CN105467620A - Sterilizing, anti-dazzle, anti-reflection and wear-resisting lens and preparing method thereof - Google Patents
Sterilizing, anti-dazzle, anti-reflection and wear-resisting lens and preparing method thereof Download PDFInfo
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- CN105467620A CN105467620A CN201511029137.0A CN201511029137A CN105467620A CN 105467620 A CN105467620 A CN 105467620A CN 201511029137 A CN201511029137 A CN 201511029137A CN 105467620 A CN105467620 A CN 105467620A
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- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
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Abstract
The invention relates to a sterilizing, anti-dazzle, anti-reflection and wear-resisting lens and a preparing method thereof. The lens comprises a substrate. The inner surface of the substrate is sequentially provided with a first film, a second film, a third film, a fourth film, a fifth film and a sixth film from inside to outside, the outer surface of the substrate is sequentially provided with a first film, a second film, a third film, a fourth film, a fifth film and a sixth film from inside to outside, and the first film, the second film, the third film, the fourth film, the fifth film and the sixth film of the inner surface and the first film, the second film and the third film, the fourth film, the fifth film and the sixth film of the outer surface are symmetrical. The first films and the third films are trititanium pentoxide layers, and the thickness of the first films and the thickness of the third films both range from 10 nm to 100 nm; the second films and the fourth films are silicon dioxide layers, and the thickness of the second films and the thickness of the fourth films both range from 50 nm to 100 nm; the fifth films are nano-silver layers, and the thickness of the fifth films ranges from 5 nm to 20 nm; the sixth films are high hardness layers, and the thickness of the sixth films ranges from 10 nm to 50 nm. The preparing method includes the following steps that 1, the substrate is washed; 2, the inner surface and the outer surface of the substrate are coated with the films. By means of the lens, the definition can be effectively increased, the anti-blue-light effect can be effectively improved, dazzling can be prevented, the wear resistance can be improved, bacterium growth can be effectively inhibited, and the lens has the harmful-bacterium killing performance.
Description
Technical field
The present invention relates to a kind of lens technology field, especially relate to that a kind of sterilization anti-glazing is anti-reflection resistance toly to grind a lens and preparation method thereof.
Background technology
Along with people's culture, the improving constantly of living standard, carrying out of sight protection work, the simple optical device that glasses make as correcting defects of vision or protect eyes, has played important effect in people's sphere of life.Glasses are normally made up of eyeglass and mirror holder, and from eyeglass functionally, it has the light quantity that adjustment enters eyes, increase eyesight, effect such as protection eye-safe and clinical treatment illness in eye etc.
Current eyeglass of a great variety, as TAC polarized lenses common at present, it 100% obstruct can be harmful to light, therefore quite by the favor of consumer, be particularly suitable for outdoor exercises to use, but, in motion process, eyeglass is swiped unavoidably, therefore the rub proofness of eyeglass is also the Consideration that consumer chooses, TAC polarized lenses commercially available at present, the hardness on its surface can only reach H, its wearing quality is 1.5 grades, be easy to be scratched by hard object or break, affect the effect that user observes things, both made troubles to user, but also need often to change, increase use cost, have much room for improvement.
During driving at night, if opposite driving vehicle adopts powerful car light in violation of rules and regulations, driver will produce dazzling sensation, and within longer a period of time, vision is difficult to recover normal condition, very easily causes traffic hazard.In the case, produce dazzling mechanism is people: when people enters dark place from strong light environment, or from dark place to daylight, and eyes all need experience one section of adaptation time just can see surrounding objects clearly, are correspondingly called dark adatpation and light adaptation.Relevant scientific data shows, this time met the needs of is approximately 5-10min, and adapts to new lightness environment needs 20 completely
-30min.In driving at night process, when opposite vehicle is head-on sailed, driver just has the process of a light adaptation, and when vehicle crosses, has again a scotopic process, very easily causes people's kopiopia.For solving this potential safety hazard, the method that people adopt electronics to combine with optics usually, such as ADS crystalline substance hopes mirror, this product is the upgraded product of automotive sunshade panel, effectively can prevent dazzling, and have the advantage automatically adjusting transmissivity with extraneous light intensity, but it matches with vehicle, if other vehicles are wanted to adopt this product to install separately, greatly reduce its versatility, and this series products is on the high side.
In addition, glasses are after long periods of wear, and eyeglass is easy breed bacteria not only, but also easily adsorb the fine particles such as the dust in surrounding environment, thus are unfavorable for that wearer's is healthy, pollute eyeglass, affect its light transmission.
Summary of the invention
The object of the invention is to for the deficiencies in the prior art, provide a kind of wearing quality good, light transmission is good, and anti-reflection property is strong, has the antibacterial and anti-glare function of sterilization, is suitable for that the sterilization anti-glazing of use at night is anti-reflection resistance toly to grind a lens and preparation method thereof.
For achieving the above object, the present invention is by the following technical solutions:
A kind of sterilization anti-glazing is anti-reflection resistance toly to grind a lens, and comprises substrate, and inside and outside two surfaces of described substrate from the inside to surface symmetry are sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete and the 6th rete; Described first rete and third membrane layer are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete and the 4th rete are silicon dioxide layer, and thickness is 50-100nm; Described 5th rete is nano-silver layer, and thickness is 5-20nm; Described 6th rete is high rigidity layer, and thickness is 10-50nm.
The film material of described nano-silver layer is the oxide of silver, and shaping by electron gun evaporation; The oxide of described silver is Ag
2o, AgO or Ag
2o
3.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate is by resin or glass ware forming.
The resistance to preparation method ground a lens that sterilization anti-glazing is anti-reflection, when described substrate is by resin forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, under the effect of electron gun evaporation, the oxonium ion of the film material of the 5th rete is separated, silver in the film material of the 5th rete is deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form, and the speed simultaneously controlling the 5th rete evaporation is 1/S, and the 5th rete finally forms the nano-silver layer that thickness is 5-20nm; Wherein, the oxide of described silver is Ag
2o, AgO or Ag
2o
3;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 10-50nm; Wherein, the film material of described 6th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
The resistance to preparation method ground a lens that sterilization anti-glazing is anti-reflection, when described substrate is by glass ware forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, under the effect of electron gun evaporation, the oxonium ion of the film material of the 5th rete is separated, silver in the film material of the 5th rete is deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form, and the speed simultaneously controlling the 5th rete evaporation is 1/S, and the 5th rete finally forms the nano-silver layer that thickness is 5-20nm; Wherein, the oxide of described silver is Ag
2o, AgO or Ag
2o
3;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 10-50nm; Wherein, the film material of described 6th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by high purity metal, metal alloy or other oxide that simple substance exists by electron gun with high temperature bombardment, the nano molecular be evaporated makes it move to substrate along certain direction and the final method in deposition on substrate film forming.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and good, the cohesive force of rete compactness of preparation is strong and high purity.
The present invention's vacuum evaporation on substrate has some layers five to be oxidized three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, evenly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline materials have the highest refractive index, good crystallinity in visible light wave range, evaporation is stablized, without advantages such as venting and splashes, make it be adapted at eyeglass substrate being coated with the good multilayer film of anti-reflection property, obtained eyeglass has excellent anti-reflection performance.
The present invention's vacuum evaporation on substrate has some layers of silicon oxide layer, mainly plays a part to increase film adhesion, wearing quality and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperatively interact, and not only play the effect of controlled filter blue light, and anti-reflection property are very good; The present invention is at some five oxidation three titanium layers and the silicon dioxide layers be arranged alternately of the inside and outside surperficial evaporation of eyeglass substrate, not only effective elimination most purple light and blue light, and can usable reflection harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of injury to human eye retina and shortwave dazzle.
The present invention's vacuum evaporation on substrate has the nano-silver layer such as such as silver peroxide, the oxide of silver oxonium ion under the effect of electron gun evaporation is utilized to be separated, silver ion in the oxide of silver is with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, can effectively anti-bacteria or other growth of microorganism there is the performance of remarkable kill harmful bacterium, avoid and cause the problems such as acute red eye because of bacteriological infection.
The present invention is cooperatively interacted by above-mentioned rete, and playing the effects such as absorption, reflection, conversion, filtration, is the anti-reflection wear-resisting core technology of glasses lens plated sterilization anti-glazing; Meanwhile, by regulating the thickness of above-mentioned each rete, the visible ray making wavelength longer produces coherent interference, thus produces anti-dazzle anti-reflection effect further; High rigidity layer is set at the outermost layer on substrate inside and outside surface, effectively improves the wearing quality of eyeglass, can prevent it from scratching.
When eyeglass substrate of the present invention is by resin forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 2-4hrs, and the adhesion 80 DEG C time is 2-4hrs; When eyeglass substrate of the present invention is by glass ware forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 6-9hrs, and the adhesion 80 DEG C time is 6-9hrs; Multiple retes that eyeglass of the present invention is coated with effectively can promote sharpness and the anti-blue light effect of eyeglass, effectively visual fatigue is alleviated to harmful blue light, the filtration of dazzling light, the wearing quality of eyeglass and effective bacteria growing inhibiting can be significantly improved, there is the performance of kill harmful bacterium.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the anti-reflection resistance to exploded view ground a lens of sterilization anti-glazing of the present invention.
Embodiment
As shown in Figure 1, the present invention includes substrate 1, inside and outside two surfaces of described substrate 1 from the inside to surface symmetry are sequentially provided with the first rete 2, second rete 3, third membrane layer 4, the 4th rete 5, the 5th rete 6 and the 6th rete 7; Described first rete 2 and third membrane layer 4 are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete 3 and the 4th rete 5 are silicon dioxide layer, and thickness is 50-100nm; Described 5th rete 6 is nano-silver layer, and thickness is 5-20nm; Described 6th rete 7 is high rigidity layer, and thickness is 10-50nm.
The film material of described nano-silver layer is the oxide of silver, and shaping by electron gun evaporation; The oxide of described silver is Ag
2o, AgO or Ag
2o
3.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate is by resin or glass ware forming.
Embodiment 1
The resistance to preparation method ground a lens that sterilization anti-glazing is anti-reflection, when described substrate is by resin forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, under the effect of electron gun evaporation, the oxonium ion of the film material of the 5th rete is separated, silver in the film material of the 5th rete is deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form, and the speed simultaneously controlling the 5th rete evaporation is 1/S, and the 5th rete finally forms the nano-silver layer that thickness is 5-20nm; Wherein, the oxide of described silver is Ag
2o, AgO or Ag
2o
3;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 10-50nm; Wherein, the film material of described 6th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
Embodiment 2
The resistance to preparation method ground a lens that sterilization anti-glazing is anti-reflection, when described substrate is by glass ware forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, under the effect of electron gun evaporation, the oxonium ion of the film material of the 5th rete is separated, silver in the film material of the 5th rete is deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form, and the speed simultaneously controlling the 5th rete evaporation is 1/S, and the 5th rete finally forms the nano-silver layer that thickness is 5-20nm; Wherein, the oxide of described silver is Ag
2o, AgO or Ag
2o
3;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 10-50nm; Wherein, the film material of described 6th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by high purity metal, metal alloy or other oxide that simple substance exists by electron gun with high temperature bombardment, the nano molecular be evaporated makes it move to substrate along certain direction and the final method in deposition on substrate film forming.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and good, the cohesive force of rete compactness of preparation is strong and high purity.
The present invention's vacuum evaporation on substrate has some layers five to be oxidized three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, evenly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline materials have the highest refractive index, good crystallinity in visible light wave range, evaporation is stablized, without advantages such as venting and splashes, make it be adapted at eyeglass substrate being coated with the good multilayer film of anti-reflection property, obtained eyeglass has excellent anti-reflection performance.
The present invention's vacuum evaporation on substrate has some layers of silicon oxide layer, mainly plays a part to increase film adhesion, wearing quality and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperatively interact, and not only play the effect of controlled filter blue light, and anti-reflection property are very good; The present invention is at some five oxidation three titanium layers and the silicon dioxide layers be arranged alternately of the inside and outside surperficial evaporation of eyeglass substrate, not only effective elimination most purple light and blue light, and can usable reflection harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of injury to human eye retina and shortwave dazzle.
The present invention's vacuum evaporation on substrate has the nano-silver layer such as such as silver peroxide, the oxide of silver oxonium ion under the effect of electron gun evaporation is utilized to be separated, silver ion in the oxide of silver is with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, can effectively anti-bacteria or other growth of microorganism there is the performance of remarkable kill harmful bacterium, avoid and cause the problems such as acute red eye because of bacteriological infection.
The present invention is cooperatively interacted by above-mentioned rete, and playing the effects such as absorption, reflection, conversion, filtration, is the anti-reflection wear-resisting core technology of glasses lens plated sterilization anti-glazing; Meanwhile, by regulating the thickness of above-mentioned each rete, the visible ray making wavelength longer produces coherent interference, thus produces anti-dazzle anti-reflection effect further; High rigidity layer is set at the outermost layer on substrate inside and outside surface, effectively improves the wearing quality of eyeglass, can prevent it from scratching.
When eyeglass substrate of the present invention is by resin forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 2-4hrs, and the adhesion 80 DEG C time is 2-4hrs; When eyeglass substrate of the present invention is by glass ware forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 6-9hrs, and the adhesion 80 DEG C time is 6-9hrs; Multiple retes that eyeglass of the present invention is coated with effectively can promote sharpness and the anti-blue light effect of eyeglass, effectively visual fatigue is alleviated to harmful blue light, the filtration of dazzling light, the wearing quality of eyeglass and effective bacteria growing inhibiting can be significantly improved, there is the performance of kill harmful bacterium.
More than describe and should not have any restriction to protection scope of the present invention.
Claims (8)
1. a sterilization anti-glazing is anti-reflection resistance toly grinds a lens, and comprises substrate, it is characterized in that: inside and outside two surfaces of described substrate from the inside to surface symmetry are sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete and the 6th rete; Described first rete and third membrane layer are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete and the 4th rete are silicon dioxide layer, and thickness is 50-100nm; Described 5th rete is nano-silver layer, and thickness is 5-20nm; Described 6th rete is high rigidity layer, and thickness is 10-50nm.
2. a kind of sterilization anti-glazing according to claim 1 is anti-reflection resistance toly grinds a lens, and it is characterized in that: the film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
3. a kind of sterilization anti-glazing according to claim 1 is anti-reflection resistance toly grinds a lens, and it is characterized in that: the film material of described nano-silver layer is the oxide of silver, and shaping by electron gun evaporation; The oxide of described silver is Ag
2o, AgO or Ag
2o
3.
4. a kind of sterilization anti-glazing according to claim 1 is anti-reflection resistance toly grinds a lens, and it is characterized in that: described substrate is by resin or glass ware forming.
5. the anti-reflection resistance to preparation method ground a lens of sterilization anti-glazing according to claim 4, it is characterized in that: when described substrate is by resin forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, under the effect of electron gun evaporation, the oxonium ion of the film material of the 5th rete is separated, silver in the film material of the 5th rete is deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form, and the speed simultaneously controlling the 5th rete evaporation is 1/S, and the 5th rete finally forms the nano-silver layer that thickness is 5-20nm; Wherein, the oxide of described silver is Ag
2o, AgO or Ag
2o
3;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 10-50nm; Wherein, the film material of described 6th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
6. the anti-reflection resistance to preparation method ground a lens of a kind of sterilization anti-glazing according to claim 5, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
7. the anti-reflection resistance to preparation method ground a lens of sterilization anti-glazing according to claim 4, it is characterized in that: when described substrate is by glass ware forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10-3 handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, wherein the film material of the 5th rete is the oxide of silver, under the effect of electron gun evaporation, the oxonium ion of the film material of the 5th rete is separated, silver in the film material of the 5th rete is deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form, and the speed simultaneously controlling the 5th rete evaporation is 1/S, and the 5th rete finally forms the nano-silver layer that thickness is 5-20nm; Wherein, the oxide of described silver is Ag
2o, AgO or Ag
2o
3;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 10-50nm; Wherein, the film material of described 6th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
8. the anti-reflection resistance to preparation method ground a lens of a kind of sterilization anti-glazing according to claim 7, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
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