CN105950115A - Environment-friendly abrasive paste suitable for gallium oxide substrate and preparation method of environment-friendly abrasive paste - Google Patents

Environment-friendly abrasive paste suitable for gallium oxide substrate and preparation method of environment-friendly abrasive paste Download PDF

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Publication number
CN105950115A
CN105950115A CN201610314540.6A CN201610314540A CN105950115A CN 105950115 A CN105950115 A CN 105950115A CN 201610314540 A CN201610314540 A CN 201610314540A CN 105950115 A CN105950115 A CN 105950115A
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China
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gallium oxide
oxide substrate
applicable
environmental protection
abrasive pastes
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CN201610314540.6A
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黄传锦
周海
顾斌
徐晓明
龚凯
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Yangcheng Institute of Technology
Yancheng Institute of Technology
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Yangcheng Institute of Technology
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Priority to CN201610314540.6A priority Critical patent/CN105950115A/en
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents

Abstract

The invention discloses environment-friendly abrasive paste suitable for a gallium oxide substrate and a preparation method of the environment-friendly abrasive paste. The abrasive paste is prepared from components in percentage by mass as follows: 0.5%-10% of a main grinding agent, 0.5%-10% of a grinding aid, 10%-50% of an excipient, 0.5%-30% of a surfactant, 0.3%-5% of a thickening agent, 0.3%-5% of a complexing agent, 0.1%-0.3% of a preservative, 0.05%-0.3% of a defoaming agent and 30%-80% of deionized water. The preparation method comprises steps as follows: the deionized water and the thickening agent are stirred and heated, the excipient, the complexing agent and the grinding aid are added and stirred, the surfactant and the defoaming agent are added, stirred and homogenized, and a water phase is formed; the main grinding agent is ground, and a solid phase is formed; the water phase and the solid phase are stirred and homogenized, then the preservative is added, the mixture is stirred and homogenized continuously, and the abrasive paste is obtained. The prepared abrasive paste is environment-friendly and user-friendly and can reduce the cleavage phenomenon on the surface of gallium oxide.

Description

A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate and preparation method thereof
Technical field
The invention belongs to abrasive pastes technical field, be specifically related to a kind of environmental protection abrasive pastes being applicable to gallium oxide substrate and preparation method thereof.
Background technology
In January, 2013, in " Japan the 3rd LED and organic EL illuminating exhibition " that Tokyo is held, field village makes institute and light wave company of subsidiary has put on display its use gallium oxide single crystal (β-Ga developed2O3) White LED, it, compared with when being traditionally used on sapphire substrate the common blue LED die made, has the advantages that easily improve optical output power, therefore enjoys the extensive concern of industry.Because gallium oxide single crystal material belongs to novel crystal material, the correlation techniques such as current crystal growth, Ultra-precision Turning technique are the most immature, so the production technology report relevant to gallium oxide substrate is the most few, even if the most simply illustrate finished product and the LED component of making thereof of gallium oxide substrate in Japan, and seldom relate to gallium oxide underlay producing technique technology.
Abrasive pastes are one of modal adjuvant consumptive materials in the current crystalline material course of processing, but abrasive pastes do not have universality.Because its physicochemical characteristic of different crystalline materials also differs, Lithium metaniobate, lithium tantalate, the most crisp high carborundum and sapphire, deliquescent potassium dihydrogen phosphate, the gallium oxide etc. of the easy cleavage of fragility such as soft fragility, general abrasive pastes are utilized to process above-mentioned crystal it may happen that the phenomenon of discomfort, it is therefore necessary to develop more scientific rational special-purpose polishing cream.Additionally, on the market or comprise current less use in some abrasive pastes of relating to of earlier patents or avoid the chemical agent used, these chemical agents bring harm, such as NPE and OPEO class surfactant often to people or environment.
Summary of the invention
In order to overcome above the deficiencies in the prior art, the invention provides a kind of environmental protection abrasive pastes being applicable to gallium oxide substrate and preparation method thereof, friendly to environment and operator, the cleavage phenomenon on gallium oxide surface can be alleviated simultaneously.
The technical solution used in the present invention is:
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: main grinding agent 0.5-10%, grinding aid 0.5-10%, excipient 10-50%, surfactant 0.5-30%, thickening agent 0.3-5%, chelating agent 0.3-5%, preservative 0.1-0.3%, defoamer 0.05-0.3%, deionized water 30-80%.
Preferably, above-mentioned main grinding agent is the mixture of one or more in corundum, carborundum, diamond, and particle diameter is 0.25-5 μm.
Preferably, the mixture of one or more during above-mentioned grinding aid is sodium hydroxide, potassium hydroxide, dimethylamine, triethanolamine, dimethyl amine, diethylenetriamine, cyclohexylamine, di-n-butylamine.
Preferably, the mixture of one or more during above-mentioned excipient is Sorbitol, glycerol, Polyethylene Glycol, polypropylene glycol, polyglycereol 10, glycerine monofatty ester.
Preferably, the mixture of one or more during above-mentioned surfactant is alkanolamide, fatty acid amide sulfosuccinic acid monoesters, N-sodium N-lauroyl sarcosinate, polyoxyethylenated alcohol sodium sulfate, sodium lauryl sulfate, lauryl potassium sulfate, lignosulfonates, fatty alcohol-polyoxyethylene ether.
Preferably, the mixture of one or more during above-mentioned thickening agent is carboxymethyl cellulose, hydroxyethyl cellulose, hydroxypropyl methyl cellulose, carrageenan, xanthan gum, hydroxypropyl guar gum, carbomer, polyacrylic acid.
Preferably, the mixture of one or more during above-mentioned chelating agent is disodiumedetate, tetrasodium ethylenediamine tetraacetate, sodium gluconate, sodium citrate.
Preferably, foregoing preservatives is KF88 preservative.
Preferably, the one during above-mentioned defoamer is polyether-type defoamer, silicone defoamer.
A kind of environmental protection abrasive pastes preparation method being applicable to gallium oxide substrate, comprises the following steps:
(1) in agitator, add deionized water, thickening agent, be warming up to 60-80 DEG C after stirring and dissolving, be sequentially added into excipient, chelating agent, grinding aid, stirring and dissolving, sequentially add surfactant, defoamer, stirring, homogenizing, form aqueous phase;
(2) main grinding agent is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, add aqueous phase, solid phase, after stirring homogenizing, add preservative, continue stirring homogenizing, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Each component effect is as follows:
Main grinding agent: the hardness of hardness ratio gallium oxide is high, shear removal gallium oxide substrate crystal face produces because of upper one manufacturing procedure under pressure surface and sub-surface damage layer.
Grinding aid: have the effect of corrosion oxidation gallium plane of crystal, makes gallium oxide form softer alkali formula compound, contains the generation of processed crystal face cleavage fracture, help main grinding agent to grind gallium oxide crystal quickly.
Surfactant, chelating agent and thickening agent: be adsorbed in the surface of abrasive grain, balance and the surface free energy of neutralization abrasive grain, so that abrasive pastes main abrasive particulate in preparation production process the most mutually bonds reunions, play abrasive material in abrasive pastes dispersed and prevent the effect of gathering;In process of lapping, it is adsorbed in the gallium oxide fine scrap surface being ground pulverizing, and is disperseed and wrap up, under the common effect of abrasive disk (or grinding pad) and current, processing scrap is taken out of grinding interface;During abrasive pastes preparation produces, grinds substrate base, improve adhesion and the mobility of abrasive pastes, be more beneficial for preparation production and the abrasive application of abrasive pastes;Neutralize abrasive disk (or grinding pad) and the fricative electric charge of substrate surface in process of lapping, and then eliminate the phenomenon that in the processed environment of surface of the work, pollutant stick, improve and grind crystal face quality.
Excipient, for improving the moisture retention of abrasive pastes, and plays plasticising in application process, lubricates, disperses and the effect of suspending, and the abrasive pastes of different size purposes can be carried out coloring treatment, be beneficial to use of classifying.
Preservative: prevent in abrasive pastes medicine component to cause putrid and deteriorated because of reasons such as chemical changes.
Defoamer: eliminate the foam produced in process of lapping because of the application of surfactant, it is to avoid carrying out smoothly of foam interference grinding technics.
The abrasive pastes that the present invention prepares have the advantage that
(1) environmental protection component is used, without the surfactant such as NPE and OPEO, friendly to environment and operator;
(2) gallium oxide substrate it is applicable to, it is possible to alleviate the cleavage phenomenon on gallium oxide surface, filled up the blank of prior art.
Accompanying drawing explanation
Fig. 1 is that embodiment 5 grinds front wafer topography figure;
Fig. 2 is wafer topography figure after embodiment 5 is ground;
Fig. 3 is that embodiment 6 grinds front wafer topography figure;
Fig. 4 is wafer topography figure after embodiment 6 is ground;
Fig. 5 is that embodiment 7 grinds front wafer topography figure;
Fig. 6 is wafer topography figure after embodiment 7 is ground.
Detailed description of the invention
Below by detailed description of the invention, the present invention is described in further detail.
Embodiment 1
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: carborundum 0.5%(particle diameter is 0.5 μm), cyclohexylamine 0.5%, glycerol 17.75%, lignosulfonates 0.5%, hydroxyethyl cellulose 0.3%, sodium citrate 0.3%, KF88 preservative 0.1%, silicone diethanol defoamer 0.05%, deionized water 80%.
Preparation method, comprises the following steps:
(1) in agitator, deionized water, hydroxyethyl cellulose are added, stir 10 minutes with 60r/min speed, 60 DEG C it are warming up to after dissolving, it is sequentially added into glycerol, sodium citrate, cyclohexylamine, with 150r/min speed stirring and dissolving, sequentially add lignosulfonates, silicone diethanol defoamer, stir 20 minutes with 150r/min speed, with 1500r/min speed homogenizing 10 minutes, form aqueous phase;
(2) carborundum is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, aqueous phase, solid phase are added, stir 20 minutes with 300r/min speed at a temperature of 30 DEG C, again with 1500r/min speed homogenizing 10 minutes, add KF88 preservative, 1500r/min speed homogenizing 10 minutes, stir 20 minutes with 15r/min speed again, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Using the abrasive pastes that the present embodiment prepares, grind gallium oxide substrate base on precision lapping machine, the surface roughness of wafer is down to 7nm by 65nm, and the cleavage phenomenon on surface is substantially alleviated.
Embodiment 2
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: corundum 10%(particle diameter is 5 μm), dimethylamine 10%, polypropylene glycol 10%, N-sodium N-lauroyl sarcosinate 29.4%, xanthan gum 2%, carbomer 3%, sodium gluconate 5%, KF88 preservative 0.3%, silicone diethanol defoamer 0.3%, deionized water 30%.
Preparation method, comprises the following steps:
(1) in agitator, deionized water, xanthan gum, carbomer are added; stir 30 minutes with 240r/min speed; 80 DEG C it are warming up to after dissolving; it is sequentially added into polypropylene glycol, sodium gluconate, dimethylamine; with 300r/min speed stirring and dissolving, sequentially add N-sodium N-lauroyl sarcosinate, silicone diethanol defoamer, stir 40 minutes with 300r/min speed; with 15000r/min speed homogenizing 30 minutes, form aqueous phase;
(2) corundum is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, aqueous phase, solid phase are added, with 600 at a temperature of 60 DEG C R/min speed stirs 40 minutes, then with 15000r/min speed homogenizing 30 minutes, adds KF88 preservative, 15000r/min speed homogenizing 30 minutes, then stir 60 minutes with 150r/min speed, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Using the abrasive pastes that the present embodiment prepares, grind gallium oxide substrate base on precision lapping machine, the surface roughness of wafer is down to 189nm by 345nm, and the cleavage phenomenon on surface is substantially alleviated.
Embodiment 3
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: carborundum 0.5%(particle diameter is 5 μm), corundum 0.5%(particle diameter be 5 μm), diethylenetriamine 2%, glycerine monofatty ester 50%, lauryl potassium sulfate 10%, hydroxypropyl guar gum 3%, sodium gluconate 1%, sodium citrate 1%, tetrasodium ethylenediamine tetraacetate 1%, KF88 preservative 0.2%, dimethicone 0.1%, deionized water 30.7%.
Preparation method, comprises the following steps:
(1) in agitator, deionized water, hydroxypropyl guar gum, sodium gluconate, sodium citrate are added, stir 12 minutes with 80r/min speed, 60-80 DEG C it is warming up to after dissolving, it is sequentially added into glycerine monofatty ester, tetrasodium ethylenediamine tetraacetate, diethylenetriamine, with 180r/min speed stirring and dissolving, sequentially add lauryl potassium sulfate, dimethicone, stir 25 minutes with 180r/min speed, with 2500r/min speed homogenizing 15 minutes, form aqueous phase;
(2) carborundum, corundum are placed in powder material tank pulverizing, form solid phase;
(3) in vacuum Manufacturing medicine extract machine, aqueous phase, solid phase are added, with 350 at a temperature of 35 DEG C R/min speed stirs 25 minutes, then with 2500r/min speed homogenizing 15 minutes, adds KF88 preservative, 2500r/min speed homogenizing 15 minutes, then stir 25 minutes with 25r/min speed, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Using the abrasive pastes that the present embodiment prepares, grind gallium oxide substrate base on precision lapping machine, the surface roughness of wafer is down to 177nm by 339nm, and the cleavage phenomenon on surface is substantially alleviated.
Embodiment 4
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: carborundum 5%(particle diameter is 3 μm), dimethyl amine 3%, glycerine monofatty ester 20%, fatty acid amide sulfosuccinic acid monoesters 30%, carrageenan 2%, tetrasodium ethylenediamine tetraacetate 2%, KF88 preservative 0.2%, dimethicone 0.2%, deionized water 37.6%.
Preparation method, comprises the following steps:
(1) in agitator, deionized water, carrageenan are added, stir 25 minutes with 220r/min speed, 65 DEG C it are warming up to after dissolving, it is sequentially added into glycerine monofatty ester, tetrasodium ethylenediamine tetraacetate, dimethyl amine, with 250r/min speed stirring and dissolving, sequentially add fatty acid amide sulfosuccinic acid monoesters, dimethicone, stir 35 minutes with 280r/min speed, with 13000r/min speed homogenizing 25 minutes, form aqueous phase;
(2) carborundum is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, aqueous phase, solid phase are added, stir 35 minutes with 550r/min speed at a temperature of 55 DEG C, again with 13000r/min speed homogenizing 25 minutes, add KF88 preservative, 13000r/min speed homogenizing 25 minutes, stir 50 minutes with 120r/min speed again, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Using the abrasive pastes that the present embodiment prepares, grind gallium oxide substrate base on precision lapping machine, the surface roughness of wafer is down to 167nm by 305nm, and the cleavage phenomenon on surface is substantially alleviated.
Embodiment 5
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: W3 diadust 5.0%(particle diameter is 1.5-3 μm), potassium hydroxide 1.5%, di-n-butylamine 1.5%, glycerine monofatty ester 20%, polyethylene glycol 200 5%, cetomacrogol 1000 10%, alkanolamide 1.5%, fatty acid amide sulfosuccinic acid monoesters 1.5%, disodiumedetate 1.8%, carbomer 2.0%, KF88 preservative 0.2%, GP type glycerin polyether 0.1%, deionized water 49.9%.
Preparation method, comprises the following steps:
(1) in agitator, deionized water, carbomer are added, stir 18 minutes with 110r/min speed, 75 DEG C it are warming up to after dissolving, it is sequentially added into glycerine monofatty ester, polyethylene glycol 200, cetomacrogol 1000, disodiumedetate, potassium hydroxide, di-n-butylamine, with 200r/min speed stirring and dissolving, sequentially add alkanolamide, fatty acid amide sulfosuccinic acid monoesters, GP type glycerin polyether, stir 30 minutes with 200r/min speed, with 10000r/min speed homogenizing 20 minutes, form aqueous phase;
(2) diadust is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, aqueous phase, solid phase are added, stir 30 minutes with 450r/min speed at a temperature of 45 DEG C, again with 10000r/min speed homogenizing 20 minutes, add KF88 preservative, 10000r/min speed homogenizing 20 minutes, stir 40 minutes with 100r/min speed again, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Use the abrasive pastes that the present embodiment prepares, precision lapping machine grinds gallium oxide substrate base, Keyemce three-dimensional appearance instrument is used to observe crystal face pattern, before grinding, wafer topography is as shown in Figure 1, after grinding, wafer topography is as shown in Figure 2, the surface roughness of wafer is down to 155nm by 296nm, and the cleavage phenomenon on surface is substantially alleviated.
Embodiment 6
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: W1.5 diadust 5.0%(particle diameter is 0.75-1.5 μm), sodium hydroxide 1.0%, triethanolamine 1.0%, glycerol 15.0%, Sorbitol 30.0%, polyoxyethylenated alcohol sodium sulfate 0.5%, fatty alcohol-polyoxyethylene ether 0.5%, disodiumedetate 1.3%, hydroxypropyl methyl cellulose 0.5%, polyacrylic acid 0.5%, KF88 preservative 0.2%, GP type glycerin polyether 0.1%, deionized water 43.9%.
Preparation method, comprises the following steps:
(1) in agitator, deionized water, polyacrylic acid are added, stir 20 minutes with 150r/min speed, 70 DEG C it are warming up to after dissolving, it is sequentially added into glycerol, Sorbitol, disodiumedetate, sodium hydroxide, triethanolamine, with 200r/min speed stirring and dissolving, sequentially add polyoxyethylenated alcohol sodium sulfate, fatty alcohol-polyoxyethylene ether, GP type glycerin polyether, stir 30 minutes with 250r/min speed, with 9000r/min speed homogenizing 15 minutes, form aqueous phase;
(2) diadust is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, aqueous phase, solid phase are added, with 400 at a temperature of 50 DEG C R/min speed stirs 35 minutes, then with 9000r/min speed homogenizing 20 minutes, adds KF88 preservative, 9000r/min speed homogenizing 25 minutes, then stir 40 minutes with 100r/min speed, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Use the abrasive pastes that the present embodiment prepares, precision lapping machine grinds gallium oxide substrate base, Keyemce three-dimensional appearance instrument is used to observe crystal face pattern, before grinding, wafer topography is as shown in Figure 3, after grinding, wafer topography is as shown in Figure 4, the surface roughness of wafer is down to 35nm by 185nm, and the cleavage phenomenon on surface is substantially alleviated.
Embodiment 7
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate, are made up of the component of following mass fraction: W0.5 diadust 5.0%(particle diameter is 0.25-0.5 μm), sodium hydroxide 1.5%, triethanolamine 1.5%, polyglycereol 10 35%, sodium lauryl sulfate 1.5%, fatty alcohol-polyoxyethylene ether 0.5%, sodium gluconate 1.0%, carboxymethyl cellulose 1.8%, KF88 preservative 0.2%, GPE type polyoxyethylene polyoxypropylene glycerin ether 0.1%, deionized water 43.9%.
Preparation method, comprises the following steps:
(1) in agitator, deionized water, carboxymethyl cellulose are added, stir 20 minutes with 200r/min speed, 70 DEG C it are warming up to after dissolving, it is sequentially added into polyglycereol 10, sodium gluconate, sodium hydroxide, triethanolamine, with 200r/min speed stirring and dissolving, sequentially add sodium lauryl sulfate, fatty alcohol-polyoxyethylene ether, GPE type polyoxyethylene polyoxypropylene glycerin ether, stir 30 minutes with 200r/min speed, with 8000r/min speed homogenizing 20 minutes, form aqueous phase;
(2) diadust is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, aqueous phase, solid phase are added, with 400 at a temperature of 50 DEG C R/min speed stirs 30 minutes, then with 8000r/min speed homogenizing 20 minutes, adds KF88 preservative, 8000r/min speed homogenizing 20 minutes, then stir 40 minutes with 80r/min speed, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
Use the abrasive pastes that the present embodiment prepares, precision lapping machine grinds gallium oxide substrate base, Keyemce three-dimensional appearance instrument is used to observe crystal face pattern, before grinding, wafer topography is as shown in Figure 5, after grinding, wafer topography is as shown in Figure 6, the surface roughness of wafer is down to 5nm by 62nm, and the cleavage phenomenon on surface is substantially alleviated.

Claims (10)

1. the environmental protection abrasive pastes being applicable to gallium oxide substrate, it is characterized in that, be made up of the component of following mass fraction: main grinding agent 0.5-10%, grinding aid 0.5-10%, excipient 10-50%, surfactant 0.5-30%, thickening agent 0.3-5%, chelating agent 0.3-5%, preservative 0.1-0.3%, defoamer 0.05-0.3%, deionized water 30-80%.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described main grinding agent is the mixture of one or more in corundum, carborundum, diamond, and particle diameter is 0.25-5 μm.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described grinding aid is the mixture of one or more in sodium hydroxide, potassium hydroxide, dimethylamine, triethanolamine, dimethyl amine, diethylenetriamine, cyclohexylamine, di-n-butylamine.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described excipient is the mixture of one or more in Sorbitol, glycerol, Polyethylene Glycol, polypropylene glycol, polyglycereol 10, glycerine monofatty ester.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described surfactant is the mixture of one or more in alkanolamide, fatty acid amide sulfosuccinic acid monoesters, N-sodium N-lauroyl sarcosinate, polyoxyethylenated alcohol sodium sulfate, sodium lauryl sulfate, lauryl potassium sulfate, lignosulfonates, fatty alcohol-polyoxyethylene ether.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described thickening agent is the mixture of one or more in carboxymethyl cellulose, hydroxyethyl cellulose, hydroxypropyl methyl cellulose, carrageenan, xanthan gum, hydroxypropyl guar gum, carbomer, acrylate copolymer.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described chelating agent is the mixture of one or more in disodiumedetate, tetrasodium ethylenediamine tetraacetate, sodium gluconate, sodium citrate.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described preservative is KF88 preservative.
A kind of environmental protection abrasive pastes being applicable to gallium oxide substrate the most according to claim 1, it is characterised in that: described defoamer is the one in polyether-type defoamer, silicone defoamer.
10. the preparation method of a kind of environmental protection abrasive pastes being applicable to gallium oxide substrate described in claim 1, it is characterised in that: comprise the following steps:
(1) in agitator, add deionized water, thickening agent, be warming up to 60-80 DEG C after stirring and dissolving, be sequentially added into excipient, chelating agent, grinding aid, stirring and dissolving, sequentially add surfactant, defoamer, stirring, homogenizing, form aqueous phase;
(2) main grinding agent is placed in powder material tank pulverizing, forms solid phase;
(3) in vacuum Manufacturing medicine extract machine, add aqueous phase, solid phase, after stirring homogenizing, add preservative, continue stirring homogenizing, obtain described in be applicable to the environmental protection abrasive pastes of gallium oxide substrate.
CN201610314540.6A 2016-05-13 2016-05-13 Environment-friendly abrasive paste suitable for gallium oxide substrate and preparation method of environment-friendly abrasive paste Pending CN105950115A (en)

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CN104592935A (en) * 2015-01-04 2015-05-06 江苏中晶科技有限公司 Accelerator used in grinding hard material
CN105153942A (en) * 2015-07-28 2015-12-16 郑州磨料磨具磨削研究所有限公司 Control method for grain size of abrasive material in nano diamond polishing solution
CN105153943A (en) * 2015-09-10 2015-12-16 盐城工学院 Anti-cleavage polishing solution for gallium oxide wafer and preparation method of anti-cleavage polishing solution
CN105273638A (en) * 2015-10-14 2016-01-27 盐城工学院 Anti-cleavage suspended grinding fluid for gallium oxide wafer and preparation method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
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CN110023449A (en) * 2016-12-28 2019-07-16 霓达哈斯股份有限公司 Composition for polishing and grinding method
CN110023449B (en) * 2016-12-28 2021-08-17 霓达杜邦股份有限公司 Polishing composition and polishing method
CN111234707A (en) * 2020-03-28 2020-06-05 苏州普茨迈精密航空设备有限公司 Elastic flowable grinding paste and preparation method thereof
CN115466574A (en) * 2022-09-21 2022-12-13 深圳市东方亮化学材料有限公司 Processing method of double-component metal grinding and polishing paste

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