CN105446539A - Multifunctional touch display screen and manufacturing method thereof - Google Patents

Multifunctional touch display screen and manufacturing method thereof Download PDF

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Publication number
CN105446539A
CN105446539A CN201511029034.4A CN201511029034A CN105446539A CN 105446539 A CN105446539 A CN 105446539A CN 201511029034 A CN201511029034 A CN 201511029034A CN 105446539 A CN105446539 A CN 105446539A
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China
Prior art keywords
rete
film material
evaporation
vacuum coating
coating cabin
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CN201511029034.4A
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Chinese (zh)
Inventor
吴晓彤
方俊勇
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Ott Road (zhangzhou) Optical Technology Co Ltd
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Priority to CN201511029034.4A priority Critical patent/CN105446539A/en
Publication of CN105446539A publication Critical patent/CN105446539A/en
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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a multifunctional touch display screen and a manufacturing method thereof. The touch display screen comprises a substrate; a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer, a ninth film layer, a tenth film layer and an eleventh film layer are sequentially arranged on the outer surface of the substrate from inside to outside; the first film layer, the third film layer and the fifth film layer are all trititanium pentoxide layers; the second film layer, the fourth film layer and the sixth film layer are all silicon dioxide layers; the seventh film layer is a metal layer; the eighth film layer is a nano-silver layer; the ninth film layer is an ITO (Indium Tin Oxide) layer; the tenth film layer is a high-hardness layer; and the eleventh film layer is a fluoride layer. The manufacturing method of the multifunctional touch display screen comprises the following steps of: 1, cleaning the substrate; and 2, coating the outer surface of the substrate. According to the touch display screen disclosed by the invention, harmful blue light can be effectively filtered; filtration on dazzle light can effectively relieve visual fatigue; and the multifunctional touch display screen has a sterilization ability, sufficient wear resistance and functions of resisting to water, oil stain and the like.

Description

A kind of Multifunctional touching display screen and manufacture method thereof
Technical field
The present invention relates to a kind of touch display screen technical field, especially relate to a kind of Multifunctional touching display screen and manufacture method thereof.
Background technology
Along with the progress of society and the development of science and technology, mobile phone, computer, TV extensively enter people work and life in, at present on the market mobile phone, computer, TV with display screen based on liquid crystal, LED, LCD, along with people are to service time growing with the electronic equipment of display screen such as computer, TV, the blue light sent in these display screens, ultraviolet, the injury of dazzling light to eye eyesight are more and more serious.
The high-energy visible ray of blue light to be wavelength be 400-500nm, blue light directly to penetrate cornea, eyes crystal, through retina, blue light can stimulate retina to produce a large amount of radical ion, make the atrophy of retinal pigment epithelium, and cause the death of photaesthesia cell, retinal pigment epithelium is very strong to the light absorption effect of blue region, absorbs blue ray radiation and can make retinal pigment epithelium atrophy, and this is also the one of the main reasons producing ARM; Blue ray radiation composition is higher larger to cellula visualis injury, and the atrophy of retinal pigment epithelium, can make amphiblestroid image thicken, and can do continuous adjustment, increase the weight of the working strength of ciliary muscle, cause visual fatigue fuzzy image ciliary muscle.Can cause the visual fatigue of people under the effect of ultraviolet and blue light, eyesight can decline gradually, easily causes dry and astringent, early onset cataract, the spontaneous macular diseases such as photophobia, fatigue on ocular vision.
Existing touch display screen is in use easy to scratched or rub flower, affects attractive in appearance, and more seriously, after the surface of touch display screen scratches or rubs and spends, internal layer exposes in atmosphere, holds corrosion-vulnerable, affects serviceable life.In addition, the rarer sterilizing function of existing touch display screen, people are in use easy from bacterial infection touch display screen, damage to human body.Therefore on market in the urgent need to occurring that a kind of wear-resisting touch display screen with antibacterial, anti-blue light, anti-glare function is to replace existing traditional display screen.
Summary of the invention
The object of the invention is to for the deficiencies in the prior art, provide a kind of blue light that can effectively prevent to the injury of human body, there is high-wearing feature and anti-glare function, be suitable for Multifunctional touching display screen and the manufacture method thereof of use at night.
For achieving the above object, the present invention is by the following technical solutions:
A kind of Multifunctional touching display screen, comprise substrate, the outside surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete, the 8th rete, the 9th mold layer, the tenth rete and the 11 rete from the inside to surface; Described first rete, third membrane layer and the 5th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 4th rete and the 6th rete are silicon dioxide layer, and thickness is 50-100nm; Described 7th rete is metal level, and thickness is 5-20nm; Described 8th rete is nano-silver layer, and the thickness of the 8th rete is 5-20nm; Described 9th rete is ITO layer, and the thickness of the 9th rete is 10-100nm; Described tenth rete is high rigidity layer, and thickness is 10-50nm; Described 11 rete is fluoride layer, and the thickness of the 11 rete is 3-10nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, and shaping by electron gun evaporation.
The film material of described nano-silver layer is the oxide of silver, and uses electron gun evaporation shaping; The oxide of described silver is Ag 2o, AgO or Ag 2o 3.
Described fluoride layer is the shaping magnesium fluoride layer of resistance evaporation.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate is by resin or glass ware forming.
The present invention also discloses a kind of manufacture method of Multifunctional touching display screen, and when the substrate of described touch display screen is by resin forming, described manufacture method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silicon dioxide, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the oxide evaporation of the silver of the film material of the 8th rete is rear decomposes, be attached to the surface of the 7th rete in above-mentioned steps G with the form of nanoscale elemental silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the thickness after the 8th rete is finally formed is the nano-silver layer of the thin layer of 5-20nm; The oxide of wherein said silver is Ag 2o, AgO or Ag 2o 3;
I, plating the 9th rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in the vacuum chamber of vacuum evaporation plating machine, cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
When the substrate of described touch display screen is by glass ware forming, described manufacture method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silicon dioxide, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the oxide evaporation of the silver of the film material of the 8th rete is rear decomposes, be attached to the surface of the 7th rete in above-mentioned steps G with the form of nanoscale elemental silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the thickness after the 8th rete is finally formed is the nano-silver layer of the thin layer of 5-20nm; The oxide of wherein said silver is Ag 2o, AgO or Ag 2o 3;
I, plating the 9th rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in the vacuum chamber of vacuum evaporation plating machine, cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by electron gun with high temperature bombardment by high purity metal or metal oxide, the nano molecular be evaporated makes it move to substrate along certain direction and the final method in deposition on substrate film forming.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and good, the cohesive force of rete compactness manufactured is strong and high purity.
The present invention's vacuum evaporation on substrate has five oxidation three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, evenly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline material in visible light wave range, there is the highest refractive index, good crystallinity, evaporation is stablized, without advantages such as venting and splashes, it is made to be adapted at touch display screen substrate being coated with the good multilayer film of anti-reflection property.
The present invention is vacuum evaporation silica layer on substrate, mainly plays a part to increase film adhesion, wearing quality and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperatively interact, mainly play the effect of controlled filter wavelength, the present invention is at some five oxidation three titanium layers and the silicon dioxide layers be arranged alternately of touch display screen substrate outside surface evaporation, not only effective elimination most purple light and blue light, and can usable reflection harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of injury to human eye retina and shortwave dazzle, the metal level of third membrane layer of the present invention, not only improves anti-blue light effect and sharpness, and can reflect harmful light, dazzling light wave, flashes light wave etc. by force, the present invention is cooperatively interacted by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is the wear-resisting core technology of touch display screen plated film filter blue light anti-glazing, meanwhile, by regulating the thickness of above-mentioned each rete, the visible ray making wavelength longer produces coherent interference, thus produces antiglare effect further, decompose after utilizing the oxide evaporation of the oxide of silver silver under the effect of electron gun evaporation, with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, arranging of ITO layer effectively cuts off harmful electron irradiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearing quality that high rigidity layer effectively can improve touch display screen is set in addition, can prevent it from scratching.Arrange fluoride layer at the outermost layer of substrate outside surface and have good hydrophobicity and oil-stain-preventing function, touch display screen of the present invention can also waterproof and oil-stain-preventing effectively, therefore, and user's greasy dirt on hand and water stainly would not to leave a trace on touch display screen.
When touch display screen substrate of the present invention is by resin forming, the adhesion of each rete of the touch display screen obtained by manufacture method of the present invention subzero 20 DEG C time is 2-4hrs, and the adhesion 80 DEG C time is 2-4hrs, when touch display screen substrate of the present invention is by glass ware forming, the adhesion of each rete of the touch display screen obtained by manufacture method of the present invention subzero 20 DEG C time is 6-9hrs, and the adhesion 80 DEG C time is 6-9hrs, multiple retes that touch display screen of the present invention is coated with can filter 23 more than 3% harmful blue light effectively, metal level can promote sharpness and anti-blue light effect effectively simultaneously, thus improve the overall sharpness of touch display screen, good contribution is had for the sharpness of vision and authenticity, to harmful blue light, the filtration of dazzling light effectively can alleviate visual fatigue, decompose after utilizing the oxide evaporation of the oxide of silver silver under the effect of electron gun evaporation, with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, arranging of ITO layer effectively cuts off harmful electron irradiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearing quality that high rigidity layer effectively can improve touch display screen is set in addition, can prevent it from scratching.Fluoride layer is set at the outermost layer of substrate outside surface there is good hydrophobicity and oil-stain-preventing function.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the exploded view of Multifunctional touching display screen of the present invention.
Embodiment
As shown in Figure 1, the present invention includes substrate 1, comprise substrate 1, the outside surface of described substrate 1 is sequentially provided with the first rete 2, second rete 3, third membrane layer 4, the 4th rete 5, the 5th rete 6, the 6th rete 7, the 7th rete 8, the 8th rete 9, the 9th mold layer 10, the tenth rete the 11 and the 11 rete 12 from the inside to surface; Described first rete 2, third membrane layer 4 and the 5th rete 6 are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete 3, the 4th rete 5 and the 6th rete 7 are silicon dioxide layer, and thickness is 50-100nm; Described 7th rete 8 is metal level, and thickness is 5-20nm; Described 8th rete 9 is nano-silver layer, and the thickness of the 8th rete 9 is 5-20nm; Described 9th rete 10 is ITO layer, and the thickness of the 9th rete 10 is 10-100nm; Described tenth rete 11 is high rigidity layer, and thickness is 10-50nm; Described 11 rete 12 is fluoride layer, and the thickness of the 11 rete 12 is 3-10nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, and shaping by electron gun evaporation.
The film material of described nano-silver layer is the oxide of silver, and uses electron gun evaporation shaping; The oxide of described silver is Ag 2o, AgO or Ag 2o 3.
Described fluoride layer is the shaping magnesium fluoride layer of resistance evaporation.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate 1 is by resin or glass ware forming.
Embodiment 1:
When the substrate 1 of described touch display screen is by resin forming, the manufacture method of described Multifunctional touching display screen specifically comprises the following steps:
1) substrate 1 is cleaned, dry;
2) plated film is carried out to the outside surface of substrate 1;
A, plate the first rete 2:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete 2, be deposited on the outside surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, and the thickness after the first rete 2 is finally formed is 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, and the thickness after the second rete 3 is finally formed is 50-100nm; Wherein, the film material of described second rete 3 is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 2.5/S, and the thickness after third membrane layer 4 is finally formed is 10-100nm; Wherein, the film material of described third membrane layer 4 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete 5:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete 5, be deposited on the surface of third membrane layer 4 in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 7/S, and the thickness after the 4th rete 5 is finally formed is 50-100nm; Wherein, the film material of described 4th rete 5 is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete 6:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete 6, be deposited on the surface of the 4th rete 5 in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete 6 evaporation is 2.5/S, and the thickness after the 5th rete 6 is finally formed is 10-100nm; Wherein, the film material of described 5th rete 6 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete 7:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete 7, be deposited on the surface of the 5th rete 6 in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete 7, the speed simultaneously controlling the 6th rete 7 evaporation is 7/S, and the thickness after the 6th rete 7 is finally formed is 50-100nm; Wherein, the film material of described 6th rete 7 is silicon dioxide, forms silicon dioxide layer;
G, plating the 7th rete 8:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete 8, be deposited on the surface of the 6th rete 7 in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete 8, the speed simultaneously controlling the 7th rete 8 evaporation is 1/S, thickness after 7th rete 8 is finally formed is 5-20nm, wherein the film material of the 7th rete 8 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete 9:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete 9, wherein the film material of the 8th rete 9 is the oxide of silver, under the effect of electron gun evaporation, the oxide evaporation of the silver of the film material of the 8th rete 9 is rear decomposes, be attached to the surface of the 7th rete 8 in above-mentioned steps G with the form of nanoscale elemental silver, the speed simultaneously controlling the 8th rete 9 evaporation is 1/S, and the thickness after the 8th rete 9 is finally formed is the nano-silver layer of the thin layer of 5-20nm; The oxide of wherein said silver is Ag 2o, AgO or Ag 2o 3;
I, plating the 9th rete 10:
Vacuum tightness in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, adopt the film material of electron gun bombardment the 9th rete 10, be deposited on the surface of the 8th rete 9 in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete 10, the speed simultaneously controlling the 9th rete 10 evaporation is 1/S, thickness after 9th rete 10 is finally formed is 10-100nm, and wherein the film material of the 9th rete 10 is ITO material, forms ITO layer;
J, plating the tenth rete 11:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material 11 of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete 10 in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete 11, the speed simultaneously controlling the tenth rete 11 evaporation is 7/S, and the thickness after the tenth rete 11 is finally formed is 10-50nm; Wherein, the film material of described tenth rete 11 is alundum (Al2O3), zirconia, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete 12:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of resistance heated the 11 rete 12, be deposited on the surface of the tenth rete 11 in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete 12, the speed simultaneously controlling the 11 rete 12 evaporation is 1.5/S, thickness after 11 rete 12 is finally formed is 3-10nm, and wherein the film material of the 11 rete 12 is fluoride, forms fluoride layer.
In described step 1), substrate 1 is cleaned, dry concrete steps are as follows: substrate 1 is placed in the vacuum chamber of vacuum evaporation plating machine, cleans with the outside surface 2-3 minute of ion gun bombardment substrate 1.
The adhesion of each rete on the touch display screen obtained by said method subzero 20 DEG C time is 2-4hrs, and the adhesion 80 DEG C time is 2-4hrs, has very strong adhesive ability, simultaneously good, the high purity of the compactness of each rete.And, this touch display screen can filter 23 more than 3% harmful blue light effectively, metal level can promote sharpness and anti-blue light effect effectively simultaneously, thus improve the overall sharpness of touch display screen, good contribution is had for the sharpness of vision and authenticity, to harmful blue light, the filtration of dazzling light effectively can alleviate visual fatigue, decompose after utilizing the oxide evaporation of the oxide of silver silver under the effect of electron gun evaporation, with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, arranging of ITO layer effectively cuts off harmful electron irradiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearing quality that high rigidity layer effectively can improve touch display screen is set in addition, can prevent it from scratching.Fluoride layer is set at the outermost layer of substrate outside surface there is good hydrophobicity and oil-stain-preventing function.
Embodiment 2:
When the substrate 1 of described touch display screen is by glass ware forming, described manufacture method specifically comprises the following steps:
1) substrate 1 is cleaned, dry;
2) plated film is carried out to the outside surface of substrate 1;
A, plate the first rete 2:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete 2, be deposited on the outside surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, and the thickness after the first rete 2 is finally formed is 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, and the thickness after the second rete 3 is finally formed is 50-100nm; Wherein, the film material of described second rete 3 is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 2.5/S, and the thickness after third membrane layer 4 is finally formed is 10-100nm; Wherein, the film material of described third membrane layer 4 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete 5:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete 5, be deposited on the surface of third membrane layer 4 in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 7/S, and the thickness after the 4th rete 5 is finally formed is 50-100nm; Wherein, the film material of described 4th rete 5 is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete 6:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete 6, be deposited on the surface of the 4th rete 5 in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete 6 evaporation is 2.5/S, and the thickness after the 5th rete 6 is finally formed is 10-100nm; Wherein, the film material of described 5th rete 6 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete 7:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete 7, be deposited on the surface of the 5th rete 6 in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete 7, the speed simultaneously controlling the 6th rete 7 evaporation is 7/S, and the thickness after the 6th rete 7 is finally formed is 50-100nm; Wherein, the film material of described 6th rete 7 is silicon dioxide, forms silicon dioxide layer;
G, plating the 7th rete 8:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete 8, be deposited on the surface of the 6th rete 7 in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete 8, the speed simultaneously controlling the 7th rete 8 evaporation is 1/S, thickness after 7th rete 8 is finally formed is 5-20nm, wherein the film material of the 7th rete 8 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete 9:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete 9, wherein the film material of the 8th rete 9 is the oxide of silver, under the effect of electron gun evaporation, the oxide evaporation of the silver of the film material of the 8th rete 9 is rear decomposes, be attached to the surface of the 7th rete 8 in above-mentioned steps G with the form of nanoscale elemental silver, the speed simultaneously controlling the 8th rete 9 evaporation is 1/S, and the thickness after the 8th rete 9 is finally formed is the nano-silver layer of the thin layer of 5-20nm; The oxide of wherein said silver is Ag 2o, AgO or Ag 2o 3;
I, plating the 9th rete 10:
Vacuum tightness in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, adopt the film material of electron gun bombardment the 9th rete 10, be deposited on the surface of the 8th rete 9 in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete 10, the speed simultaneously controlling the 9th rete 10 evaporation is 1/S, thickness after 9th rete 10 is finally formed is 10-100nm, and wherein the film material of the 9th rete 10 is ITO material, forms ITO layer;
J, plating the tenth rete 11:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material 11 of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete 10 in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete 11, the speed simultaneously controlling the tenth rete 11 evaporation is 7/S, and the thickness after the tenth rete 11 is finally formed is 10-50nm; Wherein, the film material of described tenth rete 11 is alundum (Al2O3), zirconia, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete 12:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of resistance heated the 11 rete 12, be deposited on the surface of the tenth rete 11 in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete 12, the speed simultaneously controlling the 11 rete 12 evaporation is 1.5/S, thickness after 11 rete 12 is finally formed is 3-10nm, and wherein the film material of the 11 rete 12 is fluoride, forms fluoride layer.
In described step 1), substrate 1 is cleaned, dry concrete steps are as follows: substrate 1 is placed in the vacuum chamber of vacuum evaporation plating machine, cleans with the outside surface 5-10 minute of ion gun bombardment substrate 1.
The adhesion of each rete on the touch display screen obtained by said method subzero 20 DEG C time is 6-9hrs, and the adhesion 80 DEG C time is 6-9hrs, has very strong adhesive ability, simultaneously good, the high purity of the compactness of each rete.And, this touch display screen can filter 23 more than 3% harmful blue light effectively, metal level can promote sharpness and anti-blue light effect effectively simultaneously, thus improve the overall sharpness of touch display screen, good contribution is had for the sharpness of vision and authenticity, to harmful blue light, the filtration of dazzling light effectively can alleviate visual fatigue, decompose after utilizing the oxide evaporation of the oxide of silver silver under the effect of electron gun evaporation, with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, arranging of ITO layer effectively cuts off harmful electron irradiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearing quality that high rigidity layer effectively can improve touch display screen is set in addition, can prevent it from scratching.Fluoride layer is set at the outermost layer of substrate outside surface there is good hydrophobicity and oil-stain-preventing function.
In sum, the present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by electron gun with high temperature bombardment by high purity metal or metal oxide, the nano molecular be evaporated makes it move to substrate along certain direction and the final method in deposition on substrate film forming.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and good, the cohesive force of rete compactness manufactured is strong and high purity.
The present invention's vacuum evaporation on substrate has five oxidation three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, evenly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline material in visible light wave range, there is the highest refractive index, good crystallinity, evaporation is stablized, without advantages such as venting and splashes, it is made to be adapted at touch display screen substrate being coated with the good multilayer film of anti-reflection property.
The present invention is vacuum evaporation silica layer on substrate, mainly plays a part to increase film adhesion, wearing quality and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperatively interact, mainly play the effect of controlled filter wavelength, the present invention is at some five oxidation three titanium layers and the silicon dioxide layers be arranged alternately of touch display screen substrate outside surface evaporation, not only effective elimination most purple light and blue light, and can usable reflection harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of injury to human eye retina and shortwave dazzle, the metal level of third membrane layer of the present invention, not only improves anti-blue light effect and sharpness, and can reflect harmful light, dazzling light wave, flashes light wave etc. by force, the present invention is cooperatively interacted by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is the wear-resisting core technology of touch display screen plated film filter blue light anti-glazing, meanwhile, by regulating the thickness of above-mentioned each rete, the visible ray making wavelength longer produces coherent interference, thus produces antiglare effect further, decompose after utilizing the oxide evaporation of the oxide of silver silver under the effect of electron gun evaporation, with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, arranging of ITO layer effectively cuts off harmful electron irradiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearing quality that high rigidity layer effectively can improve touch display screen is set in addition, can prevent it from scratching.Arrange fluoride layer at the outermost layer of substrate outside surface and have good hydrophobicity and oil-stain-preventing function, touch display screen of the present invention can also waterproof and oil-stain-preventing effectively, therefore, and user's greasy dirt on hand and water stainly would not to leave a trace on touch display screen.
Multiple rete that touch display screen of the present invention is coated with and, this touch display screen can filter 23 more than 3% harmful blue light effectively, metal level can promote sharpness and anti-blue light effect effectively simultaneously, thus improve the overall sharpness of touch display screen, good contribution is had for the sharpness of vision and authenticity, to harmful blue light, the filtration of dazzling light effectively can alleviate visual fatigue, decompose after utilizing the oxide evaporation of the oxide of silver silver under the effect of electron gun evaporation, with the lamellar nano-silver layer of the form of nanoscale elemental silver attachment shape, nanometer simple substance silver bactericidal effect makes it have sterilizing ability, nanometer simple substance silver is nontoxic non-stimulated, while ensure that the sterilizing ability that touch display screen is enough, human body is avoided to come to harm, arranging of ITO layer effectively cuts off harmful electron irradiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearing quality that high rigidity layer effectively can improve touch display screen is set in addition, can prevent it from scratching.Fluoride layer is set at the outermost layer of substrate outside surface there is good hydrophobicity and oil-stain-preventing function.

Claims (10)

1. a Multifunctional touching display screen, comprise substrate, it is characterized in that: the outside surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete, the 8th rete, the 9th mold layer, the tenth rete and the 11 rete from the inside to surface; Described first rete, third membrane layer and the 5th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 4th rete and the 6th rete are silicon dioxide layer, and thickness is 50-100nm; Described 7th rete is metal level, and thickness is 5-20nm; Described 8th rete is nano-silver layer, and the thickness of the 8th rete is 5-20nm; Described 9th rete is ITO layer, and the thickness of the 9th rete is 10-100nm; Described tenth rete is high rigidity layer, and thickness is 10-50nm; Described 11 rete is fluoride layer, and the thickness of the 11 rete is 3-10nm.
2. a kind of Multifunctional touching display screen according to claim 1, it is characterized in that: the film material of described metal level is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, and shaping by electron gun evaporation.
3. a kind of Multifunctional touching display screen according to claim 1, is characterized in that: the film material of described nano-silver layer is the oxide of silver, and uses electron gun evaporation shaping; The oxide of described silver is Ag 2o, AgO or Ag 2o 3.
4. a kind of Multifunctional touching display screen according to claim 1, is characterized in that: described fluoride layer is the shaping magnesium fluoride layer of resistance evaporation.
5. a kind of Multifunctional touching display screen according to claim 1, is characterized in that: the film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
6. a kind of Multifunctional touching display screen according to claim 1, is characterized in that: described substrate is by resin or glass ware forming.
7. the manufacture method of Multifunctional touching display screen according to claim 6, it is characterized in that: when described substrate is by resin forming, described manufacture method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silicon dioxide, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the oxide evaporation of the silver of the film material of the 8th rete is rear decomposes, be attached to the surface of the 7th rete in above-mentioned steps G with the form of nanoscale elemental silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the thickness after the 8th rete is finally formed is the nano-silver layer of the thin layer of 5-20nm; The oxide of wherein said silver is Ag 2o, AgO or Ag 2o 3;
I, plating the 9th rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
8. the manufacture method of a kind of Multifunctional touching display screen according to claim 7, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in the vacuum chamber of vacuum evaporation plating machine, cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
9. the manufacture method of Multifunctional touching display screen according to claim 6, it is characterized in that: when described substrate is by glass ware forming, described manufacture method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outside surface of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silicon dioxide, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silicon dioxide, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the oxide evaporation of the silver of the film material of the 8th rete is rear decomposes, be attached to the surface of the 7th rete in above-mentioned steps G with the form of nanoscale elemental silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the thickness after the 8th rete is finally formed is the nano-silver layer of the thin layer of 5-20nm; The oxide of wherein said silver is Ag 2o, AgO or Ag 2o 3;
I, plating the 9th rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10 -3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silicon dioxide high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum tightness in vacuum coating cabin is kept to be more than or equal to 5.0 × 10 -3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
10. the manufacture method of a kind of Multifunctional touching display screen according to claim 9, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in the vacuum chamber of vacuum evaporation plating machine, cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
CN201511029034.4A 2015-12-31 2015-12-31 Multifunctional touch display screen and manufacturing method thereof Pending CN105446539A (en)

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