CN105437050A - Metallographic grinding and polishing process - Google Patents

Metallographic grinding and polishing process Download PDF

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Publication number
CN105437050A
CN105437050A CN201510751777.6A CN201510751777A CN105437050A CN 105437050 A CN105437050 A CN 105437050A CN 201510751777 A CN201510751777 A CN 201510751777A CN 105437050 A CN105437050 A CN 105437050A
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CN
China
Prior art keywords
polishing
metallographic
metallographic specimen
specimen
electrolyte
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CN201510751777.6A
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Chinese (zh)
Inventor
程东华
程士弟
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Hexian Longsheng Precision Machinery Co Ltd
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Hexian Longsheng Precision Machinery Co Ltd
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Priority to CN201510751777.6A priority Critical patent/CN105437050A/en
Publication of CN105437050A publication Critical patent/CN105437050A/en
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/04Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B19/00Single-purpose machines or devices for particular grinding operations not covered by any other main group
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32Polishing; Etching

Abstract

The invention discloses a metallographic grinding and polishing process. The metallographic grinding and polishing process comprises the steps that (1) the surface of a metallographic specimen is cleaned; (2) the surface of the metallographic specimen is ground; (3) the metallographic specimen is polished; and (4) cleaning is conducted. The metallographic specimen is cleaned and polished through vibration of an ultrasonic washing unit, when the metallographic specimen is cleaned, liquid inside the ultrasonic washing unit is industrial pure water, diamond abrasive grains, polishing paste and glycerinum are put into the ultrasonic washing unit for cleaning, resources can be saved, and influence on the subsequent grinding and polishing process can be avoided; a rubber soft bottom is arranged at the bottom of the metallographic specimen, so that the surface is prevented from being scratched in the grinding process, the metallographic specimen is dried for many times, oxidation of easily oxidized metals can be prevented in the operation process, and it is ensured that the surface of the metallographic specimen is even in color and has no water spot; coating of antirust agents is avoided, and the retention time is long in a vacuum environment.

Description

A kind of metallographic abrasive polishing process
Technical field
The present invention relates to technical field of metallographic sample preparation, particularly a kind of metallographic abrasive polishing process.
Background technology
The making of metallographic specimen accounts for 2/3 of Metallographic Analysis total time, how to improve metallographic sample preparation efficiency tool and is of great significance.
Traditional metallographic sample preparation adopts manual grinding, efficiency is lower, sample after machinery, need ask through accurate flour milling, metallographic test personnel spread abrasive paper for metallograph on a glass, carry out 4-5 road by hand and grind, sand paper grade is more and more thinner, from (180#-) 240#-400#-600#-800# grinding successively, meticulous grind away need be increased to 1000# even 1200#, and often changes one sand paper, needs to clear up sample, table top simultaneously.Grind after operation completes, carry out rough polishing and finishing polish.Like this, a whole flow process of sample is got off and is about spent 0.5h to complete, and not only loses time and waste of manpower resource.
Existing metallographic abrasive polishing process is:
Sample preparation: powder (having another name called bakelite powder) is inlayed in utilization and steel samples to be seen is made metallographic sample by pointing machine.Inlay temperature one at 110 DEG C ~ 150 DEG C.
Grind away: utilize variable grain degree silicon carbide paper that metallographic sample is carried out grinding process, each polishing direction and previous polishing direction are at an angle of 90, previous polishing cut grinds off by each polishing, and the sand paper specification of finally polishing is 1500# silicon carbide paper, cut direction uniformity.
Polishing: after utilizing polishing cloth and polishing agent to polish on polishing machine, metallographic sample surface scratch is removed, and makes the smooth no marking of sample surfaces.Polishing agent one select diamond polishing cream or diamond grinding fluid.
Corrode: by the metallographic sample after polishing, put into aggressive agent and corrode, wash away aggressive agent with pure water after corroding a period of time, after drying up, can metallographic observation be carried out.
In whole technical process, not to metallographic sample metallographic antirust treatment, so in metallographic sample preparation process, especially after erosion, as easy as rolling off a logly produce stain at surface oxidation, affect the observation of metallographic structure.
And more or traditional mechanical polishing process is continued to use in the polishing of metallographic specimen, the normally high temperature pickling after oil removing of this glossing, many containing larger materials of murder by poisoning such as chromic acid, hydrofluoric acid, nitric acid in pickle, the Main Function of pickle is the fineness that scale removal improves metallic article, but high temperature pickling time is long, this not only makes production cost high, and the poisonous sour volatility included is large, very easily contaminated environment and etching apparatus.
Application number is the Chinese invention patent of CN200910204809.5, the invention discloses the process that a kind of metallographic specimen makes, comprise the steps: a) sawing sample rapid stock-removal: use and change the retired sample grinding machine of the spectrum of Grinding wheel disc mill into, with once can the quick grind away of Clamping apparatus for polishing specimen of a clamping 8-10 sample, manual grip, sample grinding machine carries out rapid stock-removal, and surface roughness, to Ra1.6-0.8um, reaches the requirement of accurate grinding; B) metallographic grind away; C) metallurgical polishing.Compared with prior art, the invention has the advantages that, it can carry out metallographic sample preparation work easily and quickly, both ensured sample quality, analyze quality, again cost-saved, raise the efficiency.
Application number is the Chinese invention patent of CN201110008675.7, a kind of preparation method for silicon steel metallographic sample.Preparation method is: after the sample preparation of silicon steel metallographic sample, polish with the silicon carbide paper of variable grain degree, sample surfaces cut is removed in machine glazed finish again, sample clean is clean and dry up, utilize aggressive agent to corrode, after having corroded, use purified rinse water immediately, add dodecyl sodium sulfate aqueous solvent during flushing and coordinate nappa cloth to carry out friction treatment, with pure water, sample clean is clean again after friction treatment, silicon steel sample metallographic observation can be carried out under common metallographic microscope after drying up sample.Advantage is, solves the problem that in metallographic specimen preparation process, surface is observed because of oxidation impact.And easy and simple to handle, easily realize.
Application number is the Chinese invention patent of CN201310085308.6, a kind of metallographic phase display method for wrought magnesium alloy diverse microcosmic structural state, it mainly comprises the concrete operations of metallographic specimen preparation, sand paper corase grind-fine grinding, machine glazed finish and electrobrightening, and a kind of electrolytic polishing liquid is unlike the prior art provided, provide electrolytic polishing process different separately for as cast condition, solid solution state, nodularization state and aging state Magnesium Alloy again.Electrolytic polishing liquid provided by the invention, it is easily prepared, simple to operate; For the electrolytic polishing process of the diverse microcosmic tissue of magnesium alloy, the quality of metallographic display can be improved; The concrete operations of corase grind-fine grinding provided by the invention and machine glazed finish can improve the quality of metallography preparation.
Composite polishing is the combination of Mechanical Method and electrolysis two kinds of lapping modes, composite polishing combines the advantage of machine glazed finish and electrobrightening, in the whole technical process of prior art, not to metallographic sample metallographic antirust treatment, so in metallographic sample preparation process, especially after erosion, as easy as rolling off a logly produce stain at surface oxidation, affect the observation of metallographic structure, and oil removing abatement processes is not carried out to metallographic sample, impact easily to follow-up grinding and glossing.
Summary of the invention
Technical problem to be solved by this invention is to provide a kind of metallographic abrasive polishing process, to solve cause in prior art above-mentioned not to metallographic sample metallographic antirust treatment, so in metallographic sample preparation process, especially after erosion, as easy as rolling off a logly produce stain at surface oxidation, affect the observation of metallographic structure, and oil removing abatement processes is not carried out to metallographic sample, easily give the defect that follow-up grinding and glossing impact.
For achieving the above object, the invention provides following technical scheme: a kind of metallographic abrasive polishing process, is characterized in that, processing step is:
(1) metallographic specimen surface clean
A. dedusting cleaning
Rinsed the surface of metallographic specimen with industrial water purification by giant, to there being the metallographic specimen surface of heavy oil dirt to adopt hot industry water purification, temperature is 45-55 DEG C, and washing time is 10-15min;
B. surface degreasing
Metallographic specimen is placed in buck and carries out Ultrasonic Cleaning, scavenging period is 10min, and room temperature is 20 DEG C, and after cleaning, soaks 0.5-2h;
C. rinsing
Utilize pure water to the rinsing of metallographic specimen metallographic low pressure, rinsing time is 5-10min;
(2) metallographic specimen surface grinding
A. roughly grind
Use 300-2000 object silicon carbide paper to polish to metallographic specimen, put into water purification after having polished and simply clean;
B. refine
Adopt grinder to polish to metallographic specimen, add lapping liquid when grinding, on metallographical polishing machine, the rubber soft end is placed in the bottom of metallographic specimen, and at rubber soft end coating butter, in order to offset pressure in process of lapping and frictional force, avoid scratch surface in process of lapping;
(3) metallographic specimen polishing
A. rough polishing
30-900 object metallurgical polishing paper is used simply to polish to metallographic specimen, and jet polishing agent, the ejection time is 3-6s;
B. ultrasonic polishing
Metallographic specimen is placed in supersonic wave cleaning machine and carries out polishing, and in supersonic wave cleaning machine, add diamond lap sand, antiscuffing paste and glycerine, polishing time is 30-60min.
C. electrolyte plasma polishing
Take metallographic specimen as anode, be connected with D.C. regulated power supply positive pole, immerse in electrolyte; Take platinized platinum as negative electrode, be connected with D.C. regulated power supply negative pole; Both immerse in electrolyte in a distance, and electrolyte Yi Liu Suan ﹑ phosphoric acid is basis, and immerse in electrolytic polishing liquid and carry out polishing with the electric current of 5-8A, polish temperature is 0-30 DEG C;
(4) clean
Rinsed the surface of metallographic specimen with deionized water by giant, washing time is 10-20min;
Preferably, after described step (1), metallographic specimen surface is dried, blow away the moisture on metallographic specimen surface with air-heater, and do the residual moisture on surface with white flannelette sassafras.
Preferably, the lapping liquid in the fine grinding b step of described step (2) adopts polycrystalline diamond lapping liquid.
Preferably, in described step (3), in rough polishing a step, the composition of polishing agent is: etchant 45%, brightener 22%, renovation agent 15%, other activating agents 13%.
Preferably, in described step (3) in ultrasonic polishing b step, in supersonic wave cleaning machine, composition glycerine 15-20%, antiscuffing paste 25-30%, diamond lap sand 40-50%, surplus are water.
Preferably, in described step (3) in electrolyte plasma polishing step c, the mass ratio of electrolyte is the concentrated sulfuric acid 5%-10%, SPA 12%-15% and water 75-80%.
Preferably, in described step (3) in electrolyte plasma polishing step c, high-frequency and high-voltage burst pulse electric field is adopted to carry out plasma electric slurry polishing to metallographic specimen.
Preferably, after described step (4), adopt hot nitrogen or electric furnace to dry metallographic specimen surface moisture to ensure that metallographic specimen surface uniform color is without water spots, be positioned over vacuum after completing and ensure.
The beneficial effect of above technical scheme is adopted to be: the vibration that present invention employs supersonic wave cleaning machine is cleaned metallographic specimen and polishes, when cleaning metallographic specimen, the liquid of supersonic wave cleaning machine inside is industrial water purification, diamond lap sand is put in inside, antiscuffing paste and glycerine are cleared up, achieve a tractor serves several purposes, can economize on resources, before polishing. metallographic specimen is cleaned, carry out oil removal treatment, can avoid impacting to follow-up grinding and glossing, the rubber soft end is placed in the bottom of metallographic specimen, and at rubber soft end coating butter, in order to offset pressure in process of lapping and frictional force, avoid scratch surface in process of lapping, repeatedly drying and processing is carried out to metallographic specimen, the water stain of metallographic specimen surface can be removed, oxidizable metal can also be avoided to be oxidized in the process of operation, hot nitrogen or electric furnace is adopted to dry metallographic specimen surface moisture to ensure that metallographic specimen surface uniform color is without water spots, ensure that in later observations process, do not have water stain impact observes, and avoid and smear antirust agent, impact is observed, under vacuum conditions, not only can the holding time longer, and can be in always can be to be seen state.
Detailed description of the invention
The following detailed description of the preferred embodiment of the present invention.
Embodiment 1
A kind of metallographic abrasive polishing process, it is characterized in that, processing step is:
(1) metallographic specimen surface clean
A. dedusting cleaning
Rinsed the surface of metallographic specimen with industrial water purification by giant, to there being the metallographic specimen surface of heavy oil dirt to adopt hot industry water purification, temperature is 45 DEG C, and washing time is 15min;
B. surface degreasing
Metallographic specimen is placed in buck and carries out Ultrasonic Cleaning, scavenging period is 10min, and room temperature is 20 DEG C, and after cleaning, soaks 0.5h;
C. rinsing
Utilize pure water to the rinsing of metallographic specimen metallographic low pressure, rinsing time is 5min;
(2) metallographic specimen surface grinding
A. roughly grind
Use 300 object silicon carbide papers to polish to metallographic specimen, put into water purification after having polished and simply clean;
B. refine
Adopt grinder to polish to metallographic specimen, add lapping liquid when grinding, on metallographical polishing machine, the rubber soft end is placed in the bottom of metallographic specimen, and at rubber soft end coating butter, in order to offset pressure in process of lapping and frictional force, avoid scratch surface in process of lapping;
(3) metallographic specimen polishing
A. rough polishing
30 object metallurgical polishing paper are used simply to polish to metallographic specimen, and jet polishing agent, the ejection time is 6s;
B. ultrasonic polishing
Metallographic specimen is placed in supersonic wave cleaning machine and carries out polishing, and in supersonic wave cleaning machine, add diamond lap sand, antiscuffing paste and glycerine, polishing time is 30min.
C. electrolyte plasma polishing
Take metallographic specimen as anode, be connected with D.C. regulated power supply positive pole, immerse in electrolyte; Take platinized platinum as negative electrode, be connected with D.C. regulated power supply negative pole; Both immerse in electrolyte in a distance, and electrolyte Yi Liu Suan ﹑ phosphoric acid is basis, and immerse in electrolytic polishing liquid and carry out polishing with the electric current of 8A, polish temperature is 0 DEG C;
(4) clean
Rinsed the surface of metallographic specimen with deionized water by giant, washing time is 20min;
Preferably, after described step (1), metallographic specimen surface is dried, blow away the moisture on metallographic specimen surface with air-heater, and do the residual moisture on surface with white flannelette sassafras.
Preferably, the lapping liquid in the fine grinding b step of described step (2) adopts polycrystalline diamond lapping liquid.
Preferably, in described step (3), in rough polishing a step, the composition of polishing agent is: etchant 45%, brightener 22%, renovation agent 15%, other activating agents 13%.
Preferably, in described step (3) in ultrasonic polishing b step, in supersonic wave cleaning machine, composition glycerine 15%, antiscuffing paste 25%, diamond lap sand 50%, surplus are water.
Preferably, in described step (3) in electrolyte plasma polishing step c, the mass ratio of electrolyte is the concentrated sulfuric acid 5%, SPA 15% and water 80%.
Preferably, in described step (3) in electrolyte plasma polishing step c, high-frequency and high-voltage burst pulse electric field is adopted to carry out plasma electric slurry polishing to metallographic specimen.
Preferably, after described step (4), adopt hot nitrogen or electric furnace to dry metallographic specimen surface moisture to ensure that metallographic specimen surface uniform color is without water spots, be positioned over vacuum after completing and ensure.
Embodiment 2
A kind of metallographic abrasive polishing process, it is characterized in that, processing step is:
(1) metallographic specimen surface clean
A. dedusting cleaning
Rinsed the surface of metallographic specimen with industrial water purification by giant, to there being the metallographic specimen surface of heavy oil dirt to adopt hot industry water purification, temperature is 55 DEG C, and washing time is 10min;
B. surface degreasing
Metallographic specimen is placed in buck and carries out Ultrasonic Cleaning, scavenging period is 10min, and room temperature is 20 DEG C, and after cleaning, soaks 2h;
C. rinsing
Utilize pure water to the rinsing of metallographic specimen metallographic low pressure, rinsing time is 10min;
(2) metallographic specimen surface grinding
A. roughly grind
Use 2000 object silicon carbide papers to polish to metallographic specimen, put into water purification after having polished and simply clean;
B. refine
Adopt grinder to polish to metallographic specimen, add lapping liquid when grinding, on metallographical polishing machine, the rubber soft end is placed in the bottom of metallographic specimen, and at rubber soft end coating butter, in order to offset pressure in process of lapping and frictional force, avoid scratch surface in process of lapping;
(3) metallographic specimen polishing
A. rough polishing
900 object metallurgical polishing paper are used simply to polish to metallographic specimen, and jet polishing agent, the ejection time is 3s;
B. ultrasonic polishing
Metallographic specimen is placed in supersonic wave cleaning machine and carries out polishing, and in supersonic wave cleaning machine, add diamond lap sand, antiscuffing paste and glycerine, polishing time is 60min.
C. electrolyte plasma polishing
Take metallographic specimen as anode, be connected with D.C. regulated power supply positive pole, immerse in electrolyte; Take platinized platinum as negative electrode, be connected with D.C. regulated power supply negative pole; Both immerse in electrolyte in a distance, and electrolyte Yi Liu Suan ﹑ phosphoric acid is basis, and immerse in electrolytic polishing liquid and carry out polishing with the electric current of 5A, polish temperature is 30 DEG C;
(4) clean
Rinsed the surface of metallographic specimen with deionized water by giant, washing time is 10min;
Preferably, after described step (1), metallographic specimen surface is dried, blow away the moisture on metallographic specimen surface with air-heater, and do the residual moisture on surface with white flannelette sassafras.
Preferably, the lapping liquid in the fine grinding b step of described step (2) adopts polycrystalline diamond lapping liquid.
Preferably, in described step (3), in rough polishing a step, the composition of polishing agent is: etchant 45%, brightener 22%, renovation agent 15%, other activating agents 13%.
Preferably, in described step (3) in ultrasonic polishing b step, in supersonic wave cleaning machine, composition glycerine 20%, antiscuffing paste 30%, diamond lap sand 40%, surplus are water.
Preferably, in described step (3) in electrolyte plasma polishing step c, the mass ratio of electrolyte is the concentrated sulfuric acid 10%, SPA 12% and water 78%.
Preferably, in described step (3) in electrolyte plasma polishing step c, high-frequency and high-voltage burst pulse electric field is adopted to carry out plasma electric slurry polishing to metallographic specimen.
Preferably, after described step (4), adopt hot nitrogen or electric furnace to dry metallographic specimen surface moisture to ensure that metallographic specimen surface uniform color is without water spots, be positioned over vacuum after completing and ensure.
Embodiment 3
A kind of metallographic abrasive polishing process, it is characterized in that, processing step is:
(1) metallographic specimen surface clean
A. dedusting cleaning
Rinsed the surface of metallographic specimen with industrial water purification by giant, to there being the metallographic specimen surface of heavy oil dirt to adopt hot industry water purification, temperature is 50 DEG C, and washing time is 12min;
B. surface degreasing
Metallographic specimen is placed in buck and carries out Ultrasonic Cleaning, scavenging period is 10min, and room temperature is 20 DEG C, and after cleaning, soaks 0.5-2h;
C. rinsing
Utilize pure water to the rinsing of metallographic specimen metallographic low pressure, rinsing time is 8min;
(2) metallographic specimen surface grinding
A. roughly grind
Use 900 object silicon carbide papers to polish to metallographic specimen, put into water purification after having polished and simply clean;
B. refine
Adopt grinder to polish to metallographic specimen, add lapping liquid when grinding, on metallographical polishing machine, the rubber soft end is placed in the bottom of metallographic specimen, and at rubber soft end coating butter, in order to offset pressure in process of lapping and frictional force, avoid scratch surface in process of lapping;
(3) metallographic specimen polishing
A. rough polishing
400 object metallurgical polishing paper are used simply to polish to metallographic specimen, and jet polishing agent, the ejection time is 5s;
B. ultrasonic polishing
Metallographic specimen is placed in supersonic wave cleaning machine and carries out polishing, and in supersonic wave cleaning machine, add diamond lap sand, antiscuffing paste and glycerine, polishing time is 40min.
C. electrolyte plasma polishing
Take metallographic specimen as anode, be connected with D.C. regulated power supply positive pole, immerse in electrolyte; Take platinized platinum as negative electrode, be connected with D.C. regulated power supply negative pole; Both immerse in electrolyte in a distance, and electrolyte Yi Liu Suan ﹑ phosphoric acid is basis, and immerse in electrolytic polishing liquid and carry out polishing with the electric current of 7A, polish temperature is 20 DEG C;
(4) clean
Rinsed the surface of metallographic specimen with deionized water by giant, washing time is 15min;
Preferably, after described step (1), metallographic specimen surface is dried, blow away the moisture on metallographic specimen surface with air-heater, and do the residual moisture on surface with white flannelette sassafras.
Preferably, the lapping liquid in the fine grinding b step of described step (2) adopts polycrystalline diamond lapping liquid.
Preferably, in described step (3), in rough polishing a step, the composition of polishing agent is: etchant 45%, brightener 22%, renovation agent 15%, other activating agents 13%.
Preferably, in described step (3) in ultrasonic polishing b step, in supersonic wave cleaning machine, composition glycerine 18%, antiscuffing paste 26%, diamond lap sand 45%, surplus are water.
Preferably, in described step (3) in electrolyte plasma polishing step c, the mass ratio of electrolyte is the concentrated sulfuric acid 10%, SPA 15% and water 75%.
Preferably, in described step (3) in electrolyte plasma polishing step c, high-frequency and high-voltage burst pulse electric field is adopted to carry out plasma electric slurry polishing to metallographic specimen.
Preferably, after described step (4), adopt hot nitrogen or electric furnace to dry metallographic specimen surface moisture to ensure that metallographic specimen surface uniform color is without water spots, be positioned over vacuum after completing and ensure.
The vibration that have employed supersonic wave cleaning machine is cleaned metallographic specimen and polishes, when cleaning metallographic specimen, the liquid of supersonic wave cleaning machine inside is industrial water purification, diamond lap sand is put in inside, antiscuffing paste and glycerine are cleared up, achieve a tractor serves several purposes, can economize on resources, before polishing. metallographic specimen is cleaned, carry out oil removal treatment, can avoid impacting to follow-up grinding and glossing, the rubber soft end is placed in the bottom of metallographic specimen, and at rubber soft end coating butter, in order to offset pressure in process of lapping and frictional force, avoid scratch surface in process of lapping, repeatedly drying and processing is carried out to metallographic specimen, the water stain of metallographic specimen surface can be removed, oxidizable metal can also be avoided to be oxidized in the process of operation, hot nitrogen or electric furnace is adopted to dry metallographic specimen surface moisture to ensure that metallographic specimen surface uniform color is without water spots, ensure that in later observations process, do not have water stain impact observes, and avoid and smear antirust agent, impact is observed, under vacuum conditions, not only can the holding time longer, and can be in always can be to be seen state.
Above-described is only the preferred embodiment of the present invention, it should be pointed out that for the person of ordinary skill of the art, and without departing from the concept of the premise of the invention, can also make some distortion and improvement, these all belong to protection scope of the present invention.

Claims (8)

1. a metallographic abrasive polishing process, is characterized in that, processing step is:
(1) metallographic specimen surface clean
A. dedusting cleaning
Rinsed the surface of metallographic specimen with industrial water purification by giant, to there being the metallographic specimen surface of heavy oil dirt to adopt hot industry water purification, temperature is 45-55 DEG C, and washing time is 10-15min;
B. surface degreasing
Metallographic specimen is placed in buck and carries out Ultrasonic Cleaning, scavenging period is 10min, and room temperature is 20 DEG C, and after cleaning, soaks 0.5-2h;
C. rinsing
Utilize pure water to the rinsing of metallographic specimen metallographic low pressure, rinsing time is 5-10min;
(2) metallographic specimen surface grinding
A. roughly grind
Use 300-2000 object silicon carbide paper to polish to metallographic specimen, put into water purification after having polished and simply clean;
B. refine
Adopt grinder to polish to metallographic specimen, add lapping liquid when grinding, on metallographical polishing machine, the rubber soft end is placed in the bottom of metallographic specimen, and at rubber soft end coating butter, in order to offset pressure in process of lapping and frictional force, avoid scratch surface in process of lapping;
(3) metallographic specimen polishing
A. rough polishing
30-900 object metallurgical polishing paper is used simply to polish to metallographic specimen, and jet polishing agent, the ejection time is 3-6s;
B. ultrasonic polishing
Metallographic specimen is placed in supersonic wave cleaning machine and carries out polishing, and in supersonic wave cleaning machine, add diamond lap sand, antiscuffing paste and glycerine, polishing time is 30-60min.
C. electrolyte plasma polishing
Take metallographic specimen as anode, be connected with D.C. regulated power supply positive pole, immerse in electrolyte; Take platinized platinum as negative electrode, be connected with D.C. regulated power supply negative pole; Both immerse in electrolyte in a distance, and electrolyte Yi Liu Suan ﹑ phosphoric acid is basis, and immerse in electrolytic polishing liquid and carry out polishing with the electric current of 5-8A, polish temperature is 0-30 DEG C;
(4) clean
Rinsed the surface of metallographic specimen with deionized water by giant, washing time is 10-20min.
2. a kind of metallographic abrasive polishing process according to claim 1, it is characterized in that, after described step (1), metallographic specimen surface is dried, blow away the moisture on metallographic specimen surface with air-heater, and do the residual moisture on surface with white flannelette sassafras.
3. a kind of metallographic abrasive polishing process according to claim 1, is characterized in that, the lapping liquid in the fine grinding b step of described step (2) adopts polycrystalline diamond lapping liquid.
4. a kind of metallographic abrasive polishing process according to claim 1, is characterized in that, in described step (3), in rough polishing a step, the composition of polishing agent is: etchant 45%, brightener 22%, renovation agent 15%, other activating agents 13%.
5. a kind of metallographic abrasive polishing process according to claim 1, it is characterized in that, in described step (3) in ultrasonic polishing b step, in supersonic wave cleaning machine, composition glycerine 15-20%, antiscuffing paste 25-30%, diamond lap sand 40-50%, surplus are water.
6. a kind of metallographic abrasive polishing process according to claim 1, it is characterized in that, in described step (3) in electrolyte plasma polishing step c, the mass ratio of electrolyte is the concentrated sulfuric acid 5%-10%, SPA 12%-15% and water 75-80%.
7. a kind of metallographic abrasive polishing process according to claim 6, is characterized in that, in described step (3) in electrolyte plasma polishing step c, adopts high-frequency and high-voltage burst pulse electric field to carry out plasma electric slurry polishing to metallographic specimen.
8. a kind of metallographic abrasive polishing process according to claim 1, it is characterized in that, after described step (4), adopt hot nitrogen or electric furnace to dry metallographic specimen surface moisture to ensure that metallographic specimen surface uniform color is without water spots, be positioned over vacuum after completing and ensure.
CN201510751777.6A 2015-11-06 2015-11-06 Metallographic grinding and polishing process Pending CN105437050A (en)

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Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105951100A (en) * 2016-05-04 2016-09-21 太原理工大学 Magnesium-aluminum-strontium-yttrium alloy etching agent and method for obtaining metallographic structure through magnesium-aluminum-strontium-yttrium alloy etching agent
CN106086901A (en) * 2016-07-31 2016-11-09 安庆市芊芊纸业有限公司 A kind of component of machine process of surface treatment
CN106891230A (en) * 2017-04-17 2017-06-27 湘潭大学 Metallographic sample Grinding and polishing machine and its clamp base
CN107020567A (en) * 2017-03-03 2017-08-08 中山市科旗金属表面处理设备有限公司 A kind of glossing
CN107253098A (en) * 2017-07-30 2017-10-17 安吉圆磨机械科技有限公司 A kind of flange polishing process
CN107336085A (en) * 2017-08-02 2017-11-10 安吉圆磨机械科技有限公司 A kind of few flange surface polishing process of polishing scratch
CN107520675A (en) * 2017-08-02 2017-12-29 安吉圆磨机械科技有限公司 A kind of flange surface polishing process
CN108318304A (en) * 2018-01-31 2018-07-24 中国空间技术研究院 A kind of the aerospace preparation of PCBA effective sections and damage detecting method
CN108535080A (en) * 2018-03-27 2018-09-14 华电国际电力股份有限公司技术服务中心 A kind of metallurgical polishing method for making sample
CN109396970A (en) * 2018-12-26 2019-03-01 临安恒达精密仪表元件厂 A kind of metal product superfinishing polishing process
CN110480426A (en) * 2019-09-03 2019-11-22 贵州航天精工制造有限公司 A kind of polishing method of irregular inner hole
CN110596163A (en) * 2019-09-27 2019-12-20 西北有色金属研究院 Preparation method of EBSD sample of titanium alloy fracture section
CN111118505A (en) * 2020-01-14 2020-05-08 深圳市益联塑胶有限公司 Metal surface treatment method
CN111774571A (en) * 2020-08-03 2020-10-16 深圳市光为光通信科技有限公司 Optical module shell and preparation method thereof
CN112300872A (en) * 2020-10-28 2021-02-02 西安热工研究院有限公司 Cleaning solution for removing water stains on surface of metallographic sample and using method thereof
CN112318220A (en) * 2020-09-04 2021-02-05 山东国晶新材料有限公司 Clamping rod surface cleaning method
CN112730171A (en) * 2020-12-30 2021-04-30 成都市海瑞产品质量技术检测有限公司 Grain size detection method for low-carbon high-alloy material
CN112809457A (en) * 2021-01-14 2021-05-18 宇茂科技(苏州)有限公司 Polishing processing technology capable of prolonging service life of metal part
CN113276010A (en) * 2021-04-22 2021-08-20 上海天安轴承有限公司 Remediation method for oxide film defects on surface of micro bearing part
CN113418770A (en) * 2021-06-21 2021-09-21 江西铜业技术研究院有限公司 Electrolytic polishing solution for preparing molybdenum-rhenium alloy metallographic specimen and method thereof
CN115138631A (en) * 2021-03-31 2022-10-04 江苏海川光电新材料有限公司 Surface finish machining process for metal micro-drawing bus

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Cited By (25)

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CN105951100A (en) * 2016-05-04 2016-09-21 太原理工大学 Magnesium-aluminum-strontium-yttrium alloy etching agent and method for obtaining metallographic structure through magnesium-aluminum-strontium-yttrium alloy etching agent
CN106086901B (en) * 2016-07-31 2019-02-19 安庆市芊芊纸业有限公司 A kind of component of machine process of surface treatment
CN106086901A (en) * 2016-07-31 2016-11-09 安庆市芊芊纸业有限公司 A kind of component of machine process of surface treatment
CN107020567A (en) * 2017-03-03 2017-08-08 中山市科旗金属表面处理设备有限公司 A kind of glossing
CN106891230A (en) * 2017-04-17 2017-06-27 湘潭大学 Metallographic sample Grinding and polishing machine and its clamp base
CN106891230B (en) * 2017-04-17 2022-11-01 湘潭大学 Metallographic sample polishing machine and clamp base thereof
CN107253098A (en) * 2017-07-30 2017-10-17 安吉圆磨机械科技有限公司 A kind of flange polishing process
CN107336085A (en) * 2017-08-02 2017-11-10 安吉圆磨机械科技有限公司 A kind of few flange surface polishing process of polishing scratch
CN107520675A (en) * 2017-08-02 2017-12-29 安吉圆磨机械科技有限公司 A kind of flange surface polishing process
CN108318304A (en) * 2018-01-31 2018-07-24 中国空间技术研究院 A kind of the aerospace preparation of PCBA effective sections and damage detecting method
CN108535080A (en) * 2018-03-27 2018-09-14 华电国际电力股份有限公司技术服务中心 A kind of metallurgical polishing method for making sample
CN109396970B (en) * 2018-12-26 2020-06-05 临安恒达精密仪表元件厂 Metal product ultra-precision polishing process
CN109396970A (en) * 2018-12-26 2019-03-01 临安恒达精密仪表元件厂 A kind of metal product superfinishing polishing process
CN110480426A (en) * 2019-09-03 2019-11-22 贵州航天精工制造有限公司 A kind of polishing method of irregular inner hole
CN110596163A (en) * 2019-09-27 2019-12-20 西北有色金属研究院 Preparation method of EBSD sample of titanium alloy fracture section
CN111118505A (en) * 2020-01-14 2020-05-08 深圳市益联塑胶有限公司 Metal surface treatment method
CN111774571A (en) * 2020-08-03 2020-10-16 深圳市光为光通信科技有限公司 Optical module shell and preparation method thereof
CN112318220A (en) * 2020-09-04 2021-02-05 山东国晶新材料有限公司 Clamping rod surface cleaning method
CN112300872A (en) * 2020-10-28 2021-02-02 西安热工研究院有限公司 Cleaning solution for removing water stains on surface of metallographic sample and using method thereof
CN112730171A (en) * 2020-12-30 2021-04-30 成都市海瑞产品质量技术检测有限公司 Grain size detection method for low-carbon high-alloy material
CN112730171B (en) * 2020-12-30 2022-12-09 成都市海瑞产品质量技术检测有限公司 Grain size detection method for low-carbon high-alloy material
CN112809457A (en) * 2021-01-14 2021-05-18 宇茂科技(苏州)有限公司 Polishing processing technology capable of prolonging service life of metal part
CN115138631A (en) * 2021-03-31 2022-10-04 江苏海川光电新材料有限公司 Surface finish machining process for metal micro-drawing bus
CN113276010A (en) * 2021-04-22 2021-08-20 上海天安轴承有限公司 Remediation method for oxide film defects on surface of micro bearing part
CN113418770A (en) * 2021-06-21 2021-09-21 江西铜业技术研究院有限公司 Electrolytic polishing solution for preparing molybdenum-rhenium alloy metallographic specimen and method thereof

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