CN105413986A - Thermal vacuum drying device provided with pressure balancer and pressure balancer - Google Patents

Thermal vacuum drying device provided with pressure balancer and pressure balancer Download PDF

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Publication number
CN105413986A
CN105413986A CN201510777270.8A CN201510777270A CN105413986A CN 105413986 A CN105413986 A CN 105413986A CN 201510777270 A CN201510777270 A CN 201510777270A CN 105413986 A CN105413986 A CN 105413986A
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China
Prior art keywords
tube
main pipeline
funnel
vacuumizing
drying device
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CN201510777270.8A
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CN105413986B (en
Inventor
潘金旺
张纯
任思雨
苏君海
李建华
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Truly Huizhou Smart Display Ltd
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Truly Huizhou Smart Display Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

The invention discloses a thermal vacuum drying device. The thermal vacuum drying device comprises a cavity. Vacuum adsorption ports are formed in the two side faces of the cavity. One end of a vacuumizing branch pipe is connected with the vacuum adsorption ports, and the other end of the vacuumizing branch pipe is converged to one end of a vacuumizing main pipe. The other end of the vacuumizing main pipe is connected with a vacuum pump unit. A pressure balancer is arranged in the convergence of the vacuumizing branch pipe and the vacuumizing main pipe. The pressure balancer comprises a U-shaped pipe and a vacuumizing main pipe funnel-shaped part. The vacuumizing branch pipe extends to the bottom of the U-shaped pipe. The top of the U-shaped pipe is sealed. Air holes are formed in the two sides of the U-shaped pipe. The U-shaped pipe is communicated with the transversely arranged vacuumizing main pipe funnel-shaped part through the air holes. By means of the buffer effect of the U-shaped pipe of the pressure balancer, the pressures of all branch pipes are adjusted to be consistent, and thus the pressure of the whole hot dry vacuum (HVCD) cavity and the pressure of part of the HVCD cavity are held to be stable; polyimide solution airflow is constant; the MURA defects are reduced; the film texture of flexible substrates is improved; the processing yield is increased.

Description

A kind of thermal vacuum drying device and pressure equilibrium device being provided with pressure equilibrium device
Technical field
The present invention relates to Flexible Displays product manufacturing technical field, particularly relate to a kind of the thermal vacuum drying device and the pressure equilibrium device that are provided with pressure equilibrium device.
Background technology
By flexible polyimide, (FlexiblePolyimide is called for short: flexible PI) making flexible base board, be applied to the production of Flexible Displays product, is one of heat subject of current Flexible Displays product manufacturing.Because flexible polyimide has high viscosity, hydrophobic feature, its precursor polyimide solution (polyimidesolution) is measured many (percentage by weight >=70% that solvent NMP measures) containing solvent NMP.Polyimide solution, after coating, generally needs through thermal vacuum drying (HotDryVacuum, be called for short HVCD) processing procedure, then is placed in roasting plant (Oven) and carries out baking-curing processing procedure.Because the solvent of polyimide solution (PISolvent) is high, the dry HCVD processing procedure of thermal vacuum easily causes various MURA problem, namely occurs spot, dirty, the uneven various vestiges caused of surface color, thus affects the yield of flexible base board.
The MURA that the dry HVCD processing procedure of common thermal vacuum occurs has the PinMURA caused because supporting Pin, the erose MURA etc. that vacuum pneumatic or pressure inequality because of vavuum pump cause.
At present, as shown in Figure 1, when manufacturing the chamber 1 of the dry HVCD device of thermal vacuum, arrange vacuum port or vacuum suction mouth (VacuumAbsorptionPort) be generally one or several, two vacuum suction mouths 11,12 are provided with in Fig. 1, and respectively vacuumize branch pipe(tube) 2 and directly meet at and single vacuumize main pipeline 3, by the aggregation units vacuumizing main pipeline 3 and connect vacuum pumping pump unit 4 and solvent capture unit 5.This set-up mode easily causes that respectively to vacuumize in branch pipe(tube) pressure uneven, cause local pressure in the chamber of the dry HVCD device of thermal vacuum uneven, when polyimide solvent is extracted, air-flow gets muddled, thus produces irregularly shaped MURA on polyimide film (PIFilm) surface.
Summary of the invention
For above-mentioned the deficiencies in the prior art, the invention provides a kind of thermal vacuum drying device being provided with pressure equilibrium device, regulated the pressure respectively vacuumizing branch pipe(tube) by pressure equilibrium device, maintain local pressure minimize variability in HVCD chamber, reduce MURA and produce.
For achieving the above object, the technical solution used in the present invention is:
The invention provides a kind of thermal vacuum drying device, comprise chamber, vacuum suction mouth is provided with in the two sides of chamber, the one end vacuumizing branch pipe(tube) connects described vacuum suction mouth, the other end meets at the one end vacuumizing main pipeline, the other end vacuumizing main pipeline connects vacuum pump unit, or connects the aggregation units of vacuum pumping pump unit and solvent capture unit, is provided with pressure equilibrium device at the meet vacuumizing branch pipe(tube) and vacuumize main pipeline; Described pressure equilibrium device comprises U-tube and vacuumizes main pipeline funnel-like part, and vacuumize the bottom that branch pipe(tube) extends to described U-tube, the top seal of U-tube, U-tube both sides are provided with pore; Described U-tube vacuumizes main pipeline funnel-like part by described pore connection horizontally set.
Further, the inner tubal wall of described U-tube side and the outer tube wall of opposite side are provided with pore, if vacuumize main pipeline funnel-like part described in the connection of leachy outer tube wall side.
Further, the radius of the pore arranged in U-tube both sides and quantity are arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit, and the quantity of described pore is at least twice vacuumizing branch pipe(tube) quantity.
Further, the caliber of described U-tube is arranged according to the treating capacity of solvent with highly needing.
Further, described in vacuumize main pipeline funnel-like part and be set to oval funnel-form, described in vacuumize the major axis at the oval funnel-form position of main pipeline and minor axis dimension is arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit.
The present invention also provides a kind of pressure equilibrium device of described thermal vacuum drying device, described pressure equilibrium device comprises U-tube and vacuumizes main pipeline funnel-like part, thermal vacuum drying device vacuumize the bottom that branch pipe(tube) extends to described U-tube, the top seal of U-tube, U-tube both sides are provided with pore; Described U-tube vacuumizes main pipeline funnel-like part by described pore connection horizontally set.
Further, the inner tubal wall of described U-tube side and the outer tube wall of opposite side are provided with pore, if vacuumize main pipeline funnel-like part described in the connection of leachy outer tube wall side.
Further, the radius of the pore arranged in U-tube both sides and quantity are arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit, and the quantity of described pore is at least twice vacuumizing branch pipe(tube) quantity.
Further, the caliber of described U-tube is arranged according to the treating capacity of solvent with highly needing.
Further, described in vacuumize main pipeline funnel-like part and be set to oval funnel-form, described in vacuumize the major axis at the oval funnel-form position of main pipeline and minor axis dimension is arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit.
Beneficial effect of the present invention is:
Vacuum port single in HVCD chamber is designed to multiport (for single-port situation) by thermal vacuum drying device provided by the invention, and vacuumizing branch pipe(tube) and vacuumizing the pressure equilibrium device increasing by " U-tube+oval funnel-form pipeline " between main pipeline, utilize the cushioning effect of U-tube, regulate U-tube upper and lower side pressure difference, each branch pipe(tube) pressure is regulated consistent, thus make HVCD chamber whole and part pressure keep stable, polyimide solution (PISolvent) air stream constant, reduce the defects such as MURA phenomenon, improve the film quality of flexible base board, improve process rate.
Accompanying drawing explanation
Fig. 1 is the structural representation of the dry HVCD device of existing thermal vacuum;
Fig. 2 is the structural representation of the dry HVCD device of the thermal vacuum being provided with pressure equilibrium device of the present invention and pressure equilibrium device.
Detailed description of the invention
Specifically illustrate embodiments of the present invention below in conjunction with accompanying drawing, accompanying drawing is only for reference and use is described, does not form the restriction to scope of patent protection of the present invention.
As shown in Figure 1, 2, the present embodiment provides a kind of thermal vacuum drying device, comprise chamber 1, vacuum suction mouth 11,12 is provided with in the two sides of chamber 1, the one end vacuumizing branch pipe(tube) 2 connects described vacuum suction mouth 11,12, the other end meets at the one end vacuumizing main pipeline 3, the other end vacuumizing main pipeline 3 connects vacuum pump unit 4 (not shown), or connect the aggregation units of vacuum pumping pump unit 4 and solvent capture unit 5 (not shown), be provided with pressure equilibrium device 6 with the meet vacuumizing main pipeline 3 vacuumizing branch pipe(tube) 2; Described pressure equilibrium device 6 comprises U-tube 61 and vacuumizes main pipeline funnel-like part 62, and vacuumize the bottom that branch pipe(tube) 2 extends to described U-tube 61, the top seal of U-tube 61, U-tube 61 both sides are provided with pore 610; What described U-tube 61 was communicated with horizontally set by described pore 610 vacuumizes main pipeline funnel-like part 62.
In the present embodiment, the inner tubal wall of described U-tube 61 side and the outer tube wall of opposite side are provided with pore 610, if vacuumize main pipeline funnel-like part 62 described in the connection of leachy outer tube wall side.
Preferably, the radius of the pore 610 arranged in U-tube 61 both sides and quantity are arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit 4, and the quantity of described pore 610 is at least twices vacuumizing branch pipe(tube) 2 quantity.In the present embodiment, vacuumizing branch pipe(tube) 2 quantity is 4, and the quantity of described pore 610 is 8.
Preferably, the caliber R of described U-tube 61 and height H need to arrange according to the treating capacity of solvent.
Preferably, described in vacuumize main pipeline funnel-like part 62 and be set to oval funnel-form, described in vacuumize the major axis at the oval funnel-form position 62 of main pipeline 3 and minor axis dimension is arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit.
The present invention also provides a kind of pressure equilibrium device 6 of described thermal vacuum drying device, described pressure equilibrium device 6 comprises U-tube 61 and vacuumizes main pipeline funnel-like part 62, thermal vacuum drying device vacuumize the bottom that branch pipe(tube) 2 extends to described U-tube 61, the top seal of U-tube 61, U-tube 61 both sides are provided with pore 610; What described U-tube 61 was communicated with horizontally set by described pore 610 vacuumizes main pipeline funnel-like part 62.
In the present embodiment, the inner tubal wall of described U-tube 61 side and the outer tube wall of opposite side are provided with pore 610, if vacuumize main pipeline funnel-like part 62 described in the connection of leachy outer tube wall side.
Preferably, the radius of the pore 610 arranged in U-tube 61 both sides and quantity are arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit 5, and the quantity of described pore 610 is at least twices vacuumizing branch pipe(tube) 2 quantity.In the present embodiment, vacuumizing branch pipe(tube) 2 quantity is 4, and the quantity of described pore 610 is 8.
Preferably, the caliber R of described U-tube 61 and height H need to arrange according to the treating capacity of solvent.
Preferably, described in vacuumize main pipeline funnel-like part 62 and be set to oval funnel-form, described in vacuumize the major axis at the oval funnel-form position 62 of main pipeline 3 and minor axis dimension is arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit.
In the present embodiment, the material of whole thermal vacuum drying device and pressure equilibrium device thereof is the stainless steel SUS material that heat conductivity is good.
The implementation result of the present invention and the dry HVCD device of existing thermal vacuum contrasts as follows:
(1) implementation result of the HVCD device before improving:
As shown in Figure 1, suppose that the HVCD before and after improving all has 4 to vacuumize branch pipe(tube) 2, its pressure is respectively P1, P2, P3, P4.In main pipeline 3 (in Fig. 1 A point), the impact of air pressure is evaporated with HVCD chamber internal solvent (Solvent) because floating by vacuum pump unit 4 power, the local pressure of A point is not quite similar, so that the pressure of each bypass line (Vent) produces difference, namely P1, P2, P3, P4 value is unequal, the flow velocity that chamber 1 internal solvent flows to vacuum suction mouth 11,12 is inconsistent, form MURA on polyimide solution (PISolvent) surface, film quality becomes coarse and even deteriorated.
(2) implementation result of the HVCD device after improving:
Vacuum ballast by vacuum pump unit 4 affects, and in a point, this region local pressure may produce difference;
Through the buffering regulating action of U-tube 61, b overall pressure is substantially identical with a place, but this region local pressure difference minimizes;
Stablizing of b place overall pressure, local pressure minimize variability, ensures that the pressure atmosphere of each branch pipe(tube) in c place is consistent.When each branch pipe(tube) extracts solvent or vacuum, mutual pressure difference minimizes and even does not have difference, and HVCD chamber solvent evaporative air is stablized, and reduces MURA and produces, improve polyimide surface film quality.
Pressure contrasts: Pa≤Pb≤Pc=P1=P2=P3=P4.
Above disclosedly be only preferred embodiment of the present invention, the scope of the present invention can not be limited with this, therefore according to the equivalent variations that the present patent application the scope of the claims is done, still belong to the scope that the present invention is contained.

Claims (10)

1. a thermal vacuum drying device, comprise chamber, vacuum suction mouth is provided with in the two sides of chamber, the one end vacuumizing branch pipe(tube) connects described vacuum suction mouth, the other end meets at the one end vacuumizing main pipeline, the other end vacuumizing main pipeline connects vacuum pump unit, or connects the aggregation units of vacuum pumping pump unit and solvent capture unit, it is characterized in that:
Pressure equilibrium device is provided with vacuumizing branch pipe(tube) with the meet vacuumizing main pipeline; Described pressure equilibrium device comprises U-tube and vacuumizes main pipeline funnel-like part, and vacuumize the bottom that branch pipe(tube) extends to described U-tube, the top seal of U-tube, U-tube both sides are provided with pore; Described U-tube vacuumizes main pipeline funnel-like part by described pore connection horizontally set.
2. a kind of thermal vacuum drying device according to claim 1, is characterized in that:
The inner tubal wall of described U-tube side and the outer tube wall of opposite side are provided with pore, if vacuumize main pipeline funnel-like part described in the connection of leachy outer tube wall side.
3. a kind of thermal vacuum drying device according to claim 1 and 2, is characterized in that:
The radius of the pore arranged in U-tube both sides and quantity are arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit, and the quantity of described pore is at least twice vacuumizing branch pipe(tube) quantity.
4. a kind of thermal vacuum drying device according to claim 1, is characterized in that:
The caliber of described U-tube is arranged according to the treating capacity of solvent with highly needing.
5. a kind of thermal vacuum drying device according to claim 1, it is characterized in that: described funnel-form vacuumizes main pipeline and is set to oval funnel-form, described in vacuumize the major axis at the oval funnel-form position of main pipeline and minor axis dimension is arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit.
6. the pressure equilibrium device of a thermal vacuum drying device as claimed in claim 1, it is characterized in that: described pressure equilibrium device comprises U-tube and vacuumizes main pipeline funnel-like part, thermal vacuum drying device vacuumize the bottom that branch pipe(tube) extends to described U-tube, the top seal of U-tube, U-tube both sides are provided with pore; Described U-tube vacuumizes main pipeline funnel-like part by described pore connection horizontally set.
7. the pressure equilibrium device of thermal vacuum drying device according to claim 6, is characterized in that:
The inner tubal wall of described U-tube side and the outer tube wall of opposite side are provided with pore, if vacuumize main pipeline funnel-like part described in the connection of leachy outer tube wall side.
8. the pressure equilibrium device of the thermal vacuum drying device according to claim 6 or 7, it is characterized in that: the radius of the pore arranged in U-tube both sides and quantity are arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit, and the quantity of described pore is at least twice vacuumizing branch pipe(tube) quantity.
9. a kind of thermal vacuum drying device according to claim 6, is characterized in that:
The caliber of described U-tube is arranged according to the treating capacity of solvent with highly needing.
10. a kind of thermal vacuum drying device according to claim 6, is characterized in that:
The described main pipeline funnel-like part that vacuumizes is set to oval funnel-form, described in vacuumize the major axis at the oval funnel-form position of main pipeline and minor axis dimension is arranged according to the operating pressure of the treating capacity of solvent and vacuum pump unit.
CN201510777270.8A 2015-11-13 2015-11-13 A kind of thermal vacuum drying device and pressure equilibrium device provided with pressure equilibrium device Active CN105413986B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107457164A (en) * 2017-07-28 2017-12-12 武汉华星光电技术有限公司 A kind of Minton dryer, system and vacuum drying method

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4596077A (en) * 1982-06-23 1986-06-24 Nobuyoshi Kuboyama Heating process and its apparatus in reducing air pressure within a balanced level
JPH03163819A (en) * 1989-11-22 1991-07-15 Mitsubishi Electric Corp Manufacture of semiconductor device
JPH07280435A (en) * 1991-12-12 1995-10-27 Guy Beurel Pressure regulator in enclosure of freeze-drying
FR2782155A1 (en) * 1998-08-07 2000-02-11 Usifroid System for regulation of gas pressure in freeze-drying tank, uses water vapor in the tank, the pressure of which can be maintained by varying the amount of condensation
JP2007120777A (en) * 2005-10-25 2007-05-17 Sumitomo Metal Mining Co Ltd Drying storage method of resin film for two-layer flexible substrate, and heating dryer
CN202734470U (en) * 2012-08-11 2013-02-13 南通华达微电子集团有限公司 Gas pressure control device in silver paste solidifying oven
JP2014512510A (en) * 2011-04-29 2014-05-22 ミルロック テクノロジー,インコーポレイテッド Control of nucleation in refrigeration process of freeze-drying cycle using ice mist dispersion by pressure difference
CN204620350U (en) * 2015-03-03 2015-09-09 昆山龙腾光电有限公司 Dry drying device is carried out to substrate

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4596077A (en) * 1982-06-23 1986-06-24 Nobuyoshi Kuboyama Heating process and its apparatus in reducing air pressure within a balanced level
JPH03163819A (en) * 1989-11-22 1991-07-15 Mitsubishi Electric Corp Manufacture of semiconductor device
JPH07280435A (en) * 1991-12-12 1995-10-27 Guy Beurel Pressure regulator in enclosure of freeze-drying
FR2782155A1 (en) * 1998-08-07 2000-02-11 Usifroid System for regulation of gas pressure in freeze-drying tank, uses water vapor in the tank, the pressure of which can be maintained by varying the amount of condensation
JP2007120777A (en) * 2005-10-25 2007-05-17 Sumitomo Metal Mining Co Ltd Drying storage method of resin film for two-layer flexible substrate, and heating dryer
JP2014512510A (en) * 2011-04-29 2014-05-22 ミルロック テクノロジー,インコーポレイテッド Control of nucleation in refrigeration process of freeze-drying cycle using ice mist dispersion by pressure difference
CN202734470U (en) * 2012-08-11 2013-02-13 南通华达微电子集团有限公司 Gas pressure control device in silver paste solidifying oven
CN204620350U (en) * 2015-03-03 2015-09-09 昆山龙腾光电有限公司 Dry drying device is carried out to substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107457164A (en) * 2017-07-28 2017-12-12 武汉华星光电技术有限公司 A kind of Minton dryer, system and vacuum drying method
CN107457164B (en) * 2017-07-28 2021-03-23 武汉华星光电技术有限公司 Vacuum drying device, system and vacuum drying method

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