CN105388173A - 获取ebsp图样的方法 - Google Patents

获取ebsp图样的方法 Download PDF

Info

Publication number
CN105388173A
CN105388173A CN201510644709.XA CN201510644709A CN105388173A CN 105388173 A CN105388173 A CN 105388173A CN 201510644709 A CN201510644709 A CN 201510644709A CN 105388173 A CN105388173 A CN 105388173A
Authority
CN
China
Prior art keywords
sample
ebsp
detecting device
image
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510644709.XA
Other languages
English (en)
Chinese (zh)
Inventor
M·恩科斯基
P·斯特斯卡
T·维斯塔维
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51421841&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CN105388173(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by FEI Co filed Critical FEI Co
Publication of CN105388173A publication Critical patent/CN105388173A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/203—Measuring back scattering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H01J2237/24415—X-ray
    • H01J2237/2442—Energy-dispersive (Si-Li type) spectrometer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24485—Energy spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2555—Microprobes, i.e. particle-induced X-ray spectrometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN201510644709.XA 2014-08-25 2015-08-25 获取ebsp图样的方法 Pending CN105388173A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP14182139.7 2014-08-25
EP14182139.7A EP2991098A1 (en) 2014-08-25 2014-08-25 Method of acquiring EBSP patterns

Publications (1)

Publication Number Publication Date
CN105388173A true CN105388173A (zh) 2016-03-09

Family

ID=51421841

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510644709.XA Pending CN105388173A (zh) 2014-08-25 2015-08-25 获取ebsp图样的方法

Country Status (4)

Country Link
US (1) US9618463B2 (https=)
EP (2) EP2991098A1 (https=)
JP (1) JP6253618B2 (https=)
CN (1) CN105388173A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109465531A (zh) * 2018-11-20 2019-03-15 清华大学 一种电子束熔丝沉积增材制造实时监控系统
CN110310876A (zh) * 2018-03-27 2019-10-08 卡尔蔡司显微镜有限责任公司 电子束显微镜
CN112179928A (zh) * 2019-07-02 2021-01-05 Fei 公司 用于获取电子反向散射衍射图样的方法和系统
CN113406359A (zh) * 2020-03-16 2021-09-17 Fei 公司 用于背面平面视图薄片制备的方法和系统
CN113745080A (zh) * 2020-05-29 2021-12-03 Fei 公司 用于动态带对比度成像的方法和系统

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10375379B2 (en) * 2015-09-17 2019-08-06 Innolux Corporation 3D display device
GB2562694B (en) * 2016-12-12 2020-12-30 Vg Systems Ltd Image capture assembly and method for electron back scatter diffraction
JP6823563B2 (ja) 2017-07-31 2021-02-03 株式会社日立製作所 走査電子顕微鏡および画像処理装置
JP6521205B1 (ja) * 2017-10-25 2019-05-29 日本製鉄株式会社 結晶方位図生成装置、荷電粒子線装置、結晶方位図生成方法およびプログラム
EP3506332B1 (en) * 2017-12-29 2020-12-23 Jeol Ltd. Scanning electron microscope and analysis method
US10784076B2 (en) * 2018-07-05 2020-09-22 Fei Company 3D defect characterization of crystalline samples in a scanning type electron microscope
EP3705877A1 (en) 2019-03-04 2020-09-09 VG Systems Limited Methods and apparatus for electron backscatter diffraction sample characterisation
EP3736561B1 (en) * 2019-05-08 2021-05-05 Bruker Nano GmbH Method for improving an ebsd/tkd map
WO2020235091A1 (ja) * 2019-05-23 2020-11-26 株式会社日立ハイテク 荷電粒子線装置及び荷電粒子線装置の制御方法
GB2592558B (en) 2019-11-07 2022-08-24 Vg Systems Ltd Charged particle detection for spectroscopic techniques
DE102019133658A1 (de) 2019-12-10 2021-06-10 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Bearbeiten einer mikrostrukturierten Komponente
EP3882951A1 (en) * 2020-03-19 2021-09-22 FEI Company Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
GB202006638D0 (en) * 2020-05-05 2020-06-17 Oxford Instr Nanotechnology Ltd Improved camera for electron diffraction pattern analysis
EP4530616A1 (en) * 2023-09-29 2025-04-02 FEI Company Methods and systems of electron diffraction
US12607579B2 (en) 2023-09-29 2026-04-21 Fei Company Method and system for orientating a sample for inspection with charged particle microscopy
US12580150B2 (en) 2023-12-19 2026-03-17 Fei Company Systems and methods for analyzing a sample using charged particle beams and active pixel control sensors
EP4700378A1 (en) * 2024-08-22 2026-02-25 Fei Company Electron count and energy enhanced diffraction analysis

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1672236A (zh) * 2002-03-27 2005-09-21 应用材料有限公司 具有织构化的涂层的处理室部件的评估
CN101644644A (zh) * 2008-08-07 2010-02-10 Fei公司 用聚焦的粒子束加工工件的方法
US20110186734A1 (en) * 2010-01-29 2011-08-04 Masakatsu Hasuda Electron microscope and specimen analyzing method
WO2013050788A1 (en) * 2011-10-06 2013-04-11 Oxford Instruments Nanotechnology Tools Limited Apparatus and method for performing microdiffraction analysis

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7342225B2 (en) * 2002-02-22 2008-03-11 Agere Systems, Inc. Crystallographic metrology and process control
JP4022512B2 (ja) * 2003-11-14 2007-12-19 Ｔｄｋ株式会社 結晶解析方法及び結晶解析装置
DE102006043895B9 (de) * 2006-09-19 2012-02-09 Carl Zeiss Nts Gmbh Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen
EP2818852B1 (en) * 2008-11-06 2019-01-02 Nanomegas SPRL Methods and devices for high throughput crystal structure analysis by electron diffraction
US8502155B2 (en) 2009-08-04 2013-08-06 Organisation Europeenne Pour La Recherche Nucleaire Pixilated radiation sensing device
GB201105609D0 (en) * 2011-04-04 2011-05-18 Meaden Graham M Apparatus and method for determining crystallographic parameters using divergent beam diffraction patterns
JP6216515B2 (ja) * 2013-01-30 2017-10-18 株式会社日立ハイテクノロジーズ 電子ビーム装置、及び電子ビーム観察方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1672236A (zh) * 2002-03-27 2005-09-21 应用材料有限公司 具有织构化的涂层的处理室部件的评估
CN101644644A (zh) * 2008-08-07 2010-02-10 Fei公司 用聚焦的粒子束加工工件的方法
US20110186734A1 (en) * 2010-01-29 2011-08-04 Masakatsu Hasuda Electron microscope and specimen analyzing method
WO2013050788A1 (en) * 2011-10-06 2013-04-11 Oxford Instruments Nanotechnology Tools Limited Apparatus and method for performing microdiffraction analysis

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
R.R.KELLER & R.H.GEISS: "Transmission EBSD from 10 nm domains in a scattering electron microscope", 《JOURNAL OF MICROSCOPY》 *
S.DABRITZ，ET AL.: "Kossel and pseudo Kossel CCD pattern in comparison with electron backscattering diffraction diagrams", 《APPLIED SURFACE SCIENCE》 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110310876A (zh) * 2018-03-27 2019-10-08 卡尔蔡司显微镜有限责任公司 电子束显微镜
CN110310876B (zh) * 2018-03-27 2024-05-14 卡尔蔡司显微镜有限责任公司 电子束显微镜
CN109465531A (zh) * 2018-11-20 2019-03-15 清华大学 一种电子束熔丝沉积增材制造实时监控系统
CN112179928A (zh) * 2019-07-02 2021-01-05 Fei 公司 用于获取电子反向散射衍射图样的方法和系统
CN112179928B (zh) * 2019-07-02 2024-07-30 Fei公司 用于获取电子反向散射衍射图样的方法和系统
CN113406359A (zh) * 2020-03-16 2021-09-17 Fei 公司 用于背面平面视图薄片制备的方法和系统
CN113745080A (zh) * 2020-05-29 2021-12-03 Fei 公司 用于动态带对比度成像的方法和系统

Also Published As

Publication number Publication date
EP2991098A1 (en) 2016-03-02
JP2016045206A (ja) 2016-04-04
JP6253618B2 (ja) 2017-12-27
US20160054240A1 (en) 2016-02-25
EP2996139A1 (en) 2016-03-16
US9618463B2 (en) 2017-04-11

Similar Documents

Publication Publication Date Title
CN105388173A (zh) 获取ebsp图样的方法
US8093556B2 (en) Device and method for analyzing a sample
US8993961B2 (en) Electric charged particle beam microscope and electric charged particle beam microscopy
EP2738787B1 (en) Method of performing tomographic imaging of a sample in a charged-particle microscope
US9535020B2 (en) Analyzing an object using a particle beam apparatus
KR20160119840A (ko) 시료에 따른 전자 회절 패턴 분석을 수행하는 방법
US8624186B2 (en) Movable detector for charged particle beam inspection or review
JP5964055B2 (ja) 試料を加工及び／又は解析するための粒子ビーム装置及び方法
US20120112063A1 (en) Method and apparatus for generating three-dimensional image data
JP2016045206A5 (https=)
TW201706595A (zh) 缺陷判定方法、及ｘ射線檢查裝置
US9287087B2 (en) Sample observation method, sample preparation method, and charged particle beam apparatus
US8853629B2 (en) Cross-section processing and observation method and cross-section processing and observation apparatus
CN102779713A (zh) 带检测器装置的粒子束仪
US11087953B2 (en) Moveable detector
US20160274040A1 (en) Method for generating image data relating to an object and particle beam device for carrying out this method
KR102169574B1 (ko) 하전 입자 빔 장치
JP5858702B2 (ja) 複合荷電粒子ビーム装置
JP4337832B2 (ja) 電子線を用いた観察装置及び観察方法
JP5489412B2 (ja) 蛍光ｘ線分析機能付き高分解能ｘ線顕微装置
WO2019058440A1 (ja) 荷電粒子線装置
JP2008084643A (ja) 電子顕微鏡及び立体観察方法
US10319559B2 (en) Method and device for testing samples by means of an electron or ion beam microscope
US7767962B2 (en) Method for SEM measurement of features using magnetically filtered low loss electron microscopy
US8502142B2 (en) Charged particle beam analysis while part of a sample to be analyzed remains in a generated opening of the sample

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20160309