CN105457843A - Photoresist coating device and phtoresist coating method - Google Patents

Photoresist coating device and phtoresist coating method Download PDF

Info

Publication number
CN105457843A
CN105457843A CN 201610033569 CN201610033569A CN105457843A CN 105457843 A CN105457843 A CN 105457843A CN 201610033569 CN201610033569 CN 201610033569 CN 201610033569 A CN201610033569 A CN 201610033569A CN 105457843 A CN105457843 A CN 105457843A
Authority
CN
Grant status
Application
Patent type
Prior art keywords
substrate
photoresist
coating
adhesive
thickness
Prior art date
Application number
CN 201610033569
Other languages
Chinese (zh)
Inventor
王雷
Original Assignee
武汉华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/027Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

Abstract

The invention provides a photoresist coating device and a photoresist coating method. The photoresist coating method is performed by adopting a vertical whole-face adhesive spitting mode, an adhesive is sprayed on the surface of a substrate through needlelike adhesive spitting nozzles which are densely distributed on a coating spray head, the photoresist adhesive can be naturally flattened on the surface of the substrate to form a film under the action of gravity and surface tension, the film is vertically pulled to grow by continuously supplementing the adhesive, the adhesive spitting nozzles are controlled to stop spraying the adhesive when the thickness of the film formed on the surface of the substrate reaches a preset range, and then the vertical whole-face adhesive spitting action is completed. Compared with an existing photoresist coating method adopting a horizontal coating mode, the photoresist coating method has the advantages that on the condition that the adhesive spitting uniformity and the film thickness stability are guaranteed, the coating time is greatly shortened, and therefore the productivity is improved.

Description

光阻涂布装置及光阻涂布方法 Photoresist coating photoresist coating apparatus and method

技术领域 FIELD

[0001]本发明涉及显示面板的制造领域,尤其涉及一种光阻涂布装置及光阻涂布方法。 [0001] The present invention relates to the field of manufacturing a display panel, particularly to a photoresist coating apparatus and a resist coating process.

背景技术 Background technique

[0002]薄膜晶体管液晶显不装置(Thin Film Transistor Liquid Crystal Display,TFT-LCD)具有机身薄、省电、无辐射等众多优点,得到了广泛的应用。 [0002] The thin film transistor liquid crystal display device is not (Thin Film Transistor Liquid Crystal Display, TFT-LCD) having a thin body, low power, radiation and many other advantages, has been widely used. 现有市场上的液晶显示装置大部分为背光型液晶显示装置,其包括液晶显示面板及背光模组(backlightmodule)。 The liquid crystal display device on the market, most of the conventional backlight type liquid crystal display device comprising a liquid crystal display panel and a backlight module (backlightmodule). 通常液晶显示面板由彩膜(CF,Color Filter)基板、TFT阵列基板、夹于彩膜基板与TFT阵列基板之间的液晶(LC,Liquid Crystal)及密封框胶(Sealant)组成;其成型工艺一般包括:前段阵列(Array)制程与CF制程(薄膜、黄光、蚀刻及剥膜)、中段成盒(Cell)制程(TFT阵列基板与CF基板贴合)及后段模组组装(Module)制程(驱动1C与印刷电路板压合);其中,前段Array制程主要是形成TFT基板,以便于控制液晶分子的运动;前段CF制程主要是形成CF基板;中段Cell制程主要是在TFT基板与CF基板之间添加液晶;后段模组组装制程主要是驱动1C压合与印刷电路板的整合,进而驱动液晶分子转动,显示图像。 Normally liquid crystal display panel by the color filter (CF, Color Filter) substrate, the TFT array substrate, the color filter substrate interposed between the TFT array substrate and a liquid crystal (LC, Liquid Crystal) and sealing the sealant (Sealant) composition; the molding process general comprising: pre-stage array (the array) process and CF process (film, yellow, etching and stripping), the middle of a box (the Cell) process (TFT array substrate and the CF substrate bonding) and a rear section module assembly (module) process (driving 1C and the printed circuit board lamination); wherein the front stage Array process mainly the TFT substrate, in order to control the liquid crystal molecules in motion; pre-stage CF process is formed mainly of the CF substrate; middle Cell process mainly the TFT substrate and the CF adding a liquid crystal between the substrates; rear stage process module assembly 1C is mainly driven integration nip the printed circuit board, thereby driving the liquid crystal molecules is rotated, displaying an image.

[0003] CF基板是LCD用来实现彩色显示的主要器件,其基本构成通常包括:玻璃基板、黑色矩阵(Black Matrix,BM)、彩色色阻层等等。 [0003] CF substrate is used to achieve the main LCD color display device, which generally includes a basic structure: a glass substrate, a black matrix (Black Matrix, BM), a color resist layer and the like. 背光源发出的光经过液晶分子的调制入射到CF基板,通过CF基板上彩色色阻层的红色色阻、绿色色阻、以及蓝色色阻的滤光作用,分别显示红,绿,蓝三种光线,不同颜色的色阻分别透射对应颜色波段的光,从而实现显示器的彩色显示。 Light emitted from the backlight through the liquid crystal molecules is incident on the modulator of the CF substrate, through the red color filter of a color on the CF substrate barrier layer, a green color filter, and an optical effect blue color resist, respectively, red, green, and blue light of different colors respectively corresponding to the light transmitting color filter color bands, thereby achieving a color display monitor. 在CF制程当中,包括光阻涂布、曝光、显影等制程,其中,光阻涂布无疑是最为重要的一个环节,光阻涂布的均匀性以及光阻的厚度对于显示效果都有很重要的影响。 In the process among the CF, including photoresist coating, exposure, development and other processes, wherein the photoresist coating is undoubtedly the most important aspect, the resist thickness uniformity and the photoresist coating has important for display Impact.

[0004]传统的光阻涂布方式为:如图1所示,首先将涂布喷头500与放置在承载台200上的基板100进行对位,涂布喷头500上设有与基板100的宽度相对应的狭缝喷嘴510;然后,如图2所示,控制所述涂布喷头500上的狭缝喷嘴510吐胶,在基板100上形成横跨基板100的光阻束(beam) 110';之后,如图3所示,通过水平牵引的方式使涂布喷头500在基板100上方水平移动,在基板100表面形成整面的光阻图层,得到光阻层110;该光阻涂布方式虽然在膜厚均匀性方面有优势,但是整体的生产时间(Tact time)却是随着玻璃基板的尺寸增大而逐渐增加的,因此对于产能的提升没有帮助。 [0004] The traditional way photoresist coating: 1, first coating head 500 is disposed on the carrier substrate 200 to position 100, the width of the substrate 100 is provided on the head 500 is applied corresponding to the slit nozzle 510; then, as shown, to control the slit nozzle coating head 2 500 510 on spit gum, cross beam resist substrate 100 (beam) 110 is formed on the substrate 100 ' ; then, as shown in FIG. 3, by way of a horizontal pulling the coating head 500 above the substrate 100 in a horizontal movement, the entire surface of the photoresist layer formed on a surface of the substrate 100, photoresist layer 110 to obtain; the photoresist coating Although the embodiment has advantages in uniformity of film thickness, but the overall production time (Tact time) is increased as the size of the glass substrate is gradually increased, and therefore do not contribute to improve production capacity.

[0005]因此,有必要提供一种光阻涂布装置及光阻涂布方法,以解决上述问题。 [0005] Accordingly, there is a need for a photoresist coating apparatus and a resist coating method, to solve the above problems.

发明内容 SUMMARY

[0006]本发明的目的在于提供一种光阻涂布装置,喷头本体的底面上设有紧密地阵列排布的数个针状的吐胶喷嘴,能够对基板进行垂直整面吐胶,保证吐胶均匀性以及膜厚稳定性,降低光阻涂布制程的生产时间。 [0006] The object of the present invention is to provide a photoresist coating apparatus, provided with a bottom surface of the head body is tightly arranged in an array of several needle-like discharge nozzle gum, can be perpendicular to the entire surface of the substrate is spit gum, guarantee and the film thickness uniformity of the glue jetting stability, resist coating process to reduce production time.

[0007]本发明的目的还在于提供一种光阻涂布方法,采用垂直整面吐胶的方式进行,保证吐胶均匀性以及膜厚稳定性,降低光阻涂布制程的生产时间。 [0007] The object of the present invention is to provide a resist coating process, the entire surface of the vertical glue spit manner, to ensure discharge stability and the film thickness uniformity of the adhesive, the resist coating process to reduce production time.

[0008]为实现上述发明目的,本发明提供一种光阻涂布装置,用于在基板上涂布光阻膜层,包括涂布喷头;所述涂布喷头包括喷头本体、及阵列排布于所述喷头本体底面上的数个针状的吐胶喷嘴; [0008] In order to achieve the above object, the present invention provides a resist coating apparatus for coating a photoresist layer on a substrate, comprising a coating head; the coating head comprises a head body, and arranged in an array a plurality of needle-like body in the bottom surface of the showerhead nozzle discharge gum;

[0009]所述喷头本体用于容纳光阻胶,使用时,数个吐胶喷嘴同时从竖直方向上向水平放置的基板进行吐胶,在重力以及表面张力作用下光阻胶在基板的表面上自然流平而形成薄膜,通过吐胶喷嘴不断吐胶而使薄膜的厚度增加。 [0009] The head body for receiving glue resist, in use, a plurality of adhesive discharge nozzle placed simultaneously from a vertical direction to a horizontal spit plastic substrate, gravity and surface tension of the substrate in the photoresist gum forming a thin film on the surface of the natural leveling, by continuously spouting nozzle glue spit gum increase the thickness of the film.

[0010]所述光阻涂布装置还包括设于所述喷头本体底面上的厚度检测器,用于量测在所述基板上形成薄膜的厚度。 [0010] The apparatus further comprises a photoresist coating thickness detector provided in the bottom surface of the head body, for measuring the thickness of thin film formed on the substrate.

[0011]所述厚度检测器为激光感测器。 The [0011] thickness detector is a laser sensor.

[0012]所述光阻涂布装置还包括控制机构,所述厚度检测器将量测结果实时反馈给所述控制机构,当在基板表面上形成的薄膜的厚度达到预定范围时,所述控制机构控制所述数个吐胶喷嘴停止吐胶。 [0012] The photoresist coating apparatus further includes a control means of the thickness detector the real-time feedback the measurement result to the control means, when the thickness of the film formed on the substrate surface reaches the predetermined range, the control means for controlling the plurality of jetting nozzles gum rubber stop spouting.

[0013]本发明还提供一种光阻涂布方法,包括如下步骤: [0013] The present invention also provides a resist coating process, comprising the steps of:

[0014]步骤1、提供光阻涂布装置及待涂布的基板,将所述基板放置于承载台上,并将光阻涂布装置与所述基板进行对位; [0014] Step 1, a resist coating device and the substrate to be coated, the carrier substrate is placed on a table, and means for alignment photoresist coating to the substrate;

[0015]所述光阻涂布装置包括涂布喷头;所述涂布喷头包括喷头本体、及阵列排布于所述喷头本体底面上的数个针状的吐胶喷嘴;所述喷头本体内容纳有光阻胶,对位后,所述数个吐胶喷嘴对应的位于所述基板的正上方; [0015] The photoresist coating apparatus comprising a coating head; the coating head comprises a head body, and arranged in an array on the bottom surface of the body of the head a number of needle-like discharge nozzle gum; content of the spray head body gum photoresist is housed, after bit, the number of discharge directly above the glue nozzles positioned corresponding to the substrate;

[0016]调整喷头本体与所述基板之间的距离; [0016] adjusting the distance between the nozzle body and the substrate;

[0017]步骤2、数个吐胶喷嘴同时从竖直方向上向水平放置的基板进行吐胶,在重力以及表面张力作用下光阻胶在基板的表面上自然流平而形成薄膜,通过吐胶喷嘴不断吐胶而使薄膜的厚度增加; [0017] Step 2, a plurality of adhesive discharge nozzle placed simultaneously from a vertical direction to a horizontal spit plastic substrate, gravity and surface tension on the surface of the substrate glue resist natural leveling film is formed by spouting continuously jetting the glue nozzles glue film thickness increases;

[0018]步骤3、当在基板表面上形成的薄膜的厚度达到预定范围时,控制数个吐胶喷嘴停止吐胶,得到基板表面上的光阻层,将喷头本体向上移动以远离所述基板,从而完成光阻涂布。 [0018] Step 3, when the thickness of the film formed on the substrate surface reaches the predetermined range, a plurality of discharge control to stop spouting nozzle gum gel, to give a photoresist layer on the substrate surface, the head body moves upward away from the substrate , thereby completing the photoresist coating.

[0019]所述基板为玻璃基板,所述步骤3得到的具有光阻层的基板用于形成液晶显示面板的彩膜基板。 [0019] The substrate is a glass substrate, said substrate having a photoresist layer for forming the step 3 of the color filter substrate of the liquid crystal display panel.

[0020]所述光阻涂布喷头还包括设于所述喷头本体底面上的厚度检测器,用于量测在所述基板上形成薄膜的厚度。 [0020] The head further comprises a photoresist coating provided on the bottom surface of the head thickness detector body, for measuring the thickness of thin film formed on the substrate.

[0021 ]所述厚度检测器为激光感测器。 The [0021] thickness detector is a laser sensor.

[0022]所述光阻涂布装置还包括控制机构,所述厚度检测器将量测结果实时反馈给所述控制机构,当在基板表面上形成的薄膜的厚度达到预定范围时,所述步骤3中,所述控制机构控制所述数个吐胶喷嘴停止吐胶。 [0022] The photoresist coating apparatus further includes a control means of the thickness detector the real-time feedback the measurement result to the control means, when the thickness of the film formed on the substrate surface reaches the predetermined range, the step of 3, the control means controlling the plurality of jetting nozzles gum rubber stop spouting.

[0023]通过所述控制机构控制所述喷头本体的移动,以控制所述喷头本体与所述基板之间的距离。 [0023] By said control means controls movement of the nozzle body to control the distance between the head body and the substrate.

[0024]本发明的有益效果:本发明提供的一种光阻涂布装置,涂布喷头包括喷头本体、及紧密地阵列排布于所述喷头本体底面上的数个针状的吐胶喷嘴;使用时,数个吐胶喷嘴同时从竖直方向上向水平放置的基板进行吐胶,从而对基板进行垂直整面涂胶,在保证吐胶均匀性以及膜厚稳定性的情况下,能够大大降低光阻涂布制程的生产时间;本发明提供的一种光阻涂布方法,采用垂直整面吐胶方式进行,通过涂布喷头上设置的密集排布的针状的吐胶喷嘴向基板表面上吐胶,此时,在重力以及表面张力作用下光阻胶会在基板表面自然流平形成薄膜,随后通过不断补胶而垂直牵引薄膜生长,当在基板表面上形成的薄膜的厚度达到预定范围时,控制数个吐胶喷嘴停止吐胶,完成垂直整面吐胶动作;该光阻涂布方法,相比于现有的水平涂布方式的光阻涂布方法,在 [0024] Advantageous effects of the present invention: one photoresist coating apparatus provided by the present invention, the coating head comprising a head body, and closely arranged in an array on the bottom surface of the body of the head a number of needle-like discharge nozzle gum ; in use, a plurality of adhesive discharge nozzle placed simultaneously from a vertical direction to a horizontal spit plastic substrate, thereby coating the entire surface of the substrate vertically, in the case where the glue spit ensure uniformity and stability of the film thickness, can be resist coating process greatly reduces the production time; one light-blocking coating method provided by the invention, the entire surface of the vertical glue spit manner, densely packed needles coated by a glue nozzle jetting nozzles provided jetting adhesive on the substrate surface, then, under gravity and surface tension will resist natural gum leveling film is formed on the surface of the substrate, followed by continuously pulling up the vertical glue film growth, when the thickness of the film formed on the substrate surface upon reaching the predetermined range, a plurality of discharge control to stop spouting nozzle gum gum, gum discharge the entire surface to complete the operation of the vertical; the photoresist coating method, the coating method in comparison to conventional resist coating method is horizontal, the 证吐胶均匀性以及膜厚稳定性的情况下,大大减少涂布时间,从而提高了产能。 Plastic card case where the discharge stability and the film thickness uniformity, greatly reducing coating time, thereby improving productivity.

附图说明 BRIEF DESCRIPTION

[0025]下面结合附图,通过对本发明的具体实施方式详细描述,将使本发明的技术方案及其他有益效果显而易见。 [0025] below with reference to the accompanying drawings, by way of specific embodiments of the present invention are described in detail, the present invention will make the technical solution and other beneficial effects become apparent.

[0026] 附图中, [0026] In the drawings,

[0027]图1-3为现有的光阻涂布方法的示意图; [0027] FIG. 1-3 is a conventional resist coating method schematic;

[0028]图4为本发明的光阻涂布装置的涂布喷头的立体结构示意图; Dimensional structure of the coating head photoresist coating apparatus [0028] FIG. 4 is a schematic view of the invention;

[0029]图5为本发明的光阻涂布方法的流程示意图; [0029] FIG. 5 photoresist coating process of the present invention, a schematic view of the method;

[0030]图6为本发明的光阻涂布方法的步骤2的示意图; Step schematic photoresist coating process [0030] FIG. 6 of the present invention, 2;

[0031 ]图7为本发明的光阻涂布方法的步骤3的示意图。 3 is a schematic view of the step of resist coating process [0031] FIG. 7 of the present invention.

具体实施方式 detailed description

[0032]为更进一步阐述本发明所采取的技术手段及其效果,以下结合本发明的优选实施例及其附图进行详细描述。 [0032] To further elaborate the technical means adopted and effects of the present invention, the following in connection with preferred embodiments and embodiment of the present invention is described in detail with the accompanying drawings.

[0033]请参阅图4,本发明一种光阻涂布装置,用于在基板10上涂布光阻膜层,包括涂布喷头;所述涂布喷头包括喷头本体50、及紧密地阵列排布于所述喷头本体50底面上的数个针状的吐胶喷嘴51; [0033] Referring to FIG 4, the present invention provides a resist coating apparatus for coating photoresist film on the substrate 10, including a coating head; the coating head comprises a head body 50, and an array of closely a plurality of needles arranged in the bottom surface of the head body 50 of the discharge nozzle 51 of plastic;

[0034]所述喷头本体50用于容纳光阻胶,使用时,数个吐胶喷嘴51同时从竖直方向上向水平放置的基板10进行吐胶,在重力以及表面张力作用下光阻胶在基板10的表面上自然流平而形成薄膜,通过吐胶喷嘴51不断吐胶而使薄膜的厚度增加。 [0034] The head body 50 for receiving glue resist, in use, a plurality of jetting nozzle 51 while the glue placed in the horizontal direction from the vertical substrate 10 spit gum, gum resist gravity and surface tension on the surface of the substrate 10 to form a natural leveling film, adhesive discharge nozzle 51 is increased by continuously spouting the thickness of the film adhesive.

[0035]具体的,所述光阻涂布装置还包括设于所述喷头本体50底面上的厚度检测器52,用于量测在所述基板10上形成薄膜的厚度。 [0035] Specifically, the thickness of the photoresist coating apparatus further comprises a detector 50 disposed on the bottom surface of the head body 52, for forming a thin film thickness measurement on the substrate 10.

[0036]具体的,所述厚度检测器52为激光感测器。 [0036] Specifically, the thickness detector 52 is a laser sensor.

[0037]具体的,所述光阻涂布装置还包括控制机构,所述厚度检测器52将量测结果实时反馈给所述控制机构,当在基板10表面上形成的薄膜的厚度达到预定范围时,所述控制机构控制所述数个吐胶喷嘴51停止吐胶。 [0037] Specifically, the photoresist coating apparatus further comprises control means 52 the measurement result of the thickness detector real-time feedback to the control means, when the thickness of the film formed on the surface of the substrate 10 reaches a predetermined range when the control means 51 stops controlling the plurality of jetting nozzles glue spit gum.

[0038]请参阅图5,本发明还提供一种光阻涂布方法,包括如下步骤: [0038] Referring to FIG 5, the present invention also provides a resist coating process, comprising the steps of:

[0039]步骤1、提供光阻涂布装置及待涂布的基板10,将所述基板10放置于承载台20上,并将光阻涂布装置与所述基板10进行对位; [0039] Step 1, a resist coating device and the substrate to be coated 10, the substrate 10 is placed on the supporting table 20, and the photoresist coating apparatus 10 of the substrate position;

[0040] 所述光阻涂布装置包括涂布喷头;所述涂布喷头包括喷头本体50、及紧密地阵列排布于所述喷头本体50底面上的数个针状的吐胶喷嘴51;所述喷头本体50内容纳有光阻胶,对位后,所述数个吐胶喷嘴51对应的位于所述基板10的正上方; [0040] The photoresist coating apparatus comprising a coating head; the coating head comprises a head body 50, and an array of closely arranged to the bottom surface of the head body 50 a number of adhesive discharge nozzle 51 of the needle; the head body 50 is accommodated content photoresist glue, after bit, said plurality of adhesive discharge nozzle 51 corresponding to the 10 located directly above the substrate;

[0041]调整喷头本体50与所述基板10之间的距离; [0041] The head body 50 to adjust the distance between the substrate 10 and the;

[0042]具体的,所述光阻涂布喷头还包括设于所述喷头本体50底面上的厚度检测器52,用于量测在所述基板10上形成薄膜的厚度。 [0042] Specifically, the photoresist coating further comprises a spray head provided in the head body 50 thickness of the bottom surface of the detector 52, for measuring the thickness of the film formed on the substrate 10.

[0043]具体的,所述厚度检测器52为激光感测器。 [0043] Specifically, the thickness detector 52 is a laser sensor.

[0044]具体的,所述光阻涂布装置还包括控制机构;该步骤1中,通过控制机构调整喷头本体50与所述基板10之间的距离。 [0044] Specifically, the photoresist coating apparatus further comprising a control means; step 1, to adjust the distance between the head body 50 and the substrate 10 by a control mechanism.

[0045]步骤2、如图6所示,数个吐胶喷嘴51同时从竖直方向上向水平放置的基板10进行吐胶,在重力以及表面张力作用下光阻胶在基板10的表面上自然流平而形成薄膜,通过吐胶喷嘴51不断吐胶而使薄膜的厚度增加; [0045] Step 2, as shown, a plurality of discharge nozzles 651 in FIG glue placed simultaneously from a vertical direction to a horizontal spit plastic substrate 10, the photoresist on the surface of the substrate 10 in a glue under gravity and surface tension NATURAL leveling film is formed by continuously spouting the discharge nozzle 51 rubber gum increase the thickness of the film;

[0046]具体的,该步骤2中,所述厚度检测器52将量测结果实时反馈给所述控制机构,当在基板10表面上形成的薄膜的厚度未达到预定范围时,所述控制机构控制所述数个吐胶喷嘴51继续不断吐胶而使薄膜的厚度增加; [0046] Specifically, in the step 2, the measurement result of the 52 thickness detector real-time feedback to the control means, when the thickness of the film formed on the surface of the substrate 10 does not reach the predetermined range, the control means controlling the plurality of jetting nozzles 51 continue jetting gum gum increase the thickness of the film;

[0047]步骤3、如图7所示,当在基板10表面上形成的薄膜的厚度达到预定范围时,控制数个吐胶喷嘴51停止吐胶,得到基板10表面上的光阻层11,将喷头本体11向上移动以远离所述基板10,从而完成光阻涂布; [0047] Step 3, shown in Figure 7, when the thickness of the film formed on the surface of the substrate 10 reaches the predetermined range, controlling the number of discharge nozzle 51 stops jetting adhesive glue, to give a photoresist layer on a surface of the substrate 1011, the head body 11 is moved upward away from the substrate 10, thereby completing the photoresist coating;

[0048]具体的,所述步骤3中,所述控制机构根据所述厚度检测器52的量测结果,判断在基板10表面上形成的薄膜的厚度达到预定范围时,所述控制机构控制所述数个吐胶喷嘴51停止吐胶。 When [0048] Specifically, the step 3, the control means in accordance with the measurement result of the thickness detector 52 determines the thickness of the film formed on the surface of the substrate 10 reaches the predetermined range, the control means controlling the said plurality of discharge nozzle 51 stops jetting adhesive glue.

[0049]具体的,所述基板10为玻璃基板,所述步骤3得到的具有光阻层11的基板10用于形成液晶显示面板的彩膜基板。 [0049] Specifically, the substrate 10 is a glass substrate, the substrate having the photoresist layer 11 obtained in Step 3 for forming the color filter substrate 10 liquid crystal display panel.

[0050]具体的,通过所述控制机构控制所述喷头本体50的移动,以控制所述喷头本体50与所述基板10之间的距离。 [0050] Specifically, by the control means controlling the movement of the head body 50 so as to control the distance between the head body 10 and the substrate 50.

[0051]综上所述,本发明提供的一种光阻涂布装置,包括涂布喷头,所述涂布喷头包括喷头本体、及紧密地阵列排布于所述喷头本体底面上的数个针状的吐胶喷嘴;使用时,数个吐胶喷嘴同时从竖直方向上向水平放置的基板进行吐胶,从而对基板进行垂直整面涂胶,在保证吐胶均匀性以及膜厚稳定性的情况下,能够大大降低光阻涂布制程的生产时间;本发明提供的一种光阻涂布方法,采用垂直整面吐胶方式进行,通过涂布喷头上设置的密集排布的针状的吐胶喷嘴向基板表面上吐胶,此时,在重力以及表面张力作用下光阻胶会在基板表面自然流平形成薄膜,随后通过不断补胶而垂直牵引薄膜生长,当在基板表面上形成的薄膜的厚度达到预定范围时,控制数个吐胶喷嘴停止吐胶,完成垂直整面吐胶动作;该光阻涂布方法,相比于现有的水平涂布方法,在保 [0051] In summary a photoresist coating apparatus provided by the present invention, comprising a coating head, the coating head comprises a head body, and closely arranged in an array on the bottom surface of the body of the head a number of needle-like discharge nozzle gum; use, a plurality of discharge nozzles simultaneously gum placed in the horizontal direction from the vertical spit plastic substrate, thereby coating the entire surface of the substrate vertically, and the film thickness uniformity to ensure stable jetting gum in the case of, can greatly reduce the resist coating process of production time; one light-blocking coating method provided by the invention, the entire surface of the vertical glue spit manner, by applying a nozzle disposed densely packed pins gum-like discharge nozzle to discharge glue on the substrate surface, then, under gravity and surface tension will resist natural gum leveling film is formed on the substrate surface, followed by continuously pulling up the vertical glue film growth, when the surface of the substrate when the thickness of the film formed on the predetermined range, a plurality of discharge control to stop spouting nozzle gum gum, gum discharge the entire surface to complete the operation of the vertical; the photoresist coating process, compared to the prior level of coating method, Paul 吐胶均匀性以及膜厚稳定性的情况下,大大减少涂布时间,从而提尚了广能。 Glue spit case where the film thickness uniformity and stability, greatly reducing coating time, thereby improving a wide energy still.

[0052]以上所述,对于本领域的普通技术人员来说,可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形,而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。 [0052] The above, those of ordinary skill in the art, can make various corresponding modifications and other variations according to the technical idea and the technical solutions of the present invention, and all such changes and modifications shall belong to the present invention is attached the scope of the claims.

Claims (10)

  1. 1.一种光阻涂布装置,用于在基板(10)上涂布光阻膜层,包括涂布喷头,其特征在于,所述涂布喷头包括喷头本体(50)、及阵列排布于所述喷头本体(50)底面上的数个针状的吐胶喷嘴(51); 所述喷头本体(50)用于容纳光阻胶,使用时,数个吐胶喷嘴(51)同时从竖直方向上向水平放置的基板(10)进行吐胶,在重力以及表面张力作用下光阻胶在基板(10)的表面上自然流平而形成薄膜,通过吐胶喷嘴(51)不断吐胶而使薄膜的厚度增加。 A photoresist coating apparatus for coating photoresist film on the substrate (10), comprising a coating nozzle, wherein the coating head comprises a head body (50), and arranged in an array to the head body (50) a plurality of needle-shaped bottom surface of the adhesive discharge nozzle (51); said head body (50) for receiving glue resist, in use, a plurality of adhesive discharge nozzle (51) simultaneously from disposed in the vertical direction to horizontal base plate (10) for discharge of plastic, natural rubber leveling photoresist film is formed on a surface of the substrate (10) by gravity and surface tension, the continuous discharge by a discharge nozzle glue (51) increasing the thickness of the film adhesive.
  2. 2.如权利要求1所述的光阻涂布装置,其特征在于,所述光阻涂布装置还包括设于所述喷头本体(50)底面上的厚度检测器(52),用于量测在所述基板(10)上形成薄膜的厚度。 2. The resist coating apparatus according to claim 1, wherein said apparatus further comprises a photoresist coating disposed on said head body (50) thickness detector (52) of the bottom surface, the amount of the measured thickness of the film formed on the substrate (10).
  3. 3.如权利要求2所述的光阻涂布装置,其特征在于,所述厚度检测器(52)为激光感测器。 Resist coating apparatus according to claim 2, wherein the thickness detector (52) is a laser sensor.
  4. 4.如权利要求2所述的光阻涂布装置,其特征在于,所述光阻涂布装置还包括控制机构,所述厚度检测器(52)将量测结果实时反馈给所述控制机构,当在基板(10)表面上形成的薄膜的厚度达到预定范围时,所述控制机构控制所述数个吐胶喷嘴(51)停止吐胶。 4. The resist coating apparatus according to claim 2, characterized in that said photoresist coating apparatus further comprises a control means, a thickness detector (52) the measurement results to the real-time feedback control means , when the substrate (10) thickness of the film formed on the surface reaches a predetermined range, said control means controls said plurality of adhesive discharge nozzle (51) to stop spouting gum.
  5. 5.一种光阻涂布方法,其特征在于,包括如下步骤: 步骤1、提供光阻涂布装置及待涂布的基板(10),将所述基板(10)放置于承载台(20)上,并将光阻涂布装置与所述基板(10)进行对位; 所述光阻涂布装置包括涂布喷头;所述涂布喷头包括喷头本体(50)、及阵列排布于所述喷头本体(50)底面上的数个针状的吐胶喷嘴(51);所述喷头本体(50)内容纳有光阻胶,对位后,所述数个吐胶喷嘴(51)对应的位于所述基板(10)的正上方; 调整喷头本体(50)与所述基板(10)之间的距离; 步骤2、数个吐胶喷嘴(51)同时从竖直方向上向水平放置的基板(10)进行吐胶,在重力以及表面张力作用下光阻胶在基板(10)的表面上自然流平而形成薄膜,通过吐胶喷嘴(51)不断吐胶而使薄膜的厚度增加; 步骤3、当在基板(10)表面上形成的薄膜的厚度达到预定范围时,控制数个吐胶喷嘴(51)停止吐胶,得到基板 A photoresist coating method, characterized by comprising the following steps: Step 1, a resist coating device and the substrate to be (10) coated, said substrate (10) is placed on the supporting table (20 on), and the resist coating device and the substrate (10) for alignment; the photoresist coating apparatus comprising a coating head; the coating head comprises a head body (50), and arranged in an array on said head body (50) a plurality of needle-shaped bottom surface of the adhesive discharge nozzle (51); said head body (50) houses a plastic resist, after bit, said plurality of adhesive discharge nozzle (51) positioned directly above the corresponding substrate (10); a head body distance adjustment (50) of the substrate (10) between; step 2, a plurality of adhesive discharge nozzle (51) simultaneously in the horizontal direction from the vertical placing a substrate (10) for discharge of plastic, gravity and surface tension on a surface of a leveling photoresist natural gum in the substrate (10) to form a thin film, by glue jetting nozzle (51) continues to discharge the plastic film has a thickness increase; step 3, when the substrate (10) thickness of the film formed on the surface of the predetermined range, controls several glue nozzles discharge (51) to stop the discharge of plastic, to obtain a substrate (10)表面上的光阻层(11),将喷头本体(11)向上移动以远离所述基板(10),从而完成光阻涂布。 (10) the photoresist layer (11) on a surface of the head body (11) moves upwardly away from the base plate (10), thereby completing the photoresist coating.
  6. 6.如权利要求5所示的光阻涂布方法,其特征在于,所述基板(10)为玻璃基板,所述步骤3得到的具有光阻层(11)的基板(10)用于形成液晶显示面板的彩膜基板。 6. A photoresist coating method shown in claim 5, characterized in that the base plate (10) is a glass substrate, a substrate having a photoresist layer (11) obtained in the step 3 (10) for forming the color filter substrate of the liquid crystal display panel.
  7. 7.如权利要求5所示的光阻涂布方法,其特征在于,所述光阻涂布喷头还包括设于所述喷头本体(50)底面上的厚度检测器(52),用于量测在所述基板(10)上形成薄膜的厚度。 7. A photoresist coating method shown in claim 5, wherein said head further comprises a photoresist coating disposed on said head body (50) thickness detector (52) of the bottom surface, the amount of the measured thickness of the film formed on the substrate (10).
  8. 8.如权利要求7所示的光阻涂布方法,其特征在于,所述厚度检测器(52)为激光感测器。 8. A photoresist coating method shown in claim 7, wherein the thickness detector (52) is a laser sensor.
  9. 9.如权利要求7所示的光阻涂布方法,其特征在于,所述光阻涂布装置还包括控制机构,所述厚度检测器(52)将量测结果实时反馈给所述控制机构,当在基板(10)表面上形成的薄膜的厚度达到预定范围时,所述步骤3中,所述控制机构控制所述数个吐胶喷嘴(51)停止吐胶。 9. A photoresist coating method shown in claim 7, characterized in that said photoresist coating apparatus further comprises a control means, a thickness detector (52) the measurement results to the real-time feedback control means , when the substrate (10) thickness of the film formed on the surface of the predetermined range, the step 3, the control means controls the plurality of adhesive discharge nozzle (51) to stop spouting gum.
  10. 10.如权利要求9所示的光阻涂布方法,其特征在于,通过所述控制机构控制所述喷头本体(50)的移动,以控制所述喷头本体(50)与所述基板(10)之间的距离。 10. The photoresist coating method shown in claim 9, wherein said control means controls movement by the head body (50) to control said head body (50) and the substrate (10 )the distance between.
CN 201610033569 2016-01-18 2016-01-18 Photoresist coating device and phtoresist coating method CN105457843A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201610033569 CN105457843A (en) 2016-01-18 2016-01-18 Photoresist coating device and phtoresist coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201610033569 CN105457843A (en) 2016-01-18 2016-01-18 Photoresist coating device and phtoresist coating method

Publications (1)

Publication Number Publication Date
CN105457843A true true CN105457843A (en) 2016-04-06

Family

ID=55596254

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201610033569 CN105457843A (en) 2016-01-18 2016-01-18 Photoresist coating device and phtoresist coating method

Country Status (1)

Country Link
CN (1) CN105457843A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101084119A (en) * 2004-09-20 2007-12-05 富士胶卷迪马蒂克斯股份有限公司 System and methods for fluid drop ejection
US20080226812A1 (en) * 2006-05-26 2008-09-18 Yung Ming Chen Stent coating apparatus and method
US20090042113A1 (en) * 2007-08-10 2009-02-12 Au Optronics Corporation Manufacturing method of filter and color filter
CN102414863A (en) * 2009-05-01 2012-04-11 卡帝瓦公司 Method and apparatus for organic vapor printing
CN102540582A (en) * 2012-02-09 2012-07-04 中华映管股份有限公司 Gluing component applicable to liquid crystal display panel

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101084119A (en) * 2004-09-20 2007-12-05 富士胶卷迪马蒂克斯股份有限公司 System and methods for fluid drop ejection
US20080226812A1 (en) * 2006-05-26 2008-09-18 Yung Ming Chen Stent coating apparatus and method
US20090042113A1 (en) * 2007-08-10 2009-02-12 Au Optronics Corporation Manufacturing method of filter and color filter
CN102414863A (en) * 2009-05-01 2012-04-11 卡帝瓦公司 Method and apparatus for organic vapor printing
CN102540582A (en) * 2012-02-09 2012-07-04 中华映管股份有限公司 Gluing component applicable to liquid crystal display panel

Similar Documents

Publication Publication Date Title
US20050179853A1 (en) Liquid crystal display device, color filter substrate and protruding structure, and manufacturing method thereof
JP2000122071A (en) Liquid crystal display element and production of liquid crystal display element
JP2000338501A (en) Production of liquid crystal display panel
JP2003121635A (en) Color filter substrate, manufacturing method therefor, liquid crystal device and electronic instrument
US20040246420A1 (en) Display device and manufacturing method thereof
US20040263766A1 (en) Liquid crystal display device and method of fabricating the same
US20040125328A1 (en) Method of fabricating liquid crystal display device
CN1508594A (en) Distributor of liquid crystal display panel and method for controlling gap between baseboard and nozzle
CN103064209A (en) Method for preparing liquid crystal display panel
US20030147040A1 (en) Method of fabricating liquid crystal display device
JP2008158169A (en) Liquid crystal display panel and method for manufacturing the same
CN101498858A (en) Production method of colorful optical filtering substrate and LCD panel
CN1530706A (en) Masking external frame structure of liquid-crystal displaying panel and producing method thereof
CN103325732A (en) COA substrate and manufacturing method and display device of COA substrate
KR100688958B1 (en) Liquid Crystal Panel using for Liquid Crystal Display Device and method of manufacturing the same
JP2001356312A (en) Manufacturing method of liquid crystal display element and uv irradiation device used for the manufacturing method
US20060061727A1 (en) Method of manufacturing liquid crystal display apparatus and liquid crystal dripping apparatus
CN102081250A (en) Manufacturing method of display panel and display device
JP2002350863A (en) Optoelectronic device, manufacturing method therefor and electronic device
CN102221758A (en) Alignment method for hybrid vertical photoalignment liquid crystal display device
CN101661194A (en) Printing plate and method of printing an alignment film using the same
US20040257517A1 (en) Liquid crystal display panel and fabricating method and apparatus thereof
CN1439460A (en) Liquid-crystal dropper and method, liquid-crystal display panel producing devices
JP2002072222A (en) Liquid crystal display device and method of manufacturing the same
JP2011145534A (en) Display device with front window and method for manufacturing the same

Legal Events

Date Code Title Description
C06 Publication
C10 Entry into substantive examination