CN105806491A - Three-wavelength two-dimensional temperature field measuring device and method - Google Patents

Abstract

The invention belongs to a three-wavelength two-dimensional temperature field measuring device and method and belongs to temperature field measuring devices and methods.The measuring device comprises a shading tube K for reducing the effect of environment stray light, a main objective lens L1 used for optical imaging and imaging radiation of an object to be measured onto a field stop, a lens L2 used for producing parallel light rays, an aperture stop used for controlling light energy of imaging light beams, interference filters F1, F2 and F3 used for only allowing light with a certain specific wavelength to pass, photoelectric sensor arrays D1, D2 and D3 used for receiving filtered radiation and converting radiation energy into electronic signals, a V/F conversion device used for converting the voltage signals into frequency signals so that information can be collected conveniently and a data collection analyzer used for collecting and processing information, converted by the V/F conversion device, of photoelectric sensors to acquire relative spectral intensity information of all points so that an index linear emissivity model can be adopted for conducting inversion on temperatures of all the points.The device and method have the advantages that achievement is easy, the cost of a collection system is low, performance is stable, and the device and method are applied and popularized in the field of high-temperature detection.

Description

A kind of three wavelength two-dimension temperature field measurement device and methods

Technical field

The present invention relates to a kind of temperature field measuring apparatus and method, particularly a kind of three wavelength two-dimension temperature field measurement device and methods.

Background technology

Thermometry is generally divided into contact type measurement method and non-contact type measuring method two class, and conventional contact temperature-measuring instrument mainly includes thermocouple thermometer, thermal resistance thermometer and contact type optical fiber pyrometer.Contact thermography instrument comparative maturity technically, the temperature survey of industrial furnace plays a good role, but these sensors generally once can only measure certain point or the temperature value of several point, the thermo parameters method of high temperature object cannot be obtained, and some of which sensor thermal inertia is relatively larger, thermal balance is set up relatively difficult, it is difficult to the continuous monitoring to high temperature object, in addition, it is big often to there is equipment volume in high temperature production process, material is many, operating mode is complicated, acid and alkali corrosion and the strong situation of electromagnetic interference, it is easily caused contact temperature-measuring not long for equipment life, measuring accuracy is low.The adverse circumstances of production scene also limit the application of contact temperature-measuring instrument.

Summary of the invention

The invention aims to provide a kind of three wavelength two-dimension temperature field measurement device and methods, solve conventional contact temperature measuring device and can only survey the problem of certain point or certain several somes temperature, without knowing emissivity and locus calibration.

The object of the present invention is achieved like this: the three wavelength two-dimension temperature field measurements of the present invention include the measuring method of three wavelength temperature measuring equipments and two-dimensional temperature field；

Three wavelength temperature measuring equipments include: principal goods mirror L1, lens L2, aperture diaphragm, the first interferometric filter F1, the second interferometric filter F2, the 3rd interferometric filter F3, the first photoelectric sensor D1, the second photoelectric sensor D2, the 3rd photoelectric sensor D3, V/F conversion equipment, data collection and analysis device and cone K；

Principal goods mirror L1, lens L2, aperture diaphragm and the first photoelectric sensor D1 series connection are located on primary optic axis, have the first interferometric filter F1 between lens L2 and aperture diaphragm；Between the second photoelectric sensor D2 and the first interferometric filter F1, there is the second interferometric filter F2, between the 3rd photoelectric sensor D3 and the second interferometric filter F2, have the 3rd interferometric filter F3；Arriving the second photoelectric sensor D2 from the second optical axis of the first interferometric filter F1 refraction by the second interferometric filter F2, the 3rd optical axis of the second interferometric filter F2 refraction arrives the 3rd photoelectric sensor D3 by the 3rd interferometric filter F3；First photoelectric sensor D1, the second photoelectric sensor D2 and the three photoelectric sensor D3 are connected with data collection and analysis device respectively through V/F conversion equipment, and cone K is used for reducing the impact of veiling glare；

Described principal goods mirror L1 is used for optical imagery, by the radiant image of object under test in field stop；

Described lens L2, is used for producing parallel rays；

Described aperture diaphragm, for controlling the light energy of imaging beam；

Described first interferometric filter F1, the second interferometric filter F2, the 3rd interferometric filter F3, for by the wavelength within the scope of certain；

Described first photoelectric sensor D1, the second photoelectric sensor D2, the 3rd photoelectric sensor D3, work in a certain wavelength；

Described V/F conversion equipment, for being converted to frequency signal by voltage signal, it is simple to gathers information；

Described data collection and analysis device, for gathering the information sent through V/F conversion equipment by photoelectric sensor and processing.

Three described wavelength temperature measuring equipments adopt three wavelength measurements to realize the measurement to whole temperature field, it is not necessary to realize the accurate measurement in temperature field when carrying out locus calibration.

This two-dimensional temperature field measuring method: adopt three radiation measurement channels, realize the measurement of three specific wavelength radiant intensity that each point in target area goes out, intensity signal is converted into frequency signal output by measurement process, being received by data collection and analysis device, the conversion coefficient measured between signal and radiant intensity can be determined by blackbody calibration method；It is very warm that the radiant intensity information of three wavelength launched by each impact point carrys out inverting target, introduces object under test surface spectrum emissivity function, adopts Wien closely to set up actinometry equation, it is achieved the accurate measurement in temperature field；

Specifically comprise the following steps that

(1) target area being launched radiant image in field stop, reconvert becomes directional light, carries out light-splitting processing by interference filter element；

(2) the radiation information measurement of three specific wavelengths in sensor array each picture point respectively is adopted；First convert optical signals to the signal of telecommunication, then electrical information is converted to frequency signal, data collection and analysis device receive, be converted to the spectral intensity information of impact point, ready for further temperature retrieval；

(3) adopt index linear emissivity model, each point temperature is carried out inverting, to obtain two-dimensional temperature field information；

(4) without knowing and set emissivity in advance, the impact not by locus is measured.

Described data collection and analysis device utilizes the calculating that Multi spectral thermometry method carries out temperature field to complete according to below equation group:

$\left\{\begin{array}{c}{V_1}^{i,j}={A_1}^{i,j}\·{\mathrm{\ϵ}}_{\mathrm{\λ}1}\left(T^{i,j}\right).I_{b,\mathrm{\λ}1}\left(T^{i,j}\right)\\ {V_2}^{i,j}={A_2}^{i,j}\·{\mathrm{\ϵ}}_{\mathrm{\λ}2}\left(T^{i,j}\right).I_{b,\mathrm{\λ}2}\left(T^{i,j}\right)\\ {V_3}^{i,j}={A_3}^{i,j}\·{\mathrm{\ϵ}}_{\mathrm{\λ}3}\left(T^{i,j}\right).I_{b,\mathrm{\λ}3}\left(T^{i,j}\right)\end{array}\right.---\left(1\right)$

Wherein (i j) represents the coordinate of any point, V on sensor imaging focal plane to superscript₁ ^i,j, V₂ ^i,j, V₃ ^i,jRepresent the output signal value of three photodetectors respectively, for known quantity；A₁ ^i,jA₂ ^i,jA₃ ^i,jFor only with wavelength and measurement space position about and temperature independent calibration constant, it is possible to be expressed as space constant Π^i,jWith spectral response F_k ^i,j, the product of k=1,2,3, i.e. A₁ ^i,j=Π^i,jF₁ ^i,j,A₂ ^i,j=Π^i,jF₃ ^i,j,A₃ ^i,j=Π^i,jF₃ ^i,j, T^i,j(i, temperature j), for unknown quantity, I at point to represent object under test_b,λ1, I_b,λ2, I_b,λ3The respectively spectral radiance of corresponding wavelength, ε_λ1, ε_λ2, ε_λ3For spectral emissivity function to be measured, for unknown quantity；Π^i,jTemperature field measurement process can change with the change measuring position, and F_k ^i,j, k=1,2,3 relevant with Instrument sensor self, need to demarcate.

Described spectral emissivity function to be measured adopts exponential polynomials function to be expressed as follows:

ε=e^a+bλ(2)

Known by Planck law:

$I_b=\frac{C_1{\mathrm{\λ}}^{-5}}{e^{c_2/\mathrm{\λ}T}-1}$

Adopt Wien approximate replacement Planck law, it may be assumed that

$I_b=\frac{C_1{\mathrm{\λ}}^{-5}}{e^{c_2/\mathrm{\λ}T}}---\left(3\right)$

Then each equation left side of equation group (1) is V₁ ^i,j, V₂ ^i,j, V₃ ^i,jThree known quantities, the right includes a, b, T, T by being solved temperature, a, and b is emissivity model coefficient, it is possible to for emissivity measurement；Therefore solving of equation group (1) is to close.

Described realizes accurately measuring and calculating of temperature field:

(2) (3) are brought into (1) and obtains equation below group (4)

$\left\{\begin{array}{c}{V_1}^{i,j}={A_1}^{i,j}\·e^{a+{\mathrm{b\λ}}_1}.\frac{C_1{{\mathrm{\λ}}_1}^{-5}}{e^{C_2/{\mathrm{\λ}}_{1}T}}\\ {V_2}^{i,j}={A_2}^{i,j}\·e^{a+{\mathrm{b\λ}}_2}.\frac{C_1{{\mathrm{\λ}}_2}^{-5}}{e^{C_2/{\mathrm{\λ}}_{2}T}}\\ {V_3}^{i,j}={A_3}^{i,j}\·e^{a+b\mathrm{\λ}3}.\frac{C_1{{\mathrm{\λ}}_3}^{-5}}{e^{C_2/{\mathrm{\λ}}_{3}T}}\end{array}\right.---\left(4\right)$

Are taken the logarithm in equation (4) both sides, equation below group can be obtained:

$\left\{\begin{array}{c}{{\mathrm{InV}}_1}^{i,j}={{\mathrm{InA}}_1}^{i,j}+a+{\mathrm{b\λ}}_1+{\mathrm{InC}}_1{{\mathrm{\λ}}_1}^{-5}-C_2/{\mathrm{\λ}}_{1}T\\ {{\mathrm{InV}}_2}^{i,j}={{\mathrm{InA}}_2}^{i,j}+a+{\mathrm{b\λ}}_2+{\mathrm{InC}}_1{{\mathrm{\λ}}_2}^{-5}-C_2/{\mathrm{\λ}}_{2}T\\ {{\mathrm{InV}}_3}^{i,j}={{\mathrm{InA}}_3}^{i,j}+a+{\mathrm{b\λ}}_3+{\mathrm{InC}}_1{{\mathrm{\λ}}_3}^{-5}-C_2/{\mathrm{\λ}}_{3}T\end{array}\right.---\left(5\right)$

Equation (5) comprises 4 unknown quantitys a, b, T, Π^i,j, T is by being solved temperature, and a, b is emissivity model coefficient, it is possible to for emissivity measurement, Π^i,jIt is point (i, j) the locus constant at place；Comprise three equations, thus equation group (5) seem can not direct solution；Π^i,jIt is present in A_k ^i,j, in k=1,2,3, can change along with the change measuring position, through specific Mathematical treatment, it is possible to eliminate the impact of Π；(6) formula is substituted into (5) Shi Ke get,

$\begin{array}{c}{{\mathrm{InA}}_k}^{i,j}+a={{\mathrm{InF}}_k}^{i,j}+In{\Π}^{i,j}+a\\ ={{\mathrm{InF}}_k}^{i,j}+a_1,k=1,2,3\end{array}---\left(6\right)$

$\left\{\begin{array}{c}{{\mathrm{InV}}_1}^{i,j}={{\mathrm{InF}}_1}^{i,j}+a_1+{\mathrm{b\λ}}_1+{\mathrm{InC}}_1{{\mathrm{\λ}}_1}^{-5}-C_2/{\mathrm{\λ}}_{1}T\\ {{\mathrm{InV}}_2}^{i,j}={{\mathrm{InF}}_2}^{i,j}+a_1+{\mathrm{b\λ}}_2+{\mathrm{InC}}_1{{\mathrm{\λ}}_2}^{-5}-C_2/{\mathrm{\λ}}_{2}T\\ {{\mathrm{InV}}_3}^{i,j}={{\mathrm{InF}}_3}^{i,j}+a_1+{\mathrm{b\λ}}_3+{\mathrm{InC}}_1{{\mathrm{\λ}}_3}^{-5}-C_2/{\mathrm{\λ}}_{3}T\end{array}\right.---\left(7\right)$

F_k ^i,j, after k=1,2,3 demarcation, (7) formula has a₁, b, tri-unknown numbers of T and three equations, it is achieved the closing of temperature solves.

Beneficial effect, owing to have employed such scheme, adopts sensor array and beam splitting system, the radiation measurement to three specific wavelengths that target area each point is launched, it is not necessary to carry out emissivity model construction, it is possible to realize two-dimension temperature field measurement.Select suitable temperature retrieval algorithm, it is only necessary to the spectral response under three specific wavelengths is demarcated, measure the impact not by locus.This invention can realize the non-cpntact measurement of two dimension high temperature surface temperature field.

Technical scheme by measuring the radiant intensity information of object under test to the relevant data acquisition of three wavelength, the measurement of two-dimensional temperature field can be realized without knowing emissivity information when, technical scheme realizes simple, acquisition system cost is not high, stable performance, in the application easy to spread of high temperature detection field.

Accompanying drawing explanation

Fig. 1 is the structure chart of the present invention three wavelength temperature field measurement device.

Detailed description of the invention

The three wavelength temperature field measurements of the present invention include the measuring method of temperature measuring equipment and two-dimensional temperature field；

Three wavelength temperature measuring equipments include: principal goods mirror L1, lens L2, aperture diaphragm, the first interferometric filter F1, the second interferometric filter F2, the 3rd interferometric filter F3, the first photoelectric sensor D1, the second photoelectric sensor D2, the 3rd photoelectric sensor D3, V/F conversion equipment, data collection and analysis device and, cone K；

Principal goods mirror L1, lens L2, aperture diaphragm and the first photoelectric sensor D1 series connection are located on primary optic axis, have the first interferometric filter F1 between lens L2 and aperture diaphragm；Between the second photoelectric sensor D2 and the first interferometric filter F1, there is the second interferometric filter F2, between the 3rd photoelectric sensor D3 and the second interferometric filter F2, have the 3rd interferometric filter F3；Arriving the second photoelectric sensor D2 from the second optical axis of the first interferometric filter F1 refraction by the second interferometric filter F2, the 3rd optical axis of the second interferometric filter F2 refraction arrives the 3rd photoelectric sensor D3 by the 3rd interferometric filter F3；First photoelectric sensor D1, the second photoelectric sensor D2 and the three photoelectric sensor D3 are connected with data collection and analysis device respectively through V/F conversion equipment, and cone K is used for reducing the impact of veiling glare.

Described principal goods mirror L1 is used for optical imagery, by the radiant image of object under test in field stop；

Described lens L2, is used for producing parallel rays；

Described aperture diaphragm, for controlling the light energy of imaging beam；

Described first interferometric filter F1, the second interferometric filter F2, the 3rd interferometric filter F3, for by the wavelength within the scope of certain；

Described first photoelectric sensor D1, the second photoelectric sensor D2, the 3rd photoelectric sensor D3, work in a certain wavelength；

Described V/F conversion equipment, for being converted to frequency signal by voltage signal, it is simple to gathers information；

Described data collection and analysis device, for gathering the information sent through V/F conversion equipment by photoelectric sensor and processing.

Three described wavelength temperature measuring equipments adopt three wavelength measurements to realize the measurement to whole temperature field, it is not necessary to realize the accurate measurement in temperature field when carrying out locus calibration.

This two-dimensional temperature field measuring method step is as follows: adopt three radiation measurement channels, realize the measurement of three specific wavelength radiant intensity that each point in target area goes out, intensity signal is converted into frequency signal output by measurement process, being received by data collection and analysis device, the conversion coefficient measured between signal and radiant intensity can be determined by blackbody calibration method；It is very warm that the radiant intensity information of three wavelength launched by each impact point carrys out inverting target, introduces object under test surface spectrum emissivity function, adopts Wien closely to set up actinometry equation, it is achieved the accurate measurement in temperature field；

Specifically comprise the following steps that

(1) target area being launched radiant image in field stop, reconvert becomes directional light, carries out light-splitting processing by interference filter element；

(2) the radiation information measurement of three specific wavelengths in sensor array each picture point respectively is adopted；First convert optical signals to the signal of telecommunication, then electrical information is converted to frequency signal, data collection and analysis device receive, be converted to the spectral intensity information of impact point, ready for further temperature retrieval；

(3) adopt index linear emissivity model, each point temperature is carried out inverting, to obtain two-dimensional temperature field information；

(4) without knowing and set emissivity in advance, the impact not by locus is measured.

Described data collection and analysis device utilizes the calculating that Multi spectral thermometry method carries out temperature field to complete according to below equation group:

$\left\{\begin{array}{c}{V_1}^{i,j}={A_1}^{i,j}\·{\mathrm{\ϵ}}_{\mathrm{\λ}1}\left(T^{i,j}\right).I_{b,\mathrm{\λ}1}\left(T^{i,j}\right)\\ {V_2}^{i,j}={A_2}^{i,j}\·{\mathrm{\ϵ}}_{\mathrm{\λ}2}\left(T^{i,j}\right).I_{b,\mathrm{\λ}2}\left(T^{i,j}\right)\\ {V_3}^{i,j}={A_3}^{i,j}\·{\mathrm{\ϵ}}_{\mathrm{\λ}3}\left(T^{i,j}\right).I_{b,\mathrm{\λ}3}\left(T^{i,j}\right)\end{array}\right.---\left(1\right)$

Wherein (i j) represents the coordinate of any point, V on sensor imaging focal plane to superscript₁ ^i,j, V₂ ^i,j, V₃ ^i,jRepresent the output signal value of three photodetectors respectively, for known quantity；A₁ ^i,jA₂ ^i,jA₃ ^i,jFor only with wavelength and measurement space position about and temperature independent calibration constant, it is possible to be expressed as space constant Π^i,jWith spectral response F_k ^i,j, the product of k=1,2,3, i.e. A₁ ^i,j=Π^i,jF₁ ^i,j,A₂ ^i,j=Π^i,jF₃ ^i,j,A₃ ^i,j=Π^i,jF₃ ^i,j, T^i,j(i, temperature j), for unknown quantity, I at point to represent object under test_b,λ1, I_b,λ2, I_b,λ3The respectively spectral radiance of corresponding wavelength, ε_λ1, ε_λ2, ε_λ3For spectral emissivity function to be measured, for unknown quantity；Π^i,jTemperature field measurement process can change with the change measuring position, and F_k ^i,j, k=1,2,3 relevant with Instrument sensor self, need to demarcate；

Described object under test surface spectrum emissivity function adopts exponential polynomials function to be expressed as follows:

ε=e^a+bλ(2)

Known by Planck law:

$I_b=\frac{C_1{\mathrm{\λ}}^{-5}}{e^{c_2/\mathrm{\λ}T}-1}$

Adopt Wien approximate replacement Planck law, it may be assumed that

$I_b=\frac{C_1{\mathrm{\λ}}^{-5}}{e^{c_2/\mathrm{\λ}T}}---\left(3\right)$

Then each equation left side of equation group (1) is V₁ ^i,j, V₂ ^i,j, V₃ ^i,jThree known quantities, the right includes a, b, T, T by being solved temperature, a, and b is emissivity model coefficient, it is possible to for emissivity measurement；

Therefore solving of equation group (1) is to close.

Described realizes accurately measuring and calculating of temperature field:

(2) (3) are brought into (1) and obtains equation below group (4)

$\left\{\begin{array}{c}{V_1}^{i,j}={A_1}^{i,j}\·e^{a+{\mathrm{b\λ}}_1}.\frac{C_1{{\mathrm{\λ}}_1}^{-5}}{e^{C_2/{\mathrm{\λ}}_{1}T}}\\ {V_2}^{i,j}={A_2}^{i,j}\·e^{a+{\mathrm{b\λ}}_2}.\frac{C_1{{\mathrm{\λ}}_2}^{-5}}{e^{C_2/{\mathrm{\λ}}_{2}T}}\\ {V_3}^{i,j}={A_3}^{i,j}\·e^{a+b\mathrm{\λ}3}.\frac{C_1{{\mathrm{\λ}}_3}^{-5}}{e^{C_2/{\mathrm{\λ}}_{3}T}}\end{array}\right.---\left(4\right)$

Are taken the logarithm in equation (4) both sides, equation below group can be obtained:

$\left\{\begin{array}{c}{{\mathrm{InV}}_1}^{i,j}={{\mathrm{InA}}_1}^{i,j}+a+{\mathrm{b\λ}}_1+{\mathrm{InC}}_1{{\mathrm{\λ}}_1}^{-5}-C_2/{\mathrm{\λ}}_{1}T\\ {{\mathrm{InV}}_2}^{i,j}={{\mathrm{InA}}_2}^{i,j}+a+{\mathrm{b\λ}}_2+{\mathrm{InC}}_1{{\mathrm{\λ}}_2}^{-5}-C_2/{\mathrm{\λ}}_{2}T\\ {{\mathrm{InV}}_3}^{i,j}={{\mathrm{InA}}_3}^{i,j}+a+{\mathrm{b\λ}}_3+{\mathrm{InC}}_1{{\mathrm{\λ}}_3}^{-5}-C_2/{\mathrm{\λ}}_{3}T\end{array}\right.---\left(5\right)$

Equation (5) comprises 4 unknown quantitys a, b, T, Π^i,j, T is by being solved temperature, and a, b is emissivity model coefficient, it is possible to for emissivity measurement, Π^i,jIt is point (i, j) the locus constant at place；Comprise three equations, thus equation group (5) seem can not direct solution；Π^i,jIt is present in A_k ^i,j, in k=1,2,3, can change along with the change measuring position, through specific Mathematical treatment, it is possible to eliminate the impact of Π；(6) formula is substituted into (5) Shi Ke get,

$\begin{array}{c}{{\mathrm{InA}}_k}^{i,j}+a={{\mathrm{InF}}_k}^{i,j}+In{\Π}^{i,j}+a\\ ={{\mathrm{InF}}_k}^{i,j}+a_1,k=1,2,3\end{array}---\left(6\right)$

$\left\{\begin{array}{c}{{\mathrm{InV}}_1}^{i,j}={{\mathrm{InF}}_1}^{i,j}+a_1+{\mathrm{b\λ}}_1+{\mathrm{InC}}_1{{\mathrm{\λ}}_1}^{-5}-C_2/{\mathrm{\λ}}_{1}T\\ {{\mathrm{InV}}_2}^{i,j}={{\mathrm{InF}}_2}^{i,j}+a_1+{\mathrm{b\λ}}_2+{\mathrm{InC}}_1{{\mathrm{\λ}}_2}^{-5}-C_2/{\mathrm{\λ}}_{2}T\\ {{\mathrm{InV}}_3}^{i,j}={{\mathrm{InF}}_3}^{i,j}+a_1+{\mathrm{b\λ}}_3+{\mathrm{InC}}_1{{\mathrm{\λ}}_3}^{-5}-C_2/{\mathrm{\λ}}_{3}T\end{array}\right.---\left(7\right)$

F_k ^i,j, after k=1,2,3 demarcation, (7) formula has a₁, b, tri-unknown numbers of T and three equations, it is possible to achieve the closing of temperature solves.

Hereinafter implement to be used for the present invention is described, but be not limited to the scope of the present invention.

nullEmbodiment 1: as shown in drawings，Principal goods mirror L1 is used for optical imagery，By the radiant image of object under test in field stop，Light beam is through lens L2，Produce parallel rays，Pass through aperture diaphragm afterwards，For controlling the light energy of imaging beam，First interferometric filter F1、Second interferometric filter F2 and the three interferometric filter F3，For by the wavelength within the scope of certain，Allow the first photoelectric sensor D1、Second photoelectric sensor D2 and the three photoelectric sensor D3 works in a certain wavelength，Through the first photoelectric sensor D1、The single-wavelength light of the second photoelectric sensor D2 and the three photoelectric sensor D3 is through V/F conversion equipment，Voltage signal is converted to frequency signal，It is easy to collection information，Enter data collection and analysis device afterwards，Gather the information sent through V/F conversion equipment by photoelectric sensor and process，Obtain the relevant information of required two-dimensional temperature field.Three wavelength temperature measuring equipments adopt three wavelength measurements to realize the measurement to whole temperature field, it is not necessary to realize the accurate measurement in temperature field when carrying out locus calibration.

Being more than the preferred forms of the present invention, according to present disclosure, those of ordinary skill in the art apparent can expect some identical, replacement schemes, all should fall within the scope of protection of the present invention.

Claims (6)

1. a three wavelength two-dimension temperature field measurement device, is characterized in that: three wavelength temperature measuring equipments include: principal goods mirror L1, lens L2, aperture diaphragm, the first interferometric filter F1, the second interferometric filter F2, the 3rd interferometric filter F3, the first photosensor arrays D1, the second photosensor arrays D2, the 3rd photosensor arrays D3, V/F conversion equipment, data collection and analysis device and cone K；

Principal goods mirror L1, lens L2, aperture diaphragm and the first photoelectric sensor D1 series connection, be positioned on primary optic axis, have the first interferometric filter F1 between lens L2 and aperture diaphragm；Between the second photoelectric sensor D2 and the first interferometric filter F1, there is the second interferometric filter F2, between the 3rd photoelectric sensor D3 and the second interferometric filter F2, have the 3rd interferometric filter F3；Arriving the second photoelectric sensor D2 from the second optical axis of the first interferometric filter F1 refraction by the second interferometric filter F2, the 3rd optical axis of the second interferometric filter F2 refraction arrives the 3rd photoelectric sensor D3 by the 3rd interferometric filter F3；First photoelectric sensor D1, the second photoelectric sensor D2 and the three photoelectric sensor D3 are connected with data collection and analysis device respectively through V/F conversion equipment, and cone K is used for reducing the impact of veiling glare；

Described principal goods mirror L1 is used for optical imagery, by the radiant image of object under test in field stop；

Described lens L2, is used for producing parallel rays；

Described aperture diaphragm, for controlling the light energy of imaging beam；

Described first interferometric filter F1, the second interferometric filter F2, the 3rd interferometric filter F3, for by the wavelength within the scope of certain；

Described first photoelectric sensor D1, the second photoelectric sensor D2, the 3rd photoelectric sensor D3, work in a certain wavelength；

Described V/F conversion equipment, for being converted to frequency signal by voltage signal, it is simple to gathers information；

Described data collection and analysis device, for gathering the information sent through V/F conversion equipment by photoelectric sensor and processing.

2. three wavelength two-dimension temperature field measurement devices according to claim 1, it is characterized in that: described three wavelength temperature measuring equipments adopt three wavelength measurements to realize the measurement to whole temperature field, it is not necessary to when carrying out locus calibration, realize the accurate measurement in temperature field.

3. the measuring method of a kind of three wavelength two-dimension temperature field measurement devices described in claim 1, it is characterized in that: this two-dimensional temperature field measuring method: adopt three radiation measurement channels, realize the measurement of three specific wavelength radiant intensity that each point in target area goes out, intensity signal is converted into frequency signal output by measurement process, being received by data collection and analysis device, the conversion coefficient measured between signal and radiant intensity can be determined by blackbody calibration method；It is very warm that the radiant intensity information of three wavelength launched by each impact point carrys out inverting target, introduces object under test surface spectrum emissivity function, adopts Wien closely to set up actinometry equation, it is achieved the accurate measurement in temperature field；

Specifically comprise the following steps that

(1) target area being launched radiant image in field stop, reconvert becomes directional light, carries out light-splitting processing by interference filter element；

(2) the radiation information measurement of three specific wavelengths in sensor array each picture point respectively is adopted；First convert optical signals to the signal of telecommunication, then electrical information is converted to frequency signal, data collection and analysis device receive, be converted to the spectral intensity information of impact point, ready for further temperature retrieval；

(3) adopt index linear emissivity model, each point temperature is carried out inverting, to obtain two-dimensional temperature field information；

(4) without knowing and set emissivity in advance, the impact not by locus is measured.

4. the measuring method of a kind of three wavelength two-dimension temperature field measurement devices according to claim 3, is characterized in that: the calculating that described data collection and analysis device utilizes Multi spectral thermometry method to carry out temperature field completes according to below equation group:

Wherein (i j) represents the coordinate of any point, V on sensor imaging focal plane to superscript₁ ^i,j, V₂ ^i,j, V₃ ^i,jRepresent the output signal value of described three photodetectors respectively, for known quantity；A₁ ^i,jA₂ ^i,jA₃ ^i,jFor only with wavelength and measurement space position about and temperature independent calibration constant, it is possible to be expressed as space constant Π^i,jWith spectral response F_k ^i,j, the product of k=1,2,3, i.e. A₁ ^i,j=Π^i,jF₁ ^i,j,A₂ ^i,j=Π^i,jF₃ ^i,j,A₃ ^i,j=Π^i,jF₃ ^i,j, T^i,j(i, temperature j), for unknown quantity, I at point to represent object under test_b,λ1, I_b,λ2, I_b,λ3The respectively spectral radiance of corresponding wavelength, ε_λ1, ε_λ2, ε_λ3For spectral emissivity function to be measured, for unknown quantity；Π^i,jTemperature field measurement process can change with the change measuring position, and F_k ^i,j, k=1,2,3 relevant with Instrument sensor self, need to demarcate.

5. the measuring method of a kind of three wavelength two-dimension temperature field measurement devices according to claim 3, is characterized in that: object under test surface spectrum emissivity function adopts exponential polynomials function to be expressed as follows:

ε=e^a+bλ(2)

Known by Planck law:

Adopt Wien approximate replacement Planck law, it may be assumed that

Then each equation left side of equation group (1) is V₁ ^i,j, V₂ ^i,j, V₃ ^i,jThree known quantities, the right includes a, b, T, T by being solved temperature, a, and b is emissivity model coefficient, it is possible to for emissivity measurement；

Therefore solving of equation group (1) is to close.

6. the measuring method of a kind of three wavelength two-dimension temperature field measurement devices according to claim 3, is characterized in that: realize the accurate survey calculation in temperature field:

(2) (3) are brought into (1) and obtains equation below group (4)

Are taken the logarithm in equation (4) both sides, equation below group can be obtained:

Equation (5) comprises 4 unknown quantitys a, b, T, Π^i,j, T is by being solved temperature, and a, b is emissivity model coefficient, it is possible to for emissivity measurement, Π^i,jBe point (i, j) the locus constant at place, comprise three equations, thus equation group (5) seem can not direct solution；Π^i,jIt is present in A_k ^i,j, in k=1,2,3, can change along with the change measuring position, through Mathematical treatment, it is possible to eliminate the impact of Π；(6) formula is substituted into (5) Shi Ke get,

F_k ^i,j, after k=1,2,3 demarcation, (7) formula has a₁, b, tri-unknown numbers of T and three equations, it is possible to achieve the closing of temperature solves.