CN105859507B - 有机光电材料及其用途 - Google Patents
有机光电材料及其用途 Download PDFInfo
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- CN105859507B CN105859507B CN201610079365.7A CN201610079365A CN105859507B CN 105859507 B CN105859507 B CN 105859507B CN 201610079365 A CN201610079365 A CN 201610079365A CN 105859507 B CN105859507 B CN 105859507B
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- thin film
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- 239000000463 material Substances 0.000 title claims abstract description 95
- 150000001875 compounds Chemical class 0.000 claims abstract description 35
- 239000010409 thin film Substances 0.000 claims abstract description 30
- 238000013086 organic photovoltaic Methods 0.000 claims abstract description 12
- 230000005284 excitation Effects 0.000 claims abstract description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 29
- 239000004065 semiconductor Substances 0.000 claims description 21
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 239000010408 film Substances 0.000 claims description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 14
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 13
- 239000000126 substance Substances 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims 1
- 239000002305 electric material Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 113
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 29
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- 125000003118 aryl group Chemical group 0.000 description 13
- 125000001072 heteroaryl group Chemical group 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 12
- 229910052736 halogen Inorganic materials 0.000 description 12
- 150000002367 halogens Chemical class 0.000 description 12
- 239000012043 crude product Substances 0.000 description 11
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 11
- 230000005525 hole transport Effects 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 150000001721 carbon Chemical group 0.000 description 9
- 125000003983 fluorenyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 9
- 239000012044 organic layer Substances 0.000 description 9
- 230000027756 respiratory electron transport chain Effects 0.000 description 9
- 235000012239 silicon dioxide Nutrition 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- 239000010453 quartz Substances 0.000 description 8
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- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000005160 1H NMR spectroscopy Methods 0.000 description 6
- -1 5-octylbiphenyl-2-yl Chemical group 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000004305 biphenyl Substances 0.000 description 6
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- 238000007796 conventional method Methods 0.000 description 6
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- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
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- 150000002475 indoles Chemical class 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- 125000005605 benzo group Chemical group 0.000 description 4
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- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
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- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
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- 238000000576 coating method Methods 0.000 description 3
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- 238000010586 diagram Methods 0.000 description 3
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910000029 sodium carbonate Inorganic materials 0.000 description 3
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 238000010189 synthetic method Methods 0.000 description 3
- HYCYKHYFIWHGEX-UHFFFAOYSA-N (2-phenylphenyl)boronic acid Chemical compound OB(O)C1=CC=CC=C1C1=CC=CC=C1 HYCYKHYFIWHGEX-UHFFFAOYSA-N 0.000 description 2
- XRDQOEYGTXLTLK-UHFFFAOYSA-N 1-octyl-2-phenylbenzene Chemical group CCCCCCCCC1=CC=CC=C1C1=CC=CC=C1 XRDQOEYGTXLTLK-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 125000006269 biphenyl-2-yl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C(*)C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- DKHNGUNXLDCATP-UHFFFAOYSA-N dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile Chemical compound C12=NC(C#N)=C(C#N)N=C2C2=NC(C#N)=C(C#N)N=C2C2=C1N=C(C#N)C(C#N)=N2 DKHNGUNXLDCATP-UHFFFAOYSA-N 0.000 description 2
- 239000000284 extract Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000002309 gasification Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- QNXSIUBBGPHDDE-UHFFFAOYSA-N indan-1-one Chemical compound C1=CC=C2C(=O)CCC2=C1 QNXSIUBBGPHDDE-UHFFFAOYSA-N 0.000 description 2
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 2
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- XSCHRSMBECNVNS-UHFFFAOYSA-N quinoxaline Chemical compound N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- PMJMHCXAGMRGBZ-UHFFFAOYSA-N subphthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(=N3)N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C3=N1 PMJMHCXAGMRGBZ-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- DXJPAROGPFPUHR-UHFFFAOYSA-N (2-phenylphenyl)boronic acid Chemical compound OB(O)c1ccccc1-c1ccccc1.OB(O)c1ccccc1-c1ccccc1 DXJPAROGPFPUHR-UHFFFAOYSA-N 0.000 description 1
- MICMHFIQSAMEJG-UHFFFAOYSA-N 1-bromopyrrolidine-2,5-dione Chemical compound BrN1C(=O)CCC1=O.BrN1C(=O)CCC1=O MICMHFIQSAMEJG-UHFFFAOYSA-N 0.000 description 1
- JAFIWAUYENFTET-UHFFFAOYSA-N 1-octyl-3-phenylbenzene Chemical group CCCCCCCCC1=CC=CC(C=2C=CC=CC=2)=C1 JAFIWAUYENFTET-UHFFFAOYSA-N 0.000 description 1
- STTGYIUESPWXOW-UHFFFAOYSA-N 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline Chemical compound C=12C=CC3=C(C=4C=CC=CC=4)C=C(C)N=C3C2=NC(C)=CC=1C1=CC=CC=C1 STTGYIUESPWXOW-UHFFFAOYSA-N 0.000 description 1
- RLPAWKJLZUFLCR-UHFFFAOYSA-N 4-(4-aminophenyl)-3-naphthalen-1-yl-n,n-diphenylaniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N(C=2C=CC=CC=2)C=2C=CC=CC=2)C=C1C1=CC=CC2=CC=CC=C12 RLPAWKJLZUFLCR-UHFFFAOYSA-N 0.000 description 1
- AJHRPJXKLDJNHT-UHFFFAOYSA-N 5,14,23-tribromo-9,9,18,18,27,27-hexamethylheptacyclo[18.7.0.02,10.03,8.011,19.012,17.021,26]heptacosa-1(20),2(10),3(8),4,6,11(19),12(17),13,15,21(26),22,24-dodecaene Chemical compound CC1(C)C2=C(C=C(Br)C=C2)C2=C3C(C4=C(C=CC(Br)=C4)C3(C)C)=C3C(C4=C(C=CC(Br)=C4)C3(C)C)=C12 AJHRPJXKLDJNHT-UHFFFAOYSA-N 0.000 description 1
- IZSZGRWXUIXAQK-UHFFFAOYSA-N 5,5,10,10,15,15-hexamethyl-10,15-dihydro-5h-diindeno[1,2-a:1',2'-c]fluorene Chemical compound C12=CC=CC=C2C(C)(C)C2=C1C(C(C)(C)C1=CC=CC=C11)=C1C1=C2C2=CC=CC=C2C1(C)C IZSZGRWXUIXAQK-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- SLUCIZWTWREKRZ-UHFFFAOYSA-N C(CCCCCCC)C=1C=CC(=C(C1)C1=CC=CC=C1)B(O)O.B(O)(O)O Chemical group C(CCCCCCC)C=1C=CC(=C(C1)C1=CC=CC=C1)B(O)O.B(O)(O)O SLUCIZWTWREKRZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- SLGBZMMZGDRARJ-UHFFFAOYSA-N Triphenylene Natural products C1=CC=C2C3=CC=CC=C3C3=CC=CC=C3C2=C1 SLGBZMMZGDRARJ-UHFFFAOYSA-N 0.000 description 1
- GZZMEFFUSRGCNW-UHFFFAOYSA-N [Br].[Br] Chemical compound [Br].[Br] GZZMEFFUSRGCNW-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 125000003963 dichloro group Chemical group Cl* 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000001194 electroluminescence spectrum Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- KDKYADYSIPSCCQ-UHFFFAOYSA-N ethyl acetylene Natural products CCC#C KDKYADYSIPSCCQ-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 125000003454 indenyl group Chemical class C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- ZKYQRJXGGLVQML-UHFFFAOYSA-N iridium(3+);2-phenylpyridine Chemical compound [Ir+3].C1=CC=CC=C1C1=CC=CC=N1 ZKYQRJXGGLVQML-UHFFFAOYSA-N 0.000 description 1
- NSABRUJKERBGOU-UHFFFAOYSA-N iridium(3+);2-phenylpyridine Chemical compound [Ir+3].[C-]1=CC=CC=C1C1=CC=CC=N1.[C-]1=CC=CC=C1C1=CC=CC=N1.[C-]1=CC=CC=C1C1=CC=CC=N1 NSABRUJKERBGOU-UHFFFAOYSA-N 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000001840 matrix-assisted laser desorption--ionisation time-of-flight mass spectrometry Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- COTNUBDHGSIOTA-UHFFFAOYSA-N meoh methanol Chemical compound OC.OC COTNUBDHGSIOTA-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- KIOCVGZCTSCENI-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O.C[N+]([O-])=O KIOCVGZCTSCENI-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- JQQSUOJIMKJQHS-UHFFFAOYSA-N pentaphene Chemical compound C1=CC=C2C=C3C4=CC5=CC=CC=C5C=C4C=CC3=CC2=C1 JQQSUOJIMKJQHS-UHFFFAOYSA-N 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000035935 pregnancy Effects 0.000 description 1
- 150000003216 pyrazines Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- FMZQNTNMBORAJM-UHFFFAOYSA-N tri(propan-2-yl)-[2-[13-[2-tri(propan-2-yl)silylethynyl]pentacen-6-yl]ethynyl]silane Chemical compound C1=CC=C2C=C3C(C#C[Si](C(C)C)(C(C)C)C(C)C)=C(C=C4C(C=CC=C4)=C4)C4=C(C#C[Si](C(C)C)(C(C)C)C(C)C)C3=CC2=C1 FMZQNTNMBORAJM-UHFFFAOYSA-N 0.000 description 1
- ZGYICYBLPGRURT-UHFFFAOYSA-N tri(propan-2-yl)silicon Chemical compound CC(C)[Si](C(C)C)C(C)C ZGYICYBLPGRURT-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
Classifications
-
- H—ELECTRICITY
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Abstract
本发明涉及一种有机光电材料以及使用其的有机电激发光装置(本发明称之为有机EL)、有机光伏装置(本发明称之为OPV)及有机薄膜晶体管(本发明称之为OTFT)装置。更具体而言,本发明关于一种具有式(1)化合物的有机光电材料,以及一种有机电激发光装置、一种有机光伏装置与一种有机薄膜晶体管装置。前述装置采用此有机光电材料,能够增加效能。
Description
技术领域
本发明涉及一种用于有机光电材料以及使用此材料的有机电激发光(organicelectroluminescent,organic EL)装置、有机光伏(organic photovoltaic,OPV)装置以及有机薄膜晶体管(organic thin-film transistor,OTFT)装置。更具体而言,本发明是关于一种具有式(1)所示的化合物的有机光电材料以及使用此材料的有机EL装置、OPV装置或OTFT装置,并且这些装置得以增加效能。
背景技术
有机光电材料已开发数十年。近期,有机光电材料广泛用于有机光电装置中,诸如有机EL装置、OPV装置及OTFT装置,且由于其对平板及可挠性显示器、固态发光、太阳能储存等潜在应用而在工业实践使用上吸引了显著关注。有机电激发光(有机EL)是一种发光二极管(LED),其中发光层是由有机化合物制成的膜,其可在相对应的电流下发出光线,发光层夹设于两个电极之间。有机EL装置具有诸如自发光、宽视角、反应速度快及高亮度的许多优点,其制造方式亦较简单且能够提供与LCD相当的清晰显示,使得有机EL装置成为工业用显示器的选择之一,且已步入商业化。有机光伏(OPV)装置包括基板、第一电极、第二电极与光电转换层。第一电极沉积于基板上,第二电极沉积于第一电极上,光电转换层沉积于第一电极与第二电极之间,这类装置通过吸收光线而产生电荷。OPV因为其低成本、制备简单及大面积能力,而被视为绿色能源技术呈现高度成长趋势。OPV的转化效率已达到实际应用。有机薄膜晶体管(OTFT)装置包括具有绝缘面的基板、至少一闸极(gate electrode)、形成并接触于闸极的闸绝缘膜(gate insulating film)、形成并接触于闸绝缘膜的有机半导体薄膜(organic semiconductor film)、形成并接触于有机半导体薄膜的一对源汲极(source-drain electrode),载子产生电极(carrier generating electrode)设置于有机半导体薄膜内,并且可对应闸极信号(gate signal)而注入载子。由于OTFT亦具有低成本、可挠性、低温加工及大面积能力的优点,其已成为有机电子领域中的热门显学。且其效能已经与非晶硅的薄膜晶体管的效能相当。
然而,有机光电装置中仍有许多技术问题尚未解决,诸如材料不稳定、低功率效率(power efficiency)、短半衰期时间等,阻碍了有机光电装置商业化的进程。
因此,在有机光电装置中,对于具有良好热稳定性、效率佳以及长半衰期时间的有机光电材料的需求是持续存在的。
发明内容
本发明提供一种用有机光电材料,其可应用于有机EL装置、OPV装置及/或OTFT装置。此材料可克服现有技术如美国专利公开案第20140131664号、美国专利公开案第20140175384号、美国专利公开案第20140209866号、日本专利公开案第2012191017号、美国专利案第8,232,546号及德国专利公开案第102011089351号中的缺失,例如:热稳定性低、半衰期时间短与高功率消耗。
本发明的目的在于,提供一种化合物,其可应用于有机EL装置中的电子阻挡材料(electron blocking material)、发光主体材料(emitting host material)、电洞阻挡材料(hole blocking material)及/或电子传输材料(electron transporting material)。
本发明的目的还在于,提供一种化合物,其可应用于OPV装置中的电洞传输材料(hole transporting material)及/或主动层材料(active layer material)。
本发明的目的还在于,提供一种化合物,其可用应于OTFT装置中的有机半导体层材料(organic semiconductor material)。
本发明在工业实践上具有经济优势。依据本发明,提供一种用于有机EL装置、OPV装置及/或OTFT装置的有机光电材料。前述有机光电材料包括具有下式(1)所示结构的化合物:
其中式(1)中,X独立地表示选自于由O、S、C(R4)(R5)及N(R6)所组成的群组中的原子或基团所构成的二价桥,且R4至R6各自分别为取代基;m、n及p各自分别表示0至10的整数;R1至R3独立地表示选自于由氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基(alkyl)、具有6至50个碳原子的经取代或未经取代的芳基(aryl)、具有6至50个碳原子的经取代或未经取代的芳烷基(aralkyl)、以及具有3至50个碳原子的经取代或未经取代的杂芳基(heteroaryl)所组成的群组。较佳地,R4至R6可各自分别为氢原子、卤素、烷基、芳基、芳烷基或杂芳基或其它可替代的基团;更佳地,R4至R6可各自分别为氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基、以及具有3至50个碳原子的经取代或未经取代的杂芳基。
本发明还提供一种有机EL装置,其包括一对由阳极及阴极所组成的电极及一个或多个有机薄膜层,有机薄膜层设置于电极之间且包括前述具式(1)化合物的有机光电材料。较佳地,前述一个或多个有机薄膜层中的其中至少一层为发光层,且前述具式(1)化合物的有机光电材料可用作为发光层的主体材料。
本发明还提供一种OPV装置,其包括一对由阳极或阴极所组成的电极、主动层(active layer)以及一个或多个有机薄膜层,主动层以及有机薄膜层设置于电极之间,且主动层或有机薄膜层包括前述具式(1)化合物的有机光电材料。较佳地,此有机光电材料可为主动层的施体(doner),或者可为有机薄膜层的电洞传输材料(hole transportmaterial)。
本发明还提供一种OTFT装置,其包括源汲极、闸极以及有机半导体层以及绝缘层,有机半导体层及绝缘层分别设置于源汲极与门极之间,且有机半导体层包括前述具式(1)化合物的有机光电材料。
附图说明
图1为本发明的有机EL装置的实施例的示意图。
图2为本发明的OPV装置的实施例的示意图。
图3为本发明的有机EL装置的实施例的示意图。
主要附图标号说明:
6透明电极 6a透明电极
6b基材 7电洞注入层
7a电洞注入层 7b闸极
8电洞传输层 8a电洞传输层
8b绝缘层 9发光层
9a主动层 9b有机半导体层
10电洞阻挡层 10a电子传输层
10b源汲极 11电子传输层
11a电子注入层 12电子注入层
12a金属电极 13金属电极
具体实施方式
本发明欲探究前述的有机光电材料以及使用前述的有机光电材料的装置。在下文中将提供生产、结构以及要素的详细描述以使本发明可充分地被理解。显然本发明的应用并不限于本领域技术人员所熟悉的特定细节。另一方面,普遍周知的常见元素和过程并未详细描述于本发明中,且不应对本发明产生不必要的限制。下文是更详细地描述本发明的一些较佳实施例。但是,应认知的是,本发明可以在除明确描述的实施例之外的广泛多种其它实施例中实践,即,本发明还可以广泛应用于其它实施例,并不受本发明的范围的明确限制。
本发明涉及一种有机光电材料,其可用于有机EL装置、OPV装置及/或OTFT装置中。在一较佳实施例中,前述有机光电材料包括具有下式(1)所示结构的化合物:
其中式(1)中,X独立地表示选自于由O、S、C(R4)(R5)及N(R6)所组成的群组中的原子或基团所构成的二价桥,且R4至R6各自分别为取代基;m、n及p各自分别表示0至10的整数;R1至R3独立地表示选自于由氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基以及具有3至50个碳原子的经取代或未经取代的杂芳基所组成的群组。在一较佳实施例中,R4至R6可各自分别为氢原子、卤素、烷基、芳基、芳烷基或杂芳基或其他可替代的基团;在一更佳实施例中,R4至R6可各自分别为氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基、以及具有3至50个碳原子的经取代或未经取代的杂芳基。
在一较佳实施例中,前述包括式(1)所示的化合物的有机光电材料,可用于有机EL装置中,且该化合物可进一步具有由下列式(2)所示的结构:
其中,R1至R3独立地表示选自于由氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基以及具有3至50个碳原子的经取代或未经取代的杂芳基所组成的群组。
在一较佳实施例中,前述包括式(1)所示的化合物的有机光电材料,可用于OPV装置中,且该化合物可进一步具有由下列式(3)所示的结构:
其中,R1至R3以及R6独立地表示选自于由氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基以及具有3至50个碳原子的经取代或未经取代的杂芳基所组成的群组。
在一较佳实施例中,前述包括式(1)所示的化合物的有机光电材料,可用于OTFT装置中,且该化合物可进一步具有由下列式(4)所示的结构:
其中,R1至R3独立地表示选自于由氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基以及具有3至50个碳原子的经取代或未经取代的杂芳基所组成的群组。
在一较佳实施例中,前述有机光电材料实质上可由式(1)至式(4)中的其中一种或多种所组成。
在一些更佳的实施例中,依据前述式(2)至(4)所示的化合物,该化合物可进一步选自于下列通式所组成的群组:
另一方面,本发明涉及一种有机电激发光装置,其可包括一对由阴极和阳极所组成的电极,且在此对电极之间设置有至少一发光层以及一个或多个有机薄膜层,其中发光层以及/或有机薄膜层包括前述具式(1)化合物的有机光电材料。请参阅图1所示,于一较佳实施例中,此种有机电激发光装置可包括透明电极6、电洞注入层7、电洞传输层8、发光层9、电洞阻挡层10、电子传输层11、电子注入层12以及金属电极13。在此装置中,电洞注入层7设置于透明电极6与金属电极13之间,电洞传输层8设置于电洞注入层7与金属电极13之间,发光层9设置于电洞传输层8与金属电极13之间,电洞阻挡层10设置于发光层9与金属电极13之间,电子传输层11设置于电洞阻挡层10与金属电极13之间,以及电子注入层12设置于电子传输层11与金属电极13之间。此外,在一较佳实施例中,发光层9可发出磷光、荧光,或其它可经有机材料电性激发产生的光线;更佳地,发光层9可发出磷光或荧光;又更佳地,发光层9可发出磷光。
再一方面,本发明涉及一种有机光伏装置,其可包括一对由阴极和阳极所组成的电极,且在此对电极之间设置有主动层以及一个或多个有机薄膜层,其中发光层以及/或有机薄膜层包括前述具式(1)化合物的有机光电材料。请参阅图2所示,于一较佳实施例中,此种有机光伏装置可包括透明电极6a、电洞注入层7a、电洞传输层8a、主动层9a、电子传输层10a、电子注入层11a以及金属电极12a。在此装置中,电洞注入层7a设置于透明电极6a与金属电极12a之间,电洞传输层8a设置于电洞注入层7a与金属电极12a之间,主动层9a设置于电洞传输层8a与金属电极12a之间,电子传输层10a设置于主动层9a与金属电极12a之间,电子传输层10a设置于主动层9a与金属电极12a之间,以及电子注入层11a设置于电子传输层10a与金属电极12a之间。此外,主动层9a包括施体(donor)及受体(acceptor)。在一较佳实施例中,前述具式(1)化合物的有机光电材料可作为主动层9a的施体;在另一较佳实施例中,前述具式(1)化合物的有机光电材料亦可作为电洞传输层8a的材料。
另一方面,本发明涉及一种有机薄膜晶体管装置,其可包括一组源汲极及闸极,且在源汲极与闸极之间设置有有机半导体层以及绝缘层,其中有机半导体层包括前述具式(1)化合物的有机光电材料。请参阅图3所示,于一较佳实施例中,此种有机薄膜晶体管装置可包括基材6b、闸极7b、绝缘层8b、有机半导体层9b及一组源汲极10b。在此装置中,闸极7b设置于基材6b与源汲极10b之间,绝缘层8b设置于闸极7b与源汲极10b之间,有机半导体层9b设置于绝缘层8b与源汲极10b之间。
以下通过示例性实施例阐明本发明中有机光电材料的详细制备,但本发明不限于该等示例性实施例。实施例1至3是本发明中有机光电材料的一些实施例的制备。实施例4至6展示有机EL装置、OPV装置及OTFT装置的制造和特性。
实施例1:化合物Ex2的合成
合成5,5,10,10,15,15-六甲基-10,15二氢-5H-二茚并[1,2-a:1',2'-C]芴(5,5,10,10,15,15-hexamethyl-10,15-dihydro-5H-diindeno[1,2-a:1',2'-c]fluorene)
在冰浴中,将150ml无水醋酸(AcOH)缓慢地滴加于28.7g(21.7mmol)的1-茚酮(1-indanone)及78ml浓盐酸(conc.HCl)的混合物中,随后反应回流过夜。将反应完成后的混合物冷却至室温并且过滤后,得到粗产物。将粗产物依序用水、丙酮、二氯甲烷(dichloromethane,DCM)清洗后,得到22.2g(15.6mmol)呈白色固体状的产物,产率为72%。1HNMR(CDCl3,400MHz):化学位移(ppm)7.96(d,3H),7.70(d,3H),7.51(t,3H),7.41(t,3H),4.28(s,6H)。
合成3,8,13-三溴-5,5,10,10,15,15-六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2'-c]芴(3,8,13-tribromo-5,5,10,10,15,15-hexamethyl-10,15-dihydro-5H-diindeno[1,2-a:1',2'-c]fluorene)
在冰浴中,将3.92g(24.5mmol)的溴(bromine)缓慢地滴加于3g(7.0mmol)的5,5,10,10,15,15-六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2'-C]芴及150ml二氯甲烷的混合物中,随后在室温搅拌12小时进行反应。将反应完成后的混合物冷却至室温,再利用二氯甲烷和水萃取出有机层,并且将萃取出的有机层用亚硫酸钠(sodium sulfite)清洗、用无水硫酸镁(anhydrous magnesium sulfate)进行干燥以去除溶剂,形成残余物。利用四氢呋喃(tetrahydrofuran,THF)进行再结晶,得到3.0g(4.6mmol)的粗产物,产率为66%。1HNMR(CDCl3,400MHz):化学位移(ppm)8.10(d,3H),7.64(d,3H),7.52(dd,3H),1.81(s,18H)。
合成3,8,13-三(联苯-2-基)-5,5,10,10,15,15-六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2-c]芴(3,8,13-tri(biphenyl-2-yl)-5,5,10,10,15,15-hexamethyl-10,15-dihydro-5H-diindeno[1,2-a:1',2'-c]fluorene)
将2g(3.0mmol)的3,8,13-三溴-5,5,10,10,15,15-六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2'-c]芴、2.67g(13.5mmol)联苯-2-基硼酸(biphenyl-2-ylboronic acid)、0.03g(0.03mmol)四(三苯基膦)钯(Pd(PPh3)4)、7.5ml 2M碳酸钠(Na2CO3)水溶液、13ml乙醇(EtOH)以及40ml甲苯(toluene)的混合物经过脱气处理并且放置在氮气下,随后在100℃下加热12小时进行反应。将反应完成后的混合物冷却至室温,再利用二氯甲烷和水萃取出有机层,并且将萃取出的有机层用无水硫酸镁进行干燥以去除溶剂,形成残余物。通过以硅胶填充的层析管柱来纯化残余物,得到2.21g(2.06mmol)呈白色固体状的产物,产率为55%。1HNMR(CDCl3,400MHz):化学位移(ppm)8.15(d,3H),7.85~7.65(m,15H),7.52~7.24(m,15H),1.81(s,18H)。MS(m/z,FD+):882.7。
合成化合物Ex2
在经过脱气及填充氮气的100ml三颈烧瓶中,1g(1.13mmol)3,8,13-三(联苯-2-基)-5,5,10,10,15,15-六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2-c]芴溶解于无水二氯甲烷(22.5ml)中,随后将1.83g(11.3mmol)氯化铁(III)(iron(III)chloride)及2.23ml的硝基甲烷(nitromethane)滴加于其中以形成混合物,再将混合物搅拌进行反应,直到起始原料消失。利用30ml甲醇(methanol)使反应骤冷(quench),并且进行过滤以获得粗产物,通过以硅胶填充的层析管柱来纯化粗产物,之后再利用二氯甲烷/己烷混合溶液,对纯化后的粗产物进行再结晶二次,得到0.34g(0.39mmol)白色固体状产物(即Ex2),产率为35%。1HNMR(CDCl3,400MHz):化学位移(ppm)9.11(s,3H),8.86~8.91(m,6H),8.83(s,3H),8.80(d,3H),8.66(d,3H),7.85~7.45(m,12H),1.81(s,18H)。MS(m/z,FD+):877.1。
实施例2:化合物Ex14的合成
合成5,10,15-三芐-3,8,13-三溴-10,15-二氢-5H-二吲哚并[3,2-a:3',2'-c]咔唑(5,10,15-tribenzyl-3,8,13-tribromo-10,15-dihydro-5H-diindolo[3,2-a:3',2'-c]carbazole)
在避光环境下,将2.86g(16.09mmol)的N-溴代琥珀酰亚胺(N-Bromosuccinimide)添加于3g(4.87mmol)的5,10,15-三芐-10,15-二氢-5H-二吲哚并[3,2-a:3',2'-c]咔唑(5,10,15-tribenzyl-10,15-dihydro-5H-diindolo[3,2-a:3',2'-c]carbazole)(J.Mater.Chem.A,2013,1,4077)以及300ml二甲基甲酰胺(Dimethylformamide,DMF)的混合物中,而后缓慢加热至60℃后维持12小时进行反应。将反应完成后的混合物冷却至室温,再倒入冰水中,进行过滤以得到3.2g(3.79mmol)的浅棕色粗产物,产率78%。所得的粗产物可以不用经过纯化,直接进入下一合成步骤。1HNMR(CDCl3,400MHz):化学位移(ppm)8.02(m,3H),7.76(s,3H),7.47~7.11(m,15H),6.01(s,6H)。
合成5,10,15-三芐-3,8,13-三(联苯-2-基)-10,15-二氢-5H-二吲哚并[3,2-a:3',2'-c]咔唑(5,10,15-tribenzyl-3,8,13-tri(biphenyl-2-yl)-10,15-dihydro-5H-diindolo[3,2-a:3',2'-c]carbazole)
将3.2g(3.75mmol)的5,10,15-三芐-3,8,13-三溴-10,15-二氢-5H-二吲哚并[3,2-a:3',2'-c]咔唑、3.34g(16.90mmol)的联苯-2-基硼酸、0.04g(0.01mmol)的四(三苯基膦)钯、9.3ml的2M碳酸钠水溶液、15ml的乙醇以及45ml甲苯的混合物经过脱气处理并且放置在氮气下,随后在100℃下加热12小时进行反应。将反应完成后的混合物冷却至室温,再利用二氯甲烷及水萃出有机层,并且将萃取出的有机层用无水硫酸镁进行干燥以去除溶剂,形成残余物。通过以硅胶填充的层析管柱来纯化残余物,得到2.21g(2.06mmol)呈白色固体状的产物,产率为55%。MS(m/z,MALDI-TOF):1071.2。
合成化合物Ex14
在经过脱气及填充氮气的100ml三颈烧瓶中,将1g(0.93mmol)的5,10,15-三芐-3,8,13-三(联苯-2-基)-10,15-二氢-5H-二吲哚并[3,2-a:3',2'-c]咔唑溶解于无水二氯甲烷(18.6ml)中,随后在冰浴中将1.50g(9.3mmol)的氯化铁(III)以及1.84ml的硝基甲烷滴加于其中以形成混合物,再将混合物搅拌进行反应,直到起始原料消失。利用30ml甲醇(methanol)使反应骤冷(quench),并且进行过滤以获得粗产物,通过以硅胶填充的层析管柱来纯化粗产物,之后再利用二氯甲烷/己烷混合溶液,对纯化后的粗产物进行再结晶二次,得到0.21g(0.20mmol)的米白色固体状产物(即Ex14),产率为22%。1HNMR(CDCl3,400MHz):化学位移(ppm)9.08(s,3H),8.53~8.46(m,6H),8.34(s,3H),8.34(dd,3H),7.99(dd,3H),7.83(m,3H),7.61~7.29(m,24H),6.22(s,6H)。MS(m/z,FD+):1066.1。
实施例3:化合物Ex18的合成
合成2,7,12-三溴-苯并[1,2-b:3,4-b':5,6-b”]三[l]苯并噻吩(2,7,12-tribromo-benzo[1,2-b:3,4-b':5,6-b”]tris[l]benzothiophene)
除了以苯并[1,2-b:3,4-b':5,6-b”]三[l]苯并噻吩(Benzo[1,2-b:3,4-b':5,6-b”]tris[1]benzothiophene)(参照期刊论文:Tetrahedron,42(2),763-73;1986所制备而得)取代5,5,10,10,15,15-六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2'-c]芴,其余步骤皆与实施例1所述的合成方法相同以获得产物,产率52%。MS(m/z,FD+):629.9。
合成2,7,12-三(辛基联苯-2-基)-苯并[1,2-b:3,4-b':5,6-b”]三[l]苯并噻吩(2,7,12-tri(5-octylbiphenyl-2-yl)-benzo[1,2-b:3,4-b':5,6-b”]tris[l]benzothio-phene)
除了以2,7,12-三溴-苯并[1,2-b:3,4-b':5,6-b”]三[l]苯并噻吩(2,7,12-tribromo-benzo[1,2-b:3,4-b':5,6-b”]tris[1]benzothiophene)取代3,8,13-三溴-5,5,10,10,15,15六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2'-c]芴,并且以5-辛基联苯-2-基硼酸(5-octylbiphenyl-2-ylboronic acid)取代联苯-2-基硼酸,其余步骤皆与实施例1所述的合成方法相同以获得产物,产率58%。MS(m/z,FD+):1190.2。
合成化合物Ex18
除了以2,7,12-三(辛基联苯-2-基)-苯并[1,2-b:3,4-b':5,6-b”]三[1]苯并噻吩取代3,8,13-三(联苯-2-基)-5,5,10,10,15,15-六甲基-10,15-二氢-5H-二茚并[1,2-a:1',2'-c]芴,其余步骤皆与实施例2所述的合成方法相同以获得化合物Ex18,产率24%。MS(m/z,FD+):1182.9。
产生有机EL装置的一般方法
依据本发明,提供一种经铟锡氧化物(indium tinoxide,ITO)涂布的玻璃(下文ITO基材),其电阻为9欧姆/平方(ohm/square)至12欧姆/平方且厚度为120nm到160nm,并且在超声波浴中利用多个清洁步骤(例如:清洁剂、去离子水)进行清洁。在进行有机层的气相沉积过程之前,通过UV和臭氧进一步处理经清洁后的ITO基材。用于ITO基材的所有前处理过程均于洁净室(1000级)环境中进行。
在诸如电阻加热石英舟(resistively heated quartz boats)等的高真空单元(10-7托)中,通过气相沉积将这些有机层依序涂布于ITO基材上。通过石英晶体监控器(quartz-crystal monitor)精确监控或设定对应层的厚度以及气相沉积速率(0.1nm/sec至0.3nm/sec)。如上所述,个别层还可能由一种以上化合物所组成,意即一般来说掺杂有掺杂剂材料的主体材料。这类型材料可透过从两种或两种以上来源进行共气化(co-vaporization)而达成。
二吡嗪并[2,3-f:2,3-]喹喔啉-2,3,6,7,10,11-六甲腈(Dipyrazino[2,3-f:2,3-]quinoxaline-2,3,6,7,10,11-hexacarbonitrile,HAT-CN)在有机EL装置中可用来作为电洞注入层。N,N-双(萘-1-基)-N,N-双(苯基)-联苯胺(N,N-Bis(naphthalene-1-yl)-N,N-bis(phenyl)-benzidine,NPB)最常用来作为电洞传输层。4-(10,10-甲基-10H-茚并[2,1-b]菲-13-基)二苯并[b,d]噻吩(4-(10,10-dimethyl-10H-indeno[2,1-b]triphenylen-13-yl)dibenzo[b,d]thiophene)(H1)以及10,10-二甲基-13-(3-(三亚苯-2-基)苯基)-10H-茚并[2,1-b]三亚苯(10,10-dimethyl-13-(3-(triphenylen-2-yl)phenyl)-10H-indeno[2,1-b]triphenylene)(H2)分别作为与本发明的有机EL装置的磷光发光主体相互对照的比较性材料,2-(10,10-二甲基-10H茚并[2,1-b]菲-13-基)-4,6-二甲基-5-苯基联苯-3-基)-1,3,5-三嗪(2-(10,10-dimethyl-10H-indeno[2,1-b]triphenylen-13-yl)-4,6-bis-5-phenylbiphenyl-3-yl)-1,3,5-triazine)(ET3)作为有机EL装置中的电子传输材料,并且与8-羟基喹啉酯基-锂(8-hydroxyquinolato-lithium,LiQ)进行共沉积(co-deposition)。三(2-苯基吡啶)铱(III)(tris(2-phenylpyridin-ato)iridium(III))(D2)用来作为磷光掺杂剂(phosphorescent dopant)。用于产生标准有机EL装置控制组的现有技术的OLED材料和本发明用于比较现有技术的材料,其化学结构如下:
典型的有机EL装置由诸如Al、Mg、Ca、Li、K或其合金的低功函数金属所构成,并通过热蒸镀方式成为阴极,低功函数金属可辅助电子从阴极注入至电子传输层。此外,为了减少电子注入的屏障,并且改进有机EL装置性能,在阴极与电子传输层之间引入薄膜电子注入层。电子注入层的常规材料是具有低功函数的金属卤化物或金属氧化物,例如:LiF、LiQ、MgO或Li2O等。另一方面,在有机EL装置制造之后,通过使用PR650光谱扫描光谱仪(PR650spectra scan spectrometer)测量EL光谱(EL spec-tra)和CIE坐标(CIE coordination)。此外,利用吉时利2400可程序化设计电压-电流源(Keithley2400 programmable voltage-current source)取得电流/电压(current/voltage)、发光/电压(luminescence/voltage)及良率/电压(yield/voltage)的特性。上述设备是于室温(约25℃)及大气压力环境中操作。
实施例4
使用类似于上述一般方法的程序,产生具有以下装置结构的磷光有机EL装置,装置结构为ITO/HAT-CN(20nm)/NPB(110nm)/掺杂12%D2的磷光主体(PhHost)(30nm)/电洞阻挡材料(HBM)/掺杂50%LiQ的ET3(40nm)/LiQ(1nm)/Al(160nm)。磷光有机EL装置测试报告的I-V-B(于1000尼特(nit)时)以及半衰期如表1所示,其中半衰期被定义为3000cd/m2的初始亮度降到一半的时间。
表1
在以上有机EL装置测试报告(参见表1)的较佳实施例中,显示本发明中含式(1)化合物的有机光电材料用于有机EL装置中时,可表现出更为优异的性能,并且显示低驱动电压以及长半衰期等特性。
产生有机光伏装置的一般方法
依据本发明,提供一种经铟锡氧化物(indium tin oxide,ITO)涂布的玻璃(下文ITO基材),其电阻为9欧姆/平方(ohm/square)至12欧姆/平方且厚度为120nm到160nm,并且在超声波浴中利用多个清洁步骤(例如:清洁剂、去离子水)进行清洁。在进行有机层的气相沉积过程之前,通过UV和臭氧进一步处理经清洁后的ITO基材。用于ITO基材的所有前处理过程均于洁净室(1000级)环境中进行。
在诸如电阻加热石英舟(resistively heated quartz boats)等的高真空单元(10-7托)中,通过气相沉积将这些有机层依序涂布于ITO基材上。通过石英晶体监控器(quartz-crystal monitor)精确监控或设定对应层的厚度以及气相沉积速率(0.1nm/sec至0.3nm/sec)。如上所述,个别层还可能由一种以上化合物所组成,意即一般来说掺杂有掺杂剂材料的主体材料。这类型材料可透过从两种或两种以上来源进行共气化(co-vaporization)而达成。
在避光环境中以及照明强度(illumination intensity)为100mW/cm2的经校正的模拟太阳光源(calibrated AM1.5G sun)下,有机光伏装置(OPV)装置的电流密度/电压(J-V)特性是利用吉时利2400可程序化设计电压-电流源计(Keithley2400 programmablevoltage-current source meter)所量测而得出。
亚酞菁氯化物(Subphthalocyanine chloride,SubPc)及亚萘酞菁氯化物(Subnaphthalocyanine chloride,SubNc)用来作为OPV装置中的施体(doner),C60及C70最常被用来用作受体(acceptor),以及2,9-二甲基-4,7-二苯基-1,10-啡啉(2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline,BCP)则用来作为激子阻挡层(exciton blockinglayer)。用于产生标准OPV装置控制组的现有技术的OPV材料和本发明用于比较现有技术的材料,其化学结构如下:
实施例5
使用类似于上述一般方法的程序,产生具有以下装置结构的OPV装置,装置结构为ITO/缓冲层(buffer layer)/电洞传输材料(HTM)(15nm)/SubPc(20nm)/C60(30nm)/BCP(10nm)/LiF(1nm)/Al(120nm)。OPV装置测试报告的J-V、效率以及填充因子(fill factor,FF)(%)如表2所示。
表2
HTM | <sup>a</sup>V<sub>oc</sub>(V) | <sup>b</sup>J<sub>sc</sub>(mA/cm<sup>2</sup>) | FF(%) | 效率(%) |
NPB | 0.92 | 5.6 | 48.4 | 2.493568 |
Ex14 | 1.03 | 6.9 | 56.6 | 4.022562 |
- | 0.99 | 5.8 | 54.7 | 3.140874 |
a开路电压(open circuit voltage,Voc)。
b短路电流密度(short circuit current density,Jsc)。
在以上OPV装置测试报告(参见表2)的较佳实施例中,显示本发明中含式(1)化合物的有机光电材料用于OPV装置中的电洞传输材料(hole transport material,HTM)时,可使本发明的OPV装置显示高效率、高填充因子值以及高开路电压。
产生有机薄膜晶体管装置的一般方法
有机薄膜晶体管(OTFT)装置的基材可以是带有250nm热生长二氧化硅(thermallygrown SiO2)的高浓度掺杂p型硅(p+-doped Si)。以溶胶(sol-gel)法涂布聚甲基丙烯酸甲酯(polymethyl methacrylate,PMMA)薄膜在二氧化硅闸氧化层(gate oxide)上的沉积工艺参数及其作为表面修饰层的用途角色,以及有机薄膜层材料的沉积程序,已在别处文献多有详述。在一实施例中,将超薄(ultra-thin)氟化锂(LiF)层通过热蒸镀法而沉积在有机薄膜材料上,且氟化锂层的厚度可介于及之间。最后,用热蒸镀法透过屏蔽(shadowmask)将铝沉积在有机薄膜材料上,且铝的厚度为60纳米(nm),以形成源汲极(S/Delectrode)。薄膜的厚度可通过石英晶体监控器(quartz crystal monitor)进行监控。所制备的装置可具有宽度为20cm且长度为10m的通道(channel),其输出特性展现出典型的场效晶体管(field effect transistor,FET)的特性。
在氮气环境下于手套箱(glove box)中,利用惠普4156C精准半导体参数分析仪(HP4156C Precision Semiconductor Parameter Analyzer)以及吉时利4200半导体参数分析仪(Keithley 4200 semiconductor parameter analyzer)进行OTFT装置的电性量测。电容-电压(capacitance-voltage,C-V)值的量测是利用安捷伦E4980A精密型LCR表(Agilent E4980A precision LCRmeter)来进行。
用于产生标准OTFT装置控制组的现有技术的OTFT材料和本发明用于比较现有技术的材料,其化学结构如下:
使用类似于上述一般方法的程序,产生具有以下装置结构的OTFT装置,前述的化合物Ex18以及二种比较例材料:并五苯(Pentance)及6,13-双(三异丙基硅烷基乙炔基)并五苯(6,13-bis(triisopropylsilylethynyl)pentacene,TIPS),利用旋转涂布或沉积的方式形成薄膜,从而构成整体装置结构。OTFT装置的场效载子移动率(field-effect carriermobility)以及开/关电流比(on/off current ratio)的数据如表3所示。
表3
场效载子移动率 | 开/关电流比 | |
Ex18 | 0.99x10<sup>-1</sup>cm<sup>2</sup>V<sup>-1</sup>s<sup>-1</sup> | 1.6x10<sup>5</sup> |
并五苯 | 1.3x10<sup>-2</sup>cm<sup>2</sup>V<sup>-1</sup>s<sup>-1</sup> | 4.3x10<sup>4</sup> |
TIPS | 1.1x10<sup>0</sup>cm<sup>2</sup>V<sup>-1</sup>s<sup>-1</sup> | 3.9x10<sup>6</sup> |
在以上OTFT装置测试报告(参见表3)的较佳实施例中,显示本发明所述的含式(1)化合物的有机光电材料用来作为OTFT装置中的有机薄膜材料时,可使OTFT装置展示出开/关电流比约1.6×105以及场效移动率(field-effect mobility)约1.0×10-1cm2V-1s-1的优异效能。
综上所述,本发明提供一种有机光电材料,其可用于有机EL装置、OPV装置及/或OTFT装置中。前述有机光电材料包括具有下式(1)所示结构的化合物:
其中式(1)中,X独立地表示选自于由O、S、C(R4)(R5)及N(R6)所组成的群组中的原子或基团所构成的二价桥,且R4至R6各自分别为取代基;m、n及p各自分别表示0至10的整数;R1至R3独立地表示选自于由氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基、以及具有3至50个碳原子的经取代或未经取代的杂芳基所组成的群组,在一较佳实施例中,R4至R6可各自分别为氢原子、卤素、烷基、芳基、芳烷基或杂芳基或其他可替代的基团;在一更佳实施例中,R4至R6可各自分别为氢原子、卤素、具有1至30个碳原子的经取代或未经取代的烷基、具有6至50个碳原子的经取代或未经取代的芳基、具有6至50个碳原子的经取代或未经取代的芳烷基、以及具有3至50个碳原子的经取代或未经取代的杂芳基。
以上所述仅为本发明的较佳实施例,而非对本发明有任何形式上的限制,虽然本发明已通过较佳实施例提供如上,然而本发明并非限定于上述实施例,任何所属技术领域中技术人员,在没有脱离本发明技术方案的范围之内,当可利用上述的技术内容做出更动或修饰而做出等同变化的等效实施例,但凡是未脱离本发明技术方案的内容,依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与修饰,均仍属于本发明技术方案的范围。
Claims (9)
1.一种有机光电材料,其包括具有下式(1)所示的化合物:
其中式(1)中,当X独立地表示选自于由C(R4)(R5)和N(R6)所组成的群组中的基团所构成的二价桥时,R4至R5为具有1至30个碳原子的烷基;R6为具有6至50个碳原子的经取代或未经取代的芳烷基;R1至R3表示氢原子;m、n及p各自分别表示0至10的整数;当X独立地表示选自于由O和S所组成的群组中的原子所构成的二价桥时,m、n及p表示1;R1至R3独立地表示选自具有1至30个碳原子的烷基。
2.如权利要求1所述的有机光电材料,其进一步具有由下列式(2)至式(4)所示的化合物的其中一种或多种:
其中,式(2)和式(3)中,R1至R3表示氢原子;及R6为具有6至50个碳原子的经取代或未经取代的芳烷基;
式(4)中,R1至R3独立地表示选自具有1至30个碳原子的烷基。
3.如权利要求1或2所述的有机光电材料,其进一步具有由下列所示的化合物的其中一种或多种:
4.一种有机电激发光装置,其包括对电极、至少一发光层以及一个或多个有机薄膜层,其中所述对电极由阳极及阴极所组成,所述至少一发光层以及所述一个或多个有机薄膜层设置于所述对电极之间,且所述至少一发光层包括如权利要求1至3中任一项所述的有机光电材料。
5.如权利要求4所述的有机电激发光装置,其中,所述有机光电材料为所述发光层中的主体材料。
6.一种有机光伏装置,其包括对电极、主动层以及一个或多个有机薄膜层,所述对电极是由阳极或阴极组成,所述主动层以及所述一个或多个有机薄膜层设置于所述对电极之间,其中所述主动层或所述一个或多个有机薄膜层包括如权利要求1至3中任一项所述的有机光电材料。
7.如权利要求6所述的有机光伏装置,其中,所述有机光电材料为所述主动层的施体。
8.如权利要求6所述的有机光伏装置,其中,所述有机光电材料为所述一个或多个有机薄膜层的电洞传输材料。
9.一种有机薄膜晶体管,其包括一组源汲极、闸极、有机半导体层以及绝缘层,所述有机半导体层及所述绝缘层分别设置于所述组源汲极及所述闸极之间,其中所述有机半导体层包括如权利要求1至3中任一项所述的有机光电材料。
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