CN105514216A - Triggering agent for thin-film battery texturing process - Google Patents
Triggering agent for thin-film battery texturing process Download PDFInfo
- Publication number
- CN105514216A CN105514216A CN201511011587.7A CN201511011587A CN105514216A CN 105514216 A CN105514216 A CN 105514216A CN 201511011587 A CN201511011587 A CN 201511011587A CN 105514216 A CN105514216 A CN 105514216A
- Authority
- CN
- China
- Prior art keywords
- parts
- triggering agent
- agent
- thin
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000010409 thin film Substances 0.000 title abstract 2
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
- 238000005530 etching Methods 0.000 claims abstract description 17
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims abstract description 10
- 229930182470 glycoside Natural products 0.000 claims abstract description 7
- -1 flavone glycoside Chemical class 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims abstract description 5
- 235000011164 potassium chloride Nutrition 0.000 claims abstract description 5
- 239000001103 potassium chloride Substances 0.000 claims abstract description 5
- 150000002338 glycosides Chemical class 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- 229940043237 diethanolamine Drugs 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract description 9
- GAMYVSCDDLXAQW-AOIWZFSPSA-N Thermopsosid Natural products O(C)c1c(O)ccc(C=2Oc3c(c(O)cc(O[C@H]4[C@H](O)[C@@H](O)[C@H](O)[C@H](CO)O4)c3)C(=O)C=2)c1 GAMYVSCDDLXAQW-AOIWZFSPSA-N 0.000 abstract 2
- 229930003944 flavone Natural products 0.000 abstract 2
- 235000011949 flavones Nutrition 0.000 abstract 2
- VHBFFQKBGNRLFZ-UHFFFAOYSA-N vitamin p Natural products O1C2=CC=CC=C2C(=O)C=C1C1=CC=CC=C1 VHBFFQKBGNRLFZ-UHFFFAOYSA-N 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 1
- AUIXNZFZSGLHKP-UHFFFAOYSA-M sodium;2,3-dimethylbenzenesulfonate Chemical compound [Na+].CC1=CC=CC(S([O-])(=O)=O)=C1C AUIXNZFZSGLHKP-UHFFFAOYSA-M 0.000 abstract 1
- 238000003756 stirring Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 3
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Weting (AREA)
Abstract
The invention relates to the technical field of battery production, and particularly to a triggering agent for a thin-film battery texturing process. The triggering agent is prepared from 10 parts of diethanolamine, 6 parts of ethyl acetate, 1 part of flavone glycoside, 10 parts of sodium dimethylbenzenesulfonate, 5 parts of potassium chloride and 60 parts of water. The triggering agent is advantageous in that the formula is reasonable and novel; and particularly a small amount of flavone glycoside is added and can remarkably improve processing efficiency of the triggering agent. Through use of the triggering agent, suede uniformity of a battery substrate after surface etching and side wall protection is remarkably improved.
Description
Technical field
The present invention relates to battery processing technique field, specifically relate to a kind of triggering agent for hull cell process for etching.
Background technology
In the course of processing of existing hull cell, first cell substrate is positioned in plasma process chamber, then to the surface etching of substrate and sidewall protection to form matte.But the uniformity consistency that this processing method mainly exists matte is poor, main cause does not add or spray to trigger agent.
Summary of the invention
For the technical problem existed in prior art, the object of the present invention is to provide a kind of triggering agent for hull cell process for etching, for achieving the above object, present invention employs following technical scheme:
For a triggering agent for hull cell process for etching, be made up of 10 parts of diethanol amine, 6 parts of ethyl acetate, 1 part of glycosides displayed, 10 parts of acid dimethyl sodium, 5 parts of potassium chloride and 60 water.
Beneficial effect of the present invention shows:
1), the triggering agent that uses in process for etching, its formula Design is reasonable, novel, particularly with the addition of a small amount of glycosides displayed, can significantly improve the treatment effeciency triggering agent.By trigger agent with the use of, the matte uniformity of cell substrate after surface etching and sidewall protection is significantly improved.
2), trigger the preparation method of agent, by the method for progressively adding, the solubility property between each material can not only be improved, the possibility of particle agglomeration can also be avoided, the pretreatment potentiality of triggering agent is promoted significantly.
3), for the triggering agent of hull cell process for etching; operating procedure is succinct; focus on first spraying on surface etching forward direction substrate triggering agent; then to the surface etching of substrate and sidewall protection with the step forming matte; simultaneously; trigger the formula of agent by appropriate design and trigger the preparation method of agent, thus follow-up surface etching and sidewall protection step are completed better.
Embodiment
Below with reference to embodiment, the present invention is described in detail.But; embodiment content is only citing made for the present invention and explanation; affiliated those skilled in the art make various amendment to described specific embodiment or supplement or adopt similar mode to substitute; only otherwise depart from the design of invention or surmount this scope as defined in the claims, protection scope of the present invention all should be belonged to.
One, the composition of agent is triggered
10 parts of diethanol amine, 6 parts of ethyl acetate, 1 part of glycosides displayed, 10 parts of acid dimethyl sodium, 5 parts of potassium chloride and 60 water.
Two, the preparation method triggering agent is:
First in container, add 10 parts of diethanol amine, 6 parts of ethyl acetate and 30 parts of water, stir 5 minutes; Then slowly add 1 part of glycosides displayed and 10 parts of acid dimethyl sodium, limit edged stirs, and stirs 5 minutes after interpolation; Last property adds 5 parts of potassium chloride and 30 parts of water, stirs 15 minutes.
Three, for the triggering agent of hull cell process for etching, step is as follows:
First on surface etching forward direction hull cell substrate, sprayed triggering agent, then substrate be positioned in plasma process chamber, then to the surface etching of substrate and sidewall protection to form matte, etching employing sulfuric acid-hydrogen peroxide etch systems.
Claims (1)
1., for a triggering agent for hull cell process for etching, it is characterized in that being made up of 10 parts of diethanol amine, 6 parts of ethyl acetate, 1 part of glycosides displayed, 10 parts of acid dimethyl sodium, 5 parts of potassium chloride and 60 water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511011587.7A CN105514216A (en) | 2015-12-30 | 2015-12-30 | Triggering agent for thin-film battery texturing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201511011587.7A CN105514216A (en) | 2015-12-30 | 2015-12-30 | Triggering agent for thin-film battery texturing process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105514216A true CN105514216A (en) | 2016-04-20 |
Family
ID=55722047
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201511011587.7A Pending CN105514216A (en) | 2015-12-30 | 2015-12-30 | Triggering agent for thin-film battery texturing process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105514216A (en) |
-
2015
- 2015-12-30 CN CN201511011587.7A patent/CN105514216A/en active Pending
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160420 |