CN105665397A - Liquid crystal glass substrate cleaning device and method - Google Patents
Liquid crystal glass substrate cleaning device and method Download PDFInfo
- Publication number
- CN105665397A CN105665397A CN201610153466.4A CN201610153466A CN105665397A CN 105665397 A CN105665397 A CN 105665397A CN 201610153466 A CN201610153466 A CN 201610153466A CN 105665397 A CN105665397 A CN 105665397A
- Authority
- CN
- China
- Prior art keywords
- liquid crystal
- crystal glass
- glass base
- unit
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Liquid Crystal (AREA)
Abstract
The invention relates to the field of liquid crystal glass substrates, and discloses a liquid crystal glass substrate cleaning device and method. The liquid crystal glass substrate cleaning device comprises a cleaning fluid cleaning unit, a front isolation unit and a rear isolation unit, wherein the front isolation unit and the rear isolation unit are respectively connected to the head end and the tail end of the cleaning fluid cleaning unit; each of the front isolation unit and the rear isolation unit comprises a fluid cutter part which is close to one side of the cleaning fluid cleaning unit; and the fluid cutter parts respectively spray cleaning fluid to the cleaning fluid cleaning unit obliquely so as to form a cleaning fluid curtain extending in the width direction of the liquid crystal glass substrate cleaning device. The liquid crystal glass substrate cleaning method comprises the step of cleaning the liquid crystal glass substrate by using the liquid crystal glass substrate cleaning device, wherein the cleaning fluid is a hydrochloric acid solution. In the liquid crystal glass substrate cleaning device, the cleaning fluid cleaning unit is well isolated from front and back relevant working procedure units. By the method disclosed by the invention, the good cleaning effect can be achieved.
Description
Technical field
The present invention relates to liquid-crystalline glasses field, in particular it relates to a kind of liquid crystal glass base cleaning equipment and method.
Background technology
As the manufacture method of the glass substrates used such as a kind of liquid crystal display, well known, including the manufacture method being called float forming, this manufacture method generally comprises following operation: forming process, namely forms ribbon glass substrate; Cut-out/chamfering/grinding step, becomes the satisfactory rectangle glass of preliminary dimension by above-mentioned ribbon glass substrate cutting; Matting, namely removes the foreign body of glass surface; And inspection, packaging process etc.
Wherein, matting uses liquid crystal glass base cleaning equipment to complete, to remove contamination and the granule of glass baseplate surface. Current liquid crystal glass base cleaning equipment is applicable for use with alkaline cleaner mostly, as containing surfactant KOH or NaOH etc., and current liquid crystal glass base cleaning equipment puts into after glass substrate put into conveyer belt by unit by it mostly, then through cutting liquid, caustic dip, cut liquid, pure water cleaning, air knife, export from output unit after hot air drying, thus completing the whole cleaning process of glass substrate, in order to being delivered to subsequent processing. But there is problems of, owing to the cleaning dynamics of alkaline cleaning fluid is inadequate, the major part that alkaline cleaning fluid can remove glass baseplate surface is used to stain and granule, but the foreign body that glass substrate adheres to when kiln molten tin bath annealing furnace molding or surface dropping, it is very difficult to remove such as stannum speckle etc., when this makes to use glass substrate to make display, cause the short circuit on panel, affect the quality of finished product; But, if use the equipment that hydrochloric acid solution etc. has abrasive intensity, due to corrosivity relatively by force so that higher safeguard procedures, existing liquid crystal glass base cleaning equipment cannot meet this requirement due to the restriction of structure etc.
Summary of the invention
It is an object of the invention to provide a kind of liquid crystal glass base cleaning equipment, the isolation of the cleanout fluid cleaning unit of this liquid crystal glass base cleaning equipment is better, and present invention also offers a kind of liquid crystal glass base cleaning method.
To achieve these goals, the present invention provides a kind of liquid crystal glass base cleaning equipment, this liquid crystal glass base cleaning equipment includes cleanout fluid cleaning unit and is connected to the front isolated location at described cleanout fluid cleaning unit head and the tail two ends and rear isolated location, described front isolated location and described rear isolated location include the liquid cutting knife portion arranged near the side of described cleanout fluid cleaning unit respectively, described liquid cutting knife portion is provided towards described cleanout fluid cleaning unit jet cleaning liquid obliquely respectively, to form the cleanout fluid curtain extended along the width of described liquid crystal glass base cleaning equipment.
Preferably, the nozzle in described liquid cutting knife portion is set to the angle with vertical direction is 5 ° to 30 °.
Preferably, described front isolated location and described rear isolated location respectively further comprise and deviate from the autogenous cutting cutter portion that the side of described cleanout fluid cleaning unit is arranged.
Preferably, this liquid crystal glass base cleaning equipment includes the conveyer belt for carrying liquid crystal glass base, and described liquid cutting knife portion includes the upper liquid cutting knife that lays respectively at above and below described conveyer belt and correspond to each other and lower liquid cutting knife; Described autogenous cutting cutter portion includes laying respectively at above and below conveyer belt and the upper autogenous cutting cutter that corresponds to each other and therapeutic method to keep the adverse QI flowing downwards cutting knife.
Preferably, what the described autogenous cutting cutter portion of described front isolated location and described rear isolated location included arranging near each self-corresponding described liquid cutting knife portion respectively cuts cleanout fluid air knife portion, described in cut cleanout fluid air knife portion and be provided towards each self-corresponding described liquid cutting knife portion and blow air obliquely.
Preferably, this liquid crystal glass base cleaning equipment also includes the prerinse unit being connected to described front isolated location front end, the described autogenous cutting cutter portion of described front isolated location also includes second cutting water air knife portion near what described prerinse unit was arranged, and this second is cut water air knife portion and be provided towards described prerinse unit and blow air obliquely;
And, this liquid crystal glass base cleaning equipment also includes the pure water cleaning unit being connected to described rear isolated location tail end, the described autogenous cutting cutter portion of described rear isolated location also includes the 3rd cutting water air knife portion near what described pure water cleaning unit was arranged, and the 3rd cuts water air knife portion is provided towards described pure water cleaning unit and blows air obliquely.
Preferably, this liquid crystal glass base cleaning equipment also includes the input isolated location and the input unit that are linked in sequence in described prerinse unit front end, described input isolated location includes first and cuts water air knife portion, and this first is cut water air knife portion and be provided towards described prerinse unit and blow air; And/or this liquid crystal glass base cleaning equipment also includes being linked in sequence and cuts drying unit and output unit in described pure water cleaning unit tail end.
Preferably, this liquid crystal glass base cleaning equipment adopts hydrochloric acid corrosion resistant material to make.
Present invention also offers a kind of liquid crystal glass base cleaning method, this liquid crystal glass base cleaning method includes utilizing the liquid crystal glass base cleaning equipment according to the present invention that liquid crystal glass base is carried out, and described cleanout fluid is hydrochloric acid solution.
Preferably, the concentration of described hydrochloric acid solution is 5%～18%, and temperature is 30 °～40 °; Further, described liquid crystal glass base residence time in described cleanout fluid cleaning unit is 30s～60s.
In the liquid crystal glass base cleaning equipment of the present invention, by the both sides, front and back at cleanout fluid cleaning unit, isolated location is set, the operation unit making cleanout fluid cleaning unit relevant to front and back has better isolation, the raising of isolation desirably prevents in cleanout fluid cleaning unit the cleanout fluid of spray to the operation unit crossfire of adjacent (front side or rear side), operation unit before and after polluting, the improvement of this structure makes the liquid crystal glass base cleaning equipment of the present invention can be better adapted to the cleanout fluid that the corrosivity such as hydrochloric acid are higher thus higher to described insulated degree requirement. and, specifically, the isolation method adopted in the present invention is by being respectively provided with two liquid cutting knife portions near described cleanout fluid cleaning unit rear and front end place, and two liquid cutting knife portions are used for being respectively facing cleanout fluid cleaning unit jet cleaning liquid, thus the width along described crystal glass substrate cleaning apparatus forms one cleanout fluid curtain, play the effect preventing cleanout fluid cleaning unit to the operation unit crossfire before and after cleanout fluid cleaning unit.
Other features and advantages of the present invention will be described in detail in detailed description of the invention part subsequently.
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and constitutes the part of description, is used for explaining the present invention, but is not intended that limitation of the present invention together with detailed description below. In the accompanying drawings:
Fig. 1 is the side view of the liquid crystal glass base cleaning equipment according to the preferred embodiment of the present invention;
Fig. 2 is the enlarged drawing at the front isolated location place of the liquid crystal glass base cleaning equipment in Fig. 1;
Fig. 3 is the enlarged drawing at the rear isolated location place of the liquid crystal glass base cleaning equipment in Fig. 1;
Fig. 4 is the substantially flow chart using the liquid crystal glass base cleaning equipment in Fig. 1 that liquid crystal glass base is carried out.
Description of reference numerals
1 puts into unit 2 prerinse unit
3 cleanout fluid cleaning unit 4 pure water cleaning units
5 cut drying unit 6 output unit
Cleanout fluid air knife portion is cut in 7,9 liquid cutting knife portions 8,10
11 the 3rd cut water air knife portion 12 second cuts water air knife portion
Isolated location before 14 input isolated locations 15
Isolated location after 16
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail. It should be appreciated that detailed description of the invention described herein is merely to illustrate and explains the present invention, it is not limited to the present invention.
In the present invention, when not making contrary explanation, the noun of locality of use is usually undefined in the normal service condition of the liquid crystal glass base cleaning equipment of the present invention and also consistent with direction shown in reference accompanying drawing such as " upper and lower ".
The invention provides a kind of liquid crystal glass base cleaning equipment, this liquid crystal glass base cleaning equipment includes cleanout fluid cleaning unit 3 and is connected to front isolated location 15 and the rear isolated location 16 at described cleanout fluid cleaning unit 3 head and the tail two ends, described front isolated location 15 and described rear isolated location 16 include the liquid cutting knife portion 7 and the liquid cutting knife portion 9 that arrange near the side of described cleanout fluid cleaning unit 3 respectively, described liquid cutting knife portion 7 and liquid cutting knife portion 9 are respectively set to towards described cleanout fluid cleaning unit 3 jet cleaning liquid obliquely, to form the cleanout fluid curtain extended along the width of described liquid crystal glass base cleaning equipment.
In the liquid crystal glass base cleaning equipment of the present invention, by the both sides, front and back at cleanout fluid cleaning unit 3, isolated location is set, the operation unit making cleanout fluid cleaning unit 3 relevant to front and back has better isolation, the raising of isolation desirably prevents in cleanout fluid cleaning unit 3 cleanout fluid of spray to the operation unit crossfire of adjacent (front side or rear side), operation unit before and after polluting, the improvement of this structure makes the liquid crystal glass base cleaning equipment of the present invention can be better adapted to the cleanout fluid that the corrosivity such as hydrochloric acid are higher thus higher to described insulated degree requirement. and, specifically, the isolation method adopted in the present invention is by being respectively provided with liquid cutting knife portion 7 and liquid cutting knife portion 9 near described cleanout fluid cleaning unit 3 rear and front end place, and liquid cutting knife portion 7 and liquid cutting knife portion 9 are used for being respectively facing cleanout fluid cleaning unit 3 jet cleaning liquid, such as spray hydrochloric acid solution continuously, thus the width along described crystal glass substrate cleaning apparatus forms one cleanout fluid curtain, in the process of liquid crystal glass base normal transmission, play the effect preventing cleanout fluid cleaning unit 3 to the operation unit crossfire before and after cleanout fluid cleaning unit 3.
Preferably, in order to reach good isolation effect, it is 5 ° to 30 ° that the nozzle in described liquid cutting knife portion 7,9 is set to the angle with vertical direction.
And, referring to Fig. 1 to Fig. 3, in a preferred embodiment of the invention, described front isolated location 15 and described rear isolated location 16 respectively further comprise and deviate from the autogenous cutting cutter portion that the side of described cleanout fluid cleaning unit 3 is arranged, thus, can forming dual resisteance measure respectively between the operation unit (prerinse unit 2 and pure water cleaning unit 4) in such as present embodiment of cleanout fluid cleaning unit 3 and front and back, namely autogenous cutting isolation and liquid cut isolation, thus improving isolation effect further.
Further, in the present embodiment, this liquid crystal glass base cleaning equipment includes the conveyer belt for carrying liquid crystal glass base, and described liquid cutting knife portion 7,9 includes the upper liquid cutting knife that lays respectively at above and below described conveyer belt and correspond to each other and lower liquid cutting knife; Described autogenous cutting cutter portion includes laying respectively at above and below conveyer belt and the upper autogenous cutting cutter that corresponds to each other and therapeutic method to keep the adverse QI flowing downwards cutting knife. As such, it is possible to respectively prerinse unit 2 and the operation unit that is adjacent more fully are isolated from the upper side and lower side of liquid crystal glass base.
Wherein, the described autogenous cutting cutter portion of described front isolated location 15 and described rear isolated location 16 can include near each self-corresponding described liquid cutting knife portion 7 respectively, 9 arrange cut cleanout fluid air knife portion 8,10, described cut cleanout fluid air knife portion 8,10 are provided towards each self-corresponding described liquid cutting knife portion 7,9 blows air obliquely. Cut cleanout fluid air knife portion 8; 10 is to liquid cutting knife portion 7; the second protection of 9; cutting cleanout fluid air knife portion 8 can effectively prevent liquid crystal glass base when the past isolated location 15 enters cleanout fluid cleaning unit 3; cleanout fluid adverse current in cleanout fluid cleaning unit 3 enters front isolated location 15; cut cleanout fluid air knife portion 10 and then can effectively prevent liquid crystal glass base isolated location 16, formation twice isolation after the entrance of cleanout fluid crossfire during isolated location 16 after entering from cleanout fluid cleaning unit 3.
Preferably, this liquid crystal glass base cleaning equipment also includes the prerinse unit 2 being connected to described front isolated location 15 front end, further preferably, the described autogenous cutting cutter portion of described front isolated location 15 also includes second cutting water air knife portion 12 near what described prerinse unit 2 was arranged, and this second is cut water air knife portion 12 and be provided towards described prerinse unit 2 and blow air obliquely.
And, preferably, this liquid crystal glass base cleaning equipment also includes the pure water cleaning unit 4 being connected to described rear isolated location 16 tail end, further preferably, the described autogenous cutting cutter portion of described rear isolated location 16 also includes the 3rd cutting water air knife portion 11 near what described pure water cleaning unit 4 was arranged, and the 3rd cuts water air knife portion 11 is provided towards described pure water cleaning unit 4 and blows air obliquely.
In preferred implementation shown in Fig. 1 and Fig. 4, prerinse unit 2 can use water that liquid crystal glass base is carried out prerinse, to remove the bulky grain etc. on liquid crystal glass base surface, pure water cleaning unit 4 is then for cleaning the cleanout fluid of clean liquid crystal glass base remained on surface, additionally, the setting of prerinse unit 2 and pure water cleaning unit 4 isolated location 15 and rear isolated location 16 can dilute the cleaning liquid mist (such as hydrochloric acid mist) in cleanout fluid cleaning unit 3 when occurring abnormal in the past, effectively prevented cleaning liquid mist processing apparatus forwards, backwards and polluted.
Further, wherein, second cuts the water that water air knife portion 12 is prevented effectively from liquid crystal glass base surface brings cleanout fluid cleaning unit 3 into, causes the concentration of lotion in cleanout fluid cleaning unit 3 to reduce and affect cleaning performance; 3rd cuts the watery vomiting that water air knife portion 11 is then prevented effectively from liquid crystal glass base surface flows into cleanout fluid cleaning unit 3, causes the concentration of lotion in cleanout fluid cleaning unit 3 to reduce and affect cleaning performance.
In addition, this liquid crystal glass base cleaning equipment also includes the input isolated location 14 and the input unit 1 that are linked in sequence in described prerinse unit 2 front end, described input isolated location 14 includes first and cuts water air knife portion, this first is cut water air knife portion and is provided towards described prerinse unit 2 and blows air, puts in unit 1 preventing the water in prerinse unit 2 from flowing into; And/or this liquid crystal glass base cleaning equipment also includes being linked in sequence and cuts drying unit 5 and output unit 6 in described pure water cleaning unit 4 tail end.
Above-mentioned input unit 1, put into isolated location 14, prerinse unit 2, front isolated location 15, cleanout fluid cleaning unit 3, rear isolated location 16, pure water cleaning unit 4, cut drying unit 5 and output unit 6 could be arranged to be linked in sequence successively, additionally, described liquid crystal glass base cleaning equipment also includes tank unit (not shown), thinks that equipment provides water source.
Referring to Fig. 4, liquid crystal glass base to be cleaned is from a upper incoming input unit 1 of operation, under the conveying of conveyer belt, through putting into isolated location 14, enter prerinse unit 2, prerinse uses water that liquid crystal glass base is carried out prerinse, remove the bulky grain etc. on liquid crystal glass base surface, then the liquid crystal glass base after prerinse is through front isolated location 15, enter cleanout fluid cleaning unit 3 unit, cleanout fluid cleaning unit 3 adopts cleanout fluid (such as hydrochloric acid solution) that liquid crystal glass base is carried out degree of depth cleaning, effectively remove residue and stuck foreign matter during the thermoforming on liquid crystal glass base surface, then the liquid crystal glass base after deep clean is then through rear isolated location 16, enter pure water cleaning unit 4 to be cleaned the cleanout fluid removing remained on surface by pure water, then, dry through cutting drying unit 5, it is transported to subsequent processing again through output unit 6.
So that the liquid crystal glass base cleaning equipment of the present invention can adapt to the hydrochloric acid solution in more highly corrosive as cleanout fluid, to obtain better cleaning effect, it is preferable that this liquid crystal glass base cleaning equipment adopts hydrochloric acid corrosion resistant material to make.
According to a further aspect in the invention, provide a kind of liquid crystal glass base cleaning method, this liquid crystal glass base cleaning method includes utilization and according to liquid crystal glass base cleaning equipment of the present invention, liquid crystal glass base is carried out, and described cleanout fluid is hydrochloric acid solution.
Wherein, in order to obtain better cleaning effect, it is preferable that the concentration of described hydrochloric acid solution is 5%～18%, temperature is 30 °～40 °; Further, described liquid crystal glass base residence time in described cleanout fluid cleaning unit 3 is 30s～60s.
Use above-mentioned liquid crystal glass base cleaning method, the cold end being possible not only to remove liquid crystal glass base surface pollutes and surface particles, and the defect that liquid crystal glass base produces when hot junction molding can be removed well, it is effectively improved the yields of liquid crystal glass base.
The preferred embodiment of the present invention is described in detail above in association with accompanying drawing; but; the present invention is not limited to the detail in above-mentioned embodiment; in the technology concept of the present invention; technical scheme can being carried out multiple simple variant, these simple variant belong to protection scope of the present invention.
It is further to note that, each concrete technical characteristic described in above-mentioned detailed description of the invention, in reconcilable situation, it is possible to be combined by any suitable mode, in order to avoid unnecessary repetition, various possible compound modes are no longer illustrated by the present invention separately.
Additionally, can also carry out combination in any between the various different embodiment of the present invention, as long as it is without prejudice to the thought of the present invention, it should be considered as content disclosed in this invention equally.
Claims (10)
1. a liquid crystal glass base cleaning equipment, it is characterized in that, this liquid crystal glass base cleaning equipment includes cleanout fluid cleaning unit (3) and is connected to front isolated location (15) and the rear isolated location (16) at described cleanout fluid cleaning unit (3) head and the tail two ends, described front isolated location (15) and described rear isolated location (16) include the liquid cutting knife portion (7 arranged near the side of described cleanout fluid cleaning unit (3) respectively, 9), described liquid cutting knife portion (7, 9) it is respectively set to towards described cleanout fluid cleaning unit (3) jet cleaning liquid obliquely, to form the cleanout fluid curtain extended along the width of described liquid crystal glass base cleaning equipment.
2. liquid crystal glass base cleaning equipment according to claim 1, it is characterised in that it is 5 ° to 30 ° that the nozzle of described liquid cutting knife portion (7,9) is set to the angle with vertical direction.
3. liquid crystal glass base cleaning equipment according to claim 1, it is characterized in that, described front isolated location (15) and described rear isolated location (16) respectively further comprise and deviate from the autogenous cutting cutter portion that the side of described cleanout fluid cleaning unit (3) is arranged.
4. liquid crystal glass base cleaning equipment according to claim 3, it is characterized in that, this liquid crystal glass base cleaning equipment includes the conveyer belt for carrying liquid crystal glass base, described liquid cutting knife portion (7,9) includes the upper liquid cutting knife that lays respectively at above and below described conveyer belt and correspond to each other and lower liquid cutting knife; Described autogenous cutting cutter portion includes laying respectively at above and below conveyer belt and the upper autogenous cutting cutter that corresponds to each other and therapeutic method to keep the adverse QI flowing downwards cutting knife.
5. liquid crystal glass base cleaning equipment according to claim 3, it is characterized in that, the described autogenous cutting cutter portion of described front isolated location (15) and described rear isolated location (16) includes near each self-corresponding described liquid cutting knife portion (7 respectively, 9) what arrange cuts cleanout fluid air knife portion (8,10), described cut cleanout fluid air knife portion (8,10) it is provided towards each self-corresponding described liquid cutting knife portion (7,9) and blows air obliquely.
6. liquid crystal glass base cleaning equipment according to claim 3, it is characterized in that, this liquid crystal glass base cleaning equipment also includes the prerinse unit (2) being connected to described front isolated location (15) front end, the described autogenous cutting cutter portion of described front isolated location (15) also includes second cutting water air knife portion (12) near what described prerinse unit (2) was arranged, and this second is cut water air knife portion (12) and be provided towards described prerinse unit (2) and blow air obliquely;
And, this liquid crystal glass base cleaning equipment also includes the pure water cleaning unit (4) being connected to described rear isolated location (16) tail end, the described autogenous cutting cutter portion of described rear isolated location (16) also includes the 3rd cutting water air knife portion (11) near what described pure water cleaning unit (4) was arranged, and the 3rd cuts water air knife portion (11) is provided towards described pure water cleaning unit (4) and blows air obliquely.
7. liquid crystal glass base cleaning equipment according to claim 6, it is characterized in that, this liquid crystal glass base cleaning equipment also includes being linked in sequence the input isolated location (14) in described prerinse unit (2) front end and put into unit (1), described input isolated location (14) includes first and cuts water air knife portion, and this first is cut water air knife portion and be provided towards described prerinse unit (2) and blow air;
And/or this liquid crystal glass base cleaning equipment also includes being linked in sequence and cuts drying unit (5) and output unit (6) in described pure water cleaning unit (4) tail end.
8. the liquid crystal glass base cleaning equipment according to any one in claim 1-7, it is characterised in that this liquid crystal glass base cleaning equipment adopts hydrochloric acid corrosion resistant material to make.
9. a liquid crystal glass base cleaning method, it is characterized in that, this liquid crystal glass base cleaning method includes utilizing the liquid crystal glass base cleaning equipment according to any one in claim 1-8 that liquid crystal glass base is carried out, and described cleanout fluid is hydrochloric acid solution.
10. liquid crystal glass base cleaning method according to claim 9, it is characterised in that the concentration of described hydrochloric acid solution is 5%～18%, temperature is 30 °～40 °; Further, described liquid crystal glass base residence time in described cleanout fluid cleaning unit (3) is 30s～60s.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610153466.4A CN105665397A (en) | 2016-03-17 | 2016-03-17 | Liquid crystal glass substrate cleaning device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610153466.4A CN105665397A (en) | 2016-03-17 | 2016-03-17 | Liquid crystal glass substrate cleaning device and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105665397A true CN105665397A (en) | 2016-06-15 |
Family
ID=56310716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610153466.4A Pending CN105665397A (en) | 2016-03-17 | 2016-03-17 | Liquid crystal glass substrate cleaning device and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105665397A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106391571A (en) * | 2016-12-09 | 2017-02-15 | 曾周 | Cleaning technology for ITO glass |
| CN107520159A (en) * | 2017-08-21 | 2017-12-29 | 深圳市欣裕达机械设备有限公司 | A kind of novel efficient uprightly passes through formula Tray cleaning machines |
| CN111085520A (en) * | 2019-11-23 | 2020-05-01 | 石家庄旭新光电科技有限公司 | Liquid crystal glass substrate cleaning system |
| CN111215416A (en) * | 2020-03-27 | 2020-06-02 | 无锡犇腾净化科技有限公司 | Cleaning air dryer suitable for tray |
| CN111632979A (en) * | 2020-06-01 | 2020-09-08 | 史广斌 | Cleaning device for outer surface of glass |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1485150A (en) * | 2002-08-19 | 2004-03-31 | 大日本屏影象制造株式会社 | Substrate processing device and rinsing apparatus |
| WO2005053006A1 (en) * | 2003-11-25 | 2005-06-09 | Sumitomo Precision Products Co., Ltd. | Conveyance system substrate treating apparatus |
| CN1947871A (en) * | 2005-10-14 | 2007-04-18 | 大日本网目版制造株式会社 | Substrate treating apparatus |
| CN103990624A (en) * | 2014-05-28 | 2014-08-20 | 深圳市汉东电子玻璃清洗设备有限公司 | Cleaning machine |
| CN104014572A (en) * | 2014-05-26 | 2014-09-03 | 深圳市和科达精密清洗设备股份有限公司 | Automatic glass cleaning equipment |
| CN205393141U (en) * | 2016-03-17 | 2016-07-27 | 东旭科技集团有限公司 | Liquid crystal glazing base plate cleaning equipment |
-
2016
- 2016-03-17 CN CN201610153466.4A patent/CN105665397A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1485150A (en) * | 2002-08-19 | 2004-03-31 | 大日本屏影象制造株式会社 | Substrate processing device and rinsing apparatus |
| WO2005053006A1 (en) * | 2003-11-25 | 2005-06-09 | Sumitomo Precision Products Co., Ltd. | Conveyance system substrate treating apparatus |
| CN1947871A (en) * | 2005-10-14 | 2007-04-18 | 大日本网目版制造株式会社 | Substrate treating apparatus |
| CN104014572A (en) * | 2014-05-26 | 2014-09-03 | 深圳市和科达精密清洗设备股份有限公司 | Automatic glass cleaning equipment |
| CN103990624A (en) * | 2014-05-28 | 2014-08-20 | 深圳市汉东电子玻璃清洗设备有限公司 | Cleaning machine |
| CN205393141U (en) * | 2016-03-17 | 2016-07-27 | 东旭科技集团有限公司 | Liquid crystal glazing base plate cleaning equipment |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106391571A (en) * | 2016-12-09 | 2017-02-15 | 曾周 | Cleaning technology for ITO glass |
| CN107520159A (en) * | 2017-08-21 | 2017-12-29 | 深圳市欣裕达机械设备有限公司 | A kind of novel efficient uprightly passes through formula Tray cleaning machines |
| CN111085520A (en) * | 2019-11-23 | 2020-05-01 | 石家庄旭新光电科技有限公司 | Liquid crystal glass substrate cleaning system |
| CN111215416A (en) * | 2020-03-27 | 2020-06-02 | 无锡犇腾净化科技有限公司 | Cleaning air dryer suitable for tray |
| CN111632979A (en) * | 2020-06-01 | 2020-09-08 | 史广斌 | Cleaning device for outer surface of glass |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105665397A (en) | Liquid crystal glass substrate cleaning device and method | |
| CN103157628B (en) | The cleaning device of inorganic components and cleaning method thereof | |
| TW200407201A (en) | Substrate treatment apparatus and substrate washing method | |
| CN205393141U (en) | Liquid crystal glazing base plate cleaning equipment | |
| CN104362118B (en) | Liquid cutter cleaning device | |
| CN110734814A (en) | glass cleaning composition and preparation method thereof | |
| CN103691691A (en) | Full-automatic washing and drying machine for hollow type suppository for infusion preparation | |
| JP2009185347A (en) | Steel sheet cleaning device | |
| CN104772313B (en) | A kind of cleaning method of sapphire wafer after plated film | |
| TWI607977B (en) | Chemical polishing device | |
| CN112139189A (en) | Glass plate cleaning device and glass plate manufacturing method | |
| KR102609763B1 (en) | Manufacturing method of glass plate | |
| JP2006148144A (en) | Cleaning apparatus for plate and draining apparatus thereof | |
| JP2004174308A (en) | Sheet material washing equipment | |
| JP4620573B2 (en) | Board cleaning equipment and high-pressure liquid spray cleaning equipment | |
| CN103235481B (en) | Glue uniformization chromium plate manufacturing process | |
| JP5340457B1 (en) | Chemical polishing equipment | |
| KR101988999B1 (en) | Single wafer-type chemical polishing device | |
| KR101147653B1 (en) | Apparatus for treating substrates | |
| KR101634186B1 (en) | Cleaning apparatus for plate type material surface and cleaning method thereof | |
| JP2010131485A (en) | Device and method for draining liquid on substrate | |
| TWI627145B (en) | Sheet cutter with clean air shield | |
| JP2016155728A (en) | Apparatus and method for producing glass substrate | |
| JP2007160283A (en) | Substrate washing apparatus | |
| JP4606498B2 (en) | Board cleaning equipment and high-pressure liquid spray cleaning equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160615 |