CN105301783A - Six-beam interference system based on self-cleaning surface structure manufacture - Google Patents
Six-beam interference system based on self-cleaning surface structure manufacture Download PDFInfo
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- CN105301783A CN105301783A CN201410249593.5A CN201410249593A CN105301783A CN 105301783 A CN105301783 A CN 105301783A CN 201410249593 A CN201410249593 A CN 201410249593A CN 105301783 A CN105301783 A CN 105301783A
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Abstract
The present invention discloses a six-beam interference system based on self-cleaning surface structure manufacture, and the system is an integrated system which is simple in structure, is high in reliability, and is hardly affected by an external environment and noises. The system is divided into three parts: a light-dividing part, an angle adjusting part, and an equal-thickness coherent part. The system is characterized in that a laser is divided into three laser beams by a semi-reflection and semi-transmission lens after entering into the system; the three laser beams are enabled to respectively irradiate on wedge-shaped plates at the same incident angle through the angle adjustment of the total reflection mirror, wherein the wedge-shaped plates are at the same height and have the same size; the upper surface of each wedge-shaped plate is coated with a semi-reflection and semi-transmission film, and the lower surface of each wedge-shaped plate is coated with a total reflection film; the three laser beams are divided into six symmetrical beams with the same energy under the action of the wedge-shaped plates coated with the films; the six beams are converged at the position of an interference focus, thereby achieving six-beam interference potoetching for performing the micro-nano level processing to materials. Because all devices are disposed in the system and the technology of amplitude-dividing interference is employed, the interference system is greatly simplified and the precision of the system is greatly improved. Therefore, the system can be widely used for the nano processing.
Description
Technical field
The present invention is a kind of simple system based on six beam interferences, realizes the simplification of six beam system.The present invention can realize nanoscale, even Subnano-class optical interference structures, can be used on six beam interference light paths and to build and Three-beam Interfere light path is built, also can be used for the raising of six light beam photoetching research and development of products efficiency.
Technical background
At present, superfine comminution and ultra micro operation have entered the New Times of nanometer technology, and people are no longer confined to micron, sub-micrometer scale for microsize material physical chemistry Property requirements, but reach nanometer, sub-nanometer scale.Nanometer manufacture is technical field emerging in recent years, and its core technology is observability under micro-nano-scale and can be handling.Because micro-nano operation is achieved a part based on laser lithography system system, the complex that its light path is built and debugged brings very large difficulty to scientific research sex work, simultaneously also for the volume production of research products brings very large problem.
What current application was maximum is utilizes repeatedly light splitting, multiple reflections realizes coherent light beam.This method uses loaded down with trivial details, once light path has been built, usually cannot change before not reaching required effect.Use lens, catoptron more, price is also somewhat expensive." a kind of multi-beam formation system for interference photoetching " has achieved the improvement of the photo-etching light path of 2-5 light beam before this, does not reach the improvement of six light beams.The present invention adopts integral type cure system, only needs light beam to enter from light inlet, just can obtain six beam interferences, greatly reduce the complex of photo-etching light path system debug.
Technical Reference
[1] Zhang Jin, laser interference photolithography technology, Sichuan University Ph.D. Dissertation, 2003.
[2] beautiful jade is appointed, based on the laser interference photolithography technology research that multiple beam is relevant, Jilin University's master thesis, 2005.
[3] Zhong Xianqiong, Hu Xiaofei, Loli, Hou Junyong, to Anping, Principles of Laser and laser technology, 1671-1742 (2009) 04-0422-05.
[4] Ji Jinghu, Fu Yonghong, Wang Zuquan, Hua Xijun, laser surface across yardstick texturing mechanical seal frictional behaviour, 1674-8530.2012.04.015.
[5] Wang Wenmian, surveys long laser interferometer, aviation Precision Manufacturing Technology, 1995. for accurate and ultraprecise
[6] Jia Hongzhi, Li Yulin, neglects full profit, the manufacture method laser technology of fiber grating, 2001.
[7] Feng Bairu, a silk floss, Zong Derong, Jiang Shilei, make the phase shifting mask two-beam interference exposure method of grating, photoelectric project, 2003.
[8] Yao Chinese, Zhou Mingbao, Tian Hong, the photoetching technique of 21 st Century, 1999.
[9]OpticalandInterferometricLithography-NanotechnologyEnablers，S.R.J.BRUECK，FELLOW，IEEE.
[10]3DMicro-andNanostructuresviaInterferenceLithography，Ji-HyunJang，ChaitanyaK.Ullal，MartinMaldovan，TarasGorishnyy，StevenKooi，CheongYangKoh，andEdwinL.Thomas，DOI：10.1002/adfm.200700140.
[11]Large-areamicrolensarraysfabricatedonflexiblepolycarbonatesheetsviasingle-steplaserinterferenceablation，RuiGuo，DajunYuanandSumanDasJ.Micromech.Microeng.21(2011)015010.
[12]Fabricationofhighqualitysub-micronAugratingsoverlargeareaswithpulsedlaserinterferencelithographyforSPRsensors，AlexanderArriola，AinaraRodriguez，NoemiPerez，TxaberTavera，MichaelJ，Withford，AlexanderFuerbachandSantiagoM.Olaizola，2012OpticalSocietyofAmerica.
Summary of the invention
Existing micro/nano level interference lithography device, can realize the design of six light beam photo-etching light paths in theory, but system relative complex, involving great expense, in order to overcome above-mentioned deficiency, the invention provides a kind of simplified model based on six beam interferences.System not only structure is simple, and reliability is high, by external environment and noise effect little.
The object of the invention is to overcome the deficiencies in the prior art, filling technique improves blank and provides a kind of simplified model based on six beam interferences.
The present invention realizes by following technical measures:
Based on the simplification device based on six beam interferences, comprise spectral module, angular adjustment, uniform thickness are concerned with module.Described spectral module comprise spectroscope several pieces, catoptron several pieces; Angular adjustment comprises the three pieces of catoptrons being in sustained height; The uniform thickness module that is concerned with comprises the plate wedge that three pieces are in sustained height.
When beam of laser is from light inlet access to plant, first three light about the same can be divided into through two half-reflecting half mirrors
The catoptron being in sustained height through three again makes light with identical incident angles to plate wedge sustained height, every Ray Of Light of incident clapboard can reflect in clapboard upper and lower surface, form coherent ray, coherent ray just can be interfered after overconvergence.
The present invention compared with prior art has the following advantages: greatly reduce the complicacy that six light beam photo-etching light paths are built, and system architecture is simple, and reliability is high, by external environment and noise effect little.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the present invention is further described.
Fig. 1 is the overall pattern schematic diagram of simplification device based on six beam interferences;
Fig. 2 is the schematic diagram (single unit system) of device inner structure light splitting;
Fig. 3 is the schematic diagram (upper optical path part) of device inner structure light splitting
Fig. 4 is the schematic diagram (bottom equal thickness interference part, in three interference plates) of device inner structure light splitting
Fig. 5 is this device matlab analog simulation two dimension interference pattern.
Fig. 6 is this device matlab analog simulation three-dimensional interference pattern.
Concrete structure explanation
In figure 1, incident ray; 2, light inlet; 3, crust of the device; 4, emergent ray; 5, focus is interfered; 6, removable interference platform; 7, inner perspective; 8, half-reflecting half mirror; 9, total reflective mirror; 10, total reflective mirror; 11, half-reflecting half mirror; 12, total reflective mirror; 13, total reflective mirror; 14, part reflective semitransparent film (being plated in clapboard upper surface); 15, optical glass clapboard; 16, crust of the device; 17, be all-trans film (being plated in clapboard lower surface).
8,9,10,11,12,13,14,15,16,17 all belong to device (7) inside.
Embodiment
In the drawings, spectral module () comprises (1) light inlet, (8) (11) half-reflecting half mirror; Angular adjustment (two) comprises (9) (10) (13) catoptron; The uniform thickness module (three) that is concerned with comprises plate wedge (15).
Before the device is to be used, low-power laser is first used to find device to interfere focus (5), regulating device and the position of interfering platform and miscellaneous part.Select required laser energy, make incident ray (1) from light inlet (2) access to plant, thus obtain emergent ray (4), in interference, focus (5) place forms six beam interferences, and interference pattern is as shown in Figure 5, Figure 6.
Inner at device (7), incident ray (1) is after light inlet (2) access to plant, first under the effect of half-reflecting half mirror (8) and half-reflecting half mirror (11), laser is divided into the three-beam of energy equalization, three-beam respectively directive has adjusted the total reflective mirror (10) of angle, (12), (13) on, in total reflective mirror (10), (12), (13) under effect, make three-beam identical with identical angle directive height, on the clapboard (15) that size thickness is all identical, clapboard lays respectively on three faces of device, it is capable that three clapboards form positive triangle, clapboard is to have the optical glass of high laser damage threshold for material, and optical glass has fabulous reflection and delivery capabilities, it is splendid device clapboard Material selec-tion, when light incides clapboard surface, because clapboard upper surface is coated with part reflective semitransparent film (14), the two-beam that the light beam transmission making to incide clapboard is identical with being refracted as energy, the light being transmitted to clapboard arrives the lower surface of clapboard, lower surface due to clapboard is coated with the film that is all-trans (17), transmitted light is made all to reflex to the upper surface (14) of clapboard at clapboard lower surface, go out to occur to reflect also transmission at the upper surface of clapboard to go out, on clapboard, the two-beam of reflection and transmission finally interferes at interference focus (5) place.
It is identical that each clapboard can form two bundle Space Angle, the two-beam interference that phase angle is obstructed, three pieces of clapboards of equilateral triangle position can form six symmetrical beam interferences, be placed on removable interference platform (6) by needing the material carrying out processing, and regulate the relative position of interfering focus (5) and removable interference platform (6), make interference Jiao of six light beams fall (5) by chance to converge removable interference platform (6), thus carry out six beam interference photoetching, carry out the processing and manufacturing of material.
Manufactured structure has the self-cleaning structure of imitative lotus leaf and hydrophobic ability, can reach automatically cleaning effect.
Claims (4)
1., based on the six beam interference systems that self-cleaning surface structure manufactures, it is characterized in that: system comprises crust of the device (3), half-reflecting half mirror (8,11), total reflective mirror (9,10,12,13), part reflective semitransparent film (being plated in clapboard upper surface) (14), optical glass clapboard (15), be all-trans film (being plated in clapboard lower surface) (17), described half-reflecting half mirror (8, 11) and total reflective mirror (9, 10, 12, 13) device inside is fixed on, and adjust angle according to light path and fix, make light by total reflective mirror (10, 12, 13) clapboard (15) can be entered with equal angular incident light after, described optical glass clapboard (15) needs three size shape identical, and be fixed on three identical At The Heights of inside surface of regular triangular prism shell (3), use optical glass clapboard (13) upper surface of described use need plate part reflective semitransparent film (14), lower surface need plate the film that is all-trans (17), described device internal components fixed position need meet light path, after laser is entered from light inlet (2), emergent ray (4) can be formed outward at device interferes focus (5).
2. the six beam interference systems manufactured based on self-cleaning surface structure according to claim 1, is characterized in that: spectral module () comprises (1) light inlet, (8,11) half-reflecting half mirror; Angular adjustment (two) comprises (9,10,13) catoptron; The uniform thickness module (three) that is concerned with comprises plate wedge (15); Incident ray (4) needs vertical incidence access to plant, penetrates after apparatus system, six beam interferences needed for formation; Optical glass plate wedge (15) upper surface is coated with part reflective semitransparent film (14), lower surface is coated with the film that is all-trans (17), make the laser inciding clapboard (15) produce the light splitting of reflected light and transmitted light, finally can reach amplitude-splittine interference; Because clapboard (15) has same material, formed objects and height, in angular adjustment module, regulate identical incident angle of light to enter into clapboard (15), thus the emergent ray of clapboard (15) (4) can be made to focus on a bit (5).
3. the six beam interference systems manufactured based on self-cleaning surface structure according to claim 1, it is characterized in that: the material that can carry out the photoetching of micro/nano level six beam interference makes, its micro/nano level material made has the self-cleaning structure of imitative lotus leaf, with super-hydrophobic micro-nano structure, as Fig. 5, Fig. 6, thus the material of manufacture can be made to reach self-cleaning ability.
4. the six beam interference systems manufactured based on self-cleaning surface structure according to claim 2, it is characterized in that: incident ray (1) respectively through, spectral module (one) comprises (1) light inlet, (8,11) half-reflecting half mirror, angular adjustment (two) comprises (9,10,13) catoptron, the uniform thickness module (three) that is concerned with comprises plate wedge (15), and emergent ray (4) focuses on formation six beam interference focus (5).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410249593.5A CN105301783A (en) | 2014-05-28 | 2014-05-28 | Six-beam interference system based on self-cleaning surface structure manufacture |
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| CN201410249593.5A CN105301783A (en) | 2014-05-28 | 2014-05-28 | Six-beam interference system based on self-cleaning surface structure manufacture |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2449258Y (en) * | 2000-11-08 | 2001-09-19 | 中国科学院光电技术研究所 | Multi-beam formation system for interference photoetching |
| CN1731284A (en) * | 2004-08-05 | 2006-02-08 | 中国科学院光电技术研究所 | Adopt the image interference photoetching method and the etching system thereof of gating shutter and Dove prism |
| CN1837963A (en) * | 2006-04-27 | 2006-09-27 | 天津师范大学 | Method and apparatus for once forming of round grating by optical linear element |
| CN1949087A (en) * | 2006-11-03 | 2007-04-18 | 上海微电子装备有限公司 | Aligning system of photoetching apparatus and steping combined system of said aligning system thereof |
-
2014
- 2014-05-28 CN CN201410249593.5A patent/CN105301783A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2449258Y (en) * | 2000-11-08 | 2001-09-19 | 中国科学院光电技术研究所 | Multi-beam formation system for interference photoetching |
| CN1731284A (en) * | 2004-08-05 | 2006-02-08 | 中国科学院光电技术研究所 | Adopt the image interference photoetching method and the etching system thereof of gating shutter and Dove prism |
| CN1837963A (en) * | 2006-04-27 | 2006-09-27 | 天津师范大学 | Method and apparatus for once forming of round grating by optical linear element |
| CN1949087A (en) * | 2006-11-03 | 2007-04-18 | 上海微电子装备有限公司 | Aligning system of photoetching apparatus and steping combined system of said aligning system thereof |
Non-Patent Citations (1)
| Title |
|---|
| 于淼: "激光干涉光刻纳米阵列的研究", 《中国优秀硕士学位论文全文数据库》 * |
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