CN105296934B - A kind of linear evaporation source and evaporated device - Google Patents

A kind of linear evaporation source and evaporated device Download PDF

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Publication number
CN105296934B
CN105296934B CN201510761075.6A CN201510761075A CN105296934B CN 105296934 B CN105296934 B CN 105296934B CN 201510761075 A CN201510761075 A CN 201510761075A CN 105296934 B CN105296934 B CN 105296934B
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crucible
nozzle
evaporation source
linear evaporation
diffuser plate
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CN105296934A (en
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金薰
李浩永
卢正权
金甲锡
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Hefei Sineva Intelligent Machine Co Ltd
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Hefei Sineva Intelligent Machine Co Ltd
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Abstract

The invention discloses a kind of linear evaporation source and evaporated devices, to reduce the generation of spray nozzle clogging phenomenon, improve vapor deposition efficiency.Wherein, linear evaporation source, including:The crucible of one end open, the interior hollow chamber being equipped with for housing evaporation material of crucible;It is enclosed in crucible outside, the primary heater of heat is provided for crucible;Lid closes the overhead guard of crucible openend, and overhead guard is equipped with multiple nozzles being used for the evaporation material for treating plated substrate injection caburation;It further includes:The secondary heater of identical heat is provided for each nozzle, secondary heater includes:The fire end of the outer surface of corresponding nozzle is corresponded and is wrapped in nozzle.

Description

A kind of linear evaporation source and evaporated device
Technical field
The present invention relates to evaporated device technical field, more particularly to a kind of linear evaporation source and evaporated device.
Background technology
In recent years, display of organic electroluminescence (OLED) is gradually more closed as a kind of novel FPD Note.Due to its have actively shine, light emission luminance height, high resolution, wide viewing angle, fast response time, low energy consumption and can flexibility The features such as change, becomes the next-generation display technology it is possible that instead of liquid crystal display.
Evaporation coating device is the experiment and production equipment applied to field of film preparation, in organic electroluminescent LED (OLED), the organic photoelectrics field such as organic solar batteries (OPV), organic field effect tube (OFET) is widely used.
Organic Light Emitting Diode (Organic Light-Emitting Diode, abbreviation OLED) is by being deposited organic material To make the carrier blocking layers and organic luminous layer that form OLED display device.The evaporation source of OLED evaporation coating devices now point For dot evaporation source and linear evaporation source.The organic vapor deposition material being deposited in evaporation source is mainly divided to two kinds, and one kind is subliming type Organic material, it is another then be fusion organic material.Wherein, subliming type organic material mainly directly adds organic material Heat, organic material distillation is cooled on substrate again for gaseous state forms organic film;Fusion organic material then first melts after the heating It is gaseous state to heat up again for liquid, is finally cooled on substrate again and forms organic film.
Multiple nozzles of the linear sources used at present generally by crucible and above crucible form, crucible and nozzle periphery Edge is equipped with heater strip, by being heated to crucible, evaporation material therein is made to become steam, the steam after crucible inner homogeneous It is ejected on substrate and forms a film from nozzle.
But in the case where using linear evaporation source, since temperature is uneven when the heat of evaporation source emits to spray nozzle part It is even, it may occur that the phenomenon that evaporation material plug nozzle, to reduce vapor deposition efficiency.
Invention content
The object of the present invention is to provide a kind of linear evaporation source and evaporated device, to reduce the hair of spray nozzle clogging phenomenon It is raw, improve vapor deposition efficiency.
In order to achieve the above objectives, the present invention provides following technical solutions:
The present invention provides a kind of linear evaporation source, including:The crucible of one end open, the crucible is interior to be equipped with to house The hollow chamber of evaporation material;It is enclosed in the crucible outside, the primary heater of heat is provided for the crucible;Described in lid closes The overhead guard of crucible openend, the overhead guard are equipped with multiple nozzles being used for the evaporation material for treating plated substrate injection caburation;Also Including:
The secondary heater of heat is provided for each nozzle, the secondary heater includes:With the nozzle one by one The fire end of outer surface that is corresponding and being wrapped in the corresponding nozzle.
Linear evaporation source provided by the invention, by setting secondary heater in the outside of each nozzle so that nozzle is each Partial temperature is uniform, avoids the temperature at nozzle different or relatively low, and evaporation material temperature reduction at nozzle is caused to be cooled to The generation of the phenomenon that solid plug nozzle, and then vapor deposition efficiency can be improved.
In some optional embodiments, the secondary heater be even heat distribution heating plate, and it is described plus Hot plate is equipped with the one-to-one first through hole of the nozzle to form multiple fire ends.Heating plate can be electrical heating Plate, heating plate are equipped with the conducting wire being electrically connected with external power supply, and certainly, the material that heating plate can also have self-heating is made.
In some optional embodiments, the material of the heating plate is 6061T6 aluminium.6061T6 high intensity, high rigidity (more than HV90 degree) good processing effect, oxidation effectiveness is good, and no trachoma stomata, flatness is preferable, improves processing efficiency, Reduce material cost.
In some optional embodiments, it is tightly connected between the overhead guard and the crucible by sealing ring.Sealing The generation for the phenomenon that setting of circle can prevent the evaporation material in crucible from being overflowed out of crucible after gasifying.
In some optional embodiments, the material of the sealing ring includes:In nickel, 304 stainless steels, 316L stainless steels Any one.
In some optional embodiments, the first diffuser plate is equipped in the overhead guard, first diffuser plate is located at institute It states between secondary heater and the crucible, first diffuser plate is equipped with and one-to-one first outlet of the nozzle Mouthful, and the aperture of first gas outlet is adjustable.The effect of this first gas outlet is:The gas evaporated in crucible can be radiated, According to the size and location of mouth, can uniformly to radiate by the gas of nozzle.In addition, the aperture because of the first gas outlet It is adjustable, so the exit dose that the material in adjustable crucible passes through the first gas outlet so that can keep certain pressure inside crucible Power.
In some optional embodiments, the second diffuser plate is equipped in the crucible, second diffuser plate is located at institute Between stating the evaporation material in the first diffuser plate and the crucible, second diffuser plate is equipped with to be corresponded with the nozzle The second gas outlet, and the aperture of second gas outlet is adjustable.The effect of this second gas outlet is:It can will evaporate in crucible Gas radiates, and according to the size and location of mouth, can uniformly to radiate by the gas of nozzle.In addition, go out because of second The aperture of gas port is adjustable, so the exit dose that the material in adjustable crucible passes through the first gas outlet so that can be protected inside crucible Hold certain pressure.
In some optional embodiments, the primary heater includes:The master being distributed along the crucible short transverse Heating part and auxiliary heating part.Main heating part and auxiliary heating part can control respectively to the heat that crucible exports, and auxiliary heating part can be with According to evaporation material number, selection is opened or the temperature that is not turned on and is exported after opening.
In some optional embodiments, each nozzle is equipped with nozzle cover, and the nozzle cover is equipped at least One spray orifice.In this way convenient for control nozzle emitted dose, the uniformity of coating film thickness on substrate is improved.
At least one baffle is equipped in some optional embodiments, in the crucible with by the hollow cavity of the crucible Room is divided into multiple sub-chamber.The uniformity of evaporation material evaporation can be improved in this way.
In some optional embodiments, it is additionally provided with to measure the vapor deposition film thickness treated on plated substrate on the overhead guard Measurement nozzle.The setting of nozzle is measured convenient for measuring the thickness of the evaporation film on substrate to be deposited, gas is by measuring nozzle It emits in the system (commonly referred to as Thickness Monitor) for measuring thickness, is deposited by the system for measuring thickness The thickness of film, and the service life of measurement quartz element can be improved.
In some optional embodiments, above-mentioned linear evaporation source further includes:For accommodating the crucible, the first heating The shell of device, overhead guard and secondary heater, the head cover of the shell, which is equipped with, to be corresponded and allows corresponding with the nozzle The second through-hole for passing through of the nozzle, the head cover of the shell be additionally provided with corresponded at least one measurement nozzle and Allow the corresponding third through-hole for measuring nozzle and passing through.The setting of shell can be in order to keep the temperature crucible, and can be with The heat that evaporation source generates is prevented to be directly injected to treat on plated substrate.
In some optional embodiments, the medial surface of the shell is equipped with reflecting plate.The setting of reflecting plate is used for The heat being distributed on outer casing inner wall in the heat that primary heater is generated reflexes to crucible outer wall, improves primary heater The efficiency of heating surface.
In some optional embodiments, the material of the reflecting plate includes:Titanium, 304 stainless steels, 316L stainless steels, Any one in molybdenum, tantalum.
In some optional embodiments, the lateral wall of the shell is equipped with cooling device.The setting of cooling device, can It is lost in from the outer wall of shell to avoid heat, prevents that neighbouring object is caused to scald, certain shell can also use thermal insulation Material is made, and can also play generation the phenomenon that preventing from causing neighbouring object scald.Above-mentioned cooling device can be cold But line or be internally provided with cooling liquid cooling tube.
The present invention also provides a kind of evaporated device, including linear evaporation source described in any one of the above embodiments.Due to above-mentioned line Shape evaporation source can reduce the generation of spray nozzle clogging phenomenon, can improve vapor deposition efficiency.Therefore evaporated device provided by the invention, tool There is preferable performance, and production efficiency can be improved.
Description of the drawings
Fig. 1 is linear a kind of structure diagram of evaporation source provided in an embodiment of the present invention;
Fig. 2 is another structure diagram of linear evaporation source provided in an embodiment of the present invention;
Fig. 3 is the structural solid figure of the secondary heater of linear evaporation source provided in an embodiment of the present invention;
Fig. 4 is the interior section structure diagram of linear evaporation source provided in an embodiment of the present invention;
Fig. 5 is the structure diagram of the primary heater of linear evaporation source provided in an embodiment of the present invention;
Fig. 6 is the internal structure schematic diagram of the crucible of linear evaporation source provided in an embodiment of the present invention.
Reference numeral:
1- crucible 11- sub-chamber
12- baffle 21- primary heaters
The main auxiliary heating parts of heating part 212- of 211-
22- secondary heater 221- first through hole
3- overhead guard 31- nozzles
311- nozzle cover 4- sealing rings
51- the first diffuser plate the second diffuser plates of 52-
6- measures nozzle 7- shells
71- head cover 8- cooling devices
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present invention, the technical solution in the embodiment of the present invention is carried out clear, complete Site preparation describes, it is clear that described embodiment is only part of the embodiment of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, those of ordinary skill in the art are obtained every other without making creative work Embodiment belongs to the range of patent protection of the present invention.
As depicted in figs. 1 and 2, wherein:Fig. 1 is linear a kind of structure diagram of evaporation source provided in an embodiment of the present invention; Fig. 2 is another structure diagram of linear evaporation source provided in an embodiment of the present invention;Linear evaporation source provided by the invention, packet It includes:The crucible 1 of one end open, the interior hollow chamber being equipped with for housing evaporation material of crucible 1;It is enclosed in 1 outside of crucible, is earthenware Crucible 1 provides the primary heater 21 of heat;Lid closes the overhead guard 3 of 1 openend of crucible, and overhead guard 3 is equipped with multiple be used for base to be plated The nozzle 31 of the evaporation material of plate injection caburation;It further includes:
The secondary heater 22 of identical heat is provided for each nozzle 31, secondary heater 22 includes:With nozzle 31 1 One corresponds to, and be wrapped in the fire end of the outer surface of corresponding nozzle 31.
Linear evaporation source provided by the invention, by setting secondary heater 22 in the outside of each nozzle 31 so that spray The temperature of 31 each section of mouth is uniform, avoids the temperature at nozzle 31 different or relatively low, leads to evaporation material temperature at nozzle 31 The generation for the phenomenon that being cooled to solid plug nozzle 31 is reduced, and then vapor deposition efficiency can be improved.
The concrete structure of above-mentioned secondary heater 22 can there are many, in a kind of specific embodiment, as shown in figure 3, Fig. 3 The structural solid figure of secondary heater for linear evaporation source provided in an embodiment of the present invention;Secondary heater 22 is even heat The heating plate of distribution, and heating plate is equipped with and corresponds first through hole 221 with nozzle 31 to form multiple fire ends.Heating plate Can be electric boiling plate, electric boiling plate is equipped with the conducting wire being electrically connected with external power supply, and certainly, heating plate can also be sent out by itself The material of heat is made.
The material of above-mentioned heating plate is 6061T6 aluminium.6061T6 high intensity, high rigidity are good (more than HV90 degree) Processing effect, oxidation effectiveness is good, and no trachoma stomata, flatness is preferable, improves processing efficiency, reduces material cost.
As shown in figure 4, Fig. 4 is the interior section structure diagram of linear evaporation source provided in an embodiment of the present invention;Overhead guard 3 It is tightly connected between crucible 1 by sealing ring 4.The setting of sealing ring 4 can prevent evaporation material in crucible 1 gasify after from The generation for the phenomenon that being overflowed in crucible 1.
The material of above-mentioned sealing ring 4 includes:Any one in nickel, 304 stainless steels, 316L stainless steels.
As shown in figure 4, being equipped with the first diffuser plate 51 on the inner wall of overhead guard 3, the first diffuser plate 51 is located at secondary heater Between 22 and crucible 1, the first diffuser plate 51 be equipped with nozzle 31 one-to-one first gas outlet, and the first gas outlet is opened It spends adjustable.The setting of first diffuser plate can keep the pressure inside crucible so that evaporation source uniformly radiates, and prevents evaporation source The generation of spillover, prevents evaporation source from disperseing.The effect of this first gas outlet is:The gas evaporated in crucible 1 can be radiated, According to the size and location of the first gas outlet, can uniformly to radiate by the gas of nozzle 31.In addition, go out because of first The aperture of gas port is adjustable, so the exit dose that the material in adjustable crucible 1 passes through the first gas outlet so that 1 inside energy of crucible Keep certain pressure.
Further, the second diffuser plate 52 is equipped in crucible 1, the second diffuser plate 52 is located at the first diffuser plate 51 and crucible 1 Between interior evaporation material, the second diffuser plate 52 is equipped with and 31 one-to-one second gas outlet of nozzle, and the second gas outlet Aperture it is adjustable.The setting of second diffuser plate can keep the pressure inside crucible so that evaporation source uniformly radiates, and prevents from steaming Rise the generation of spillover, prevents evaporation source from disperseing.The effect of this second gas outlet is:The gas that can will be evaporated in crucible 1 Radiation, according to the size and location of the second gas outlet, can uniformly to radiate by the gas of nozzle 31.In addition, because The aperture of second gas outlet is adjustable, so the exit dose that the material in adjustable crucible passes through the first gas outlet so that in crucible Portion can keep certain pressure.
The concrete structure of above-mentioned primary heater 21 can also there are many, in a kind of optional embodiment, such as Fig. 5 institutes Show, Fig. 5 is the structure diagram of the primary heater 21 of linear evaporation source provided in an embodiment of the present invention;Primary heater 21 wraps It includes:The main heating part 211 and auxiliary heating part 212 being distributed along 1 short transverse of crucible.Earthenware is given in main heating part 211 and auxiliary heating part 212 Crucible 1 export heat can control respectively, auxiliary heating part 212 can according to evaporation material number, selection open or be not turned on And the temperature that exports after opening, the uniformity of evaporation material in crucible 1 can be further improved.
In a kind of optional embodiment, as shown in figure 4, each nozzle 31 is equipped with nozzle cover 311, on nozzle cover 311 Equipped at least one spray orifice.In this way convenient for control 31 emitted dose of nozzle, the uniformity of coating film thickness on substrate is improved.
As shown in fig. 6, Fig. 6 is the internal structure schematic diagram of the crucible 1 of linear evaporation source provided in an embodiment of the present invention;Earthenware At least one baffle 12 is equipped in crucible 1 so that the hollow chamber of crucible 1 is divided into multiple sub-chamber 11.Vapor deposition material can be improved in this way Expect the uniformity of evaporation.
In a kind of preferable embodiment, it is additionally provided with to measure the measurement for treating the film thickness of the vapor deposition on plated substrate on overhead guard Nozzle 6.The setting of nozzle 6 is measured convenient for measuring the thickness of the evaporation film on substrate to be deposited, gas is by measuring emission nozzles Onto the system (commonly referred to as Thickness Monitor) for measuring thickness, evaporation film is obtained by the system for measuring thickness Thickness, and the service life of measurement quartz element can be improved.
The heat that crucible 1 generates in order to prevent scatters and disappears, as shown in Figure 1, above-mentioned linear evaporation source further includes:For accommodating earthenware Crucible 1, primary heater 21, overhead guard 3 and secondary heater 22 shell 7, the head cover 71 of shell 7 is equipped with nozzle 31 one by one The second through-hole corresponding and that corresponding nozzle 31 is allowed to pass through, the head cover 71 of shell 7 are additionally provided with and at least one measurement nozzle 6 one One corresponds to and allows the third through-hole that corresponding measurement nozzle 6 passes through.The setting of shell 7 can in order to be kept the temperature to crucible 1, And the heat that can prevent evaporation source from generating is directly injected to and treats on plated substrate.
Further, the medial surface of shell is equipped with reflecting plate.The setting of reflecting plate is for primary heater 21 to be generated Heat in the heat that is distributed on 7 inner wall of shell reflex to 1 outer wall of crucible, improve the efficiency of heating surface of primary heater 21.
The material of said reflection plate includes any one in titanium, 304 stainless steels, 316L stainless steels, molybdenum, tantalum.
In preferable embodiment, the lateral wall of shell 7 is equipped with cooling device 8.The setting of cooling device 8, can be to avoid Heat is lost in from the outer wall of shell 7, prevents that neighbouring object is caused to scald, and certain shell 7 can also use heat-insulating material It is made, generation the phenomenon that preventing from causing neighbouring object scald can also be played.Above-mentioned cooling device 8 can be cooling line Or it is internally provided with the cooling tube of cooling liquid.
The present invention also provides a kind of evaporated device, including linear evaporation source described in any one of the above embodiments.Due to above-mentioned line Shape evaporation source can reduce the generation of spray nozzle clogging phenomenon, can improve vapor deposition efficiency.Therefore evaporated device provided by the invention, tool There is preferable performance, and production efficiency can be improved.
Obviously, various changes and modifications can be made to the invention without departing from essence of the invention by those skilled in the art God and range.In this way, if these modifications and changes of the present invention belongs to the range of the claims in the present invention and its equivalent technologies Within, then the present invention is also intended to include these modifications and variations.

Claims (14)

1. a kind of linear evaporation source, including:The crucible of one end open, the crucible is interior to be equipped with to house the hollow of evaporation material Chamber;It is enclosed in the crucible outside, the primary heater of heat is provided for the crucible;Lid closes the top of the crucible openend Cover, the overhead guard are equipped with multiple nozzles being used for the evaporation material for treating plated substrate injection caburation;It is characterized in that, it also wraps It includes:
The secondary heater of heat is provided for each nozzle, the secondary heater includes:Corresponded with the nozzle, And it is wrapped in the fire end of the outer surface of the corresponding nozzle;
The first diffuser plate is equipped in the overhead guard, first diffuser plate between the secondary heater and the crucible, First diffuser plate be equipped with one-to-one first gas outlet of the nozzle, and the aperture of first gas outlet can It adjusts;
The second diffuser plate is equipped in the crucible, second diffuser plate is located at the steaming in first diffuser plate and the crucible Between plating material, second diffuser plate is equipped with and one-to-one second gas outlet of the nozzle, and second outlet The aperture of mouth is adjustable.
2. linear evaporation source as described in claim 1, which is characterized in that the secondary heater adds for even heat distribution Hot plate, and the heating plate is equipped with the one-to-one first through hole of the nozzle to form multiple fire ends.
3. linear evaporation source as claimed in claim 2, which is characterized in that the material of the heating plate is 6061T6 aluminium.
4. linear evaporation source as claimed in claim 2, which is characterized in that pass through sealing ring between the overhead guard and the crucible It is tightly connected.
5. linear evaporation source as claimed in claim 4, which is characterized in that the material of the sealing ring includes:It is nickel, 304 stainless Any one in steel, 316L stainless steels.
6. linear evaporation source as described in claim 1, which is characterized in that the primary heater includes:Along crucible height Spend the main heating part of directional spreding and auxiliary heating part.
7. linear evaporation source as described in claim 1, which is characterized in that each nozzle is equipped with nozzle cover, the spray Mouth is covered equipped at least one spray orifice.
8. linear evaporation source as described in claim 1, which is characterized in that at least one baffle is equipped in the crucible with by institute The hollow chamber for stating crucible is divided into multiple sub-chamber.
9. such as the linear evaporation source of claim 1~8 any one of them, which is characterized in that be additionally provided with to survey on the overhead guard Amount treats the measurement nozzle of the vapor deposition film thickness on plated substrate.
10. linear evaporation source as claimed in claim 9, which is characterized in that further include:For accommodate the crucible, first plus The shell of hot device, overhead guard and secondary heater, the head cover of the shell, which is equipped with, to be corresponded with the nozzle and allows pair The second through-hole that the nozzle answered passes through, the head cover of the shell, which is additionally provided with, to be corresponded and permits at least one measurement nozzle Perhaps the corresponding third through-hole for measuring nozzle and passing through.
11. linear evaporation source as claimed in claim 10, which is characterized in that the medial surface of the shell is equipped with reflecting plate.
12. linear evaporation source as claimed in claim 11, which is characterized in that the material of the reflecting plate includes:Titanium, 304 are not It becomes rusty steel, 316L stainless steels, molybdenum, any one in tantalum.
13. linear evaporation source as claimed in claim 10, which is characterized in that the lateral wall of the shell is equipped with cooling device.
14. a kind of evaporated device, which is characterized in that including such as linear evaporation source of claim 1~13 any one of them.
CN201510761075.6A 2015-11-09 2015-11-09 A kind of linear evaporation source and evaporated device Active CN105296934B (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010080109A1 (en) * 2008-12-18 2010-07-15 Veeco Instruments Inc. Vacuum deposition sources having heated effusion orifices
CN102676999A (en) * 2011-03-08 2012-09-19 株式会社日立高新技术 Evaporation source and deposition apparatus
CN103476962A (en) * 2011-03-30 2013-12-25 夏普株式会社 Deposition particle emitting device, deposition particle emission method, and deposition device
CN203593780U (en) * 2013-09-24 2014-05-14 京东方科技集团股份有限公司 Vapor deposition sprayer and vapor deposition equipment
CN104762601A (en) * 2015-04-30 2015-07-08 京东方科技集团股份有限公司 Evaporator source, evaporation device and evaporation method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010080109A1 (en) * 2008-12-18 2010-07-15 Veeco Instruments Inc. Vacuum deposition sources having heated effusion orifices
CN102676999A (en) * 2011-03-08 2012-09-19 株式会社日立高新技术 Evaporation source and deposition apparatus
CN103476962A (en) * 2011-03-30 2013-12-25 夏普株式会社 Deposition particle emitting device, deposition particle emission method, and deposition device
CN203593780U (en) * 2013-09-24 2014-05-14 京东方科技集团股份有限公司 Vapor deposition sprayer and vapor deposition equipment
CN104762601A (en) * 2015-04-30 2015-07-08 京东方科技集团股份有限公司 Evaporator source, evaporation device and evaporation method

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