CN105304747B - 基于ZnO纳米棒/CH3NH3PbI3/MoO3结构的自驱动光电探测器及其制备方法 - Google Patents
基于ZnO纳米棒/CH3NH3PbI3/MoO3结构的自驱动光电探测器及其制备方法 Download PDFInfo
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- 238000002360 preparation method Methods 0.000 title claims abstract description 25
- 239000002073 nanorod Substances 0.000 title claims abstract description 24
- 238000001704 evaporation Methods 0.000 claims abstract description 45
- 230000008020 evaporation Effects 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 29
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Inorganic materials O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims abstract description 27
- 238000004528 spin coating Methods 0.000 claims abstract description 19
- 230000005540 biological transmission Effects 0.000 claims abstract description 13
- 239000004020 conductor Substances 0.000 claims abstract description 9
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 8
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 7
- JTCFNJXQEFODHE-UHFFFAOYSA-N [Ca].[Ti] Chemical compound [Ca].[Ti] JTCFNJXQEFODHE-UHFFFAOYSA-N 0.000 claims description 14
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-dimethylformamide Substances CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 11
- 238000001035 drying Methods 0.000 claims description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000007772 electrode material Substances 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 6
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims description 6
- 239000011701 zinc Substances 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 4
- 229910021641 deionized water Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 4
- XIOUDVJTOYVRTB-UHFFFAOYSA-N 1-(1-adamantyl)-3-aminothiourea Chemical compound C1C(C2)CC3CC2CC1(NC(=S)NN)C3 XIOUDVJTOYVRTB-UHFFFAOYSA-N 0.000 claims description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 3
- QEZYDNSACGFLIC-UHFFFAOYSA-N CN.[I] Chemical compound CN.[I] QEZYDNSACGFLIC-UHFFFAOYSA-N 0.000 claims description 3
- 229910002651 NO3 Inorganic materials 0.000 claims description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 3
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 claims description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 3
- 239000005357 flat glass Substances 0.000 claims description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims description 3
- 229940071870 hydroiodic acid Drugs 0.000 claims description 3
- 238000007654 immersion Methods 0.000 claims description 3
- RQQRAHKHDFPBMC-UHFFFAOYSA-L lead(ii) iodide Chemical compound I[Pb]I RQQRAHKHDFPBMC-UHFFFAOYSA-L 0.000 claims description 3
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims description 3
- 239000004246 zinc acetate Substances 0.000 claims description 3
- 238000000137 annealing Methods 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 238000002242 deionisation method Methods 0.000 claims 1
- 238000007747 plating Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 8
- 230000004043 responsiveness Effects 0.000 abstract description 5
- 230000004888 barrier function Effects 0.000 abstract description 4
- 230000031700 light absorption Effects 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000002184 metal Substances 0.000 abstract description 3
- 230000027756 respiratory electron transport chain Effects 0.000 abstract description 3
- 230000000903 blocking effect Effects 0.000 abstract description 2
- 238000009396 hybridization Methods 0.000 abstract description 2
- 238000011017 operating method Methods 0.000 abstract description 2
- 230000035945 sensitivity Effects 0.000 abstract 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 68
- 239000011787 zinc oxide Substances 0.000 description 34
- 238000002441 X-ray diffraction Methods 0.000 description 12
- 239000000463 material Substances 0.000 description 11
- 230000004044 response Effects 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 239000002086 nanomaterial Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- -1 X I Chemical class 0.000 description 2
- MCEWYIDBDVPMES-UHFFFAOYSA-N [60]pcbm Chemical compound C123C(C4=C5C6=C7C8=C9C%10=C%11C%12=C%13C%14=C%15C%16=C%17C%18=C(C=%19C=%20C%18=C%18C%16=C%13C%13=C%11C9=C9C7=C(C=%20C9=C%13%18)C(C7=%19)=C96)C6=C%11C%17=C%15C%13=C%15C%14=C%12C%12=C%10C%10=C85)=C9C7=C6C2=C%11C%13=C2C%15=C%12C%10=C4C23C1(CCCC(=O)OC)C1=CC=CC=C1 MCEWYIDBDVPMES-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000002390 rotary evaporation Methods 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 150000002927 oxygen compounds Chemical class 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
本发明提出了一种FTO/ZnO纳米棒/CH3NH3PbI3/MoO3/Au结构的自驱动光电探测器及其制备方法,其具体结构为FTO层,ZnO纳米棒电子传输层,也是空穴阻挡层,CH3NH3PbI3为钙钛矿吸光层,半导体氧化物MoO3为空穴传输层,也是电子阻挡层,金属电极是由Au膜组成。采用旋涂、水浴、两步法合成、蒸镀等方法制备。本发明利用了ZnO纳米棒/CH3NH3PbI3形成的有机无机杂化异质结结构及以半导体氧化物MoO3为空穴传输层,使本发明具有较高的响应度和探测器灵敏度,响应率和探测率都分别高达24.3A/W和3.56×1014cmHz1/2/W,同时有一定的自驱动能力,不需要外部偏压来驱动,有利于节约能源。其各项性能远远超过目前所报道的Si基探测器,同时还可以实现近紫外和可见红外的双重探测。本发明操作步骤简单,实验成本低廉,具有较好的应用前景。
Description
【技术领域】
本发明涉及半导体纳米材料以及自驱动光电探测器技术领域,尤其是涉及将ZnO纳米棒和钙钛矿材料结合起来形成异质结以制作高性能光电探测器。
【背景技术】
氧化锌(ZnO)是一种短波长、宽带隙的光电材料,其结晶温度较低、易刻蚀、加工方便,且具有很高的化学稳定性和耐高温性质,来源丰富,使得其在发光二极管、激光器、紫外探测器等领域有着非常广泛的应用。尤其是在1996年Tang等人在室温下实现了ZnO的微晶光泵浦紫外激光发射[1],随后曹慧等人在同样条件下也观测到了ZnO多晶粉末薄膜的自谐振腔随机紫外激光发射的现象[2],与此同时,《Nature》和《Science》杂志也相继刊登了类似的成果并对其高度评价。[3,4]近年来,基于ZnO纳米结构的发光和探测已受到越来越多的关注。[5-11]
最近,有机无机杂化钙钛矿材料在光伏电池上的应用发展非常迅速,其光伏电池的效率已达到了20%以上。[12-13]钙钛矿材料具有长的电荷载流子寿命和扩散长度,因而在合成的薄膜中载流子复合率非常低。同时,钙钛矿材料在300-800nm的光谱范围内具有很强捕获光的能力,特别是在500nm左右,它对光的吸收达到了90%以上。此外,钙钛矿类的材料能带内的缺陷密度非常低,因而基于钙钛矿材料的二极管将会有非常低的饱和电流。[14]这些优点说明了钙钛矿材料将是应用于探测器的理想材料。最近,Yang Yang课题组就以钙钛矿半导体材料制作探测器,他们的探测器结构为ITO/PEDOT:PSS/CH3NH3PbI3-xClx/PCBM/PFN/Al,得到的探测器性能优异,其探测度高达41014cmHz1/2/W。[15]
【参考文献】
[1]P.Yu,Z.K.Tang,G.K.L.Wong,et al.Solid State Commum.,1997,103,459.
[2]H.Cao,Y.G.Zhao,H.C.Ong,et al.Appl.Phys.Lett.,1998,73,3656.
[3]R.F.Service,Science,1997,276,895.
[4]M.Shim,P.Guyot-Sionnest,Nature,2000,407,981.
[5]C.Soci,A.Zhang,B.Xiang,S.A.Dayeh,D.P.R.Aplin,J.Park,X.Y.Bao,Y.H.Lo,and D.Wang*,Nano Lett.,2007,7,1003.
[6]D.Guo,C.Shan,S.Qu&D.Shen,Sci.REP-UK.,2014,12,07469.
[7]H.Zhou,P.Gui,Q.Yu,J.Mei,H.Wang and G.Fang,J.Mater.Chem.C,2015,3,990.
[8]X.Liu,L.Gu,Q.Zhang,J.Wu,Y.Long&Z.Fan,Nat.Commun.,2014,5,4007,DOI:10.1038/ncomms5007.
[9]C.Tian,D.Jiang,*B.Li,J.Lin,Y.Zhao,W.Yuan,J.Zhao,Q.Liang,S.Gao,J.Hou,and J.Qin,ACS Appl.Mater.Interfaces,2014,dx.doi.org/10.1021/am405292p.
[10]J.Hwang,M.Lai,H.Chen,and M.Kao,IEEE PHOTONICS TECHNOLOGY LETTERS,2014,26,1023.
[11]M.Ghusoon,A.Muneer,and W.Mohammed,IEEE,2015,ISBN:978-1-4799-5680-7/15,212.
[12]W.Nie,H.Tsai,R.Asadpour,J.-C.Blancon,A.J.Neukirch,G.Gupta,J.J.Crochet,M.Chhowalla,S.Tretiak,M.A.Alam,H.-L.Wang,A.D.Mohite,Science,2015,347,522.
[13]National Renewable Energy Laboratory.Best Research-CellEfficiencies,2015; www.nrel.gov/ncpv/images/efficiency_chart.jpg.
[14]W.-J.Yin,T.Shi&Y.Yan,Adv.Mater.,2014,26,4653.
[15]L.Dou*,Y.(Micheal)Yang*,J.You*,Z.Hong,W.-H.Chang,G.Li&Y.Yang,Nat.Commun.,2014,5,5404,DOI:10.1038.
【发明内容】
基于上述技术背景,本发明提供一种FTO/ZnO纳米棒/CH3NH3PbI3/MoO3/Au 有机无机杂化结构的自驱动光电探测器及其制备方法,该方法操作步骤简单,实验成本低廉,且所制备的ZnO纳米棒/CH3NH3PbI3杂化结构的整体结构清晰,ZnO纳米棒均匀,而且长度可控。此外,我们制作的探测器具有较高的响应度和探测灵敏度,远远超过目前所报道的Si基探测器,同时还可以实现近紫外和可见红外的双重探测。
本发明是这样实现的。它主要由透明导电玻璃、电子传输层、钙钛矿吸光层、空穴传输层、金属电极组成,其中电子传输层由在ZnO种子层上生成的ZnO纳米棒构成,同时也是空穴阻挡层,钙钛矿吸光层是通过两步法合成的CH3NH3PbI3构成,空穴传输层是由半导体氧化物MoO3构成,同时也是电子阻挡层,金属电极是由Au膜组成。
本发明的具体制备流程和工艺如下:
(1)FTO的预处理:将FTO玻璃片切成面积为2cm*2cm的正方形玻璃样片,依次用去离子水,丙酮,酒精进行超声清洗,再用紫外臭氧剂(UV)清洗15min;
(2)ZnO种子层的制备:以甲醇为溶剂,配制5mmol/L的醋酸锌(Zn(CH3COO)2)溶液,搅拌5分钟,然后开始在FTO玻璃样片上旋涂,旋涂的转速为3000r/min,时间为15s,在100℃条件下烘干10分钟,然后转移到马弗炉中退火2h。
(3)ZnO纳米棒的制备:在生长有ZnO种子层FTO玻璃样片上,用水浴法生长ZnO纳米棒,水浴溶液成分为50mmol/L的六水硝酸锌(Zn(NO3)2·6H2O)、30mmol/L的六次甲基四铵(C6H12N4)和0.6g的PEI(聚醚酰亚胺),同时利用氨水将溶液的PH值控制在10.6-10.8范围内,水浴的温度为85℃-90℃,根据不同棒长需求来控制水浴的时间。水浴结束后,先后用去离子水和酒精冲洗,去除表面的杂物,最后转移到马弗炉中退火处理2h。
(4)两步法合成钙钛矿层(CH3NH3PbI3):第一步是旋涂PbI2,即以DMF(N,N-二甲基甲酰胺)为溶剂,配制1mmol/L(0.462g)的PbI2溶液,在70℃的恒温条件下搅拌4h,然后采用旋涂法将PbI2甩在ZnO纳米棒上,旋涂转速为3000r/min,时间为15s,旋涂好后放置在烘干台上烘烤5min;第二步是PbI2与碘甲胺反应合成钙钛矿,即以甲胺和氢碘酸、或氢氯酸、或氢溴酸为原料在低温下采用旋转蒸发法制备CH3NH3X(X为I、Br、Cl等卤素)晶体,并在乙醇与乙醚 溶剂中进行重结晶。以异丙醇为溶剂,配制0.1g/10ml的CH3NHI溶液,然后将烘干后FTO样片(上面已经旋有PbI2)放在溶液中浸泡40s,然后再在烘干台上烘烤10min;
(5)制备空穴传输层:采用蒸镀的方法,将半导体氧化物MoO3镀到钙钛矿层上面,蒸镀时保持10-4的真空度,蒸镀的速率控制在蒸镀的厚度为5--20nm,其中以蒸镀厚度为12nm效果最好。
(6)对电极的制备:以Au为电极材料,采用蒸镀的方法,在空穴传输层上蒸镀一层Au,蒸镀的速率控制在蒸镀的Au的厚度为40nm,即可制作成一个完整光电探测器。
所述的ZnO薄膜的厚度为100---150nm,其中以120nm为佳;
所述的ZnO纳米棒长度为0.5—2μm,其中以1μm为佳;
所述的MoO3层厚度为5---20nm,其中以12n为佳;
将所制备得到的ZnO纳米棒和CH3NH3PbI3分别进行了X射线衍射(XRD)、扫描电子显微镜(SEM)表征分析。X射线衍射分析使用的仪器是D8Advance,测定条件是0.02°/步扫描。扫描电子显微镜的测定电压是在20KV的条件下进行的。将组装好的光电探测器测试其I-V特性曲线,光电响应曲线和响应的快慢。这些测试分析结果分别列于附图中。
本发明是将优异的ZnO纳米结构和钙钛矿材料有机结合起来,同时以MoO3为空穴传输层和电子阻挡层,提出了一种新颖的溶液法制备杂化钙钛矿光电探测器,其结构为FTO/ZnO纳米棒/CH3NH3PbI3/MoO3/Au(如图1所示)。该探测器结构独特,响应率和探测率都分别高达24.3A/W和3.561014cmHz1/2/W,响应速率也比较快,同时不需要外部偏压来驱动,有利于节约能源。此外,我们的探测器可同时实现紫外光和可见光的双重探测,拓宽了其应用范围。在此器件中,我们以MoO3为空穴传输层和电子阻挡层,当MoO3的厚度为12nm时,可以得到性能最优的探测器。ZnO/钙钛矿异质结器件在低成本、低能耗、高性能光电探测器领域有着较好的应用前景,这种独特的结构为制备高性能探测器的发展提供一条新的途径。
本发明的优点和特色之处在于:
(1)本发明中制作的光电探测器结构新颖,首次提出将ZnO纳米棒和钙钛 矿材料结合起来制作探测器,而且制作工艺简单,实验原料成本低廉,环境友好,这种独特的结构为制备高性能探测器的发展提供一条新的途径。
(2)本发明中制作的光电探测器性能优异,探测响应度高达24.3A/W,探测灵敏度高达3.56×1014cmHz1/2/W,其性能远高于目前的Si基探测器。
(3)本发明制作的光电探测器不仅可以探测近紫外光,同时对可见红外光具有比较强的探测能力,实现了对近紫外光和可见红外光的双重探测。
附图说明
图1是本发明的探测器结构图。
图2是本发明的ZnO纳米棒和钙钛矿层的SEM图。(a)、(b)分别为ZnO纳米棒的平面图和截面图;(c)、(d)分别为钙钛矿层的平面和截面图。
图3是本发明的探测器的不同MoO3厚度的I-V特性曲线。
图4是12nm厚度MoO3的探测器的明暗I-V特性曲线。
图5是12nm厚度MoO3的探测器的响应度曲线。
图6是12nm厚度MoO3的探测器的探测灵敏度曲线。
其中1---FTO层,2---ZnO纳米棒层,3---CH3NH3PbI3钙钛矿层,4---MoO3层,5---Au膜电极。
具体实施方式
下面通过实施例将能够更好地理解本发明。
实施例1:5nm厚度MoO3的探测器的制备:
(1)FTO的预处理:将FTO玻璃片切成面积为2cm*2cm的正方形玻璃样片,然后依次采用用去离子水,丙酮,酒精,去离子水进行超声清洗20分钟,将玻璃片表面的杂质清洗干净,再用紫外臭氧(UV)清洗15min,除去表面附着的有机物。
(2)ZnO种子层的制备:以甲醇为溶剂,配制5mmol/L的醋酸锌(Zn(CH3COO)2)溶液,搅拌5分钟,然后开始在FTO玻璃样片上旋涂,旋涂的转速为3000r/min,时间为15s,在100℃条件下烘干15分钟,然后转移到马 弗炉中退火1h。
(3)ZnO纳米棒的制备:在生长有ZnO种子层FTO玻璃样片上,用水浴法生长ZnO纳米棒,水浴溶液成分为50mmol/L的六水硝酸锌(Zn(NO3)2·6H2O)、30mmol/L的六次甲基四铵(C6H12N4)和0.6g的PEI(聚醚酰亚胺),同时利用氨水将溶液的PH值控制在10.6-10.8范围内,水浴的温度为85℃-90℃,根据不同棒长需求来控制水浴的时间。水浴结束后,先后用去离子水和酒精冲洗,去除表面的杂物,最后将其放入马弗炉中退火2h。
(4)两步法合成钙钛矿层(CH3NH3PbI3):第一步是旋涂PbI2,即以DMF(N,N-二甲基甲酰胺)为溶剂,配制1mmol/L(0.462g)的PbI2溶液,在70℃的恒温条件下搅拌4h,然后采用旋涂法将PbI2甩在PCBM层上,旋涂转速为3000r/min,时间为15s,旋涂好后放置在烘干台上烘烤5min;第二步是PbI2与碘甲胺反应合成钙钛矿,即以甲胺和氢碘酸、或氢氯酸、或氢溴酸为原料在低温下采用旋转蒸发法制备CH3NH3X(X为I、Br、Cl等卤素)晶体,并在乙醇与乙醚溶剂中进行重结晶。以异丙醇为溶剂,配制0.1g/10ml的CH3NHI溶液,然后将烘干后FTO样片(上面已经旋有PbI2)的放在溶液中浸泡40s,然后再在烘干台上烘烤10min;
(5)制备空穴传输层:采用蒸镀的方法,将半导体氧化物MoO3镀到钙钛矿层上面,蒸镀时保持10-4的真空度,蒸镀的速率控制在蒸镀的厚度为5nm。
(6)对电极的制备:以Au为电极材料,采用蒸镀的方法,蒸镀的速率控制在蒸镀的Au的厚度为40nm,即可制作成一个完整光电探测器。
将所制备得到的ZnO纳米棒和CH3NH3PbI3分别进行了X射线衍射(XRD)、扫描电子显微镜(SEM)表征分析。X射线衍射分析使用的仪器是D8Advance,测定条件是0.02°/步扫描。扫描电子显微镜的测定电压是在20KV的条件下进行的。将组装好的光电探测器测试其I-V特性曲线,光电响应曲线和响应的快慢。这些测试分析结果分别列于附图中。
实施例2:8nm厚度MoO3的探测器的制备:
(1)、(2)、(3)、(4)步骤与实施例1相同;
(5)制备空穴传输层:采用蒸镀的方法,将半导体氧化物MoO3镀到钙钛矿层上面,蒸镀时保持10-4的真空度,蒸镀的速率控制在蒸镀的厚度为8nm。
(6)对电极的制备:以Au为电极材料,采用蒸镀的方法,蒸镀的速率控制在蒸镀的Au的厚度为40nm,即可制作成一个完整光电探测器。
将所制备得到的ZnO纳米棒和CH3NH3PbI3分别进行了X射线衍射(XRD)、扫描电子显微镜(SEM)表征分析。X射线衍射分析使用的仪器是D8Advance,测定条件是0.02°/步扫描。扫描电子显微镜的测定电压是在20KV的条件下进行的。将组装好的光电探测器测试其I-V特性曲线,光电响应曲线和响应的快慢。这些测试分析结果分别列于附图中。
实施例3:12nm厚度MoO3的探测器的制备:
(1)、(2)、(3)、(4)步骤与实施例1相同;
(5)制备空穴传输层:采用蒸镀的方法,将半导体氧化物MoO3镀到钙钛矿层上面,蒸镀时保持10-4的真空度,蒸镀的速率控制在蒸镀的厚度为12nm。
(6)对电极的制备:以Au为电极材料,采用蒸镀的方法,蒸镀的速率控制在蒸镀的Au的厚度为40nm,即可制作成一个完整光电探测器。
将所制备得到的ZnO纳米棒和CH3NH3PbI3分别进行了X射线衍射(XRD)、扫描电子显微镜(SEM)表征分析。X射线衍射分析使用的仪器是D8Advance,测定条件是0.02°/步扫描。扫描电子显微镜的测定电压是在20KV的条件下进行的。将组装好的光电探测器测试其I-V特性曲线,光电响应曲线和响应的快慢。这些测试分析结果分别列于附图中。
实施例4:16nm厚度MoO3的探测器的制备:
(1)、(2)、(3)、(4)步骤与实施例1相同;
(5)制备空穴传输层:采用蒸镀的方法,将半导体氧化物MoO3镀到钙钛矿层上面,蒸镀时保持10-4的真空度,蒸镀的速率控制在蒸镀的厚度为16nm。
(6)对电极的制备:以Au为电极材料,采用蒸镀的方法,蒸镀的速率控制在蒸镀的Au的厚度为40nm,即可制作成一个完整光电探测器。
将所制备得到的ZnO纳米棒和CH3NH3PbI3分别进行了X射线衍射(XRD)、扫描电子显微镜(SEM)表征分析。X射线衍射分析使用的仪器是D8Advance,测定条件是0.02°/步扫描。扫描电子显微镜的测定电压是在20KV的条件下进行的。将组装好的光电探测器测试其I-V特性曲线,光电响应曲线和响应的快慢。这些测试分析结果分别列于附图中。
实施例5:20nm厚度MoO3的探测器的制备:
(1)、(2)、(3)、(4)步骤与实施例1相同;
(5)制备空穴传输层:采用蒸镀的方法,将半导体氧化物MoO3镀到钙钛矿层上面,蒸镀时保持10-4的真空度,蒸镀的速率控制在蒸镀的厚度为20nm。
(6)对电极的制备:以Au为电极材料,采用蒸镀的方法,蒸镀的速率控制在蒸镀的Au的厚度为40nm,即可制作成一个完整光电探测器。
将所制备得到的ZnO纳米棒和CH3NH3PbI3分别进行了X射线衍射(XRD)、扫描电子显微镜(SEM)表征分析。X射线衍射分析使用的仪器是D8Advance,测定条件是0.02°/步扫描。扫描电子显微镜的测定电压是在20KV的条件下进行的。将组装好的光电探测器测试其I-V特性曲线,光电响应曲线和响应的快慢。这些测试分析结果分别列于附图中。
Claims (1)
1.一种基于ZnO纳米棒/CH3NH3PbI3结构的自驱动光电探测器的制备方法,其特征在于步骤为:
(1)FTO的预处理:将FTO玻璃片切成面积为2cm×2cm的正方形玻璃样片,依次用去离子水,丙酮,酒精,去离子水进行超声清洗,再用紫外臭氧剂UV清洗15min;
(2)ZnO种子层的制备:以甲醇为溶剂,配制5mmol/L的醋酸锌Zn(CH3COO)2溶液,搅拌5分钟,然后开始在FTO玻璃样片上旋涂,旋涂的转速为3000r/min,时间为15s,在100℃条件下烘干10分钟,然后转移到马弗炉中退火2h;
(3)ZnO纳米棒的制备:在生长有ZnO种子层FTO玻璃样片上,用水浴法生长ZnO纳米棒,水浴溶液成分为50mmol/L的六水硝酸锌Zn(NO3)2·6H2O、30mmol/L的六次甲基四铵C6H12N4和0.6g的聚醚酰亚胺PEI,同时利用氨水将溶液的PH值控制在10.6-10.8范围内,水浴的温度为85℃-90℃,根据不同棒长需求来控制水浴的时间,水浴结束后,先后用去离子水和酒精冲洗,去除表面的杂物,最后转移到马弗炉中退火处理2h;
(4)两步法合成钙钛矿层CH3NH3PbI3:
第一步是旋涂PbI2,即以N,N-二甲基甲酰胺DMF为溶剂,配制1mmol/L的PbI2溶液,在70℃的恒温条件下搅拌4h,然后采用旋涂法将PbI2甩在ZnO纳米棒上,旋涂转速为3000r/min,时间为15s,旋涂好后放置在烘干台上烘烤5min;
第二步是PbI2与碘甲胺反应合成钙钛矿,即以甲胺和氢碘酸为原料在低温下采用旋转蒸发法制备CH3NH3I晶体,并在乙醇与乙醚溶剂中进行重结晶;再以异丙醇为溶剂,配制0.1g/10ml的CH3NHI溶液,然后将烘干后上面已经旋有PbI2的FTO样片放在溶液中浸泡40s,然后再在烘干台上烘烤10min;
(5)制备空穴传输层:采用蒸镀的方法,将半导体氧化物MoO3镀到钙钛矿层上面,蒸镀时保持10-4的真空度,蒸镀的速率控制在0.1埃/秒,蒸镀的MoO3厚度为12nm;
(6)对电极的制备:以Au为电极材料,采用蒸镀的方法,在空穴传输层上蒸镀一层Au,蒸镀的速率控制在0.8埃/秒,蒸镀的Au的厚度为40nm;
至此,即可制作成一个完整光电探测器。
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