CN106040147B - Synthesis device - Google Patents
Synthesis device Download PDFInfo
- Publication number
- CN106040147B CN106040147B CN201610511708.2A CN201610511708A CN106040147B CN 106040147 B CN106040147 B CN 106040147B CN 201610511708 A CN201610511708 A CN 201610511708A CN 106040147 B CN106040147 B CN 106040147B
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- China
- Prior art keywords
- strainer
- parts
- filter
- support rack
- drive shaft
- Prior art date
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- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 39
- 238000003786 synthesis reaction Methods 0.000 title claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 64
- 238000003756 stirring Methods 0.000 claims abstract description 34
- 238000001914 filtration Methods 0.000 claims abstract description 32
- 238000005086 pumping Methods 0.000 claims abstract description 28
- 238000009434 installation Methods 0.000 claims abstract description 27
- 238000010992 reflux Methods 0.000 claims abstract description 20
- 238000002156 mixing Methods 0.000 claims abstract description 17
- 238000009826 distribution Methods 0.000 claims description 3
- 241000220317 Rosa Species 0.000 claims description 2
- 235000003283 Pachira macrocarpa Nutrition 0.000 claims 1
- 241001083492 Trapa Species 0.000 claims 1
- 235000014364 Trapa natans Nutrition 0.000 claims 1
- 235000009165 saligot Nutrition 0.000 claims 1
- 239000012535 impurity Substances 0.000 abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 239000010410 layer Substances 0.000 description 33
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 26
- 229910052706 scandium Inorganic materials 0.000 description 21
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 21
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 20
- 239000002253 acid Substances 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 14
- 229910052804 chromium Inorganic materials 0.000 description 13
- 239000011651 chromium Substances 0.000 description 13
- 229910052742 iron Inorganic materials 0.000 description 13
- 229910052712 strontium Inorganic materials 0.000 description 13
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 13
- 150000001875 compounds Chemical class 0.000 description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 10
- 229910052759 nickel Inorganic materials 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 9
- 229910052684 Cerium Inorganic materials 0.000 description 9
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 9
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- -1 i.e. Substances 0.000 description 9
- 229910052750 molybdenum Inorganic materials 0.000 description 9
- 239000011733 molybdenum Substances 0.000 description 9
- 239000011241 protective layer Substances 0.000 description 9
- 229910052797 bismuth Inorganic materials 0.000 description 8
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 8
- 230000003139 buffering effect Effects 0.000 description 8
- 229910052792 caesium Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052688 Gadolinium Inorganic materials 0.000 description 7
- 239000004411 aluminium Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 239000010941 cobalt Substances 0.000 description 7
- 229910017052 cobalt Inorganic materials 0.000 description 7
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 7
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 7
- 229910052735 hafnium Inorganic materials 0.000 description 7
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 7
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- 229910052776 Thorium Inorganic materials 0.000 description 6
- 229910052796 boron Inorganic materials 0.000 description 6
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 229910052741 iridium Inorganic materials 0.000 description 6
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 6
- 229910052698 phosphorus Inorganic materials 0.000 description 6
- 239000011574 phosphorus Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 239000010937 tungsten Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 229910052758 niobium Inorganic materials 0.000 description 5
- 239000010955 niobium Substances 0.000 description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 229910052726 zirconium Inorganic materials 0.000 description 4
- 229920002748 Basalt fiber Polymers 0.000 description 3
- 229920000742 Cotton Polymers 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- RCEAADKTGXTDOA-UHFFFAOYSA-N OS(O)(=O)=O.CCCCCCCCCCCC[Na] Chemical compound OS(O)(=O)=O.CCCCCCCCCCCC[Na] RCEAADKTGXTDOA-UHFFFAOYSA-N 0.000 description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 239000005864 Sulphur Substances 0.000 description 3
- PASHVRUKOFIRIK-UHFFFAOYSA-L calcium sulfate dihydrate Chemical compound O.O.[Ca+2].[O-]S([O-])(=O)=O PASHVRUKOFIRIK-UHFFFAOYSA-L 0.000 description 3
- 230000009514 concussion Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 3
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 3
- 239000000347 magnesium hydroxide Substances 0.000 description 3
- 239000011490 mineral wool Substances 0.000 description 3
- 229920002401 polyacrylamide Polymers 0.000 description 3
- 229920001021 polysulfide Polymers 0.000 description 3
- 239000005077 polysulfide Substances 0.000 description 3
- 150000008117 polysulfides Polymers 0.000 description 3
- 150000003438 strontium compounds Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229920001821 foam rubber Polymers 0.000 description 2
- 150000002251 gadolinium compounds Chemical class 0.000 description 2
- 150000002363 hafnium compounds Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- 150000002822 niobium compounds Chemical class 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 229910001021 Ferroalloy Inorganic materials 0.000 description 1
- ADGCGOYTTFAQCH-UHFFFAOYSA-N [Sr].[Gd] Chemical compound [Sr].[Gd] ADGCGOYTTFAQCH-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- XXHRVGVASCXZLC-UHFFFAOYSA-N bismuth gadolinium Chemical compound [Gd].[Bi] XXHRVGVASCXZLC-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 150000003586 thorium compounds Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/18—Stationary reactors having moving elements inside
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/01—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with flat filtering elements
- B01D29/05—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with flat filtering elements supported
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
- B01D29/50—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition
- B01D29/56—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with multiple filtering elements, characterised by their mutual disposition in series connection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0053—Details of the reactor
- B01J19/006—Baffles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00761—Details of the reactor
- B01J2219/00763—Baffles
- B01J2219/00765—Baffles attached to the reactor wall
- B01J2219/00768—Baffles attached to the reactor wall vertical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
- B01J2219/0236—Metal based
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/18—Details relating to the spatial orientation of the reactor
- B01J2219/185—Details relating to the spatial orientation of the reactor vertical
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Mixers Of The Rotary Stirring Type (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
A kind of synthesis device, including autoclave body, mixing stirring device, material filter and filtering support device.The both ends of autoclave body are respectively arranged with upper cover and low head.Mixing stirring device includes installation frame, driving motor, drive shaft and agitating paddle.Material filter includes material-pumping tube body, filter box, screen modules, the filtering pump housing, reflux tube body and valve.It includes the first support rack and the second support rack to filter support device.Above-mentioned synthesis device is by being arranged autoclave body, mixing stirring device and material filter, and material filter can carry out material circulating filtration removal impurity operation, go deimpurity operation more simple and convenient, production efficiency is also higher.
Description
Technical field
The present invention relates to chemical industry synthesis equipment technical fields, more particularly to a kind of synthesis device.
Background technology
Currently, in material production field, after especially various materials mixing reacts, the case where obtaining final products
In, it usually needs chemical industry synthesis equipment is used, for being stirred mixing to material, and it is made successfully to react, is used for
Synthesis obtains the final products of higher quality.
Wherein, due to material before the reaction or after reaction, more or less there is some impurity, traditional removal impurity mode
Filter device first to take out the product obtained after reaction from chemical industry synthesis equipment, then outside carried out product
Filter.
However, above-mentioned go deimpurity mode to still remain the more complex cumbersome problem of operation, cause production efficiency relatively low.
Invention content
Based on this, it is necessary to provide one kind and the higher synthesis of the more simple and convenient and production efficiency of deimpurity operation is gone to set
It is standby.
A kind of synthesis device, including：
The both ends of autoclave body, the autoclave body are respectively arranged with upper cover and low head；
Mixing stirring device, the mixing stirring device include installation frame, driving motor, drive shaft and agitating paddle, institute
It states installation frame to be fixedly mounted on the upper cover, the driving motor is set on the installation frame, the drive shaft
First end and the driving motor rotation axis connection, the second end of the drive shaft connect with the agitating paddle, and described
Agitating paddle is located inside the low head；
Material filter, the material filter include material-pumping tube body, filter box, screen modules, filter pump
Body, reflux tube body and valve, the first end of the material-pumping tube body are connected to the bottom of the low head, and the filter box is hollow
Setting, interior to form filter cavity, the second end of the material-pumping tube body is connect with the first end of the filter box, and the pumping
The second end of expects pipe body is connected to the filter cavity, and the screen modules include the first strainer, the second strainer and third filter
Net, first strainer, second strainer and the third strainer are arranged at intervals at successively in the filter cavity, and described
The edge at the edge of one strainer, the edge of second strainer and the third strainer connects with the madial wall of the filter box
Connect, first strainer towards the second end of the material-pumping tube body direction be arranged, it is described filtering the pump housing feed end with it is described
The second end of filter box connects, and the filtering pump housing feed end is connected to the filter cavity, and the filtering pump housing goes out
Material end is connected to the first end of the reflux tube body, and the second end of the reflux tube body is connected to the upper cover, the valve
It is set on the reflux tube body；And
Filter support device, the filtering support device include first support rack and second support rack, described first
The edge of support rack is connect with the madial wall of the filter box, and the first support rack is located at first strainer and institute
Between stating the second strainer, the first support rack offers the first mesh, the edge of the second support rack and the mistake
The madial wall of filter box body connects, and the second support rack is between second strainer and the third strainer, and described the
Two support racks offer the second mesh.
The mesh of first strainer, the mesh of second strainer and third filter in one of the embodiments,
The filter opening size of net is sequentially reduced.
First strainer, the first support rack, second strainer, described the in one of the embodiments,
Two support racks and the third strainer are arranged in parallel.
The size of first mesh setting identical as the size of the second mesh in one of the embodiments,.
First mesh and second mesh are diamond shape cavernous structure in one of the embodiments,.
In one of the embodiments, between the first support rack and first strainer and second strainer
It is provided with interval.
In one of the embodiments, between the second support rack and second strainer and the third strainer
It is provided with interval.
Above-mentioned novel synthesis device is by being arranged autoclave body, mixing stirring device and material filter, and material filtering
Device can to material carry out circulating filtration removal impurity operation, go it is deimpurity operation it is more simple and convenient, production efficiency also compared with
It is high.
Description of the drawings
Fig. 1 is the structural schematic diagram of the synthesis device of an embodiment of the present invention；
Fig. 2 is enlarged drawings of the Fig. 1 at A；
Fig. 3 is the partial structural diagram of the synthesis device of another embodiment of the present invention；
Fig. 4 is the partial structural diagram of the synthesis device of another embodiment of the present invention；
Fig. 5 is the partial structural diagram of the synthesis device of another embodiment of the present invention；
Fig. 6 is the partial structural diagram of the synthesis device of another embodiment of the present invention；
Fig. 7 is the partial structural diagram of the synthesis device of another embodiment of the present invention；
Fig. 8 is the partial structural diagram of the synthesis device of another embodiment of the present invention；
Fig. 9 is the partial structural diagram of the synthesis device of another embodiment of the present invention.
Specific implementation mode
To facilitate the understanding of the present invention, below with reference to relevant drawings to invention is more fully described.In attached drawing
Give the better embodiment of the present invention.But the present invention can realize in many different forms, however it is not limited to herein
Described embodiment.On the contrary, the purpose of providing these embodiments is that making to understand more the disclosure
Add thorough and comprehensive.
It should be noted that when element is referred to as " being fixed on " or " being set to " another element, it can be directly another
On one element or there may also be elements placed in the middle.When an element is considered as " connection " another element, it can be with
It is directly to another element or may be simultaneously present centering elements.Term as used herein " vertically ", " level
", "left", "right" and similar statement for illustrative purposes only, be not offered as being unique embodiment.
Unless otherwise defined, all of technologies and scientific terms used here by the article and belong to the technical field of the present invention
The normally understood meaning of technical staff is identical.Used term is intended merely to description tool in the description of the invention herein
The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more
Any and all combinations of relevant Listed Items.
For example, a kind of synthesis device, including：The both ends of autoclave body, the autoclave body are respectively arranged with upper cover and low head；It stirs
Mixing arrangement is mixed, the mixing stirring device includes installation frame, driving motor, drive shaft and agitating paddle, the installation frame
Be fixedly mounted on the upper cover, the driving motor is set on the installation frame, the first end of the drive shaft with
The rotation axis connection of the driving motor, the second end of the drive shaft are connect with the agitating paddle, and the agitating paddle is located at
Inside the low head；Material filter, the material filter include material-pumping tube body, filter box, screen modules,
The filtering pump housing, reflux tube body and valve, the first end of the material-pumping tube body are connected to the bottom of the low head, the Rose Box
The hollow setting of body, interior to form filter cavity, the second end of the material-pumping tube body is connect with the first end of the filter box, and
The second end of the material-pumping tube body is connected to the filter cavity, the screen modules include the first strainer, the second strainer and
Third strainer, first strainer, second strainer and the third strainer are arranged at intervals at successively in the filter cavity,
The edge at the edge of first strainer, the edge of second strainer and the third strainer is interior with the filter box
Side wall connects, and first strainer is arranged towards the direction of the second end of the material-pumping tube body, the feed end of the filtering pump housing
It is connect with the second end of the filter box, and the filtering pump housing feed end is connected to the filter cavity, the filter pump
The discharge end of body is connected to the first end of the reflux tube body, and the second end of the reflux tube body is connected to the upper cover, institute
Valve is stated to be set on the reflux tube body；And filtering support device, the filtering support device include first support rack and
The edge of second support rack, the first support rack is connect with the madial wall of the filter box, first supporting network
For frame between first strainer and second strainer, the first support rack offers the first mesh, and described second
The edge of support rack is connect with the madial wall of the filter box, and the second support rack is located at second strainer and institute
Between stating third strainer, the second support rack offers the second mesh.
In order to which further above-mentioned synthesis device is explained, for example, the synthesis device of another embodiment is as follows：
Referring to Fig. 1, synthesis device 10 includes autoclave body 100, mixing stirring device 200 and material filter 300, stirring
Mixing arrangement 200 and material filter 300 may be contained on autoclave body 100.
Referring to Fig. 1, the both ends of autoclave body 100 are respectively arranged with upper cover 110 and low head 120, autoclave body 100 is for housing
The material of addition, and be mixed and react to material and occasion is provided.For example, after upper cover 110 is connect with low head 120
Form autoclave body 100.For another example, the autoclave body is an integral molding structure.For another example, in the process for being installed on outside support of the autoclave body
In, the upper cover is located at the top of outside support, and the low head is located at the lower part of outside support.
For example, it is hemispherical columnar structured that the autoclave body, which has both ends, certainly, the autoclave body can also be according to reality
Situation is selected, for example, using both ends for the columnar structured of plane.
Referring to Fig. 1, mixing stirring device 200 includes installation frame 210, driving motor 220, drive shaft 230 and stirring
Paddle 240, installation frame 210 are fixedly mounted on the upper cover 110 of autoclave body 100, and driving motor 220 is set to installation frame 210
On, the first end of drive shaft 230 and the rotation axis connection of driving motor 220, the second end of drive shaft 230 stretch to autoclave body 100
Inside, e.g., the second end of drive shaft 230 stretch to inside the low head 120 of autoclave body 100, the second end of drive shaft 230 and stirring
Paddle 240 connects, and e.g., agitating paddle 240 is located inside the low head 120 of autoclave body 100.
It can also be selected according to actual needs certainly for example, the agitating paddle is anchor formula agitating paddle or propeller
With other kinds of agitating paddle.
Referring to Fig. 1, driving motor 220 is used to that drive shaft 230 to be driven to rotate, and then drive fixed with drive shaft 230
Agitating paddle 240 rotates.When needing to be stirred hybrid manipulation to the material in autoclave body 100, control driving motor 220, which drives, to be driven
Moving axis 230 rotates, and then agitating paddle 240 is driven to rotate, and is acted on using the flow-disturbing of agitating paddle 240, can play preferable stirring
Immixture, and then hybrid manipulation can be stirred to the material in autoclave body 100.
Also referring to Fig. 1 and Fig. 2, material filter 300 includes material-pumping tube body 310, filter box 320, filter screen
Component 330, the filtering pump housing 340, reflux tube body 350 and valve 360, low head 120, material-pumping tube body 310, filter box 320, mistake
Filter pump body 340, reflux tube body 350 and upper cover 110 are sequentially communicated, and screen modules 330 are placed in inside filter box 320,
Valve 360 is set on reflux tube body 350.
Also referring to Fig. 1 and Fig. 2, the first end of material-pumping tube body 310 is connected to the bottom of low head 120, in this way, working as kettle
When being reacted, material can flow into material-pumping tube body 310 material in body 100 out of low head 120, and then after progress
Continuous filter operation.
Referring to Fig. 2,320 hollow setting of filter box, filter box 320 is interior to form filter cavity 321, material-pumping tube body
310 second end is connect with the first end of filter box 320, and the second end of material-pumping tube body 310 is connected to filter cavity 321,
In this way, the material to be filtered flowed into out of material-pumping tube body 310 can flow into inside filter cavity 321, and in filter cavity
Filter operation is completed in 321.
Referring to Fig. 2, screen modules 330 include the first strainer 331, the second strainer 332 and third strainer 333, first
Strainer 331, the second strainer 332 and third strainer 333 are arranged at intervals at successively in filter cavity 321, the edge of the first strainer
331, the edge 332 of the second strainer and the edge of third strainer 333 are connect with the madial wall of filter box 320, in this way, from pumping
The material flowed out in expects pipe body 310 penetrates the first strainer 331, the second strainer 332 and third strainer 333 successively, to make material
Filter operation is completed, the impurity in material can be preferably removed, is operated more convenient simple.For example, the first strainer 331, second
Strainer 332 and third strainer 333 are spaced setting successively, so that there are gaps between strainer, in such manner, it is possible to preferably utilize
The gap accommodates the impurity being filtered out and is for another example cleared up the impurity being filtered out at interval of preset time, to reduce strainer
Or babinet the problem of blocking.
In order to preferably improve the filter effect of the screen modules, for example, first strainer, second strainer
And the filter opening aperture of the third strainer is sequentially reduced, in this way, taking three layers of effect gradually filtered, can be directed to different-grain diameter
Impurity, to optimize filtration path, and then can preferably improve the filter effect of the screen modules.
Also referring to Fig. 1 and Fig. 2, the feed end of the filtering pump housing 340 is connect with the second end of filter box 320, and mistake
340 feed end of filter pump body is connected to filter cavity 321, and the first end for filtering the discharge end and reflux tube body 350 of the pump housing 340 connects
Logical, the second end of reflux tube body 350 is connected to upper cover 110.In this way, based on the filtering pump housing 340 in normal work, generation
Suction, material can be pumped to from low head 120 in material-pumping tube body 310 by the filtering pump housing 340, then be taken out by material-pumping tube body 310
It is drawn in filter box 320, and material is by the first strainer 331, the second strainer 332 and the in the filter box 320
When three strainers 333, filter operation is completed, that is, completes to go deimpurity operation, after material completes filter operation, then, is passed through
The filtering pump housing 340 and by filtered material is pulled under the action of filtering the pump housing 340 in reflux tube body 350,
Finally, it then is back in upper cover 110, that is, it is back to inside autoclave body 100, at this point, material completes a filter operation, certainly,
In order to further increase the removal effect of impurity, according to actual conditions, circulating filtration operation can also be performed.
For example, the first strainer 331 is arranged towards the direction of the second end of material-pumping tube body 310, third strainer 333 is towards reflux
Tube body 350 is arranged.
Referring to Fig. 2, valve 360 is set on reflux tube body 350, when needing to be filtered operation, valve is opened
360, at this point, material is filtered operation in 300 internal circulation flow of material filter, after completing filter operation, close valve
Door 360, at this point, material stops flowing in material filter 300.
Above-mentioned synthesis device 10 is by being arranged autoclave body 100, mixing stirring device 200 and material filter 300, and object
Expect that filter device 300 can carry out material circulating filtration removal impurity operation, goes deimpurity operation more simple and convenient, production
Efficiency is also higher.
In order to reduce because the excessive generation of material pressure is the problem of impacting screen modules, preferably to protect filter screen
The dispersion effect of component and strength imparting material, for example, also referring to Fig. 3 and Fig. 4, the synthesis device further includes pressure buffer
Device 400, the pressure buffer device 400 be located at the material-pumping tube body 310 and screen modules 330 the first strainer 331 it
Between, the pressure buffer device 400 includes several buffering plate bodys 410, and several buffering plate bodys are arranged at intervals at described successively
In filter cavity, and the edge of several buffering plate bodys is connect with the madial wall of the filter box, the buffering plate body
410 offer flowing hole 411；For another example, the buffering plate body offers several flowing holes；For another example, several flowing holes are in square
Shape array distribution is on the buffering plate body；For another example, the flowing hole of the two neighboring buffering plate body shifts to install；Again
Such as, the flowing hole has the cross section of regular polygon structure；For another example, the flowing hole has regular hexagon feature cross-section；
For another example, the buffering plate body have cuboid shape structure, in this way, when material pass through pressure buffer device 400 when, can reduce because
The problem of impact to screen modules of the excessive generation of material pressure, preferably to protect screen modules and strength imparting material
Dispersion effect.
In order to preferably dismantle the screen modules, so can preferably to the screen modules carry out cleaning or
Replacement operation, for example, also referring to 5, the synthesis device further includes activity provision for disengagement 500, the activity provision for disengagement
500 include locking plate body 510, the installation installation plate body 540 of plate body 530 and second of fastener 520 first, the filter box 320
Dismounting window 322 is offered, the locking plate body is at least partly embedded in the dismounting window, and closes the dismounting window
Mouthful, the fastener wears the side wall of the locking plate body and the filter box successively, and described first installs the first of plate body
Side and the latch, which are shown consideration for, to be closed, the second side of the first installation plate body respectively with a side of first strainer,
A side of second strainer and the connection of a side of the third strainer, the first side difference of the second installation plate body
It is connect with another side of another side of the first strainer, another side of second strainer and the third strainer, it is described
The second side and the madial wall of the filter box for installing plate body support.The locking plate body is set with the dismounting window
Sealing ring is provided at position；For another example, there is the fastener threaded portion and head, the first end of the threaded portion to wear successively
The side wall of the locking plate body and the filter box, the head is connect with the second end of the threaded portion；For another example, the head
Portion has the cross section of regular hexagon structure；For another example, portion is set in the locking plate body setting, and the portion of setting is torn open embedded at described
It unloads in window；For another example, the first installation plate body is arranged in parallel with the second installation plate body；For another example, first strainer, institute
It states the second strainer and the third strainer to be vertically arranged with the first installation plate body, in this way, passing through the activity provision for disengagement
500, the screen modules can be preferably dismantled, and then can preferably the screen modules be cleaned or be replaced
Operation.
In order to preferably support the screen modules, for preferably protecting the screen modules, for example, please referring to
Fig. 6, the synthesis device further include filtering support device 600, and the filtering support device 600 includes the first support rack 610
And second support rack 620, it is described first support rack edge connect with the madial wall of the filter box, described first
Rack is supportted between first strainer and second strainer, the first support rack offers the first mesh, described
The edge of second support rack is connect with the madial wall of the filter box, and the second support rack is located at second strainer
And between the third strainer, the second support rack offers the second mesh.The mesh of first strainer, described second
The filter opening size of the mesh of strainer and the third strainer is sequentially reduced；For another example, first strainer, first supporting network
Frame, second strainer, the second support rack and the third strainer are arranged in parallel；For another example, first mesh is big
Small setting identical as the size of the second mesh；For another example, first mesh and second mesh are the poroid knot of diamond shape
Structure；For another example, it is both provided with interval between the first support rack and first strainer and second strainer；For another example, institute
It states and is both provided with interval between the second support rack and second strainer and the third strainer, in this way, passing through setting first
It supports rack 610 and second to support rack 620, can preferably support the screen modules, described in preferably protection
Screen modules.
Flow-disturbing degree in order to reduce vortex phenomenon, and when can improve stirring operation, for example, referring to Fig. 7,
The synthesis device further includes baffle means 700, if the baffle means 700 include installation the body of rod 710, baffling montant 720 and
The first end of dry baffling cross bar 730, the installation body of rod 710 is connect with the madial wall of the low head 120, the baffling montant
It being connect with the second end of the installation body of rod, several baffling cross bars are arranged at intervals at successively on the baffling montant, and if
The baffling cross bar is done to be arranged in parallel.The first end of the installation body of rod is provided with the binding face of arc-shaped curved surface structure, the patch
Conjunction face is bonded with the madial wall of the low head；For another example, the installation body of rod is provided with reinforcing rib；For another example, the reinforcing rib by
The first end of the installation body of rod is extended to the second end of the installation body of rod；For another example, the baffling montant and the drive
Moving axis is arranged in parallel；For another example, the baffling montant has hollow structure；For another example, the end of the baffling cross bar has hemispherical
Structure can reduce vortex phenomenon in this way, by the way that baffle means 700 are arranged, and flow-disturbing when can improve stirring operation
Degree.
In order to reduce the drive shaft in rotation, the concussion problem of generation, for example, referring to Fig. 8, the synthesis device
Further include stirring limiting device 800, the stirring limiting device 800 includes limit body 810 and limits connecting rod 820, described
Limit body 810 be placed on outside the second end of the drive shaft 230, and the limit body 810 be located at the agitating paddle 240 and
Between the bottom of the low head 120, between being provided between the madial wall and the lateral wall of the drive shaft of the limit body
Every the first end of the limit body of rod is connect with the limit body, the second end of the limit body of rod and the low head
Bottom connects, and the extending direction of the limit body of rod and the extending direction of the drive shaft form angle；For another example, the stirring
Paddle is propeller；For another example, the limit body has rounded cylindrical structure；For another example, the central axis of the limit body
It is overlapped with the central axis of the drive shaft；For another example, several limit connecting rods, Ruo Gansuo is arranged in the stirring limiting device
It states limit connecting rod and sets distribution so that the center of the drive shaft is radial；For another example, two institutes are arranged in the stirring limiting device
Limit connecting rod is stated, angle is formed between two limit connecting rods；For another example, the number of degrees of the angle are 60 degree~120 degree,
In this way, stirring limiting device 800 by setting, the drive shaft can be reduced in rotation, the concussion problem of generation.
It should be pointed out that when each material for being stirred hybrid manipulation inside the autoclave body carries out combination reaction, and
Most of combination reaction is all exothermic reaction, what the yield that the rate and product of reaction generate was also required to release when dependent reaction
Heat, for improving reaction rate and yield.In addition, in whipping process, the mixing stirring device can do work to material, i.e.,
Material shows as outwardly releasing heat during being mutually mixed agitation, especially the stronger material of toughness, heat release
Phenomenon becomes apparent from, and therefore, is based on the above situation, for the combination reaction of some dependence higher temperatures, such as dependent on reaction itself
The combination reaction of heat release and stirring heat production, and additional heating device is not needed for the reaction that it is heated, it is especially desirable to
Ensure the heat-insulating property of the autoclave body.Further, in order to be directed to some acid materials, therefore, to assure that the inside of the autoclave body
The madial wall of wall, i.e., the autoclave body directly contacted with acid material has higher acid etch resistance energy, for prolonging the raw kettle
The service life of body and being normally carried out for reaction.Further, the lateral wall of the autoclave body with corrosive materials due to often connecing
It touches, e.g., the corrosive materials of the forms such as gaseous state or liquid contact, it is therefore desirable to have preferable corrosion resistance, for more preferable
Protect the autoclave body in ground.
In order to improve acid etch resistance energy, heat-insulating property and the corrosion resistance of the autoclave body, for example, referring to Fig. 8, described
Autoclave body, e.g., the side wall of the autoclave body include the resistance to acid attack layer 130 being cascading, insulating layer 140, supporting layer 150, counterweight
Layer 160 and protective layer 170, the resistance to acid attack layer are located at the madial wall of the autoclave body, and the resistance to acid attack layer is directly and material,
Such as, acid material contact, the protective layer are located at the lateral wall of the autoclave body, i.e., the described protective layer is directly naked to be exposed on the external.
For example, the resistance to acid attack layer of an embodiment includes each component of following mass parts：75 parts~88 parts of iron, titanium 30
Part~34 parts, 20 parts~25 parts of chromium, 2.5~3.4 parts of antimony, 2.3~3.4 parts of copper part, 1.5 parts~2.7 parts of zinc, aluminium 0.9~1.4
Part, 0.15 part~0.27 part of carbon, 0.25 part~0.46 part of silicon, 0.12 part~0.18 part of boron, 0.04 part~0.09 part of cobalt, phosphorus
0.001 part~0.03 part, 0.001 part~0.03 part of sulphur, 0.02 part~0.03 part of strontium, 0.03 part~0.04 part of bismuth, 0.01 part of scandium
~0.02 part and 0.001 part~0.002 part of gadolinium.Wherein, scandium is scandium or contains scadium compound, wherein containing containing scandium in scadium compound
Element；Gadolinium is gadolinium or contains gadolinium compound, wherein contains and contains gadolinium element in gadolinium compound；Bismuth is bismuth or bismuth-containing compound, wherein
Contain bismuth element in bismuth gadolinium compound；Strontium is strontium or contains strontium compound, wherein contains strontium element in strontium gadolinium compound.
Using 75 parts~88 parts of iron, 30 parts~34 parts of titanium and 20 parts of chromium~25 parts of infrastructure elements as resistance to acid attack layer, from
And the resistance to acid attack layer can be enable to have certain acid etch resistance, in addition, by adding 2.5~3.4 parts of antimony, 2.3 parts of copper
~3.4 parts, 1.5 parts~2.7 parts of zinc, 0.9~1.4 part of aluminium, 0.04 part~0.09 part of cobalt, 0.02 part~0.03 part of strontium, bismuth 0.03
0.001 part~0.002 part of part~0.04 part, 0.01 part~0.02 part of scandium and gadolinium are compounded, additionally it is possible to be advanced optimized described
The properties of resistance to acid attack layer can especially advanced optimize the acid etch resistance energy of the resistance to acid attack layer, so as to more preferable
Ground resist material acid etching, for further increase the autoclave body service life and ensure reaction be normally carried out.
For another example, the resistance to acid attack layer of another embodiment includes each component of following mass parts：75 parts~80 parts of iron, titanium
33 parts~34 parts, 24 parts~25 parts of chromium, 2.7~3.4 parts of antimony, 2.7 parts~3.4 parts of copper, 1.8 parts~2.5 parts of zinc, aluminium 1.1~1.4
Part, 0.18 part~0.27 part of carbon, 0.27 part~0.46 part of silicon, 0.13 part~0.18 part of boron, 0.04 part~0.09 part of cobalt, phosphorus
0.001 part~0.03 part, 0.001 part~0.03 part of sulphur, 0.02 part~0.03 part of strontium, 0.03 part~0.04 part of bismuth, 0.01 part of scandium
~0.02 part and 0.001 part~0.002 part of gadolinium.
For another example, the resistance to acid attack layer of another embodiment includes each component of following mass parts：77 parts of iron, 33 parts of titanium,
25 parts of chromium, 3.4 parts of antimony, 2.7 parts of copper, 1.9 parts of zinc, 1.3 parts of aluminium, 0.27 part of carbon, 0.46 part of silicon, 0.18 part of boron, 0.04 part of cobalt, phosphorus
0.002 part of 0.03 part, 0.001 part of sulphur, 0.03 part of strontium, 0.04 part of bismuth, 0.01 part of scandium and gadolinium.
For example, the insulating layer of an embodiment includes each component of following mass parts：It is 15 parts~22 parts of land plaster, white
8~20 parts of cotton, 8 parts~15 parts of rock wool, 7 parts~9 parts of glass fibre, 10 parts~20 parts of Lauxite, 3.5 parts of polyacrylamide~
4.5 parts, 1 part~3 parts of basalt fibre, 3~5 parts of rubber foam, 1 part~2 parts of magnesium hydroxide, aminopropyl triethoxysilane 1
Part~2 parts, 1 part~2 parts of aluminium oxide, 1 part~2 parts of 3,5- di-tert-butyl-4-hydroxybenzoic acids methyl esters, 3~4 parts of polypropylene fiber,
0.2~0.8 part of 1 part~2 parts of polysulfide rubber and lauryl sodium sulfate.
It can make the insulating layer that there is good heat-insulating property using each component of mass parts as above, when in the autoclave body
When exothermic reaction occurs for the material in portion, and after transferring heat to the resistance to acid attack layer, had based on the insulating layer good
Heat-insulated and heat-insulating property can limit heat and be further transmitted through the autoclave body, and then heat is avoided to be transferred directly to external environment
In, it is ensured that the material inside the autoclave body is reacted at a suitable temperature, the production for improving reaction rate and product
Rate.
For another example, the insulating layer of another embodiment includes each component of following mass parts：17 parts~21 parts of land plaster,
White 17~20 parts of cotton, 10 parts~15 parts of rock wool, 7 parts~9 parts of glass fibre, 10 parts~20 parts of Lauxite, polyacrylamide 3.5
Part~4.5 parts, 1 part~2.5 parts of basalt fibre, 3.5~5 parts of rubber foam, 1.5 parts~2 parts of magnesium hydroxide, three second of aminopropyl
1.5 parts~2 parts of oxysilane, 1 part~2 parts of aluminium oxide, 1 part~1.4 parts of 3,5- di-tert-butyl-4-hydroxybenzoic acids methyl esters, third
0.2~0.5 part of 3.3~4 parts of synthetic fibre fiber, 1 part~2 parts of polysulfide rubber and lauryl sodium sulfate.
For another example, the insulating layer of another embodiment includes each component of following mass parts：19 parts of land plaster, white cotton 17
~20 parts, 15 parts of rock wool, 9 parts of glass fibre, 20 parts of Lauxite, 3.8 parts of polyacrylamide, 2.1 parts of basalt fibre, rubber
4.6 parts of foam, 1.7 parts of magnesium hydroxide, 2 parts of aminopropyl triethoxysilane, 1.8 parts of aluminium oxide, 3,5- di-t-butyl -4- hydroxyls
0.4 part of 1.4 parts of methyl benzoate, 4 parts of polypropylene fiber, 1.9 parts of polysulfide rubber and lauryl sodium sulfate.
For example, the supporting layer of an embodiment includes each component of following mass parts：95 parts~98 parts of iron, manganese 0.4
Part~0.95 part, 0.1 part~0.5 part of molybdenum, 0.01 part~0.05 part of titanium, 0.02 part~0.1 part of aluminium, 0.06 part~0.25 part of carbon,
0.1 part~0.3 part of silicon, 0.05 part~0.1 part of phosphorus, 0.001 part~0.01 part of boron, 0.05 part~0.5 part of hafnium, 0.05 part of scandium~
0.3 part, 0.05 part~0.3 part of chromium, 0.01 part~0.05 part of nickel, 0.01 part~0.05 part of cerium, 0.01 part~0.05 part of thorium and zirconium
0.01 part~0.05 part.Wherein, hafnium for hafnium or contains hafnium compound, wherein contains and contains hafnium element in hafnium compound；Scandium is scandium or contains
Scadium compound, wherein contain and contain scandium element in scadium compound；Thorium is thorium or contains thorium compound, wherein contains in cerium-containing compound
Ce elements；Cerium is cerium or cerium-containing compound, wherein contains Ce elements in cerium-containing compound.
It is appreciated that in order to make the autoclave body have preferable heat-insulating property, need to introduce the insulating layer, and the guarantor
The mechanical strength of warm layer is poor, in order to reinforce the integrally-built mechanical strength of the autoclave body, needs to introduce the supporting layer, makes it
It is in direct contact with the insulating layer, for improving the integrally-built mechanical strength of the autoclave body, to achieve the purpose that safety in production.
Based on the above situation, this just necessarily requires the supporting layer to have higher mechanical strength and anti-deformation nature, by using such as
It improves quality each component of part, the especially described supporting layer contains 0.05 part~0.5 part of hafnium, 0.05 part~0.3 part of scandium, 0.05 part of chromium
0.01 part~0.05 part of~0.3 part, 0.01 part~0.05 part of nickel, 0.01 part~0.05 part of cerium, 0.01 part~0.05 part of thorium and zirconium,
The mechanical strength that traditional ferroalloy can be improved keeps its mechanical strength and anti-deformation nature more excellent, disclosure satisfy that requirement.
For another example, the supporting layer of another embodiment includes each component of following mass parts：97 parts~98 parts of iron, manganese
0.55 part~0.95 part, 0.35 part~0.5 part of molybdenum, 0.01 part~0.05 part of titanium, 0.02 part~0.1 part of aluminium, 0.17 part of carbon~
0.25 part, 0.1 part~0.25 part of silicon, 0.05 part~0.1 part of phosphorus, 0.008 part~0.01 part of boron, 0.1 part~0.5 part of hafnium, scandium 0.1
Part~0.3 part, 0.1 part~0.3 part of chromium, 0.02 part~0.05 part of nickel, 0.02 part~0.05 part of cerium, 0.02 part~0.05 part of thorium and
0.02 part~0.05 part of zirconium.
For another example, the supporting layer of another embodiment includes each component of following mass parts：97 parts of iron, 0.75 part of manganese,
0.5 part of molybdenum, 0.05 part of titanium, 0.02 part of aluminium, 0.17 part of carbon, 0.25 part of silicon, 0.1 part of phosphorus, 0.008 part of boron, 0.5 part of hafnium, scandium 0.2
Part, 0.2 part of chromium, 0.05 part of nickel, 0.05 part of cerium, 0.05 part of thorium and 0.05 part of zirconium.
For example, the weight coating of an embodiment includes each component of following mass parts：85 parts~95 parts of tungsten, 30 parts of nickel
0.5 part~5 parts of~60 parts, 15 parts~40 parts of iron, 1.5 parts~10 parts of chromium, 1.5 parts~10 parts of lead, 1 part~6 parts of copper and molybdenum.
It is appreciated that in producing reaction process, need to carry out the higher stirring behaviour of intensity to the material in the autoclave body
Make, and since thickness is larger and the presence of the insulating layer of lighter weight, in order to avoid the integrally-built matter of the autoclave body
Amount kicks the beam, and then reduces influence of the external impacts to the autoclave body, you can concussion or displacement problem occurs to reduce the autoclave body.
The weight coating can be made to have excellent counterweight performance using each component of mass parts as above, can effectively increase the kettle
The integrally-built weight of body keeps it identical as the weight of traditional autoclave body or is adapted to, so as to improve the peace in production process
Full performance.
For another example, the weight coating of another embodiment includes each component of following mass parts：90 parts~95 parts of tungsten, nickel 30
0.5 part of part~45 parts, 27 parts~40 parts of iron, 1.5 parts~2.3 parts of chromium, 1.5 parts~3.3 parts of lead, 1 part~5.5 parts of copper and molybdenum~
4.9 part.
For another example, the weight coating of another embodiment includes each component of following mass parts：92 parts of tungsten, 38 parts of nickel, iron
3.8 parts of 29 parts, 2.1 parts of chromium, 2.1 parts of lead, 3.5 parts of copper and molybdenum.
For example, the protective layer of an embodiment includes each component of following mass parts：65 parts~80 parts of iron, lithium 16~
18 parts, 18 parts~25 parts of nickel, 3.5 parts~4 parts of molybdenum, 2 parts~5 parts of chromium, 1 part~5 parts of cobalt, 1 part~5 parts of vanadium, 1 part~2 parts of manganese, iridium
0.8 part~2.5 parts, 0.5 part~2.5 parts of niobium, 0.3 part~2.5 parts of scandium, 0.2 part~2.5 parts of strontium, 0.2 part~2.5 parts of caesium, tungsten
0.2 part~2.5 parts and 0.2 part~2.5 parts of titanium.Wherein, caesium is caesium or contains cesium compound, wherein containing containing caesium in cesium compound
Element；Wherein, strontium is strontium or contains strontium compound, wherein containing containing strontium element in strontium compound；Wherein, scandium for scandium or contains scandium
Close object, wherein contain and contain scandium element in scadium compound；Wherein, niobium for niobium or contains niobium compound, wherein is included containing niobium compound
There is niobium element；Wherein, iridium is iridium or contains iridic compound, wherein containing containing iridium in iridic compound.
It is appreciated that the lateral wall of the autoclave body is with corrosive materials due to often contacting, and e.g., the forms such as gaseous state or liquid
Corrosive materials contact, it is therefore desirable to have preferable corrosion resistance, for preferably protecting the autoclave body.By as above
The each component of mass parts can make the protective layer have good Corrosion Protection, and then preferably protect the autoclave body, use
In the service life for extending the autoclave body.
For another example, the protective layer of another embodiment includes each component of following mass parts：65 parts~70 parts of iron, lithium 16
Part~16.5 parts, 18~21 parts of nickel, 3.5 parts~3.9 parts of molybdenum, 2 parts~4.4 parts of chromium, 1 part~3.9 parts of cobalt, 1 part~4.5 parts of vanadium,
1 part~1.7 parts of manganese, 0.8 part~2.3 parts of iridium, 0.5 part~2.2 parts of niobium, 0.3 part~2.3 parts of scandium, 0.2 part~2.3 parts of strontium, caesium
0.2 part~1.9 parts of 0.2 part~2.4 parts, 0.2 part~2.1 parts of tungsten and titanium.
For another example, the protective layer of another embodiment includes each component of following mass parts：65 parts of iron, 16.5 parts of lithium,
21 parts of nickel, 3.5 parts of molybdenum, 3.5 parts of chromium, 2.8 parts of cobalt, 3.7 parts of vanadium, 1.5 parts of manganese, 2.3 parts of iridium, 2.2 parts of niobium, 2.3 parts of scandium, strontium 2.3
Part, 2.4 parts of caesium, 0.2 part of tungsten and 0.2 part of titanium.
In order to advanced optimize the autoclave body, e.g., the structure of the side wall of the autoclave body, for example, the resistance to acid attack layer, described
Insulating layer, the supporting layer, the weight coating and the protective layer thickness ratio be (1~1.5)：(15~20)：(5~5.5)：
(8~9.8)：(0.5~1.2)；For another example, the thickness of the weight coating and protective layer ratio is 1：15：5：9.5：1.1.
It is combined with each other it should be noted that the other embodiment of the present invention further includes technical characteristic in the various embodiments described above
The novel synthesis device that can be formed, and can implemented.
Each technical characteristic of embodiment described above can be combined arbitrarily, to keep description succinct, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, it is all considered to be the range of this specification record.
Only several embodiments of the present invention are expressed for embodiment described above, the description thereof is more specific and detailed, but
It cannot be construed as a limitation to the scope of the present invention.It should be pointed out that for the ordinary skill people of this field
For member, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the present invention's
Protection domain.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (7)
1. a kind of synthesis device, which is characterized in that including：
The both ends of autoclave body, the autoclave body are respectively arranged with upper cover and low head；
Mixing stirring device, the mixing stirring device include installation frame, driving motor, drive shaft and agitating paddle, the peace
Installation frame is fixedly mounted on the upper cover, and the driving motor is set on the installation frame, and the of the drive shaft
The rotation axis connection of one end and the driving motor, the second end of the drive shaft are connect with the agitating paddle, and the stirring
Paddle is located inside the low head；
Material filter, the material filter include material-pumping tube body, filter box, screen modules, the filtering pump housing, return
The first end of flow tube body and valve, the material-pumping tube body is connected to the bottom of the low head, the hollow setting of filter box,
Filter cavity is formed in it, the second end of the material-pumping tube body is connect with the first end of the filter box, and the material-pumping tube
The second end of body is connected to the filter cavity, and the screen modules include the first strainer, the second strainer and third strainer, institute
It states the first strainer, second strainer and the third strainer to be arranged at intervals at successively in the filter cavity, first filter
The edge at the edge of net, the edge of second strainer and the third strainer is connect with the madial wall of the filter box,
First strainer is arranged towards the direction of the second end of the material-pumping tube body, the feed end of the filtering pump housing and the filtering
The second end of babinet connects, and the filtering pump housing feed end is connected to the filter cavity, the discharge end of the filtering pump housing
It is connected to the first end of the reflux tube body, the second end of the reflux tube body is connected to the upper cover, the valve setting
In on the reflux tube body；And
Support device is filtered, the filtering support device includes the first support rack and the second support rack, first support
The edge of rack is connect with the madial wall of the filter box, and the first support rack is located at first strainer and described the
Between two strainers, the first support rack offers the first mesh, the edge and the Rose Box of the second support rack
The madial wall of body connects, and the second support rack is between second strainer and the third strainer, described second
Support rack offers the second mesh；
Wherein, the synthesis device further includes stirring limiting device, and the stirring limiting device includes that limit body and limit connect
Extension bar, the limit body is placed on outside the second end of the drive shaft, and the stop collar body is located at the agitating paddle and institute
Between the bottom for stating low head, interval, institute are provided between the madial wall and the lateral wall of the drive shaft of the limit body
The first end for stating the limit body of rod is connect with the limit body, and the second end of the limit body of rod and the bottom of the low head connect
It connects, and the extending direction of the limit body of rod and the extending direction of the drive shaft form angle；The agitating paddle stirs for spiral
Mix paddle；The limit body has rounded cylindrical structure；The central shaft of the central axis and the drive shaft of the limit body
Line overlaps；Several limit connecting rods are arranged in the stirring limiting device, and several limit connecting rods are with the drive shaft
Center radial set distribution；Two limit connecting rods, two limit connections are arranged in the stirring limiting device
Angle is formed between bar；The number of degrees of the angle are 60 degree~120 degree.
2. synthesis device according to claim 1, which is characterized in that the mesh of first strainer, second strainer
Mesh and the filter opening size of the third strainer be sequentially reduced.
3. synthesis device according to claim 1, which is characterized in that first strainer, the first support rack, institute
The second strainer, the second support rack and the third strainer is stated to be arranged in parallel.
4. synthesis device according to claim 1, which is characterized in that the size of first mesh and second mesh
The identical setting of size.
5. synthesis device according to claim 1, which is characterized in that first mesh and second mesh are water chestnut
Shape cavernous structure.
6. synthesis device according to claim 1, which is characterized in that first support rack and first strainer and
It is both provided with interval between second strainer.
7. synthesis device according to claim 1, which is characterized in that second support rack and second strainer and
It is both provided with interval between the third strainer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610511708.2A CN106040147B (en) | 2016-06-30 | 2016-06-30 | Synthesis device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610511708.2A CN106040147B (en) | 2016-06-30 | 2016-06-30 | Synthesis device |
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| CN106040147A CN106040147A (en) | 2016-10-26 |
| CN106040147B true CN106040147B (en) | 2018-10-09 |
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| CN103083973A (en) * | 2011-11-05 | 2013-05-08 | 海门市大生水处理设备（厂）有限公司 | Air-liquid pipeline filter |
| CN205055928U (en) * | 2015-09-15 | 2016-03-02 | 山东东源新材料科技有限公司 | Produce no vanadium tombarthite base titanium and tungsten powder's stirring mixing apparatus |
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