CN105575861A - Quartz wafer bearing tool - Google Patents
Quartz wafer bearing tool Download PDFInfo
- Publication number
- CN105575861A CN105575861A CN201510921225.5A CN201510921225A CN105575861A CN 105575861 A CN105575861 A CN 105575861A CN 201510921225 A CN201510921225 A CN 201510921225A CN 105575861 A CN105575861 A CN 105575861A
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- basket
- wafer
- hole
- newel
- rotating disk
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
Abstract
The invention discloses a quartz wafer bearing tool. The bearing tool comprises a wafer bearing basket, a bearing basket upper cover, a central post, a rotation support bench and a rotation disc which is shaped like a Chinese character 'mi'. Multiple protruding clamp pins are arranged on the wafer bearing basket. Positioning holes corresponding to positions of the clamp pins are arranged in the bearing basket upper cover. The bearing basket upper cover is connected with the wafer bearing basket via the clamp pins. The wafer bearing basket passes through a support column end of the rotation disc via a central through hole and then is connected with the rotation disc. The rotation support bench passes through the central post via a central through hole and then falls to the bottom end of the central post. The rotation disc passes through the central post via a central through hole and then falls to a post body of the central post. Multiple cylindrical bearing holes which are distributed in an array way are arranged in the wafer bearing basket. Multiple flow guiding holes corresponding to positions of the bearing holes are arranged in the bearing basket. According to the invention, multiple quartz wafers can be uniformly cleaned and surfaces of the cleaned quartz wafers can be quite easily dried.
Description
Technical field
The application relates to tool field, particularly a kind of quartz wafer bearing fixture.
Background technology
Quartz-crystal resonator utilizes the quartz wafer and the resonant element made with piezoelectric effect.Because quartz-crystal resonator has a series of excellent characteristics such as volume is little, lightweight, reliability is high, frequency stability is excellent, be widely used in the industries such as communication, medical treatment, Aero-Space, weaponry and field.
In the manufacture process of quartz-crystal resonator, usually need to carry out precision cleaning to quartz wafer surface, to ensure exposed quartz wafer clean surface, thus the metal electrode being plated on quartz wafer surface after ensureing has good adhesive force.
When using chemical solvent to carry out wet-cleaned to quartz wafer, be generally again bearing fixture entirety is infiltrated after quartz wafer is put into bearing fixture to carry out at chemical solvent.For undersized bar shaped quartz wafer, due to the size restrictions of its length, width and thickness, (general length is less than 6mm, width is less than 3mm, thickness is only at below 0.3mm), normally the quartz wafer of some is loaded in the basket of bearing fixture simultaneously and clean, but be stacked due to multiple quartz wafer, easily produce the uneven and cleaning rear surface of cleaning and remain not easily dry problem.
Summary of the invention
Based on above-mentioned technical problem, the embodiment of the present application provides a kind of quartz wafer bearing fixture, for evenly cleaning multiple quartz wafer, and makes the quartz wafer remained on surface after cleaning more easily dry.
The embodiment of the present application adopts following technical proposals:
A kind of quartz wafer bearing fixture, comprise: wafer carries basket, carries basket upper cover, newel, rotating gantry and rice word rotating disk, wherein, wafer carries the bayonet lock that basket is provided with multiple protrusion, carry basket covers and be provided with location hole corresponding with the position of each bayonet lock respectively, carry a basket upper cover and carry basket by described multiple bayonet lock with wafer and be connected; Wafer carries basket by its central through hole, through rice word rotating disk strut end head and be connected with rice word rotating disk; Rotating gantry, by its central through hole, drops on the bottom of newel through newel; Rice word rotating disk, by its central through hole, drops on the cylinder of newel through newel; Wafer carries on basket multiple columniform year hole in array distribution, and one end diameter of cylinder is greater than the diameter of the other end; Carry on basket and be stamped multiple pod apertures corresponding respectively with the position in each year hole respectively, and the diameter of pod apertures is less than the width of quartz wafer.
Preferably, comprise spacing collar further, spacing collar, by its central through hole, drop on rotating gantry, and the upper end of spacing collar contacts with rice word rotating disk through described newel.
Preferably, comprise snap close further, snap close, by its central through hole, drops on a meter upper end for word rotating disk through newel, and snap close has the screwed hole perpendicular to newel cylinder length direction.
Preferably, comprise screw further, screw coordinates with screwed hole, and the termination of screw contacts with newel.
Preferably, comprise abnormity nut further, the strut end head of rice word rotating disk has threaded post, wafer is carried basket through threaded post and is fixed in meter strut end head of word rotating disk by abnormity nut.
Preferably, wafer carries on basket multiple columniform year hole in array distribution, and the shape flare in cylindrical year hole, namely one end diameter of cylinder is greater than the diameter of the other end.
Preferably, the surface that wafer carries basket side is also provided with guiding gutter, and the one end in columniform year hole is positioned at the bottom land position of guiding gutter.
Preferably, the surface that wafer carries basket opposite side is also distributed with guiding gutter, and symmetrical in the guiding gutter position that wafer carries in basket both side surface.
Preferably, diversion window basket covering and is also provided with and penetrates in carrying basket upper cover is carried.
Preferably, also comprise drier, drier is connected with rotating gantry.
The technique scheme that the embodiment of the present application adopts can reach following beneficial effect: have multiple columniform year hole in array distribution because wafer carries on basket, thus the quartz wafer in each year hole is evenly cleaned, and make the quartz wafer remained on surface after cleaning more easily dry.
Accompanying drawing explanation
Accompanying drawing described herein is used to provide further understanding of the present application, and form a application's part, the schematic description and description of the application, for explaining the application, does not form the improper restriction to the application.In the accompanying drawings:
The bearing fixture structure vertical view that Fig. 1 provides for the embodiment of the present application;
Fig. 2 is the bearing fixture structural front view in Fig. 1;
Wafer in the bearing fixture that Fig. 3 a provides for the embodiment of the present application carries basket surface structure schematic diagram;
Fig. 3 b is that the wafer in Fig. 3 a carries surface texture schematic diagram in the key;
Basket upper cover surface structure schematic diagram is carried in the bearing fixture that Fig. 4 a provides for the embodiment of the present application;
Fig. 4 b is year basket upper cover lower surface configuration schematic diagram in Fig. 4 a;
Wafer in the bearing fixture that Fig. 5 a provides for the embodiment of the present application carries basket and the installation process schematic diagram carrying basket upper cover;
Fig. 5 b is that the wafer in Fig. 5 a carries basket and the final installation site schematic diagram carrying basket upper cover;
Partial structurtes schematic diagram in the bearing fixture that Fig. 6 provides for the embodiment of the present application;
Hole and pod apertures profile is carried in the bearing fixture that Fig. 7 provides for the embodiment of the present application;
Reference numeral in figure is: 101-wafer carries basket, and 102-carries basket upper cover, 103-newel, 104-rotating gantry, 105-spacing collar, 106-rice word rotating disk, 107-snap close, 108-abnormity nut, 109-screw, 110-carries hole, 111-guiding gutter, 112-pod apertures, 113-bayonet lock, 114-location hole, 115-diversion window, 116-press strip, 117-quartz wafer.
Embodiment
For making the object of the application, technical scheme and advantage clearly, below in conjunction with the application's specific embodiment and corresponding accompanying drawing, technical scheme is clearly and completely described.Obviously, described embodiment is only some embodiments of the present application, instead of whole embodiments.Based on the embodiment in the application, those of ordinary skill in the art are not making the every other embodiment obtained under creative work prerequisite, all belong to the scope of the application's protection.
As can be seen from Fig. 1 and Fig. 2, a kind of quartz wafer bearing fixture that the embodiment of the present application provides, mainly comprises: wafer carries basket 101, carries basket upper cover 102, newel 103, rotating gantry 104 and rice word rotating disk 105.
Composition graphs 3a and Fig. 4 b can find out, wafer carries the bayonet lock 113 that basket 101 is provided with multiple protrusion, carries basket upper cover 102 and is provided with location hole 114 corresponding with the position of each bayonet lock respectively.Existing composition graphs 5a and Fig. 5 b can specifically find out, wafer carries the edge on the both sides of basket 101 upper surface, and be respectively designed with 3 protruding " Г " type bayonet locks 113 along its length, the correspondence position simultaneously carrying basket upper cover 102 is provided with the location hole 114 corresponding with bayonet lock.Wafer carry on basket 101 install carry basket upper cover 102 time, location hole 114 being aimed at " Г " type bayonet lock 113 and being enclosed within wafer carries on basket 101, now because of the dislocation displacement between location hole 114 and bayonet lock 113, making to carry basket upper cover 102 has the edge that edge on one side carries basket 101 than wafer to give prominence to, the edge that promotion year basket upper cover 102 beyond is given prominence to carries basket 101 edge with wafer and flushes, carry basket upper cover 102 to be stuck in by location hole 114 in the groove of bayonet lock 113 and to be fixed on wafer and to carry on basket 101, namely achieve and carry a basket upper cover 102 and carry basket 101 by above-mentioned multiple bayonet lock and wafer and be connected.
Composition graphs 2 can be found out again, wafer after being connected with year basket upper cover 102 carries basket 101 is carried basket 101 center central through hole by wafer, through rice word rotating disk 106 strut end head and be connected with rice word rotating disk 106, wherein the end structure of rice word rotating disk 106 matches with the central through hole that wafer carries basket 101, finally make wafer carry basket 101 to be connected with rice word rotating disk 106, and keep the position that wafer carries basket 101 to keep vertical.It should be noted that, here wafer carries basket 101 and is connected with rice word rotating disk 106, simultaneously wafer carry basket 101 again with carry a basket upper cover 102 and be connected, therefore carrying the correspondence position on basket upper cover 102, corresponding through hole can be also set, can coordinate with rice word rotating disk 106.
Rotating gantry 104 is by its central through hole, the bottom of newel 103 is dropped on through newel 103, as seen from Figure 2, the cross section of the cylinder of newel 103 is square, and cylinder bottom surface has cylindrical and cylindrical cross-section area to be greater than the collet of square-section area, by above-mentioned cylinder and collet, rotating gantry 104 can be made by its central through hole through on newel 103, and not cause when mentioning newel 103 both to be separated.
Rice word rotating disk 106, by its central through hole, drops on the cylinder of newel through newel 103.When rice word rotating disk 106 is connected with newel, can both link position places on cylinder, recess that pole section diminishes be set thus a meter word rotating disk 106 is through in the recessed position of newel 103, and and being unlikely to make meter word rotating disk 106 along the downward landing of cylinder.Certainly can also by adding spacing collar 105, spacing collar 105 is by its central through hole, drop on rotating gantry 104 through newel 103, and the upper end of spacing collar 105 contacts with rice word rotating disk 106, such spacing collar 105 can support and limit rice word rotating disk 106 in the position of newel 103, finally ensures that wafer carries basket 101 integrated hanging.
For the central through hole of above-mentioned rotating gantry 104 and the central through hole of rice word rotating disk 106, all should match with the sectional dimension of newel 103 cylinder, can be as shown in Figure 2 be all square-section, newel 103 can be driven when rotating gantry 104 rotates to rotate, newel 103 rotates and then a meter word rotating disk 106 can be driven to rotate.
In addition, wafer carries on basket 101 multiple cylindrical year hole 110 in array distribution, and one end diameter of cylinder is greater than the diameter of the other end, it should be noted that, the diameter of less one section of cylindrical year hole 110 body diameter is less than the width of quartz wafer 117, one end that the diameter in cylindrical year hole 110 is larger and the diameter carried in the middle of hole are all greater than the width of quartz wafer 117, specifically can be shown in Figure 7.Carry basket upper cover 102 and have multiple pod apertures 112 corresponding respectively with the position in each year hole respectively, and the diameter of pod apertures 112 is less than the width of quartz wafer 117.
Adopt the quartz wafer bearing fixture that the embodiment of the present application provides, due to carry at wafer basket is provided with multiple in array equally distributed cylindrical year hole, make undersized bar shaped quartz wafer, can blade independently submerge completely in each year hole along its length, what prevent between quartz wafer is stacking; Simultaneously quartz wafer can in the cylindrical space carrying hole centrally axle freely rotates, without clamping dead angle, thus guarantee quartz wafer surface can be cleaned uniformly comprehensively and be dried, while do not damage quartz wafer; Simultaneously owing to carrying the cylinder design in hole, and one end diameter of cylinder is greater than the diameter of the other end, make this tool can overcome easily small size bar shaped wafer not easily travel direction accurate adjustment operation difficulty, only need clamp quartz wafer by arbitrary orientation, adjustment minor face is aimed at and is carried the larger one end of bore dia, lose into carrying in hole, hole, quartz wafer can slip into easily and carry in hole, and quartz wafer loading operation is convenient.
When cleaning quartz wafer, whole bearing fixture infiltrates in cleaning fluid, utilizes ultrasonic wave to make cleaning fluid shake thus clean quartz wafer.Corresponding position of carrying hole is covered owing to carrying on basket, be provided with the pod apertures that diameter is slightly less than wafer width size, and year hole base diameter is less than the width of quartz wafer, above-mentioned year hole and pod apertures complement each other to form the fluid passage along cylinder direction, define good flow-guiding channel, make cleaning quartz wafer process time liquid lotion can fully circulate overload hole, wafer can fully infiltrate in a liquid, realize the wettability that tool is good, finally make quartz wafer evenly be cleaned.
In addition, when drying quartz wafer, wafer carries blue with vertical state, and in planet, the veneer of distribution is fixed on each offset column end of meter word rotating disk, wafer carries the first type surface of basket outside newel, makes year Kong Zhuxiang that wafer is housed along rotating disk radial direction.When whole bearing fixture rotates drying, just in time making the liquid remained in quartz wafer surface and year hole fully throw away along carrying Kong Zhuxiang, achieving good drying performance.
When utilizing bearing fixture to dry quartz wafer, because whole bearing fixture is fixed on High Rotation Speed on drier by rotating gantry 104, in order to ensure safety, snap close 107 can also be added above rice word rotating disk, snap close 107 is by its central through hole, drop on a meter upper end for word rotating disk 106 through newel 103, and snap close has a screwed hole perpendicular to newel 103 cylinder length direction.Screw 109 can also be utilized further, above-mentioned screw coordinates with screwed hole, utilizes screw 109 that snap close 107 is fixed on newel 103, and then by the rice word rotating disk 106 of snap close 107 lower end, spacing collar 105, and rotating gantry 104 is fixed on newel 103 all firmly.
Wafer is carried to the connected mode of basket 101 and rice word rotating disk 106, can further include abnormity nut 108, by arranging threaded post in the strut end head of rice word rotating disk 106, wafer can be carried basket 101 through threaded post and be fixed in meter strut end head of word rotating disk 106 by abnormity nut 108.
Wafer carries on basket 101 multiple columniform year hole 110 in array distribution, and a kind of preferred scheme is the shape flare in cylindrical year hole 110, and namely one end diameter of cylinder is greater than the diameter of the other end, specifically as shown in Figure 7.In Fig. 7, left side is for carrying basket upper cover 102, on have pod apertures 112, basket 101 is carried for wafer in right side, be in the middle of right side and carry hole 110, can also see that quartz wafer 117 is carrying the position in hole 110 in addition, the width of the quartz wafer 117 in Fig. 7 is less than the width carrying centre position, hole, thus quartz wafer can be put into a year hole, in addition, carry the right side in side bottom hole 110 and Fig. 7, all be less than the width of quartz wafer 117 with the diameter of pod apertures 112, thus quartz wafer 117 be limited in year hole 110 when cleaning and dry.
The surface that wafer carries basket side is also provided with the straight-through sedimentation guiding gutter 111 along carrying hole column distribution, see Fig. 3 a and Fig. 3 b, the one end in columniform year hole 110 is positioned at the bottom land position of guiding gutter 111.The surface that wafer carries basket 101 opposite side is also distributed with guiding gutter 111, and symmetrical in guiding gutter 111 position that wafer carries in basket 101 both side surface.These guiding gutters make the wafer vertically placed to carry in basket 101 can abundant water conservancy diversion cleaning fluid, and removes the capillarity in year hole 110 simultaneously, and these pod apertures 110 and guiding gutter 111 cooperatively interact, and form good passage to cleaning fluid.
Carry basket upper cover 102 lower surface simultaneously and be also provided with outstanding press strip 116, Fig. 4 a and Fig. 4 b, carry the diversion window 115 basket upper cover 102 being also provided with and penetrating in carrying basket upper cover 102.Guiding gutter 111 size that these press strips 116 and wafer carry basket 101 upper surface forms precision-fit, can ensure to carry basket upper cover 102 precision fixing fully to prevent quartz wafer from the escape of carrying hole, can make again to have between press strip 116 and guiding gutter 111 space of reasonable size and give full play to diversion function, diversion window 115 can also prevent year basket upper cover and wafer to carry between basket interlayer and clamp liquid when drying, to ensure to dry abundant drying simultaneously.Meanwhile, shown in Figure 6, described abnormity nut 108, only just can need can carry basket 101 easily with hand and be fixed in meter word sabot 106 by wafer, without the need to by erecting tools.In addition, shown in Figure 6, by described newel 103, rotating gantry 104, spacing collar 105, rice word rotating disk 106, snap close 107 order, the cleaning bracket being formed and have and rotate drying functions is installed, can once mounting complete after continuous use, each assembly is detachably placed to save space, easy to use and flexible when not re-using.
These are only the embodiment of the application, be not limited to the application.To those skilled in the art, the application can have various modifications and variations.Any amendment done within all spirit in the application and principle, equivalent replacement, improvement etc., within the right that all should be included in the application.
Claims (10)
1. a quartz wafer bearing fixture, is characterized in that, comprising: wafer carries basket, carries basket upper cover, newel, rotating gantry and rice word rotating disk, wherein,
Wafer carries the bayonet lock that basket is provided with multiple protrusion, and year basket covers and is provided with location hole corresponding with the position of each bayonet lock respectively, a year basket upper cover carries basket by described multiple bayonet lock with wafer and is connected;
Wafer carries basket by its central through hole, through rice word rotating disk strut end head and be connected with rice word rotating disk;
Rotating gantry, by its central through hole, drops on the bottom of newel through newel;
Rice word rotating disk, by its central through hole, drops on the cylinder of newel through newel;
Wafer carries on basket multiple columniform year hole in array distribution, and one end diameter of cylinder is greater than the diameter of the other end;
Carry on basket and be stamped multiple pod apertures corresponding respectively with the position in each year hole respectively, and the diameter of pod apertures is less than the width of quartz wafer.
2. bearing fixture according to claim 1, is characterized in that, comprises spacing collar further, and spacing collar, by its central through hole, drop on rotating gantry, and the upper end of spacing collar contacts with rice word rotating disk through described newel.
3. bearing fixture according to claim 2, is characterized in that, comprises snap close further, and snap close, by its central through hole, drops on a meter upper end for word rotating disk through newel, and snap close has the screwed hole perpendicular to newel cylinder length direction.
4. bearing fixture according to claim 3, is characterized in that, comprises screw further, and screw coordinates with screwed hole, and the termination of screw contacts with newel.
5. bearing fixture according to claim 1, is characterized in that, comprises abnormity nut further, and the strut end head of rice word rotating disk has threaded post, and wafer is carried basket through threaded post and is fixed in meter strut end head of word rotating disk by abnormity nut.
6. bearing fixture according to claim 1, wafer carries on basket multiple columniform year hole in array distribution, and it is characterized in that, the shape flare in cylindrical year hole, namely one end diameter of cylinder is greater than the diameter of the other end.
7. bearing fixture according to claim 6, is characterized in that, the surface that wafer carries basket side is also provided with guiding gutter, and the one end in columniform year hole is positioned at the bottom land position of guiding gutter.
8. bearing fixture according to claim 7, is characterized in that, the surface that wafer carries basket opposite side is also distributed with guiding gutter, and symmetrical in the guiding gutter position that wafer carries in basket both side surface.
9. bearing fixture according to claim 1, is characterized in that, carries diversion window basket covering and is also provided with and penetrates in carrying basket upper cover.
10. bearing fixture according to claim 1, is characterized in that, comprises drier further, and drier is connected with rotating gantry.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510921225.5A CN105575861B (en) | 2015-12-11 | 2015-12-11 | A kind of quartz wafer bearing fixture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510921225.5A CN105575861B (en) | 2015-12-11 | 2015-12-11 | A kind of quartz wafer bearing fixture |
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| Publication Number | Publication Date |
|---|---|
| CN105575861A true CN105575861A (en) | 2016-05-11 |
| CN105575861B CN105575861B (en) | 2018-03-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510921225.5A Active CN105575861B (en) | 2015-12-11 | 2015-12-11 | A kind of quartz wafer bearing fixture |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109332331A (en) * | 2018-09-28 | 2019-02-15 | 芜湖华宇彩晶科技有限公司 | Supporting and positioning device is used in a kind of cleaning of display screen |
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| US20060289042A1 (en) * | 2005-06-27 | 2006-12-28 | Sae Magnetics (H.K.) Ltd. | Cleaning tool |
| CN203170663U (en) * | 2013-03-12 | 2013-09-04 | 汇隆电子（金华）有限公司 | Wafer cleaning jig |
| CN203206185U (en) * | 2013-04-28 | 2013-09-18 | 浙江东晶电子股份有限公司 | Chip-arranging and secondary-washing tool used for small-size quartz crystal resonator |
| CN203778451U (en) * | 2014-03-03 | 2014-08-20 | 浙江东晶电子股份有限公司 | Quartz crystal polished section oscillator cleaning jig |
| CN204396370U (en) * | 2015-01-20 | 2015-06-17 | 深圳市深宇峰电子有限公司 | A kind of cleaning load plate of paster crystal oscillator pedestal |
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2015
- 2015-12-11 CN CN201510921225.5A patent/CN105575861B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060289042A1 (en) * | 2005-06-27 | 2006-12-28 | Sae Magnetics (H.K.) Ltd. | Cleaning tool |
| CN203170663U (en) * | 2013-03-12 | 2013-09-04 | 汇隆电子（金华）有限公司 | Wafer cleaning jig |
| CN203206185U (en) * | 2013-04-28 | 2013-09-18 | 浙江东晶电子股份有限公司 | Chip-arranging and secondary-washing tool used for small-size quartz crystal resonator |
| CN203778451U (en) * | 2014-03-03 | 2014-08-20 | 浙江东晶电子股份有限公司 | Quartz crystal polished section oscillator cleaning jig |
| CN204396370U (en) * | 2015-01-20 | 2015-06-17 | 深圳市深宇峰电子有限公司 | A kind of cleaning load plate of paster crystal oscillator pedestal |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109332331A (en) * | 2018-09-28 | 2019-02-15 | 芜湖华宇彩晶科技有限公司 | Supporting and positioning device is used in a kind of cleaning of display screen |
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| Publication number | Publication date |
|---|---|
| CN105575861B (en) | 2018-03-06 |
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