CN105328516B - 磁流变柔性抛光垫的动态磁场自锐抛光装置及其抛光方法 - Google Patents
磁流变柔性抛光垫的动态磁场自锐抛光装置及其抛光方法 Download PDFInfo
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- CN105328516B CN105328516B CN201510801886.4A CN201510801886A CN105328516B CN 105328516 B CN105328516 B CN 105328516B CN 201510801886 A CN201510801886 A CN 201510801886A CN 105328516 B CN105328516 B CN 105328516B
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/10—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
- B24B47/12—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces by mechanical gearing or electric power
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/02—Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools
Abstract
Description
Claims (10)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510801886.4A CN105328516B (zh) | 2015-11-18 | 2015-11-18 | 磁流变柔性抛光垫的动态磁场自锐抛光装置及其抛光方法 |
PCT/CN2016/072318 WO2017084211A1 (zh) | 2015-11-18 | 2016-01-27 | 磁流变柔性抛光垫的动态磁场自锐抛光装置及其抛光方法 |
US15/519,005 US10118269B2 (en) | 2015-11-18 | 2016-01-27 | Self-sharpening polishing device with magnetorheological flexible polishing pad formed by dynamic magnetic field and polishing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201510801886.4A CN105328516B (zh) | 2015-11-18 | 2015-11-18 | 磁流变柔性抛光垫的动态磁场自锐抛光装置及其抛光方法 |
Publications (2)
Publication Number | Publication Date |
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CN105328516A CN105328516A (zh) | 2016-02-17 |
CN105328516B true CN105328516B (zh) | 2018-03-30 |
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CN201510801886.4A Active CN105328516B (zh) | 2015-11-18 | 2015-11-18 | 磁流变柔性抛光垫的动态磁场自锐抛光装置及其抛光方法 |
Country Status (3)
Country | Link |
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US (1) | US10118269B2 (zh) |
CN (1) | CN105328516B (zh) |
WO (1) | WO2017084211A1 (zh) |
Families Citing this family (37)
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CN105904333B (zh) * | 2016-06-08 | 2018-01-30 | 广东工业大学 | 一种集群动态磁场控制抛光垫刚度的双面抛光装置及方法 |
CN107008979B (zh) * | 2016-11-21 | 2018-08-24 | 北京工商大学 | 一种磁流体柔轮磨削装置 |
CN106826411B (zh) * | 2017-02-21 | 2019-06-14 | 广东工业大学 | 一种凸轮驱动磁体式磁流变流体动压抛光装置及抛光方法 |
CN106938407A (zh) * | 2017-02-21 | 2017-07-11 | 广东工业大学 | 一种可控动磁场的动态磁流变抛光装置及其抛光方法 |
CN106881636B (zh) * | 2017-04-10 | 2018-10-23 | 上海理工大学 | 一种载液板及其制造方法以及磁性复合流体抛光头装置 |
CN107097120B (zh) * | 2017-05-27 | 2018-11-13 | 上海理工大学 | 多通道磁流变液供给装置 |
CN107470987B (zh) * | 2017-08-04 | 2019-09-10 | 北京交通大学 | 一种基于磁流变胶的超光滑平面抛光装置及抛光方法 |
CN107414608B (zh) * | 2017-09-07 | 2023-02-28 | 河南工业大学 | 一种回转式光纤预制棒磁流变抛光机及其抛光方法 |
CN107703881B (zh) * | 2017-09-11 | 2023-08-04 | 中国工程物理研究院机械制造工艺研究所 | 一种自动标定磁流变抛光缎带厚度的装置 |
CN107877269B (zh) * | 2017-10-26 | 2023-10-03 | 广东工业大学 | 一种集群磁流变高效抛光加工高精度球的装置及抛光方法 |
CN107617933B (zh) * | 2017-11-06 | 2023-05-05 | 广东工业大学 | 一种动态磁场磁流变抛光装置 |
CN109286747B (zh) * | 2018-12-07 | 2021-07-13 | 深圳市铭创智联科技有限公司 | 夜视视野可控的监控器 |
CN110227984B (zh) * | 2019-06-17 | 2021-07-02 | 南方科技大学 | 非球面光学元器件抛光工艺 |
CN110170887B (zh) * | 2019-06-19 | 2023-11-14 | 河北工业大学 | 一种激光与磁流变液耦合抛光装置 |
CN110281085A (zh) * | 2019-07-25 | 2019-09-27 | 广东工业大学 | 一种集群磁流变研磨抛光装置及其使用方法 |
CN110517842B (zh) * | 2019-08-29 | 2024-03-15 | 广东工业大学 | 电磁耦合装置及具有其的抛光装置、电磁流变性能测量装置 |
CN110524317A (zh) * | 2019-08-29 | 2019-12-03 | 广东工业大学 | 一种电磁耦合抛光设备及其电磁耦合控制磨粒状态的抛光方法 |
CN110421412A (zh) * | 2019-09-05 | 2019-11-08 | 河北工业大学 | 一种小型磁流变平面抛光装置 |
CN110948366A (zh) * | 2019-12-09 | 2020-04-03 | 华侨大学 | 带有可调摆动机构的抛光机及抛光方法 |
CN110900322B (zh) * | 2019-12-23 | 2024-04-09 | 广东工业大学 | 一种电芬顿集群磁流变复合研磨抛光装置及方法 |
CN110948293B (zh) * | 2019-12-23 | 2024-03-22 | 广东工业大学 | 一种半导体基片用声光磁复合抛光装置及抛光方法 |
CN111069984B (zh) * | 2019-12-31 | 2024-04-09 | 广东工业大学 | 一种动态磁场磁流变抛光装置及抛光方法 |
CN111451937B (zh) * | 2020-04-15 | 2021-07-27 | 浙江工业大学 | 具有自动抓取功能的液态金属研磨盘自修复装置 |
CN111483266A (zh) * | 2020-06-04 | 2020-08-04 | 金华市金飞饰品有限公司 | 一种压钻机用齿轮型自动传动和定位系统 |
CN111823064B (zh) * | 2020-07-30 | 2022-04-29 | 吉林大学 | 一种针对复杂曲面内腔的磁场遥操纵涡旋抛光装置与方法 |
CN113021105B (zh) * | 2021-02-25 | 2022-02-01 | 深圳市昶东鑫线路板有限公司 | 一种用于线路板预处理的研磨装置及其研磨方法 |
CN113059406B (zh) * | 2021-03-17 | 2024-04-19 | 广东工业大学 | 一种磁场动态叠加的磁流变抛光装置及抛光方法 |
CN113305650B (zh) * | 2021-06-17 | 2022-07-01 | 广东工业大学 | 一种超光滑平坦化抛光方法及装置 |
CN113427325B (zh) * | 2021-07-16 | 2022-09-20 | 吉林大学 | 一种电磁流耦合光学曲面精密抛光加工机床及加工方法 |
CN113579987B (zh) * | 2021-07-23 | 2022-10-04 | 广东工业大学 | 一种曲率自适应集群磁流变抛光自由曲面的方法及装置 |
CN113910009B (zh) * | 2021-10-18 | 2023-08-15 | 台州学院 | 磁流变液抛光弹抛光机 |
CN113977360B (zh) * | 2021-10-18 | 2023-08-25 | 台州学院 | 往返式自控旋转磁场磁流变抛光机 |
CN114102420B (zh) * | 2021-11-16 | 2024-01-30 | 台州学院 | 多级匀速自循环式磁流变抛光机 |
CN114029749B (zh) * | 2021-11-29 | 2023-10-27 | 武汉武重机床有限公司 | 燕尾式滑台 |
CN114227963B (zh) * | 2022-01-27 | 2022-09-02 | 无锡阳光精机有限公司 | 一种高端装备制造用高转速偏心式切片机电主轴设备 |
CN114571293B (zh) * | 2022-05-09 | 2022-07-29 | 江苏克莱德激光技术有限责任公司 | 一种用于金属表面处理的磁流变抛光装置及其使用方法 |
CN116833900B (zh) * | 2023-07-31 | 2024-01-26 | 广东工业大学 | 一种用于半导体晶片化学机械抛光的磁流变弹性抛光垫、制备方法及其应用 |
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US4211041A (en) * | 1978-06-16 | 1980-07-08 | Kozhuro Lev M | Rotor-type machine for abrasive machining of parts with ferromagnetic abrasive powders in magnetic field |
DE3585200D1 (de) * | 1984-10-15 | 1992-02-27 | Nissei Ind Co | Flachschleifmaschine. |
US5449313A (en) * | 1992-04-14 | 1995-09-12 | Byelocorp Scientific, Inc. | Magnetorheological polishing devices and methods |
US5795212A (en) * | 1995-10-16 | 1998-08-18 | Byelocorp Scientific, Inc. | Deterministic magnetorheological finishing |
JP3664188B2 (ja) * | 1995-12-08 | 2005-06-22 | 株式会社東京精密 | 表面加工方法及びその装置 |
US6139404A (en) * | 1998-01-20 | 2000-10-31 | Intel Corporation | Apparatus and a method for conditioning a semiconductor wafer polishing pad |
JPH11333677A (ja) * | 1998-03-27 | 1999-12-07 | Ebara Corp | 基板の研磨装置 |
DE19848918A1 (de) * | 1998-07-28 | 2000-02-10 | Bernhard Ganser | Schleifvorrichtung für gebogene Flächen |
JP2000326235A (ja) * | 1999-05-17 | 2000-11-28 | Inst Of Physical & Chemical Res | Elid用砥石とこれを用いたelid平面研削装置 |
US6514129B1 (en) * | 1999-10-27 | 2003-02-04 | Strasbaugh | Multi-action chemical mechanical planarization device and method |
US6626742B2 (en) * | 2000-05-04 | 2003-09-30 | Mpm Ltd. | Polishing method and device |
US6935929B2 (en) * | 2003-04-28 | 2005-08-30 | Micron Technology, Inc. | Polishing machines including under-pads and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces |
CN100486765C (zh) * | 2006-12-31 | 2009-05-13 | 广东工业大学 | 基于磁流变效应的研磨抛光方法及其抛光装置 |
US8480458B2 (en) * | 2011-09-13 | 2013-07-09 | White Drive Products, Inc. | Grinding wheel dressing system |
CN103072069B (zh) * | 2012-12-19 | 2015-12-23 | 广东工业大学 | 磁流变效应粘弹性夹持的电瓷基片柔性研抛装置及方法 |
CN104209862B (zh) * | 2014-08-26 | 2017-01-11 | 广东工业大学 | 柔性抛光垫在线修整的超光滑平面研磨抛光装置及方法 |
CN104308671B (zh) * | 2014-10-09 | 2017-01-11 | 东北大学 | 一种磁流变抛光装置与方法 |
CN205237716U (zh) * | 2015-11-18 | 2016-05-18 | 广东工业大学 | 磁流变柔性抛光垫的动态磁场自锐抛光装置 |
-
2015
- 2015-11-18 CN CN201510801886.4A patent/CN105328516B/zh active Active
-
2016
- 2016-01-27 WO PCT/CN2016/072318 patent/WO2017084211A1/zh active Application Filing
- 2016-01-27 US US15/519,005 patent/US10118269B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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WO2017084211A1 (zh) | 2017-05-26 |
US10118269B2 (en) | 2018-11-06 |
CN105328516A (zh) | 2016-02-17 |
US20180021910A1 (en) | 2018-01-25 |
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Effective date of registration: 20210923 Address after: 510006 No. 100 West Ring Road, Guangzhou University, Guangzhou, Guangdong, Panyu District Patentee after: GUANGDONG University OF TECHNOLOGY Patentee after: Dongguan KIZI Precision Lapping Mechanical Manufacture Co.,Ltd. Address before: 510006 No. 100 West Ring Road, Guangzhou University, Guangzhou, Guangdong, Panyu District Patentee before: GUANGDONG University OF TECHNOLOGY |
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Effective date of registration: 20211012 Address after: 510006 No. 100 West Ring Road, Guangzhou University, Guangzhou, Guangdong, Panyu District Patentee after: GUANGDONG University OF TECHNOLOGY Address before: 510006 No. 100 West Ring Road, Guangzhou University, Guangzhou, Guangdong, Panyu District Patentee before: GUANGDONG University OF TECHNOLOGY Patentee before: Dongguan KIZI Precision Lapping Mechanical Manufacture Co.,Ltd. |
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Application publication date: 20160217 Assignee: Dongguan KIZI Precision Lapping Mechanical Manufacture Co.,Ltd. Assignor: GUANGDONG University OF TECHNOLOGY Contract record no.: X2021440000193 Denomination of invention: Dynamic magnetic field self sharpening polishing device of magnetorheological flexible polishing pad and its polishing method Granted publication date: 20180330 License type: Common License Record date: 20211018 |
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Address after: No.729, Dongfeng East Road, Yuexiu District, Guangzhou City, Guangdong Province 510060 Patentee after: GUANGDONG University OF TECHNOLOGY Address before: 510006 No. 100 West Ring Road, Guangzhou University, Guangzhou, Guangdong, Panyu District Patentee before: GUANGDONG University OF TECHNOLOGY |
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