CN1058337C - 表面起伏式绕射光学元件及其制作方法 - Google Patents
表面起伏式绕射光学元件及其制作方法 Download PDFInfo
- Publication number
- CN1058337C CN1058337C CN 97103984 CN97103984A CN1058337C CN 1058337 C CN1058337 C CN 1058337C CN 97103984 CN97103984 CN 97103984 CN 97103984 A CN97103984 A CN 97103984A CN 1058337 C CN1058337 C CN 1058337C
- Authority
- CN
- China
- Prior art keywords
- index coefficient
- optical index
- optical
- photoresist
- coefficient distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims (13)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 97103984 CN1058337C (zh) | 1997-04-11 | 1997-04-11 | 表面起伏式绕射光学元件及其制作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 97103984 CN1058337C (zh) | 1997-04-11 | 1997-04-11 | 表面起伏式绕射光学元件及其制作方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1196490A CN1196490A (zh) | 1998-10-21 |
CN1058337C true CN1058337C (zh) | 2000-11-08 |
Family
ID=5167035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 97103984 Expired - Fee Related CN1058337C (zh) | 1997-04-11 | 1997-04-11 | 表面起伏式绕射光学元件及其制作方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1058337C (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104950365B (zh) * | 2015-05-21 | 2017-07-21 | 哈尔滨工业大学 | 一种光学透明频率选择表面结构及制作方法 |
CN109188577A (zh) * | 2018-08-23 | 2019-01-11 | 中国建筑材料科学研究总院有限公司 | 一种光学元件微纳阵列结构的制备方法 |
CN109270615A (zh) * | 2018-11-21 | 2019-01-25 | 京东方科技集团股份有限公司 | 光栅结构的制备系统及制备方法 |
-
1997
- 1997-04-11 CN CN 97103984 patent/CN1058337C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1196490A (zh) | 1998-10-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4846552A (en) | Method of fabricating high efficiency binary planar optical elements | |
US5340637A (en) | Optical device diffraction gratings and a photomask for use in the same | |
US6958207B1 (en) | Method for producing large area antireflective microtextured surfaces | |
US5004673A (en) | Method of manufacturing surface relief patterns of variable cross-sectional geometry | |
US6638667B2 (en) | Fabricating optical elements using a photoresist formed using of a gray level mask | |
JP3526215B2 (ja) | 光ファイバー加工用位相マスク及びその製造方法 | |
KR101755758B1 (ko) | 고해상도 2차원 주기적 패턴을 인쇄하기 위한 방법 및 장치 | |
JPH06265709A (ja) | 電子線リソグラフィを用いる回折格子製造方法 | |
CN104765086B (zh) | 一种具有单级衍射特性的梯形基元光栅 | |
KR100270588B1 (ko) | 노광용 마스크와 그 제조방법 및 노광용 마스크의 패턴 데이타 작성 방법 | |
US7682755B2 (en) | Lithography mask and optical lithography method using surface plasmon | |
JPH07506224A (ja) | 投影照明用の解像力強化光学位相構造体 | |
CN1058337C (zh) | 表面起伏式绕射光学元件及其制作方法 | |
EP0505103B1 (en) | Sub-micron device fabrication | |
Purdy | Fabrication of complex micro-optic components using photo-sculpting through halftone transmission masks | |
US20050233228A1 (en) | Grayscale lithography methods and devices | |
EP2199837B1 (en) | A dispersion grating | |
US11340387B2 (en) | Diffuser | |
JP4357803B2 (ja) | 回折格子形成用の位相マスクとその製造方法、および回折格子の形成用方法 | |
US20050112476A1 (en) | Phase-shift mask and fabrication thereof | |
JP3452053B2 (ja) | パターン形成方法 | |
JP3413138B2 (ja) | 位相型計算機ホログラムの製造方法 | |
JP2000089014A (ja) | 光ファイバー加工用位相マスク及びその製造方法 | |
US4026743A (en) | Method of preparing transparent artworks | |
CN116609871B (zh) | 一种不等高直齿光栅的制作方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090320 Address after: Taipei city of Taiwan Province Patentee after: Institute for Information Industry Address before: Zhongxing Road, four section, No. 195, bamboo East Town, Taiwan County, Hsinchu Patentee before: Industrial Technology Research Institute |
|
ASS | Succession or assignment of patent right |
Owner name: YULIN TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE Effective date: 20090320 |
|
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20001108 Termination date: 20110411 |