CN105629673A - Vector arc rotary stage switching method and device for double interferometer measurement-based gas-magnetic-combined air floatation workpiece stage - Google Patents
Vector arc rotary stage switching method and device for double interferometer measurement-based gas-magnetic-combined air floatation workpiece stage Download PDFInfo
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- CN105629673A CN105629673A CN201610023020.XA CN201610023020A CN105629673A CN 105629673 A CN105629673 A CN 105629673A CN 201610023020 A CN201610023020 A CN 201610023020A CN 105629673 A CN105629673 A CN 105629673A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N15/00—Holding or levitation devices using magnetic attraction or repulsion, not otherwise provided for
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Abstract
The invention provides a vector arc rotary stage switching method and device for double interferometer measurement-based gas-magnetic-combined air floatation workpiece stages, and belongs to a semiconductor manufacturing equipment technology. The device comprises a support frame, a balance mass block, gas-magnetic-combined air floatation workpiece stages, a workpiece stage measurement device and a workpiece stage drive device, wherein the two workpiece stages work between a measurement station and an exposure station; the positions of the workpiece stages are measured by laser interferometers; motion compensation is carried out on the balance mass block by an active compensation structure comprising double motor crank-rocker mechanisms; the workpiece stages are driven by air suspension planar motors; and the two workpiece stages are driven by the planar motors to achieve single-beat arc fast stage switching in the double workpiece stage switching process. According to the vector arc rotary stage switching method and device, the problems that an existing stage switching scheme has multiple beats, a long track, multiple starting and stopping beats, long stabilization time and the like are solved; the stage switching link is reduced; the stage switching time is shortened; and the productivity of a lithography machine is improved.
Description
Technical field
The invention belongs to semiconductor manufacturing equipment technical field, relate generally to the moving winding gas magnetic knot based on a kind of interferometer measurement and close air supporting double-workpiece-table vector circular arc revolution channel switching method and device.
Background technology
Litho machine is one of ultraprecise equipment important during great scale integrated circuit manufactures. Work stage as litho machine key subsystem determines the resolution of litho machine, alignment precision and productivity to a great extent.
Productivity is mainly one of pursuing a goal of litho machine development. When meeting resolution and alignment precision, improve work stage operational efficiency and then improve the developing direction that litho machine productivity is work stage technology. Improving the work stage the most direct mode of operational efficiency is exactly improve acceleration of motion and the speed of work stage, but for ensureing original precision, speed and acceleration can not unrestrictedly improve. Initial work stage only one of which silicon wafer carrying device, litho machine once can only process a silicon chip, and whole operation serial process, production efficiency is low. Dual-stage technology is proposed for this, this is also the mainstream technology means improving litho machine production efficiency at present. Dual-stage technology is provided with exposure, two stations of pretreatment and two work stage in work stage, exposure and measure adjustment can parallel processing, substantially reduce the time, improve production efficiency. Current representative products is the ASML company of the Holland litho machine based on Twinscan technology and dual-stage technology.
The operational efficiency of raising double-workpiece-table is one of developing goal of current photo-etching machine work-piece platform technology. Dual-stage technology involve the problem that work stage switches between two stations, zapping efficiency directly influences the operational efficiency of photo-etching machine work-piece platform and the productivity of litho machine. How to reduce zapping when shortening the zapping time as far as possible and the interference of other system is always up the emphasis of research. In tradition dual stage handoff procedure, work stage is the same with in pretreatment process in exposure is linear drives, in dual stage patent US2001/0004105A1 and W098/40791, each work stage has the unit of two commutative cooperations to realize the exchange of dual stage, productivity is improve under the premise not improving work stage movement velocity, but owing to adopting the mode that is of coupled connections between work stage and guide rail, in zapping process, work stage there will be of short duration separating with driver element, and the positioning precision of work stage is produced considerable influence. Moving cell and guide rail are longer simultaneously, and moving-mass is relatively big, and the raising for movement velocity and acceleration all has a negative impact. Chinese patent CN101609265 proposes the silicon slice platform multi-platform exchange system that a kind of planar motor drives, and planar motor stator is arranged on base station top, and mover is arranged on bottom silicon wafer stage, drives the separation being absent from work stage and driver element relative to linear electric motors; Chinese patent CN101694560 proposes a kind of double-platform switching system adopting air supporting to support permanent-magnet planar motor driving, work stage adopts planar motor drive and supported by air supporting, avoid driver element and work stage separation problem in aforementioned zapping process, reduce work stage running resistance, reduce planar motor and drive electric current, reduce heat dissipation problem.
Adopting straight line zapping scheme during above-mentioned patent zapping, revolution zapping scheme relatively straight line zapping scheme has unique advantage, therefore occurs in that the dual-stage technology adopting revolution zapping. Chinese patent CN101071275 adopts the mode turning round whole base station to realize the transposition of double-workpiece-table, simplifies system structure, two work stage are moved non-overlapping regions simultaneously, it is to avoid collision safety hidden danger. But realizing work stage transposition by turning round whole base station to there is rotary inertia big, high-power turning motor precision positioning difficulty and caloric value cause greatly the problems such as system temperature rise, and the radius of gyration is big, makes litho machine main machine structure enlarge markedly simultaneously. Chinese patent CN102495528 adopts at base station center one to turn round through position and completes double-workpiece-table zapping, and zapping is divided into three beats, improves zapping efficiency, but revolution zapping mechanism structure is complicated, and revolution positioning precision is relatively low.
Summary of the invention
For above-mentioned the deficiencies in the prior art, the present invention proposes a kind of moving winding gas magnetic knot based on interferometer measurement and closes air supporting double-workpiece-table vector circular arc revolution channel switching method and device, reaches to realize work stage single-unit and claps quick camber line zapping, reduces zapping link, shortens the zapping time, is effectively increased the purpose of litho machine productivity.
The object of the present invention is achieved like this.
Propose a kind of moving winding gas magnetic knot based on interferometer measurement and close air supporting double-workpiece-table vector circular arc channel switching method, the method comprises the following steps: original operating state, measuring position the first work stage and be in prealignment state, exposure position second workpiece platform is in exposure status, the first step, and is waited to measurement position zapping precalculated position A by moving winding actuation movement after measuring position the first work stage prealignment, by moving winding actuation movement to exposure zapping precalculated position, position B after the second workpiece platform exposure of exposure position, second step, first work stage and second workpiece platform by planar motor vector controlled along arc track counterclockwise movement, in motor process, the phase place of two work stage does not change, movement position is measured by interferometer, meanwhile, first cable stage is followed the first work stage and is moved to exposure position by measuring a side, second cable stage follows second workpiece platform by exposing a side to measuring position motion, when the first work stage moves to exposure precalculated position, position C, when second workpiece platform moves to measurement precalculated position, position D, zapping terminates, first work stage carries out silicon chip photolithographic exposure in exposure position, second workpiece platform carries out silicon chip upper slice and wafer pre-alignment operation in measurement position, 3rd step, and is waited to measurement position zapping precalculated position A' by moving winding actuation movement after measuring position second workpiece platform prealignment, by moving winding actuation movement to exposure zapping precalculated position, position B' after the first work stage exposure of exposure position, 4th step, second workpiece platform and the first work stage by planar motor vector controlled along arc track clockwise movement, meanwhile, first cable stage follows the first work stage by exposing a side to measuring position motion, second cable stage is followed second workpiece platform and is moved to exposure position by measuring a side, when second workpiece platform moves to exposure precalculated position, position C, when first work stage moves to measurement precalculated position, position D, zapping terminates, exposure position second workpiece platform enters exposure status, measure position the first work stage and carry out fluctuating plate and prealignment operation, now system returns to original operating state, complete the working cycle comprising twice zapping operation.
Propose a kind of gas magnetic knot based on interferometer measurement and close air supporting double-workpiece-table vector circular arc revolution programme changer, this device includes supporting framework, balance mass block, first work stage, second workpiece platform, described balance mass block is positioned at above support framework, grand dynamic planar motor stator is arranged in the plane on balance mass block, first work stage and second workpiece platform are arranged in above grand dynamic planar motor stator, described first work stage and second workpiece platform run between measurement position and exposure position, bracing frame is fixing on the support frame, 6 interferometers are arranged on bracing frame, first work stage is connected by the first cable stage cable and the first cable stage, second workpiece platform is connected by the second cable stage cable and the second cable stage, first cable stage and the second cable stage are separately mounted on the first cable stage guide rail and the second cable stage guide rail, support framework to be connected with balance mass block by the active motion compensation mechanism being made up of two bi-motor crank and rocker mechanisms, described bi-motor crank and rocker mechanism is made up of pedestal, 2 servomotors, 1 output shaft, 2 grating scales, 2 read heads, 2 cranks, 2 rocking bars, servomotor rotating shaft is connected with crank, 2 cranks are connected on same output shaft respectively through rocking bar, output shaft is connected by rolling bearing with balance mass block, grating scale is coaxially connected with servomotor, and read head is fixed on pedestal, first work stage and second workpiece platform are six-freedom-degree magnetic suspension jiggle station, described six-freedom-degree magnetic suspension jiggle station is made up of Chuck, sucker, prism of corner cube, crashproof frame, grand dynamic planar motor rotor, fine motion planar motor rotor and gravity compensator mover integrate, and gas foot and vac sorb district are distributed in the bottom of six-freedom-degree magnetic suspension jiggle station, described sucker is arranged on Chuck, Chuck surrounding is provided with four prism of corner cubes, in Chuck surrounding, crashproof frame is installed, grand dynamic planar motor rotor is arranged on below crashproof frame, described grand dynamic planar motor rotor includes 4 basic motion units, each unit is made up of 4 phase windings, wherein every phase armature winding is made up of some concentric square coils, each coil is sequentially connected in series from inside to outside, two often adjacent coils around on the contrary, grand dynamic planar motor stator adopts Halbach permanent magnet array composition, the gas that four angular distribution four symmetries having in " 7 " font of six-freedom-degree magnetic suspension jiggle station bottom surface are uniform is sufficient, and between gas foot, distribution has the vac sorb district of rectangle, is centered around around grand dynamic planar motor rotor in " mouth " font.
The present invention has following innovative point and outstanding advantages.
1) the circular arc vector zapping scheme that the present invention proposes can effectively shorten the zapping time, improves zapping efficiency. Adopting vector zapping strategy that existing for double-workpiece-table many beats straight line zapping is optimized for single-unit and clap fast channel switching, start-stop number of times is few, stable element is few; Adopting arc trajectory planning to shorten zapping path, revolution impact is little, stabilization time is short, and this is one of the innovative point and outstanding advantages of the present invention simultaneously.
2) present invention proposes integrated winding structure vector plane motor, recombination current driving is adopted to realize high effect vector controlled, have that range of movement is big, simple in construction, pushing force density are big, dynamic characteristic good, winding utilization is high, uniformity of temperature profile, thermal deformation are little, positioning precision high, improve the unfailing performance of motion, this is the two of the innovative point of the present invention and outstanding advantages.
3) present invention proposes the Active Compensation mechanism based on bi-motor crank and rocker mechanism, balance mass block X accurately compensating in real time to the motion of, Y-direction can be realized, relative to Active Compensation structure, improve the precision of compensation, this is the three of the innovative point of the present invention and outstanding advantages.
4) present invention proposes gas magnetic knot and closes airbearing stage, and horizontal movement relies on vector plane motor, and vertical direction adopts gas suspension. Between gas foot, distribution has vac sorb district, adds the rigidity of structure, and gas magnetic knot closes and reduces the heating that electric current causes, and is move more reliable and more stable, and this is the four of the innovative point of the present invention and outstanding advantages.
Accompanying drawing explanation
Fig. 1 is that single-unit claps optimization planning camber line fast channel switching schematic flow sheet.
Fig. 2 is based on the moving winding gas magnetic knot of interferometer measurement and closes air supporting double-workpiece-table vector circular arc programme changer population structure schematic diagram.
Fig. 3 is the sectional view that gas magnetic knot closes air supporting double-workpiece-table system.
Fig. 4 is motion compensation mechanism and the packaged distribution structure schematic diagram of balance mass.
Fig. 5 is bi-motor crank and rocker mechanism structural representation.
Fig. 6 is six-freedom-degree magnetic suspension jiggle station structural representation.
Fig. 7 fine motion planar motor rotor and magnetic suspension gravity compensator integrated mechanism schematic diagram.
Fig. 8 is gas foot, vac sorb district and permanent magnetic synchronous plane electromotor motor arrangements schematic diagram.
Piece number in figure: 1-supports framework; 2-balance mass block; 3a-the first work stage; 3b-second workpiece platform; The grand dynamic planar motor stator of 4-; 5-measures position; 6-exposes position; 7-bracing frame; 8-interferometer; 9a-the first cable stage; 9b-the first cable stage guide rail; 9c-the first cable stage cable; 10a-the second cable stage; 10b-the second cable stage guide rail; 10c-the second cable stage cable; 11-bi-motor crank and rocker mechanism; 12-pedestal; 13-servomotor; 14-output shaft; 15-grating scale; 16-read head; 17-crank; 18-rocking bar; 301-Chuck; 302-sucker; 303-prism of corner cube; The crashproof frame of 304-; The grand dynamic planar motor rotor of 305-; 306-fine motion planar motor rotor; 307-gravity compensator mover; 308-gas foot; 309-vac sorb district.
Detailed description of the invention
Below in conjunction with accompanying drawing, embodiment of the present invention is described in further detail.
Gas magnetic knot conjunction air supporting double-workpiece-table vector circular arc revolution channel switching method based on interferometer measurement comprises the following steps: original operating state, measures position the first work stage and is in prealignment state, and exposure position second workpiece platform is in exposure status, the first step, and is waited to measurement position zapping precalculated position A by moving winding actuation movement after measuring position the first work stage prealignment, by moving winding actuation movement to exposure zapping precalculated position, position B after the second workpiece platform exposure of exposure position, second step, first work stage and second workpiece platform by planar motor vector controlled along arc track counterclockwise movement, in motor process, the phase place of two work stage does not change, movement position is measured by interferometer, meanwhile, first cable stage is followed the first work stage and is moved to exposure position by measuring a side, second cable stage follows second workpiece platform by exposing a side to measuring position motion, when the first work stage moves to exposure precalculated position, position C, when second workpiece platform moves to measurement precalculated position, position D, zapping terminates, first work stage carries out silicon chip photolithographic exposure in exposure position, second workpiece platform carries out silicon chip upper slice and wafer pre-alignment operation in measurement position, 3rd step, and is waited to measurement position zapping precalculated position A' by moving winding actuation movement after measuring position second workpiece platform prealignment, by moving winding actuation movement to exposure zapping precalculated position, position B' after the first work stage exposure of exposure position, 4th step, second workpiece platform and the first work stage by planar motor vector controlled along arc track clockwise movement, meanwhile, first cable stage follows the first work stage by exposing a side to measuring position motion, second cable stage is followed second workpiece platform and is moved to exposure position by measuring a side, when second workpiece platform moves to exposure precalculated position, position C, when first work stage moves to measurement precalculated position, position D, zapping terminates, exposure position second workpiece platform enters exposure status, measure position the first work stage and carry out fluctuating plate and prealignment operation, now system returns to original operating state, complete the working cycle comprising twice zapping operation.
Gas magnetic knot conjunction air supporting double-workpiece-table vector circular arc revolution programme changer based on interferometer measurement includes supporting framework 1, balance mass block 2, first work stage 3a, second workpiece platform 3b, described balance mass block 2 is positioned at above support framework 1, it is characterized in that grand dynamic planar motor stator 4 is arranged in the plane on balance mass block 2, first work stage 3a and second workpiece platform 3b is arranged in above grand dynamic planar motor stator 4, described first work stage 3a and second workpiece platform 3b runs between measurement position 5 and exposure position 6, bracing frame 7 is fixed on support framework 1, 6 interferometers 8 are arranged on bracing frame, first work stage 3a is connected by the first cable stage cable 9c and the first cable stage 9a, second workpiece platform 3b is connected by the second cable stage cable 10c and the second cable stage 10a, first cable stage 9a and the second cable stage 10a is separately mounted on the first cable stage guide rail 9b and the second cable stage guide rail 10b, support framework 1 to be connected with balance mass block 2 by the active motion compensation mechanism being made up of two bi-motor crank and rocker mechanisms 11, described bi-motor crank and rocker mechanism 11 is by pedestal 12, 2 servomotors 13, 1 output shaft 14, 2 grating scales 15, 2 read heads 16, 2 cranks 17, 2 rocking bars 18 form, servomotor 13 rotating shaft is connected with crank 17, 2 cranks 17 are connected on same output shaft 14 respectively through rocking bar 18, output shaft 14 is connected by rolling bearing with balance mass block 2, grating scale 15 is coaxially connected with servomotor 13, read head 16 is fixed on pedestal 12, first work stage 3a and second workpiece platform 3b is six-freedom-degree magnetic suspension jiggle station, described six-freedom-degree magnetic suspension jiggle station is made up of Chuck301, sucker 302, prism of corner cube 303, crashproof frame 304, grand dynamic planar motor rotor 305, fine motion planar motor rotor 306 and gravity compensator mover 307 integrate, and gas foot 308 and vac sorb district 309 are distributed in the bottom of six-freedom-degree magnetic suspension jiggle station, described sucker 302 is arranged on Chuck301, Chuck301 surrounding is provided with four prism of corner cubes 303, in Chuck301 surrounding, crashproof frame 304 is installed, grand dynamic planar motor rotor 305 is arranged on below crashproof frame 304, described grand dynamic planar motor rotor 305 includes 4 basic motion unit F1, F2, F3, F4, each unit is made up of 4 phase windings, wherein every phase armature winding is made up of some concentric square coils, each coil is sequentially connected in series from inside to outside, two often adjacent coils around on the contrary, grand dynamic planar motor stator 4 adopts Halbach permanent magnet array to form, the gas foot 308 that angular distribution four symmetries having in " 7 " font of four of six-freedom-degree magnetic suspension jiggle station bottom surface are uniform, between gas foot 308, distribution has the vac sorb district 309 of rectangle, is centered around around grand dynamic planar motor rotor 305 in " mouth " font.
Workflow of the present invention is as follows.
First work stage 3a after measuring position 5 prealignment by planar motor actuation movement to zapping position A, wait that second workpiece platform 3b completes exposure in exposure position 6, second workpiece platform 3b complete exposure after by planar motor actuation movement to zapping position B, then the first work stage 3a and second workpiece platform 3b completes zapping operation by planar motor vector controlled along arc track counterclockwise movement, and during zapping, the first cable stage 9a and the second cable stage 10a also makes corresponding sports; After zapping completes, the first work stage 3a to exposure position 6 move exposure position 6 be exposed, second workpiece platform 3b to measure position 5 move measure position 5 carry out upper slice and prealignment operation; The complete second workpiece platform 3b of wafer pre-alignment that taken the lead in moves to measurement zapping position, position A', wait that the first work stage 3a moves to zapping position B' after completing exposure, then, second workpiece platform 3b and the first work stage 3a along arc track clockwise movement, completes second time zapping by planar motor vector controlled; After zapping completes, the first work stage 3a moves to measuring position 5, and second workpiece platform 3b moves to exposure position 6, so completes once the complete working cycle.
Claims (2)
1. the gas magnetic knot based on interferometer measurement closes air supporting double-workpiece-table vector circular arc revolution channel switching method, it is characterized in that the method comprises the following steps: original operating state, measuring position the first work stage and be in prealignment state, exposure position second workpiece platform is in exposure status, the first step, and is waited to measurement position zapping precalculated position A by moving winding actuation movement after measuring position the first work stage prealignment, by moving winding actuation movement to exposure zapping precalculated position, position B after the second workpiece platform exposure of exposure position, second step, first work stage and second workpiece platform by planar motor vector controlled along arc track counterclockwise movement, in motor process, the phase place of two work stage does not change, movement position is measured by interferometer, meanwhile, first cable stage is followed the first work stage and is moved to exposure position by measuring a side, second cable stage follows second workpiece platform by exposing a side to measuring position motion, when the first work stage moves to exposure precalculated position, position C, when second workpiece platform moves to measurement precalculated position, position D, zapping terminates, first work stage carries out silicon chip photolithographic exposure in exposure position, second workpiece platform carries out silicon chip upper slice and wafer pre-alignment operation in measurement position, 3rd step, and is waited to measurement position zapping precalculated position A' by moving winding actuation movement after measuring position second workpiece platform prealignment, by moving winding actuation movement to exposure zapping precalculated position, position B' after the first work stage exposure of exposure position, 4th step, second workpiece platform and the first work stage by planar motor vector controlled along arc track clockwise movement, meanwhile, first cable stage follows the first work stage by exposing a side to measuring position motion, second cable stage is followed second workpiece platform and is moved to exposure position by measuring a side, when second workpiece platform moves to exposure precalculated position, position C, when first work stage moves to measurement precalculated position, position D, zapping terminates, exposure position second workpiece platform enters exposure status, measure position the first work stage and carry out fluctuating plate and prealignment operation, now system returns to original operating state, complete the working cycle comprising twice zapping operation.
2. the gas magnetic knot based on interferometer measurement closes air supporting double-workpiece-table vector circular arc revolution programme changer, this device includes supporting framework (1), balance mass block (2), first work stage (3a), second workpiece platform (3b), described balance mass block (2) is positioned at support framework (1) top, it is characterized in that grand dynamic planar motor stator (4) is arranged in the plane on balance mass block (2), first work stage (3a) and second workpiece platform (3b) are arranged in grand dynamic planar motor stator (4) top, described first work stage (3a) and second workpiece platform (3b) run between measurement position (5) and exposure position (6), bracing frame (7) is fixed in support framework (1), 6 interferometers (8) are arranged on bracing frame, first work stage (3a) is connected with the first cable stage (9a) by the first cable stage cable (9c), second workpiece platform (3b) is connected with the second cable stage (10a) by the second cable stage cable (10c), first cable stage (9a) and the second cable stage (10a) are separately mounted on the first cable stage guide rail (9b) and the second cable stage guide rail (10b), support framework (1) to be connected with balance mass block (2) by the active motion compensation mechanism being made up of two bi-motor crank and rocker mechanisms (11), described bi-motor crank and rocker mechanism (11) is by pedestal (12), 2 servomotors (13), 1 output shaft (14), 2 grating scales (15), 2 read heads (16), 2 cranks (17), 2 rocking bar (18) compositions, servomotor (13) rotating shaft is connected with crank (17), 2 cranks (17) are connected on same output shaft (14) respectively through rocking bar (18), output shaft (14) is connected by rolling bearing with balance mass block (2), grating scale (15) is coaxially connected with servomotor (13), read head (16) is fixed on pedestal (12), first work stage (3a) and second workpiece platform (3b) are six-freedom-degree magnetic suspension jiggle station, described six-freedom-degree magnetic suspension jiggle station is by Chuck(301), sucker (302), prism of corner cube (303), crashproof frame (304), grand dynamic planar motor rotor (305) form, fine motion planar motor rotor (306) and gravity compensator mover (307) integrate, and gas foot (308) and vac sorb district (309) is distributed in the bottom of six-freedom-degree magnetic suspension jiggle station, described sucker (302) is arranged on Chuck(301) on, Chuck(301) surrounding is provided with four prism of corner cubes (303), at Chuck(301) surrounding is provided with crashproof frame (304), grand dynamic planar motor rotor (305) is arranged on crashproof frame (304) lower section, described grand dynamic planar motor rotor (305) includes 4 basic motion unit (F1, F2, F3, F4), each unit is made up of 4 phase windings, wherein every phase armature winding is made up of some concentric square coils, each coil is sequentially connected in series from inside to outside, two often adjacent coils around on the contrary, grand dynamic planar motor stator (4) adopts Halbach permanent magnet array composition, gas foot (308) that angular distribution four symmetries having in " 7 " font of four of six-freedom-degree magnetic suspension jiggle station bottom surface are uniform, between gas foot (308), distribution has the vac sorb district (309) of rectangle, is centered around grand dynamic planar motor rotor (305) in " mouth " font around.
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| CN109870881A (en) * | 2019-03-20 | 2019-06-11 | 哈尔滨工业大学 | The macro box-like long stroke precision movement platform of micro-group |
| US10503081B2 (en) | 2017-03-27 | 2019-12-10 | Boe Technology Group Co., Ltd. | Carrying platform and exposure method |
| CN112083633A (en) * | 2020-09-30 | 2020-12-15 | 上海集成电路研发中心有限公司 | Photoetching device |
| CN113029235A (en) * | 2021-02-25 | 2021-06-25 | 哈尔滨工业大学 | Small-stroke nanoscale motion platform and heat-related hysteresis data measuring method |
| CN113195930A (en) * | 2018-12-21 | 2021-07-30 | Asml荷兰有限公司 | Positioning device, rigidity reducing device, and electron beam apparatus |
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| 张磊: "动磁钢式磁悬浮平面电机的设计与建模研究", 《中国优秀硕士学位论文全文数据库 工程科技II辑》 * |
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| CN109488686B (en) * | 2018-11-14 | 2019-07-16 | 哈尔滨工业大学 | One kind being based on the maglev linear motion device of gas |
| CN113195930A (en) * | 2018-12-21 | 2021-07-30 | Asml荷兰有限公司 | Positioning device, rigidity reducing device, and electron beam apparatus |
| CN109870881A (en) * | 2019-03-20 | 2019-06-11 | 哈尔滨工业大学 | The macro box-like long stroke precision movement platform of micro-group |
| CN109870881B (en) * | 2019-03-20 | 2021-06-15 | 哈尔滨工业大学 | Macro-micro combined long-stroke precision motion platform |
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| CN113029235A (en) * | 2021-02-25 | 2021-06-25 | 哈尔滨工业大学 | Small-stroke nanoscale motion platform and heat-related hysteresis data measuring method |
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