CN105698850A - An experiment system and an experiment method used for studying dielectric barrier discharge processing of SF[6] gases - Google Patents

An experiment system and an experiment method used for studying dielectric barrier discharge processing of SF[6] gases Download PDF

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CN105698850A
CN105698850A CN201610057207.1A CN201610057207A CN105698850A CN 105698850 A CN105698850 A CN 105698850A CN 201610057207 A CN201610057207 A CN 201610057207A CN 105698850 A CN105698850 A CN 105698850A
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gas
barrier discharge
dielectric barrier
manually
reactor
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张晓星
唐炬
胡雄雄
肖焓艳
肖淞
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Wuhan University WHU
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D21/00—Measuring or testing not otherwise provided for
    • G01D21/02—Measuring two or more variables by means not covered by a single other subclass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
    • G01N30/02—Column chromatography
    • G01N2030/022—Column chromatography characterised by the kind of separation mechanism
    • G01N2030/025—Gas chromatography

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Abstract

The invention discloses an experiment system and an experiment method used for studying dielectric barrier discharge treatment of SF[6] gases. The experiment system comprises a gas distribution system, an SF[6] gas processing system, a parameter detection system and a tail gas processing system. The gas distribution system comprises a gas bottle, a gas pressure-reducing valve, a gas distribution instrument and a bubbler. The SF[6] gas processing system comprises a pressure regulator, a plasma power supply and a dielectric barrier discharge reactor. The parameter detection system comprises a high-voltage probe, a sampling resistor, a sampling capacitor, a coaxial cable, a single-pole double-throw switch, an oscilloscope, a fiber optical spectrometer, an optical fiber, a collimating mirror, a computer and a gas chromatograph. The tail gas processing system mainly comprises a vacuum pump, a digital display pressure vacuum meter and an alkaline hydrolysis absorption cell. According to the experiment method, preparation work such as connecting and cleaning of the experiment system is carried out; then the SF[6] gas processing system is used to process the SF[6] gasses; a parameter detection system is utilized to carry out detection of required parameters; and finally, cleaning work after the experiment is completed.

Description

SF is processed for studying dielectric barrier discharge6The experimental system of gas and experimental technique
Technical field
The invention belongs to high-voltage insulation technique and field of environment protection, be specifically related to one and efficiently process sulfur hexafluoride gas (SF for studying dielectric barrier discharge6) experimental system and experimental technique。
Background technology
Sulfur hexafluoride (SF6) there is good electric property and excellent arc extinction performance, it is widely used in various high voltage electric equipment as insulating dielectric materials。Additionally, due to SF6Being a kind of colourless, tasteless, nontoxic, non-combustible and non-corrosive noble gas, it is also extensively used for the industries such as metal smelt, Aero-Space, medical treatment, chemical industry, atmospheric trace and electronic manufacture。The SF produced in these industries6If be directly discharged to without process in air, it will environment is had a huge impact。Research shows SF6The potential value GWP of greenhouse effect (GlobalWarmingPotential) be CO223900 times, and SF6Processing speed in an atmosphere slowly, takes around 3200, so by SF in the Kyoto Protocol of signing in 19976Gas is classified as one of greenhouse gases of six kinds of Limited uses。
At present, SF is processed6The research of method focuses primarily upon pyrolysismethod, thermocatalyst method and plasma method etc.。Wherein pyrolysismethod makes SF6With CaCO31100 DEG C of reactions carried out above, course of reaction must assure that abundant CaCO3Carry out the H generated with reaction2S and HF reacts, but temperature is high in processing procedure, and power consumption is big, and Financial cost is higher；The catalyst that thermocatalyst method uses in processing procedure can promote SF6Decomposition, simultaneously also reduce reaction temperature, but reaction temperature be still up to hundreds of degree, and the catalyst added is easily poisoning loses activity, thus reducing SF6Decomposition efficiency；And a kind of method that plasma method pollutes as new processing environment has many good qualities, it can utilize high energy electron, free radical isoreactivity particle and the SF that gas discharge produces under cryogenic6Effect, makes SF6Molecule is decomposed within the extremely short time, generates fluorine atom and a series of low-fluorine sulfide such as SF5、SF4、SF3、SF2Deng, the low-fluorine sulfide of generation and O2、H2The free radical that O and some reducibility gas produce etc. occurs the chemical reaction of series of complex to generate such as SOF2、SOF4、SO2F2And SO2Deng product thus accelerating SF6The decomposition of gas。
Dielectric barrier discharge (DielectricBarrierDischarge, DBD) owing to the low temperature plasma of large volume, high-energy-density can be produced in wider air pressure (0.01～1MPa) and frequency (50Hz～1MHz) scope, and it is uniform, stable to discharge, the electron energy of generation is higher；Energy consumption is low；Electrode structure is simple, dielectric is there is between sparking electrode, discharge gas metal electrode is avoided directly to contact and damage electrode, therefore it has a good application prospect in gaseous contamination improvement, but the generation how improving capacity usage ratio and prevention harmful by-products further is that current DBD processes SF6Field problem demanding prompt solution。
The domestic one that discloses decomposes sulfur hexafluoride gas method, and the method only discloses employing double-dielectric barrier discharge technology and carrys out resolution process SF6Gas, but the method processes SF6Efficiency and effect also have considerable room for improvement, and do not solve DBD and process SF6The problem easily producing harmful by-products。The present invention devises DBD in conjunction with the method and processes SF6The experiment porch of gas, research DBD processes SF further6The process of gas, adopts Lissajous graphic-arts technique and emission spectrometry to measure gas discharge parameter in processing procedure, for research SF6The decomposition mechanism of gas provides more information, for industrial treatment SF6Waste gas provides theoretical foundation。
Summary of the invention
It is an object of the invention to at present multifactor impact DBD being processed SF6Research not deep enough, be not enough to be applied to the problems such as industry is actual, it is provided that one is used for studying dielectric barrier discharge and processes SF6Experiment porch and method, is finally industrial high-efficient harmless treatment SF6Waste gas provides reliable experiment basis and technical support, thus reducing SF6The harm that environment is caused by gas。
Employed technical scheme comprise that such for realizing the object of the invention, it is provided that one is used for studying dielectric barrier discharge and processes SF6The experimental system of gas, including air distribution system, SF6Gas handling system, parameter detecting system and exhaust treatment system。Described air distribution system includes distributing instrument, gas pressure reducer I, gas pressure reducer II, SF6Gas bottle, background gas bottle and bubbler。Described SF6Gas handling system includes dielectric barrier discharge reactor, pressure regulator and plasma electrical source。Described parameter detecting system includes high-voltage probe, sampling resistor, sampling capacitance, coaxial cable, single-pole double-throw switch (SPDT), oscillograph, collimating mirror, optical fiber, fiber spectrometer, computer and gas chromatograph。Described exhaust treatment system includes digital display pressure vacuum meter, vacuum pump and aqueous alkali absorption cell。
The air inlet 1 of described distributing instrument is by air hose and SF6Gas bottle gas outlet turns on, described SF6The gas outlet of gas bottle connects gas pressure reducer I。Described gas pressure reducer I is a kind of valve controlling the decompression of gas bottle outlet pressure, and the gas of regulable control certain pressure is input in distributing instrument by air hose。The air inlet 2 of described distributing instrument, by air hose and the conducting of background gas bottle gas outlet, described background gas bottle gas outlet connects gas pressure reducer II。The gas outlet of described distributing instrument is connected in bubbler liquid by air hose, and described bubbler exit is turned on by the air inlet of air hose with globe valve I。Concentration and the gas flow of required gas are all regulating by described distributing instrument。
Described SF6In gas handling system, the power output end of pressure regulator is connected with the power input of plasma electrical source by wire, and the power output end of described plasma electrical source is connected with the interior electrode terminal of dielectric barrier discharge reactor by wire。Described dielectric barrier discharge reactor is coaxial circles column reactor, and air inlet is turned on by the gas outlet of air hose with globe valve I, and gas outlet is turned on by the air inlet of air hose with globe valve II。
The gas outlet of described globe valve II is turned on by the A QI KOU of air hose with threeway I, and the B QI KOU of described threeway I is turned on by the A QI KOU of air hose with threeway II。The B QI KOU of described threeway II is turned on by the air inlet of air hose with manually-operated gate III, and the gas outlet of described manually-operated gate III is communicated in aqueous alkali absorption cell by air hose。The C QI KOU of described threeway II is turned on by the air inlet of air hose with manually-operated gate II, and described manually-operated gate II gas outlet is connected with the A QI KOU of threeway III by air hose。The B QI KOU of described threeway III is by air hose and the conducting of described air-inlet of vacuum pump, and C QI KOU is turned on by the QI KOU of air hose with described digital display pressure vacuum meter。
The C QI KOU of described threeway I is turned on by the air inlet of air hose with manually-operated gate I, and the gas outlet of described manually-operated gate I is turned on by the QI KOU of air hose with described gas chromatograph。
The external electrode of described dielectric barrier discharge reactor is connected with the single-pole double-throw switch (SPDT) with BNC connector；When described single-pole double-throw switch (SPDT) is allocated to A end, ground connection after being connected with described sampling resistor；When being allocated to B end, ground connection after being connected with described sampling capacitance；Single-pole double-throw switch (SPDT) is connected with described oscillographic signal input part A by coaxial cable I；Described oscillographic signal input part B is connected with the outfan of described high-voltage probe by coaxial cable II, and the input of described high-voltage probe is connected with the power output end of described plasma electrical source by wire；
Described collimating mirror is parallel to the major axis of described dielectric barrier discharge reactor and is placed on medium position, and the opposite side of collimating mirror is connected with the optical fiber with SMA905 joint, and collimating mirror is used for collecting the light of plasma emission, and is converged in optical fiber by light。The other end of described optical fiber is connected to the input of described fiber spectrometer by SMA905 joint, and the optical transport that collimating mirror is converged by optical fiber processes in fiber spectrometer。The data output end of described fiber spectrometer is connected with the data input pin of described computer by supporting data wire, and the spectrogram after fiber spectrometer processes in computer analysis and shows。
Described gas bottle is equipped with pending SF6Gas bottle, (background gas is generally He, Ar, N to background gas bottle2, air etc.) and adscititious gases bottle (include O2、H2Deng)。
Described distributing instrument is mainly by SF6Gas carries out distribution with background gas and other adscititious gases according to the ratio (maximum ratio is 300:1) that experiment is required, is then passed in dielectric barrier discharge reactor by the mixing gas prepared, if research moisture is to SF6The impact of gas treatment, it is possible to mixing gas is carried aqueous vapor through bubbler and enters in dielectric barrier discharge reactor。Concentration and the gas flow of the gas that reaction is required are all regulated by distributing instrument, and have effusion meter on instrument for showing concentration ratio and the flow of mixing gas。
The gas that distributing instrument can be prepared by described bubbler carries out gas washing, and carries aqueous vapor and enter reactor, for probing into the carrying SF of aqueous vapor6The impact of gas treatment。
Described pressure regulator is single-phase voltage regulator, modulates certain voltage principally for plasma electrical source, and range of accommodation is 0～250V。
The voltage that the input of described plasma electrical source is pressure regulator output, the frequency adjusting knob of input and plasma electrical source by regulating pressure regulator can change output voltage and the frequency of plasma electrical source, the output voltage range of described plasma electrical source is 0～30kV, and frequency is 50Hz～20kHz。Pressure regulator constitutes the electric power system of dielectric barrier discharge reactor together with plasma electrical source, provides the alternating voltage required by experiment for reactor。
Described high-voltage probe is primarily used to gather plasma electrical source and is applied to the voltage signal on dielectric barrier discharge reactor and it is decayed according to the ratio of 1000:1, is input in oscillograph by the voltage signal after decay by coaxial cable。
Described sampling resistor is resistance is the resistance of 50 ohm, this resistance one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor, obtain gas-discharge current signal in reactor by gathering the voltage signal at these resistance two ends, and be input in oscillograph by coaxial cable。
Described sampling capacitance is capacitance is the electric capacity of 0.47 μ F, this electric capacity one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor, the quantity of electric charge (Q=C shifted in process gas discharge in reactor in the cycle by gathering the voltage signal at these electric capacity two ends to obtainMUM, CMFor sampling capacitance value, UMVoltage for sampling capacitance two ends), and be input in oscillograph by coaxial cable。
Described coaxial cable is primarily used to be transferred in oscillograph the voltage signal detected be analyzed。
Sampling resistor or sampling capacitance are accessed in circuit by described single-pole double-throw switch (SPDT) by toggle switch to A or B end。
Described oscillograph is primarily used to be analyzed the signal of coaxial cable collection, the voltage on the voltage and sampling resistor or sampling capacitance that plasma electrical source is applied on reactor can be measured simultaneously, and show gas discharge voltage and current waveform, and corresponding amplitude and discharge frequency；Namely the voltage signal apply power supply and the voltage signal at sampling capacitance two ends are loaded into oscillographic two passages respectively can measure electric discharge Q-ULissajous figure, thus calculating discharge power。
Described collimating mirror is primarily used to collect the light of plasma emission, and is converged to by light in optical fiber, and collimating mirror diameter is 5～40mm。
The optical transport that described optical fiber is primarily used to collimating mirror converges processes in fiber spectrometer。
Described fiber spectrometer is primarily used to process the light that fiber-optic transfer is come in, and is transferred to computer after treatment and is analyzed, and obtains relative intensity and the wavelength of plasma emission spectroscopy。The spectrum that in plasma, the particle emission of different excited state is different, it is possible to by the kind of particle in corresponding spectra processing procedure plasma and state。
Described computer is primarily used to the spectrogram analyzed and show after fiber spectrometer processes。
Described gas chromatograph is primarily used to process in detection reactor the SF of front and back6Gas concentration, and SF6Catabolite kind and concentration。
Described vacuum pump is mainly used to before passing into finite concentration gas to be evacuated in by reactor, it is prevented that the interference of other foreign gases。
Described digital display pressure vacuum meter is mainly used to be shown in the process medium of evacuation and stops the pressure in reactor。
Described aqueous alkali absorption cell is used to the product in absorption reactor thermally, in order to avoid toxic products is discharged in air。
Further, described dielectric barrier discharge reactor is coaxial circles column reactor, SF6The processing procedure of gas completes therein。The metal inner electrode (copper rod, aluminium bar, stainless steel tube etc.) of the center of described dielectric barrier discharge reactor is diameter to be 5～28mm, length be 150～200mm, described interior electrode is close to encirclement by the inner layer dielectric pipe (quartz, pottery, lucite etc.) of thick layer 1～2.5mm, long 260～300mm。Described inner layer dielectric pipe air gap distance is that 2～6mm place has layer of transparent outer layer electrolyte (being generally quartz glass), the formation reaction tube between described inner layer dielectric pipe and outer layer electrolyte。External electrode is tightly around the wire netting on outer layer electrolyte or bonding jumper or the metal tube having loophole, and length is equal with interior electrode。Reaction tube two ends seal plug seals, and wherein in the seal plug of one end, the position of corresponding interior electrode is mobilizable stick harness, and the centre of described stick harness is interior electrode terminal。Described interior electrode terminal is that a bonding jumper one end is embedded in interior electrode, and the other end exposes the outside at stick harness。All around being dispersed with four valves on said two seal plug, valve turns on described reaction tube, and wherein the valve of one end is as suction nozzle, and the valve of the other end is as outlet nozzle, and valve makes air inlet and gives vent to anger uniformly。
Described four suction nozzle each two are turned on two blow vents of threeway A and B respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway A and B the blow vent is turned on two blow vents of threeway C respectively, two paths is formed a passage, finally by air hose, the air inlet of the 3rd of threeway C the blow vent with described dielectric barrier discharge reactor is turned on。In described four outlet nozzles, each two is turned on two blow vents of threeway D and E respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway D and E the blow vent is turned on two blow vents of threeway F respectively, two paths is formed a passage, finally by air hose, the gas outlet of the 3rd of threeway F the blow vent with described dielectric barrier discharge reactor is turned on。Described dielectric barrier discharge reactor sealing is better, it is adaptable to produce plasma under wider air pressure。
Described experimental system can probe under Different electrodes size, media type and thickness, air-gap separation, voltage magnitude and frequency, discharge power, initial concentration, flow velocity, background gas and adscititious gases ratio and kind DBD to SF6Degraded。
Based on described for studying dielectric barrier discharge process SF6The experimental technique of the experimental system of gas, specifically comprises the following steps that
(1) Preparatory work of experiment
1. the connection of circuit system and gas circuit
The circuit of subsystems in described experimental system and gas circuit are connected。
2. reactor evacuation
Manual-lock globe valve I, manually-operated gate I and manually-operated gate III, open globe valve II and manually-operated gate II, starts vacuum pump to described dielectric barrier discharge reactor evacuation, and observes the reading of digital display pressure vacuum meter。After being evacuated, stand the sealing confirming dielectric barrier discharge reactor for 5 minutes good after carry out subsequent experimental again。
3. cleaning reactor
When the sealing of dielectric barrier discharge reactor is good, the pressure controlling gas pressure reducer II (3) output gas is 0.2MPa, utilizes distributing instrument to be passed in dielectric barrier discharge reactor with the flow of 0.2L/min～1L/min by the background gas in background gas bottle。Manually opened globe valve I, globe valve II and manually-operated gate III, close manually-operated gate I and manually-operated gate II, dielectric barrier discharge reactor be rinsed 3～5min。Then manual-lock globe valve I manually-operated gate III again, opens globe valve II and manually-operated gate II, starts vacuum pump to described dielectric barrier discharge reactor evacuation。So repeatedly complete cleaning 2～3 times；Last manual-lock gas pressure reducer II, globe valve and manually-operated gate II and vacuum pump。
4. bias light collection
Opening computer, by the center of collimating mirror alignment medium barrier discharge reactor wall, bias light in collection medium barrier discharge reactor also preserves corresponding spectrogram, background correction light during to gather plasma emission spectroscopy in this experimentation。
(2) SF is processed6Gas
1. after Preparatory work of experiment has worked, open gas pressure reducer I (2) and gas pressure reducer I (3) and control output gas pressure intensity be 0.2MPa, set the distribution concentration (concentration range is adjustable 1 μ L/L～100%) of distributing instrument, treat that distributing instrument prepares certain density SF6After the mixing gas of background gas and adscititious gases, manually opened globe valve I (7), globe valve II (22) and manually-operated gate III (31), by observing the gas flowmeter on distributing instrument, mixing gas is passed in dielectric barrier discharge reactor (if probing into aqueous vapor when affecting, first mixing gas is passed into bubbler and pass in dielectric barrier discharge reactor again) by adjusting gas flow (scope is at 0.2L/min～1L/min)。
2. open plasma power supply, regulates amplitude and the frequency of pressure regulator output AC voltage, to SF according to requirement of experiment6Gas carries out discharge process。
(3) parameter detecting
1. gather the voltage signal that detects of high-voltage probe, by coaxial cable, voltage signal is input to oscillograph, it is possible to record voltage waveform and voltage magnitude and frequency that plasma electrical source is added in reaction。
2. single-pole double-throw switch (SPDT) (43) is allocated to A end, gathers the voltage signal at sampling resistor two ends, by coaxial cable, voltage signal is input to oscillograph, it is possible to record discharge current waveform and current amplitude in dielectric barrier discharge reactor。
3. single-pole double-throw switch (SPDT) (43) is allocated to B end, gathers the voltage signal at sampling capacitance two ends, and by coaxial cable, the signal collected is input to oscillograph。The voltage signal that high-voltage probe collects is input to another passage of oscillograph simultaneously。Changing oscillographic coordinate to show, it can be observed that dynamic Q-ULissajous figure, calculate graphics area by formula and namely can calculate the discharge power under corresponding voltage, discharge power P computing formula is as follows
P = W T = 1 T ∫ 0 T U · I d t = f ∫ 0 T U · C m dU c d t · d t = f ∫ 0 T U · d Q = f S
Wherein, W is the energy that electric discharge consumes, and T is the cycle of applied voltage, and U is the voltage that plasma electrical source is added on dielectric barrier discharge reactor, and I is the electric current flowing through dielectric barrier discharge reactor, and f is the frequency of applied voltage, CmFor the capacitance of sampling capacitance, UcFor the voltage at sampling capacitance two ends, Q is the quantity of electric charge shifted in process gas discharge in the cycle, and S is the area of parallelogram Lissajous figure。
4. at discharge process SF6In the process of gas, the spectrum of plasma emission preserving in Real-time Collection dielectric barrier discharge reactor, by the spectrogram that computer is analyzed can be found out spectrum and the relative intensity of atom under different conditions or molecular emission specific wavelength, two close spectral lines according to choosing same atomic emissions in spectrogram calculate average electron temperature in plasma, atomic spectral line and the ion line of choosing identity element transmitting calculate electron density in plasma, thus analyzing SF6The catabolic process of gas。
5. SF is treated6After gas treatment a period of time, manual unlocking manually-operated gate I, the gas in dielectric barrier discharge reactor is passed into the SF after gas chromatograph carries out detection process6The concentration of gas, catabolite kind and concentration thereof。
(4) experiment terminates
Treat SF6After gas treatment has been tested, manual-lock manually-operated gate I, open globe valve I, globe valve II and manually-operated gate III, by the operation of cleaning reactor of step (1)-3., dielectric barrier discharge reactor is rinsed 3～5min, being passed in aqueous alkali absorption cell by the gas residue thing in dielectric barrier discharge reactor allows it fully be absorbed, in order to avoid toxic products is leaked in environment。Then manual-lock globe valve I and manually-operated gate III again, opens manually-operated gate II, starts vacuum pump to described dielectric barrier discharge reactor evacuation。So repeatedly complete cleaning 2～3 times；Cleaning closes globe valve II, manually-operated gate II and vacuum pump after completing。
The distributing instrument that the present invention adopts can provide the pending gaseous mixture of heterogeneity and concentration, and makes gas flow rate adjustable, and the pressure regulator of employing and plasma electrical source can be SF6Decomposition provide different size of burning voltage。Discharge parameter can be detected in real time in the process processed, by calculating discharge power for processing SF simultaneously6Gas provides energy reference；Kind and the state of each particle in plasma is detected, it is possible to for research SF by emission spectrometry6Gas decomposition mechanism provides information。For the tail gas after processing, aqueous alkali absorption cell can be passed into and absorb the toxic products produced。
The present invention can be laboratory research SF6Gas decomposes offer information and is a large amount of SF of industrial treatment6Gas provides certain foundation, for reducing SF6The directly discharge of gas contains global warming offer technology with this。
Accompanying drawing explanation
Fig. 1 is experimental system structure chart of the present invention；
Fig. 2 is that present media barrier discharge processes SF6Structure of reactor figure；
Fig. 3 is present media barrier discharge reactor cross section figure；
Fig. 4 is voltage and current waveform, and voltage is 16kV, and frequency is 8kHz, and flow is that 200mL/min records voltage current waveform；
Fig. 5 is Q-ULissajous figure, and voltage is 16kV, and frequency is 8kHz, and flow is the 200mL/min Q-ULissajous figure recorded；
Fig. 6 is the spectrogram of detection, and voltage is 16kV, and frequency is 8kHz, and flow is the 200mL/min plasma emission spectroscopy figure recorded；
In figure: 1 is distributing instrument；2 be gas pressure reducer I, 3 for gas pressure reducer II；4 is SF6Gas cylinder；5 is equipped with other gas cylinders；6 is bubbler；7 is globe valve I；8 is air inlet；9 is gas outlet；10 is dielectric barrier discharge reactor；11 is pressure regulator；12 is plasma electrical source；13 is high-voltage probe；14 is sampling resistor；15 is sampling capacitance；16-1 is coaxial cable I；16-2 is coaxial cable II；17 is oscillograph；18 is collimating mirror；19 is optical fiber；20 is fiber spectrometer；21 is computer；22 is globe valve II；23 is threeway I；24 is manually-operated gate I；25 is gas chromatograph；26 is threeway II；28 is threeway III；27 is manually-operated gate II；29 is digital display pressure vacuum meter；30 is vacuum pump；31 is manually-operated gate III；32 is aqueous alkali absorption cell；33 is interior electrode；34 is external electrode；35 is inner layer glass medium；36 is glass outer medium；37 is suction nozzle；38 is outlet nozzle；39 is seal plug；40 is stick harness；41 is interior electrode terminal；42 is base；43 is single-pole double-throw switch (SPDT)。
Detailed description of the invention
Below in conjunction with drawings and Examples, the invention will be further described, but should not be construed the above-mentioned subject area of the present invention and be only limitted to following embodiment。Without departing from the idea case in the present invention described above, according to ordinary skill knowledge and customary means, make various replacement and change, all should include in protection scope of the present invention。
Embodiment 1:
SF is processed for studying dielectric barrier discharge6The experimental system of gas includes air distribution system, SF6Gas handling system, parameter detecting system and exhaust treatment system。Described air distribution system includes distributing instrument 1, gas pressure reducer I2, gas pressure reducer II3, SF6Gas bottle 4, background gas bottle 5 and bubbler 6。Described SF6Gas handling system includes dielectric barrier discharge reactor 10, pressure regulator 11 and plasma electrical source 12。Described parameter detecting system includes high-voltage probe 13, sampling resistor 14, sampling capacitance 15, coaxial cable 16, single-pole double-throw switch (SPDT) 43, oscillograph 17, collimating mirror 18, optical fiber 19, fiber spectrometer 20, computer 21 and gas chromatograph 25。Described exhaust treatment system includes digital display pressure vacuum meter 29, vacuum pump 30 and aqueous alkali absorption cell 32。
Described SF6Gas bottle 4 is equipped with pending SF6The gas bottle of gas, SF6Concentration be 1%, described background gas bottle 5 is the gas bottle equipped with pure He, be used for dilute SF6。
Described gas pressure reducer I2 and gas pressure reducer II3 is a kind of valve controlling the decompression of gas bottle outlet pressure, and mainly the pressure of regulable control output gas is 0.2Mpa, and is input in distributing instrument 1 by air hose。
Described distributing instrument 1 is mainly SF6Gas and He (maximum ratio is 300:1) distribution according to a certain percentage, then the mixing gas prepared is carried aqueous vapor through bubbler 6 and enter in dielectric barrier discharge reactor 10, concentration and the gas flow of the gas that reaction is required are all regulated by distributing instrument 1, instrument have effusion meter for showing the flow of mixing gas。
Described bubbler 6 is equipped with water and with the bubbler of anti-suck, and the gas mainly prepared by distributing instrument 1 carries out gas washing, and carries aqueous vapor and enter reactor 10, aqueous vapor carry promotion SF6The process of gas。
Described pressure regulator 11 is single-phase voltage regulator, modulates certain voltage principally for plasma electrical source 12, and range of accommodation is 0～250V。
The voltage that input is pressure regulator 11 output of described plasma electrical source 12, the frequency adjusting knob of input and plasma electrical source 12 by regulating pressure regulator 11 can change output voltage and the frequency of plasma electrical source 12, the output voltage range of described plasma electrical source 12 is 0～30kV, and frequency is 50Hz～20kHz。Pressure regulator 11 constitutes the electric power system of dielectric barrier discharge reactor 10 together with plasma electrical source 12, provides the alternating voltage required by experiment for reactor 10。
Described dielectric barrier discharge reactor 10 is coaxial circles column reactor, and concrete structure figure is referring to Fig. 2 and Fig. 3, SF6The processing procedure of gas is just in this reactor。The interior electrode 33 of the present embodiment reactor 10 center is diameter to be 25mm, length be 200mm, material is metallic iron, and interior electrode 33 is surrounded by the high-purity quartz glass medium 35 of thick layer 2.5mm, long 290mm, and inner layer glass medium tube 35 is close to interior electrode 33；Outer media 36 is high-purity quartz glass medium, in order to spectral detection, and the air gap distance between ectonexine medium is 4mm；External electrode 34 is tightly around the wire netting on outer media, and its length is equal with interior electrode。Reaction tube two ends seal plug 39 seals, and wherein in the seal plug 39 of one end, the position of corresponding interior electrode 33 is mobilizable stick harness 40, and the centre of described stick harness 40 is interior electrode terminal 41。Described interior electrode terminal 41 is that a bonding jumper one end is embedded in interior electrode 33, and the other end exposes the outside at stick harness 40。All around being dispersed with four valves on said two seal plug 39, valve turns on described reaction tube, and wherein the valve of one end is suction nozzle 37, and the valve of the other end is outlet nozzle 38, and valve makes air inlet and gives vent to anger uniformly。
Described four suction nozzle 37 each two are turned on two blow vents of threeway A and B respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway A and B the blow vent is turned on two blow vents of threeway C respectively, two paths is formed a passage, finally by air hose, the air inlet 8 of the 3rd of threeway C the blow vent Yu described dielectric barrier discharge reactor 10 is turned on。Described four outlet nozzle 38 each two are turned on two blow vents of threeway D and E respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway D and E the blow vent is turned on two blow vents of threeway F respectively, two paths is formed a passage, finally by air hose, the gas outlet of the 3rd of threeway F the blow vent with described dielectric barrier discharge reactor 10 is turned on。Described dielectric barrier discharge reactor 10 sealing is better, it is adaptable to produce plasma under wider air pressure。
Described high-voltage probe 13 is primarily used to gather plasma electrical source 12 and is applied to the voltage signal on dielectric barrier discharge reactor 10 and it is decayed according to the ratio of 1000:1, is input in oscillograph 17 by the voltage signal after decay by coaxial cable 16。
Described sampling resistor 14 is resistance is the resistance of 50 ohm, this resistance one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor 10, obtain gas-discharge current signal in reactor 10 by gathering the voltage signal at these resistance two ends, and be input in oscillograph 17 by coaxial cable 16。
Described sampling capacitance 15 is capacitance is the electric capacity of 0.47 μ F, this electric capacity one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor 10, the quantity of electric charge (Q=C shifted in process gas discharge in reactor 10 in the cycle by gathering the voltage signal at these electric capacity 15 two ends to obtainMUM, CMFor sampling capacitance 15 capacitance, UMVoltage for sampling capacitance 15 two ends), and be input in oscillograph 17 by coaxial cable 16。
Described coaxial cable 16 is primarily used to be transferred in oscillograph 17 voltage signal detected be analyzed。
Sampling resistor or sampling capacitance are accessed in circuit by described single-pole double-throw switch (SPDT) 43 by toggle switch to A or B end。
The signal that described oscillograph 17 is primarily used to coaxial cable 16 gathers is analyzed, the voltage that plasma electrical source 12 is applied on the voltage on reactor 10 and sampling resistor 14 or sampling capacitance 15 can be measured simultaneously, and show gas discharge voltage and current waveform, and corresponding amplitude and discharge frequency；Namely the voltage signal simultaneously exported by power supply 12 and the voltage signal at sampling capacitance 15 two ends are loaded into two passages of oscillograph 17 respectively can measure electric discharge Q-ULissajous figure, thus calculating discharge power。
Described collimating mirror 18 is primarily used to collect the light of plasma emission, and is converged to by light in optical fiber 19, and the present embodiment adopts the diameter of collimating mirror 18 to be 5mm, and focal length is 10mm。
The optical transport that described optical fiber 19 is primarily used to converge collimating mirror 18 processes in fiber spectrometer 20。
Described fiber spectrometer 20 is primarily used to process the light that optical fiber 19 transmission is come in, and is transferred to computer 21 after treatment and is analyzed, and obtains relative intensity and the wavelength of plasma emission spectroscopy。The spectrum that in plasma, the particle emission under different conditions is different, it is possible to by the kind of particle in corresponding spectra processing procedure plasma and state。
Described computer 21 is primarily used to the spectrogram analyzed and show after fiber spectrometer 20 processes。
Described gas chromatograph 25 is primarily used to process in detection reactor 10 SF of front and back6Gas concentration, and SF6Catabolite kind and concentration。
Described vacuum pump 30 is mainly used to before passing into finite concentration gas to be evacuated in reactor 10, it is prevented that the interference of other foreign gases。
Described digital display pressure vacuum meter 29 is mainly used to be shown in the process medium of evacuation and stops the pressure in reactor 10。
Described aqueous alkali absorption cell 32 is used to the product in absorption reactor thermally 10, in order to avoid toxic products is discharged in air。
The air inlet 1 of described distributing instrument 1 is by air hose and SF6Gas bottle 4 gas outlet turns on, described SF6The gas outlet of gas bottle 4 connects gas pressure reducer I2。The gas of described gas pressure reducer I2 regulable control certain pressure is input in distributing instrument 1 by air hose。The air inlet 2 of described distributing instrument 1, by air hose and the conducting of background gas bottle 5 gas outlet, described background gas bottle 5 gas outlet connects gas pressure reducer II3。The gas outlet of described distributing instrument 1 is connected in bubbler 6 liquid by air hose, and described bubbler 6 exit is turned on by the air inlet of air hose with globe valve I7。Concentration and the gas flow of required gas are all regulating by described distributing instrument 1。
Described SF6In gas handling system, the power output end of pressure regulator 11 is connected with the power input of plasma electrical source 12 by wire, and the power output end of described plasma electrical source 12 is connected with the interior electrode terminal of dielectric barrier discharge reactor 10 by wire。Described dielectric barrier discharge reactor 10 is coaxial circles column reactor, and air inlet 8 is turned on by the gas outlet of air hose with globe valve I7, and gas outlet 9 is turned on by the air inlet of air hose with globe valve II22。
The gas outlet of described globe valve II22 is turned on by the A QI KOU of air hose with threeway I23, and the B QI KOU of described threeway I23 is turned on by the A QI KOU of air hose with threeway II26。The B QI KOU of described threeway II26 is turned on by the air inlet of air hose with manually-operated gate III31, and the gas outlet of described manually-operated gate III31 is communicated in aqueous alkali absorption cell 32 by air hose。The C QI KOU of described threeway II26 is turned on by the air inlet of air hose with manually-operated gate II27, and described manually-operated gate II27 gas outlet is connected with the A QI KOU of threeway III28 by air hose。The B QI KOU of described threeway III28 is by air hose and the conducting of described vacuum pump 30 air inlet, and C QI KOU is turned on by the QI KOU of air hose with described digital display pressure vacuum meter 29。
The C QI KOU of described threeway I23 is turned on by the air inlet of air hose with manually-operated gate I24, and the gas outlet of described manually-operated gate I24 is turned on by the QI KOU of air hose with described gas chromatograph 25。
The external electrode of described dielectric barrier discharge reactor 10 is connected with the single-pole double-throw switch (SPDT) 43 with BNC connector；When described single-pole double-throw switch (SPDT) 43 is allocated to A end, ground connection after being connected with described sampling resistor 14；When being allocated to B end, ground connection after being connected with described sampling capacitance 15；Single-pole double-throw switch (SPDT) 43 is connected with the signal input part A of described oscillograph 17 by coaxial cable I16-1；The signal input part B of described oscillograph 17 is connected with the outfan of described high-voltage probe 13 by coaxial cable II16-2, and the input of described high-voltage probe 13 is connected with the power output end of described plasma electrical source 12 by wire。
Described collimating mirror is parallel to the major axis of described dielectric barrier discharge reactor 10 and is placed on medium position, the opposite side of collimating mirror is connected with the optical fiber with SMA905 joint, the opposite side of collimating mirror 18 is the port of optical fiber 19, collimating mirror 18 is used for collecting the light of plasma emission, and is converged to by light in optical fiber 19。The other end of described optical fiber 19 is connected to the input of described fiber spectrometer 20 by SMA905 joint, and the optical transport that collimating mirror converges is processed by optical fiber 19 in fiber spectrometer 20。The data output end of described fiber spectrometer 20 is connected with the data input pin of described computer 21 by supporting data wire, and the spectrogram after fiber spectrometer processes is analyzed at computer 21 and shows。
Embodiment 2:
SF is processed for studying dielectric barrier discharge6The experimental system of gas includes air distribution system, SF6Gas handling system, parameter detecting system and exhaust treatment system。Described air distribution system includes distributing instrument 1, gas pressure reducer I2, gas pressure reducer II3, SF6Gas bottle 4, background gas bottle 5 and bubbler 6。Described SF6Gas handling system includes dielectric barrier discharge reactor 10, pressure regulator 11 and plasma electrical source 12。Described parameter detecting system includes high-voltage probe 13, sampling resistor 14, sampling capacitance 15, coaxial cable 16, single-pole double-throw switch (SPDT) 43, oscillograph 17, collimating mirror 18, optical fiber 19, fiber spectrometer 20, computer 21 and gas chromatograph 25。Described exhaust treatment system includes digital display pressure vacuum meter 29, vacuum pump 30 and aqueous alkali absorption cell 32。
Described SF6Gas bottle 4 is equipped with pending SF6The gas bottle of gas, SF6Concentration be 1%, described background gas bottle 5 is the gas bottle equipped with pure He, be used for dilute SF6。
Described gas pressure reducer I2 and gas pressure reducer II3 is a kind of valve controlling the decompression of gas bottle outlet pressure, and mainly the pressure of regulable control output gas is 0.2Mpa, and is input in distributing instrument 1 by air hose。
Described distributing instrument 1 is mainly SF6Gas and He (maximum ratio is 300:1) distribution according to a certain percentage, then the mixing gas prepared is carried aqueous vapor through bubbler 6 and enter in dielectric barrier discharge reactor 10, concentration and the gas flow of the gas that reaction is required are all regulated by distributing instrument 1, instrument have effusion meter for showing the flow of mixing gas。
Described bubbler 6 is equipped with water and with the bubbler of anti-suck, and the gas mainly prepared by distributing instrument 1 carries out gas washing, and carries aqueous vapor and enter reactor 10, aqueous vapor carry promotion SF6The process of gas。
Described pressure regulator 11 is single-phase voltage regulator, modulates certain voltage principally for plasma electrical source 12, and range of accommodation is 0～250V。
The voltage that input is pressure regulator 11 output of described plasma electrical source 12, the frequency adjusting knob of input and plasma electrical source 12 by regulating pressure regulator 11 can change output voltage and the frequency of plasma electrical source 12, the output voltage range of this plasma electrical source 12 is 0～30kV, and frequency is 50Hz～20kHz。Pressure regulator 11 constitutes the electric power system of dielectric barrier discharge reactor 10 together with plasma electrical source 12, provides the alternating voltage required by experiment for reactor 10。
Described dielectric barrier discharge reactor 10 is coaxial circles column reactor, and concrete structure figure is referring to Fig. 2 and Fig. 3, SF6The processing procedure of gas is just in this reactor。The interior electrode 33 of the present embodiment reactor 10 center is diameter to be 5mm, length be 150mm, material is metallic aluminium, and interior electrode 33 is surrounded by the high-purity quartz glass medium 35 of thick layer 1mm, long 260mm, and inner layer glass medium tube 35 is close to interior electrode 33；Outer media 36 is organic glass medium, in order to spectral detection, and the air gap distance between ectonexine medium is 2mm；External electrode 34 is tightly around the wire netting on outer media, and its length is equal with interior electrode。Reaction tube two ends seal plug 39 seals, and wherein in the seal plug 39 of one end, the position of corresponding interior electrode 33 is mobilizable stick harness 40, and the centre of described stick harness 40 is interior electrode terminal 41。Described interior electrode terminal 41 is that a bonding jumper one end is embedded in interior electrode 33, and the other end exposes the outside at stick harness 40。All around being dispersed with four valves on said two seal plug 39, valve turns on described reaction tube, and wherein the valve of one end is suction nozzle 37, and the valve of the other end is outlet nozzle 38, and valve makes air inlet and gives vent to anger uniformly。
Described four suction nozzle 37 each two are turned on two blow vents of threeway A and B respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway A and B the blow vent is turned on two blow vents of threeway C respectively, two paths is formed a passage, finally by air hose, the air inlet 8 of the 3rd of threeway C the blow vent Yu described dielectric barrier discharge reactor 10 is turned on。Described four outlet nozzle 38 each two are turned on two blow vents of threeway D and E respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway D and E the blow vent is turned on two blow vents of threeway F respectively, two paths is formed a passage, finally by air hose, the gas outlet of the 3rd of threeway F the blow vent with described dielectric barrier discharge reactor 10 is turned on。Described dielectric barrier discharge reactor 10 sealing is better, it is adaptable to produce plasma under wider air pressure。
Described high-voltage probe 13 is primarily used to gather plasma electrical source 12 and is applied to the voltage signal on dielectric barrier discharge reactor 10 and it is decayed according to the ratio of 1000:1, is input in oscillograph 17 by the voltage signal after decay by coaxial cable 16。
Described sampling resistor 14 is resistance is the resistance of 50 ohm, this resistance one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor 10, obtain gas-discharge current signal in reactor 10 by gathering the voltage signal at these resistance two ends, and be input in oscillograph 17 by coaxial cable 16。
Described sampling capacitance 15 is capacitance is the electric capacity of 0.47 μ F, this electric capacity one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor 10, the quantity of electric charge (Q=C shifted in process gas discharge in reactor 10 in the cycle by gathering the voltage signal at these electric capacity 15 two ends to obtainMUM, CMFor sampling capacitance 15 capacitance, UMVoltage for sampling capacitance 15 two ends), and be input in oscillograph 17 by coaxial cable 16。
Described coaxial cable 16 is primarily used to be transferred in oscillograph 17 voltage signal detected be analyzed。
Sampling resistor or sampling capacitance are accessed in circuit by described single-pole double-throw switch (SPDT) 43 by toggle switch to A or B end。
The signal that described oscillograph 17 is primarily used to coaxial cable 16 gathers is analyzed, the voltage that plasma electrical source 12 is applied on the voltage on reactor 10 and sampling resistor 14 or sampling capacitance 15 can be measured simultaneously, and show gas discharge voltage and current waveform, and corresponding amplitude and discharge frequency；Namely the voltage signal simultaneously exported by power supply 12 and the voltage signal at sampling capacitance 15 two ends are loaded into two passages of oscillograph 17 respectively can measure electric discharge Q-ULissajous figure, thus calculating discharge power。
Described collimating mirror 18 is primarily used to collect the light of plasma emission, and is converged to by light in optical fiber 19, and the present embodiment adopts the diameter of collimating mirror 18 to be 10mm, and focal length is 15mm。
The optical transport that described optical fiber 19 is primarily used to converge collimating mirror 18 processes in fiber spectrometer 20。
Described fiber spectrometer 20 is primarily used to process the light that optical fiber 19 transmission is come in, and is transferred to computer 21 after treatment and is analyzed, and obtains relative intensity and the wavelength of plasma emission spectroscopy。The spectrum that in plasma, the particle emission under different conditions is different, it is possible to by the kind of particle in corresponding spectra processing procedure plasma and state。
Described computer 21 is primarily used to the spectrogram analyzed and show after fiber spectrometer 20 processes。
Described gas chromatograph 25 is primarily used to process in detection reactor 10 SF of front and back6Gas concentration, and SF6Catabolite kind and concentration。
Described vacuum pump 30 is mainly used to before passing into finite concentration gas to be evacuated in reactor 10, it is prevented that the interference of other foreign gases。
Described digital display pressure vacuum meter 29 is mainly used to be shown in the process medium of evacuation and stops the pressure in reactor 10。
Described aqueous alkali absorption cell 32 is used to the product in absorption reactor thermally 10, in order to avoid toxic products is discharged in air。
Embodiment 3:
SF is processed for studying dielectric barrier discharge6The experimental system of gas includes air distribution system, SF6Gas handling system, parameter detecting system and exhaust treatment system。Described air distribution system includes distributing instrument 1, gas pressure reducer I2, gas pressure reducer II3, SF6Gas bottle 4, background gas bottle 5 and bubbler 6。Described SF6Gas handling system includes dielectric barrier discharge reactor 10, pressure regulator 11 and plasma electrical source 12。Described parameter detecting system includes high-voltage probe 13, sampling resistor 14, sampling capacitance 15, coaxial cable 16, single-pole double-throw switch (SPDT) 43, oscillograph 17, collimating mirror 18, optical fiber 19, fiber spectrometer 20, computer 21 and gas chromatograph 25。Described exhaust treatment system includes digital display pressure vacuum meter 29, vacuum pump 30 and aqueous alkali absorption cell 32。
Described SF6Gas bottle 4 is equipped with pending SF6The gas bottle of gas, SF6Concentration be 1%, described background gas bottle 5 is the gas bottle equipped with pure He, be used for dilute SF6。
Described gas pressure reducer I2 and gas pressure reducer II3 is a kind of valve controlling the decompression of gas bottle outlet pressure, and mainly the pressure of regulable control output gas is 0.2Mpa, and is input in distributing instrument 1 by air hose。
Described distributing instrument 1 is mainly SF6Gas and He (maximum ratio is 300:1) distribution according to a certain percentage, then the mixing gas prepared is carried aqueous vapor through bubbler 6 and enter in dielectric barrier discharge reactor 10, concentration and the gas flow of the gas that reaction is required are all regulated by distributing instrument 1, instrument have effusion meter for showing the flow of mixing gas。
Described bubbler 6 is equipped with water and with the bubbler of anti-suck, and the gas mainly prepared by distributing instrument 1 carries out gas washing, and carries aqueous vapor and enter reactor 10, aqueous vapor carry promotion SF6The process of gas。
Described pressure regulator 11 is single-phase voltage regulator, modulates certain voltage principally for plasma electrical source 12, and range of accommodation is 0～250V。
The voltage that input is pressure regulator 11 output of described plasma electrical source 12, the frequency adjusting knob of input and plasma electrical source 12 by regulating pressure regulator 11 can change output voltage and the frequency of plasma electrical source 12, the output voltage range of this plasma electrical source is 0～30kV, and frequency is 50Hz～20kHz。Pressure regulator 11 constitutes the electric power system of dielectric barrier discharge reactor 10 together with plasma electrical source 12, provides the alternating voltage required by experiment for reactor 10。
Described dielectric barrier discharge reactor 10 is coaxial circles column reactor, and concrete structure figure is referring to Fig. 2 and Fig. 3, SF6The processing procedure of gas is just in this reactor。The interior electrode 33 of the present embodiment reactor 10 center is diameter to be 28mm, length be 170mm, material is rustless steel, and interior electrode 33 is surrounded by the high-purity quartz glass medium 35 of thick layer 1.8mm, long 300mm, and inner layer glass medium tube 35 is close to interior electrode 33；Outer media 36 is ceramic dielectric, in order to spectral detection, and the air gap distance between ectonexine medium is 6mm；External electrode 34 is tightly around the wire netting on outer media, and its length is equal with interior electrode。Reaction tube two ends seal plug 39 seals, and wherein in the seal plug 39 of one end, the position of corresponding interior electrode 33 is mobilizable stick harness 40, and the centre of described stick harness 40 is interior electrode terminal 41。Described interior electrode terminal 41 is that a bonding jumper one end is embedded in interior electrode 33, and the other end exposes the outside at stick harness 40。All around being dispersed with four valves on said two seal plug 39, valve turns on described reaction tube, and wherein the valve of one end is suction nozzle 37, and the valve of the other end is outlet nozzle 38, and valve makes air inlet and gives vent to anger uniformly。
Described four suction nozzle 37 each two are turned on two blow vents of threeway A and B respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway A and B the blow vent is turned on two blow vents of threeway C respectively, two paths is formed a passage, finally by air hose, the air inlet 8 of the 3rd of threeway C the blow vent Yu described dielectric barrier discharge reactor 10 is turned on。Described four outlet nozzle 38 each two are turned on two blow vents of threeway D and E respectively by air hose, after 4 paths are formed two paths, again through air hose, the 3rd of threeway D and E the blow vent is turned on two blow vents of threeway F respectively, two paths is formed a passage, finally by air hose, the gas outlet of the 3rd of threeway F the blow vent with described dielectric barrier discharge reactor 10 is turned on。Described dielectric barrier discharge reactor 10 sealing is better, it is adaptable to produce plasma under wider air pressure。
Described high-voltage probe 13 is primarily used to gather plasma electrical source 12 and is applied to the voltage signal on dielectric barrier discharge reactor 10 and it is decayed according to the ratio of 1000:1, is input in oscillograph 17 by the voltage signal after decay by coaxial cable 16。
Described sampling resistor 14 is resistance is the resistance of 50 ohm, this resistance one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor 10, obtain gas-discharge current signal in reactor 10 by gathering the voltage signal at these resistance two ends, and be input in oscillograph 17 by coaxial cable 16。
Described sampling capacitance 15 is capacitance is the electric capacity of 0.47 μ F, this electric capacity one end ground connection, when the other end is connected with the low-pressure end of dielectric barrier discharge reactor 10, the quantity of electric charge (Q=C shifted in process gas discharge in reactor 10 in the cycle by gathering the voltage signal at these electric capacity 15 two ends to obtainMUM, CMFor sampling capacitance 15 capacitance, UMVoltage for sampling capacitance 15 two ends), and be input in oscillograph 17 by coaxial cable 16。
Described coaxial cable 16 is primarily used to be transferred in oscillograph 17 voltage signal detected be analyzed。
Sampling resistor or sampling capacitance are accessed in circuit by described single-pole double-throw switch (SPDT) 43 by toggle switch to A or B end。
The signal that described oscillograph 17 is primarily used to coaxial cable 16 gathers is analyzed, the voltage on the voltage and sampling resistor 14 or sampling capacitance 15 that plasma electrical source 12 is applied on reactor can be measured simultaneously, and show gas discharge voltage and current waveform, and corresponding amplitude and discharge frequency；Namely the voltage signal simultaneously exported by power supply 12 and the voltage signal at sampling capacitance 15 two ends are loaded into two passages of oscillograph 17 respectively can measure electric discharge Q-ULissajous figure, thus calculating discharge power。
Described collimating mirror 18 is primarily used to collect the light of plasma emission, and is converged to by light in optical fiber 19, and the present embodiment adopts the diameter of collimating mirror 18 to be 25.4mm, and focal length is 100mm。
The optical transport that described optical fiber 19 is primarily used to converge collimating mirror 18 processes in fiber spectrometer 20。
Described fiber spectrometer 20 is primarily used to process the light that optical fiber 19 transmission is come in, and is transferred to computer 21 after treatment and is analyzed, and obtains relative intensity and the wavelength of plasma emission spectroscopy。The spectrum that in plasma, the particle emission under different conditions is different, it is possible to by the kind of particle in corresponding spectra processing procedure plasma and state。
Described computer 21 is primarily used to the spectrogram analyzed and show after fiber spectrometer 20 processes。
Described gas chromatograph 25 is primarily used to process in detection reactor 10 SF of front and back6Gas concentration, and SF6Catabolite kind and concentration。
Described vacuum pump 30 is mainly used to before passing into finite concentration gas to be evacuated in reactor 10, it is prevented that the interference of other foreign gases。
Described digital display pressure vacuum meter 29 is mainly used to be shown in the process medium of evacuation and stops the pressure in reactor 10。
Described aqueous alkali absorption cell 32 is used to the product in absorption reactor thermally 10, in order to avoid toxic products is discharged in air。
Embodiment 4:
The present invention is based on being used for studying dielectric barrier discharge process SF6The experimental technique of the experimental system of gas, it is achieved high efficiency processes SF6Specifically comprising the following steps that of gas and discharge parameter collection
(1) Preparatory work of experiment
1. the connection of circuit system and gas circuit
The circuit of subsystems in described experimental system and gas circuit being connected, physical circuit and gas circuit connect referring to Fig. 1。
2. reactor evacuation
Manual-lock globe valve I7, manually-operated gate I24 and manually-operated gate III31, open globe valve II22 and manually-operated gate II27, starts vacuum pump 30 to described dielectric barrier discharge reactor 10 evacuation, and observes the reading of digital display pressure vacuum meter 29。After being evacuated, stand the sealing confirming dielectric barrier discharge reactor 10 for 5 minutes good after carry out subsequent experimental again。
3. cleaning reactor
When the sealing of dielectric barrier discharge reactor 10 is good, the pressure controlling gas pressure reducer II3 output gas is 0.2MPa, and the present embodiment preferably utilizes distributing instrument 1 to be passed in dielectric barrier discharge reactor 10 with the flow of 0.5L/min by the background gas in background gas bottle 5。Manually opened globe valve I7, globe valve II22 and manually-operated gate III31, close manually-operated gate I24 and manually-operated gate II27, dielectric barrier discharge reactor 10 be rinsed 3min。Then manual-lock globe valve I7 and manually-operated gate III31 again, opens manually-operated gate II27, starts vacuum pump 30 to described dielectric barrier discharge reactor 10 evacuation。So repeatedly complete cleaning 3 times；Last manual-lock gas pressure reducer II3, globe valve II22, manually-operated gate II27 and vacuum pump 30。
4. bias light collection
Opening computer 21, by the center of collimating mirror 18 alignment medium barrier discharge reactor 10 wall, bias light in collection medium barrier discharge reactor 10 also preserves corresponding spectrogram, background correction light during to gather plasma emission spectroscopy in this experimentation。
(2) SF is processed6Gas
1., after Preparatory work of experiment has worked, the present embodiment preferably sets the distribution concentration of distributing instrument 1 as 500 μ L/L, treats that distributing instrument 1 prepares the SF of 500 μ L/L6After/He mixing gas, by observing the gas flowmeter on distributing instrument 1, adjusting gas flow is 0.3L/min, manually opened globe valve I7, globe valve II22 and manually-operated gate III31, mixing gas is passed in bubbler 6, allows mixing gas carry aqueous vapor and enter in reactor 10。
2. open plasma power supply 12, regulates amplitude and the frequency of pressure regulator 11 output AC voltage according to requirement of experiment, and in the present embodiment, preferred selection power supply 12 output voltage is 16kV, and frequency is 8kHz, is added on reactor 10 SF6Gas carries out discharge process。
(3) parameter detecting
1. gather the voltage signal that detects of high-voltage probe 13, by coaxial cable 16, voltage signal is input to oscillograph 17, it is possible to record voltage waveform and voltage magnitude and frequency that plasma electrical source 12 is added in reaction。Concrete waveform is referring to Fig. 4。
2. single-pole double-throw switch (SPDT) 43 is allocated to A end, gathers the voltage signal at sampling resistor 14 two ends, by coaxial cable 16, voltage signal is input to oscillograph 17, it is possible to record discharge current waveform and current amplitude in dielectric barrier discharge reactor 10。Concrete waveform is referring to Fig. 4。
3. single-pole double-throw switch (SPDT) 43 is allocated to B end, gathers the voltage signal at sampling capacitance 15 two ends, and by coaxial cable 16, the signal collected is input to oscillograph 17。The voltage signal that high-voltage probe 13 collects is input to another passage of oscillograph 17 simultaneously。The coordinate changing oscillograph 17 shows, it can be observed that dynamic Q-ULissajous figure, concrete waveform is referring to Fig. 5。Calculating graphics area by formula and namely can calculate the discharge power under corresponding voltage, discharge power P computing formula is as follows
P = W T = 1 T ∫ 0 T U · I d t = f ∫ 0 T U · C m dU c d t · d t = f ∫ 0 T U · d Q = f S
Wherein, W is the energy that electric discharge consumes, and T is the cycle of applied voltage, and U is the voltage that plasma electrical source 12 is added on dielectric barrier discharge reactor 10, and I is the electric current flowing through dielectric barrier discharge reactor 10, and f is the frequency of applied voltage, CmFor the capacitance of sampling capacitance 15, UcFor the voltage at sampling capacitance 15 two ends, Q is the quantity of electric charge shifted in process gas discharge in the cycle, and S is the area of parallelogram Lissajous figure。
4. at discharge process SF6In the process of gas, the spectrum of plasma emission preserving in Real-time Collection dielectric barrier discharge reactor 10, concrete waveform is referring to Fig. 6。By the spectrogram that computer is analyzed can be found out spectrum and the relative intensity of atom under different conditions or molecular emission specific wavelength, two close spectral lines according to choosing same atomic emissions in spectrogram calculate average electron temperature in plasma, atomic spectral line and the ion line of choosing identity element transmitting calculate electron density in plasma, thus analyzing SF6The catabolic process of gas。
5. SF is treated6After gas treatment a period of time, manual unlocking manually-operated gate I24, the gas in dielectric barrier discharge reactor 10 is passed into the SF after gas chromatograph 25 carries out detection process6The concentration of gas, catabolite kind and concentration thereof。
(4) experiment terminates
Treat SF6After gas treatment has been tested, manual-lock manually-operated gate I24, open globe valve I7, globe valve II22 and manually-operated gate III31, by the operation of cleaning reactor of step (1)-3., dielectric barrier discharge reactor 10 is rinsed 5min, being passed in aqueous alkali absorption cell 32 by the gas residue thing in dielectric barrier discharge reactor 10 allows it fully be absorbed, in order to avoid toxic products is leaked in environment；Then manual-lock globe valve I7 and manually-operated gate III31 again, opens manually-operated gate II27, starts vacuum pump 30 to described dielectric barrier discharge reactor 10 evacuation。So repeatedly complete cleaning 2～3 times；Cleaning closes globe valve II22, manually-operated gate II27 and vacuum pump 30 after completing。

Claims (3)

1. it is used for studying dielectric barrier discharge and processes SF6The experimental system of gas, it is characterised in that: include air distribution system, SF6Gas handling system, parameter detecting system and exhaust treatment system；Described air distribution system includes distributing instrument (1), gas pressure reducer I (2), gas pressure reducer II (3), SF6Gas bottle (4), background gas bottle (5) and bubbler (6)；Described SF6Gas handling system includes dielectric barrier discharge reactor (10), pressure regulator (11) and plasma electrical source (12)；Described parameter detecting system includes high-voltage probe (13), sampling resistor (14), sampling capacitance (15), coaxial cable (16), oscillograph (17), collimating mirror (18), optical fiber (19), fiber spectrometer (20), computer (21), gas chromatograph (25) and single-pole double-throw switch (SPDT) (43)；Described exhaust treatment system includes digital display pressure vacuum meter (29), vacuum pump (30) and aqueous alkali absorption cell (32)；
The air inlet 1 of described distributing instrument (1) is by air hose and SF6Gas bottle (4) gas outlet turns on, described SF6The gas outlet of gas bottle (4) connects gas pressure reducer I (2)；The gas of described gas pressure reducer I (2) regulable control certain pressure is input in distributing instrument (1) by air hose；The air inlet 2 of described distributing instrument (1), by air hose and the conducting of background gas bottle (5) gas outlet, described background gas bottle (5) gas outlet connects gas pressure reducer II (3)；The gas outlet of described distributing instrument (1) is connected in bubbler (6) liquid by air hose, and described bubbler (6) exit is turned on by the air inlet of air hose with globe valve I (7)；Concentration and the gas flow of required gas are all regulating by described distributing instrument (1)；
Described SF6In gas handling system, the power output end of pressure regulator (11) is connected with the power input of plasma electrical source (12) by wire, and the power output end of described plasma electrical source (12) is connected with the interior electrode terminal (41) of dielectric barrier discharge reactor (10) by wire；Described dielectric barrier discharge reactor (10) is coaxial circles column reactor, air inlet (8) is turned on by the gas outlet of air hose with globe valve I (7), and gas outlet (9) are turned on by the air inlet of air hose with globe valve II (22)；
The gas outlet of described globe valve II (22) is turned on by the A QI KOU of air hose with threeway I (23), and the B QI KOU of described threeway I (23) is turned on by the A QI KOU of air hose with threeway II (26)；The B QI KOU of described threeway II (26) is turned on by the air inlet of air hose with manually-operated gate III (31), and the gas outlet of described manually-operated gate III (31) is communicated in aqueous alkali absorption cell (32) by air hose；The C QI KOU of described threeway II (26) is turned on by the air inlet of air hose with manually-operated gate II (27), and described manually-operated gate II (27) gas outlet is connected with the A QI KOU of threeway III (28) by air hose；The B QI KOU of described threeway III (28) is by air hose and the conducting of described vacuum pump (30) air inlet, and C QI KOU is turned on by the QI KOU of air hose with described digital display pressure vacuum meter (29)；
The C QI KOU of described threeway I (23) is turned on by the air inlet of air hose with manually-operated gate I (24), and the gas outlet of described manually-operated gate I (24) is turned on by the QI KOU of air hose with described gas chromatograph (25)；
The external electrode (34) of described dielectric barrier discharge reactor (10) is connected with the single-pole double-throw switch (SPDT) (43) with BNC connector；When described single-pole double-throw switch (SPDT) (43) is allocated to A end, ground connection after being connected with described sampling resistor (14)；When being allocated to B end, ground connection after being connected with described sampling capacitance (15)；The BNC connector of single-pole double-throw switch (SPDT) (43) is connected with the signal input part A of described oscillograph (17) by coaxial cable I (16-1)；The signal input part B of described oscillograph (17) is connected with the outfan of described high-voltage probe (13) by coaxial cable II (16-2), and the input of described high-voltage probe (13) is connected with the power output end of described plasma electrical source (12) by wire；
Described collimating mirror (18) is parallel to the major axis of described dielectric barrier discharge reactor (10) and is placed on medium position, the opposite side of collimating mirror (18) is connected with the optical fiber (19) with SMA905 joint, collimating mirror (18) is used for collecting the light of plasma emission, and is converged to by light in optical fiber (19)；The other end of described optical fiber (19) is connected to the input of described fiber spectrometer (20) by SMA905 joint, and the optical transport that collimating mirror (18) is converged by optical fiber (19) processes in fiber spectrometer (20)；The data output end of described fiber spectrometer (20) is connected with the data input pin of described computer (21) by supporting data wire, and the spectrogram after fiber spectrometer processes is analyzed at computer (21) and shows。
2. according to claim 1 for studying dielectric barrier discharge process SF6The experimental system of gas, it is characterized in that: described dielectric barrier discharge reactor (10) is coaxial circles column reactor, the metal inner electrode (33) of its structure centre is diameter to be 5～28mm, length be 150～200mm, described interior electrode (33) is close to encirclement by the inner layer dielectric pipe (35) of thick layer 1～2.5mm, long 260～300mm；Described inner layer dielectric pipe (35) air gap distance is that 2～6mm place has layer of transparent outer layer electrolyte (36), SF6The processing procedure of gas completes in the air gap between described inner layer dielectric pipe (35) and outer layer electrolyte (36)；External electrode (34) is that length is equal with interior electrode (33) tightly around the wire netting on outer layer electrolyte (36) or bonding jumper or the metal tube having loophole；Reaction tube two ends seal plug (39) seals, wherein in the seal plug (39) of one end, the position of corresponding interior electrode (33) is mobilizable stick harness (40), and the centre of described stick harness (40) is interior electrode terminal (41)；Described interior electrode terminal (41) is a bonding jumper, and its one end is embedded in interior electrode (33), and the other end exposes the outside in stick harness (40)；All around being dispersed with four valves on said two seal plug (39), valve and the conducting of described reaction tube, wherein the valve of one end is suction nozzle (37), and the valve of the other end is outlet nozzle (38), and valve makes air inlet and gives vent to anger uniformly；
Described four suction nozzle (37) each two valves are turned on two blow vents of threeway A and B respectively by air hose, after 4 paths are formed two paths, again through air hose respectively by two blow vent conductings of the 3rd of threeway A and B the blow vent with threeway C, two paths is formed a passage, finally by air hose, the air inlet (8) of the 3rd of threeway C the blow vent with described dielectric barrier discharge reactor (10) is turned on；Described four outlet nozzle (38) each two valves are turned on two blow vents of threeway D and E respectively by air hose, after 4 paths are formed two paths, again through air hose respectively by two blow vent conductings of the 3rd of threeway D and E the blow vent with threeway F, two paths is formed a passage, finally by air hose, the gas outlet (9) of the 3rd of threeway F the blow vent with described dielectric barrier discharge reactor (10) is turned on。
3. study dielectric barrier discharge based on being used for described in claim 1 and process SF6The experimental technique of the experimental system of gas, it is characterised in that: comprise the following steps；
(1) Preparatory work of experiment
1. the connection of circuit system and gas circuit
The circuit of subsystems in described experimental system and gas circuit are connected；
2. reactor evacuation
Manual-lock globe valve I (7), manually-operated gate I (24) and manually-operated gate III (31), open globe valve II (22) and manually-operated gate II (27) simultaneously, start vacuum pump (30) to described dielectric barrier discharge reactor (10) evacuation, and observe the reading of digital display pressure vacuum meter (29)；After being evacuated, stand the sealing confirming dielectric barrier discharge reactor (10) for 3～5min minute good after carry out subsequent experimental again；
3. cleaning reactor
When the sealing of dielectric barrier discharge reactor (10) is good, the pressure controlling gas pressure reducer II (3) output gas is 0.2MPa, utilizes distributing instrument (1) to be passed in dielectric barrier discharge reactor (10) with the flow of 0.2L/min～1L/min by the background gas in background gas bottle (5)；Manually opened globe valve I (7), globe valve II (22) and manually-operated gate III (31), close manually-operated gate I (24) and manually-operated gate II (27), dielectric barrier discharge reactor (10) is rinsed 3～5min；Then manual-lock globe valve I (7) and manually-operated gate III (31), unlatching manually-operated gate II (27) again, starts vacuum pump (30) to described dielectric barrier discharge reactor (10) evacuation；So repeatedly complete cleaning 2～3 times；Last manual-lock gas pressure reducer II (3), globe valve (22) and manually-operated gate II (27) and vacuum pump (30)；
4. bias light collection
Open computer (21), center by collimating mirror (18) alignment medium barrier discharge reactor (10) wall, bias light in collection medium barrier discharge reactor (10) also preserves corresponding spectrogram, background correction light during to gather plasma emission spectroscopy in this experimentation；
(2) SF is processed6Gas
1. after Preparatory work of experiment has worked, open gas pressure reducer I (2) and gas pressure reducer I (3) and control output gas pressure intensity be 0.2MPa, set the distribution concentration of distributing instrument (1), treat that distributing instrument (1) prepares certain density SF6After the mixing gas of background gas and adscititious gases, manually opened globe valve I (7), globe valve II (22) and manually-operated gate III (31), by observing the gas flowmeter on distributing instrument (1), mixing gas is passed in reactor by adjusting gas flow；
2. open plasma power supply (12), regulate amplitude and the frequency of pressure regulator (11) output AC voltage, to SF according to requirement of experiment6Gas carries out discharge process；
(3) parameter detecting
1. the voltage signal that high-voltage probe (13) detects is gathered, by coaxial cable (16), voltage signal is input to oscillograph (17), it is possible to record voltage waveform and voltage magnitude and frequency that plasma electrical source (12) is added in reaction；
2. single-pole double-throw switch (SPDT) (43) is allocated to A end, gather the voltage signal at sampling resistor (14) two ends, by coaxial cable (16), voltage signal is input to oscillograph (17), it is possible to record dielectric barrier discharge reactor (10) interior discharge current waveform and current amplitude；
3. single-pole double-throw switch (SPDT) (43) is allocated to B end, gathers the voltage signal at sampling capacitance (15) two ends, and by coaxial cable (16), the signal collected is input to oscillograph (17)；The voltage signal that high-voltage probe (13) collects is input to oscillograph (17) another passage simultaneously；The coordinate changing oscillograph (17) shows, it can be observed that dynamic Q-ULissajous figure, calculates graphics area by formula and namely can calculate the discharge power under corresponding voltage, and discharge power P computing formula is as follows；
P = W T = 1 T ∫ 0 T U · I d t = f ∫ 0 T U · C m dU c d t · d t = f ∫ 0 T U · d Q = f S
Wherein, W is the energy that electric discharge consumes, and T is the cycle of applied voltage, U is the voltage that plasma electrical source (12) is added on dielectric barrier discharge reactor (10), I is for flowing through the electric current of dielectric barrier discharge reactor (10), and f is the frequency of applied voltage, CmFor the capacitance of sampling capacitance (15), UcFor the voltage at sampling capacitance (15) two ends, Q is the quantity of electric charge shifted in process gas discharge in the cycle, and S is the area of parallelogram Lissajous figure；
4. at discharge process SF6In the process of gas, the spectrum of Real-time Collection dielectric barrier discharge reactor (10) interior plasma emission also preserves, by the spectrogram that computer is analyzed can be found out spectrum and the relative intensity of atom under different conditions or molecular emission specific wavelength, two close spectral lines according to choosing same atomic emissions in spectrogram calculate average electron temperature in plasma, atomic spectral line and the ion line of choosing identity element transmitting calculate electron density in plasma, thus analyzing SF6The catabolic process of gas；
5. SF is treated6After gas treatment a period of time, manual unlocking manually-operated gate I (24), the gas in dielectric barrier discharge reactor (10) is passed into the SF after gas chromatograph (25) carries out detection process6The concentration of gas, catabolite kind and concentration thereof；
(4) experiment terminates
Treat SF6After gas treatment has been tested, manual-lock manually-operated gate I (24) opens globe valve I (7), globe valve II (22) and manually-operated gate III (31), by the operation of cleaning reactor of step (1)-3., dielectric barrier discharge reactor (10) is rinsed 3～5min, being passed in aqueous alkali absorption cell (32) by gas residue thing in dielectric barrier discharge reactor (10) allows it fully be absorbed, in order to avoid toxic products is leaked in environment；Then manual-lock globe valve I (7), manually-operated gate III (31), unlatching manually-operated gate II (27) again, starts vacuum pump (30) to described dielectric barrier discharge reactor (10) evacuation；So repeatedly complete cleaning 2～3 times；Cleaning closes globe valve II (22), manually-operated gate II (27) and vacuum pump (30) after completing。
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