CN105700735B - Transparent conductive body and touch screen - Google Patents
Transparent conductive body and touch screen Download PDFInfo
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- CN105700735B CN105700735B CN201510898460.5A CN201510898460A CN105700735B CN 105700735 B CN105700735 B CN 105700735B CN 201510898460 A CN201510898460 A CN 201510898460A CN 105700735 B CN105700735 B CN 105700735B
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- metal oxide
- oxide layer
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- conductive body
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
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- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Laminated Bodies (AREA)
- Non-Insulated Conductors (AREA)
Abstract
The present invention provides a kind of can easily remove metal oxide layer and metal layer and the excellent transparent conductive body of alkali resistance by etching.The present invention provides a kind of transparent conductive body (100), it is sequentially laminated with transparent resin base material (10), the 1st metal oxide layer (12), metal layer (16) and the 2nd metal oxide layer (14) containing silver alloy, 2nd metal oxide layer (14) contains ZnO as principal component, and contains In2O3And TiO2As accessory ingredient, TiO2Content relative to ZnO, In2O3And TiO2This 3 kinds of ingredients add up to 6~15mol%.
Description
Technical field
The present invention relates to a kind of transparent conductive body and use its touch screen.
Background technology
Transparent conductive body may be used as liquid crystal display (LCD), Plasmia indicating panel (PDP) and electroluminescent panel
The display of (organic EL, inorganic EL) etc. and the transparent electrode of solar cell etc..In addition, in addition to these, it can also
For electromagnetic shielding film or infrared ray barrier film etc..As the material of the metal oxide layer in transparent conductive body, widely
Using in indium oxide (In2O3) in be added with tin (Sn) ITO.
In recent years, smart mobile phone and tablet terminal etc. have the terminal rapid proliferation of touch screen.These are on liquid crystal display panel
It is provided with touch sensor portion, has the composition of cloche (cover glass) in outmost surface.Touch sensor portion exists
Structure by being pasted with 1 or 2 film after sputtering method forms a film ito film on the one or both sides of glass or film substrate
At.
Along with the enlargement of touch screen and the high precision int of touch sensor function, seek with high transmittance and low
The transparent conductive body of resistance.In order to reduce the resistance for the transparent conductive body for having used ito film, need the film thickness for thickening ito film or
Person carries out the crystallization of ito film by thermal annealing.However, if by ito film thick-film, transmitance reduces.In addition, usually difficult
With at high temperature by film substrate thermal annealing.Therefore, it is arranged in the case of the ito film on film substrate, state is to be difficult to tie up
It holds high transmitance and reduces resistance.
In this case, propose have with using zinc oxide as the stacking of the metal oxide layer of principal component and metal layer
The transparent conductive film (for example, patent document 1) of structure.
Existing technical literature
Patent document
Patent document 1：Japanese Unexamined Patent Publication 9-291355 bulletins
Invention content
The technical problems to be solved by the invention
The use of touch screen etc. on the way, patterns transparent conductive film on current-carrying part and insulated part to touch
The detection of position.Therefore, in the transparent conductive body with metal oxide layer and the stepped construction of metal layer, seek to lead to
Overetch removes metal oxide layer and metal layer together.
In addition, in patterning process, pattern is formed using photographic film, finally progress photographic film stripping, but
Aqueous slkali is used when the photographic film is removed.Therefore, when being patterned, acid can be dissolved in by seeking to take into account metal oxide layer
In be etched and the undissolved alkali resistance in alkali.
However, zinc oxide is the material for all being reacted and being dissolved in alkali in acid, in addition, existing be with zinc oxide
The metal oxide of principal component is also difficult to take into account dissolubility and alkali resistance in acid.Further, metal oxide needs have
Dissolubility in acid and sufficient alkali resistance, and need that there is sufficient electric conductivity.
Therefore, simultaneous with being difficult in using zinc oxide as the stepped construction of the metal oxide layer of principal component and metal layer
It cares for and metal oxide layer and metal layer is etched into the technical issues of removing is with sufficient alkali resistance and excellent electric conductivity together.
Therefore, present disclosure provides a kind of with excellent alkali resistance and high transmittance and low-resistance electrically conducting transparent
Body, with energy in containing zinc oxide as the metal oxide layer of principal component and the transparent conductive body of the stepped construction of metal layer
It is enough that metal oxide layer and metal layer are easily removed by etching.In addition, present disclosure is provided by using such
Bright electric conductor is so as to the touch screen that is easily manufactured.
Solve the technological means of technical problem
The present invention provides a kind of transparent conductive body in one aspect, wherein the transparent conductive body is sequentially laminated with transparent
Resin base material, the 1st metal oxide layer, the metal layer containing silver alloy and the 2nd metal oxide layer, the 2nd metal oxide
Layer contains ZnO as principal component, and contains In2O3And TiO2As accessory ingredient, TiO2Content relative to ZnO, In2O3And
TiO2This 3 kinds of ingredients add up to 6~15mol%.
There is such transparent conductive body stepped construction, the stepped construction to have：Constitute the 2nd metal oxygen of outmost surface
Compound layer contains ZnO as principal component, and contains In2O3And TiO2As accessory ingredient, TiO2Content relative to ZnO,
In2O3And TiO2This 3 kinds of ingredients add up to 6~15mol%；With the metal layer containing silver alloy.2nd metal oxide
Layer and metal layer can be readily removed together by etching.Furthermore it is possible to be made with high transparency, high conductivity, excellent
The transparent conductive body of different corrosion resistance and excellent alkali resistance.Therefore, the etching of the needs such as touch screen can be preferred for
Purposes.
In several embodiments, in the 2nd metal oxide layer, the content of ZnO is relative to ZnO, In2O3And TiO2
This 3 kinds of ingredients add up to 73~84mol%.In2O3Content add up to 9~18mol% relative to above-mentioned three components.It is logical
It crosses and ZnO, In is contained with aforementioned proportion2O3And TiO2, can fully improve the transparency, the conduction of the 2nd metal oxide layer
Property, corrosion resistance, etching and alkali resistance.
In several embodiments, the 1st metal oxide layer contains ZnO as principal component, and contains In2O3And TiO2
As accessory ingredient, TiO2Content relative to ZnO, In2O3And TiO2This 3 kinds of ingredients add up to 6~15mol%.As a result,
The 1st metal oxide layer, the 2nd metal oxide layer and metal layer can be easily removed together by etching.Furthermore it is possible to
The transparent conductive body with high transparency, high conductivity, excellent corrosion resistance and alkali resistance is made.
In several embodiments, the thickness of metal layer can be 4~11nm.Transparent conductive body can fully be improved
The transparency, and sheet resistance can be reduced.In several embodiments, silver alloy be Ag with selected from Pd, Cu, Nd, In, Sn with
And the alloy of at least one of Sb metals.
The present invention provides a kind of touch screen on the other hand, and the touch screen has colorimetric sensor films on panel, should
Colorimetric sensor films are made of above-mentioned transparent conductive body.Such touch screen is due to the sensing being made of above-mentioned transparent conductive body
Therefore device film can be easily manufactured.
The effect of invention
According to present disclosure, can provide it is a kind of with contain zinc oxide as the metal oxide layer of principal component and
Metal oxide layer and metal layer can be easily removed by etching in the transparent conductive body of the stepped construction of metal layer, and
The transparent conductive body of alkali resistance and excellent electric conductivity.It transparent is led by using such in addition, can be provided in present disclosure
Electric body is so as to the touch screen that is easily manufactured.
Description of the drawings
Fig. 1 is the sectional view for an embodiment for showing schematically transparent conductive body.
Fig. 2 is the sectional view for the another embodiment for showing schematically transparent conductive body.
Fig. 3 is the schematic section for indicating the part amplification in the section of an embodiment of touch screen.
Fig. 4 (A) and Fig. 4 (B) is the plan view of the colorimetric sensor films for an embodiment for constituting touch screen.
The explanation of symbol
10 ... transparent resin base materials, 12 ... the 1st metal oxide layers, 14 ... the 2nd metal oxide layers, 16 ... metal layers,
15a, 15b ... sensor electrode, 20 ... hard conatings, 22 ... the 1st hard conatings, 24 ... the 2nd hard conatings, 50 ... conductor lines, 70 ...
Panel, 80 ... electrodes, 90 ... binders, 92 ... gaskets, 100,101 ... transparent conductive bodies, 100a ... Y colorimetric sensor films,
100b ... X colorimetric sensor films, 200 ... touch screens.
Specific implementation mode
It is following to explain the preferred embodiments of the present invention in detail while with reference to attached drawing.But the present invention is not
It is defined to any embodiment below.In addition, same symbol is assigned to same or same element in attached drawing, according to feelings
The repetitive description thereof will be omitted for condition.
Fig. 1 is the schematic section for an embodiment for indicating transparent conductive body.Transparent conductive body 100 has matches successively
It is equipped with the transparent resin base material 10 of film-form, the layer of the 1st metal oxide layer 12, metal layer 16 and the 2nd metal oxide layer 14
Stack structure.
" transparent " in this specification refers to visible light-transmissive, and light can also be made to scatter to a certain degree.For dissipating for light
Range degree, it is different according to the level required by the purposes of transparent conductive body 100.There is commonly known as translucent such light scattering
The case where also include " transparent " in this manual concept in.It is preferred that the scattering degree of light is small, and preferably clear is high.
The whole total light transmittance of transparent conductive body 100 is, for example, 80% or more, preferably 83% or more, further preferably 85% with
On.The total light transmittance is to use the obtained transmitance for including diffused transmission light of integrating sphere, can use commercially available haze meter
It is measured.
It as transparent resin base material 10, is not particularly limited, can be with flexible organic resin film.It is organic
Resin film can also be organic resin thin slice.As organic resin film, such as polyethylene terephthalate can be enumerated
The polyolefin film of polyester film, polyethylene and the polypropylene of ester (PET), polyethylene naphthalate (PEN) etc. etc. gathers
Carbonic ester film, acrylate film, norbornene film, polyarylate film, Polyethersulfone membranes, diacetyl cellulose film,
And triacetyl cellulose film etc..In these, preferably polyethylene terephthalate (PET) and poly- naphthalenedicarboxylic acid
The polyester film of glycol ester (PEN) etc..
From the viewpoint of rigidity, transparent resin base material 10 is preferred thick.On the other hand, from by 100 film of transparent conductive body
From the perspective of change, transparent resin base material 10 is preferably thin.From such a viewpoint, the thickness of transparent resin base material 10 is, for example,
10~200 μm.From the viewpoint of being made the excellent transparent conductive body of optical characteristics, the refractive index of transparent resin base material is, for example,
1.50~1.70.In addition, the value that the refractive index in this specification measures under conditions of λ=633nm, temperature are 20 DEG C.
Dimensional stability when transparent resin base material 10 preferably heats is high.It is flexible usually in film manufacturing process
Organic resin film generates the change in size as caused by expansion or shrinkage by heating.It, can when being stretched uniaxially or biaxially
With with the thin transparent resin base material 10 of low-cost production's thickness.When extraction forms electrode, if transparent conductive body 100 heated,
Change in size then occurs due to thermal contraction.Such change in size can be come according to ASTM D1204-02 or JIS-C-2151
It is measured.The front and back size changing rate of heat treatment is dimensioned to L before it will heato, by after heating size set
To be acquired with following formula when L.
Size changing rate (%)=100 × (L-Lo)/Lo
In the case where size changing rate (%) is positive number, indicate to be expanded by heat treatment；In the feelings of negative
Under condition, indicate to be shunk by heat treatment.The size changing rate of biaxial stretch-formed transparent resin base material 10 can drawn
Being measured into both line direction (directions MD) and lateral (directions TD) when stretching.The size changing rate example of transparent resin base material 10
It is -1.0~-0.3% such as in the directions MD, is -0.1~+0.1% in the directions TD.
Transparent resin base material 10 can also be imposed selected from Corona discharge Treatment, glow discharge process, flame treatment, ultraviolet light
The surface treatment of at least one for the treatment of with irradiation, electronbeam irradiation processing and ozone treatment.Transparent resin base material 10 can be with
It is resin film.By using resin film, transparent conductive body 100 can be made to the excellent electric conductor of flexibility.As a result, not
It is limited to the transparent conductive body of touch screen purposes, the transparent electrode for being also used as flexible organic EL illuminating etc. is used or electromagnetism wave screen
It covers.
For example, in the case where being used as transparent conductive body 100 to constitute the colorimetric sensor films of touch screen, transparent resin base material
10 can also moderately be deformed using with flexible organic resin film with the external input for finger and pen etc..
2nd metal oxide layer 14 is the oxidiferous transparent layer of packet, contains ZnO as principal component, and contain
In2O3And TiO2As accessory ingredient, TiO2Content relative to ZnO, In2O3And TiO2This 3 kinds of ingredients add up to 6~
15mol%.Principal component said here is in ZnO, In2O3And TiO2In this 3 kinds of ingredients, the content of molar basis is most
Ingredient.It is not the ingredient of principal component that accessory ingredient, which is in above-mentioned three components,.2nd metal oxide layer 14 is due to containing ZnO as master
Ingredient, therefore, economy are excellent.The 2nd of high electric conductivity and the high transparency is had both in addition, can also be formed without using ITO
Metal oxide layer 14.Even if as a result, without thermal annealing, the 2nd metal oxidation with low sheet resistance can also be made
Nitride layer 14.
Here, in the 2nd metal oxide layer 14, TiO2Content relative to the total of above-mentioned three components, from fully
It is 15mol% hereinafter, preferably 12mol% or less from the perspective of improving etching.In addition, in the 2nd metal oxide layer 14
In, TiO2Content relative to the total of above-mentioned three components, from the viewpoint of fully improving alkali resistance, be 6mol% with
On, preferably 8mol% or more.If TiO2Content it is excessive, then the stacking knot of the 2nd metal oxide layer 14 and metal layer 16
Structure becomes unable to etch, in addition, the electric conductivity of metal oxide layer can disappear.On the other hand, if TiO2Content it is very few, then
The alkali resistance of above-mentioned stepped construction reduces.
In the 2nd metal oxide layer 14, the content of ZnO is saturating from fully improving relative to the total of above-mentioned three components
It crosses from the perspective of rate and electric conductivity, for example, 73mol% or more, preferably 75mol% or more.In the 2nd metal oxide layer
In 14, the content of ZnO is relative to the total of above-mentioned three components, from the viewpoint of fully improving storage stability, for example,
84mol% is hereinafter, preferably 82mol% or less.If the content of ZnO is excessive, preserved under hot and humid environment
In the case of have the tendency that gonorrhoea easy tos produce.On the other hand, if the content of ZnO is very few, there are transmitance and electric conductivity drop
Low tendency.
In the 2nd metal oxide layer 14, In2O3Content relative to the total of above-mentioned three components, from fully improving
From the perspective of transmitance, for example, 18mol% is hereinafter, preferably 16mol% or less.In the 2nd metal oxide layer 14,
In2O3Content relative to the total of above-mentioned three components, from the viewpoint of fully improving storage stability, for example,
9mol% or more, preferably 11mol% or more.If In2O3Content it is excessive, then have the tendency that transmitance reduction.Another party
Face, if In2O3Content it is very few, then there is gonorrhoea to easy to produce in the case of preservation under hot and humid environment, and
The tendency that sheet resistance is got higher.
2nd metal oxide layer 14 has both ensuring for the adjusting of optical characteristics, the protection of metal layer 16 and electric conductivity
Function.2nd metal oxide layer 14 can contain in the range of not damaging its function significantly other than above-mentioned three components
Micro constitutent or inevitable ingredient.But go out from the viewpoint that the transparent conductive body 100 with very high characteristic is made
It sends out, total ratio of 3 kinds of ingredients is high in preferably the 2nd metal oxide layer 14.The ratio is, for example, 95mol% or more, preferably
For 97mol% or more.In addition, the 2nd metal oxide layer 14 is preferably free of ITO.
1st metal oxide layer 12 and the 2nd metal oxide layer 14 can be identical in terms of thickness, structure and composition,
It can also be different.The record of composition about the 2nd metal oxide layer 14 can also be directly applied for the 1st metal oxide layer
12.1st metal oxide layer 12 is by having composition identical with the 2nd metal oxide layer 14, so as to pass through etching one
It rises and removes the 1st metal oxide layer 12, metal layer 16 and the 2nd metal oxide layer 14.Furthermore it is possible to further increase transparent
Property, corrosion resistance and alkali resistance.
1st metal oxide layer 12 can also have the composition different from the 2nd metal oxide layer 14.In this case,
Etching only removes the 2nd metal oxide layer 14 and metal layer 16, and the 1st metal oxide layer 12 can directly be made to remain.
The thickness of 1st metal oxide layer 12 and the 2nd metal oxide layer 14, from as the thickness suitable for various touch screens
From the perspective of degree, for example, 10~70nm.
1st metal oxide layer 12 and the 2nd metal oxide layer 14 can pass through vacuum vapour deposition, sputtering method, ion
The vacuum film formations such as coating method or CVD method are made.In these, from can by film forming room minimize viewpoint and at
The fireballing viewpoint of film is set out, preferably sputtering method.As sputtering method, DC magnetron sputterings can be enumerated.As target, can use
Oxide target, metal or semimetal target.
Wiring electrode etc. can also be set on the 2nd metal oxide layer 14.By the electric current of aftermentioned metal layer 16 from
Wiring electrode on the 2nd metal oxide layer 14 etc. is set to be connected via the 2nd metal oxide layer 14.2nd metal oxygen as a result,
Compound layer 14 preferably has high electric conductivity.From such a viewpoint, the sheet resistance value of 14 monofilm of the 2nd metal oxide layer
Such as preferably 1.0 × 10+7Ω/ (=1.0E+7 Ω/sq.) is hereinafter, further preferably 5.0 × 10+6Ω/ or less.
Metal layer 16 is the layer for including silver alloy as principal component.There is high electric conductivity by metal layer 16, so as to
Fully to reduce the sheet resistance of transparent conductive body 100.As the metallic element for constituting silver alloy, Ag can be enumerated and be selected from
It is at least one kind of in Pd, Cu, Nd, In, Sn and Sb.As the example of silver alloy, Ag-Pd, Ag-Cu, Ag-Pd- can be enumerated
Cu, Ag-Nd-Cu, Ag-In-Sn and Ag-Sn-Sb.
Metal layer 16 can also contain additive other than silver alloy.Additive preferably can be easily by etching solution
It is removed.The content of silver alloy in metal layer 16 for example can be 90 mass % or more, or 95 mass % or more.Gold
The thickness for belonging to layer 16 is, for example, 1~30nm.It improves from the sheet resistance for fully reducing transparent conductive body 100 and fully total
From the perspective of light transmittance, the thickness of metal layer 16 is preferably 4~11nm.If the thickness of metal layer 16 is excessive, tend to
Total light transmittance reduces.On the other hand, if the thickness of metal layer 16 is too small, have the tendency that sheet resistance is got higher.
Metal layer 16 has the function of adjusting the total light transmittance and sheet resistance of transparent conductive body 100.Metal layer 16 can
To be made by vacuum film formations such as vacuum vapour deposition, sputtering method, ion plating method or CVD method.In these, from energy
From the perspective of enough viewpoints for minimizing film forming room and film forming speed are fast, preferably sputtering method.As sputtering method, Ke Yilie
Lift DC magnetron sputterings.As target, metallic target can be used.
At least part of the 1st metal oxide layer 12 and the 2nd metal oxide layer 14 in transparent conductive body 100 with
And at least part of metal layer 16 can pass through the removings such as etching.
Fig. 2 is the schematic section for the another embodiment for indicating transparent conductive body.Transparent conductive body 101 is to clip
The mode of transparent resin base material 10 and the aspect that has a pair of of hard conating 20 is different from transparent conductive body 100.It is other composition with thoroughly
Bright electric conductor 100 is identical.
Transparent conductive body 101 is as a pair of of hard conating 20 in 12 side of the 1st metal oxide layer of transparent resin base material 10
Have on interarea the 1st hard conating 22 and on the interarea of the 12 side opposite side of the 1st metal oxide layer of transparent resin base material 10
Has the 2nd hard conating 24.That is, transparent conductive body 101, which has, is sequentially laminated with the 2nd hard conating 24, transparent resin base material the 10, the 1st
Stepped construction made of hard conating 22, the 1st metal oxide layer 12, metal layer 16 and the 2nd metal oxide layer 14.1st is hard
Thickness, structure and the composition of coating 22 and the 2nd hard conating 24 may be the same or different.In addition, being also not necessarily required to have
Both 1st hard conating 22 and the 2nd hard conating 24, can also only have any one.
By the way that hard conating 20 is arranged, the wound generated on transparent resin base material 10 can be adequately suppressed.Hard conating 20 contains
Resin cured matter obtained from making resin combination cure.Resin combination preferably comprise selected from hot curing resin composition,
At least one of ultra-violet solidified resin composition and electron ray curing resin combination.Heat-curing resin group
It can includes selected from least one of epoxylite, phenol oxygen resinoid and melamine resinoid to close object.
Resin combination is, for example, containing consolidating with energy-rays reactive groups such as (methyl) acryloyl group, vinyl
The composition of the property changed compound.In addition, it includes acryloyl group and methylacryloyl that the statement of (methyl) acryloyl group, which refers to,
It is at least one.It is anti-that curability compound preferably is contained in the energy-ray that 1 intramolecular contains 2 or more, preferably 3 or more
The polyfunctional monomer or oligomer of answering property group.
Curability compound preferably comprises acrylic monomer.As acrylic monomer, specifically, 1 can be enumerated,
6- hexylene glycols two (methyl) acrylate, triethylene glycol (methyl) acrylate, ethylene oxide denatured bisphenol-A two (methyl) propylene
Acid esters, trimethylolpropane tris (methyl) acrylate, trimethylolpropane ethylene oxide denatured three (methyl) acrylate, three
Hydroxymethyl-propane propylene oxide is modified three (methyl) acrylate, pentaerythrite four (methyl) acrylate, double trihydroxy methyls third
Alkane four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate, season penta
(methyl) acrylate of tetrol three and 3- (methyl) acryloyl-oxy base glycerol list (methyl) acrylate etc..But not necessarily
It is defined in these.For example, it is also possible to enumerate polyurethane-modified polyacrylate and epoxy-modified acrylate etc..
As curability compound, the compound with vinyl can also be used.As the compound with vinyl,
Such as ethylene glycol divinyl ether, pentaerythrite divinyl ether, 1,6-HD divinyl ether, trihydroxy methyl can be enumerated
Propane divinyl ether, ethylene oxide denatured quinhydrones divinyl ether, ethylene oxide denatured bisphenol-A divinyl ether, Ji Wusi
Alcohol trivinyl ether, six vinyl ethers of dipentaerythritol and double trimethylolpropane polyvingl ether etc..But not necessarily
It is defined to these.
Keep curability compound cured by ultraviolet light, resin combination includes Photoepolymerizationinitiater initiater.Make
For Photoepolymerizationinitiater initiater, various substances can be used.Such as can from acetophenones, benzoin class, benzophenone and
It is suitably selected in compound well known to thioxanthene ketone class etc..More specifically, DAROCUR 1173, IRGACURE can be enumerated
651, IRGACURE 184, IRGACURE 907 (are trade name, Ciba Specialty Chemicals Inc. systems above
Make) and KAYACURE DETX-S (trade name, Nippon Kayaku K. K's manufacture).
Photoepolymerizationinitiater initiater can be 0.01~20 mass % or 0.5~5 matter relative to the quality of curability compound
Measure % or so.Resin combination can also be the well known resin combination for being added in acrylic monomer and having Photoepolymerizationinitiater initiater
Object.There is the resin combination of Photoepolymerizationinitiater initiater as being added in acrylic monomer, such as can enumerate as ultraviolet light
The SD-318 (trade name, Dainippon Ink and Chemicals Co., manufacture) of gel-type resin and XNR5535 (quotient
The name of an article, Nagase Industrial Co., Ltd.'s manufacture) etc..
Apply film strength in order to improve and/or adjust refractive index etc., resin combination can also contain organic fine particles and/or
Inorganic particles.As organic fine particles, such as organic silicone microparticle, cross-linked acrylic acid particle and crosslinked polystyrene can be enumerated
Particle etc..As inorganic particles, for example, can enumerate silicon oxide particle, alumina particulate, zirconia particles, titanium oxide microparticle,
And ferric oxide particles etc..Wherein, preferably silicon oxide particle.
Particle preferably its surface is handled with silane coupling agent, and (methyl) acryloyl group and/or vinyl etc.
Energy-ray reactive group is on surface with membranaceous presence.If using having such reactive particle, penetrated in energy
Particle reacts with each other when line irradiates or particle is reacted with polyfunctional monomer or oligomer, so as to enhance film strength.
It is preferable to use with the silane coupling agent that contains (methyl) acryloyl group treated silicon oxide particle.
The average grain diameter of particle is smaller than the thickness of hard conating 20, from the viewpoint of ensuring the adequately transparency, Ke Yiwei
100nm or less, or 20nm or less.On the other hand, from the viewpoint of in the manufacture of colloidal solution, can be 5nm with
On, or 10nm or more.Using organic fine particles and/or inorganic particles, organic fine particles and inorganic particles
Total amount is, for example, 5~500 mass parts relative to the curability compound of 100 mass parts, or 20~200 mass parts.
If used with energy ray curing resin combination, by irradiating the energy-rays such as ultraviolet light, can make
Resin combination cures.Therefore, from the viewpoint of in manufacturing process, it is also preferred that using such resin combination.
The solution of resin combination or dispersion liquid can be coated on a face of transparent resin base material 10 by the 1st hard conating 22
On, drying simultaneously makes resin combination solidification to be made.Coating at this time can be carried out by well known method.As painting
Cloth method, such as extrusion nozzle method, scraper plate rubbing method (blade method), scraper for coating method (knife can be enumerated
Method), stick coating method, contact rubbing method, contact reversion rubbing method, gravure roll rubbing method, infusion process, reverse roll coating
Method, direct rolling method, curtain coating processes and extrusion etc..2nd hard conating 24 also can be saturating in the same manner as the 1st hard conating 22
It is made on another face of bright resin base material 10.
The thickness of 1st hard conating 22 and the 2nd hard conating 24 is, for example, 0.5~10 μm.If thickness is more than 10 μm, there is appearance
The tendency of in uneven thickness or wrinkle etc. easily occurs.On the other hand, if thickness is less than 0.5 μm, in transparent resin base material 10
In containing the low molecular weight compositions such as considerable amount of plasticizer or oligomer in the case of, exist and be difficult to be adequately suppressed these ingredients
Exudation the case where.In addition, from the viewpoint of inhibiting to be bent, the thickness of the 1st hard conating 22 and the 2nd hard conating 24 is preferably identical
Degree.
The refractive index of 1st hard conating 22 and the 2nd hard conating 24 is, for example, 1.40~1.60.Transparent resin base material 10 and the 1st
The absolute value of the difference of the refractive index of hard conating 22 is preferably 0.1 or less.The refractive index of transparent resin base material 10 and the 2nd hard conating 24
Absolute value of the difference be preferably also 0.1 or less.By reducing the 1st hard conating 22 and the 2nd hard conating 24 and transparent resin base material 10
Refractive index absolute value of the difference, can inhibit to occur due to the uneven of the thickness of the 1st hard conating 22 and the 2nd hard conating 24
The uneven intensity of interference.
Constituting the thickness of each layer of transparent conductive body 100,101 can be measured according to following step.Pass through focusing
Ion beam apparatus (FIB, Focused Ion Beam) cut-out transparent conductive body 100,101 obtains section.It is aobvious using transmitted electron
Micro mirror (TEM) observes the section, measures the thickness of each layer.Measurement is preferably surveyed optional 10 or more positions
It is fixed, and acquire its average value.As the method for obtaining section, can also use slicer as focused ion beam apparatus other than
Device.As the method for measuring thickness, scanning electron microscope (SEM) can also be used.Alternatively, it is also possible to use fluorescence X to penetrate
Line apparatus measures film thickness.
The thickness of transparent conductive body 100,101 can be 200 μm or less, or 150 μm or less.As long as being such
Thickness, so that it may horizontal with the requirement for fully meeting thinning.The total light transmittance of transparent conductive body 100,101 can be such as 85%
Above high value.In addition, the sheet resistance value (4 terminal method) of transparent conductive body 100,101 without the 1st metal even if aoxidize
The thermal annealing of nitride layer 12 and the 2nd metal oxide layer 14, or such as 30 Ω/ or less, or 25 Ω/ with
Under.
Have above-mentioned composition transparent conductive body 100,101 have be laminated with the 1st metal oxide layer 12, metal layer 16 with
And the 2nd metal oxide layer 14 stepped construction.The stepped construction can be removed easily together using common etching solution.Separately
Outside, there is high transmitance, and there is high electric conductivity without thermal annealing.Thus, it is possible to be preferably used as touching
The colorimetric sensor films of screen are used.
Fig. 3 is that amplification indicates the schematic section for having the part in the section of the touch screen 200 of a pair of sensors film.
Fig. 4 (A) and Fig. 4 (B) is the plan view of the colorimetric sensor films 100a and 100b that have used above-mentioned transparent conductive body 100.Touch screen
200 have a pair of sensors film 100a, the 100b being oppositely disposed by optical cement 18.Touch screen 200 is can will contact
The touch location of body is (horizontal as the coordinate position being parallel in two-dimensional coordinate (X-Y coordinate) plane of the panel 70 as picture
To position and lengthwise position) calculate mode and constitute.
Specifically, touch screen 200 has the colorimetric sensor films of the lengthwise position detection attached by optical cement 18
(hereinafter referred to as " X is passed by 100a (hereinafter referred to as " Y colorimetric sensor films ") and the colorimetric sensor films 100b of lateral position detection
Sensor film ").In the sides below colorimetric sensor films 100b X, in X colorimetric sensor films 100b and the panel of display device 70
Between be provided with gasket 92.
The sides the upper surface of Y colorimetric sensor films 100a (with 70 side opposite side of panel) are provided with cloche by optical cement 17
19.I.e. touch screen 200 has on panel 70 is configured in order X colorimetric sensor films 100b, Y sensings since 70 side of panel
The stepped construction of device film 100a and cloche 19.
The Y of detection lengthwise position is with colorimetric sensor films 100a and the X of detection lateral position with colorimetric sensor films 100b by upper
State the composition of transparent conductive body 100.Y is with colorimetric sensor films 100a and X colorimetric sensor films 100b with the side opposite with cloche 19
Formula has the sensor electrode 15a and sensor electrode 15b as conductive part.
Sensor electrode 15a is made of the 1st metal oxide layer 12, the 2nd metal oxide layer 14 and metal layer 16.
As shown in Fig. 4 (A), sensor electrode 15a is in a manner of it can detect the touch location in longitudinal direction (directions y) in longitudinal direction (directions y)
On be extended with it is multiple.Multiple sensor electrode 15a are configured with being arranged parallel to each other along longitudinal direction (directions y).Sensor electrode 15a
One end connect with the electrode 80 of the sides driving IC by the conductor line 50 formed with silver paste.
The X for detecting lateral position is that the opposite face of Y colorimetric sensor films 100a has sensing with colorimetric sensor films 100b
Device electrode 15b.Sensor electrode 15b is by the 1st metal oxide layer 12,16 structure of the 2nd metal oxide layer 14 and metal layer
At.As shown in Fig. 4 (B), sensor electrode 15b is in a manner of it can detect the touch location in transverse direction (directions x) in the transverse direction (side x
To) on be extended with it is multiple.Multiple sensor electrode 15b are configured with being arranged parallel to each other along transverse direction (directions x).Sensor electrode
One end of 15b is connect by the conductor line 50 formed with silver paste with the electrode 80 of the sides driving IC.
Y with colorimetric sensor films 100a and X with colorimetric sensor films 100b from Y colorimetric sensor films 100a and X sensors
Weight is carried out by optical cement 18 in such a way that each sensor electrode 15a, 15b are mutually orthogonal when the stacking direction of film 100b is seen
It is folded.Y colorimetric sensor films 100a is being provided with cloche 19 with the sides the colorimetric sensor films 100b opposite sides X by optical cement 17.
Optical cement 17,18, cloche 19 and panel 70 can use common substance.
Conductor line 50 and electrode 80 in Fig. 4 (A), (B) can be by the conductive material structures of metal (such as Ag) etc.
At.Conductor line 50 and electrode 80 can be formed for example, by silk-screen printing to carry out pattern.
The shape and quantity of sensor electrode 15a, 15b in each colorimetric sensor films 100a, 100b are not limited to Fig. 3, Fig. 4
(A) and form shown in Fig. 4 (B).For example, it is also possible to increase the quantity of sensor electrode 15a, 15b to improve touch location
Accuracy of detection.
X colorimetric sensor films 100b is being provided with panel 70 with the sides the colorimetric sensor films 100a opposite sides Y by gasket 92.
Gasket 92 can be set to the position corresponding to the shape of sensor electrode 15a, 15b and surround sensor electrode 15a, 15b
Whole position.Gasket 92 can be by the material with translucency, such as PET (polyethylene terephthalate) resin shape
At.One end of gasket 92 has binder 90 of translucency by optical cement or acrylic compounds or epoxies etc. by is adhered to X
Below colorimetric sensor films 100b.The other end of gasket 92 is adhered to the panel 70 of display device by binder 90.This
Sample, by being oppositely disposed X colorimetric sensor films 100b and panel 70 via gasket 92, so as in X colorimetric sensor films
Gap S is set between 100b and the panel of display device 70.
Control unit (IC) is electrically connected on electrode 80.It is measured respectively since the Y sensors of finger tip and touch screen 200 are thin
The variation of static capacity between film 100a and the volume change of each sensor electrode 15a, 15b generated.Control unit can be with base
In measurement result using the touch location of contact as coordinate position (intersection point of the position of X-direction and the position of Y direction)
And it calculates.In addition, the driving method of sensor electrode and the calculation method of coordinate position can also use in addition to the foregoing
Well known various methods.
Touch screen 200 can be manufactured according to sequence below.After having prepared transparent conductive body 100, the 1st is carried out
The etching of metal oxide layer 12, metal layer 16 and the 2nd metal oxide layer 14 carries out pattern making.Specifically, it uses
The technology of photoetching is coated with erosion resistant on the surface of the 2nd metal oxide layer 14 by rotary coating.Thereafter, close in order to improve
The property can also carry out prebake conditions.Then, it configures mask pattern and is exposed, with developing liquid developing, resist pattern is consequently formed
Case.The formation of corrosion-resisting pattern is not limited to photoetching, can also be formed by silk-screen printing etc..
Then, the transparent conductive body 100 for being formed with corrosion-resisting pattern is impregnated in acidic etching liquid, dissolving is removed and do not formed
The 1st metal oxide layer 12, the 2nd metal oxide layer 14 and metal layer 16 in the part of corrosion-resisting pattern.Thereafter, it removes anti-
Agent is lost, so as to obtain the Y colorimetric sensor films 100a for being formed with sensor electrode 15a and be formed with sensor electrode 15b
X colorimetric sensor films 100b.
It is different compositions to make the 1st metal oxide layer 12 and the 2nd metal oxide layer 14, if the 1st metal is made to aoxidize
Nitride layer 12 is not to be etched the composition of removing, then is etched together to metal layer 16 and the 2nd metal oxide layer 14, after the etching
The 1st metal oxide layer 12 can also directly be remained.As etching solution, the etching solution of inorganic acids can be used.For example, it is preferable to
For the etching solution of phosphoric acid class.
Then, metal lotion of the coating such as silver alloy lotion forms conductor line 50 and electrode 80.It as a result, will control
Portion's (not illustrating) processed and sensor electrode 15a, 15b electrical connection.Then, using optical cement 18 by Y colorimetric sensor films 100a
With X with colorimetric sensor films 100b by each sensor electrode 15a, 15b towards attaching in a manner of unidirectional.In this case,
When from the point of view of the Y colorimetric sensor films 100a and X laminating methods of colorimetric sensor films 100b, with sensor electrode 15a, 15b
Mutually orthogonal mode attaches.Then, cloche 19 and Y colorimetric sensor films 100a are attached using optical cement 17.Thus, it is possible to
Manufacture touch screen 200.
In touch screen 200, transparent conductive body is used as Y colorimetric sensor films 100a and X colorimetric sensor films 100b
100.Transparent conductive body 100 can by etch together remove the 1st metal oxide layer 12, the 2nd metal oxide layer 14 and
Metal layer 16.Thus, it is possible to the manufacturing process of simple touch screen 200, to which touch screen 200 be easily manufactured.
In addition, need not all use electrically conducting transparent for both Y colorimetric sensor films 100a and X colorimetric sensor films 100b
Body 100, any one can also use other transparent conductive bodies.Even such touch screen can also make display abundant
Clearly.In addition, as colorimetric sensor films, transparent conductive body 101 can not also be used using transparent conductive body 100.
In this way, preferably transparent conductive body 100,101 can be used for touch screen.But purposes is not limited to touch
Screen, for example, can the 1st metal oxide layer 12, the 2nd metal oxide layer 14 and metal layer 16 be passed through etching and processing established practice
Shape shape, forms the part (conductive part) with the 1st metal oxide layer 12, the 2nd metal oxide layer 14 and metal layer 16
With the part (non-conductive portion) without the 1st metal oxide layer 12, the 2nd metal oxide layer 14 and metal layer 16, in liquid
Crystal display (LCD), plasma display panel (PDP), electroluminescence panel (organic EL, inorganic EL), electric driven color-changing part,
And it is used as transparent electrode use, antistatic use, electromagnetic wave shielding in the various display devices such as Electronic Paper and uses.Alternatively, it is also possible to make
It is used for antenna.
The preferred embodiments of the present invention is explained above, but the present invention is not limited to above-mentioned embodiments.Example
Such as, above-mentioned transparent conductive body 101 has a pair of of hard conating 20, but can also only have the 1st hard conating 22 and the 2nd hard conating
Any one in 24.Alternatively, it is also possible to be provided with hard conating on transparent resin base material 10 a face, on the other surface
By being coated with, multiple optical adjustment layers are set.In this case, the 1st metal oxide layer 12, metal layer 16 and the 2nd metal oxygen
Compound layer 14 can also be set in the optical adjustment layer.Further, transparent conductive body 100,101 can not damage it significantly
Arbitrary layer is set in arbitrary position in addition to above-mentioned layer in the range of function.
Embodiment
It is exemplified below embodiment and comparative example further illustrates the present invention, but the present invention is not limited to these implementations
Example.
[embodiment 1~13]
(making of transparent conductive body 101)
Make transparent conductive body as shown in Figure 2.Transparent conductive body, which has to be sequentially laminated with, to be clipped by a pair of of hard conating
The stepped construction of transparent resin base material, the 1st metal oxide layer, metal layer and the 2nd metal oxide layer.It is wanted according to below
Neck makes the transparent conductive body of each embodiment.
Prepare pet film that thickness is 100 μm (Toray Industries, Inc. make,
Part number：U48).The PET film is used as transparent resin base material.The 1st hard conating and the 2nd is modulated according to sequence below firmly
The coating of coating making.
First, prepare raw material below.
Reactive group modified colloidal sifica (decentralized medium：Propylene glycol monomethyl ether, it is non-volatile at
Point：40 weight %)：100 parts by weight
Dipentaerythritol hexaacrylate：48 parts by weight
1,6 hexanediol diacrylate：12 parts by weight
Photoepolymerizationinitiater initiater (1- hydroxycyclohexyl phenyl ketones)：2.5 parts by weight
Above-mentioned raw material are diluted and mixed with solvent (propylene glycol monomethyl ether (PGMA)), each ingredient is made to be scattered in solvent
In.Modulation nonvolatile component (NV) is the coating of 25.5 weight % as a result,.By thus obtained coating be used as the 1st hard conating and
The coating of 2nd hard conating making.
It is coated with the coating of the 1st hard conating making on a face of transparent resin base material, makes coated film.It is being set as
After removing the solvent in coated film in 80 DEG C of hot-air drying stove, is irradiated using UV processing units and add up light quantity as 400mJ/
cm2Ultraviolet light, so that coated film is cured.The 1st hard painting that thickness is 5 μm is made on a face of transparent resin base material as a result,
Layer.The 2nd hard conating that thickness is 5 μm is similarly made on another face of transparent resin base material.
The 1st metal oxide layer, metal layer and the 2nd metal are sequentially formed by DC magnetron sputterings on the 1st hard conating
Oxide skin(coating).1st metal oxide layer and the 2nd metal oxide layer are used with the ZnO-In formed shown in table 12O3-
TiO2Target is formed.The 1st metal oxide layer and the 2nd metal oxide layer in each embodiment, which use, has same composition
Target formed.The composition of the 1st metal oxide layer and the 2nd metal oxide layer in each embodiment is as shown in table 1.Each reality
The thickness for applying the 1st metal oxide layer and the 2nd metal oxide layer in example is 50nm.
In whole embodiment shown in table 1, metal layer uses AgPdCu (Ag:Pd:Cu=99.0:0.5:0.5 (matter
Amount %)) target formed.The thickness of metal layer 16 is 5nm.
(evaluation of transparent conductive body 101)
According to sequence evaluating etching characteristic below.First, prepare the PAN systems etching solution containing phosphoric acid, acetic acid, nitric acid.
It impregnates the transparent conductive body of each embodiment at room temperature in the etching solution 1 minute, is etched.Thereafter, total light transmittance is carried out
It measures, whether the 1st metal oxide layer of judgement, metal layer and the 2nd metal oxide layer dissolve.It specifically, will be after etching
The total light transmittance of sample be only determined as " A " with the total light transmittance unanimous circumstances of transparent resin base material, by inconsistent situation
It is determined as " B ".Total light transmittance (transmitance) uses haze meter (trade name：NDH-7000, Japanese electricity Se industrial groups manufacture) come
It measures.Evaluation result is as shown in table 1.
In addition, according to sequence evaluating alkali resistance below.Prepare the KOH solution of a concentration of 3wt%.In the aqueous slkali
The transparent conductive body of each embodiment is impregnated 2 minutes at room temperature.Thereafter, total light transmittance measurement is carried out, judges the 1st metal oxide
Whether layer, metal layer and the 2nd metal oxide layer dissolve.Specifically, the total light transmittance of the sample after aqueous slkali being impregnated
It is determined as " A " with the total light transmittance unanimous circumstances before dipping, inconsistent situation is determined as " B ".Total light transmittance (penetrates
Rate) use haze meter (trade name：NDH-7000, the manufacture of Japanese electricity Se industrial groups) it measures.Evaluation result is as shown in table 1.
Use 4 terminal resistance rate meter (trade names：Loresta GP, Mitsubishi chemical Co., Ltd's manufacture) measure each embodiment
Sheet resistance.It shows the result in table 1.In table 1, " sheet resistance (1) " is by transparent conductive body in 85 DEG C, 85%RH
Sheet resistance value before being preserved 50 hours in the environment of (relative humidity 85%), " sheet resistance (2) " are protected under above-mentioned environment
Sheet resistance value after depositing.
After the transparent conductive body of each embodiment is preserved in the environment of 85 DEG C, 85%RH, preserved by visual observation
The evaluation of stability.It will see that the case where being determined as " B " the case where gonorrhoea, not seeing is determined as in transparent conductive body
“A”.The results are shown in Table 1.
[table 1]
As shown in table 1, etching characteristic and alkali resistance are evaluated as " A " in whole embodiments.It thereby confirms that, it is real
The metal oxide layer and metal layer applied in the transparent conductive body of example 1~13 can be removed easily, and with excellent resistance to
Alkalinity.The transparent conductive body total light transmittance of embodiment 12,13 is slightly lower, this is because In2O3Containing ratio it is high, therefore, absorptivity increases
The reason added.However, if it is the total light transmittance, as long as do not seek the horizontal transparency high in this way such as noise piece
Purposes (for example, noise shielding etc.) is to the level fully used.
In order to evaluate the characteristic of metal oxide layer, only metal oxide layer (single layer) is made in the same manner as above-mentioned sequence
Sample.The evaluation of the sample is carried out similarly with above-mentioned sequence.By evaluation, results are shown in Table 2.In addition, the suction of table 2
Yield is to use the measurement result of the transmitance and reflectivity that are measured with optical splitter with 100- transmitances-reflectivity=absorptivity
The value that formula acquires.The absorptivity is the value under wavelength 380nm.
[table 2]
As shown in table 2, it is thus identified that even if the metal oxide layer of each embodiment contains ZnO as principal component, by containing
In2O3And TiO2As accessory ingredient, and it is defined TiO2Containing ratio, to which corrosion resistance and alkali resistance can also be taken into account
It improves and high electric conductivity.In addition, it is thus identified that if by ZnO and In2O3Content be set as preferred range, then absorptivity is filled
Divide low.
[embodiment 14~24]
The composition of target when in addition to change making metal layer, and the composition of change metal layer and/or change as shown in table 3
Other than the thickness of metal layer, transparent conductive body is made similarly to Example 1.That is, changing metal in embodiment 14~20
The thickness of layer.In embodiment 21, AgNdCu (Ag are used:Nd:Cu=99.0:0.5:0.5 (quality %)) target forms metal
Layer.In embodiment 22, AgInSn (Ag are used:In:Sn=99.0:0.5:0.5 (quality %)) target forms metal layer.In reality
It applies in example 23, uses AgSnSb (Ag:Sn:Sb=99.0:0.5:0.5 (quality %)) target forms metal layer.In embodiment 24
In, use AgCu (Ag:Cu=99.5:0.5 (quality %)) target forms metal layer.
The evaluation of the transparent conductive body of embodiment 14~24 obtained is carried out similarly to Example 1.Evaluation result such as table 3
It is shown.In addition, the composition and thickness of the metal oxide layer of embodiment 14~24 are same as Example 1.
[table 3]
According to shown in table 3 as a result, in any embodiment the evaluation of etching characteristic and alkali resistance all be " A ".Thus
It confirmed, the metal oxide layer and metal layer in the transparent conductive body of embodiment 14~24 can be removed easily, and be had
There is excellent alkali resistance.In addition, if the thickness of metal layer becomes larger, confirmation has the tendency that sheet resistance becomes smaller, and has total
The tendency that light transmittance reduces.In addition, in the case where silver alloy contains Pd, confirm that storage stability is especially excellent.
[comparative example 1~7]
In addition to being used with shown in table 4 as target when forming the 1st metal oxide layer and 2 metal oxide layer
Other than the target of composition, the transparent conductive body of comparison example 1~4 similarly to Example 1.In each comparative example, the 1st metal
Oxide skin(coating) and the 2nd metal oxide layer are formed using the target of composition having the same.The 1st metal oxidation in each comparative example
The composition of nitride layer and the 2nd metal oxide layer is as shown in table 4.The electrically conducting transparent of each comparative example is had rated similarly to Example 1
Each characteristic of body.The results are shown in Table 4.
[table 4]
As shown in table 4, it is thus identified that although with ZnO-In is contained2O3-TiO2Three kinds of ingredients, but have TiO2Contain
There is the transparent conductive body of metal oxide layer of the rate outside the range of the present application that cannot take into account etching characteristic and alkali resistance.
The possibility utilized in industry
According to content of this disclosure, can provide can easily remove metal oxide layer and metal layer by etching,
And alkali resistance is excellent and high transmittance, low-resistance transparent conductive body.In addition, according to content of this disclosure, by using this
The transparent conductive body of sample can provide the touch screen that can be easily manufactured.
Claims (6)
1. a kind of transparent conductive body, wherein
It is sequentially laminated with transparent resin base material, the 1st metal oxide layer, the metal layer containing silver alloy and the oxidation of the 2nd metal
Nitride layer,
2nd metal oxide layer contains ZnO as principal component, and contains In2O3And TiO2As accessory ingredient,
TiO2Content relative to ZnO, In2O3And TiO2This 3 kinds of ingredients add up to 6~15mol%,
In the 2nd metal oxide layer, the content of ZnO is relative to ZnO, In2O3And TiO2This 3 kinds of ingredients add up to
73~84mol%, In2O3Content add up to 9~18mol% relative to 3 kinds of ingredients.
2. transparent conductive body as described in claim 1, wherein
The thickness of the metal layer is 4~11nm.
3. transparent conductive body as described in claim 1, wherein
1st metal oxide layer contains ZnO as principal component, and contains In2O3And TiO2As accessory ingredient, TiO2Contain
Amount is relative to ZnO, In2O3And TiO2This 3 kinds of ingredients add up to 6~15mol%.
4. transparent conductive body as claimed in claim 2, wherein
1st metal oxide layer contains ZnO as principal component, and contains In2O3And TiO2As accessory ingredient, TiO2Contain
Amount is relative to ZnO, In2O3And TiO2This 3 kinds of ingredients add up to 6~15mol%.
5. transparent conductive body as described in any one of claims 1 to 4, wherein
The silver alloy is Ag and the alloy selected from least one of Pd, Cu, Nd, In, Sn and Sb metals.
6. a kind of touch screen, wherein
The touch screen has colorimetric sensor films on panel, and the colorimetric sensor films are described in any one of Claims 1 to 5
Transparent conductive body constitute.
Applications Claiming Priority (2)
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|---|---|---|---|
| JP2014-248808 | 2014-12-09 | ||
| JP2014248808A JP6390395B2 (en) | 2014-12-09 | 2014-12-09 | Transparent conductor and touch panel |
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| CN105700735B true CN105700735B (en) | 2018-10-09 |
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| JP (1) | JP6390395B2 (en) |
| KR (1) | KR101737778B1 (en) |
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| US20190393585A1 (en) * | 2017-01-25 | 2019-12-26 | Tdk Corporation | Transparent conductive film for antennas |
| WO2019130841A1 (en) * | 2017-12-28 | 2019-07-04 | 日東電工株式会社 | Light-transmissive electrically conductive film, method for manufacturing same, light control film, and light control member |
| CN111758067B (en) * | 2018-02-23 | 2023-04-21 | Tdk株式会社 | Transparent conductor, light adjuster and electronic device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09291355A (en) * | 1996-04-26 | 1997-11-11 | Asahi Glass Co Ltd | Transparent conductive film-provided substrate and its production |
| CN1442872A (en) * | 2003-04-17 | 2003-09-17 | 上海交通大学 | Multilayer nano transparent conductive membrane and its preparation method |
| CN102747334A (en) * | 2012-07-30 | 2012-10-24 | 中国科学院宁波材料技术与工程研究所 | Zinc-oxide-based transparent conductive film and preparation method thereof |
| CN103510047A (en) * | 2013-10-21 | 2014-01-15 | 研创应用材料（赣州）有限公司 | Method for preparing novel conductive indium tin oxide material and film thereof |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08264021A (en) * | 1995-03-26 | 1996-10-11 | Gunze Ltd | Transparent conductive film |
| JP3785676B2 (en) * | 1996-04-26 | 2006-06-14 | 旭硝子株式会社 | Substrate with transparent conductive film and method for producing the same |
| JP2000351170A (en) | 1999-06-10 | 2000-12-19 | Gunze Ltd | Transparent conductive laminate |
| US6787240B2 (en) * | 2000-06-23 | 2004-09-07 | Donnelly Corporation | Enhanced light transmission conductive coated transparent substrate |
| JP4376474B2 (en) | 2001-04-17 | 2009-12-02 | グンゼ株式会社 | Transparent conductive film |
| TWI353304B (en) * | 2007-10-23 | 2011-12-01 | Sino American Silicon Prod Inc | Transparent conductive component utilized in touch |
| JP2010157497A (en) * | 2008-12-02 | 2010-07-15 | Geomatec Co Ltd | Substrate with transparent conductive film and method of manufacturing the same |
| JP2012132089A (en) * | 2010-02-22 | 2012-07-12 | Sumitomo Chemical Co Ltd | Method for forming electrically conductive transparent zinc oxide-based film, electrically conductive transparent zinc oxide-based film and electrically conductive transparent substrate |
-
2014
- 2014-12-09 JP JP2014248808A patent/JP6390395B2/en active Active
-
2015
- 2015-12-07 TW TW104140948A patent/TW201626408A/en unknown
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09291355A (en) * | 1996-04-26 | 1997-11-11 | Asahi Glass Co Ltd | Transparent conductive film-provided substrate and its production |
| CN1442872A (en) * | 2003-04-17 | 2003-09-17 | 上海交通大学 | Multilayer nano transparent conductive membrane and its preparation method |
| CN102747334A (en) * | 2012-07-30 | 2012-10-24 | 中国科学院宁波材料技术与工程研究所 | Zinc-oxide-based transparent conductive film and preparation method thereof |
| CN103510047A (en) * | 2013-10-21 | 2014-01-15 | 研创应用材料（赣州）有限公司 | Method for preparing novel conductive indium tin oxide material and film thereof |
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| KR20160070018A (en) | 2016-06-17 |
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| KR101737778B1 (en) | 2017-05-19 |
| JP2016110899A (en) | 2016-06-20 |
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