CN105259666A - Device for manufacturing microstructure through focal field trajectory based on dynamic control - Google Patents
Device for manufacturing microstructure through focal field trajectory based on dynamic control Download PDFInfo
- Publication number
- CN105259666A CN105259666A CN201510860470.XA CN201510860470A CN105259666A CN 105259666 A CN105259666 A CN 105259666A CN 201510860470 A CN201510860470 A CN 201510860470A CN 105259666 A CN105259666 A CN 105259666A
- Authority
- CN
- China
- Prior art keywords
- field
- femtosecond
- dynamic
- micro
- vectorial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
Abstract
A device for manufacturing a microstructure through a focal field trajectory based on dynamic control. The device comprises a femtosecond laser, a dynamic femtosecond vector light field array generation and control system and a tightly-focused micromachining system. According to the working principle, a holographic grating is loaded on a spatial light modulator for generating a vector light field array, and a tightly-focused field with the specific light intensity distribution is obtained through focusing of a microscope objective. The dynamic-changing vector light field array is obtained by designing dynamic-changing holographic grating, and a focal field trajectory in the special shape such as a quadrangle, an octagon, a fan blade shape and the like and changing along with time can be generated after tight focusing is performed. On the basis of the generated focal field trajectory, the microstructure corresponding to the focal field trajectory can be obtained on the basis of the generated focal field trajectory. Compared with other methods for manufacturing micro nanometer structures, the device has the unique advantage that samples or light sources do not need to move, the manufactured microstructure is close to the wavelength magnitude, the two-dimensional/three-dimensional structure of any design can be machined, and the advantages of being efficient, high in repeatability, good in stability and the like are achieved when the microstructure is manufactured.
Description
Technical field
The invention belongs to the regulation and control of light field polarization and femtosecond laser micro-nano technology field, be specifically related to utilize the femtosecond vectorial field array of dynamic regulation regulate and control burnt field track and carry out the apparatus and method of micro-nano technology based on this.
Background technology:
In more than ten years in past, along with the development of femtosecond laser technology, the application of femtosecond laser micro-nano technology is more and more extensive.Femtosecond laser relies on its intrinsic ultrashort and superpower characteristic, more traditional Long Pulse LASER has many incomparable unique advantages in microfabrication: the non-thermofusible of process, the accuracy of processing stage, the submicron features of processing dimension, the popularity etc. of rapidoprint, be thus widely used for processing metal, semiconductor and dielectric material etc.Meanwhile, femtosecond laser parallel micromachining technology is also a kind of method making two dimension or three-dimensional structure in transparent material.But femtosecond laser micro-nano technology also has the feature that working (machining) efficiency is low, this is because general Laser Processing is all process based on the mode of single-spot scanning.In order to improve the efficiency of processing, the interference hot spot of multiple beam or multiple-beam interference can be adopted to carry out parallel fabrication, but the shortcoming of these methods lacks dirigibility when the two-dimensional/three-dimensional microstructure of processed complex.
Polarization, as an important attribute of light field, plays very important effect in the regulation and control of light.Recent years, the spatial domain of light field is regulated and controled, especially the spatial domain of polarization state is regulated and controled, achieved some impressive progresses, and become extensively concerned research field.Vectorial field or non-uniform polarisation light field, namely in light field wave front, diverse location has the light field of different polarization states, as the space structure light field that a class is very important, the distribution of its non-uniform polarisation causes novel temporal-spatial evolution behavior and many new kink characteristics being different from scalar field.Radial polarisation light field can be tightly focused into 0.16 λ
2the far-field focus of super diffraction limit, and linearlypolarized laser can only realize 0.26 λ under the same conditions
2focused spot.Utilize the combined regulating of light field polarization state and position phase, rotation direction (angle) the polarization vector light field of carrying vortex position phase can be set up, after tight focusing, less super diffraction limit far-field focus can be obtained.Especially, the tight radial polarisation light field that focuses on can generate strong longitudinal electric field component (referred to as longitudinal field, namely its polarization direction axially).Recently, femtosecond vectorial field has been used to the micro-nano structure preparing sub-wavelength at solid material surface.For single vectorial field, a general only generation focused spot under tight focused condition, and its working (machining) efficiency of the micro-nano technology of single focal spot is the significant challenge faced at present.But, for the vectorial field array be made up of multiple single vectorial field, due to polarization state distribution and the spatial arrangement thereof of each vectorial field can be designed separately, therefore can realize the three-dimensional regulation and control of focusing field and then obtain multifocal spot, thus in the efficiency improving micro-nano technology, very large application potential [K.Lou is had, S.X.Qian, Z.C.Ren, C.H.Tu, Y.N.Li, andH.T.Wang, " FemtosecondLaserProcessingbyUsingPatternedVectorOpticalF ields; " Sci.Rep.3,2281 (2013); M.Q.Cai, C.H.Tu, H.H.Zhang, S.X.Qian, K.Lou, Y.N.Li, andH.T.Wang, " Subwavelengthmultiplefocalspotsproducedbytightfocusedthe patternedvectoropticalfields, " Opt.Express21,31469 – 31482 (2013) .].
Based on the polarization state distribution of vectorial field single in vectorial field array and the design of spatial arrangement of vectorial field array, different tight focusing Field distribution of focal planes can be obtained.Such as, design a kind of vectorial field array, it can produce six focused spot by arranged in regular hexagon shape when tightly focusing on, to carry out micro-nano technology with this focousing field, then once can process six points, if will process a circular structure, imagination allows these six points slowly rotate 60 ° in time around central point, a circular time dependent focal spot track can be produced like this, then can process a circle based on it.If desired process a regular hexagon, then need, in the process rotating these six focal spots, make focal spot track present hexagon, and this holographic grating that can be carried in spatial light modulator by dynamic design to be realized.Foundation and method like this type of, can realize processing and the preparation of other complex micro structures.Therefore can realize on the one hand the processing to complicated micro-nano structure easily based on the femtosecond vectorial field array of dynamic regulation, significantly can also improve the efficiency of micro-nano technology on the other hand.The more important thing is, in the process of micro-nano technology, do not need the movement of sample and light beam, and everything only needs dynamically to change the holographic grating be carried in spatial light modulator and just can realize, the method based on the burnt field track processing micro structure of this dynamic regulation not yet finds related application at present.
Summary of the invention
Goal of the invention carries out to sample the problem that complicated moving controls and working (machining) efficiency is low in order to need when solving current femtosecond laser micro-nano technology, provides a kind of apparatus and method of the complicated micro-nano structure highly-efficient processing based on dynamic regulation femtosecond vectorial field array.
Technical scheme:
Burnt field track based on dynamic regulation makes a device for complicated micro-nano structure, and this device comprises: generation and the regulator control system of femto-second laser, dynamically femtosecond vectorial field array and tightly focus on micro-machining system.
Generation and the regulator control system of dynamic femtosecond vectorial field array comprise: the spatial light modulator (4) arranged successively along optical axis direction, 4f system supplementary lens (5), spatial filter (6), quarter wave plate (7), the rearmounted lens of 4f system (8), Ronchi grating (9) and for generation of the computer system (14) with Dynamic controlling holographic grating.
Tight focusing micro-machining system comprises: microcobjective (11), sample (12) and sample three-dimensional mobile platform (13);
The variable attenuator that the femtosecond laser that femto-second laser (1) exports forms via 1/2 wave plate (2) and polarization beam apparatus (3) controls laser energy, then vertical incidence is to spatial light modulator (4), spatial light modulator loads and is generated and the holographic grating of Dynamic controlling by computer system (14), converged through 4f system supplementary lens (5) by the linearly polarized light of diffraction after spatial light modulator, the spatial filter (6) be on the frequency plane of 4f system supplementary lens is utilized just to choose respectively, the diffraction light of negative one-level, then separately a left side of carrying vortex phase is changed into through a quarter wave plate (7), right-circularly polarized light, Ronchi grating (9) is incident to again after the rearmounted lens of 4f system (8) converge, the femtosecond vectorial field array obtaining dynamic regulation after bundle is closed through Ronchi grating.The dynamic regulation femtosecond vectorial field array obtained is incident to microcobjective (11) and focuses on after catoptron (10) reflection, focused beam irradiation carries out the processing of micro-nano structure on sample (12) surface or inner (transparent material), sample can carry out three-dimensional by three-dimensional mobile platform (13) as required and accurately control mobile, is implemented by the computer system be attached thereto (14) the control of mobile platform.
The centre wavelength of described femto-second laser (1) is 775 ~ 810nm, pulse width is 50 ~ 150fs, repetition frequency is 1 ~ 5kHz.
The holographic grating that the described system of machine as calculated (14) is loaded into spatial light modulator (4) in the dynamic change in time of micro Process process to generate the femtosecond vectorial field array of dynamic regulation, and then the time dependent burnt field track needed for producing; The shape of the micro-nano structure of preparation can be controlled by the design of burnt field track.
Described sample (12) can be metal, semiconductor or dielectric material (carrying out micro-nano technology on surface), also can be transparent solid material (as glass, melt quartz, lithium niobate or periodically poled lithium niobate etc., carry out micro-nano technology on inner or surface).
Advantage of the present invention and beneficial effect
(1) shape of the micro-nano structure of the present invention's processing can be realized by the design of burnt field track and Dynamic controlling, therefore can realize the preparation and fabrication of complicated micro-nano structure;
(2) polarization that the present invention is based on vectorial field array regulates and controls thus produces the tight focusing Jiao Chang of multifocal spot, and carries out micro Process based on multifocal spot, improves the efficiency of micro-nano technology;
(3) the present invention is when processing single micro-nano structure, without the need to the movement of sample or light beam, only needs dynamic regulation to be loaded into holographic grating in spatial light modulator.The technology of the present invention is ripe, and step is simple, and stability is strong, repeatable high.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram utilizing the femtosecond vectorial field array of dynamic regulation to make microstructure.
Fig. 2 is the burnt field track regulation and control schematic diagram based on vectorial field array, (a) vectorial field array arrangement schematic diagram and characterising parameter thereof, b the rotation of the vectorial field array shown in () figure (a), the focal spot that (c) is caused by vectorial field array rotation rotates schematic diagram.
Fig. 3 is the regular hexagon burnt field track forming process schematic diagram based on dynamic regulation vectorial field array.The first row: the vectorial field array schematic diagram after rotating to an angle, the second row: the Field distribution of focal plane corresponding with the vectorial field array of the first row, the third line: the regular hexagon burnt field track progressively rotating generation based on vectorial field array forms schematic diagram.Simulated conditions: (a) r=r
0, α=0, (b) r=1.10r
0, α=π/15, (c) r=1.15r
0, π/15, α=2, (d) r=1.15r
0, α=π/5, (e) r=1.10r
0, π/15, α=4.
Fig. 4 is that square burnt field track forms schematic diagram, (a) vectorial field array arrangement schematic diagram, b focal spot distribution that () figure (a) vectorial field array is corresponding, (c) vectorial field array progressively rotates the square focal spot track that pi/2 is formed.
Fig. 5 is the corresponding microstructure prepared in the processing of lithium niobate inside based on the regular hexagon (a) produced and square (b) burnt field track.The first row: analog result, the second row: experimental result.
Fig. 6 is based on the burnt field track of the vectorial field array generation by tetragonal crystal system (a), (b) and trigonal system arrangement (c), (d) and the corresponding microstructure in the processing preparation of lithium niobate inside.The first row: analog result, the second row: experimental result.
Fig. 7 is based on the periodicity regular hexagon microstructure of regular hexagon focal spot track in the preparation of lithium columbate crystal inside.
Fig. 8 is based on the periodicity two layer embedded regular hexagon microstructure of regular hexagon focal spot track in the preparation of lithium columbate crystal inside.
Embodiment
Now the present invention is described in more detail in conjunction with the accompanying drawings and embodiments, it should be pointed out that but the present invention is not limited to these embodiments.
Embodiment 1, make the device of microstructure based on the burnt field track of dynamic regulation
As shown in Figure 1, what the present invention proposed utilize the femtosecond vectorial field array of dynamic regulation to make the device of microstructure comprises: generation and the regulator control system of femto-second laser, dynamically femtosecond vectorial field array, tightly focus on micro-machining system.
Generation and the regulator control system of dynamic femtosecond vectorial field array comprise: the spatial light modulator (4) arranged successively along optical axis direction, 4f system supplementary lens (5), spatial filter (6), quarter wave plate (7), the rearmounted lens of 4f system (8), Ronchi grating (9) and for generation of the computer system (14) with Dynamic controlling holographic grating.Tight focusing micro-machining system comprises: microcobjective (11), sample (12) and three-dimensional mobile platform (13).
The variable attenuator that the femtosecond laser that femto-second laser (1) exports forms via 1/2 wave plate (2) and polarization beam apparatus (3) controls laser energy, then vertical incidence is to spatial light modulator (4), spatial light modulator loads and is generated and the holographic grating of Dynamic controlling by computer system (14), converged through 4f system supplementary lens (5) by the linearly polarized light of diffraction after spatial light modulator, the spatial filter (6) be on the frequency plane of 4f system supplementary lens is utilized just to choose respectively, the diffraction light of negative one-level, then separately a left side of carrying vortex phase is changed into through a quarter wave plate (7), right-circularly polarized light, Ronchi grating (9) is incident to again after the rearmounted lens of 4f system (8) converge, the femtosecond vectorial field array obtaining dynamic regulation after bundle is closed through Ronchi grating.The dynamic regulation femtosecond vectorial field array obtained by aforementioned system is incident to microcobjective (11) and focuses on after catoptron (10) reflection, focused beam irradiation carries out micro-nano technology on sample (12) surface or inner (transparent material), sample can carry out three-dimensional by three-dimensional mobile platform (13) as required and accurately control mobile, is implemented by the computer system be attached thereto (14) the control of mobile platform.
Embodiment 2, the principle utilizing the femtosecond vectorial field array making microstructure of dynamic regulation and method
Femtosecond laser is after the generation and regulator control system of the dynamic femtosecond vectorial field array described in embodiment 1, be incident to microcobjective to focus on, then be incident to sample surfaces or micro-nano technology is carried out in inside, the focal spot track that the shape of the micro-nano structure of preparation or pattern tightly focus on Jiao Chang by motion vector light field determined.To specifically introduce the principle of carrying out micro-nano technology based on motion vector light field array below.
As shown in Fig. 2 (a), vectorial field array is made up of a series of single vectorial field arranged according to certain rule, and the polarisation distribution of each vectorial field can regulate and control separately, and their spatial arrangement also can required design.The description of vectorial field array can by cartesian coordinate system (x, y) represent with oblique coordinates system (ξ, η), wherein oblique coordinates system (ξ, η) be the coordinate system of similar lattice arrangement, the symmetry of vectorial field array is represented by the angle β of ξ and η axle.
The formation basic theory of focal spot track is introduced below with a special case.If each vectorial field forming vectorial field array is the vectorial field of rotation direction polarization, and its incident field size is identical, when it is arranged as similar three rank crystallographic system, i.e. β=π/3, then after tight focusing, its Jiao Chang is rendered as six focal spots, as shown in the solid line small circle in Fig. 2 (c).When our the vectorial field array integral-rotation α angle by Fig. 2 (a), then six focal spots also rotation alpha angle of its Jiao Chang, when vectorial field array is progressively rotated π/3, then can obtain the circular focal spot track as shown in chain double-dashed line in Fig. 2 (c).Obtain orthohexagonal focal spot track if want, then in the process of vectorial field array rotation, the distance r at center, six focal spot out of focus fields
salso need real-time change, its focal spot track moves along the hexagonal side length of expection just can (as Suo Shi the dotted line small circle in Fig. 2 (c)), r
sreal-time change can realize by changing the radius size of single vectorial field.
For regular hexagon, in its length of side, any point is to the distance r at center
swith its length of side r
s0between have following relation:
Due to r
s0size and the light field size of single vectorial field be inversely proportional to, therefore can obtain the initial light field size r inputting light field
0with the relation of light field radius r single in rotary course:
Fig. 3 gives the formation schematic diagram of regular hexagon burnt field track.Anglec of rotation α corresponding in Fig. 3 (a)-(e) is respectively 0, π/15,2 π/15, π/5 and 4 π/15, the first row is the rotation of vectorial field array, second row is the distribution situation of corresponding focal spot, and the third line is the time dependent focal spot track formed.When each step-length enough little (such as π/90) rotated, then can obtain very uniform focal spot track.
The asymmetry parameter β changing vectorial field array then can cause the change of Field distribution of focal plane.If each vectorial field forming vectorial field array is the vectorial field of rotation direction polarization, and its incident field size is identical, when β=pi/2, as shown in Fig. 4 (a), then after tight focusing, its Jiao Chang, as shown in Fig. 4 (b), is rendered as four focal spots.To obtain the focal spot track of the square shown in Fig. 4 (c), then by the geometric relationship of square, any point can be obtained in its length of side to the distance r at foursquare center
swith its length of side r
s0between meet following relation:
And input the initial light field size r of light field
0with light field size r in rotary course with the relation of anglec of rotation α be then:
From Fig. 2 to Fig. 4, to obtain the focal spot track of other shapes, then it is very important for controlling the tight focal spot mobile route (or track) focused on, and the track of focal spot can be realized by the parameter of design vectorial field array.Based on this method, we can realize the focal spot track of Various Complex, as burnt field tracks such as octagon, quatrefoil, flaabellum shapes.In addition, the nested sandwich construction of said structure can also be realized.
As mentioned above, the dynamic change vectorial field array based on careful design can obtain the focal spot track of expection, can process the corresponding micro-nano structure of preparation based on the focal spot track produced.If adopt mobile platform to carry out simple two dimension rectilinear movement to sample, corresponding periodic structure (as shown in Figure 8) can also be obtained.
Processing instance one
Make the processing unit (plant) of complex micro structure below in conjunction with the burnt field track based on dynamic regulation of the present invention, the microstructure of cutting lithium columbate crystal inside processing regular hexagon and square at z is described in detail.
Processing unit (plant) is with reference to Fig. 1, incident femtosecond laser is after spatial light modulator and 4f system, Shu Shengcheng vectorial field is closed by Ronchi grating based on wavefront reconstruction principle, with generation single vectorial field unlike, in order to obtain vectorial field array, the holographic grating that spatial light modulator loads also is array, grating has identical cycle and orientation, and the vectorial field array that pattern of rows and columns of holographic grating and needs produce has identical arrangement (see Fig. 2 (a) Suo Shi).When the arrangement of vectorial field array presents trigonal system (β=π/3) or tetragonal crystal system (β=pi/2), six points (being positioned at regular hexagon vertex position) and four points (being positioned on square summit) can be produced respectively when tight focusing.In order to produce the burnt field track of regular hexagon or square, the holographic grating array be loaded in spatial light modulator rotates until the anglec of rotation reaches π/3 or pi/2 gradually, in the process rotated, the size (the single light field size of the vectorial field array of generation is directly determined by raster size) of each grating in holographic grating array is along with the angle [alpha] rotated is by (2) formula or the change of (4) formula.The vectorial field produced forms the burnt field track of regular hexagon and square after the microcobjective of NA=0.75 focuses on.When processing the microstructure of regular hexagon and square, lithium niobate sample maintains static, and is processed material by the burnt field track produced, to obtain the microstructure of regular hexagon correspondingly and square, as shown in Figure 5.In Fig. 5, above a line be simulation result, below a line be corresponding experimental result.
Processing instance two
Above-mentioned example controls burnt field track according to formula (1)-(4), thus obtain regular hexagon and tetragonal micro-nano structure.Here we provide the making of other shape microstructures again.
Known by introducing above, if the microstructure of certain shape will be prepared, then first must produce corresponding burnt field track, the change of diameter with the anglec of rotation of the single light field of vectorial field array in rotary course can be calculated according to burnt field track.Octagon in Fig. 6 (a) and Fig. 6 (b) and the burnt field track of bunge bedstraw herb shape are rotated pi/2 by the vectorial field array arranged by tetragonal crystal system (β=pi/2) and are obtained, and start to rotate front four focuses and lay respectively on the position on upper and lower, the limit, left and right of burnt field track.In Fig. 6 (c) and Fig. 6 (d), the burnt field track of Magen David and flaabellum shape rotates π/3 by the vectorial field array (β=π/3) arranged by trigonal system and obtains.Before starting to rotate, six focuses of Fig. 6 (c) lay respectively on hexagonal six summits, and six of Fig. 6 (d) focuses lay respectively at the outermost of six helixes.Based on the burnt field track obtained, micro-nano technology is carried out to lithium niobate inside, obtain microstructure consistent with it.
Processing instance three
Above-mentioned example one and example two all for the single microstructure of processing, provide the example that the method for inventing based on us prepares two-dimensional and periodic micro-nano structure here again.
On the basis obtaining the single regular hexagon microstructure shown in Fig. 5 (a), adopt three-dimensional mobile platform to carry out simple two-dimensional movement to sample and can obtain periodic microstructure.When manufacturing cycle structure, mobile platform moves linearly along the direction with respect to the horizontal direction of 60 °, and the displacement between two regular hexagon microstructures is two times of the regular hexagon length of side, and experimental results as shown in Figure 7.
Processing instance four
Give the periodicity regular hexagon microstructure of preparation in processing instance three, provide manufacturing cycle two layers of nested type regular hexagon microstructure here again.When the periodic micro structure that preparation two layers is nested, need first to prepare single ectonexine regular hexagon microstructure respectively, then can produce two layers of nested periodic micro structure according to the mode mobile example translation stage identical with the individual layer periodic micro/nano structure shown in Fig. 7, experimental result as shown in Figure 8.It is pointed out that because prepared structure is micron dimension, therefore need to adopt precise 2-D/three-dimensional mobile platform to move to ensure that the limit of multiple elementary microstructure can the perfect overlapping thus perfection of hold period structure to sample.
Claims (4)
1. make a device for microstructure based on the burnt field track of dynamic regulation, it is characterized in that this device comprises: generation and the regulator control system of femto-second laser, dynamically femtosecond vectorial field array and tightly focus on micro-machining system;
Generation and the regulator control system of dynamic femtosecond vectorial field array comprise: the spatial light modulator (4) arranged successively along optical axis direction, 4f system supplementary lens (5), spatial filter (6), quarter wave plate (7), the rearmounted lens of 4f system (8), Ronchi grating (9) and for generation of the computer system (14) with Dynamic controlling holographic grating;
Tight focusing micro-machining system comprises: microcobjective (11), sample (12) and sample three-dimensional mobile platform (13);
The variable attenuator that the femtosecond laser that femto-second laser (1) exports forms via 1/2 wave plate (2) and polarization beam apparatus (3) controls laser energy, then vertical incidence is to spatial light modulator (4), spatial light modulator loads and is generated and the holographic grating of Dynamic controlling by computer system (14), converged through 4f system supplementary lens (5) by the linearly polarized light of diffraction after spatial light modulator, the spatial filter (6) be on the frequency plane of 4f system supplementary lens is utilized just to choose respectively, the diffraction light of negative one-level, then separately a left side of carrying vortex phase is changed into through a quarter wave plate (7), right-circularly polarized light, Ronchi grating (9) is incident to again after the rearmounted lens of 4f system (8) converge, the femtosecond vectorial field array obtaining dynamic regulation after bundle is closed through Ronchi grating, the dynamic regulation femtosecond vectorial field array obtained is incident to microcobjective (11) and focuses on after catoptron (10) reflection, focused beam irradiation carries out the processing of micro-nano structure on sample (12) surface or inside, sample carries out three-dimensional by three-dimensional mobile platform (13) as required and accurately controls mobile, is implemented by the computer system be attached thereto (14) the control of mobile platform.
2. device according to claim 1, is characterized in that the processing of described micro-nano structure carries out based on the femtosecond vectorial field array time dependent burnt field track of dynamic regulation; The shape of micro-nano structure is controlled by the design of burnt field track.
3. device according to claim 1, is characterized in that the femtosecond vectorial field array of described dynamic regulation produces by being carried in time dependent holographic grating in spatial light modulator.
4. the device according to claim 1 or 2 or 3, is characterized in that the centre wavelength of described femto-second laser is 775 ~ 810nm, pulse width is 50 ~ 150fs, repetition frequency is 1 ~ 5kHz.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510860470.XA CN105259666B (en) | 2015-11-30 | 2015-11-30 | A kind of Jiao Chang tracks based on dynamic regulation make the device of micro-structural |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510860470.XA CN105259666B (en) | 2015-11-30 | 2015-11-30 | A kind of Jiao Chang tracks based on dynamic regulation make the device of micro-structural |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105259666A true CN105259666A (en) | 2016-01-20 |
CN105259666B CN105259666B (en) | 2018-01-30 |
Family
ID=55099419
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510860470.XA Expired - Fee Related CN105259666B (en) | 2015-11-30 | 2015-11-30 | A kind of Jiao Chang tracks based on dynamic regulation make the device of micro-structural |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN105259666B (en) |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105607267A (en) * | 2016-03-07 | 2016-05-25 | 东南大学 | Device for generating diffraction-free needle-shaped light field |
CN106444048A (en) * | 2016-09-06 | 2017-02-22 | 苏州大学 | Gaussian Shell model (GSM) shaping method and system |
CN106990547A (en) * | 2017-05-16 | 2017-07-28 | 南开大学 | The super surface of dolphin shape cellular circular array |
CN106990529A (en) * | 2017-06-05 | 2017-07-28 | 南开大学 | A kind of scalar diffraction theory algorithm for calculating one-dimensional reflecting grating far-field distribution |
CN107247339A (en) * | 2017-07-14 | 2017-10-13 | 浙江理工大学 | The double imaging methods and system of a kind of radial polarisation characteristic based on vectorial field |
CN108279550A (en) * | 2018-01-08 | 2018-07-13 | 武汉舒博光电技术有限公司 | A kind of dual-beam micronano optical manufacturing method |
WO2019015194A1 (en) * | 2017-07-18 | 2019-01-24 | 苏州大学 | Real-time construction and modulation system and method for micro-nano light field |
CN109683327A (en) * | 2018-12-06 | 2019-04-26 | 中国工程物理研究院激光聚变研究中心 | The shaping of light beam focal spot and kinetic-control system and method based on plasma regulation |
CN109991750A (en) * | 2019-04-23 | 2019-07-09 | 济南大学 | Square array vortex beams generation device, spiral light beam generation device and application |
CN110031982A (en) * | 2019-04-28 | 2019-07-19 | 济南大学 | The method and apparatus of square array vector beam is generated using two-dimensional grating and prism |
CN110095881A (en) * | 2019-04-12 | 2019-08-06 | 西安交通大学 | A kind of vector vortex photogenerated device based on gouy phase |
CN110421265A (en) * | 2019-07-01 | 2019-11-08 | 中国科学院上海光学精密机械研究所 | A kind of method and apparatus using femtosecond laser processing different shape sub-wavelength period structure |
CN110501892A (en) * | 2019-07-23 | 2019-11-26 | 中国科学技术大学 | The preparation method and device of chiral more valve micro-structures |
CN111055011A (en) * | 2019-12-29 | 2020-04-24 | 中国科学院西安光学精密机械研究所 | High-coaxiality and large-depth-diameter-ratio micropore machining method and system |
CN111399237A (en) * | 2020-03-13 | 2020-07-10 | 山东师范大学 | Device for generating universal non-uniform correlation light beam |
CN111790980A (en) * | 2020-06-28 | 2020-10-20 | 华中科技大学 | Method, system and application for regulating and controlling three-dimensional direction of optical axis of nano grating |
CN112904580A (en) * | 2021-02-05 | 2021-06-04 | 苏州大学 | System and method for generating vector non-uniform correlation light beam |
WO2021175118A1 (en) * | 2020-03-06 | 2021-09-10 | 上海瑞立柯信息技术有限公司 | Dynamic light field generation method and generation device |
CN113552718A (en) * | 2021-07-26 | 2021-10-26 | 南开大学 | Micro-nano structure processing method and system |
CN113777900A (en) * | 2021-09-17 | 2021-12-10 | 北京理工大学 | Patterned computer hologram prepared based on three-dimensional space shaping femtosecond laser |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101178484A (en) * | 2007-12-07 | 2008-05-14 | 南京大学 | Generation device of random polarization distributing vector light beam |
US20100219506A1 (en) * | 2005-12-21 | 2010-09-02 | University Of Virginia Patent Foundation | Systems and Methods of Laser Texturing and Crystallization of Material Surfaces |
CN103071930A (en) * | 2013-01-09 | 2013-05-01 | 南开大学 | System and method for preparing micro-pore array through femtosecond laser direct writing |
-
2015
- 2015-11-30 CN CN201510860470.XA patent/CN105259666B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100219506A1 (en) * | 2005-12-21 | 2010-09-02 | University Of Virginia Patent Foundation | Systems and Methods of Laser Texturing and Crystallization of Material Surfaces |
CN101178484A (en) * | 2007-12-07 | 2008-05-14 | 南京大学 | Generation device of random polarization distributing vector light beam |
CN103071930A (en) * | 2013-01-09 | 2013-05-01 | 南开大学 | System and method for preparing micro-pore array through femtosecond laser direct writing |
Non-Patent Citations (1)
Title |
---|
娄凯: "飞秒矢量光场空间调控及其在微纳加工中的应用", 《基础科学辑》 * |
Cited By (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105607267A (en) * | 2016-03-07 | 2016-05-25 | 东南大学 | Device for generating diffraction-free needle-shaped light field |
CN106444048A (en) * | 2016-09-06 | 2017-02-22 | 苏州大学 | Gaussian Shell model (GSM) shaping method and system |
CN106990547A (en) * | 2017-05-16 | 2017-07-28 | 南开大学 | The super surface of dolphin shape cellular circular array |
CN106990529A (en) * | 2017-06-05 | 2017-07-28 | 南开大学 | A kind of scalar diffraction theory algorithm for calculating one-dimensional reflecting grating far-field distribution |
CN106990529B (en) * | 2017-06-05 | 2021-12-10 | 南开大学 | Scalar diffraction theory algorithm for calculating one-dimensional reflection grating far-field distribution |
CN107247339A (en) * | 2017-07-14 | 2017-10-13 | 浙江理工大学 | The double imaging methods and system of a kind of radial polarisation characteristic based on vectorial field |
WO2019015194A1 (en) * | 2017-07-18 | 2019-01-24 | 苏州大学 | Real-time construction and modulation system and method for micro-nano light field |
CN108279550A (en) * | 2018-01-08 | 2018-07-13 | 武汉舒博光电技术有限公司 | A kind of dual-beam micronano optical manufacturing method |
CN108279550B (en) * | 2018-01-08 | 2021-07-27 | 武汉舒博光电技术有限公司 | Double-beam micro-nano optical manufacturing method |
CN109683327A (en) * | 2018-12-06 | 2019-04-26 | 中国工程物理研究院激光聚变研究中心 | The shaping of light beam focal spot and kinetic-control system and method based on plasma regulation |
CN109683327B (en) * | 2018-12-06 | 2021-02-26 | 中国工程物理研究院激光聚变研究中心 | Light beam focal spot shaping and dynamic control system and method based on plasma regulation |
CN110095881A (en) * | 2019-04-12 | 2019-08-06 | 西安交通大学 | A kind of vector vortex photogenerated device based on gouy phase |
CN109991750B (en) * | 2019-04-23 | 2021-04-20 | 济南大学 | Square array vortex light beam generating device, spiral light beam generating device and application |
CN109991750A (en) * | 2019-04-23 | 2019-07-09 | 济南大学 | Square array vortex beams generation device, spiral light beam generation device and application |
CN110031982B (en) * | 2019-04-28 | 2021-05-25 | 济南大学 | Method and device for generating square array vector light beam by using two-dimensional grating and prism |
CN110031982A (en) * | 2019-04-28 | 2019-07-19 | 济南大学 | The method and apparatus of square array vector beam is generated using two-dimensional grating and prism |
CN110421265A (en) * | 2019-07-01 | 2019-11-08 | 中国科学院上海光学精密机械研究所 | A kind of method and apparatus using femtosecond laser processing different shape sub-wavelength period structure |
CN110421265B (en) * | 2019-07-01 | 2021-06-01 | 中国科学院上海光学精密机械研究所 | Method and device for processing sub-wavelength periodic structures with different shapes by femtosecond laser |
CN110501892A (en) * | 2019-07-23 | 2019-11-26 | 中国科学技术大学 | The preparation method and device of chiral more valve micro-structures |
CN110501892B (en) * | 2019-07-23 | 2020-08-25 | 中国科学技术大学 | Method and device for preparing chiral multi-lobe microstructure |
CN111055011A (en) * | 2019-12-29 | 2020-04-24 | 中国科学院西安光学精密机械研究所 | High-coaxiality and large-depth-diameter-ratio micropore machining method and system |
WO2021175118A1 (en) * | 2020-03-06 | 2021-09-10 | 上海瑞立柯信息技术有限公司 | Dynamic light field generation method and generation device |
CN111399237A (en) * | 2020-03-13 | 2020-07-10 | 山东师范大学 | Device for generating universal non-uniform correlation light beam |
CN111790980A (en) * | 2020-06-28 | 2020-10-20 | 华中科技大学 | Method, system and application for regulating and controlling three-dimensional direction of optical axis of nano grating |
CN111790980B (en) * | 2020-06-28 | 2021-10-08 | 华中科技大学 | Method, system and application for regulating and controlling three-dimensional direction of optical axis of nano grating |
CN112904580A (en) * | 2021-02-05 | 2021-06-04 | 苏州大学 | System and method for generating vector non-uniform correlation light beam |
CN112904580B (en) * | 2021-02-05 | 2022-03-01 | 苏州大学 | System and method for generating vector non-uniform correlation light beam |
WO2022166034A1 (en) * | 2021-02-05 | 2022-08-11 | 苏州大学 | System and method for generating vector non-uniformly correlated beam |
CN113552718A (en) * | 2021-07-26 | 2021-10-26 | 南开大学 | Micro-nano structure processing method and system |
CN113552718B (en) * | 2021-07-26 | 2022-08-02 | 南开大学 | Micro-nano structure processing method and system |
CN113777900A (en) * | 2021-09-17 | 2021-12-10 | 北京理工大学 | Patterned computer hologram prepared based on three-dimensional space shaping femtosecond laser |
CN113777900B (en) * | 2021-09-17 | 2022-05-20 | 北京理工大学 | Patterned computer hologram prepared based on three-dimensional space shaping femtosecond laser |
Also Published As
Publication number | Publication date |
---|---|
CN105259666B (en) | 2018-01-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105259666A (en) | Device for manufacturing microstructure through focal field trajectory based on dynamic control | |
CN103071930B (en) | System and method for preparing micro-pore array through femtosecond laser direct writing | |
CN105108342A (en) | Method for preparing two-dimensional metallic photonic crystal structure in large area through femtosecond laser direct writing | |
CN103862168B (en) | The micro-machined tight focal beam spot energy optimizing method of femtosecond laser th ree-dimensional and device | |
CN103336367B (en) | Three-dimensional optical field adjusting and controlling device | |
CN104439699A (en) | System and method for preparing micro-nano array structure by means of laser light | |
CN102759800B (en) | Method for preparing microlens array beam shaper through femtosecond laser reinforced chemical etching | |
CN110303244B (en) | Method for rapidly preparing surface periodic structure | |
CN105182556A (en) | Multi-focus array light spot generation device and method | |
CN104297925A (en) | Design method of hybrid refractive-diffractive element for achieving femtosecond laser long focal depth | |
Baltrukonis et al. | High-order vector bessel-gauss beams for laser micromachining of transparent materials | |
CN103676499A (en) | Rotary Dammann grating based multichannel parallel laser direct writing device and method | |
CN101788715B (en) | Optical element for generating local area hollow light beam | |
Zhou et al. | Femtosecond multi-beam interference lithography based on dynamic wavefront engineering | |
CN100370309C (en) | Device and method for producing space light spots array with multi-beam interference and multi-polygon interference | |
Wu et al. | Controllable annulus micro-/nanostructures on copper fabricated by femtosecond laser with spatial doughnut distribution | |
CN113552718B (en) | Micro-nano structure processing method and system | |
CN102967928B (en) | The production method of the tight focal beam spot of a kind of post polarization vector light beam and device | |
CN103848392B (en) | The manufacture method of the black silicon of large area that a kind of micro structure cycle is controlled | |
Gao et al. | Gradient force pattern, focal shift, and focal switch in an apodized optical system | |
Luo et al. | Optimal condition for employing an axicon-generated Bessel beam to fabricate cylindrical microlens arrays | |
CN102591095B (en) | Ultra-short single-pulse light generator based on photonic crystal crossed beam-splitting waveguide | |
Zhang et al. | Rapid fabrication of microrings with complex cross section using annular vortex beams | |
CN209590317U (en) | A kind of long focusing glittering type negative refraction grating lens | |
CN110955054A (en) | Method for generating nano-optical needle based on angular polarized light |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180130 Termination date: 20181130 |