CN105755526A - Electrodeposition device - Google Patents
Electrodeposition device Download PDFInfo
- Publication number
- CN105755526A CN105755526A CN201610253410.6A CN201610253410A CN105755526A CN 105755526 A CN105755526 A CN 105755526A CN 201610253410 A CN201610253410 A CN 201610253410A CN 105755526 A CN105755526 A CN 105755526A
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- CN
- China
- Prior art keywords
- gear
- cathode
- stirring paddle
- deposition device
- movable cathode
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
The invention discloses an electrodeposition device which comprises an electrodeposition tank, a cathode, a cathode moving rod, a gear, a gear mounting rod and a stirring paddle.When the electrodeposition device works, the anode moving rod is in horizontal reciprocating motion under action of external force, a rack on the cathode moving rod drives the gear to be in forward and backward circular motion, and in this way, an electrolyte quickly flows under stirring action of the stirring paddle; the outer edge of the stirring paddle is close to the surface of the cathode, so that a flow field, on the surface of the cathode, of the electrolyte is relatively uniform, and uniformity of thickness of a cathode electrodeposition layer in the electrodeposition process is improved.
Description
Technical field
The present invention relates to a kind of electric deposition device, particularly to a kind of device improving cathode electrodeposition layer thickness homogeneity.
Background technology
At present, in commercial production, for increasing electrodeposition rate and effects of ion diffusion velocity, often increase electrolyte agitating device.The stirring of electro-deposition (include plating, electroforming) electrolyte is used mostly air stirring, liquid circulation stirring or cathode moving device.Although air stirring can make solution mix homogeneously, but for electrodeposition process requiring avoid the electrodeposition process of ionic oxide formation to use, and air stirring is it cannot be guaranteed that cathode surface forms stable flow field, so the uniformity of electro-deposition composition and deposition layer thickness all can be produced impact;In movable cathode agitating device, movable cathode stirring is easier to make cathode plane obtain the distribution of uniform mass transfer, but the intensity of movable cathode stirring is general not high, and the overall stirring action of whole galvanic deposition cell is relatively low, cause that deposition velocity is general not high, main cause is: conventional movable cathode stirring is that if workpiece negative electrode is flat thin lamellar, its stirring action is very weak to drive electrolyte movement by the shear action between workpiece (negative electrode) and electrolyte.Although there is multiple negative electrode agitating device to be developed so far, but still not up to very good effect.
Therefore, electrodeposition process can fully realize the mixing of electroplate liquid, can guarantee that again in the galvanic deposition cell of cathode surface flow field uniformity and carry out, just can be effectively improved the uniformity of deposition layer thickness.
Summary of the invention
For the problems referred to above, it is an object of the invention to provide a kind of electric deposition device improving deposition layer thickness evenness.
The technical solution used in the present invention is: a kind of electric deposition device, including galvanic deposition cell, movable cathode bar, negative electrode, it is characterised in that: it includes gear, gear mounting rod and stirring paddle.Described negative electrode is arranged on movable cathode bar side;Described movable cathode bar is provided with tooth bar;Described rack and pinion engagement;Described gear is rotatable to be fixed on gear mounting rod;Described gear mounting rod is fixed on galvanic deposition cell wall;Described stirring paddle coaxial line is arranged on gear shaft.
Preferably, described movable cathode bar is set in parallel in above galvanic deposition cell wall.
Preferably, described movable cathode bar can move reciprocatingly under external force.
Preferably, its quantity can be increased and decreased by described gear shaft according to the size of galvanic deposition cell and technological requirement.
Preferably, being provided with certain distance between stirring paddle outer rim and cathode plane, it is apart from adjustable.
Preferably, described stirring paddle adopts the electrically insulating material of resistance to chemical attack.
Mechanical work principle involved in the present invention is: when movable cathode bar does horizontal reciprocating movement under the effect of external force, rack drives gear on movable cathode bar does rotating circumference telemechanical, gear driven stirring paddle does positive and negative circular motion, electrolyte quickly flows under the stirring action of stirring paddle, in addition stirring paddle outer fringe position is nearer with cathode plane, therefore, electrolyte is relatively uniform in the flow field of cathode surface, so that the uniformity of cathode electrodeposition layer thickness plays a role in improving in electrodeposition process.
During work, the quantity of stirring paddle and size can be replaced according to process requirements, to obtain different stirring intensities and flow field size so that cathode surface or (with) whole galvanic deposition cell obtains different mixing effect.Stirring paddle nonlinear type from top to bottom is distributed to reduce its shielding action to the electric lines of force in galvanic deposition cell.
The present invention has the advantage that 1 compared to existing technology, simple in construction, with low cost: only need to add gear, stirring paddle and gear mounting rod on existing movable cathode agitating device and can realize agitating function, and without extra power source system.2, the uniform mixing effect of high intensity is obtained: realized the quick diffusion of electrolyte by the positive and negative circular motion of nearly negative electrode of stirring paddle, the electrolyte in nearly cathode plane and whole dislodger can be made can to obtain the uniform mixing effect of high intensity.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of a kind of electric deposition device of the present invention.
In figure: 1, movable cathode bar;2, gear;3, tooth bar;4, negative electrode;5, gear mounting rod;6, galvanic deposition cell;7, stirring paddle;8, gear shaft.
Detailed description of the invention
Below in conjunction with Fig. 1, the enforcement of the present invention is described in further detail.
A kind of electric deposition device, including galvanic deposition cell 6, movable cathode bar 1, negative electrode 4, it is characterised in that: it includes gear 2, gear mounting rod 5, stirring paddle 7.Described negative electrode 4 is arranged on movable cathode bar 1 side;Described movable cathode bar 1 is provided with tooth bar 3;Described tooth bar 3 engages with gear 2;Described gear 2 is rotatable to be fixed on gear mounting rod 5;Described gear mounting rod 5 is fixed on galvanic deposition cell 6;Described stirring paddle 7 coaxial line is arranged on gear shaft 8.
Described movable cathode bar 1 is set in parallel on galvanic deposition cell 6.
Described movable cathode bar 1 can move reciprocatingly under external force.
Its quantity can be increased and decreased by described gear shaft 8 according to the size of galvanic deposition cell 6 and technological requirement, and the number of gears that present case adopts is 2.
Being provided with certain distance between described stirring paddle 7 outer rim and 4, negative electrode, it is apart from adjustable, and present case adopts distance at 5 ~ 15mm.
The described electrically insulating material that stirring paddle 7 is resistance to chemical attack, such as polypropylene, polrvinyl chloride.
Claims (7)
1. an electric deposition device, including galvanic deposition cell (6), movable cathode bar (1), negative electrode (4), it is characterised in that: it includes gear (2), gear mounting rod (5), stirring paddle (7).
2. a kind of electric deposition device according to claim 1, it is characterised in that: described negative electrode (4) is arranged on movable cathode bar (1) side;Described movable cathode bar (1) is provided with tooth bar (3);Described tooth bar (3) engages with gear (2);Described gear (2) rotates and is fixed on gear mounting rod (5);Described gear mounting rod (5) is fixed on galvanic deposition cell (6) wall;Described stirring paddle (7) coaxial line is arranged on gear shaft (8).
3. a kind of electric deposition device according to claim 1, it is characterised in that: described movable cathode bar (1) is installed in parallel in above galvanic deposition cell (6) wall.
4. a kind of electric deposition device according to claim 1, it is characterised in that: described movable cathode bar (1) can move by horizontal reciprocating under external force.
5. a kind of electric deposition device according to claim 2, it is characterised in that: its quantity can be increased and decreased by described gear shaft (8) according to the size of galvanic deposition cell (6) and technological requirement.
6. a kind of electric deposition device according to claim 1, it is characterised in that: being provided with certain distance between described stirring paddle (7) outer rim and negative electrode (4) face, it is apart from adjustable.
7. a kind of electric deposition device according to claim 1, it is characterised in that: the electrically insulating material that described stirring paddle (7) is resistance to chemical attack.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610253410.6A CN105755526A (en) | 2016-04-22 | 2016-04-22 | Electrodeposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201610253410.6A CN105755526A (en) | 2016-04-22 | 2016-04-22 | Electrodeposition device |
Publications (1)
Publication Number | Publication Date |
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CN105755526A true CN105755526A (en) | 2016-07-13 |
Family
ID=56324682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201610253410.6A Pending CN105755526A (en) | 2016-04-22 | 2016-04-22 | Electrodeposition device |
Country Status (1)
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CN (1) | CN105755526A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106958037A (en) * | 2017-05-16 | 2017-07-18 | 湖州浩森科技股份有限公司 | One kind plating firing equipment |
CN110344101A (en) * | 2019-08-14 | 2019-10-18 | 深圳市迅成科技有限公司 | A kind of electroplating system with cleaning and speed-regulating function after plating |
CN111088517A (en) * | 2020-01-10 | 2020-05-01 | 孟文 | Hardware product electroplating processing system |
Citations (4)
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CN1765476A (en) * | 2004-10-28 | 2006-05-03 | 中国农业科学院土壤肥料研究所 | Mini-sized blender |
CN204342912U (en) * | 2014-12-17 | 2015-05-20 | 河南理工大学 | A kind of cathode moving device for galvanic deposit |
CN105463559A (en) * | 2015-12-16 | 2016-04-06 | 无锡福镁轻合金科技有限公司 | Plating tank with stirring function |
CN205653533U (en) * | 2016-04-22 | 2016-10-19 | 河南理工大学 | Electro -deposition apparatus |
-
2016
- 2016-04-22 CN CN201610253410.6A patent/CN105755526A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1765476A (en) * | 2004-10-28 | 2006-05-03 | 中国农业科学院土壤肥料研究所 | Mini-sized blender |
CN204342912U (en) * | 2014-12-17 | 2015-05-20 | 河南理工大学 | A kind of cathode moving device for galvanic deposit |
CN105463559A (en) * | 2015-12-16 | 2016-04-06 | 无锡福镁轻合金科技有限公司 | Plating tank with stirring function |
CN205653533U (en) * | 2016-04-22 | 2016-10-19 | 河南理工大学 | Electro -deposition apparatus |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106958037A (en) * | 2017-05-16 | 2017-07-18 | 湖州浩森科技股份有限公司 | One kind plating firing equipment |
CN106958037B (en) * | 2017-05-16 | 2019-01-11 | 湖南省鎏源新能源有限责任公司 | A kind of plating heating equipment |
CN110344101A (en) * | 2019-08-14 | 2019-10-18 | 深圳市迅成科技有限公司 | A kind of electroplating system with cleaning and speed-regulating function after plating |
CN111088517A (en) * | 2020-01-10 | 2020-05-01 | 孟文 | Hardware product electroplating processing system |
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Application publication date: 20160713 |