CN105353170B - Nano stepping sample scanning metering type scanning electron microscope - Google Patents

Nano stepping sample scanning metering type scanning electron microscope Download PDF

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CN105353170B
CN105353170B CN201510873126.4A CN201510873126A CN105353170B CN 105353170 B CN105353170 B CN 105353170B CN 201510873126 A CN201510873126 A CN 201510873126A CN 105353170 B CN105353170 B CN 105353170B
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electron microscope
scanning
sample
displacement
interferometer
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CN105353170A (en
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高思田
李伟
施玉书
李琪
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National Institute of Metrology
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National Institute of Metrology
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/20Sample handling devices or methods
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q30/00Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
    • G01Q30/02Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope

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  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

The invention relates to a nano stepping sample scanning metering type scanning electron microscope, a two-dimensional laser interferometer comprises two interferometers, the interferometers are respectively positioned at the positions of a measured sample in the X direction and the Y direction, a light source of each interferometer is led in from a laser through an optical fiber, passes through a vacuum window sheet of a glass window, is divided into two beams in the electron microscope, and respectively enters the two interferometers; when the ultrasonic motor coarsely adjusts the displacement table to do scanning movement, one emergent interference light enters the photoelectric detector through the vacuum window to serve as an X-axis displacement data signal of the displacement table; the other beam of interference light is reflected by the plane reflector and then enters the interferometer close to the cabin door, and the emergent interference light is received by the other detector and used as a Y-axis displacement data signal of the displacement table; and X, Y axis displacement data are matched with an electron microscope to collect secondary electron signals excited by electron beams on the surface of the sample, so that measurement data traced by a laser interferometer are obtained. An electron microscope is provided that can directly trace its measurements to a standard that defines a national benchmark.

Description

Nano stepping sample scanning metering type scanning electron microscope
Technical Field
The invention relates to the technical field of scanning electron microscopes, in particular to a nano stepping sample scanning metering type scanning electron microscope.
Background
Scanning Electron Microscopy (SEM) is an effective tool for microscopic structural analysis to allow various forms of surface observation and analysis of various materials. The scanning electron microscope is characterized in that: the structure of the surface of the sample can be directly observed; the depth of field is large, and the image is rich in stereoscopic impression; the image has wide amplification range and higher resolution; other signals from the sample can be used for micro-area component analysis while observing the morphology, so as to observe various morphological characteristics of the sample.
Scanning electron microscopes typically utilize a focused electron beam that scans point-by-point across the surface of a sample, interacting with the sample to produce secondary electrons, backscattered electrons, and the like. The secondary electrons are collected by the detector and converted into optical signals by the scintillator, and then converted into electric signals by the photomultiplier and the amplifier to control the intensity of the electron beam on the fluorescent screen, so that a scanning image synchronous with the electron beam is displayed and the surface structure of the specimen is reflected.
Because a conventional scanning electron microscope uses a coil to control deflection of an electron beam to realize scanning to obtain an image, magnification and image distortion of the image of the scanning electron microscope are affected by current images of the coil and cannot be predicted and controlled, so that measurement uncertainty assessment of the scanning electron microscope is difficult to carry out.
Accordingly, the prior art has drawbacks and needs to be further improved and developed.
Disclosure of Invention
The invention aims to provide an electron microscope which can directly trace the measured value to the standard of the national standard defined by meters.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
a nano step sample scanning metering type scanning electron microscope includes high-speed nano displacement scanning
A description table, a two-dimensional laser interferometer and an ultrasonic motor coarse adjustment displacement table:
the ultrasonic motor coarse adjustment displacement table is used for fixing the high-speed nano displacement scanning table, and a sample table and a pole shoe of an electron gun of the electron microscope are arranged on the high-speed nano displacement scanning table;
the two-dimensional laser interferometer comprises two interferometers, the interferometers are respectively positioned at the positions of a measurement sample in the X direction and the Y direction, a light source of the interferometers is led in from the laser through optical fibers, passes through a vacuum window sheet of a glass window, is divided into two beams in an electron microscope, and is respectively incident to the two interferometers;
an electron gun of the electron microscope emits electron beams to the surface of the sample, the generated secondary electrons are received by an electron microscope receiver, and the high-speed nano-table drives the sample to scan at a high speed;
when the ultrasonic motor coarsely adjusts the displacement table to do scanning motion, one emergent interference light enters the photoelectric detector through the vacuum window to serve as an X-axis displacement data signal of the displacement table; the other beam of interference light is reflected by the plane reflector and then enters the interferometer close to the cabin door, and the emergent interference light is received by the other detector and used as a Y-axis displacement data signal of the displacement table;
and X, Y axis displacement data are matched with an electron microscope to collect secondary electron signals excited by electron beams on the surface of the sample, so that measurement data traced by a laser interferometer are obtained.
The metering type scanning electron microscope, wherein, the two-dimensional laser interferometer comprises a laser beam incident optical fiber, a through hole flange, a vacuum window sheet, a cube spectroscope, an elastic hinge, a plane reflecting mirror, a receiver, an interferometer and an L-shaped two-dimensional reflecting mirror.
The metering type scanning electron microscope comprises a coil-free ultrasonic motor coarse adjustment displacement table, a high-speed nanometer displacement scanning table, a fine adjustment sample table and a pole shoe, wherein the coil-free ultrasonic motor coarse adjustment displacement table is connected with the high-speed nanometer displacement scanning table through a first connecting plate, the high-speed nanometer displacement scanning table is connected with the fine adjustment sample table through a second connecting plate, and a measured sample and an electron gun pole shoe of the electron gun of the electron microscope are arranged on the fine adjustment sample table.
The metering scanning electron microscope, wherein the natural resonant frequency of the elastic hinge can be higher than 200Hz.
The metering type scanning electron microscope is characterized in that the L-shaped two-dimensional reflecting mirror material is microcrystalline glass.
The metering scanning electron microscope is characterized in that the interferometer is a 2-time path, one period of the interference signal corresponds to 158nm, the interference signal of one period is subdivided by a circuit 1024 or 2048, and the resolution is 0.15nm or 0.075nm.
The invention provides a standard measuring device capable of directly tracing a measured value to a meter definition national standard, wherein the measuring method is that a laser interferometer is directly connected to a sample stage of a scanning electron microscope, the length to be measured on the sample is measured by synchronously measuring the displacement of the sample and a secondary electron or back scattering electron signal of the sample, the measured value can be traced directly to a meter definition international unit, the absolute measuring method is the largest difference from the conventional scanning electron microscope is that electron beam scanning is not used, the electron beam spot of the electron microscope is in a static state during imaging measurement, and a measuring image is obtained through the scanning movement of a high-speed displacement stage carrying the measured sample. And measuring the displacement of the displacement platform by using a laser interferometer, wherein a measuring mirror of the laser interferometer is fixedly connected to the displacement platform, so that the displacement of the displacement platform measured by the laser interferometer can be directly traced to a laser wavelength and meter definition SI unit, and the magnitude tracing of the measurement value of the metering scanning electron microscope is realized.
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FIG. 1 is a schematic diagram of a nano-step sample scanning metering scanning electron microscope according to the present invention;
FIG. 2 is a schematic diagram of the structure of the interferometer measuring light path of the present invention.
Detailed Description
The invention will be described in further detail with reference to preferred embodiments.
The invention provides a nano stepping sample scanning metering type scanning electron microscope which comprises a high-speed nano displacement scanning table, a two-dimensional laser interferometer and an ultrasonic motor coarse adjustment displacement table, wherein the ultrasonic motor coarse adjustment displacement table does not comprise a coil for controlling deflection of an electron beam. In order to reduce the influence of electron beam drift on measurement, the ultrasonic motor coarse adjustment displacement table adopts a nano displacement scanning table of an elastic hinge system, wherein the natural resonant frequency of the nano displacement scanning table can reach more than 200Hz when the ultrasonic motor coarse adjustment displacement table is loaded with 0.5 kg. The invention uses a two-dimensional laser interferometer to measure the position of a sample stage, the laser beams in two directions intersect with electron beams of an electron microscope at one point, the Abbe error is reduced, the interferometer is positioned in the electron microscope, and the laser is led in through an optical fiber and is partially split in the electron microscope. The measurement mirror of the two-dimensional laser interferometer is fixed to the sample stage 24 and moves with the sample scanning.
The two-dimensional laser interferometer, as shown in fig. 1 and 2, comprises a laser beam incident optical fiber 10, a through hole flange 11, a vacuum window sheet 17, a cube spectroscope 12, an elastic hinge 13, a plane mirror 14, a receiver 16, an interferometer 15 and an L-shaped two-dimensional mirror 25.
The coil-free ultrasonic motor coarse adjustment displacement table 20 is, as shown in fig. 1, connected with the high-speed nano displacement scanning table 22 through a first connecting plate 21, the high-speed nano displacement scanning table 22 is connected with a fine adjustment sample table 24 through a second connecting plate 23, and the fine adjustment sample table 24 is provided with a sample 26 to be measured and a pole shoe 27 of an electron gun of an electron microscope, and the sample table coarse adjustment positioning structure is formed by the sample table coarse adjustment positioning structure.
The laser interferometry optical path of the two-dimensional laser interferometer, as shown in fig. 2, includes two interferometers 15, the interferometers 15 are respectively located at positions of the measurement sample in XY directions, a light source of each interferometer 15 is introduced from the laser through an optical fiber 10, passes through a vacuum window sheet 17 of a glass window, is divided into two beams in an electron microscope, and is respectively incident to the two interferometers.
Light emitted from the optical fiber 10 is emitted into the electron microscope vacuum cabin through vacuum windows (11, 17) on the electron microscope side door, and is divided into two beams of light through the spectroscope 12, and one beam of light is directly emitted into an interferometer 15 far away from the cabin door. When the ultrasonic motor coarse adjustment displacement table 22 performs scanning movement, the emergent interference light of the ultrasonic motor coarse adjustment displacement table is incident to the photoelectric detector 16 through the vacuum window and is used as an X-axis displacement data signal of the displacement table; the other beam of light is reflected by the plane mirror 25 and then enters the interferometer 15 near the cabin door, and when the ultrasonic motor coarse adjustment displacement table 22 performs scanning movement, the emergent interference light is received by the other detector and used as a displacement table Y-axis displacement data signal. The X, Y axis displacement data is processed by a computer and matched with an electron microscope to collect secondary electron signals excited by electron beams on the surface of a sample, and finally the measurement data traced by a laser interferometer are obtained.
The coil-free ultrasonic motor coarse adjustment displacement table 20 is used for positioning a sample, and the ultrasonic motor has no magnetic field and does not influence the electron beam. The ultrasonic motor coarse adjustment displacement table 20 is provided with a high-speed nano displacement scanning table 22, and is fixed through a first connecting plate 21. The nano-displacement scanning stage 22 carries a sample stage 24 and a two-dimensional mirror 25. The sample stage 24 can be subjected to horizontal plane rotation fine adjustment and vertical plane pitching fine adjustment by fine adjustment screws positioned on two arms, and a sample 26 to be measured can be placed on the center of the sample stage. The reflecting mirror 25 is used for reflecting laser light of the interferometer, measuring the position of the sample, and synchronizing the position measured by the interferometer with the electronic signal to obtain a two-dimensional surface image of the sample.
The interferometer is a 2-time path, a light beam is folded back between the interference mirror and the measuring mirror for 2 times, one period of an interference signal corresponds to 158nm, meanwhile, the interference signal of one period is subdivided by a circuit 1024 or 2048, and the final resolution is 0.15nm or 0.075nm.
The electron gun of the metering scanning electron microscope emits electron beams to the surface of the sample, the generated secondary electrons are received by the electron microscope receiver, the high-speed nano-stage drives the sample to scan at a high speed, and the scanning speed of the nano-stage reaches 200Hz. The sample table is provided with an L-shaped two-dimensional reflecting mirror, and the L-shaped two-dimensional reflecting mirror is made of microcrystalline glass so as to reduce expansion caused by temperature change. The laser interferometer measures the displacement of the displacement platform, and directly traces the measured value to the laser wavelength and meter to define SI units.
The invention provides a standard measuring device capable of directly tracing a measured value to a meter definition national standard, wherein the measuring method is that a laser interferometer is directly connected to a sample stage of a scanning electron microscope, the length to be measured on the sample is measured by synchronously measuring the displacement of the sample and a secondary electron or back scattering electron signal of the sample, the measured value can be traced directly to a meter definition international unit, the absolute measuring method is the largest difference from the conventional scanning electron microscope is that electron beam scanning is not used, the electron beam spot of the electron microscope is in a static state during imaging measurement, and a measuring image is obtained through the scanning movement of a high-speed displacement stage carrying the measured sample. And measuring the displacement of the displacement platform by using a laser interferometer, wherein a measuring mirror of the laser interferometer is fixedly connected to the displacement platform, so that the displacement of the displacement platform measured by the laser interferometer can be directly traced to a laser wavelength and meter definition SI unit, and the magnitude tracing of the measurement value of the metering scanning electron microscope is realized.
The foregoing is illustrative of the preferred embodiments of the present invention and is used to facilitate a more complete understanding of the teachings of the present invention by those skilled in the art. However, these examples are merely illustrative, and the specific embodiments of the present invention should not be construed as being limited to the descriptions of these examples.

Claims (6)

1. The nanometer step sample scanning metering type scanning electron microscope is characterized by comprising a high-speed nanometer displacement scanning table, a two-dimensional laser interferometer and an ultrasonic motor coarse adjustment displacement table:
the ultrasonic motor coarse adjustment displacement table is used for fixing the high-speed nano displacement scanning table, and a sample table and a pole shoe of an electron gun of the electron microscope are arranged on the high-speed nano displacement scanning table;
the two-dimensional laser interferometer comprises two interferometers, the interferometers are respectively positioned at the positions of a measurement sample in the X direction and the Y direction, a light source of the interferometers is led in from the laser through optical fibers, passes through a vacuum window sheet of a glass window, is divided into two beams in an electron microscope, and is respectively incident to the two interferometers;
an electron gun of the electron microscope emits electron beams to the surface of the sample, the generated secondary electrons are received by an electron microscope receiver, and the high-speed nano-table drives the sample to scan at a high speed;
when the ultrasonic motor coarsely adjusts the displacement table to do scanning motion, one emergent interference light enters the photoelectric detector through the vacuum window to serve as an X-axis displacement data signal of the displacement table; the other beam of interference light is reflected by the plane reflector and then enters the interferometer close to the cabin door, and the emergent interference light is received by the other detector and used as a Y-axis displacement data signal of the displacement table;
and X, Y axis displacement data are matched with an electron microscope to collect secondary electron signals excited by electron beams on the surface of the sample, so that measurement data traced by a laser interferometer are obtained.
2. A metering scanning electron microscope as claimed in claim 1 wherein the two-dimensional laser interferometer comprises a laser beam incident optical fiber, a through-hole flange, a vacuum window plate, a cube beam splitter, a spring hinge, a planar mirror, a receiver, an interferometer and an L-shaped two-dimensional mirror.
3. The metering scanning electron microscope of claim 2 wherein the non-coil ultrasonic motor coarse adjustment displacement stage is connected to the high speed nano displacement scanning stage via a first adapter plate, the high speed nano displacement scanning stage is connected to a trimmable sample stage via a second adapter plate, and pole shoes of the electron gun of the electron microscope and the sample to be measured are arranged on the trimmable sample stage.
4. A scanning electron microscope according to claim 3 characterised in that the natural resonant frequency of the elastic hinge can be higher than 200Hz.
5. A scanning electron microscope according to claim 3 characterised in that the L-shaped two-dimensional mirror material is glass ceramics.
6. A scanning electron microscope according to claim 3 in which the interferometer is a 2-pass optical path, one period of the interference signal corresponds to 158nm, one period of the interference signal is subdivided by the circuit 1024 or 2048, and the resolution is 0.15nm or 0.075nm.
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CN109727241A (en) * 2018-12-28 2019-05-07 天津航天长征火箭制造有限公司 A kind of Tank of Spacecraft fifth wheel testing and analysis system
CN112379129B (en) * 2020-11-16 2022-08-23 付学文 High-space-time-resolution multi-mode carrier dynamics measurement system and measurement method
CN113406358B (en) * 2021-06-09 2022-06-24 北京科技大学 Scanning electron microscope teaching model device and using method thereof
CN113534402A (en) * 2021-07-13 2021-10-22 万灵帮桥医疗器械(广州)有限责任公司 Reflector adjusting device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004191277A (en) * 2002-12-13 2004-07-08 Hitachi Ltd Scanning probe microscope and its measurement method
CN102680741A (en) * 2012-05-21 2012-09-19 中国科学院电工研究所 Metering type scanning electronic microscope imaging control system and scanning imaging method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004191277A (en) * 2002-12-13 2004-07-08 Hitachi Ltd Scanning probe microscope and its measurement method
CN102680741A (en) * 2012-05-21 2012-09-19 中国科学院电工研究所 Metering type scanning electronic microscope imaging control system and scanning imaging method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
李伟 等.计量型原子力显微镜的位移测量系统.《光学精密工程》.2012,第20卷(第4期),798-802. *

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