CN105671495A - Blue light filtering radiation-proof abrasion-resistant mobile phone cover plate and manufacturing method thereof - Google Patents
Blue light filtering radiation-proof abrasion-resistant mobile phone cover plate and manufacturing method thereof Download PDFInfo
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- CN105671495A CN105671495A CN201511029257.0A CN201511029257A CN105671495A CN 105671495 A CN105671495 A CN 105671495A CN 201511029257 A CN201511029257 A CN 201511029257A CN 105671495 A CN105671495 A CN 105671495A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
Abstract
The invention discloses a blue light filtering radiation-proof abrasion-resistant mobile phone cover plate and a manufacturing method thereof. The mobile phone cover plate comprises a substrate. A first film layer, a second film layer, a third film layer, a fourth film layer and a fifth film layer are arranged on the outer surface of the substrate in sequence from inside to outside. The first film layer is a trititanium pentoxide layer. The second film layer is a silicon dioxide layer. The third film layer is a metal layer. The fourth film layer is an ITO layer. The fifth film layer is a high-hardness layer. The manufacturing method of the mobile phone cover plate includes the following steps that (1) the substrate is cleaned; and (2) the outer surface of the substrate is subjected to film plating. The mobile phone cover plate can effectively filter out 33% or above of harmful blue light, moreover the whole definition is high, an excellent contribution to visual definition and reality is made, visual fatigue can be effectively relieved by filtering out the harmful blue light, and electron radiation, ultraviolet light and far infrared rays which are harmful to a human body can be effectively cut off, so that the radiation-proof effect is achieved; and the mobile phone cover plate is high in abrasion resistance by means of the high-hardness layer which is the outermost layer and formed through a high-hardness film material.
Description
Technical field
The present invention relates to the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective and manufacture method thereof.
Background technology
Along with commonly using of modern life mobile phone, and the life of people increasingly be unable to do without hands machine, the result that mobile phone brings that uses having a lot of people regular is that eyes appearance is sour and astringent, pain, the uncomfortable symptom such as shed tears, more serious appearance visual deterioration, these uncomfortable symptoms are because eyes for a long time to mobile phone screen, caused by the harmful light come out by mobile phone screen, the formidable enemy of the just eyes that mobile phone screen sends, general mobile phone screen supplier is in order to embody color contrast and the saturation of mobile phone screen, mobile phone screen lamplight brightness behind can be improved, screen surface so can be made to seem there is texture as having filled a sheet glass, improve definition, it also can reflect light glass-like equally, but light line reflection can be increased when light is pointed into screen, especially when evening consumer use mobile phone time, LED lamplight is pointed into mobile phone screen can increase light line reflection, so it is easy to be hurt eyes by these light, and produce the symptom of visual fatigue, meeting slowly causes the health problem of visual deterioration and headache, " uncomfortable light " our eyes of prolonged exposure that mobile phone screen produces also can cause visual system to lack of proper care, the uncomfortable high energy shortwave blue light being because containing a large amount of irregular frequency inside these light of light let us eyes that mobile phone screen sends, these shortwave blue lights have energy can penetrate our through retina of eyeglass, shortwave blue light prolonged exposure retina can produce a large amount of radical ion, these radical ions can make amphiblestroid pigment epithelium cell become feeble and die, epithelial declining can make photoreceptor cell，photosensory cell lack nutrient and cause vision impairment, these shortwave blue lights be also cause macular diseases act primarily as because of, our every days, the long-time blue light produced in the face of mobile phone screen stimulated, hardly realize that the short energy of blue light wavelength is high, easily cause early onset cataract, the spontaneity macular diseases such as dry and astringent, photophobia, fatigue on ocular vision.Blue light accounts for the 50 ~ 60% of visible ray, and blue light is also the one of the main reasons causing macular diseases, seriously may result in blind. Blue light can stimulate retina to produce a large amount of radical ions, make the atrophy of retinal pigment epithelium, cause the decline of photaesthesia cell again, this is because we residing be the information age, the work of people all be unable to do without mobile phone with study, more and more longer in the face of the time of mobile phone screen, also more and more higher by the frequency of eye. Eyes start sour and astringent, pain, shed tears, its plaintive teaching that: our eyes have had been subjected to injury, it is necessary to protected when using mobile phone. Occurring in that in prior art, for the mobile phone screen cover plate of the harmful light of filtration fraction, but its effect is poor, it is impossible to meet the demand of user.
In addition mobile phone screen in use also can constantly produce harmful electron radiation, ultraviolet and far infrared, along with the raising of people ' s health consciousness, how effectively to lower or to prevent radiation injury from increasingly coming into one's own.
Summary of the invention
It is an object of the invention to provide the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective and manufacture method thereof, the produced hand-set lid of the method has the injury preventing harmful blue light and electron radiation etc. to human body, and has high-wearing feature.
For achieving the above object, the present invention is by the following technical solutions:
A kind of wear-resistant mobile phone cover plate of filter blue light radioprotective, including substrate, the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete and the 5th rete from the inside to surface, and described first rete is five oxidation three titanium layers, and the thickness of the first rete is 10-100nm; Described second rete is silicon dioxide layer, and the thickness of the second rete is 50-100nm; Third membrane layer is metal level, and the thickness of third membrane layer is 5-20nm; Described 4th rete is ITO layer, and the thickness of the 4th rete is 10-100nm; Described 5th rete is high rigidity layer, and the thickness of the 5th rete is 10-50mm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and is deposited with molding by electron gun.
The film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and is deposited with molding by electron gun.
The film material of described high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
Described substrate is resin or glass ware forming.
The invention discloses the substrate of described hand-set lid when being resin forming, the manufacture method of described hand-set lid, specifically include following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, first rete ultimately form after thickness be 10-100nm, wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, formed five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, second rete ultimately form after thickness be 50-100nm, wherein the film material of the second rete is silicon dioxide, formed silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, third membrane layer ultimately form after thickness be 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, 4th rete ultimately form after thickness be 10-100nm, wherein the film material of the 4th rete is ito film material, formed ITO layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, 5th rete ultimately form after thickness be 10-50nm, wherein the film material of the 5th rete is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards the outer surface 3 minutes of substrate with ion gun.
The invention also discloses the substrate of described hand-set lid when being glass ware forming, the manufacture method of described hand-set lid, specifically include following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, first rete ultimately form after thickness be 10-100nm, wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, formed five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, second rete ultimately form after thickness be 50-100nm, wherein the film material of the second rete is silicon dioxide, formed silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, third membrane layer ultimately form after thickness be 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, 4th rete ultimately form after thickness be 10-100nm, wherein the film material of the 4th rete is ito film material, formed ITO layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, 5th rete ultimately form after thickness be 10-50nm, wherein the film material of the 5th rete is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards outer surface 5-10 minute of substrate with ion gun.
The present invention adopts the principle of electron beam vacuum evaporation, charged particle is utilized after accelerating in the electric field, to have the feature of certain kinetic energy, ion is guided into the electrode being intended to be made by the substrate of plated film, and by high purity metal, metal alloy or other oxide that electron gun with high temperature bombardment simple substance exists, the nano molecular being evaporated makes it move to substrate the method finally depositing film forming on substrate along certain direction. This invention technology is combined with the trajectory of electron motion in the special distributed controll electric field in magnetic field, and with this technique improving plated film so that coating film thickness and uniformity are controlled, and the rete compactness of preparation is good, cohesive force strong and high purity.
Multiple retes that the present invention is coated with on the substrate of hand-set lid can filter 23 more than 3% harmful blue light effectively, metal level can promote definition effectively simultaneously, thus improving the overall definition of hand-set lid, definition and verity for vision have good contribution, by visual fatigue can be effectively alleviated in the filtration of harmful blue light, arranging of ITO layer effective cuts off harmful electron radiation, ultraviolet and far infrared, serve the effect of radioprotective, high rigidity layer is set in addition and can significantly improve the wearability of hand-set lid.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the exploded view of the wear-resistant mobile phone cover plate of filter blue light radioprotective of the present invention.
Detailed description of the invention
As shown in Figure 1, the present invention includes substrate 1, the outer surface of substrate 1 is sequentially provided with first rete the 2, second rete 3, third membrane layer the 4, the 4th rete 5 and the 5th rete 6 from the inside to surface, and the first rete 2 is five oxidation three titanium layers, and the thickness of the first rete 2 is 10-100nm; Second rete 3 is silicon dioxide layer, and the thickness of the second rete 3 is 50-100nm; Third membrane layer 4 is metal level, and the thickness of third membrane layer 4 is 5-20nm; Described 4th rete 5 is ITO layer, and the thickness of the 4th rete 5 is 10-100nm; 5th rete 6 is high rigidity layer, and the thickness of the 5th rete 6 is 10-50mm.
Wherein, the film material of metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and is deposited with molding by electron gun.The film material of metal level can also be billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and is deposited with molding by electron gun.
The film material of high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
It addition, substrate 1 is resin or glass ware forming.
Embodiment 1, when the substrate 1 of hand-set lid is resin forming, the manufacture method of this hand-set lid specifically includes following steps:
1) outer surface of substrate 1 is carried out;
2) outer surface of substrate 1 is carried out plated film;
, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete 2, it is deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, first rete 2 ultimately form after thickness be 10-100nm, wherein the film material of the first rete 2 is five oxidation Tritanium/Trititaniums, formed five oxidation three titanium layers;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, second rete 3 ultimately form after thickness be 50-100nm, wherein the film material of the second rete 3 is silicon dioxide, formed silicon dioxide layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 1/S, third membrane layer 4 ultimately form after thickness be 5-20nm, wherein the film material of third membrane layer 4 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete 5:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete 5, the surface being deposited in above-mentioned steps C third membrane layer 4 with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 1/S, 4th rete 5 ultimately form after thickness be 10-100nm, wherein the film material of the 4th rete 5 is ito film material, formed ITO layer;
E, plating the 5th rete 6:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete 6, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete evaporation is 7/S, 5th rete 6 ultimately form after thickness be 10-50nm, wherein the film material of the 5th rete 6 is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In step 1), the cleaning tool body method of substrate 1 outer surface is as follows: substrate 1 is placed in vacuum chamber, the outer surface 3 minutes of substrate 1 is bombarded with ion gun.
Being 2-4hrs by the adhesive force when subzero 20 DEG C of each rete on the hand-set lid that said method prepares, the adhesive force when 80 DEG C is 2-4hrs, has very strong adhesive ability, and the compactness of each rete is good simultaneously, high purity. And, this hand-set lid can filter 23 more than 3% harmful blue light effectively, and entirety definition, definition and verity for vision have good contribution, by the filtration of harmful blue light can effectively be alleviated visual fatigue, arranging of ITO layer effective cuts off harmful electron radiation, ultraviolet and far infrared, serves the effect of radioprotective, meanwhile, outermost layer is that the high rigidity layer using high rigidity film material forming makes this hand-set lid have higher wearability.
Embodiment 2, when the substrate 1 of hand-set lid is glass ware forming, the manufacture method of this hand-set lid specifically includes following steps:
1) outer surface of substrate 1 is carried out;
2) outer surface of substrate 1 is carried out plated film;
, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete 2, it is deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, first rete 2 ultimately form after thickness be 10-100nm, wherein the film material of the first rete 2 is five oxidation Tritanium/Trititaniums, formed five oxidation three titanium layers;
B, plate the second rete 3:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete 3, the surface being deposited in above-mentioned steps the first rete 2 with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, second rete 3 ultimately form after thickness be 50-100nm, wherein the film material of the second rete 3 is silicon dioxide, formed silicon dioxide layer;
C, plating third membrane layer 4:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer 4, the surface being deposited in above-mentioned steps B the second rete 3 with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 1/S, third membrane layer 4 ultimately form after thickness be 5-20nm, wherein the film material of third membrane layer 4 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete 5:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete 5, the surface being deposited in above-mentioned steps C third membrane layer 4 with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 1/S, 4th rete 5 ultimately form after thickness be 10-100nm, wherein the film material of the 4th rete 5 is ito film material, formed ITO layer;
E, plating the 5th rete 6:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete 6, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete evaporation is 7/S, 5th rete 6 ultimately form after thickness be 10-50nm, wherein the film material of the 5th rete 6 is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
In step 1), the cleaning tool body method of substrate 1 outer surface is as follows: substrate 1 is placed in vacuum chamber, outer surface 5-10 minute of substrate 1 is bombarded with ion gun.
Being 6-9hrs by the adhesive force when subzero 20 DEG C of each rete on the hand-set lid that said method prepares, the adhesive force when 80 DEG C is 6-9hrs, has very strong adhesive ability, and the compactness of each rete is good simultaneously, high purity. And, this hand-set lid can filter 23 more than 3% harmful blue light effectively, and entirety definition, definition and verity for vision have good contribution, by the filtration of harmful blue light can effectively be alleviated visual fatigue, arranging of ITO layer effective cuts off harmful electron radiation, ultraviolet and far infrared, serves the effect of radioprotective, meanwhile, outermost layer is that the high rigidity layer using high rigidity film material forming makes this hand-set lid have higher wearability.
Claims (9)
1. the wear-resistant mobile phone cover plate of a filter blue light radioprotective, including substrate, it is characterized in that: the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete and the 5th rete from the inside to surface, described first rete is five oxidation three titanium layers, and the thickness of the first rete is 10-100nm; Described second rete is silicon dioxide layer, and the thickness of the second rete is 50-100nm; Third membrane layer is metal level, and the thickness of third membrane layer is 5-20nm; Described 4th rete is ITO layer, and the thickness of the 4th rete is 10-100nm; Described 5th rete is high rigidity layer, and the thickness of the 5th rete is 10-50mm.
2. the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective according to claim 1, it is characterised in that: the film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and is deposited with molding by electron gun.
3. the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective according to claim 1, it is characterised in that: the film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and is deposited with molding by electron gun.
4. the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective according to claim 1, it is characterised in that: the film material of described high rigidity layer is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, and is deposited with molding by electron gun.
5. the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective according to claim 1, it is characterised in that: described substrate is resin or glass ware forming.
6. the manufacture method of hand-set lid according to claim 5, it is characterised in that: when the substrate of described hand-set lid is resin forming, described manufacture method specifically includes following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, first rete ultimately form after thickness be 10-100nm, wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, formed five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, second rete ultimately form after thickness be 50-100nm, wherein the film material of the second rete is silicon dioxide, formed silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, third membrane layer ultimately form after thickness be 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, 4th rete ultimately form after thickness be 10-100nm, wherein the film material of the 4th rete is ito film material, formed ITO layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 50-70 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, 5th rete ultimately form after thickness be 10-50nm, wherein the film material of the 5th rete is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
7. the manufacture method of the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective according to claim 6, it is characterized in that: in described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards the outer surface 3 minutes of substrate with ion gun.
8. the manufacture method of hand-set lid according to claim 5, it is characterised in that: when the substrate of described hand-set lid is glass ware forming, described manufacture method specifically includes following steps:
1) outer surface of substrate is carried out;
2) outer surface of substrate is carried out plated film;
, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to more than or equal to 5.0 × 10-3Handkerchief, and control the temperature in vacuum coating cabin and be 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, it is deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, first rete ultimately form after thickness be 10-100nm, wherein the film material of the first rete is five oxidation Tritanium/Trititaniums, formed five oxidation three titanium layers;
B, plate the second rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, electron gun is adopted to bombard the film material of the second rete, the surface being deposited in above-mentioned steps the first rete with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, second rete ultimately form after thickness be 50-100nm, wherein the film material of the second rete is silicon dioxide, formed silicon dioxide layer;
C, plating third membrane layer:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment third membrane layer, the surface being deposited in above-mentioned steps B the second rete with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, third membrane layer ultimately form after thickness be 5-20nm, wherein the film material of third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 4th rete, the surface being deposited in above-mentioned steps C third membrane layer with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 1/S, 4th rete ultimately form after thickness be 10-100nm, wherein the film material of the 4th rete is ito film material, formed ITO layer;
E, plating the 5th rete:
Keep the vacuum in vacuum coating cabin more than or equal to 5.0 × 10-3Handkerchief, it is maintained with the temperature in vacuum coating cabin and is 200-300 DEG C, adopt the film material of electron gun bombardment the 5th rete, the surface being deposited in above-mentioned steps D the 4th rete with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, 5th rete ultimately form after thickness be 10-50nm, wherein the film material of the 5th rete is aluminium sesquioxide, zirconium oxide, silica crystals or silicon monoxide crystal, formed high rigidity layer.
9. the manufacture method of the wear-resistant mobile phone cover plate of a kind of filter blue light radioprotective according to claim 8, it is characterized in that: in described step 1), the concrete grammar that outer surface of substrate is cleaned is as follows: be placed in vacuum chamber by substrate, bombards outer surface 5-10 minute of substrate with ion gun.
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| CN201511029257.0A CN105671495A (en) | 2015-12-31 | 2015-12-31 | Blue light filtering radiation-proof abrasion-resistant mobile phone cover plate and manufacturing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109423608A (en) * | 2017-09-05 | 2019-03-05 | 深圳正峰印刷有限公司 | Hand-hold communication appliance structural member and its coating process |
| CN113652650A (en) * | 2021-08-20 | 2021-11-16 | 淮安澳洋顺昌光电技术有限公司 | Electron beam evaporation gold plating method for reducing gold film surface particles |
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| CN201878491U (en) * | 2010-11-30 | 2011-06-22 | 中国乐凯胶片集团公司 | Radiation protection screen |
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| CN109423608A (en) * | 2017-09-05 | 2019-03-05 | 深圳正峰印刷有限公司 | Hand-hold communication appliance structural member and its coating process |
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| CN113652650A (en) * | 2021-08-20 | 2021-11-16 | 淮安澳洋顺昌光电技术有限公司 | Electron beam evaporation gold plating method for reducing gold film surface particles |
| CN113652650B (en) * | 2021-08-20 | 2023-11-14 | 淮安澳洋顺昌光电技术有限公司 | Electron beam evaporation gold plating method for reducing particles on surface of gold film |
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