CN105518779A - 磁记录介质基板用玻璃及磁记录介质基板 - Google Patents
磁记录介质基板用玻璃及磁记录介质基板 Download PDFInfo
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- CN105518779A CN105518779A CN201480049661.1A CN201480049661A CN105518779A CN 105518779 A CN105518779 A CN 105518779A CN 201480049661 A CN201480049661 A CN 201480049661A CN 105518779 A CN105518779 A CN 105518779A
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- Prior art keywords
- glass
- magnetic recording
- recording medium
- mgo
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011521 glass Substances 0.000 title claims abstract description 471
- 239000000758 substrate Substances 0.000 title claims abstract description 307
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 255
- 230000009477 glass transition Effects 0.000 claims abstract description 39
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims abstract description 37
- 239000000126 substance Substances 0.000 claims description 129
- 238000000034 method Methods 0.000 claims description 87
- 239000000203 mixture Substances 0.000 claims description 67
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 39
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 39
- 238000009826 distribution Methods 0.000 claims description 28
- 230000006835 compression Effects 0.000 claims description 13
- 238000007906 compression Methods 0.000 claims description 13
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 11
- 229910052744 lithium Inorganic materials 0.000 claims description 8
- 229910052708 sodium Inorganic materials 0.000 claims description 8
- 229910052700 potassium Inorganic materials 0.000 claims description 4
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 abstract description 3
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract 4
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract 4
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 abstract 1
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 description 71
- 238000005342 ion exchange Methods 0.000 description 45
- 239000000696 magnetic material Substances 0.000 description 41
- 150000003839 salts Chemical class 0.000 description 35
- 230000008676 import Effects 0.000 description 34
- 230000000694 effects Effects 0.000 description 30
- 238000010438 heat treatment Methods 0.000 description 23
- 239000002585 base Substances 0.000 description 22
- 238000011068 loading method Methods 0.000 description 21
- 239000000463 material Substances 0.000 description 21
- 239000000523 sample Substances 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 20
- 230000009467 reduction Effects 0.000 description 15
- 238000007493 shaping process Methods 0.000 description 15
- 229910001413 alkali metal ion Inorganic materials 0.000 description 13
- 238000002844 melting Methods 0.000 description 13
- 230000008018 melting Effects 0.000 description 13
- 230000008569 process Effects 0.000 description 13
- 208000010392 Bone Fractures Diseases 0.000 description 12
- 206010017076 Fracture Diseases 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- 239000004615 ingredient Substances 0.000 description 12
- 239000010955 niobium Substances 0.000 description 12
- 230000005855 radiation Effects 0.000 description 12
- 230000003111 delayed effect Effects 0.000 description 11
- 150000002500 ions Chemical class 0.000 description 11
- 238000005498 polishing Methods 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- 229910020707 Co—Pt Inorganic materials 0.000 description 9
- 238000012545 processing Methods 0.000 description 9
- 239000002994 raw material Substances 0.000 description 9
- 230000003746 surface roughness Effects 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 8
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 239000003513 alkali Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 7
- 230000002349 favourable effect Effects 0.000 description 7
- 230000001172 regenerating effect Effects 0.000 description 7
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 6
- 238000000137 annealing Methods 0.000 description 6
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 6
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 239000001103 potassium chloride Substances 0.000 description 6
- 235000011164 potassium chloride Nutrition 0.000 description 6
- 159000000000 sodium salts Chemical class 0.000 description 6
- 238000006124 Pilkington process Methods 0.000 description 5
- 239000002250 absorbent Substances 0.000 description 5
- 230000002745 absorbent Effects 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000007496 glass forming Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 230000001050 lubricating effect Effects 0.000 description 5
- 238000003754 machining Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 238000005728 strengthening Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 4
- 238000005352 clarification Methods 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- 238000007667 floating Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 239000004323 potassium nitrate Substances 0.000 description 4
- 235000010333 potassium nitrate Nutrition 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 230000008929 regeneration Effects 0.000 description 4
- 238000011069 regeneration method Methods 0.000 description 4
- 239000004317 sodium nitrate Substances 0.000 description 4
- 235000010344 sodium nitrate Nutrition 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 3
- 229910018979 CoPt Inorganic materials 0.000 description 3
- 229910005335 FePt Inorganic materials 0.000 description 3
- 229910002651 NO3 Inorganic materials 0.000 description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000004031 devitrification Methods 0.000 description 3
- 238000003280 down draw process Methods 0.000 description 3
- 238000010828 elution Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000003472 neutralizing effect Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 230000004304 visual acuity Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910004116 SrO 2 Inorganic materials 0.000 description 2
- -1 alkali metal salt Chemical class 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000875 corresponding effect Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 235000019256 formaldehyde Nutrition 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000007499 fusion processing Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 239000011833 salt mixture Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- 230000005457 Black-body radiation Effects 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 208000035126 Facies Diseases 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 241001397173 Kali <angiosperm> Species 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 208000013201 Stress fracture Diseases 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- 238000009863 impact test Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/739—Magnetic recording media substrates
- G11B5/73911—Inorganic substrates
- G11B5/73921—Glass or ceramic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Glass Compositions (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-188315 | 2013-09-11 | ||
| JP2013188315A JP6131154B2 (ja) | 2013-09-11 | 2013-09-11 | 磁気記録媒体基板用ガラスおよび磁気記録媒体基板 |
| PCT/JP2014/073911 WO2015037609A1 (ja) | 2013-09-11 | 2014-09-10 | 磁気記録媒体基板用ガラスおよび磁気記録媒体基板 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105518779A true CN105518779A (zh) | 2016-04-20 |
Family
ID=52665711
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201480049661.1A Pending CN105518779A (zh) | 2013-09-11 | 2014-09-10 | 磁记录介质基板用玻璃及磁记录介质基板 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20160225396A1 (enExample) |
| JP (1) | JP6131154B2 (enExample) |
| CN (1) | CN105518779A (enExample) |
| MY (1) | MY176222A (enExample) |
| SG (1) | SG11201601861WA (enExample) |
| WO (1) | WO2015037609A1 (enExample) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109476528A (zh) * | 2016-07-21 | 2019-03-15 | 康宁股份有限公司 | 具有高断裂韧度的透明硅酸盐玻璃 |
| CN109923083A (zh) * | 2016-11-14 | 2019-06-21 | Hoya株式会社 | 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物 |
| CN111164055A (zh) * | 2017-09-21 | 2020-05-15 | 康宁股份有限公司 | 具有高断裂韧度的透明的可离子交换硅酸盐玻璃 |
| CN111247109A (zh) * | 2017-10-20 | 2020-06-05 | 康宁股份有限公司 | 改善玻璃和玻璃陶瓷的离子交换效率的方法 |
| CN111285603A (zh) * | 2018-12-07 | 2020-06-16 | 日本电气硝子株式会社 | 玻璃 |
| CN114051489A (zh) * | 2019-06-03 | 2022-02-15 | 康宁公司 | 含碱金属显示玻璃 |
| CN114901608A (zh) * | 2019-11-27 | 2022-08-12 | 康宁股份有限公司 | 含y2o3的玻璃组合物、基材、及制品 |
| CN116854364A (zh) * | 2018-05-16 | 2023-10-10 | Hoya株式会社 | 磁记录介质基板用玻璃和磁记录再生装置用玻璃间隔物 |
| CN118184398A (zh) * | 2024-05-17 | 2024-06-14 | 合肥商德应用材料有限公司 | 一种提高氧化铝陶瓷强度的处理方法 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5972460A (en) * | 1996-12-26 | 1999-10-26 | Hoya Corporation | Information recording medium |
| CN102290056A (zh) * | 2007-09-28 | 2011-12-21 | Hoya株式会社 | 磁盘用玻璃基板及其制造方法、磁盘 |
| US20120188663A1 (en) * | 2010-12-21 | 2012-07-26 | Hoya Corporation | Glass substrate for magnetic recording medium and its use |
| JP2013116846A (ja) * | 2011-01-18 | 2013-06-13 | Nippon Electric Glass Co Ltd | 強化ガラス及び強化ガラス板 |
| CN104246883A (zh) * | 2012-03-29 | 2014-12-24 | Hoya株式会社 | 磁记录介质基板用玻璃、磁记录介质用玻璃基板及其利用 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61101433A (ja) * | 1984-10-20 | 1986-05-20 | Nippon Sheet Glass Co Ltd | 化学強化用ガラス組成物 |
| JP3412804B2 (ja) * | 1996-12-26 | 2003-06-03 | Hoya株式会社 | 情報記録媒体用基板 |
| JP2000313634A (ja) * | 1999-02-25 | 2000-11-14 | Nippon Sheet Glass Co Ltd | ガラス組成物およびその製造方法、ならびにそれを用いた情報記録媒体用基板、情報記録媒体および情報記録装置 |
| JP4017466B2 (ja) * | 2001-12-04 | 2007-12-05 | 岡本硝子株式会社 | 耐熱性ガラス |
| US8885447B2 (en) * | 2012-03-29 | 2014-11-11 | Hoya Corporation | Glass for magnetic recording medium substrate, glass substrate for magnetic recording medium, and their use |
| SG10201605515PA (en) * | 2012-05-16 | 2016-09-29 | Hoya Corp | Glass for magnetic recording medium substrate and usage thereof |
-
2013
- 2013-09-11 JP JP2013188315A patent/JP6131154B2/ja active Active
-
2014
- 2014-09-10 SG SG11201601861WA patent/SG11201601861WA/en unknown
- 2014-09-10 US US15/021,204 patent/US20160225396A1/en not_active Abandoned
- 2014-09-10 WO PCT/JP2014/073911 patent/WO2015037609A1/ja not_active Ceased
- 2014-09-10 CN CN201480049661.1A patent/CN105518779A/zh active Pending
- 2014-09-10 MY MYPI2016700847A patent/MY176222A/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5972460A (en) * | 1996-12-26 | 1999-10-26 | Hoya Corporation | Information recording medium |
| CN102290056A (zh) * | 2007-09-28 | 2011-12-21 | Hoya株式会社 | 磁盘用玻璃基板及其制造方法、磁盘 |
| US20120188663A1 (en) * | 2010-12-21 | 2012-07-26 | Hoya Corporation | Glass substrate for magnetic recording medium and its use |
| JP2013116846A (ja) * | 2011-01-18 | 2013-06-13 | Nippon Electric Glass Co Ltd | 強化ガラス及び強化ガラス板 |
| CN104246883A (zh) * | 2012-03-29 | 2014-12-24 | Hoya株式会社 | 磁记录介质基板用玻璃、磁记录介质用玻璃基板及其利用 |
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| CN115072991B (zh) * | 2016-11-14 | 2024-07-19 | Hoya株式会社 | 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物 |
| CN109923083A (zh) * | 2016-11-14 | 2019-06-21 | Hoya株式会社 | 磁记录介质基板用玻璃、磁记录介质基板、磁记录介质和磁记录再生装置用玻璃间隔物 |
| US12040003B2 (en) | 2016-11-14 | 2024-07-16 | Hoya Corporation | Glass for magnetic recording medium substrate, magnetic recording medium substrate, magnetic recording medium and glass spacer for magnetic recording and reproducing apparatus |
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| US11358898B2 (en) | 2017-10-20 | 2022-06-14 | Corning Incorporated | Methods to improve ion exchange efficiency of glasses and glass ceramics |
| US12479755B2 (en) | 2018-05-16 | 2025-11-25 | Hoya Corporation | Glass for magnetic recording medium substrate or for glass spacer for magnetic recording and reproducing apparatus |
| CN116854364A (zh) * | 2018-05-16 | 2023-10-10 | Hoya株式会社 | 磁记录介质基板用玻璃和磁记录再生装置用玻璃间隔物 |
| CN111285603A (zh) * | 2018-12-07 | 2020-06-16 | 日本电气硝子株式会社 | 玻璃 |
| CN111285603B (zh) * | 2018-12-07 | 2023-08-22 | 日本电气硝子株式会社 | 玻璃 |
| CN114051489A (zh) * | 2019-06-03 | 2022-02-15 | 康宁公司 | 含碱金属显示玻璃 |
| CN114901608B (zh) * | 2019-11-27 | 2024-04-09 | 康宁股份有限公司 | 含y2o3的玻璃组合物、基材、及制品 |
| CN114901608A (zh) * | 2019-11-27 | 2022-08-12 | 康宁股份有限公司 | 含y2o3的玻璃组合物、基材、及制品 |
| CN118184398A (zh) * | 2024-05-17 | 2024-06-14 | 合肥商德应用材料有限公司 | 一种提高氧化铝陶瓷强度的处理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| SG11201601861WA (en) | 2016-04-28 |
| JP2015054794A (ja) | 2015-03-23 |
| US20160225396A1 (en) | 2016-08-04 |
| JP6131154B2 (ja) | 2017-05-17 |
| WO2015037609A1 (ja) | 2015-03-19 |
| MY176222A (en) | 2020-07-24 |
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