CN106054534A - Printing technology for screen printing plate - Google Patents

Printing technology for screen printing plate Download PDF

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Publication number
CN106054534A
CN106054534A CN201610407302.XA CN201610407302A CN106054534A CN 106054534 A CN106054534 A CN 106054534A CN 201610407302 A CN201610407302 A CN 201610407302A CN 106054534 A CN106054534 A CN 106054534A
Authority
CN
China
Prior art keywords
half tone
photoresists
thickness
photographic film
typography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610407302.XA
Other languages
Chinese (zh)
Inventor
李世杰
楚树恒
王冲普
曹献青
李瑞宗
李须来
宋晓龙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hebei Jing-long Sun Equipment Co., Ltd.
Original Assignee
NINGJIN SUNSHINE NEW ENERGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NINGJIN SUNSHINE NEW ENERGY Co Ltd filed Critical NINGJIN SUNSHINE NEW ENERGY Co Ltd
Priority to CN201610407302.XA priority Critical patent/CN106054534A/en
Publication of CN106054534A publication Critical patent/CN106054534A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/14Forme preparation for stencil-printing or silk-screen printing

Abstract

The invention relates to a printing technology for a screen printing plate and belongs to the technical field of optical tools. The printing technology comprises the following steps of coating photo-sensitive resist with the lower phase demodulation degree on a scraper surface of the screen printing plate, drying and repeating for many times until the thickness of the photo-sensitive resist is equal to the thickness of gauze; still coating the photo-sensitive resist with the lower phase demodulation degree on a printing surface of the screen printing plate, drying, attaching a first photographic film with the wide line, exposing and developing to obtain a grid line, and removing the first photographic film; coating the photo-sensitive resist with the lower phase demodulation degree on the printing surface, drying and repeating for many times until the thickness of the layer of the photo-sensitive resist is up to the standard; and coating a layer of fluorine rubber on the layer of the photo-sensitive resist, drying, attaching a second photographic film with the thin line, exposing and developing to obtain a needed grid line, and removing the second photographic film after the operations are finished. According to the printing technology, the overall wear resistance of the photo-sensitive resist is better, the service life is longer, and the manufacturing cost can be effectively controlled.

Description

A kind of typography of half tone
Technical field
The invention belongs to optical tooling technical field, relate to screen printing technology, be specifically related to the printer of a kind of half tone Skill.
Background technology
Half tone is only coated with one layer of photoresists on steel wire when printing at present, then pastes egative film, is exposed development, institute The photoresists being coated with are generally divided into two kinds, and a kind of is that solution spends high photoresists mutually, and another kind is that solution spends low photoresists mutually.Wherein, It is thin that solution spends high photoresists granularity mutually, but the life-span is short, wears no resistance, and cost is the highest;Photoresists low for Xie Xiangdu are resistance to Mill property is good, and the life-span is long, but owing to granularity is thick, so that can not be done by grid line is very thin, the grid line worked it out is rough, band hairiness Thorn, affects using effect.Therefore, how to make half tone life-span length, wearability when printing good, that can be done by grid line again is very thin, Cost can be reduced simultaneously, be a major issue anxious to be resolved during half tone uses.
Summary of the invention
The deficiency existed when instant invention overcomes existing screen painting, it is provided that the typography of a kind of half tone, this technique Half tone can be made to be provided simultaneously with good wearability, the carrot-free advantage of smooth surface in printing process, additionally, this half tone Manufacturing cost also is able to stable at reduced levels.
The concrete technical scheme of the present invention is:
The typography of a kind of half tone, described half tone includes hollow frame and is positioned at the grenadine of hollow frame, crucial Point is that this technique comprises the steps:
A, be first coated with one layer of solution spend mutually in the blade face of half tone and be: the photoresists of imaging more than 50um live width, post-drying;
B, half tone printing surface be coated with solution spend mutually for image more than 50um live width photoresists, thickness is 14-16um, Dry again;Again be coated with Xie Xiangdu be imaging more than 50um live width photoresists above paste the first photographic film, this first sense Exograph X has the lines that width is 258-262um;Afterwards, it is exposed in exposure machine, after development, obtains grid line, by first Photographic film is removed;
C, continue one layer of solution of coating at printing surface and spend the photoresists for imaging 18-22um live width mutually, dry, repeat coating with Baking step, until the thickness of photoresists is 10-20um;Pasting the second photographic film again, this second photographic film has width and is The lines of 21-25um;Afterwards, it is exposed in exposure machine, after development, obtains required grid line, the second photographic film is removed.
The step being coated with photoresists in step A includes: is coated with and repeats with drying, and each coating thickness is 2-3um, directly Identical with grenadine thickness to thickness.
Each coating thickness is 2-3um with baking step to repeat coating in step C.
In step C before patch the second photographic film, also carry out following steps:
C1, above photoresists be coated with one layer of fluorine element glue, thickness is 1um, dry.
Thickness described in step B is 15um.
The grid line of step C gained is the 1/15~1/10 of the grid line of step B gained.
The first photographic film described in step B has the lines that width is 260um.
The second photographic film described in step C has the lines that width is 23um.
The invention has the beneficial effects as follows: solution is spent relatively low photoresists and is arranged on inside by the present invention mutually, and by wide lines The first photographic film form wide grid line, so can not only quickly realize the thickness of required photoresists, and rely on Xie Xiangdu The wearability of relatively low photoresists, in half tone, the service life of associative perception photosphere can be guaranteed, and solution is spent higher mutually Photoresists are arranged on photoresists outside relatively low for Xie Xiangdu thus as contact work surface, it is possible to utilize its Glabrous well The advantage of thorn, uses smooth and easy, and the second photographic film by hachure forms thin grid line, and printing effect can be protected Card, additionally, due to using photoresists relatively low for Xie Xiangdu, only external face on major part thickness is that solution is spent higher mutually Photoresists, the integral manufacturing cost of half tone can be effectively controlled.
Detailed description of the invention
The present invention relates to the typography of a kind of half tone, described half tone includes hollow frame and is positioned at hollow frame Grenadine, spends solution low photoresists mutually and is coated on grenadine both sides, and be exposed with the photographic film of wide lines, will solve during printing Spending high photoresists mutually and be coated on outside as work surface, and the photographic film by hachure is exposed, and finally makes half tone It is provided simultaneously with that wearability is good, life-span length, grid line advantage thinner, lower-cost.
Specific embodiment, the typography of half tone specifically includes following steps:
A, be first coated with one layer of solution in the blade face of half tone and spend the photoresists for more than 50um live width can be imaged mutually, after bake Dry, it is coated with and repeats with drying, each coating thickness is 2.5um, until thickness is identical with grenadine thickness;
B, half tone printing surface be coated with solution spend the photoresists for more than 50um live width can be imaged mutually, thickness is 15um, Dry again;Being can to image to paste the first photographic film above the photoresists of more than 50um live width being coated with Xie Xiangdu again, this is years old One photographic film has the lines that width is 260um;Afterwards, it is exposed in exposure machine, after development, obtains grid line, by first Photographic film is removed;
C, printing surface continue one layer of solution of coating spend mutually for can image about 20um live width photoresists, dry, weight Overcoating cloth and baking step, each coating thickness is 2.5um, until the thickness of photoresists is 15um;Afterwards, above photoresists Being coated with one layer of fluorine element glue, thickness is 1um, dries, then pastes the second photographic film, and it is 23um's that this second photographic film has width Lines;Afterwards, being exposed in exposure machine, obtain required grid line after development, now the width of grid line is step B gained grid line The 1/15~1/10 of width, removes the second photographic film after end of operation.
Solution is spent low photoresists as laying by screen printing process mutually that the present invention relates to, it is possible to be rapidly achieved required The thickness of photoresists, and use wide lines first photographic film exposure obtain wider grid line, service life can obtain Ensureing, and cost has obtained effective control, the photoresists arranged in external face are that solution spends higher photoresists, granule mutually Degree is relatively thin, and Glabrous stings, photoresists higher for Xie Xiangdu can by the photographic film exposure of hachure obtain thinner Grid line, printing effect is preferable, and between photoresists and photographic film, one layer of fluorine element glue of coating can play moisture resistance effect, half tone Use and storage environment extended, be not easy to the most non-serviceable situation of printing effect difference that the occurrence of wetness causes, Use and printing effect for photoresists can play a very good protection.

Claims (8)

1. a typography for half tone, described half tone includes hollow frame and is positioned at the grenadine of hollow frame, its feature It is: this technique comprises the steps:
A, be first coated with one layer of solution spend mutually in the blade face of half tone and be: the photoresists of imaging more than 50um live width, post-drying;
B, being coated with solution at the printing surface of half tone and spend the photoresists for imaging more than 50um live width mutually, thickness is 14-16um, then dry Dry;Again be coated with Xie Xiangdu be imaging more than 50um live width photoresists above paste the first photographic film, this first photosensitive end Sheet has the lines that width is 258-262um;Afterwards, it is exposed in exposure machine, after development, obtains grid line, photosensitive by first Egative film is removed;
C, continue one layer of solution of coating at printing surface and spend the photoresists for imaging 18-22um live width mutually, dry, repeat coating and dry Step, until the thickness of photoresists is 10-20um;Pasting the second photographic film again, it is 21-that this second photographic film has width The lines of 25um;Afterwards, it is exposed in exposure machine, after development, obtains required grid line, the second photographic film is removed.
The typography of a kind of half tone the most according to claim 1, it is characterised in that: step A is coated with the step of photoresists Including: be coated with and repeat with drying, each coating thickness is 2-3um, until thickness is identical with grenadine thickness.
The typography of a kind of half tone the most according to claim 1, it is characterised in that: step C repeats coating and dries In step, each coating thickness is 2-3um.
The typography of a kind of half tone the most according to claim 1, it is characterised in that: at the second photosensitive end of patch in step C Before sheet, also carry out following steps:
C1, above photoresists be coated with one layer of fluorine element glue, thickness is 1um, dry.
The typography of a kind of half tone the most according to claim 1, it is characterised in that: the thickness described in step B is 15um。
The typography of a kind of half tone the most according to claim 1, it is characterised in that: the grid line of step C gained is step B The 1/15~1/10 of the grid line of gained.
The typography of a kind of half tone the most according to claim 1, it is characterised in that: first described in step B is photosensitive Egative film has the lines that width is 260um.
The typography of a kind of half tone the most according to claim 1, it is characterised in that: the second photosensitive end described in step C Sheet has the lines that width is 23um.
CN201610407302.XA 2016-06-12 2016-06-12 Printing technology for screen printing plate Pending CN106054534A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610407302.XA CN106054534A (en) 2016-06-12 2016-06-12 Printing technology for screen printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610407302.XA CN106054534A (en) 2016-06-12 2016-06-12 Printing technology for screen printing plate

Publications (1)

Publication Number Publication Date
CN106054534A true CN106054534A (en) 2016-10-26

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106494066A (en) * 2016-11-17 2017-03-15 信利半导体有限公司 A kind of screen printing net plate and preparation method thereof
CN108569021A (en) * 2017-03-09 2018-09-25 赵友之 Halftone
CN109177442A (en) * 2018-09-20 2019-01-11 奥士康精密电路(惠州)有限公司 It is a kind of to improve ill-exposed halftone manufacture craft
CN109203638A (en) * 2018-08-06 2019-01-15 田菱精密制版(深圳)有限公司 A kind of technological process for coating significantly improving silk-screen halftone film surface planarization

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103116246A (en) * 2013-02-27 2013-05-22 村上精密制版(昆山)有限公司 Photosensitive resin composition and application thereof
CN103777268A (en) * 2014-01-22 2014-05-07 福州大学 Method for raising light guide plate screen press run and permeability
CN104228314A (en) * 2014-09-20 2014-12-24 福州大学 Novel exposure blueprinting method for screen printing plate
CN104494323A (en) * 2014-09-19 2015-04-08 天津创世汇天印刷有限公司 Screen printing technology
CN105034546A (en) * 2015-08-18 2015-11-11 四川海英电子科技有限公司 Manufacturing technology of screen for production of circuit board

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103116246A (en) * 2013-02-27 2013-05-22 村上精密制版(昆山)有限公司 Photosensitive resin composition and application thereof
CN103777268A (en) * 2014-01-22 2014-05-07 福州大学 Method for raising light guide plate screen press run and permeability
CN104494323A (en) * 2014-09-19 2015-04-08 天津创世汇天印刷有限公司 Screen printing technology
CN104228314A (en) * 2014-09-20 2014-12-24 福州大学 Novel exposure blueprinting method for screen printing plate
CN105034546A (en) * 2015-08-18 2015-11-11 四川海英电子科技有限公司 Manufacturing technology of screen for production of circuit board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106494066A (en) * 2016-11-17 2017-03-15 信利半导体有限公司 A kind of screen printing net plate and preparation method thereof
CN108569021A (en) * 2017-03-09 2018-09-25 赵友之 Halftone
CN109203638A (en) * 2018-08-06 2019-01-15 田菱精密制版(深圳)有限公司 A kind of technological process for coating significantly improving silk-screen halftone film surface planarization
CN109177442A (en) * 2018-09-20 2019-01-11 奥士康精密电路(惠州)有限公司 It is a kind of to improve ill-exposed halftone manufacture craft

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C10 Entry into substantive examination
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Effective date of registration: 20170901

Address after: 055550 Ningjin County, Hebei Province, crystal street, No. 279,

Applicant after: Hebei Jing-long Sun Equipment Co., Ltd.

Address before: 055550 Ningjin County, Hebei Province, Crystal Dragon Street

Applicant before: Ningjin Sunshine New Energy Co., Ltd.

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RJ01 Rejection of invention patent application after publication

Application publication date: 20161026

RJ01 Rejection of invention patent application after publication