CN105451425A - Low-temperature plasma generation device in honeycomb structure - Google Patents
Low-temperature plasma generation device in honeycomb structure Download PDFInfo
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- CN105451425A CN105451425A CN201511014560.3A CN201511014560A CN105451425A CN 105451425 A CN105451425 A CN 105451425A CN 201511014560 A CN201511014560 A CN 201511014560A CN 105451425 A CN105451425 A CN 105451425A
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
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Abstract
The invention relates to a discharge plasma generation technology, in particular to a low-temperature plasma generation device in a honeycomb structure. The structures of a plasma generator and a discharge electrode are improved, so that discharge is uniform; and the discharge efficiency is improved. According to the specific technical scheme, the low-temperature plasma generation device in the honeycomb structure comprises a base frame, a plasma reaction channel, a cathode frame and a plurality of insulator; the plasma reaction channel is supported by the base frame; the cathode frame is located at two ends of the plasma reaction channel; the plurality of insulators are used for supporting the cathode frame; the plasma reaction channel comprises a plurality of hollow tubular anodes and cathodes; the plurality of hollow tubular anodes are connected with one another in a cling manner; each cathode is located in each anode; the anodes are connected with the base frame; each cathode comprises a cathode line and a plurality of discharge intensifiers; the plurality of discharge intensifiers are arranged on the cathode lines; the end parts of the cathode lines are connected with the cathode frame; and the cathode lines are suspended at the centers of the anodes.
Description
Technical field
The present invention relates to discharge plasma generation technology, be specifically related to a kind of honeycomb low temperature plasma generating means.
Background technology
Low temperature plasma is widely used at field of Environment Protections such as improvement organic pollutions, along with development and the technological break-through of nanosecond class pulse generator for EDM, directly adopts submicrosecond to be achieved to the technology of the high pressure pulse discharge generation plasma of nanosecond order.Nanosecond class pulse generator for EDM changes the not high problem of traditional electrical corona efficiency, by the improvement of plasma generator structure, adds the efficiency using the electrode of special construction effectively can improve corona discharge generation plasma.The plasma producing apparatus of alveolate texture is under identical volume, space utilization maximizes, smoke treatment flow is maximum simultaneously, but the discharge electrode of this structure generator there will be the inconsistent problem of the distance of anode, so easy guiding discharge is uneven, there is plasma and generate weak effect, plasma active space is little, is only limitted to the problem near corona discharge electrode.In order to the technical problem that the plasma producing apparatus solving above-mentioned alveolate texture exists, the invention provides a solution.
Summary of the invention
There is the uneven problem of electric discharge mainly for existing plasma generator in the present invention, has invented a kind of honeycomb low temperature plasma generating means, improved the structure of plasma generator and discharge electrode, makes electric discharge even, improve discharging efficiency.
Above-mentioned technical problem of the present invention is implemented by the following technical programs: a kind of honeycomb low temperature plasma generating means, comprise pedestal, the plasma reaction passage supported by pedestal, the cathode frame being positioned at plasma reaction passage two ends, for supporting some insulators of cathode frame; Described plasma reaction passage comprise some hollow tubulars near being connected anode, be positioned at the negative electrode of each anode, anode is connected with pedestal ground connection; Described negative electrode comprises cathode line, the some electric discharge boosters be arranged in cathode line, and the end of cathode line is connected to cathode frame, then cathode line is suspended on anode central authorities.
As preferably, described anode is hollow regular hexagon tubulose, then some anodes are cellular near being connected to form.
Above-mentioned plasma reactor adopts alveolate texture, i.e. tight between anode and anode, and this structure is under same volume, and space utilization maximizes, and smoke treatment flow is maximum, is also conducive to air and generates plasma with electric discharge booster haptoreaction; The large I of above-mentioned plasma reaction passage adjusts according to the output specification of nanosecond pulse power supply, increases the size of passage, can adapt to the nanosecond pulse power supply that voltage pulse output is higher.
As preferably, described electric discharge booster is regular hexagon sheet and with engraved structure, described engraved structure is circularly and evenly distributed centered by cathode line.
Above-mentioned electric discharge booster, adopt regular hexagon with the sheet metal of triangle engraved structure or strip engraved structure, identical with the anode shape of alveolate texture, all limits of orthohexagonal electric discharge booster are consistent to anode distance with angle, such structure is exactly to eliminate the uneven problem of electric discharge that alveolate texture brings, improving the efficiency of plasma reaction.In actual applications, the engraved structure of described electric discharge booster can reduce dust stratification situation, reduces the discharge instability that dust covering electric discharge booster causes, reduces the equipment cleaning time.
Number and the size of above-mentioned electric discharge booster are all adjustable, and increase number or increased in size can increase smoke contacts area, improve corona discharge efficiency, increase plasma generation efficiency.
As preferably, described cathode frame is positioned at above and below plasma reaction passage, is formed by connecting by some rod member transverse and longitudinals; The upper end of cathode line is welded on the rod member of the cathode frame being positioned at top; The rod member of the cathode frame below being positioned at is provided with through hole, then the lower end of cathode line is passed through hole but does not weld, the cathode line distortion offset from center position that avoiding expands with heat and contract with cold causes, thus causes electric discharge uneven.
As preferably, described insulator is fixed on the end of cathode frame, and insulator is arranged on insulator chamber inside, and insulator chamber is fixed on pedestal.After the voltage input end of insulator chamber connects nanosecond high-voltage pulse power source, around cathode line, form corona region, being discharged by electric discharge booster produces plasma.
As preferably, in described insulator chamber, be also provided with the hot air sweeping device with heating function, prevent porcelain vase from condensing.
In sum, the present invention compared with prior art tool have the following advantages:
The low temperature plasma generating means of alveolate texture provided by the invention, under same volume, the space utilization of the reactor of alveolate texture is larger than other structures, and the increase of smoke treatment flow is conducive to the haptoreaction of gas and electric discharge booster; Electric discharge booster employing regular hexagon of the present invention, with the sheet metal of engraved structure, effectively improves the electric discharge uniformity, eliminates dust stratification pollution problem, improve the efficiency of discharge effect and plasma generation.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
Fig. 2 is vertical view of the present invention;
Fig. 3 is the vertical view of plasma reaction passage of the present invention;
Fig. 4 is the structure chart of individual plasma reaction channel of the present invention;
Fig. 5 is the vertical view of individual plasma reaction channel of the present invention.
Number in the figure is: 1, pedestal; 2, plasma reaction passage; 21, anode; 22, cathode line; 23, discharge booster; 24, engraved structure.
Embodiment
Below in conjunction with drawings and Examples, the present invention is further described.
Embodiment 1:
As shown in Figure 1, 2, a kind of honeycomb low temperature plasma generating means, comprising pedestal 1, the plasma reaction passage 2 supported by pedestal 1, being positioned at cathode frame 3 above and below plasma reaction passage 2, for supporting four insulators 4 of cathode frame 3.
As shown in Fig. 3,4,5, described plasma reaction passage 2 is made up of multiple anode 21 and negative electrode, wherein, each anode 21 is hollow regular hexagon tubulose, then the anode of multiple hollow regular hexagon tubulose is near constituting cellular plasma reaction passage 2; Anode 21 is connected with pedestal 1 ground connection.
Each anode 21 central authorities arranges a negative electrode, and each negative electrode is made up of cathode line 22 and electric discharge booster 23; Wherein, each electric discharge booster 23 is that regular hexagon is Metal Flake and with six triangle engraved structures 24, these orthohexagonal six limits of six triangle engraved structure 24 one_to_one corresponding, is circularly and evenly distributed centered by cathode line 22.Or each electric discharge booster 23 is that regular hexagon is Metal Flake and with six strip engraved structures 24, these orthohexagonal six angles of six strip engraved structure 24 one_to_one corresponding, to be circularly and evenly distributed centered by cathode line 22.This structure makes all edges of electric discharge booster 23, angle equal to the distance of anode 21, effectively improves the technical problem that alveolate texture guiding discharge is in the past uneven, improves the efficiency of plasma reaction.
Described cathode frame 3 is positioned at above and below plasma reaction passage 2, is formed by connecting by many rod member transverse and longitudinals; The upper end of cathode line 22 is welded on the rod member of the cathode frame 3 being positioned at top; The rod member of the cathode frame 3 below being positioned at is provided with through hole, then the lower end of cathode line 22 is through through hole, but does not weld, the cathode line distortion offset from center position that avoiding expands with heat and contract with cold causes, thus causes electric discharge uneven.
Described four insulators 4 are individually fixed in four ends of cathode frame, and four insulators 4 are arranged on insulator chamber inside respectively, and insulator chamber is fixed on pedestal 1; Also be provided with the hot air sweeping device with heating function in insulator chamber, prevent porcelain vase from condensing.
During real work, after the voltage input end connection high-voltage pulse power source of insulator chamber, form corona region around the electric discharge booster 23 in cathode line 22, pass into gas from bottom, in corona region, electric discharge produces plasma, has finally discharged collection from top.
In actual applications, the engraved structure 24 of electric discharge booster 23 can reduce dust stratification situation, reduces the discharge instability that dust covering electric discharge booster causes, reduces the equipment cleaning time; Number and the size of electric discharge booster 23 are all adjustable, and increase number or increased in size can increase smoke contacts area, improve corona discharge efficiency, increase plasma generation efficiency.
The large I of plasma reaction passage 3 adjusts according to the output specification of nanosecond pulse power supply, increases the size of passage, can adapt to the nanosecond pulse power supply that voltage pulse output is higher;
Specific embodiment described in literary composition is only to the explanation for example of the present invention's spirit.Those skilled in the art can make various amendment or supplement or adopt similar mode to substitute to described specific embodiment, but can't depart from spirit of the present invention or surmount the scope that appended claims defines.
Claims (6)
1. a honeycomb low temperature plasma generating means, comprise pedestal (1), the plasma reaction passage (2) supported by pedestal, the cathode frame (3) being positioned at plasma reaction passage two ends, for supporting some insulators (4) of cathode frame;
Described plasma reaction passage comprise some hollow tubulars near being connected anode (21), be positioned at the negative electrode of each anode, anode is connected with pedestal ground connection;
Described negative electrode comprises cathode line (22), the some electric discharge boosters (23) be arranged in cathode line, and the end of cathode line is connected to cathode frame, then cathode line is suspended on anode central authorities.
2. honeycomb low temperature plasma generating means according to claim 1, is characterized in that, described anode is hollow regular hexagon tubulose, then some anodes are cellular near being connected to form.
3. honeycomb low temperature plasma generating means according to claim 1 and 2, is characterized in that, described electric discharge booster is regular hexagon sheet and with engraved structure (24), described engraved structure is circularly and evenly distributed centered by cathode line.
4. honeycomb low temperature plasma generating means according to claim 3, is characterized in that, described cathode frame is positioned at above and below plasma reaction passage, is formed by connecting by some rod member transverse and longitudinals; The upper end of cathode line is welded on the rod member of the cathode frame being positioned at top; The rod member of the cathode frame below being positioned at is provided with through hole, then the lower end of cathode line is through through hole.
5. the honeycomb low temperature plasma generating means according to claim 1 or 4, it is characterized in that, described insulator is fixed on the end of cathode frame, and insulator is arranged on insulator chamber inside, and insulator chamber is fixed on pedestal.
6. honeycomb low temperature plasma generating means according to claim 5, is characterized in that, be also provided with the hot air sweeping device with heating function in described insulator chamber.
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CN201511014560.3A CN105451425A (en) | 2015-12-31 | 2015-12-31 | Low-temperature plasma generation device in honeycomb structure |
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Cited By (6)
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CN105764226A (en) * | 2016-04-09 | 2016-07-13 | 嘉兴天盾环保科技有限公司 | Pt coating-equipped high throughput restraint-free corona ions generator |
CN106102293A (en) * | 2016-07-29 | 2016-11-09 | 中国北方发动机研究所(天津) | Parallel dielectric barrier discharge reactor |
CN106793442A (en) * | 2016-12-05 | 2017-05-31 | 张家港市艾尔环保工程有限公司 | Cellular corona discharge plasma generator |
CN108686837A (en) * | 2018-05-17 | 2018-10-23 | 广东本立环保技术有限公司 | Plasma electric field generator |
CN111617716A (en) * | 2020-06-09 | 2020-09-04 | 常州大学 | Metal honeycomb type plasma discharge reactor |
CN113925992A (en) * | 2021-11-04 | 2022-01-14 | 强固生物技术(上海)有限公司 | Plasma generating device |
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CN105764226A (en) * | 2016-04-09 | 2016-07-13 | 嘉兴天盾环保科技有限公司 | Pt coating-equipped high throughput restraint-free corona ions generator |
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CN106793442A (en) * | 2016-12-05 | 2017-05-31 | 张家港市艾尔环保工程有限公司 | Cellular corona discharge plasma generator |
CN108686837A (en) * | 2018-05-17 | 2018-10-23 | 广东本立环保技术有限公司 | Plasma electric field generator |
CN111617716A (en) * | 2020-06-09 | 2020-09-04 | 常州大学 | Metal honeycomb type plasma discharge reactor |
CN113925992A (en) * | 2021-11-04 | 2022-01-14 | 强固生物技术(上海)有限公司 | Plasma generating device |
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