CN105892156B - The method that transparent substrate is exposed - Google Patents
The method that transparent substrate is exposed Download PDFInfo
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- CN105892156B CN105892156B CN201610399140.XA CN201610399140A CN105892156B CN 105892156 B CN105892156 B CN 105892156B CN 201610399140 A CN201610399140 A CN 201610399140A CN 105892156 B CN105892156 B CN 105892156B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Polarising Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses the methods that a kind of pair of transparent substrate is exposed, comprising: fixes the relative position of the first light shield, the second light shield and transparent substrate；It is utilized respectively the first light shield, the second light shield generates the different light in polarization direction and is exposed to the different zones of transparent substrate.By the above-mentioned means, the present invention can simplify exposure manufacture process technique, shortens processing time, be improved production efficiency.
Description
Technical field
The present invention relates to liquid crystal technology field, the method being exposed more particularly to a kind of pair of transparent substrate.
Background technique
Advanced lines glass substrate reduces cost to improve glass utilization, using mixed composition (Multi Mode
Glass writes a Chinese character in simplified form MMG) technology, i.e., arrange various sizes of plate (panel) on the glass substrate, in this way, can make to lose
The substrate area of abandoning is smaller, and glass substrate cutting efficiency is high, therefore obtains the favor of liquid crystal display panel manufacturer.
It is typically different the mode difference that the panel of size is arranged on big glass substrate, so as to cause light orientation is being carried out
When, the polarization direction of required polarised light is different.In traditional light alignment manufacture process, the light alignment manufacture process of this assorted size is often
Use light shield.When first carrying out orientation to a size panel, the panel of other modes arrangement is blocked with light shield.Therefore need into
The multiple illumination orientation of row will cause processing time increase in this way, reduce production efficiency.
Summary of the invention
The invention mainly solves the technical problem of providing the methods that a kind of pair of transparent substrate is exposed, and can simplify system
Journey technique shortens processing time, improves production efficiency.
In order to solve the above technical problems, one technical scheme adopted by the invention is that: a kind of pair of transparent substrate is provided and is carried out
The method of exposure, comprising: fix the relative position of the first light shield, the second light shield and the transparent substrate；It is utilized respectively described
First light shield, the second light shield generate the different light in polarization direction and are exposed to the different zones of the transparent substrate.
Wherein, the relative position fixation by the first light shield, the second light shield and the transparent substrate include: will be described
Bright substrate is set between first light shield, the second light shield, and three is parallel to each other；It is described to be utilized respectively first light
It includes: to utilize that cover, the second light shield, which generate the different light in polarization direction and be exposed to the different zones of the transparent substrate,
The light that one light source generates passes through first light shield and is irradiated on the transparent substrate；It is worn using the light that second light source generates
Second light shield is crossed to be irradiated on the transparent substrate.
Wherein, first light shield, the second light shield include transmission region and lightproof area, and first light shield
Transmission region, lightproof area respectively correspond lightproof area, the transmission region of second light shield.
Wherein, the relative position fixation by the first light shield, the second light shield and the transparent substrate includes: by described the
One light shield, the second light shield, transparent substrate are horizontal positioned；Or first light shield, the second light shield, transparent substrate are placed vertically.
Wherein, described be utilized respectively first light shield, the second light shield generates the different light in polarization direction to described
The different zones of bright substrate be exposed include: be utilized respectively first light shield, the second light shield generate polarization direction it is different
Light is simultaneously exposed the different zones of the transparent substrate.
Wherein, described be utilized respectively first light shield, the second light shield generates the different light in polarization direction to described
The step of different zones of bright substrate are exposed, comprising: be utilized respectively first light shield, the second light shield generates polarization direction
Different light is exposed the different zones of the transparent substrate, and controls the light intensity of the different light in the polarization direction
Degree, so that the degree that the different zones of the transparent substrate expose is equal.
Wherein, described be utilized respectively first light shield, the second light shield generates the different light in polarization direction to described
The step of different zones of bright substrate are exposed, comprising: be utilized respectively first light shield, the second light shield generates polarization direction
Vertical light is exposed the different zones of the transparent substrate.
Wherein, the size of the different zones of the transparent substrate is different.
Wherein, described be utilized respectively first light shield, the second light shield generates the different light in polarization direction to described
The different zones of bright substrate be exposed include: be utilized respectively first light shield, the second light shield generate polarization direction it is different
Light is exposed the different zones of the transparent substrate, realizes light orientation.
The beneficial effects of the present invention are: be in contrast to the prior art, the present invention is by the first light shield, the second light shield and institute
The relative position for stating transparent substrate is fixed；It is utilized respectively first light shield, the second light shield generates the different light in polarization direction
The different zones of the transparent substrate are exposed.Due to not needing to separate twice using the first light shield, the second light shield, directly
First light shield, the second light shield and transparent substrate is all fixed, it is different using the first light shield, the second light shield generation polarization direction
Light is exposed the different zones of transparent substrate, in this way, can simplify exposure manufacture process technique, when shortening processing procedure
Between, it is improved production efficiency.
Detailed description of the invention
Fig. 1 is the flow chart for one embodiment of method that the present invention is exposed transparent substrate；
Fig. 2 is that glass substrate places one embodiment party of time orientation vertically in the method for the invention being exposed to transparent substrate
The structural schematic diagram of formula；
Fig. 3 is that glass substrate is horizontally arranged one embodiment party of time orientation in the method for the invention being exposed to transparent substrate
The structural schematic diagram of formula；
Fig. 4 is the schematic diagram of 8.5 generation line glass substrate mixed compositions, 8 43inch and 8 22inch, two kinds of sizes；
Fig. 5 is to need to use when carrying out light orientation to Fig. 4 to the method that transparent substrate is exposed using the present invention
The schematic diagram of two light shields；
Fig. 6 is the schematic diagram of tradition illumination glass substrate progress twice light orientation in the prior art.
Specific embodiment
The present invention is described in detail with embodiment with reference to the accompanying drawing.
Refering to fig. 1, Fig. 1 is the flow chart for one embodiment of method that the present invention is exposed transparent substrate, comprising:
Step S101: the relative position of the first light shield, the second light shield and transparent substrate is fixed.
Step S102: it is utilized respectively the first light shield, the second light shield generates the different light in polarization direction to transparent substrate
Different zones are exposed.
According to the actual application, the relative position of the first light shield, the second light shield and transparent substrate is fixed, it can be by
One light shield, the second light shield are separately fixed at the two sides of transparent substrate, the first light shield, the second light shield can also be fixed on transparent base
The same side of plate.
First light shield, the second light shield can penetrate the polarised light of different directions, and respectively correspond the different exposure of transparent substrate
Light region.At least two ways is realized for this, and a kind of polarised light being to provide different directions allows the polarised light of different directions to distinguish
Through the first light shield and the second light shield；Another kind is the effect that the first light shield and the second light shield can be attached to polarizer, light point
The polarised light in different polarization direction Tong Guo not be generated respectively after the first light shield and the second light shield.
Therefore, after through the first light shield, the second light shield, the different light in polarization direction is generated, these polarization directions are different
Light the different zones of transparent substrate can be exposed.
Due to not needing to separate twice using the first light shield, the second light shield, directly by the first light shield, the second light shield and thoroughly
Bright substrate is all fixed, generates the different light in polarization direction to the different zones of transparent substrate using the first light shield, the second light shield
It is exposed, in this way, exposure manufacture process technique can be simplified, shorten processing time, be improved production efficiency.
Wherein, step S101 can specifically include: transparent substrate is set between the first light shield, the second light shield, and three
Person is parallel to each other；Transparent substrate is set between the first light shield, the second light shield, that is to say and set the first light shield, the second light shield
It sets in the two sides of transparent substrate, in this way, condition can be provided to expose the different zones of transparent substrate simultaneously, thus
Further to shorten processing time, improves production efficiency and technique preparation is provided, and the first light shield, the second light shield is enabled to fix
Locational space it is more convenient.
At this point, step S102 can be specifically: the light generated using first light source is irradiated to transparent across the first light shield
On substrate；The light generated using second light source is passed through the second light shield and is irradiated on transparent substrate.
Wherein, the first light shield, the second light shield include transmission region and lightproof area, and the transparent area of the first light shield
Domain, lightproof area respectively correspond the lightproof area of the second light shield, transmission region.In other words, the transmission region of the first light shield,
It is lightproof area in second light shield；The lightproof area of first light shield is transmission region in the second light shield.
Wherein, step S101, which may also is that, is horizontally arranged the first light shield, the second light shield, transparent substrate；Or by the first light
Cover, the second light shield, transparent substrate are placed vertically.
If the first light shield, the second light shield are in the same side of transparent substrate, it to be by the first light respectively that there are two types of schemes
Cover, the second light shield, transparent substrate are horizontal positioned, and the first light shield, the second light shield are simultaneously in the top of transparent substrate or following；Or it will
First light shield, the second light shield, transparent substrate are placed vertically, and the first light shield, the second light shield are simultaneously on the left side or the right side of transparent substrate
Side.
If the first light shield, the second light shield are in the two sides of transparent substrate, also there are two types of scheme: be respectively by the first light shield,
Second light shield, transparent substrate are horizontal positioned, and the first light shield, the second light shield are respectively in the bottom and upper segment of transparent substrate；Or by
One light shield, the second light shield, transparent substrate are placed vertically, and the first light shield, the second light shield are respectively on the left side of transparent substrate and the right.
Wherein, step S102 can also include: be utilized respectively the first light shield, the second light shield generates the different light in polarization direction
Line is simultaneously exposed the different zones of transparent substrate.
That is, being produced when the different zones to transparent substrate are exposed using the first light shield, the second light shield
The different light in raw polarization direction exposes simultaneously, is conducive to shorten processing time in this way.
Wherein, step S102 can also include: be utilized respectively the first light shield, the second light shield generates the different light in polarization direction
Line is exposed the different zones of transparent substrate, and controls the luminous intensity of the different light in polarization direction, so that transparent base
The degree of the different zones exposure of plate is equal.
The two sides of transparent substrate or the different places of the same side, to the transmission situation of light there may be difference, in order to
So that the degree that the different zones of transparent substrate expose is equal, the luminous intensity of the light in different polarization direction can control, such as:
The region bad for translucency, can be with the luminous intensity of increasing light.
Wherein, step S102 can also include: be utilized respectively the first light shield, the second light shield generates the vertical light in polarization direction
Line is exposed the different zones of transparent substrate.In other words, after the first light shield, the second light shield, the polarised light of generation
Polarization direction be mutually perpendicular, in this way, available after overexposure, the vertical pattern in direction.
Wherein, the size of the different zones of transparent substrate is different.
Wherein, step S102 may include: be utilized respectively the first light shield, the second light shield generates the different light in polarization direction
The different zones of transparent substrate are exposed, realize light orientation.
Below by taking light orientation as an example, to illustrate the present processes.It is wherein, transparent substantially by taking glass substrate as an example,
Light source is by taking ultraviolet polarised light as an example.The first light shield and the second light shield are fixed respectively in the two sides of glass substrate, and are respectively configured partially
Shake the different ultraviolet polarized light source in direction.Specific embodiment is respectively as follows:
Scheme one: glass substrate is placed vertically, and transmission controls vertically the UV polarised light at left and right sides of glass substrate respectively
First light shield, the second light shield, while light orientation is carried out to the various sizes of region of glass substrate.Referring to fig. 2, Fig. 2 is glass base
Plate places the structural schematic diagram of one embodiment of time orientation vertically, be from left to right followed successively by UV polarized light source 1 (shown in arrow),
First light shield 2 (shadow region is lightproof area, is coated with light-proof material), (area A and the area B correspond to glass to glass substrate 3 respectively
The various sizes of region of glass substrate), the second light shield 4 (shadow region is lightproof area, is coated with light-proof material), UV polarised light
Source 5, wherein glass substrate 3 and the first light shield 2, the second light shield 4 can be fixed with fixture.
Scheme two: glass substrate is horizontal positioned, and the UV polarised light of two sides penetrates lower horizontal respectively above and below glass substrate
First light shield, the second light shield, while light orientation is carried out to the various sizes of region of glass substrate.It is glass base referring to Fig. 3, Fig. 3
Plate is horizontally arranged the structural schematic diagram of one embodiment of time orientation, is followed successively by UV polarized light source 10, the first light shield from top to bottom
20 (shadow region is lightproof area, is coated with light-proof material), (area A and the area B correspond to glass substrate to glass substrate 30 respectively
Various sizes of region), the second light shield 40 (shadow region is lightproof area, is coated with light-proof material), UV polarized light source 50,
Wherein glass substrate 30 and the first light shield 20, the second light shield 40 can be fixed with fixture.
By taking 8.5 generation line glass substrates (2.5m*2.2m) as an example, as shown in figure 4, a piece of 8.5 generation line glass substrate can be with
Two kinds of sizes of 8 43inch of mixed composition (area A in Fig. 4) and 8 22inch (area B in Fig. 4), mixed composition can allow glass
The utilization rate of glass substrate is higher.Fig. 5 be Fig. 4 glass substrate light process of alignment in need using two light shields arrived, wherein yin
Shadow zone domain is lightproof area to cover the region for not needing irradiation, and arrow indicates the polarization direction of ultraviolet polarised light, to meet not
With the light orientation demand in region.Fig. 6 is plane conversion (In-Plane Switching, write a Chinese character in simplified form IPS)/fringing field in the prior art
Switching (Fringe Field Switching, write a Chinese character in simplified form FFS) panel tradition, illumination glass substrate 300 carries out light orientation twice
The schematic diagram of (Photo Alignment) needs to block the area B with the first light shield 200, then with ultraviolet in first time illumination
Polarised light 100 carries out light orientation to the area A, similarly in second of illumination, blocks the area A with the second light shield 400, then with ultraviolet polarization
Light 500 completes light orientation to the area B, this when is the light process of alignment for completing the area entire glass substrate 300A and the area B.
The application can be by the scheme of Fig. 2 or Fig. 3, and the light that the area entire glass substrate A and the area B disposably can be completed is matched
To process.Can be completed in a During Illumination while the light orientation to entire glass substrate, and without change processing procedure or
The new light shield of person, greatly promotes production efficiency.In view of array substrate (such as thin film transistor (TFT) (Thin Film
Transistor writes a Chinese character in simplified form TFT) substrate) or the substrate two sides colored filter (Color Filter, write a Chinese character in simplified form CF) uv transmittance
May be different, the luminous intensity of the ultraviolet light on the outside of TFT or CF substrate can be increased, suitably to guarantee to be irradiated in light process of alignment
Ultraviolet ray intensity on alignment film is equal, improves the homogeneity of processing procedure.
Generally speaking, the application can be improved production efficiency, reduce liquid crystal display panel while ensuring light orientation effect
Manufacture craft and production cost.
Mode the above is only the implementation of the present invention is not intended to limit the scope of the invention, all to utilize this
Equivalent structure or equivalent flow shift made by description of the invention and accompanying drawing content, it is relevant to be applied directly or indirectly in other
Technical field is included within the scope of the present invention.
Claims (7)
1. the method that a kind of pair of transparent substrate is exposed characterized by comprising
The relative position of first light shield, the second light shield and the transparent substrate is fixed；
Using first light shield, the second light shield generate the different light in polarization direction to the different zones of the transparent substrate into
Row exposure；
The relative position fixation by the first light shield, the second light shield and the transparent substrate includes:
The transparent substrate is set between first light shield, the second light shield, and three is parallel to each other；
It is described to generate the different light in polarization direction to the not same district of the transparent substrate using first light shield, the second light shield
Domain, which is exposed, includes:
The light generated using first light source is passed through first light shield and is irradiated on the transparent substrate；It is produced using second light source
Raw light passes through second light shield and is irradiated on the transparent substrate；
First light shield, the second light shield include transmission region and lightproof area, and the transmission region of first light shield,
Lightproof area respectively corresponds lightproof area, the transmission region of second light shield.
2. the method according to claim 1, wherein
The relative position fixation by the first light shield, the second light shield and the transparent substrate includes:
First light shield, the second light shield, transparent substrate are horizontally arranged；Or
First light shield, the second light shield, transparent substrate are placed vertically.
3. the method according to claim 1, wherein
It is described to generate the different light in polarization direction to the not same district of the transparent substrate using first light shield, the second light shield
Domain, which is exposed, includes:
The different light in polarization direction is generated simultaneously to the not same district of the transparent substrate using first light shield, the second light shield
Domain is exposed.
4. the method according to claim 1, wherein described generated partially using first light shield, the second light shield
The step of different light in vibration direction is exposed the different zones of the transparent substrate, comprising:
Using first light shield, the second light shield generate the different light in polarization direction to the different zones of the transparent substrate into
Row exposure, and the luminous intensity of the different light in the polarization direction is controlled, so that the different zones of the transparent substrate expose
Degree it is equal.
5. the method according to claim 1, wherein described generated partially using first light shield, the second light shield
The step of different light in vibration direction is exposed the different zones of the transparent substrate, comprising: utilization first light shield,
Second light shield generates the vertical light in polarization direction and is exposed to the different zones of the transparent substrate.
6. the method according to claim 1, wherein the size of the different zones of the transparent substrate is different.
7. the method according to claim 1, wherein described generated partially using first light shield, the second light shield
The different light in vibration direction, which is exposed the different zones of the transparent substrate, includes:
Using first light shield, the second light shield generate the different light in polarization direction to the different zones of the transparent substrate into
Row exposure, realizes light orientation.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610399140.XA CN105892156B (en) | 2016-06-07 | 2016-06-07 | The method that transparent substrate is exposed |
| PCT/CN2016/086809 WO2017210924A1 (en) | 2016-06-07 | 2016-06-23 | Method for exposing transparent substrate |
| US15/110,067 US10527947B2 (en) | 2016-06-07 | 2016-06-23 | Method for exposing transparent substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610399140.XA CN105892156B (en) | 2016-06-07 | 2016-06-07 | The method that transparent substrate is exposed |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105892156A CN105892156A (en) | 2016-08-24 |
| CN105892156B true CN105892156B (en) | 2019-05-03 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610399140.XA Active CN105892156B (en) | 2016-06-07 | 2016-06-07 | The method that transparent substrate is exposed |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10527947B2 (en) |
| CN (1) | CN105892156B (en) |
| WO (1) | WO2017210924A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106842813A (en) * | 2016-12-29 | 2017-06-13 | 深圳市华星光电技术有限公司 | A kind of mask and the equipment comprising the mask |
| CN109991817A (en) * | 2017-12-29 | 2019-07-09 | 上海视涯信息科技有限公司 | A kind of light shield of silicon substrate display panel and forming method thereof and its exposure technology |
| CN110858042B (en) * | 2018-08-24 | 2021-04-16 | 上海微电子装备（集团）股份有限公司 | Optical alignment device and liquid crystal display device |
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Also Published As
| Publication number | Publication date |
|---|---|
| US20190204754A1 (en) | 2019-07-04 |
| CN105892156A (en) | 2016-08-24 |
| US10527947B2 (en) | 2020-01-07 |
| WO2017210924A1 (en) | 2017-12-14 |
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