CN105549138A - 七级衍射光栅结构及其制备方法、晶圆光刻对准方法 - Google Patents
七级衍射光栅结构及其制备方法、晶圆光刻对准方法 Download PDFInfo
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- CN105549138A CN105549138A CN201610140991.2A CN201610140991A CN105549138A CN 105549138 A CN105549138 A CN 105549138A CN 201610140991 A CN201610140991 A CN 201610140991A CN 105549138 A CN105549138 A CN 105549138A
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- grating
- fine structure
- structure unit
- grating fine
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims (11)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610140991.2A CN105549138B (zh) | 2016-03-11 | 2016-03-11 | 七级衍射光栅结构及其制备方法、晶圆光刻对准方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201610140991.2A CN105549138B (zh) | 2016-03-11 | 2016-03-11 | 七级衍射光栅结构及其制备方法、晶圆光刻对准方法 |
Publications (2)
Publication Number | Publication Date |
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CN105549138A true CN105549138A (zh) | 2016-05-04 |
CN105549138B CN105549138B (zh) | 2017-10-24 |
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CN201610140991.2A Active CN105549138B (zh) | 2016-03-11 | 2016-03-11 | 七级衍射光栅结构及其制备方法、晶圆光刻对准方法 |
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CN (1) | CN105549138B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111766765A (zh) * | 2020-07-16 | 2020-10-13 | 长江存储科技有限责任公司 | 对准标记 |
CN113552767A (zh) * | 2020-04-23 | 2021-10-26 | 无锡华润上华科技有限公司 | 光刻版及集成电路的制造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006038998A (ja) * | 2004-07-23 | 2006-02-09 | Oki Electric Ind Co Ltd | 光導波路装置 |
CN1936710A (zh) * | 2006-10-18 | 2007-03-28 | 上海微电子装备有限公司 | 一种对准标记及其制造方法 |
US20070248898A1 (en) * | 2006-04-20 | 2007-10-25 | Atmel Corporation | Targets for alignment of semiconductor masks |
CN103713341A (zh) * | 2013-12-12 | 2014-04-09 | 南京邮电大学 | 一种非周期高对比度光栅及其制备方法 |
-
2016
- 2016-03-11 CN CN201610140991.2A patent/CN105549138B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006038998A (ja) * | 2004-07-23 | 2006-02-09 | Oki Electric Ind Co Ltd | 光導波路装置 |
US20070248898A1 (en) * | 2006-04-20 | 2007-10-25 | Atmel Corporation | Targets for alignment of semiconductor masks |
CN1936710A (zh) * | 2006-10-18 | 2007-03-28 | 上海微电子装备有限公司 | 一种对准标记及其制造方法 |
CN103713341A (zh) * | 2013-12-12 | 2014-04-09 | 南京邮电大学 | 一种非周期高对比度光栅及其制备方法 |
Non-Patent Citations (1)
Title |
---|
李燕青等: "衍射光栅制造技术的发展", 《长春理工大学学报》 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113552767A (zh) * | 2020-04-23 | 2021-10-26 | 无锡华润上华科技有限公司 | 光刻版及集成电路的制造方法 |
CN111766765A (zh) * | 2020-07-16 | 2020-10-13 | 长江存储科技有限责任公司 | 对准标记 |
Also Published As
Publication number | Publication date |
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CN105549138B (zh) | 2017-10-24 |
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Effective date of registration: 20200911 Address after: Room 102, building a, No. 136, Kaiyuan Avenue, Huangpu District, Guangzhou City, Guangdong Province 510700 Patentee after: Guangdong Zhongkexin Development Technology Co.,Ltd. Address before: Room 328, building 15, No.3, Beitucheng West Road, Chaoyang District, Beijing, 100020 Patentee before: Beijing Zhongke micro Investment Management Co.,Ltd. Effective date of registration: 20200911 Address after: Room 328, building 15, No.3, Beitucheng West Road, Chaoyang District, Beijing, 100020 Patentee after: Beijing Zhongke micro Investment Management Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
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Effective date of registration: 20221012 Address after: Room 108, floor 1, building 4, No. 2 dacuodeng Hutong, Dongcheng District, Beijing 100010 Patentee after: Beijing Zhongke micro Investment Management Co.,Ltd. Address before: Room 102, building a, 136 Kaiyuan Avenue, Huangpu District, Guangzhou, Guangdong 510700 Patentee before: Guangdong Zhongkexin Development Technology Co.,Ltd. |