CN105353170A - Nano step sample scanning measurement type scanning electron microscope - Google Patents
Nano step sample scanning measurement type scanning electron microscope Download PDFInfo
- Publication number
- CN105353170A CN105353170A CN201510873126.4A CN201510873126A CN105353170A CN 105353170 A CN105353170 A CN 105353170A CN 201510873126 A CN201510873126 A CN 201510873126A CN 105353170 A CN105353170 A CN 105353170A
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- Prior art keywords
- electron microscope
- sample
- interferometer
- displacement
- scanning electron
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/20—Sample handling devices or methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
Abstract
The invention relates to a nano step sample scanning measurement type scanning electron microscope. A two-dimensional laser interferometer comprises two interferometers, the interferometers are respectively positioned in the X direction and the Y direction of a measured sample, a light source for the interferometers is introduced from a laser through an optical fiber, penetrates through a vacuum window plate of a glass window and is split into two beams in the electron microscope, and the two beams of light are respectively incident to the two interferometers; when an ultrasonic motor rough adjustment displacement table performs scanning motion, a beam of emergent interference light is incident to a photoelectric detector through a vacuum window as an X-axis displacement data signal of the mobile station; the other beam of interference light is reflected by a flat reflector and then is incident to the interferometer close to a cabin door, and the emergent interference light is received by the other detector as a Y-axis displacement data signal of the mobile station; the X-axis and Y-axis displacement data are matched with the electron microscope to acquire secondary electronic signals exited by electron beams on the surface of the sample, thus obtaining measured data traced by the laser interferometer. The electron microscope can directly trace the measurement value to national standard meter.
Description
Technical field
The present invention relates to Scanning electron microscopy field, particularly a kind of nanometer stepping Sample Scan metering type scanning electron microscope.
Background technology
Scanning electron microscope (SEM), as a kind of effective microstructure analysis instrument, can carry out observation and the analysis on the surface of various ways to various material.The microscopical feature of Scanning Electron is: the structure directly can observing the surface of sample; The depth of field is large, and image is rich in stereoscopic sensation; The amplification range of image is wide, and resolution is also higher; While observation pattern, other signals sent from sample also can be utilized to make Microanalysis, be used for observing the various shape characteristics of sample.
Scanning electron microscope utilizes focused beam in sample surfaces point by point scanning usually, and interacting with sample produces secondary electron, backscattered electron etc.Wherein the number of secondary electron is relevant with electron beam incident angle, that is relevant with the surface structure of sample, electronic secondary is collected by detecting body, and changed into light signal by scintillater there, be that electric signal is to control the intensity of electron beam on video screen through photomultiplier and amplifier transfers again, demonstrate the scan image synchronous with electron beam, reflect the surface structure of sample.
Scanning electron microscope due to routine uses the deflection of coil control electron beam to realize scanning and obtains image, therefore the enlargement ratio of scanning electron microscope image and pattern distortion are subject to the electric current image impact of coil, and often unpredictable and control, make scanning electron microscopy measurement uncertainty evaluation be difficult to carry out.
Therefore, prior art existing defects, needs further improvement and development.
Summary of the invention
The object of this invention is to provide a kind of electron microscope that its measured value directly can be traceable to the standard of meter Ding Yi National primary standard.
To achieve these goals, the present invention adopts following technical scheme:
A kind of nanometer stepping Sample Scan metering type scanning electron microscope, wherein, comprises high speed nanometer displacement and sweeps
Retouch platform, two-dimensional laser interferometer and ultrasound electric machine coarse adjustment displacement platform:
Described ultrasound electric machine coarse adjustment displacement platform fixes described high speed nanometer displacement scan table, described high speed nanometer displacement scan table is arranged the pole shoe of sample stage and Electronic Speculum electron gun;
Described two-dimensional laser interferometer comprises two interferometers, interferometer lays respectively at measures the position of sample in X-direction and Y-direction, and the light source of interferometer is introduced from laser instrument by optical fiber, through the vacuum window sheet of windowpane, in Electronic Speculum, be divided into two bundles, incide two interference mirrors respectively;
The electron gun divergent bundle of electron microscope is to sample surfaces, and the secondary electron of generation is received by Electronic Speculum receiver, and high speed nanometer platform drives sample high-velocity scanning;
When described ultrasound electric machine coarse adjustment displacement platform does scanning motion, an outgoing interference light incides photodetector as displacement platform X-axis displacement data signal through vacuum window; Another beam interferometer light is the incident interferometer near hatch door after plane mirror reflection, and outgoing interference light is received as displacement platform Y-axis displacement data signal by another detector;
Described X, Y-axis displacement data coordinate Electronic Speculum collected specimens surface by the secondary electron signal of electron-beam excitation, obtain the measurement data of tracing to the source through laser interferometer.
Described metering type scanning electron microscope, wherein, described two-dimensional laser interferometer comprises laser beam incident optical, through hole flange, vacuum window sheet, cube spectroscope, elastic hinge, plane mirror, receiver, interferometer and L-type two dimension catoptron.
Described metering type scanning electron microscope, wherein, the ultrasound electric machine coarse adjustment displacement platform of described coil connects described high speed nanometer displacement scan table by the first engagement plate, described high speed nanometer displacement scan table connects fine-tuning sample stage by the second engagement plate, described fine-tuning sample stage is arranged the pole shoe of sample and Electronic Speculum electron gun.
Described metering type scanning electron microscope, wherein, the natural resonance frequency of described elastic hinge can higher than 200Hz.
Described metering type scanning electron microscope, wherein, L shape two dimension reflecting mirror material is devitrified glass.
Described metering type scanning electron microscope, wherein, described interferometer is 2 times of Cheng Guanglu, and the one-period of interference signal corresponds to 158nm, and the interference signal of one-period segments through oversampling circuit 1024 or 2048, and resolving power is 0.15nm or 0.075nm.
The invention provides a kind of standard measuring equipment that its measured value directly can be traceable to meter Ding Yi National primary standard, its measuring method directly on the sample stage of scanning electron microscope, connects laser interferometer, the length to be measured on sample is measured by the signal of the displacement of synchro measure sample and the secondary electron of sample or backscattered electron, measured value can directly be traced to the source to meter Ding Yi international unit, this is a kind of absolute method of measurement, do not use electron beam scanning with the maximum difference of the scanning electron microscope of routine, the beam spot of Electronic Speculum remains static when imaging measurement, measurement image is obtained by the scanning motion of the high-speed displacement platform that carry sample.The displacement of laser interferometer to displacement platform is used to measure, the measurement mirror of laser interferometer is cemented on displacement platform, the displacement of the displacement platform obtained measured by such laser interferometer directly can be traceable to optical maser wavelength and meter Ding Yi SI unit, thus realizes the magnitude tracing of metering type sweep electron microscopic measure value.
Accompanying drawing explanation
Fig. 1 is the structural representation of nanometer stepping Sample Scan metering type scanning electron microscope of the present invention;
Fig. 2 is the structural representation of interferometer measurement light path of the present invention.
Embodiment
Below in conjunction with preferred embodiment, the present invention is described in further details.
A kind of nanometer stepping Sample Scan metering type scanning electron microscope provided by the invention comprises high speed nanometer displacement scan table, two-dimensional laser interferometer and ultrasound electric machine coarse adjustment displacement platform, and described ultrasound electric machine coarse adjustment displacement platform does not comprise the coil controlling deflection of a beam of electrons.For reducing Electron Beam Drift to the impact of measuring, described ultrasound electric machine coarse adjustment displacement platform adopts the natural resonance frequency when load 0.5kg can reach the nanometer displacement scan table of the elastic hinge system of more than 200Hz.The present invention's two-dimensional laser interferometer is for measuring the position of sample stage, and laser beam and the Electronic Speculum electron beam of both direction are given a bit, reduces to measure Abbe error, and interferometer is positioned at Electronic Speculum inside, and laser is introduced by optical fiber, in the inner light splitting of Electronic Speculum.The measurement catoptron of two-dimensional laser interferometer is fixed on sample stage 24, along with Sample Scan moves.
Described two-dimensional laser interferometer, as depicted in figs. 1 and 2, comprises laser beam incident optical 10, through hole flange 11, vacuum window sheet 17, cube spectroscope 12, elastic hinge 13, plane mirror 14, receiver 16, interferometer 15 and L-type two dimension catoptron 25.
The ultrasound electric machine coarse adjustment displacement platform 20 of described coil, as shown in Figure 1, described high speed nanometer displacement scan table 22 is connected by the first engagement plate 21, described high speed nanometer displacement scan table 22 connects fine-tuning sample stage 24 by the second engagement plate 23, described fine-tuning sample stage 24 is arranged the pole shoe 27 of sample 26 and Electronic Speculum electron gun, these sample stage coarse positioning structures formed.
The laser interferometry light path of described two-dimensional laser interferometer, as shown in Figure 2, comprise two interferometers 15, interferometer 15 lays respectively at measures the position of sample in XY direction, the light source of interferometer 15 is introduced from laser instrument by optical fiber 10, through the vacuum window sheet 17 of windowpane, in Electronic Speculum, be divided into two bundles, incide two interference mirrors respectively.
The vacuum window of light through Electronic Speculum side door (11,17) sent from optical fiber 10 injects Electronic Speculum vacuum chamber, is divided into two-beam through spectroscope 12, a branch of interferometer 15 directly injected away from hatch door.When ultrasound electric machine coarse adjustment displacement platform 22 does scanning motion, its outgoing interference light incides photodetector 16 as displacement platform X-axis displacement data signal through vacuum window; Another light beam is the incident interferometer 15 near hatch door after plane mirror 25 reflects, and when ultrasound electric machine coarse adjustment displacement platform 22 does scanning motion, outgoing interference light is received as displacement platform Y-axis displacement data signal by another detector.This X, Y-axis displacement data coordinate after machine process Electronic Speculum collected specimens surface by the secondary electron signal of electron-beam excitation as calculated, finally obtain the measurement data of tracing to the source through laser interferometer.
The ultrasound electric machine coarse adjustment displacement platform 20 of coil is used as Sample location, and ultrasound electric machine does not have magnetic field, can not affect electron beam.Ultrasound electric machine coarse adjustment displacement platform 20 is high speed nanometer displacement scan tables 22, is fixed by the first engagement plate 21.Nanometer displacement scan table 22 carries sample stage 24 and two-dimentional catoptron 25.Sample stage 24 carries out the pitching fine setting of surface level rotary fine adjustment and vertical plane by the fine adjustment screw being positioned at two-arm, can place sample 26 in the heart in sample stage.Catoptron 25 is for the laser of reflection interferometer, and measure sample position, the position of interferometer measurement is synchronous with electronic signal, obtains sample two-dimensional surface image.
Interferometer of the present invention is 2 times of Cheng Guanglu, light beam is turned back 2 times between interference mirror and measurement mirror, the one-period of interference signal corresponds to 158nm, and the interference signal of one-period segments through oversampling circuit 1024 or 2048 simultaneously, and final resolving power is 0.15nm or 0.075nm.
The electron gun divergent bundle of metering type scanning electron microscope of the present invention is to sample surfaces, and the secondary electron of generation is received by Electronic Speculum receiver, and high speed nanometer platform drives sample high-velocity scanning, and the sweep velocity of nanometer platform reaches 200Hz.Sample stage carries L shape two dimension catoptron, L shape two dimension reflecting mirror material is devitrified glass, to reduce the expansion that temperature variation causes.The displacement of laser interferometer measurement displacement platform, is directly traceable to optical maser wavelength and meter Ding Yi SI unit by measured value.
The invention provides a kind of standard measuring equipment that its measured value directly can be traceable to meter Ding Yi National primary standard, its measuring method directly on the sample stage of scanning electron microscope, connects laser interferometer, the length to be measured on sample is measured by the signal of the displacement of synchro measure sample and the secondary electron of sample or backscattered electron, measured value can directly be traced to the source to meter Ding Yi international unit, this is a kind of absolute method of measurement, do not use electron beam scanning with the maximum difference of the scanning electron microscope of routine, the beam spot of Electronic Speculum remains static when imaging measurement, measurement image is obtained by the scanning motion of the high-speed displacement platform that carry sample.The displacement of laser interferometer to displacement platform is used to measure, the measurement mirror of laser interferometer is cemented on displacement platform, the displacement of the displacement platform obtained measured by such laser interferometer directly can be traceable to optical maser wavelength and meter Ding Yi SI unit, thus realizes the magnitude tracing of metering type sweep electron microscopic measure value.
Above content is the explanation to preferred embodiment of the present invention, and those skilled in the art can be helped to understand technical scheme of the present invention more fully.But these embodiments only illustrate, can not assert that the specific embodiment of the present invention is only limitted to the explanation of these embodiments.
Claims (6)
1. a nanometer stepping Sample Scan metering type scanning electron microscope, is characterized in that, comprises high speed nanometer displacement scan table, two-dimensional laser interferometer and ultrasound electric machine coarse adjustment displacement platform:
Described ultrasound electric machine coarse adjustment displacement platform fixes described high speed nanometer displacement scan table, described high speed nanometer displacement scan table is arranged the pole shoe of sample stage and Electronic Speculum electron gun;
Described two-dimensional laser interferometer comprises two interferometers, interferometer lays respectively at measures the position of sample in X-direction and Y-direction, and the light source of interferometer is introduced from laser instrument by optical fiber, through the vacuum window sheet of windowpane, in Electronic Speculum, be divided into two bundles, incide two interference mirrors respectively;
The electron gun divergent bundle of electron microscope is to sample surfaces, and the secondary electron of generation is received by Electronic Speculum receiver, and high speed nanometer platform drives sample high-velocity scanning;
When described ultrasound electric machine coarse adjustment displacement platform does scanning motion, an outgoing interference light incides photodetector as displacement platform X-axis displacement data signal through vacuum window; Another beam interferometer light is the incident interferometer near hatch door after plane mirror reflection, and outgoing interference light is received as displacement platform Y-axis displacement data signal by another detector;
Described X, Y-axis displacement data coordinate Electronic Speculum collected specimens surface by the secondary electron signal of electron-beam excitation, obtain the measurement data of tracing to the source through laser interferometer.
2. metering type scanning electron microscope according to claim 1, it is characterized in that, described two-dimensional laser interferometer comprises laser beam incident optical, through hole flange, vacuum window sheet, cube spectroscope, elastic hinge, plane mirror, receiver, interferometer and L-type two dimension catoptron.
3. metering type scanning electron microscope according to claim 2, it is characterized in that, the ultrasound electric machine coarse adjustment displacement platform of described coil connects described high speed nanometer displacement scan table by the first engagement plate, described high speed nanometer displacement scan table connects fine-tuning sample stage by the second engagement plate, described fine-tuning sample stage is arranged the pole shoe of sample and Electronic Speculum electron gun.
4. metering type scanning electron microscope according to claim 3, is characterized in that, the natural resonance frequency of described elastic hinge can higher than 200Hz.
5. metering type scanning electron microscope according to claim 3, is characterized in that, L shape two dimension reflecting mirror material is devitrified glass.
6. metering type scanning electron microscope according to claim 3, it is characterized in that, described interferometer is 2 times of Cheng Guanglu, and the one-period of interference signal corresponds to 158nm, the interference signal of one-period segments through oversampling circuit 1024 or 2048, and resolving power is 0.15nm or 0.075nm.
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| CN201510873126.4A CN105353170B (en) | 2015-12-04 | 2015-12-04 | Nano stepping sample scanning metering type scanning electron microscope |
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| CN201510873126.4A CN105353170B (en) | 2015-12-04 | 2015-12-04 | Nano stepping sample scanning metering type scanning electron microscope |
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| CN105353170B CN105353170B (en) | 2023-06-13 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109727241A (en) * | 2018-12-28 | 2019-05-07 | 天津航天长征火箭制造有限公司 | A kind of Tank of Spacecraft fifth wheel testing and analysis system |
| CN112379129A (en) * | 2020-11-16 | 2021-02-19 | 付学文 | High-space-time resolution multi-mode carrier dynamics measurement system and measurement method |
| CN113406358A (en) * | 2021-06-09 | 2021-09-17 | 北京科技大学 | Scanning electron microscope teaching model device and using method thereof |
| CN113534402A (en) * | 2021-07-13 | 2021-10-22 | 万灵帮桥医疗器械(广州)有限责任公司 | Reflector adjusting device |
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| JP2004191277A (en) * | 2002-12-13 | 2004-07-08 | Hitachi Ltd | Scanning probe microscope and its measurement method |
| CN102680741A (en) * | 2012-05-21 | 2012-09-19 | 中国科学院电工研究所 | Metering type scanning electronic microscope imaging control system and scanning imaging method |
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Patent Citations (2)
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| JP2004191277A (en) * | 2002-12-13 | 2004-07-08 | Hitachi Ltd | Scanning probe microscope and its measurement method |
| CN102680741A (en) * | 2012-05-21 | 2012-09-19 | 中国科学院电工研究所 | Metering type scanning electronic microscope imaging control system and scanning imaging method |
Non-Patent Citations (1)
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109727241A (en) * | 2018-12-28 | 2019-05-07 | 天津航天长征火箭制造有限公司 | A kind of Tank of Spacecraft fifth wheel testing and analysis system |
| CN112379129A (en) * | 2020-11-16 | 2021-02-19 | 付学文 | High-space-time resolution multi-mode carrier dynamics measurement system and measurement method |
| CN113406358A (en) * | 2021-06-09 | 2021-09-17 | 北京科技大学 | Scanning electron microscope teaching model device and using method thereof |
| CN113406358B (en) * | 2021-06-09 | 2022-06-24 | 北京科技大学 | Scanning electron microscope teaching model device and using method thereof |
| CN113534402A (en) * | 2021-07-13 | 2021-10-22 | 万灵帮桥医疗器械(广州)有限责任公司 | Reflector adjusting device |
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| CN105353170B (en) | 2023-06-13 |
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