CN106019426B - A kind of visible ray near infrared band slit screening glass using sapphire as substrate - Google Patents
A kind of visible ray near infrared band slit screening glass using sapphire as substrate Download PDFInfo
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- CN106019426B CN106019426B CN201610538955.1A CN201610538955A CN106019426B CN 106019426 B CN106019426 B CN 106019426B CN 201610538955 A CN201610538955 A CN 201610538955A CN 106019426 B CN106019426 B CN 106019426B
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- screening glass
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Abstract
The invention discloses a kind of visible ray near infrared band slit screening glass using sapphire as substrate, the screening glass is with Ta2O5And SiO2For high low-index material, the Film Design method that the plane of incidence adds layer spectro-film using negative filter is aided with equivalent matched layer, obtains the design result for meeting and requiring；The back side devises wide spectrum dimmer reflecting film, to eliminate the ghost image because of caused by residual reflection.VNIR slit screening glass employs the special processes such as ion assisted deposition, suitable depositing temperature and sedimentation rate in preparation process.The VNIR slits screening glass can realize the neutral light splitting to 480 700nm wave bands, while being realized to 400 440nm, 800 1100nm wide spectrum wave band highly transmissive.VNIR slits protection piece performance of the present invention is stable, and the optical electivity for being suitable for EO-1 hyperion camera VNIR wave bands is used with energy hole.
Description
Technical field
The present invention relates to optical film technique, a kind of visible near-infrared (VNIR) by substrate of sapphire crystal is referred specifically to
Slit screening glass, is prepared by preparing optical electivity on the sapphire substrates plane of incidence with regulation of energy multilayer film, backside of substrate
Wide spectrum dimmer reflecting film, realizes the neutral light splitting to 480-700nm wave bands, while to 400-440nm, 800-1100nm wide light
Composing wave band realizes height thoroughly.
Technical background
Visible short infrared high spectrum camera is employed based on high efficiency convex grating modified due to its less F number
OFFNER systems, breach the key technology of double aperture slit, big face visual field and flat field degree spectrometer.Because slit length reaches
60mm, and slit width is only 30 μm, the protection of slit cleanliness factor is a difficult point during dress school, simultaneously because grating spreads out
Penetrate that optical efficiency caused by effect is unbalanced to be also required to be adjusted, therefore by designing a kind of VNIR slits screening glass, make
Can to slit carry out cleanliness factor protection, the regulation and control of spectrum and energy can be carried out again.In view of slit screening glass deformation etc. pair
In terms of the influence of spectrometer, and the reliability of slit screening glass in itself, base material, film are used as using sapphire in design
Layer material is selected absorbs less Ta in service band (especially 400-440nm)2O5It is used as high-index material.The slit is protected
Bluff piece is significant for high spectral resolution spectrometer, and the spectrum of the screening glass and regulation of energy function are for other
Similar application in air remote sensing instrument has important reference value.
The content of the invention
It is an object of the invention to provide a kind of visible ray near infrared band (VNIR) slit using sapphire crystal as substrate
Screening glass, realizes the neutral light splitting to 480-700nm wave bands, while real to 400-440nm, 800-1100nm wide spectrum wave band
It is existing highly transmissive, to meet the cleaning of the slit in visible short infrared high spectrum camera OFFNER grating splitting systems protection and energy
Amount and spectrum regulate and control demand.
The technical scheme is that：Prepared on the sapphire substrates plane of incidence optical electivity and regulation of energy multilayer film,
Backside of substrate prepares wide spectrum dimmer reflecting film.
Optical electivity and regulation of energy multilayer film should consider the neutral light splitting of middle wave band in design, it is also contemplated that two
The highly transmissive requirement at end, therefore the Film Design method that membrane system adds layer spectro-film using negative filter is aided with equivalent matched layer.
For broadening bandwidth, asymmetric equivalent stratification refers to alternating refractive index Film Design method and is used as solution, finally leads to
Cross software optimization and obtain available membrane system, while by the thickness of the indivedual key stratums of local optimum control pole, realizing accurate light
Spectrum selection and regulation of energy.And the wide spectrum dimmer reflecting film at the back side equally have followed such design principle.
Analyzed more than, the realization of the VNIR slit screening glass comprises the following steps：
1. the structure of membrane system
Optical electivity and the film structure of regulation of energy multilayer film (1) are：
Substrate/3.069H1.805L.293H1.316L (.293L.993H.824L)22.874H 1.505L/ air
The film structure of wide spectrum dimmer reflecting film (3) is：
Substrate/.489H.233L.984H.295L.497H 1.249L/ air
The implication of each symbol is respectively in formula：nsFor substrate；n0For air；L represents that optical thickness is λ0/ 4 SiO2Film
Layer；H represents that optical thickness is λ0/ 4 Ta2O5Film layer.λ0Centered on wavelength；Numeral before H, L is λ0/ 4 optical thickness ratio systems
Number multiplier；Index 2 represents membrane stack periodicity.
2. film layer preparation method
Prepared by film layer carried out on the box type vacuum filming equipment with diffusion pumping system, and H, L use electron beam
Hydatogenesis, overall process uses ion beam assisted depositing, and ion gun is MarkII, and design parameter is：Anode voltage 200~
230V, 12~16A of cathode current.Shown by film material test result analysis：Base reservoir temperature is controlled at 250 DEG C, film layer
With good firmness；At such a temperature, the Ta obtained by electron-beam evaporation2O5Film layer has finer and close structure, because
This also reduces therewith in the absorption of 400-440nm spectral regions.Ion beam assisted depositing improves film for increase film layer consistency
Layer reliability also has positive effect.Beneficial effects of the present invention are as follows：
1. it is to adopt the invention provides a kind of visible near-infrared (VNIR) slit screening glass by substrate of sapphire crystal
It is double narrow during to dress school with optical element essential in the visible short EO-1 hyperion camera optical system of convex grating light splitting
Seam cleaning protection and optical electivity and regulation of energy are significant.
2. present invention employs special process, improving the consistency of film layer, the absorption and spectrum drift of material are reduced
Move, it is ensured that the accuracy controlling being accurately positioned with energy of spectrum, and space reliability.
3. technical scheme reasonable, properties of product are stable, the height using grating beam splitting can be widely applied to
In spectrum camera system.
Brief description of the drawings
During Fig. 1 is the film layer structure schematic diagram of VNIR slit screening glass, figure：
1-optical electivity and regulation of energy multilayer film；
2-sapphire substrates；
3-wide spectrum dimmer reflecting film
Fig. 2 VNIR slit screening glass spectrum surveys transmittance graph.
Embodiment
The embodiment to the present invention is described in further detail below in conjunction with the accompanying drawings.
The particular technique index request of the embodiment of the present invention is：
| Wavelength (nm) | Transmitance requirement | Remarks |
| 400-440 | ≥0.93 | |
| 480-700 | 0.55~0.6 | Wherein 580nm is 0.45~0.5 |
| 800-1050 | ≥0.95 | 900-1000≥0.98 |
Base material is sapphire, and remarks content is the requirement that must be reached.
According to technical requirements, using preparing optical electivity and regulation of energy multilayer film, base on the sapphire substrates plane of incidence
Bottom back side prepares the technical scheme of wide spectrum dimmer reflecting film.During optical electivity should consider with regulation of energy multilayer film in design
Between wave band neutral light splitting, it is also contemplated that the highly transmissive requirement at two ends, therefore membrane system adds layer spectro-film using negative filter
Film Design method is aided with equivalent matched layer.For broadening bandwidth, asymmetric equivalent stratification refers to alternating refractive index Film Design
Method is used as solution, and available membrane system is obtained finally by software optimization, while passing through local optimum control pole
The thickness of other key stratum, realizes accurate optical electivity and regulation of energy.And the wide spectrum dimmer reflecting film at the back side equally have followed
Such design principle.Finally membrane system is：
n0/1.249L.497H.295L.984H.233L.489H/ns/3.069H 1.805L.293H 1.316L
(.293L.993H.824L)^2 2.874H 1.505L/n0
H, L are respectively Ta2O5And SiO2, nsFor substrate, n0For air.
In the present embodiment, the membrane system development of slit screening glass is under 250 DEG C of depositing temperature, using electron beam evaporation
Two kinds of Coating Materials are deposited, overall process uses ion beam assisted depositing.
Figure it is seen that the optical property of slit screening glass has reached the index request of visible near-infrared high split-phase motor,
The optical electivity of convex grating splitting system and the use requirement of regulation of energy are disclosure satisfy that, while the cleaning to double aperture slit system
Play good protective action.
Claims (2)
1. a kind of visible ray near infrared band slit screening glass using sapphire as substrate, described screening glass is to 480-700nm
The neutral light splitting of wave band, while realizing height thoroughly to 400-440nm, 800-1100nm wide spectrum wave band, its structure is:In indigo plant
There is optical electivity to have width with regulation of energy multilayer film (1), at the back side of sapphire substrates (2) on the plane of incidence of jewel substrate (2)
Spectrum dimmer reflecting film (3), it is characterised in that：
Described optical electivity and the film structure of regulation of energy multilayer film (1) are：
Substrate/3.069H1.805L.293H1.316L (.293L.993H.824L)2Wide light described in 2.874H 1.505L/ air
Spectrum antireflective coating (3) film structure be：
Substrate/.489H.233L.984H.295L.497H 1.249L/ air
In formula：L represents that optical thickness is λ0/ 4 SiO2Film layer；H represents that optical thickness is λ0/ 4 Ta2O5Film layer；λ0Centered on
Wavelength；Numeral before H, L is λ0The proportionality coefficient multiplier of/4 optical thicknesses；Index 2 represents membrane stack periodicity.
2. a kind of visible ray near infrared band slit screening glass using sapphire as substrate according to claim 1, it is special
Levy and be：Described Ta2O5Film layer and SiO2Film layer is deposited using ion auxiliary electron beam evaporation；Deposited in film layer preparation process
Temperature control is at 250 DEG C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610538955.1A CN106019426B (en) | 2016-07-11 | 2016-07-11 | A kind of visible ray near infrared band slit screening glass using sapphire as substrate |
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|---|---|---|---|
| CN201610538955.1A CN106019426B (en) | 2016-07-11 | 2016-07-11 | A kind of visible ray near infrared band slit screening glass using sapphire as substrate |
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| Publication Number | Publication Date |
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| CN106019426A CN106019426A (en) | 2016-10-12 |
| CN106019426B true CN106019426B (en) | 2017-10-13 |
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| CN109724694A (en) * | 2019-01-29 | 2019-05-07 | 安徽创谱仪器科技有限公司 | Slit element |
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| US20090225427A1 (en) * | 2008-03-10 | 2009-09-10 | Masco Corporation | Optically modified three-dimensional object |
| JP6502021B2 (en) * | 2013-04-10 | 2019-04-17 | デクセリアルズ株式会社 | Phase difference compensation element and projection type image projector |
| JP2015111241A (en) * | 2013-10-30 | 2015-06-18 | 日本電波工業株式会社 | Optical component |
| CN205899055U (en) * | 2016-07-11 | 2017-01-18 | 中国科学院上海技术物理研究所 | Use visible light near infrared band slit screening glass of sapphire as basement |
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