CN105353401B - Monolithic CR-39 etching method synchro measures twice222Rn、220The method of Rn concentration - Google Patents

Monolithic CR-39 etching method synchro measures twice222Rn、220The method of Rn concentration Download PDF

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CN105353401B
CN105353401B CN201510805209.XA CN201510805209A CN105353401B CN 105353401 B CN105353401 B CN 105353401B CN 201510805209 A CN201510805209 A CN 201510805209A CN 105353401 B CN105353401 B CN 105353401B
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etching
concentration
twice
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capsule
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CN105353401A (en
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谭延亮
袁红志
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Hengyang Normal University
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    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T5/00—Recording of movements or tracks of particles; Processing or analysis of such tracks
    • G01T5/02—Processing of tracks; Analysis of tracks

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Abstract

A kind of monolithic CR 39 etching method synchro measures twice222Rn、220The method of Rn concentration etches monolithic CR 39 twice, is synchronously obtained using reading twice222Rn、220Rn concentration.Its concrete operation step is as follows：CR 39 is mounted in a capsule, forms 39 solid state track detector of CR, then 39 solid state track detectors of CR are placed in surrounding air and are measured in air222Rn and220Rn concentration, time of measuring T1, CR 39 is etched twice after being measured, reads track number N under the microscope respectively1、N1.39 solid state track detectors of CR are respectively put into concentration as C again1Standard222Rn rooms and irradiation concentration are C2Standard220Rn rooms, irradiation time T2, 39 resin sheets of CR are etched twice after the completion of irradiation, read track number under the microscope respectively、、、, then it is obtained by calculation in environment222Rn and220The concentration of Rn.

Description

Monolithic CR-39 etching method synchro measures twice222Rn、220The method of Rn concentration
Technical field
It is particularly a kind of synchronous using etching method twice to monolithic CR-39 the present invention relates to nuclear radiation detection technical field Measurement222Rn、220The method of Rn concentration.
Background technology
CR-39 is the material of most widely used production ordinary resin eyeglass, and CR-39 is applied and is detected in solid state nuclear track The track of proton, neutron, α particles, heavy ion, fission fragment etc. is able to record on device, this is in Nuclear Physics and particle physics It has been used widely in research.CR-39 solid state nuclear track detectors after irradiation generally first carry out chemical etching, Ran Houyong Light microscope is observed.The principal element for influencing the etching of CR-39 tracks piece has temperature, etching solution concentration, etching period. Due to CR-39 detectors build-up effect at low cost, small, that radiation for a long time can be recorded, obtained in Environmental Radon fields of measurement To extensive use.Utilize CR-39 detectors pair222Rn、220Rn synchronizes measurement generally using two panels CR-39 and utilizes220The half-life period of Rn only has the characteristic of 55.6 seconds to distinguish222Rn、220Rn.So cause synchro measure222Rn、220The CR-39 of Rn Panel detector structure is complicated, and cost is higher.
222Rn、220Alpha-decay nucleic and alpha-particle energy in Rn decay chains are：
222Rn (5.5MeV)；218Po (6. 0MeV)；214Po (7.69MeV)。
220Rn (6.29MeV)；216Po (6. 78MeV)；212Bi (6.05MeV) ；212Po (8. 78MeV)。
Have researcher temperature be 600C, etching when concentration is small for NaOH solution, the etching period 24 of 6 mol/Ls Under the conditions of utilize CR-39 detectors pair222Rn、220The characteristic of energy response for the α particles that Rn and its daughter disintegration generate has carried out reality Research is tested, finds to be 0 to the alpha-particle detection efficiency of 8. 78MeV.
By further study showed that, after entering CR-39 due to the α particles of 8. 78MeV, when energy is higher, in its track Upper Rate of energy deposition is relatively low, and the rate of etch for causing its track direction is relatively low；When energy dropoff to a certain extent after, on its track Rate of energy deposition is higher, and the rate of etch for causing its track direction is higher, so just easily forms the hole easily observed by microscope. It follows that the CR-39 is etched again, just it is observed that the track that the α particles of 8. 78MeV are formed.
The content of the invention
A kind of used to monolithic CR-39 is provided and is etched twice the purpose of the present invention is overcoming the above-mentioned deficiency of the prior art Method synchro measure222Rn、220The method of Rn concentration.
The technical scheme is that：A kind of monolithic CR-39 etching method synchro measures twice222Rn、220The side of Rn concentration Method is etched monolithic CR-39 resin sheets, is synchronously obtained using reading twice twice222Rn、220Rn concentration.It is specific Operating procedure is as follows：
A, etching and reading process：
CR-39 is mounted in a capsule, forms a CR-39 solid state track detector, capsule is one with cover Sealing container is set on capsule there are one the filter membrane frame with filter membrane, in the shell energy isolated environment of capsule222Rn and220The son of Rn Body enters capsule, in air222Rn and220Rn can only enter capsule from the filter membrane on filter membrane frame, and CR-39 is made to be subject into capsule In interior air222Rn and220The irradiation of the different-energy high-energyα-particle emitted in Rn decay chains.
CR-39 solid state track detectors are placed in surrounding air, time T1, measure in air222Rn and220Rn is dense Degree.
CR-39 from CR-39 solid state track detectors is taken out after measurement, is put into progress first time erosion in etching solution It carves, reads track number N under the microscope1, then CR-39 is put into etching solution again and carries out second of etching, under the microscope Read track number N2。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters all phases Together or it is different from.
B, calculating process：
The reading etched twice all contains222Rn and220The contribution of Rn decay chains can obtain：
（1）
（2）
N1222、N1220Represent for the first time etch after respectively from222Rn and220The track number that Rn decay chains are formed； N2222、 N2220Represent second etch after respectively from222Rn and220The track number that Rn decay chains are formed.
To detection efficiency calibration：
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then detects CR-39 solid traces Device is put into concentration as C1Standard222Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution into Row etches for the first time, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of erosion It carves, reads track number under the microscope。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters all phases Together or it is different from.
The reading etched twice contains222The contribution of Rn decay chains can obtain：
（3）
（4）
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then detects CR-39 solid traces Device is put into concentration as C2Standard220Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution into Row etches for the first time, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of erosion It carves, reads track number under the microscope。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters all phases Together or it is different from.
The reading etched twice contains220The contribution of Rn decay chains can obtain：
(5)
(6)
By formula（3）、（4）、（5）、（6）Solve A1、A2、B1、B2；
A1It is right after the first etching of expression222The detection efficient of Rn, A2Represent right after etching second222The detection efficient of Rn, B1Represent right after etching for the first time220The detection efficient of Rn, B2Represent right after etching second220The detection efficient of Rn；
It therefore can be by formula（1）,（2）It is rewritten as：
（7）
（8）
In formula、It is in environment222Rn and220The concentration of Rn.
According to formula（7）、（8）Simultaneous solution can be just obtained in environment222Rn and220The concentration of Rn.
The present invention has following features compared with prior art：
It is relatively accurate that method provided by the invention can be obtained quickly through simple etching and computational methods222Rn and220Rn Concentration.
The detailed construction of the present invention is further described below in conjunction with the drawings and specific embodiments.
Description of the drawings
Attached drawing 1 is the structure diagram of CR-39 solid state track detectors；
Attached drawing 2 is the CR-39 track schematic diagrames after etching.
Specific embodiment
Embodiment one, a kind of monolithic CR-39 etching method synchro measure twice222Rn、220The method of Rn concentration, to monolithic CR- 39 resin sheets are etched twice, are synchronously obtained using reading twice222Rn、220Rn concentration.Its concrete operation step is such as Under：
A, etching and reading process：
CR-39 is mounted in a capsule 1, forms a CR-39 solid state track detector, capsule 1 is with cover for one Sealing container, set on capsule 1 there are one the filter membrane frame 2 with filter membrane 2-1, in the shell energy isolated environment of capsule 1222Rn With220The daughter of Rn enters capsule 1, in air222Rn and220Rn can only enter capsule 1 from the filter membrane 2-1 on filter membrane frame 2, make CR-39 is subject into air in capsule 1222Rn and220The irradiation of the different-energy high-energyα-particle emitted in Rn decay chains.
CR-39 solid state track detectors are placed in surrounding air, time T1, measure in air222Rn and220Rn is dense Degree.
CR-39 from CR-39 solid state track detectors is taken out after measurement, is put into progress first time erosion in etching solution It carves, reads track number N under the microscope1, then CR-39 is put into etching solution again and carries out second of etching, under the microscope Read track number N2。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters all phases Together.
B, calculating process：
The reading etched twice all contains222Rn and220The contribution of Rn decay chains can obtain：
（1）
（2）
N1222、N1220Represent for the first time etch after respectively from222Rn and220The track number that Rn decay chains are formed； N2222、 N2220Represent second etch after respectively from222Rn and220The track number that Rn decay chains are formed.
To detection efficiency calibration：
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then detects CR-39 solid traces Device is put into concentration as C1Standard222Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution into Row etches for the first time, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of erosion It carves, reads track number under the microscope。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters all phases Together.
The reading etched twice contains222The contribution of Rn decay chains can obtain：
（3）
（4）
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then detects CR-39 solid traces Device is put into concentration as C2Standard220Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution into Row etches for the first time, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of erosion It carves, reads track number under the microscope。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters all phases Together.
The reading etched twice contains220The contribution of Rn decay chains can obtain：
(5)
(6)
By formula（3）、（4）、（5）、（6）Solve A1、A2、B1、B2；
A1It is right after the first etching of expression222The detection efficient of Rn, A2Represent right after etching second222The detection efficient of Rn, B1Represent right after etching for the first time220The detection efficient of Rn, B2Represent right after etching second220The detection efficient of Rn；
It therefore can be by formula（1）,（2）It is rewritten as：
（7）
（8）
In formula、It is in environment222Rn and220The concentration of Rn.
According to formula（7）、（8）Simultaneous solution can be just obtained in environment222Rn and220The concentration of Rn.
Embodiment two, a kind of monolithic CR-39 etching method synchro measure twice222Rn、220The method of Rn concentration, to monolithic CR- 39 resin sheets are etched twice, are synchronously obtained using reading twice222Rn、220Rn concentration.Its concrete operation step is such as Under：
A, etching and reading process：
CR-39 is mounted in a capsule 1, forms a CR-39 solid state track detector, capsule 1 is with cover for one Sealing container, set on capsule 1 there are one the filter membrane frame 2 with filter membrane 2-1, in the shell energy isolated environment of capsule 1222Rn With220The daughter of Rn enters capsule 1, in air222Rn and220Rn can only enter capsule 1 from the filter membrane 2-1 on filter membrane frame 2, make CR-39 is subject into air in capsule 1222Rn and220The irradiation of the different-energy high-energyα-particle emitted in Rn decay chains.
CR-39 solid state track detectors are placed in surrounding air, time T1, measure in air222Rn and220Rn is dense Degree.
CR-39 from CR-39 solid state track detectors is taken out after measurement, is put into progress first time erosion in etching solution It carves, reads track number N under the microscope1, then CR-39 is put into etching solution again and carries out second of etching, under the microscope Read track number N2。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters are not It is identical.
B, calculating process：
The reading etched twice all contains222Rn and220The contribution of Rn decay chains can obtain：
（1）
（2）
N1222、N1220Represent for the first time etch after respectively from222Rn and220The track number that Rn decay chains are formed； N2222、 N2220Represent second etch after respectively from222Rn and220The track number that Rn decay chains are formed.
To detection efficiency calibration：
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then detects CR-39 solid traces Device is put into concentration as C1Standard222Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution into Row etches for the first time, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of erosion It carves, reads track number under the microscope。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters are not It is identical.
The reading etched twice contains222The contribution of Rn decay chains can obtain：
（3）
（4）
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then detects CR-39 solid traces Device is put into concentration as C2Standard220Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution into Row etches for the first time, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of erosion It carves, reads track number under the microscope。
To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters are not It is identical.
The reading etched twice contains220The contribution of Rn decay chains can obtain：
(5)
(6)
By formula（3）、（4）、（5）、（6）Solve A1、A2、B1、B2；
A1It is right after the first etching of expression222The detection efficient of Rn, A2Represent right after etching second222The detection efficient of Rn, B1Represent right after etching for the first time220The detection efficient of Rn, B2Represent right after etching second220The detection efficient of Rn；
It therefore can be by formula（1）,（2）It is rewritten as：
（7）
（8）
In formula、It is in environment222Rn and220The concentration of Rn.
According to formula（7）、（8）Simultaneous solution can be just obtained in environment222Rn and220The concentration of Rn.

Claims (3)

1. a kind of monolithic CR-39 etching method synchro measures twice222Rn、220The method of Rn concentration, it is characterized in that：To monolithic CR-39 Resin sheet is etched twice, is synchronously obtained using reading twice222Rn、220Rn concentration, concrete operation step are as follows：
A, etching and reading process：
CR-39 is mounted in a capsule, forms a CR-39 solid state track detector, capsule is a sealing with cover Container is set on capsule there are one the filter membrane frame with filter membrane, in the shell energy isolated environment of capsule222Rn and220The daughter of Rn into Enter capsule, in air222Rn and220Rn can only enter capsule from the filter membrane on filter membrane frame, and CR-39 is made to be subject into empty in capsule In gas222Rn and220The irradiation of the different-energy high-energyα-particle emitted in Rn decay chains；
CR-39 solid state track detectors are placed in surrounding air, time T1, measure in air222Rn and220Rn concentration；
CR-39 from CR-39 solid state track detectors is taken out after measurement, is put into progress first time etching in etching solution, Track number N is read under the microscope1, then CR-39 is put into etching solution again and carries out second of etching, is read under the microscope Track number N2；
B, calculating process：
The reading etched twice all contains222Rn and220The contribution of Rn decay chains can obtain：
（1）
（2）
N1222、N1220Represent for the first time etch after respectively from222Rn and220The track number that Rn decay chains are formed； N2222、N2220 Represent second etch after respectively from222Rn and220The track number that Rn decay chains are formed；
To detection efficiency calibration：
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then puts CR-39 solid state track detectors Enter concentration for C1Standard222Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution and carry out the It once etches, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of etching, Track number is read under the microscope；
The reading etched twice contains222The contribution of Rn decay chains can obtain：
（3）
（4）
It is put into not by the CR-39 of irradiation in CR-39 solid state track detectors, then puts CR-39 solid state track detectors Enter concentration for C2Standard220Rn rooms, by 10 days or more long-time T2Irradiation after, take out CR-39, be put into etching solution and carry out the It once etches, reads track number under the microscope, then CR-39 is put into etching solution again and carries out second of etching, Track number is read under the microscope；
The reading etched twice contains220The contribution of Rn decay chains can obtain：
(5)
(6)
By formula（3）、（4）、（5）、（6）Solve A1、A2、B1、B2；
A1It is right after the first etching of expression222The detection efficient of Rn, A2Represent right after etching second222The detection efficient of Rn, B1Table It is right after etching for the first time to show220The detection efficient of Rn, B2Represent right after etching second220The detection efficient of Rn；
It therefore can be by formula（1）,（2）It is rewritten as：
（7）
（8）
In formula、It is in environment222Rn and220The concentration of Rn；
According to formula（7）、（8）Simultaneous solution can be just obtained in environment222Rn and220The concentration of Rn.
2. a kind of monolithic CR-39 as described in claim 1 etching method synchro measures twice222Rn、220The method of Rn concentration, It is characterized in：To obtain optimal etch effect, etching solution for etching formula twice, temperature, etching period these parameters all phases Together.
3. a kind of monolithic CR-39 as described in claim 1 etching method synchro measures twice222Rn、220The method of Rn concentration, It is characterized in：Etching solution for etching formula twice, temperature, these parameters of etching period are different from.
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CN109307881B (en) * 2018-11-27 2023-06-16 衡阳师范学院 Measurement of 222 Rn、 220 Device and method for eliminating temperature and humidity effect during Rn average concentration
CN109541666B (en) * 2018-11-27 2023-09-05 衡阳师范学院 Measurement of 222 Device and method for eliminating temperature and humidity effect during Rn average concentration
CN111551979B (en) * 2020-05-27 2022-06-03 北京市化工职业病防治院 Solid nuclear track-based radioactive radon and thorium emanator concentration detection method

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