CN105461237B - 一种low-e低辐射真空保温玻璃及其生产方法 - Google Patents
一种low-e低辐射真空保温玻璃及其生产方法 Download PDFInfo
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Abstract
本发明提供一种LOW‑E低辐射真空保温玻璃及其生产方法,所述玻璃包括:真空玻璃基板,包括第一玻璃基片和第二玻璃基片,第一玻璃基片与第二玻璃基片之间通过密封胶连接并抽真空形成真空内腔;低辐射涂层,涂覆于第一玻璃基片相对第二玻璃基片的另一面;隔热保温涂层,涂覆于第二玻璃基片相对第一玻璃基片的另一面;所述低辐射涂层包括由内至外层叠设置的氧化锌铝层、银层及硅铝合金层。所述玻璃兼具保温、防辐射双重功效,防辐射效果好,设计提供专门的隔热保温涂层,涂层成分搭配合理、生产方法易操作,导热系数低,保温效果好,使用简单,且涂覆后不易脱落,使用寿命长,经济成本低,使用前景好。
Description
技术领域
本发明涉及一种LOW-E低辐射真空保温玻璃及其生产方法。
背景技术
真空玻璃是将两片平板玻璃四周密闭起来,将其间隙抽成真空并密封排气孔,两片玻璃之间的间隙为0.1-0.2mm,真空玻璃的两片一般至少有一片是低辐射玻璃,这样就将通过真空玻璃的传导、对流和辐射方式散失的热降到最低,其工作原理与玻璃保温瓶的保温隔热原理相同。真空玻璃是玻璃工艺与材料科学、真空技术、物理测量技术、工业自动化及建筑科学等,多种学科、多种技术、多种工艺协作配合的硕果。
真空玻璃是一种新型节能玻璃,它基于保温瓶原理,将两片玻璃四周密封,中间间隔为0.1-0.2mm的薄真空层。由于没有气体传热,内表面又有起保温瓶银膜作用的透明低辐射膜,使真空玻璃的保温隔热性能远优于目前已广泛使用的“中空”玻璃。
然而,目前市场上大多真空玻璃保温效果并不好,且如果长时间使用后,密封不严会严重影响其保温效果,且功能单一。
对此,目前国内主要存在如下专利文献:
如专利公开号:CN105084780A,公开了一种遮阳型双银低辐射镀膜玻璃及其制备方法,所述遮阳型双银低辐射镀膜玻璃包括依次紧密叠合的玻璃基片、第一硅铝合金膜;第二锌铝合金膜;第三银膜;第四镍镉合金膜;第五硅铝合金膜;第六锌铝合金膜;第七银膜;第八镍镉合金膜;第九硅铝合金膜,所述制备方法包括步骤:1)烧结靶材;2)玻璃的预处理;3)镀膜处理。本发明是在普通无色透明浮法玻璃基片上通过各种金属材料对光的干涉制得的双银低辐射镀膜玻璃,在阳光下反射色呈浅灰色,可达到良好的装饰、节能效果;产品可异地加工,降低加工企业制造成本;也可制成中空玻璃,达到更好的控光、节能效果。然而,该专利所提供的玻璃,主要专注防辐射功能,而对保温功能并未提及,其所述的遮阳功能并不能等同于保温。
发明内容
为解决上述存在的问题,本发明的目的在于提供一种LOW-E低辐射真空保温玻璃及其生产方法,所述玻璃兼具保温、防辐射双重功效,防辐射效果好,设计提供专门的隔热保温涂层,涂层成分搭配合理、生产方法易操作,导热系数低,保温效果好,且只需涂使用即可在玻璃表面形成涂层,使用简单,且涂覆后不易脱落,使用寿命长,经济成本低,使用前景好。
为达到上述目的,本发明的技术方案是:
一种LOW-E低辐射真空保温玻璃,所述玻璃包括:真空玻璃基板,包括由下至上层叠设置的第一玻璃基片和第二玻璃基片,所述第一玻璃基片与第二玻璃基片相对面之间通过密封胶连接并抽真空形成真空内腔;低辐射涂层,涂覆于所述第一玻璃基片相对第二玻璃基片的另一面;隔热保温涂层,涂覆于所述第二玻璃基片相对第一玻璃基片的另一面;所述低辐射涂层包括由内至外层叠设置的氧化锌铝层、银层及硅铝合金层;所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:20~30份,纳米碳化硅:10~15份,己二酸二辛酯:1~5份,纳米氧化锌:1~5份,纳米氧化锑:0.1~1份,聚丙烯酰胺:1~5份,甘露醇:5~10份,壳聚糖:1~5份,苯并三唑:1~5份,凹凸棒土:10~20份,云母粉:6~10份,氧化钴粉:0.1~1份,硅藻土:1~5份,低表面能粘结剂:10~20份,流平剂:1~5份,润湿剂:1~10份,分散剂:5~10份,消泡剂:1~5份,抗氧剂:1~5份,去离子水:50~100份。
进一步,所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:25~30份,纳米碳化硅:10~13份,己二酸二辛酯:2~5份,纳米氧化锌:3~5份,纳米氧化锑:0.1~0.5份,聚丙烯酰胺:1~3份,甘露醇:5~8份,壳聚糖:1~4份,苯并三唑:2~5份,凹凸棒土:15~20份,云母粉:6~8份,氧化钴粉:0.5~1份,硅藻土:3~5份,低表面能粘结剂:10~13份,流平剂:1~3份,润湿剂:1~5份,分散剂:5~10份,消泡剂:1~5份,抗氧剂:1~5份,去离子水:50~80份。
优选地,所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:25份,纳米碳化硅:13份,己二酸二辛酯:3份,纳米氧化锌:4份,纳米氧化锑:0.5份,聚丙烯酰胺:2份,甘露醇:6份,壳聚糖:1份,苯并三唑:2份,凹凸棒土:15份,云母粉:7份,氧化钴粉:0.5份,硅藻土:4份,低表面能粘结剂:13份,流平剂:2份,润湿剂:3份,分散剂:6份,消泡剂:3份,抗氧剂:2份,去离子水:60份。
另,所述流平剂为聚二甲基硅氧烷、聚甲基苯基硅氧烷或聚酯改性有机硅氧烷。
另有,所述所述分散剂为卵磷脂、甜菜碱或脂肪酸甘油酯。
再,所述消泡剂为乳化硅油、高碳醇或苯乙醇油酸酯。
再有,所述低表面能物质为氟硅烷、硅氧烷、聚四氟乙烯、硅烷偶联剂、甲基三乙氧基硅烷、乙烯基三甲氧基硅烷或苯基三甲氧基硅烷。
且,所述抗氧剂为抗氧剂1010或抗氧剂1098。
同时,本发明还提供一种LOW-E低辐射真空保温玻璃的生产方法,包括如下步骤:
1)制备隔热保温粉体
将纳米碳化硅于600~800℃下高温处理30~60min,在10~20min内冷却至室温,超声波研磨10~20min成粉,加入分散釜中,并加入去离子水和纳米ATO浆料,以800~1000转/min的速度进行剪切分散30~50min;将转速调至1000~1200转/min,在分散釜中加入聚丙烯酰胺、己二酸二辛酯、纳米氧化锌、纳米氧化锑搅拌5~10min;将转速调至1200~1400转/min,加入甘露醇、壳聚糖、苯并三唑、凹凸棒土、云母粉、氧化钴粉及硅藻土搅拌10~20min;将转速调至1400~1600转/min,依次加入低表面能粘结剂、流平剂、润湿剂、分散剂、消泡剂、抗氧剂均匀搅拌30~50min;将分散后的物料在室温下烘干干燥,烘干温度100~120℃,烘干时间20~30min,固化,研磨分散,得所述隔热保温粉体;
2)烧结靶材
将氧化锌铝、银及硅铝合金分别烧结在镀膜机的磁控溅射靶材上,备用;
3)预处理
将所述第一玻璃基片及第二玻璃基片通过密封胶粘结、抽真空形成真空内腔,得所述真空玻璃基板,并对真空玻璃基板表面进行去污、去油、脱湿处理;
4)喷涂
用喷枪将将步骤1)所得隔热保温粉体均匀地喷涂到由步骤3)处理后的真空玻璃基板第二玻璃基片相对第一玻璃基片的另一面,喷涂温度30~40℃,喷枪压力0.5~1MPa,喷涂完成后在室温下放置1~2小时;
5)固化
将步骤4)处理后的真空玻璃基板送入烘箱加热固化,加热固化的温度为160~180℃,加热固化的时间为10~20min,冷却至室温,在所述真空玻璃基板第二玻璃基片相对第一玻璃基片的另一面上形成隔热保温涂层;
6)镀低辐射涂层
将步骤5)固化处理后的真空玻璃基板送入磁控溅射室内,真空玻璃基板第一玻璃基片相对第二玻璃基片的另一面对准磁控溅射靶材,在所述第一玻璃基片表面由内至外依次形成氧化锌铝层、银层及硅铝合金层,得到所述低辐射涂层的镀膜,完成所述LOW-E低辐射真空保温玻璃的生产。
另,所述隔热保温涂层厚度为5~10μm,导热系数为0.01~0.05W/m·K。
本发明的有益效果在于:
所述玻璃兼具保温、防辐射双重功效,防辐射效果好,设计提供专门的隔热保温涂层,涂层成分搭配合理、生产方法易操作,导热系数低,保温效果好,且只需涂使用即可在玻璃表面形成涂层,使用简单,且涂覆后不易脱落,使用寿命长,经济成本低,使用前景好。
附图说明
图1为本发明实施例所提供的一种LOW-E低辐射真空保温玻璃的结构示意图。
具体实施方式
下面结合具体实施例对本发明进行详细说明。以下实施例将有助于本领域的技术人员进一步理解本发明,但不以任何形式限制本发明。应当指出的是,对本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进。这些都属于本发明的保护范围。
参照图1,本发明所述的一种LOW-E低辐射真空保温玻璃,所述玻璃包括:真空玻璃基板1,包括由下至上层叠设置的第一玻璃基片11和第二玻璃基片12,所述第一玻璃基片11与第二玻璃基片12相对面之间通过密封胶13连接并抽真空形成真空内腔14;低辐射涂层2,涂覆于所述第一玻璃基片11相对第二玻璃基片12的另一面;隔热保温涂层3,涂覆于所述第二玻璃基片12相对第一玻璃基片11的另一面;所述低辐射涂层2包括由内至外层叠设置的氧化锌铝层21、银层22及硅铝合金层23;所述隔热保温涂层3包括如下重量份的成分:纳米ATO浆料:20~30份,纳米碳化硅:10~15份,己二酸二辛酯:1~5份,纳米氧化锌:1~5份,纳米氧化锑:0.1~1份,聚丙烯酰胺:1~5份,甘露醇:5~10份,壳聚糖:1~5份,苯并三唑:1~5份,凹凸棒土:10~20份,云母粉:6~10份,氧化钴粉:0.1~1份,硅藻土:1~5份,低表面能粘结剂:10~20份,流平剂:1~5份,润湿剂:1~10份,分散剂:5~10份,消泡剂:1~5份,抗氧剂:1~5份,去离子水:50~100份。
进一步,所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:25~30份,纳米碳化硅:10~13份,己二酸二辛酯:2~5份,纳米氧化锌:3~5份,纳米氧化锑:0.1~0.5份,聚丙烯酰胺:1~3份,甘露醇:5~8份,壳聚糖:1~4份,苯并三唑:2~5份,凹凸棒土:15~20份,云母粉:6~8份,氧化钴粉:0.5~1份,硅藻土:3~5份,低表面能粘结剂:10~13份,流平剂:1~3份,润湿剂:1~5份,分散剂:5~10份,消泡剂:1~5份,抗氧剂:1~5份,去离子水:50~80份。
优选地,所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:25份,纳米碳化硅:13份,己二酸二辛酯:3份,纳米氧化锌:4份,纳米氧化锑:0.5份,聚丙烯酰胺:2份,甘露醇:6份,壳聚糖:1份,苯并三唑:2份,凹凸棒土:15份,云母粉:7份,氧化钴粉:0.5份,硅藻土:4份,低表面能粘结剂:13份,流平剂:2份,润湿剂:3份,分散剂:6份,消泡剂:3份,抗氧剂:2份,去离子水:60份。
另,所述流平剂为聚二甲基硅氧烷、聚甲基苯基硅氧烷或聚酯改性有机硅氧烷。
另有,所述所述分散剂为卵磷脂、甜菜碱或脂肪酸甘油酯。
再,所述消泡剂为乳化硅油、高碳醇或苯乙醇油酸酯。
再有,所述低表面能物质为氟硅烷、硅氧烷、聚四氟乙烯、硅烷偶联剂、甲基三乙氧基硅烷、乙烯基三甲氧基硅烷或苯基三甲氧基硅烷。
且,所述抗氧剂为抗氧剂1010或抗氧剂1098。
同时,本发明还提供一种LOW-E低辐射真空保温玻璃的生产方法,包括如下步骤:
1)制备隔热保温粉体
将纳米碳化硅于600~800℃下高温处理30~60min,在10~20min内冷却至室温,超声波研磨10~20min成粉,加入分散釜中,并加入去离子水和纳米ATO浆料,以800~1000转/min的速度进行剪切分散30~50min;将转速调至1000~1200转/min,在分散釜中加入聚丙烯酰胺、己二酸二辛酯、纳米氧化锌、纳米氧化锑搅拌5~10min;将转速调至1200~1400转/min,加入甘露醇、壳聚糖、苯并三唑、凹凸棒土、云母粉、氧化钴粉及硅藻土搅拌10~20min;将转速调至1400~1600转/min,依次加入低表面能粘结剂、流平剂、润湿剂、分散剂、消泡剂、抗氧剂均匀搅拌30~50min;将分散后的物料在室温下烘干干燥,烘干温度100~120℃,烘干时间20~30min,固化,研磨分散,得所述隔热保温粉体;
2)烧结靶材
将氧化锌铝、银及硅铝合金分别烧结在镀膜机的磁控溅射靶材上,备用;
3)预处理
将所述第一玻璃基片11及第二玻璃基片12通过密封胶13粘结、抽真空形成真空内腔14,得所述真空玻璃基板1,并对真空玻璃基板1表面进行去污、去油、脱湿处理;
4)喷涂
用喷枪将将步骤1)所得隔热保温粉体均匀地喷涂到由步骤3)处理后的真空玻璃基板1第二玻璃基片12相对第一玻璃基片11的另一面,喷涂温度30~40℃,喷枪压力0.5~1MPa,喷涂完成后在室温下放置1~2小时;
5)固化
将步骤4)处理后的真空玻璃基板1送入烘箱加热固化,加热固化的温度为160~180℃,加热固化的时间为10~20min,冷却至室温,在所述真空玻璃基板第二玻璃基片相对第一玻璃基片的另一面上形成隔热保温涂层3;
6)镀低辐射涂层
将步骤5)固化处理后的真空玻璃基板1送入磁控溅射室内,真空玻璃基板1第一玻璃基片11相对第二玻璃基片12的另一面对准磁控溅射靶材,在所述第一玻璃基片11表面由内至外依次形成氧化锌铝层21、银层22及硅铝合金层23,得到所述低辐射涂层2的镀膜,完成所述LOW-E低辐射真空保温玻璃的生产。
另,所述隔热保温涂层厚度为5~10μm,导热系数为0.01~0.05W/m·K。
其中,表1为本发明各实施例所提供的一种LOW-E低辐射真空保温玻璃中隔热保温涂层的成分列表。表2为本发明各实施例所提供的一种LOW-E低辐射真空保温玻璃的隔热性能及防结露结霜性能列表。
表1(单位:重量份)
表2
由表2可见,本发明所提供的LOW-E低辐射真空保温玻璃保温隔热性能好且结露温度低,具有良好的抗结霜、抗结露能力。
本发明所提供的一种LOW-E低辐射真空保温玻璃及其生产方法,所述玻璃兼具保温、防辐射双重功效,防辐射效果好,设计提供专门的隔热保温涂层,涂层成分搭配合理、生产方法易操作,导热系数低,保温效果好,且只需涂使用即可在玻璃表面形成涂层,使用简单,且涂覆后不易脱落,使用寿命长,经济成本低,使用前景好。
需要说明的是,以上实施例仅用以说明本发明的技术方案而非限制。尽管参照较佳实施例对本发明进行了详细说明,本领域的普通技术人员应当理解,可以对发明的技术方案进行修改或者等同替换,而不脱离本发明技术方案的范围,其均应涵盖在本发明的权利要求范围中。
Claims (7)
1.一种LOW-E低辐射真空保温玻璃,其特征在于,所述玻璃包括:
真空玻璃基板,包括由下至上层叠设置的第一玻璃基片和第二玻璃基片,所述第一玻璃基片与第二玻璃基片相对面之间通过密封胶连接并抽真空形成真空内腔;
低辐射涂层,涂覆于所述第一玻璃基片相对第二玻璃基片的另一面;
隔热保温涂层,涂覆于所述第二玻璃基片相对第一玻璃基片的另一面;
所述低辐射涂层包括由内至外层叠设置的氧化锌铝层、银层及硅铝合金层;
所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:20~30份,纳米碳化硅:10~15份,己二酸二辛酯:1~5份,纳米氧化锌:1~5份,纳米氧化锑:0.1~1份,聚丙烯酰胺:1~5份,甘露醇:5~10份,壳聚糖:1~5份,苯并三唑:1~5份,凹凸棒土:10~20份,云母粉:6~10份,氧化钴粉:0.1~1份,硅藻土:1~5份,低表面能粘结剂:10~20份,流平剂:1~5份,润湿剂:1~10份,分散剂:5~10份,消泡剂:1~5份,抗氧剂:1~5份,去离子水:50~100份;
所述流平剂为聚二甲基硅氧烷、聚甲基苯基硅氧烷或聚酯改性有机硅氧烷;
所述分散剂为卵磷脂、甜菜碱或脂肪酸甘油酯;
所述消泡剂为乳化硅油、高碳醇或苯乙醇油酸酯。
2.根据权利要求1所述的一种LOW-E低辐射真空保温玻璃,其特征在于,所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:25~30份,纳米碳化硅:10~13份,己二酸二辛酯:2~5份,纳米氧化锌:3~5份,纳米氧化锑:0.1~0.5份,聚丙烯酰胺:1~3份,甘露醇:5~8份,壳聚糖:1~4份,苯并三唑:2~5份,凹凸棒土:15~20份,云母粉:6~8份,氧化钴粉:0.5~1份,硅藻土:3~5份,低表面能粘结剂:10~13份,流平剂:1~3份,润湿剂:1~5份,分散剂:5~10份,消泡剂:1~5份,抗氧剂:1~5份,去离子水:50~80份。
3.根据权利要求1所述的一种LOW-E低辐射真空保温玻璃,其特征在于,所述隔热保温涂层包括如下重量份的成分:纳米ATO浆料:25份,纳米碳化硅:13份,己二酸二辛酯:3份,纳米氧化锌:4份,纳米氧化锑:0.5份,聚丙烯酰胺:2份,甘露醇:6份,壳聚糖:1份,苯并三唑:2份,凹凸棒土:15份,云母粉:7份,氧化钴粉:0.5份,硅藻土:4份,低表面能粘结剂:13份,流平剂:2份,润湿剂:3份,分散剂:6份,消泡剂:3份,抗氧剂:2份,去离子水:60份。
4.根据权利要求1所述的一种LOW-E低辐射真空保温玻璃,其特征在于,所述低表面能物质为氟硅烷、硅氧烷、聚四氟乙烯、硅烷偶联剂、甲基三乙氧基硅烷、乙烯基三甲氧基硅烷或苯基三甲氧基硅烷。
5.根据权利要求1所述的一种LOW-E低辐射真空保温玻璃,其特征在于,所述抗氧剂为抗氧剂1010或抗氧剂1098。
6.一种如权利要求1~5中任一项所述的LOW-E低辐射真空保温玻璃的生产方法,其特征在于,包括如下步骤:
1)制备隔热保温粉体
将纳米碳化硅于600~800℃下高温处理30~60min,在10~20min内冷却至室温,超声波研磨10~20min成粉,加入分散釜中,并加入去离子水和纳米ATO浆料,以800~1000转/min的速度进行剪切分散30~50min;将转速调至1000~1200转/min,在分散釜中加入聚丙烯酰胺、己二酸二辛酯、纳米氧化锌、纳米氧化锑搅拌5~10min;将转速调至1200~1400转/min,加入甘露醇、壳聚糖、苯并三唑、凹凸棒土、云母粉、氧化钴粉及硅藻土搅拌10~20min;将转速调至1400~1600转/min,依次加入低表面能粘结剂、流平剂、润湿剂、分散剂、消泡剂、抗氧剂均匀搅拌30~50min;将分散后的物料在室温下烘干干燥,烘干温度100~120℃,烘干时间20~30min,固化,研磨分散,得所述隔热保温粉体;
2)烧结靶材
将氧化锌铝、银及硅铝合金分别烧结在镀膜机的磁控溅射靶材上,备用;
3)预处理
将所述第一玻璃基片及第二玻璃基片通过密封胶粘结、抽真空形成真空内腔,得所述真空玻璃基板,并对真空玻璃基板表面进行去污、去油、脱湿处理;
4)喷涂
用喷枪将步骤1)所得隔热保温粉体均匀地喷涂到由步骤3)处理后的真空玻璃基板第二玻璃基片相对第一玻璃基片的另一面,喷涂温度30~40℃,喷枪压力0.5~1MPa,喷涂完成后在室温下放置1~2小时;
5)固化
将步骤4)处理后的真空玻璃基板送入烘箱加热固化,加热固化的温度为160~180℃,加热固化的时间为10~20min,冷却至室温,在所述真空玻璃基板第二玻璃基片相对第一玻璃基片的另一面上形成隔热保温涂层;
6)镀低辐射涂层
将步骤5)固化处理后的真空玻璃基板送入磁控溅射室内,真空玻璃基板第一玻璃基片相对第二玻璃基片的另一面对准磁控溅射靶材,在所述第一玻璃基片表面由内至外依次形成氧化锌铝层、银层及硅铝合金层,得到所述低辐射涂层的镀膜,完成所述LOW-E低辐射真空保温玻璃的生产。
7.根据权利要求6所述的一种LOW-E低辐射真空保温玻璃的生产方法,其特征在于,所述隔热保温涂层厚度为5~10μm,导热系数为0.01~0.05W/m·K。
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