CN105525257B - 连续掩膜挡板传动装置 - Google Patents

连续掩膜挡板传动装置 Download PDF

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CN105525257B
CN105525257B CN201511033444.6A CN201511033444A CN105525257B CN 105525257 B CN105525257 B CN 105525257B CN 201511033444 A CN201511033444 A CN 201511033444A CN 105525257 B CN105525257 B CN 105525257B
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mask baffle
plated film
screw rod
transmission component
mounting bracket
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CN105525257A (zh
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郭祖华
葛怀庆
练菊
朱向炜
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BENGBU RENO VACUUM TECHNOLOGY Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)

Abstract

本发明给出了一种连续掩膜挡板传动装置,包括电机、掩膜挡板、安装支架、传动组件和底座，安装支架内开有贯穿上、下端面的镀膜槽口，镀膜槽口内侧壁上开有至少一条滑槽，掩膜挡板在所述滑槽内移动，底座放置在镀膜槽口下侧；传动组件至少包括传动丝杆，传动丝杆包括螺杆和螺母，螺杆支撑在安装支架上，螺杆的放置走向与滑槽的走向一致，螺母固定在掩膜挡板上；电机带动传动组件的螺杆转动。初始状态下掩膜挡板完全遮挡待镀膜的工件，电机驱动传动组件带动掩膜挡板移动，使工件逐步暴露在掩膜挡板外，配合外部镀膜设备对工件持续镀膜，进而达到渐进式镀膜的目的，满足对工件镀膜厚度的变化要求。

Description

连续掩膜挡板传动装置
技术领域
本发明涉及一种薄膜镀膜用设备，特别涉及一种薄膜连续掩膜挡板传动装置。
背景技术
薄膜镀膜作业是在真空条件下利用镀膜设备通过不同的镀膜工艺(例如：物理气相沉积、化学气相沉积等)对工件进行镀膜，但现有薄膜镀膜设备无法完成对膜厚变化有要求的镀膜作业。
发明内容
本发明所要解决的技术问题是提供一种结构简单、镀膜效果好的连续掩膜挡板传动装置。
为解决上述技术问题，本发明提供了一种连续掩膜挡板传动装置,包括电机、掩膜挡板、安装支架、传动组件和底座，安装支架内开有贯穿上、下端面的镀膜槽口，镀膜槽口内侧壁上开有至少一条滑槽，掩膜挡板在所述滑槽内移动，底座放置在镀膜槽口下侧；
传动组件至少包括传动丝杆，传动丝杆包括螺杆和螺母，螺杆支撑在安装支架上，螺杆的放置走向与滑槽的走向一致，螺母固定在掩膜挡板上；
电机带动传动组件的螺杆转动。
采用这样的结构后，初始状态下掩膜挡板完全遮挡待镀膜的工件，电机驱动传动组件带动掩膜挡板移动，使工件逐步暴露在掩膜挡板外，配合外部镀膜设备对工件持续镀膜，进而达到渐进式镀膜的目的，满足对工件镀膜厚度的变化要求。
本连续掩膜挡板传动装置允许用户通过手动或自动控制，精确控制掩膜挡板在镀膜过程中的传动走位，适用于多种镀膜机的工艺开发。
为了更好的理解本发明的技术内容，以下将本连续掩膜挡板传动装置简称为本传动装置。
本传动装置的传动组件还包括真空磁流体动密封件、联轴器、涡轮和涡杆，螺杆一端装有涡轮，涡轮与涡杆配合，涡杆通过联轴器与真空磁流体动密封件连接，真空磁流体动密封件与电机的输出轴连接；采用这样的结构后，通过真空磁流体动密封件将电机设置在真空作业空间外，可以提高真空作业空间的使用效率；涡轮和蜗杆可以改变输出轴的方向，便于合理布置位置，使本装置适用于更多作业场所。
附图说明
图1是本传动装置实施例的主视图。
图2是图1沿A-A方向剖视图。
具体实施方式
如图1至2所示
本传动装置包括电机5、掩膜挡板3、安装支架1、传动组件和底座2。
安装支架1水平放置，安装支架1内开有贯穿上、下端面的镀膜槽口11，镀膜槽口11延伸至安装支架1的右端面，镀膜槽口11中部固定有支撑杆12，支撑杆12两端分别与镀膜槽口11前、后侧壁固定，镀膜槽口11的前、后侧壁上分别开有左、右走向滑槽13，两条滑槽13的位置对应。
底座2放置在安装支架1下侧，底座2上端面为放置工件6的置物平台，置物平台对准安装支架1的镀膜槽口11。
掩膜挡板3为长方形板体，掩膜挡板3前、后部分别伸入两个滑槽13内，并且掩膜挡板3可以沿两个滑槽13的走向左右往复移动。
传动组件包括传动丝杆、真空磁流体动密封件43、联轴器44、涡轮45和涡杆46，传动丝杆包括螺杆41和螺母42，螺杆41的左端通过轴承支撑在安装支架1左部，螺杆41的右端通过轴承支撑在安装支架1的支撑杆12上，螺杆41可以相对安装支架1自用自由转动，螺杆41的放置走向与滑槽13的走向一致，螺母42与螺杆41配合，并且螺母42与掩膜挡板3下端面固定；
涡轮45安装在螺杆41左端部，涡轮45与涡杆46配合，涡杆46通过联轴器44与真空磁流体动密封件43连接，真空磁流体动密封件43与电机5的输出轴连接。
镀膜作业时，将待镀膜的工件6放置在底座2上，掩膜挡板3处于其行程的最右侧位置，待镀膜的工件6此时完全被掩膜挡板3遮挡，启动外部的镀膜设备，本转动装置的电机5带动真空磁流体动密封件43转动，经过涡轮45和涡杆46的传动，进而驱动传动丝杆的螺杆41转动，掩膜挡板3在螺母42的带动下向左侧缓慢移动，待镀膜的工件6则逐步脱离掩膜挡板3的遮挡，达到渐进式镀膜的目的；
掩膜挡板3处于其行程的最左侧位置，工件6则暴露在镀膜设备的镀膜范围内，镀膜作业完毕后，启动电机5反转使掩膜挡板3回到右侧的初始位置。
本传动装置可以采用以下步骤进行：
1.手动或自动程序精确控制电机5，控制掩膜挡板3从原始的“右侧”位置向“左侧”位置运动，运动可以是连续，可以是渐进，由手动或自动程序控制。
2.镀膜工艺完成后，手动或自动程序控制掩膜挡板3复位到“左侧”位置。
以上所述的仅是本发明的一种实施方式，应当指出，对于本领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以作出若干变型和改进，这些也应视为属于本发明的保护范围。

Claims (2)

1.一种连续掩膜挡板传动装置，其特征是：包括电机、掩膜挡板、安装支架、传动组件和底座，安装支架内开有贯穿上、下端面的镀膜槽口，镀膜槽口内侧壁上开有至少一条滑槽，掩膜挡板在所述滑槽内移动，底座放置在镀膜槽口下侧；
传动组件至少包括传动丝杆，传动丝杆包括螺杆和螺母，螺杆支撑在安装支架上，螺杆的放置走向与滑槽的走向一致，螺母固定在掩膜挡板上；
电机带动传动组件的螺杆转动。
2.根据权利要求1所述的连续掩膜挡板传动装置，其特征是：
所述传动组件还包括真空磁流体动密封件、联轴器、涡轮和涡杆，螺杆一端装有涡轮，涡轮与涡杆配合，涡杆通过联轴器与真空磁流体动密封件连接，真空磁流体动密封件与电机的输出轴连接。
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CN106086783B (zh) * 2016-06-30 2019-01-22 京东方科技集团股份有限公司 一种遮挡装置及其遮挡方法和蒸镀系统
CN106477912A (zh) * 2016-09-23 2017-03-08 东莞市联洲知识产权运营管理有限公司 一种镀膜遮掩板平移机构
CN106567912A (zh) * 2016-11-07 2017-04-19 中国电子科技集团公司第四十八研究所 一种用于平板pecvd设备的带传动装置
CN108624840A (zh) * 2017-03-22 2018-10-09 浙江师范大学 一种镀膜机
CN109207951A (zh) * 2018-10-23 2019-01-15 宁波工程学院 一种非均匀多层薄膜的镀膜设备
CN111850468A (zh) * 2020-08-11 2020-10-30 江苏集萃有机光电技术研究所有限公司 一种掩膜组件、蒸镀装置及oled优化方法

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