cutting part combination plating CVD diamond film, glomerocryst diamond cutting can be selected from Part combines plating CVD diamond film or ceramic material combines plating CVD diamond film.
12. a kind of trimming device for polishing cushion according to claim 1, it is characterised in that wherein, the height of described keeper A blade part 10 microns to 100 microns less than described cutting members.
13. a kind of trimming device for polishing cushion according to claim 1, it is characterised in that wherein, described cutting members is arranged There is a diamond film.
14. a kind of trimming device for polishing cushion according to claim 1, it is characterised in that wherein, described keeper has one Microstructured layers.
15. a kind of trimming device for polishing cushion according to claim 1, it is characterised in that wherein, described keeper has one Cutting structure.
16. a kind of trimming device for polishing cushion according to claim 1, it is characterised in that wherein, described polishing pad finishing fills The surface configuration put has a diamond film.
17. 1 kinds of trimming device for polishing cushion, it is characterised in that including:
One pedestal;And
At least one cutting members, described cutting members is arranged on described pedestal, a top of described cutting members have a blade part with And a butting section.
18. a kind of trimming device for polishing cushion according to claim 17, it is characterised in that wherein, the height of described butting section Height less than or equal to described blade part.
19. a kind of trimming device for polishing cushion according to claim 17, it is characterised in that wherein, described butting section is with described Blade part is adjacent and extends side by side, and described butting section is a plane or a cambered surface.
20. a kind of trimming device for polishing cushion according to claim 17, it is characterised in that wherein, described cutting members has one Orthogonal rake and one escapes to allow angle, described orthogonal rake between 0 degree to 60 degree, described in escape to allow angle between 0 degree to 15 degree.
21. a kind of trimming device for polishing cushion according to claim 17, it is characterised in that wherein, described butting section has one Microstructured layers.
22. a kind of trimming device for polishing cushion according to claim 17, it is characterised in that wherein, described polishing pad finishing fills The surface configuration put has a diamond film.
23. 1 kinds of trimming device for polishing cushion, it is characterised in that including:
One pedestal;
At least one cutting members, described cutting members is arranged on described pedestal, and wherein said cutting members has a blade part;And
At least one location structure, described location structure is formed in described cutting members or on described pedestal, wherein said location knot The height of structure is less than or equal to the height of described blade part.
24. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, the height of described location structure Degree is less than or equal to the height of described blade part.
25. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, described location structure has One microstructured layers.
26. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, described location structure has One cutting structure.
27. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, the one of described location structure End face is a plane or a cambered surface.
28. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, described cutting members has one Orthogonal rake and one escapes to allow angle, described orthogonal rake between 0 degree to 60 degree, described in escape to allow angle between 0 degree to 15 degree.
29. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, the material of described keeper Monocrystalline diamond, glomerocryst diamond, CVD diamond, carbide cutting part combination plating CVD diamond film, glomerocryst diamond cutting can be selected from Part combines plating CVD diamond film or ceramic material combines plating CVD diamond film.
30. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, described cutting members is arranged There is a diamond film.
31. a kind of trimming device for polishing cushion according to claim 23, it is characterised in that wherein, described polishing pad finishing fills The surface configuration put has a diamond film.
CN201610629089.7A 2016-08-03 2016-08-03 A kind of trimming device for polishing cushion Pending CN106078517A (en)

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CN106312819A (en) * 2016-11-15 2017-01-11 华侨大学 Rapid sharpening method for hard-brittle sheet part planet grinding wheel
CN106956213A (en) * 2017-02-24 2017-07-18 咏巨科技有限公司 Combined finisher and its manufacture method
CN111113269A (en) * 2018-10-31 2020-05-08 台湾积体电路制造股份有限公司 Conditioning apparatus and method for conditioning a polishing pad for chemical mechanical polishing
TWI801997B (en) * 2021-05-20 2023-05-11 大陸商杭州眾硅電子科技有限公司 A pad conditioner ,conditioner head and a spinning part therein

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CN1548271A (en) * 2003-05-13 2004-11-24 中国砂轮企业股份有限公司 Trimming disc with grinding grains capable of being regulated individually and its making process
CN1929956A (en) * 2004-03-09 2007-03-14 3M创新有限公司 Undulated pad conditioner and method of using same
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CN106312819A (en) * 2016-11-15 2017-01-11 华侨大学 Rapid sharpening method for hard-brittle sheet part planet grinding wheel
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TWI801997B (en) * 2021-05-20 2023-05-11 大陸商杭州眾硅電子科技有限公司 A pad conditioner ,conditioner head and a spinning part therein

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