CN105318693B - Substrate drying device - Google Patents
Substrate drying device Download PDFInfo
- Publication number
- CN105318693B CN105318693B CN201510170396.9A CN201510170396A CN105318693B CN 105318693 B CN105318693 B CN 105318693B CN 201510170396 A CN201510170396 A CN 201510170396A CN 105318693 B CN105318693 B CN 105318693B
- Authority
- CN
- China
- Prior art keywords
- substrate
- air
- high pressure
- evaporation part
- shell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/06—Controlling, e.g. regulating, parameters of gas supply
- F26B21/08—Humidity
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/004—Nozzle assemblies; Air knives; Air distributors; Blow boxes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B3/00—Drying solid materials or objects by processes involving the application of heat
- F26B3/02—Drying solid materials or objects by processes involving the application of heat by convection, i.e. heat being conveyed from a heat source to the materials or objects to be dried by a gas or vapour, e.g. air
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
Abstract
The present invention discloses a kind of substrate drying device, comprising: first substrate drying section is arranged in the top of substrate and sprays the air of high pressure in the upper surface of the substrate；The second substrate drying section is arranged in the lower part of the substrate and sprays the air of the high pressure in the lower surface of the substrate, wherein the first substrate drying section includes: first shell；First jet is connected to the lower part of the first shell and sprays the air of the high pressure in the upper surface of the substrate；Evaporation part is arranged in the presumptive area of the positive lower part of the first shell of the transfer direction towards the substrate and prominent to the direction opposite with the transfer direction of the substrate；The evaporation part is heated in heating part.
Description
Technical field
The present invention relates to the substrate drying devices that one kind can prevent the underdry of substrate.
Background technique
In general, forming thin-film component on substrate when manufacturing display device, and execute surface treatment procedure.At surface
In science and engineering sequence, it is necessary to have clean operation and drying operation.
The impurity on surface or thin-film component that substrate is attached in cleaning process is removed by detergent remover.After cleaning process
The detergent remover for remaining in substrate is removed by the substrate drying device of air knife etc.Substrate drying device by the injection of the air of high pressure in
The detergent remover for remaining in substrate is removed on substrate.
In the case where providing the air of high pressure on substrate, a part of detergent remover may be as the steam of broken shape
Remain in process chamber.In the case where providing the air of high pressure on substrate, steam can be formed by with the air of high pressure
Air-flow and in technique indoor moving and be combined with each other.
The steam be combineding with each other is formed into the bigger droplet of size and falls on substrate.Accordingly, it is possible to can occur
The underdry of substrate.
Summary of the invention
The purpose of the present invention is to provide the substrate drying devices that one kind can prevent the underdry of substrate.
The substrate drying device of embodiment according to the present invention includes: first substrate drying section, is arranged in the top of substrate
And the air of high pressure is sprayed in the upper surface of the substrate；The second substrate drying section is arranged in the lower part of the substrate and incites somebody to action
The air of the high pressure is sprayed in the lower surface of the substrate, wherein the first substrate drying section includes: first shell；The
One nozzle is connected to the lower part of the first shell and sprays the air of the high pressure in the upper surface of the substrate；
Evaporation part, be arranged in the presumptive area of the positive lower part of the first shell of the transfer direction towards the substrate and to
The opposite direction of the transfer direction of the substrate is prominent；The evaporation part is heated in heating part.
The side of the evaporation part is connected to the front of the first shell, and the other side of the evaporation part, which has, inclines
The length on inclined-plane, the upper surface of the evaporation part is longer than the length of the lower surface of the evaporation part.
The direction of the first jet towards the transfer direction towards the substrate is bent to scheduled angle, thus cloth
Being set to makes the upper surface of the lower part of the first jet towards the substrate.
The first substrate drying section further include: first gas supply pipe is arranged as and the institute as the first shell
The back side for stating the first shell of positive opposite sides is facing and generates the air of the high pressure；First gas transfer
Portion extends in a first direction and is connected to the first gas supply pipe and obtains the air of the high pressure；Second gas transfer
Portion extends towards the second direction intersected with the first direction and is accommodated by the first shell, and is connected to first gas
Body transferred unit and obtain the air of the high pressure from the first gas transferred unit and be supplied to the first jet.
The first jet is connected to the lower part of the second gas transferred unit and will be by the second gas transferred unit
The air of the high pressure obtained is sprayed in the upper surface of the substrate.
The first jet includes the first hole, and first hole is arranged as being connected to the described of the second gas transferred unit
Lower part and the upper surface towards the substrate, and described in first hole will be obtained by the second gas transferred unit
The air of high pressure is sprayed in the upper surface of the substrate.
The substrate has a long side along the first direction, and along intersecting with the first direction and the second direction
Third direction has short side, and is transferred towards the first direction, and the first shell, the first jet and described
Evaporation part extends along the third direction.
The substrate drying device further include: process chamber for arranging and transferring the substrate, and accommodates first base
Plate drying section and the second substrate drying section；Illusory evaporation part is arranged in the presumptive area of the medial surface on the top of the process chamber；
The illusory evaporation part is heated in illusory heating part.
The illusory evaporation part is arranged as ghost image between the air of the high pressure and the upper surface of the substrate
Contact point, and be arranged as avoiding and the evaporation part ghost image.
The side of the illusory evaporation part is arranged as being contacted with projection pattern and is not attached to described in the first shell
The side of the positive evaporation part, and adjacent to the outrigger shaft extended toward upper with lower part direction, and the illusory evaporation part
Direction from the outrigger shaft towards no arrangement evaporation part extends presumptive area.
The evaporation part is prominent for the air and institute being less than from the front of the first shell to the high pressure
The size for stating the distance until the contact point between the upper surface of substrate, to be arranged as avoiding ghost image in the high pressure
Contact point between air and the upper surface of the substrate.
The heating part and the illusory heating part are heated to the evaporation part and the illusory evaporation part that can make institute
State the temperature of the water evaporation generated when remaining detergent remover is removed by the air of the high pressure on the upper surface of substrate.
Substrate drying device of the invention can prevent the underdry of substrate.
Detailed description of the invention
Fig. 1 is the figure that outlined the substrate drying device of embodiment according to the present invention.
Fig. 2 is the drying substrates process that outlined through first substrate drying section and the execution of the second substrate drying section
Figure.
Fig. 3 is exemplary representation mobile flow direction of steam when executing drying substrates process by first substrate drying section
Figure.
Fig. 4 A to Fig. 4 F is the figure for indicating the diversified embodiment of evaporation part of first substrate drying section.
Symbol description:
100: substrate drying device 110: first substrate drying section
120: the second substrate drying section 111: first gas supply pipe
112: first gas transferred unit 113: second gas transferred unit
114: first shell 115: first jet
116: heating part 117: evaporation part
121: second gas supply pipe 122: third gas transferred unit
123: the four gas feeders 124: second shell
125: second nozzle 10: process chamber
21: illusory heating part 22: illusory evaporation part
30: detergent remover ROL: roller
SUB: the H2: the second hole of the H1: the first hole of substrate
Specific embodiment
If the embodiment being described in detail with reference to attached drawing below, advantages of the present invention, feature and for reaching
The method of purpose will become clear.However it can be implemented as the invention is not limited to embodiments disclosed below different
Variform, the embodiment of the present invention are to thoroughly disclose the present invention and completely introduce the scope of the present invention to the present invention
There are the personnel of general knowledge in technical field and provide, the present invention is only defined by the scope of the claims.Run through
The whole instruction, identical appended drawing reference refer to identical constituent element.
So-called element (elements) or layer are located at " above " or " top " of other elements or layer, not only include tight
The situation of adjacent other elements or layer, and centre is folded with other layers or the situation of other elements also all includes.On the contrary, if
Say to be element in " above direct (directly on) " or " above adjacent ", then it represents that centre does not have sandwiched other elements
Or layer."and/or" includes all combinations of the single and more than one project in the project being related to.
As " following (below) " of relative terms spatially, " lower section (beneath) ", " lower part (lower) ",
" (above) above ", " top (upper) " etc. can be for the ease of one element of elaboration or constituent element and other elements or structures
It is used at the correlativity as illustrated in the drawing between element.Spatially the term with relativity is not only construed as wrapping
Include the term in direction shown in figure, but also be construed as include element in use or operation different directions
Term.Through the whole instruction, identical appended drawing reference refers to identical constituent element.
Although using " first ", " second " etc. to illustrate diversified element, constituent element and/or part, so
And these elements, constituent element and/or part are not intended to be limited to these terms naturally.These terms are intended merely to a member
Part, constituent element or part differentiate with other elements, constituent element or part and are used.Therefore, first yuan be related to below
Part, the first constituent element or first part be also likely to be certainly in the technological thought of the present invention second element, second constitute want
Element or second part.
The embodiment recorded in the present specification will with reference to as Utopian skeleton diagram of the invention plan view with
Sectional view and be illustrated.Then, it may cause the deformation of the form of exemplary diagram because of manufacturing technology and/or allowable error etc..
Therefore, the embodiment of the present invention is not limited to the specific modality of diagram, but the shape for further including adjoint manufacturing process and occurring
State variation.Therefore, region illustrated in the accompanying drawings has attribute schematically, and the shape in region shown in the figure is
The specific modality in the region of element is indicated in order to illustrate, rather than for limiting the scope of the invention.
Hereinafter, the preferred embodiment of the present invention is explained in more detail referring to attached drawing.
Fig. 1 is the figure for roughly illustrating the substrate drying device of embodiment according to the present invention.
Referring to Fig.1, substrate drying device 100 include process chamber 10, drying substrates portion (or air knife) 110,120, it is illusory plus
Hot portion 21, illusory evaporation part 22 and roller ROL.
Drying substrates portion 110,120 and illusory evaporation part 22 and roller ROL are arranged in process chamber 10.Illusory heating part
21 can be disposed at the outside of process chamber 10.However be not limited thereto, illusory heating part 21 can be disposed at the inside of process chamber 10.
Process chamber 10 includes that substrate is transported into portion 11, substrate transports portion 12 and exhaust pipe 13.As exemplary embodiment,
Substrate is transported into that portion 11 can be disposed at the left side of process chamber 10 and substrate transports portion 12 and can be disposed at the right side of process chamber 10.Moreover,
Exhaust pipe 13 can be disposed at the lower part of process chamber 10.The substrate SUB for having executed clean process is transported into portion 11 by substrate and is transported into
To process chamber 10.
The substrate SUB for being transported into process chamber 10 is transferred by the roller ROL arranged in process chamber 10.Roller ROL
It can be rotated along scheduled direction and transfer substrate SUB towards first direction D1.As exemplary embodiment, substrate SUB can lead to
It crosses the roller ROL being rotated in a clockwise direction and is moved from the left side of first direction D1 towards right direction.
Drying substrates portion 110,120 is stationary state, is moved the substrate SUB for being transported into process chamber 10 by roller ROL
It send.The air of high pressure is sprayed in drying substrates portion 110,120 to the substrate SUB of transfer, thereby executing drying substrates process.
It, will be remaining on substrate SUB and being ejected into the air of high pressure of substrate SUB when carrying out drying substrates process
Detergent remover removes.It can be discharged by exhaust pipe 13 by the particle for the detergent remover that the air of high pressure removes.It is done by substrate
The substrate SUB that dry portion 110,120 executes drying substrates process is transferred by roller ROL, to transport portion by substrate
12 and transport to outside.
Drying substrates portion 110,120 includes first substrate drying section 110 and the second substrate drying section 120.First substrate is dry
Dry portion 110 is arranged in the top of substrate SUB and sprays the air of high pressure in the upper surface of substrate SUB.The second substrate drying section
120 are arranged in the lower part of substrate SUB and spray the air of high pressure in the lower surface of substrate SUB.
First substrate drying section 110 includes first gas supply pipe 111, first gas transferred unit 112, second gas transfer
Portion 113, first shell 114, first jet 115, heating part 116 and evaporation part 117.
Hereinafter, the side of the first shell 114 of the transfer direction towards substrate SUB is defined as positive FS, and by first
The opposite sides of the positive FS of shell 114 are defined as the back surface B S of first shell 114.
First gas supply pipe 111 is arranged as facing with the back side of first shell 114.First gas transferred unit 112 connects
It is connected to first gas supply pipe 111 and extends along first direction D1.
Second gas transferred unit 113 is accommodated in first shell 114.The second gas being arranged in first shell 114 is moved
Portion 113 is sent to extend towards the second direction D2 intersected with first direction D1, to extend to the lower section for being disposed with substrate SUB.Second
Gas feeder 113 is connected to first gas transferred unit 112.
First gas transferred unit 112 is connected to the presumptive area on the top of second gas transferred unit 113.First gas transfer
Portion 112 is arranged between first gas supply pipe 111 and second gas transferred unit 113, to play connection first gas supply
The effect of pipe 111 and second gas transferred unit 113.
First jet 115 is connected to the lower part of first shell 114.Also, first jet 115 is connected to second gas transfer
The lower part in portion 113.Second gas transferred unit 113 is arranged between first gas transferred unit 112 and first jet 115, to rise
To the effect of connection first gas transferred unit 112 and first jet 115.
The direction of first jet 115 towards the transfer direction towards substrate SUB is bent to scheduled angle, to arrange
To make the lower part of first jet 115 towards the upper surface of substrate SUB.For example, when substrate SUB is transferred to the right from left side
When, first jet 115 is bent to the left with scheduled angle, to be arranged as making the lower part of first jet 115 towards base
The upper surface of plate SUB.
First jet 115 includes the first hole H1.First hole H1 is arranged towards the upper surface of substrate SUB.Moreover, the first hole
H1 is connected to the lower part of second gas transferred unit 113.
The air of the generation high pressure of first gas supply pipe 111.First gas transferred unit 112 is from first gas supply pipe 111
It obtains the air of high pressure and is supplied to second gas transferred unit 113.Also, the air of the acquisition high pressure of second gas transferred unit 113
And it is supplied to first jet 115.
That is, first gas transferred unit 112 and the offer of second gas transferred unit 113 generate in first gas supply pipe 111
High pressure air movement routine.Then, the air of the high pressure generated in first gas supply pipe 111 passes through first gas
Transferred unit 112 and second gas transferred unit 113 and be provided to first jet 115.
First hole H1 of first jet 115 obtains the air of high pressure by second gas transferred unit 113.The air of high pressure
It is sprayed by the first hole H1 to the upper surface of substrate SUB.Air by means of the high pressure sprayed to substrate SUB, remains in base
The detergent remover of the upper surface of plate SUB is removed.
Evaporation part 117 is arranged in the presumptive area of the lower part of the positive FS of first shell 114 and to the transfer with substrate SUB
Contrary direction is prominent.The side of evaporation part 117 is connected to the positive FS of first shell 114, the other side of evaporation part 117
With inclined surface.Moreover, the length of the upper surface of evaporation part 117 is longer than the length of the lower surface of evaporation part 117.Heating part
116 are connected to evaporation part 117 and heat to evaporation part 117.
The second substrate drying section 120 includes second gas supply pipe 121, third gas transferred unit 122, the transfer of the 4th gas
Portion 123, second shell 124 and second nozzle 125.Second nozzle 125 includes the second hole H2.
Other than not having heating part 116 and evaporation part 117, the construction of the second substrate drying section 120 is substantially with first
Drying substrates portion 110 is identical.Substrate SUB is placed in intermediate and cloth by first substrate drying section 110 and the second substrate drying section 120
It sets, and is arranged as symmetrically.
The air of the generation high pressure of second gas supply pipe 121.Third gas transferred unit 122 is connected to second gas supply pipe
121 and the air of high pressure is obtained from second gas supply pipe 121.4th gas feeder 123 is connected to third gas transferred unit
122 and the air of high pressure is obtained from third gas transferred unit 122.4th gas feeder 123 is accommodated in second shell 124.
Second nozzle 125 is connected to the top of second shell 124.Also, the second hole H2 of second nozzle 125 is connected to
The top of four gas feeders 123 and the air for obtaining high pressure.Sky of the second hole H2 to the lower surface of substrate SUB injection high pressure
Gas.Air by means of the high pressure sprayed to substrate SUB, the detergent remover for remaining in the lower surface of substrate SUB are removed.
Therefore, the second substrate drying section 120 can execute substrate and spraying the air of high pressure to the lower surface of substrate SUB
Drying process.
Illusory evaporation part 22 is arranged in the presumptive area of the medial surface on the top of process chamber 10.Illusory evaporation part 22 is arranged as
Contact point of the ghost image between the air of high pressure and the upper surface of substrate SUB.The specific layout area of illusory evaporation part 22 will be
It is described further below.Illusory heating part 21 is connected to illusory evaporation part 22 and heats to illusory evaporation part 22.
A part of the detergent remover removed by the air of high pressure is not discharged by exhaust pipe 13, but may be used as all
As the steam (Mist) of broken shape remains in process chamber 10.
Steam can be formed by air-flow with the air of high pressure and be adsorbed on the first shell of first substrate drying section 110
114 front.It, can be along the positive FS of first shell 114 when such steam be combined with each other and is formed as bigger droplet
It flows down.The steam flowed down along the positive FS of first shell 114 can come together in evaporation part 117.
Evaporation part 117 is heated to that the temperature of water evaporation can be made by heating part 116.Then, the water of evaporation part 117 is reached
Vapour can be evaporated in evaporation part 117 and is removed.
Moreover, steam can be formed by air-flow with the air of high pressure and move, process chamber is arranged in be adsorbed on
The illusory evaporation part 22 of the presumptive area of the medial surface on 10 top.Illusory heating part 21 is heated to illusory evaporation part 22 to use energy
Enough make the temperature of water evaporation.Then, the steam for being adsorbed in illusory evaporation part 22 can be evaporated in illusory evaporation part 22 and be removed
It goes.
The concrete operations of water evaporation will be described in detail below in reference to Fig. 3.
Fig. 2 is the drying substrates process roughly illustrated through first substrate drying section and the execution of the second substrate drying section
Figure.
In Fig. 2, substrate SUB, first shell 114, first jet 115 and the second spray are illustrated for ease of description and only
Mouth 125 and evaporation part 117.Other constructions are illustrated referring to Fig.1 in front, therefore are unillustrated.
Referring to Fig. 2, substrate SUB has long side along first direction D1, and along perpendicular to first direction D1 and second direction D2
Third direction D3 have short side.
First shell 114, first jet 115 and second nozzle 125 and evaporation part 117 extend along third direction D3.Cause
This, first shell 114, first jet 115 and second nozzle 125 and evaporation part 117 are arranged as putting down with the short axle of substrate SUB
Row.Although not illustrating, second shell 124 also extends along third direction D3.
As previously mentioned, the direction of first jet 115 towards the transfer direction towards substrate SUB is bent to scheduled angle
And it is arranged as the upper surface for making the lower part of first jet 115 towards substrate SUB.In the same manner, second nozzle 125 is also to towards substrate
The direction of the transfer direction of SUB is bent to scheduled angle and is arranged as making the top of second nozzle 125 towards substrate SUB
Lower surface.
The air AIR of high pressure is sprayed by the first hole H1 of first jet 115 to the upper surface of substrate SUB.Second spray
Second hole H2 of mouth 125 is arranged towards the lower surface of substrate SUB.Then, the air AIR of high pressure passes through second nozzle 125
Second hole H2 and to the lower surface of substrate SUB spray.Therefore, remain in the detergent remover quilt of the upper and lower surfaces of substrate SUB
It removes.
Fig. 3 is exemplary representation mobile flow direction of steam when executing drying substrates process by first substrate drying section
Figure.
For ease of description, it will be used to execute the base of drying substrates process by first substrate drying section 110 in Fig. 3
A part of plate SUB, a part of process chamber 10 and first substrate drying section 110 amplify and illustrate.
Referring to Fig. 3, evaporation part 117 is prominent for the positive air AIR and base to high pressure being less than from first shell 114
The size of the distance until contact point between the upper surface of plate SUB, and it is connected to the front of first shell 114.Therefore, it evaporates
Portion 117 may be disposed so that not contact point of the ghost image between the upper surface of the air AIR and substrate SUB of high pressure.
As previously mentioned, illusory evaporation part 22 is arranged in the presumptive area of the medial surface on the top of process chamber 10.Specifically,
Illusory evaporation part 22 may be disposed so that contact point of the ghost image between the upper surface of the air AIR and substrate SUB of high pressure.
The side of illusory evaporation part 22 is arranged as and one as the positive evaporation part 117 for being connected to first shell 114
The other side of the evaporation part 117 of the opposite side of side is contacted with projection pattern, and adjacent to (or saying it is with lower part direction toward upper
Two direction D2) extend outrigger shaft EA.Illusory evaporation part 22 can extend from outrigger shaft EA towards the direction of no arrangement evaporation part 117
Presumptive area.Therefore, illusory evaporation part 22 may be disposed so that not with 117 ghost image of evaporation part.
The air AIR of high pressure is sprayed by the first hole H1 of first jet 115 to the upper surface of substrate SUB.Remain in
The detergent remover 30 of the upper surface of substrate SUB is removed by the air AIR of high pressure.However, being washed by what the air AIR of high pressure was removed
A part of net liquid 30 may remain in process chamber 10 as steam M.
Specifically, when providing the air AIR of high pressure to the upper surface of substrate SUB by the first hole H1, such as Fig. 3
It is shown, using the contact point between the air AIR of high pressure and the upper surface of substrate SUB as benchmark and may direction shape toward upper
The air-flow of ovalisation.Air-flow can be defined as the movement routine of steam M.
Air-flow in this way, steam M can make the contact point between the air AIR of high pressure and the upper surface of substrate SUB
On the basis of and direction is mobile with elliptical shape toward upper.
As the mobile steam M of air-flow declines due to gravity, so as to be adsorbed on the of first substrate drying section 110
The front of one shell 114.Moreover, steam M can be combined with each other and be formed as bigger droplet.In the case, steam M can be suitable
The front of first shell 114 flow down.The steam M flowed down along the front of first shell 114 can come together in evaporation part 117.
Evaporation part 117 is heated to the temperature that steam M can be made to evaporate by heating part 116.Therefore, evaporation part 117 is reached
Steam M can be evaporated in evaporation part 117 and is removed.
Also, steam M can be formed by air-flow movement with the air of high pressure, to be arranged in the top of process chamber 10
The illusory evaporation part 22 of presumptive area of medial surface adsorbed.Illusory evaporation part 22 is heated to make by illusory heating part 21
The temperature of steam M evaporation.Therefore, the steam M for being adsorbed in illusory evaporation part 22 can be evaporated in illusory evaporation part 22 and is removed.
Although not illustrating, steam may be generated when executing drying substrates process by the second substrate drying section 120
M.The second substrate drying section 120 is arranged as than first substrate drying section 110 closer to exhaust pipe 13.
Substantially, the steam M generated when executing drying substrates process by the second substrate drying section 120 can largely be borrowed
Help gravity to move and be discharged by exhaust pipe 13 to the lower part.Therefore, it is substantially held by the second substrate drying section 120
It can avoid that underdry occurs when row drying substrates process.
As a result, the substrate drying device 100 of embodiment according to the present invention can pass through evaporation part 117 and illusory evaporation part 22
And steam M is removed, therefore the underdry of substrate can be prevented.
Fig. 4 A to Fig. 4 F is the figure for indicating the diversified embodiment of evaporation part of first substrate drying section.
Referring to Fig. 4 A to Fig. 4 F, evaporation part 117 can have triangle, rectangle, ellipse, circle and not towards projected direction
One of shape of setting cross sectional shape.Unsetting shape shown in Fig. 4 F can be defined as do not have scheduled apperance or
The shape of form.
It may connect to first shell when one in of three of the triangular-section of evaporation part 117 shown in Fig. 4 A and Fig. 4 B
The positive FS of body 114.
As shown in Figure 4 A, the upper surface of the evaporation part 117 with triangular cross-sectional shape may be disposed so that and first direction D1
In parallel.However be not limited thereto, the upper surface of the evaporation part 117 with triangular cross-sectional shape can also as shown in Figure 4 B
It is arranged as that there is scheduled angle between first direction D1.
Even if the upper surface of the evaporation part 117 with triangular cross-sectional shape is arranged as having between first direction D1
Scheduled angle, steam M also can be in the flash evapns for the evaporation part 117 for touching the heating of the portion of being heated 116.Therefore, steam M
It will not flow down along the upper surface of the evaporation part 117 with triangular cross-sectional shape shown in Fig. 4 B, but be removed immediately.
Also, as shown in Fig. 4 D to Fig. 4 F, even if evaporation part 117 is towards projected direction with oval, round or unsetting
Cross sectional shape, steam M also can touch the portion of being heated 116 heating evaporation part 117 flash evapn.Therefore, steam M
It will not be flowed down along the evaporation part 117 with ellipse, circle or indefinite cross-sectional profile shown in Fig. 4 D to Fig. 4 F, but can
To be removed immediately.
As a result, the water generated in drying substrates process can be removed by evaporation part 117 shown in Fig. 4 A to Fig. 4 F
Vapour M.
As a result, the substrate drying device 100 of embodiment according to the present invention can pass through evaporation part 117 and illusory evaporation part 22
And steam M is removed, therefore the underdry of substrate can be prevented.
It is illustrated in conjunction with the embodiments above, it is believed that skilled it will be understood by those skilled in the art that can be not
The diversely modifications and changes present invention is detached from the limit for the thought and range of the invention recorded in claims.Moreover,
Disclosed embodiment of this invention is not intended to limit technical idea of the invention, the institute in claims and its full scope of equivalents
There is technical idea that will be construed to be included in interest field of the invention.
Claims (14)
1. a kind of substrate drying device, comprising:
First substrate drying section is arranged in the top of substrate and sprays the air of high pressure in the upper surface of the substrate；
The second substrate drying section is arranged in the lower part of the substrate and sprays the air of the high pressure in the following table of the substrate
Face,
Wherein, the first substrate drying section includes:
First shell；
First jet, be connected to the lower part of the first shell and by the injection of the air of the high pressure in the substrate it is described on
Surface；
Evaporation part, be arranged in the presumptive area of the positive lower part of the first shell of the transfer direction towards the substrate and
It is prominent to the direction opposite with the transfer direction of the substrate；
The evaporation part is heated in heating part.
2. substrate drying device as described in claim 1, wherein the side of the evaporation part is connected to the first shell
The other side in the front, the evaporation part has inclined surface, and the length of the upper surface of the evaporation part is than the evaporation part
The length of lower surface is longer.
3. substrate drying device as described in claim 1, wherein transfer direction of the first jet court towards the substrate
Direction be bent to scheduled angle, thus be arranged as making the lower part of the first jet towards the substrate it is described on
Surface.
4. substrate drying device as described in claim 1, wherein the first substrate drying section further include:
First gas supply pipe is arranged as the first shell with the positive opposite sides as the first shell
The back side it is facing and generate the air of the high pressure；
First gas transferred unit extends in a first direction and is connected to the first gas supply pipe and obtains the sky of the high pressure
Gas；
Second gas transferred unit extends towards the second direction intersected with the first direction and is accommodated by the first shell, and
It is connected to the first gas transferred unit and obtains the air of the high pressure from the first gas transferred unit and be supplied to described
First jet.
5. substrate drying device as claimed in claim 4, wherein the first jet is connected to the second gas transferred unit
Lower part and by the air of the high pressure obtained by the second gas transferred unit spray in the upper table of the substrate
Face.
6. substrate drying device as claimed in claim 5, wherein the first jet includes the first hole, first hole cloth
It is set to the lower part for being connected to the second gas transferred unit and the upper surface towards the substrate, and first hole
The air of the high pressure obtained by the second gas transferred unit is sprayed in the upper surface of the substrate.
7. substrate drying device as claimed in claim 4, wherein the substrate has long side, and edge along the first direction
There is short side with the third direction that the first direction and the second direction are intersected, and transferred towards the first direction,
And the first shell, the first jet and the evaporation part extend along the third direction.
8. substrate drying device as described in claim 1, wherein further include:
Process chamber for arranging and transferring the substrate, and accommodates the first substrate drying section and the second substrate drying section；
Illusory evaporation part is arranged in the presumptive area of the medial surface on the top of the process chamber；
The illusory evaporation part is heated in illusory heating part.
9. substrate drying device as claimed in claim 8, wherein the illusory evaporation part is arranged as ghost image in the high pressure
Contact point between air and the upper surface of the substrate, and be arranged as avoiding and the evaporation part ghost image.
10. substrate drying device as claimed in claim 9, wherein the side of the illusory evaporation part is arranged as with the side of projection
Formula is contacted with the side for being not attached to the positive evaporation part of the first shell, and adjacent to toward upper and lower part
The outrigger shaft that direction extends, and the illusory evaporation part extends in advance from the outrigger shaft towards the direction of no arrangement evaporation part
Determine region.
11. substrate drying device as claimed in claim 10, wherein the evaporation part is prominent for being less than from described first
At a distance from until the positive contact point to the air of the high pressure between the upper surface of the substrate of shell
Size, to be arranged as the contact point for avoiding ghost image between the air of the high pressure and the upper surface of the substrate.
12. substrate drying device as claimed in claim 8, wherein the heating part and the illusory heating part are by the steaming
Hair portion and the illusory evaporation part are heated to make on the upper surface of the substrate remaining detergent remover by the high pressure
The temperature of water evaporation that generates when removing of air.
13. substrate drying device as described in claim 1, wherein the evaporation part has rectangle, triangle towards projected direction
One of shape, ellipse, circle and indefinite cross-sectional profile cross sectional shape.
14. substrate drying device as described in claim 1, wherein the second substrate drying section includes:
Second gas supply pipe generates the air of the high pressure；
Third gas transferred unit is connected to the second gas supply pipe and obtains the air of the high pressure；
4th gas feeder is connected to the third gas transferred unit and obtains the high pressure from the third gas transferred unit
Air；
Second shell accommodates the 4th gas feeder；
Second nozzle is connected to the top of the second shell and obtains the air of the high pressure from the 4th gas feeder
And it sprays in the lower surface of the substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020140072992A KR102180040B1 (en) | 2014-06-16 | 2014-06-16 | Apparatus for drying substrate |
| KR10-2014-0072992 | 2014-06-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105318693A CN105318693A (en) | 2016-02-10 |
| CN105318693B true CN105318693B (en) | 2019-05-21 |
Family
ID=55084734
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510170396.9A Active CN105318693B (en) | 2014-06-16 | 2015-04-10 | Substrate drying device |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR102180040B1 (en) |
| CN (1) | CN105318693B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107065433B (en) * | 2017-05-08 | 2021-01-26 | 京东方科技集团股份有限公司 | Drying device |
| CN108278876A (en) * | 2017-12-27 | 2018-07-13 | 广德大金机械有限公司 | A kind of synthetic leather energy-saving baking box |
| KR102657774B1 (en) * | 2018-06-01 | 2024-04-17 | 주식회사 디엠에스 | Air knife module assemble and substrate drying apparatus using the same |
| CN112985043A (en) * | 2019-12-17 | 2021-06-18 | 亚智科技股份有限公司 | Air knife structure and mechanism thereof |
| CN113465347B (en) * | 2021-07-13 | 2022-06-21 | 江西师范大学 | Air shower type rapid drying device for food vacuum packaging |
| CN115183562B (en) * | 2022-08-25 | 2023-06-23 | 安徽省金正塑业有限公司 | Constant-temperature drying equipment for PVC sheet processing |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11354487A (en) * | 1998-06-03 | 1999-12-24 | Dainippon Screen Mfg Co Ltd | Method and equipment for drying substrate |
| JP2009088442A (en) * | 2007-10-03 | 2009-04-23 | Hitachi High-Technologies Corp | Substrate drying device, device for manufacturing flat panel display, and flat panel display |
| CN101639316B (en) * | 2008-07-31 | 2011-04-13 | 显示器生产服务株式会社 | Air knife device |
| CN103712428A (en) * | 2013-12-16 | 2014-04-09 | 京东方科技集团股份有限公司 | Drying device |
| CN103851887A (en) * | 2012-12-07 | 2014-06-11 | 深南电路有限公司 | PCB (printed circuit board) drying machine |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5762749A (en) * | 1995-07-21 | 1998-06-09 | Dainippon Screen Mfg. Co., Ltd. | Apparatus for removing liquid from substrates |
| KR20080090070A (en) * | 2007-04-04 | 2008-10-08 | 삼성전자주식회사 | Air knife and apparatus drying substrates having the same |
-
2014
- 2014-06-16 KR KR1020140072992A patent/KR102180040B1/en active IP Right Grant
-
2015
- 2015-04-10 CN CN201510170396.9A patent/CN105318693B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11354487A (en) * | 1998-06-03 | 1999-12-24 | Dainippon Screen Mfg Co Ltd | Method and equipment for drying substrate |
| JP2009088442A (en) * | 2007-10-03 | 2009-04-23 | Hitachi High-Technologies Corp | Substrate drying device, device for manufacturing flat panel display, and flat panel display |
| CN101639316B (en) * | 2008-07-31 | 2011-04-13 | 显示器生产服务株式会社 | Air knife device |
| CN103851887A (en) * | 2012-12-07 | 2014-06-11 | 深南电路有限公司 | PCB (printed circuit board) drying machine |
| CN103712428A (en) * | 2013-12-16 | 2014-04-09 | 京东方科技集团股份有限公司 | Drying device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102180040B1 (en) | 2020-11-18 |
| KR20150144423A (en) | 2015-12-28 |
| CN105318693A (en) | 2016-02-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105318693B (en) | Substrate drying device | |
| US7448604B2 (en) | Heat treatment apparatus | |
| JP2012164992A5 (en) | ||
| JP2010528459A5 (en) | ||
| JP2009088442A (en) | Substrate drying device, device for manufacturing flat panel display, and flat panel display | |
| JP2014038949A5 (en) | ||
| TWI363254B (en) | A processing apparatus for performing in-shower, suction and drying processes | |
| JPWO2013015093A1 (en) | Board manufacturing equipment | |
| CN108604546A (en) | Substrate processing method using same and substrate board treatment | |
| TWM429172U (en) | Surface treatment apparatus | |
| CN104246988B (en) | Chemical solution treating device | |
| CN208554083U (en) | A kind of novel spray granulation device | |
| TWI357359B (en) | Apparatus for jetting fluid | |
| JP2014124954A5 (en) | ||
| TWM497955U (en) | Hair steam machine | |
| TWI336487B (en) | Method and apparatus for cleaning and drying wafers | |
| KR101309044B1 (en) | Nano coating apparatus | |
| TWI673789B (en) | Cleaning apparatus and method | |
| CN206706429U (en) | Clothing care machine | |
| JP2017123402A (en) | Cleaning device | |
| KR101395716B1 (en) | Glass substrate drying apparatus | |
| CN208161253U (en) | A kind of steam heating coal ash humidifier | |
| JPS6328298B2 (en) | ||
| EP3666959A1 (en) | Clothes dryer | |
| JP5854263B2 (en) | Steam cleaning method and apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |